Double-layer silicon carbide epitaxial furnace

Abstract

The utility model discloses a double-layer silicon carbide epitaxial furnace, belongs to the technical field of epitaxial furnaces, and aims to solve the problems that when moving wheels are folded, a mounting cover is directly contacted with the ground, if water is accumulated on the ground, the accumulated water is easy to permeate into the mounting cover, and the internal structure is easy to damp in the prior art. Comprising an epitaxial furnace body and a supporting mechanism, the supporting mechanism is arranged at the bottom of the epitaxial furnace body, the supporting mechanism comprises bases, supporting legs and moving wheels, and the bases are symmetrically arranged below the outer walls of the two sides of the epitaxial furnace body; a driving screw is vertically installed in the base, and a lifting plate is installed on the outer portion of the driving screw in a threaded mode. According to the double-layer silicon carbide epitaxial furnace, the epitaxial furnace main body can be supported, so that the epitaxial furnace main body can be stably supported or moved according to use requirements, the base is laterally arranged, the epitaxial furnace main body cannot be excessively lifted, and the epitaxial furnace main body is more convenient to use.

Description

Technical Field

[0001] The utility model belongs to the technical field of epitaxial furnaces, and particularly relates to a double-layer silicon carbide epitaxial furnace. Background Technique

[0002] The double-layer silicon carbide epitaxial furnace is a key device used in the manufacturing process of silicon carbide materials. It is mainly used to grow a specific single-crystal thin film (i.e., the epitaxial layer) on a silicon carbide substrate to fabricate high-quality silicon carbide chip wafers. A silicon carbide epitaxial furnace growth unit is disclosed in the prior art, with the application number: CN202321393162.7. To solve the problems that the existing silicon carbide epitaxial furnace equipment is relatively large in size, mostly directly placed on the ground, making it very inconvenient to move, greatly increasing the maintenance cost and having poor practicability, the sleeve is rotated through a conical tooth ring. When the sleeve rotates, the moving block moves downward, and then the movable plate drives the four moving wheels to lift the device, thus facilitating the movement of the silicon carbide epitaxial furnace body. Conversely, when the motor is started to drive the conical gear to rotate in the reverse direction, the four moving wheels are retracted into the installation cover. The setting of the anti-slip pad makes the device more stable when placed. However, when the moving wheels are retracted in the above technical solution, the installation cover directly contacts the ground. If there is water accumulation on the ground, the water is likely to seep into the installation cover, and the internal structure is likely to get damp. Therefore, the inventor proposes a double-layer silicon carbide epitaxial furnace. Summary of the Invention

[0003] (1) Technical Problems to be Solved

[0004] Aiming at the deficiencies of the prior art, the purpose of the utility model is to provide a double-layer silicon carbide epitaxial furnace, aiming to solve the problem that when the moving wheels are retracted in the prior art solution, the installation cover directly contacts the ground. If there is water accumulation on the ground, the water is likely to seep into the installation cover, and the internal structure is likely to get damp.

[0005] (2) Technical Solutions

[0006] To solve the above technical problems, the present utility model provides such a double-layer silicon carbide epitaxial furnace, which includes an epitaxial furnace main body and a support mechanism. The support mechanism is arranged at the bottom of the epitaxial furnace main body. The support mechanism includes a base, support legs, and moving wheels. The bases are symmetrically arranged below the outer walls on both sides of the epitaxial furnace main body. A driving screw is vertically installed inside the base, and a lifting plate is threadedly installed outside the driving screw. The outer peripheral surface of the lifting plate is slidably attached to the inner wall of the base. A support column is fixedly connected to the bottom of the lifting plate. The support column is vertically arranged, and a moving wheel is installed at the bottom. Movable and liftable support legs are provided at the bottom of the base. Thanks to the setting of the base, the epitaxial furnace main body can be supported, enabling the epitaxial furnace main body to be stably supported or moved according to the usage requirements. The base is laterally arranged and will not cause too much height increase to the epitaxial furnace main body, making the use of the epitaxial furnace main body more convenient.

[0007] Preferably, a sliding column is fixedly connected to the upper surface of the support leg. The sliding column is vertically arranged, and a perforation for the sliding column to pass through is provided on the bottom end surface of the base.

[0008] Preferably, a guiding block protrudes from the inner wall of the perforation, and a guiding groove is vertically formed on the inner wall of the sliding column. The guiding block and the guiding groove are slidably installed in an adapted manner.

[0009] Preferably, the inside of the sliding column is hollow, and an inner screw is threaded into the upper surface. The inner screw vertically passes through the lifting plate in a threaded manner.

[0010] Preferably, a rotating shaft is fixedly connected to the end of the inner screw away from the sliding column, and a fixed column is fixedly connected to the upper surface of the rotating shaft.

[0011] Preferably, the fixed column is vertically arranged, and the end away from the rotating shaft is fixedly connected to the top inner wall of the base.

[0012] Preferably, a driving motor is fixedly installed on the upper surface of the base, and the driving motor is connected to the driving screw.

[0013] (3) Beneficial effects

[0014] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0015] Benefiting from the setting of the base, the present utility model can support the epitaxial furnace body, enabling the epitaxial furnace body to be stably supported or moved according to usage requirements. The base is laterally arranged and will not cause excessive height increase to the epitaxial furnace body, making the use of the epitaxial furnace body more convenient. When it is necessary to move the epitaxial furnace body, the moving wheels are lowered, and at this time, the supporting legs will rise under force. When it is necessary to stably support the epitaxial furnace body, the moving wheels will rise under force, and the epitaxial furnace body is in a suspended state and will not come into contact with the accumulated water on the ground, improving the safety of use. The moving wheels and the supporting legs are used alternately, and the principle is simple and easy to implement, and can be widely promoted. Description of the Drawings

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present application. For those skilled in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0017] Figure 1 is a structural schematic diagram of the present utility model;

[0018] Figure 2 is a schematic diagram of the internal structure of the side view of the base;

[0019] Figure 3 is Figure 2 an enlarged structural schematic diagram of part A in

[0020] Figure 4 is Figure 2 an enlarged structural schematic diagram of part B in

[0021] The reference signs in the drawings are: 1, epitaxial furnace body; 2, support mechanism; 3, support column; 4, base; 5, drive screw; 6, drive motor; 7, fixed column; 8, support leg; 9, moving wheel; 10, lifting plate; 11, guide block; 12, through hole; 13, guide groove; 14, sliding column; 15, inner screw; 16, rotating shaft. Detailed Embodiment

[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present utility model with reference to the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, rather than all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0023] This detailed embodiment is a double-layer silicon carbide epitaxial furnace, and its structural schematic diagram is as shown in Figure 1 、Figure 2 As shown in the figure, it includes an epitaxial furnace main body 1 and a support mechanism 2. The support mechanism 2 is arranged at the bottom of the epitaxial furnace main body 1. The support mechanism 2 includes a base 4, support legs 8, and moving wheels 9. The base 4 is symmetrically arranged below the outer walls on both sides of the epitaxial furnace main body 1. A driving screw 5 is vertically installed inside the base 4. A lifting plate 10 is threadedly installed on the outside of the driving screw 5. The outer peripheral surface of the lifting plate 10 is slidably attached to the inner wall of the base 4. A support column 3 is fixedly connected to the bottom of the lifting plate 10. The support column 3 is vertically arranged, and a moving wheel 9 is installed at the bottom. An activatable and liftable support leg 8 is provided at the bottom of the base 4. A driving motor 6 is fixedly installed on the upper surface of the base 4, and the driving motor 6 is connected to the driving screw 5.

[0024] Refer to Figure 3 , a sliding column 14 is fixedly connected to the upper surface of the support leg 8. The sliding column 14 is vertically arranged. The bottom end surface of the base 4 has a perforation 12 for the sliding column 14 to pass through. A guiding block 11 protrudes from the inner wall of the perforation 12. A guiding groove 13 is vertically opened on the inner wall of the sliding column 14. The guiding block 11 and the guiding groove 13 are slidably installed in an adapted manner. There is a guiding groove 13 on the outer wall of the sliding column 14, and a guiding block 11 protrudes from the inner wall of the perforation 12. Therefore, although the sliding column 14 is driven by the thread force, it will not rotate itself.

[0025] Refer to Figure 4 , the inside of the sliding column 14 is hollow, and an inner screw 15 is threadedly inserted along the upper surface. The inner screw 15 threadedly passes through the lifting plate 10 vertically. One end of the inner screw 15 away from the sliding column 14 is fixedly connected to a rotating shaft 16. A fixed column 7 is fixedly connected to the upper surface of the rotating shaft 16. The fixed column 7 is vertically arranged, and one end away from the rotating shaft 16 is fixedly connected to the inner wall of the top end of the base 4.

[0026] Working principle: When in use, first start the driving motor 6. The driving motor 6 drives the driving screw 5 to rotate. The lifting plate 10 threadedly connected to the driving screw 5 rises or falls. When the lifting plate 10 rises, the support column 3 at the bottom of the lifting plate 10 drives the moving wheel 9 to retract into the inside of the base 4. When the lifting plate 10 rises, since it is threadedly connected to the inner screw 15, the inner screw 15 is forced to rotate. When the inner screw 15 rotates, the sleeved sliding column 14 starts to descend under the (thread) force. There is a guiding groove 13 on the outer wall of the sliding column 14, and a guiding block 11 protrudes from the inner wall of the perforation 12. Therefore, although the sliding column 14 is driven by the thread force, it will not rotate itself, enabling the support leg 8 to have a stable lifting force and descend below the base 4. The base 4 is lifted by the support leg 8, so that the base 4 does not contact the ground. The epitaxial furnace main body 1 is in a suspended support state and will not contact the accumulated water on the ground, improving the safety of use. The moving wheel 9 and the support leg 8 are used alternately. When the support leg 8 rises, the moving wheel 9 is forced to descend.

[0027] Finally, it should be noted that the above are only the preferred embodiments of the present invention and are not used to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A double-layer silicon carbide epitaxial furnace, comprising an epitaxial furnace body (1) and a support mechanism (2), characterized in that, The support mechanism (2) is arranged at the bottom of the epitaxial furnace body (1), and the support mechanism (2) comprises a base (4), support legs (8), and moving wheels (9); the base (4) is symmetrically arranged below the outer walls of both sides of the epitaxial furnace body (1); A driving screw rod (5) is vertically installed inside the base (4), and a lifting plate (10) is installed on the external thread of the driving screw rod (5), and the outer peripheral surface of the lifting plate (10) is slidably attached to the inner wall of the base (4); The bottom of the lifting plate (10) is fixedly connected to a support column (3), the support column (3) is arranged vertically and has a moving wheel (9) installed at the bottom, and the bottom of the base (4) is provided with a support leg (8) that can be movably raised and lowered.

2. The double-layer silicon carbide epitaxial furnace according to claim 1, wherein, The upper surface of the support leg (8) is fixedly connected with a sliding column (14), the sliding column (14) is arranged vertically, and the bottom end surface of the base (4) has a through hole (12) for the sliding column (14) to pass through.

3. The double-layer silicon carbide epitaxial furnace according to claim 2, wherein A guide block (11) is protruding from the inner wall of the through hole (12), a guide groove (13) is vertically opened on the inner wall of the sliding column (14), and the guide block (11) and the guide groove (13) are adapted to be slidably installed.

4. A double-layer silicon carbide epitaxial furnace according to claim 3, characterized in that, The interior of the sliding column (14) is hollow, and an internal screw rod (15) is threadedly inserted along the upper surface, and the internal screw rod (15) vertically threads through the lifting plate (10).

5. A double-layer silicon carbide epitaxial furnace according to claim 4, characterized in that, One end of the inner screw (15) away from the sliding column (14) is fixedly connected to a rotating shaft (16), and the upper surface of the rotating shaft (16) is fixedly connected to a fixed column (7).

6. The double-layer silicon carbide epitaxial furnace according to claim 5, characterized in that, The fixing column (7) is arranged vertically, and one end away from the rotating shaft (16) is fixedly connected to the top inner wall of the base (4).

7. A double-layer silicon carbide epitaxial furnace according to claim 1, wherein A driving motor (6) is fixedly mounted on the upper surface of the base (4), and the driving motor (6) is connected to the driving screw (5).

Images