Three-chamber horizontal magnetic control coating machine
Through the design of the three-chamber horizontal magnetron coating machine, the problems of high economic costs, large vacuum fluctuations and low production efficiency in the existing technology are solved, and a low-cost and efficient coating process is achieved.
Patent Information
- Application Number
- CN202422353348.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-26
- Publication Date
- 2025-07-29
- Estimated Expiration
- 2034-09-26
AI Technical Summary
The existing continuous horizontal vacuum magnetron coating production lines have high economic costs, large vacuum fluctuations, unstable coating, low target usage rate, and low production efficiency.
A three-chamber horizontal magnetron coating machine is adopted, including a film inlet table, a front vacuum chamber, a magnetron sputtering coating room, a rear vacuum chamber and a discharge table that are connected in turn. A vacuum lock door and a transmission roller are installed. The front vacuum chamber and the rear vacuum chamber are connected to the vacuum pump unit, the magnetron sputtering coating room is connected to the molecular pump, and the rotating cylindrical target is used for coating.
It reduces economic costs, has small fluctuations in vacuum, stable coating, high target usage rate, and improved production efficiency.
Smart Images

Figure CN223163475U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the field of coating equipment, in particular to a three-chamber horizontal magnetron sputtering coater. Background Art
[0002] The existing continuous horizontal vacuum magnetron sputtering coating production line has a large number of vacuum chambers, which is costly for small customers; the vacuum pumping capacity of the front and rear low-vacuum chambers and the magnetron sputtering coating chamber is insufficient, the vacuum degree fluctuates greatly during vacuum pumping, the coating is unstable, the target utilization rate is not high, and thus the production efficiency is not high. Summary of the Utility Model
[0003] The utility model aims to at least solve one of the technical problems existing in the prior art. For this purpose, the utility model provides a three-chamber horizontal magnetron sputtering coater, which has low economic cost, small vacuum degree fluctuation, stable coating, high target utilization rate and high production efficiency.
[0004] The technical solution adopted by the utility model to solve its technical problems is as follows:
[0005] A three-chamber horizontal magnetron sputtering coater includes a sheet feeding table, a front vacuum chamber, a magnetron sputtering coating chamber, a rear vacuum chamber and a sheet discharging table which are connected in sequence, and vacuum lock doors arranged between them. The sheet feeding table, the front vacuum chamber, the magnetron sputtering coating chamber, the rear vacuum chamber and the sheet discharging table are all provided with driving roller shafts for driving workpieces to move forward. The front vacuum chamber and the rear vacuum chamber are both connected with a plurality of vacuum pump units, the magnetron sputtering coating chamber is connected with a plurality of molecular pumps, a rotating cylindrical target is further arranged in the magnetron sputtering coating chamber, and air release valves are arranged in the front vacuum chamber, the magnetron sputtering coating chamber and the rear vacuum chamber.
[0006] A three-chamber horizontal magnetron sputtering coater according to an embodiment of the present invention has at least the following beneficial effects: During operation, the air release valve of the front vacuum chamber is opened to allow air to enter the front vacuum chamber. When the air pressure inside the front vacuum chamber is equal to the atmospheric pressure outside, the vacuum lock door between the wafer loading station and the front vacuum chamber is opened. The workpiece on the wafer loading station enters the front vacuum chamber driven by the transmission roller. The vacuum lock door is closed, and the vacuum pump unit is started to evacuate the front vacuum chamber. At the same time, the molecular pump also evacuates the magnetron sputtering coating chamber in advance until a high vacuum pressure is reached. When the front vacuum chamber and the magnetron sputtering coating chamber reach a certain pressure, the vacuum lock door between the front vacuum chamber and the magnetron sputtering coating chamber is opened. The workpiece in the front vacuum chamber enters the magnetron sputtering coating chamber driven by the transmission roller. The vacuum lock door is closed, and the rotating cylindrical target in the magnetron sputtering coating chamber coats the workpiece. At the same time, the vacuum pump unit evacuates the rear vacuum chamber in advance. When the coating is completed, the vacuum lock door between the magnetron sputtering coating chamber and the rear vacuum chamber is opened. The workpiece in the magnetron sputtering coating chamber enters the rear vacuum chamber driven by the transmission roller. The vacuum lock door is closed. Then, the air release valve of the rear vacuum chamber is opened to allow air to enter the rear vacuum chamber. When the air pressure inside the rear vacuum chamber is equal to the atmospheric pressure outside, the workpiece in the rear vacuum chamber exits to the wafer unloading station driven by the transmission roller. At this time, the equipment has completed one working cycle, and the above working process is repeated as a standard to start the next working cycle. The equipment adopts a three-chamber structure, with low economic cost. The vacuum pump units are arranged in the front vacuum chamber and the rear vacuum chamber; multiple molecular pumps are arranged in the magnetron sputtering coating chamber, with small vacuum degree fluctuations, stable coating, high target utilization rate, and high production efficiency.
[0007] According to some embodiments of the present invention, the vacuum pump unit is arranged on one side of the front vacuum chamber and the rear vacuum chamber.
[0008] Beneficially, such an arrangement of the vacuum pump unit is conducive to installation and saves installation space.
[0009] According to some embodiments of the present invention, the number of the vacuum pump units in the front vacuum chamber is three.
[0010] Beneficially, installing three vacuum pump units can ensure that the front vacuum chamber quickly reaches the working pressure and improve the working efficiency.
[0011] According to some embodiments of the present invention, the number of the vacuum pump units in the rear vacuum chamber is three.
[0012] Beneficially, installing three vacuum pump units can ensure that the rear vacuum chamber quickly reaches the working pressure and improve the working efficiency.
[0013] According to some embodiments of the present invention, the molecular pumps are arranged on both sides of the magnetron sputtering coating chamber.
[0014] Advantageously, the molecular pump is arranged in such a way that it is beneficial to uniformly increase the pressure in the magnetron sputtering coating chamber and ensure the stability of the air pressure in the magnetron sputtering coating chamber.
[0015] According to some embodiments of the present invention, three molecular pumps are respectively arranged on both sides of the magnetron sputtering coating chamber.
[0016] Advantageously, the molecular pump is arranged in such a way that it is beneficial for the magnetron sputtering coating chamber to quickly reach a high vacuum pressure and improve the working efficiency.
[0017] According to some embodiments of the present invention, the drive roller is driven by a drive motor.
[0018] Advantageously, the drive motor drives the drive roller to rotate, thereby driving the workpiece to move forward.
[0019] According to some embodiments of the present invention, the front vacuum chamber, the magnetron sputtering coating chamber, and the rear vacuum chamber are made of carbon steel or stainless steel.
[0020] Advantageously, using carbon steel or stainless steel is easy to process, and at the same time, it ensures a certain strength for the front vacuum chamber, the magnetron sputtering coating chamber, and the rear vacuum chamber.
[0021] The additional aspects and advantages of the present invention will be partially given in the following description, partially will become obvious from the following description, or will be understood through the practice of the present invention. Brief Description of the Drawings
[0022] In order to more clearly illustrate the technical solutions of the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.
[0023] Figure 1 It is a side schematic view of an embodiment of the present invention;
[0024] Figure 2 It is a top view of an embodiment of the present invention;
[0025] Figure 3 It is Figure 2 an enlarged view of part A in
[0026] Reference numerals: film inlet table 100, front vacuum chamber 110, magnetron sputtering coating chamber 120, rear vacuum chamber 130, film outlet table 140, vacuum lock door 150, vacuum pump unit 160, molecular pump 170, drive roller 180. Detailed Description of the Embodiments
[0027] Embodiments of the present utility model will be described in detail below. Examples of the embodiments are shown in the accompanying drawings, where like or similar reference numerals denote like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the accompanying drawings are exemplary and are only used to explain the present utility model, and should not be construed as a limitation to the present utility model.
[0028] In the description of the present utility model, it should be understood that with respect to the orientation description, such as the orientation or positional relationship indicated by up, down, front, back, left, right, etc., is based on the orientation or positional relationship shown in the accompanying drawings. This is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present utility model.
[0029] In the description of the present utility model, the meaning of "several" is one or more, the meaning of "multiple" is two or more, and understandings such as "greater than", "less than", "exceeding", etc. do not include the recited number, and understandings such as "above", "below", "within", etc. include the recited number. If there is a description of "first" and "second", this is only for the purpose of distinguishing technical features and should not be construed as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features or implicitly indicating the sequence relationship of the indicated technical features.
[0030] In the description of the present utility model, it should be noted that unless otherwise clearly defined and limited, the terms "installed", "connected" and "coupled" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium, and it may be the communication inside two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.
[0031] Next, refer to Figures 1 - 3 A three-chamber horizontal magnetron sputtering coater will be described in detail with a specific embodiment. It should be understood that the following description is only an exemplary illustration and not a specific limitation to the utility model.
[0032] As Figures 1 - 3As shown in the figure, a three-chamber horizontal magnetron sputtering coating machine includes a film loading table 100, a front vacuum chamber 110, a magnetron sputtering coating chamber 120, a rear vacuum chamber 130, and a film unloading table 140 connected in sequence, as well as vacuum lock doors 150 provided between them. The film loading table 100, the front vacuum chamber 110, the magnetron sputtering coating chamber 120, the rear vacuum chamber 130, and the film unloading table 140 are all provided with drive rollers 180 for driving the workpiece forward. The front vacuum chamber 110 and the rear vacuum chamber 130 are both connected to multiple vacuum pump units 160, and the magnetron sputtering coating chamber 120 is connected to multiple molecular pumps 170. A rotating cylindrical target is also provided in the magnetron sputtering coating chamber 120. The front vacuum chamber 110, the magnetron sputtering coating chamber 120, and the rear vacuum chamber 130 are provided with air release valves (the air release valves are not shown in the figure). Specifically, the installation method of the vacuum lock door 150 is longitudinal installation, and the installation method of the air extraction valve of the vacuum pump unit 160 is longitudinal installation. During operation, the air release valve of the front vacuum chamber 110 is opened to allow air to enter the front vacuum chamber 110. When the atmospheric pressure inside the front vacuum chamber 110 is equal to the outside atmospheric pressure, the vacuum lock door 150 between the film loading table 100 and the front vacuum chamber 110 is opened, and the workpiece on the film loading table 100 enters the front vacuum chamber 110 driven by the drive roller 180. This vacuum lock door 150 is closed, and the vacuum pump unit 160 is started to pump air from the front vacuum chamber 110. At the same time, the molecular pump 170 also pre-pumps the magnetron sputtering coating chamber 120 until a high vacuum pressure is reached. When the front vacuum chamber 110 and the magnetron sputtering coating chamber 120 reach a certain pressure, the vacuum lock door 150 between the front vacuum chamber 110 and the magnetron sputtering coating chamber 120 is opened, and the workpiece in the front vacuum chamber 110 enters the magnetron sputtering coating chamber 120 driven by the drive roller 180. This vacuum lock door 150 is closed, and the rotating cylindrical target in the magnetron sputtering coating chamber 120 coats the workpiece. At the same time, the vacuum pump unit 160 pre-pumps the rear vacuum chamber 130 in advance. When the coating is completed, the vacuum lock door 150 between the magnetron sputtering coating chamber 120 and the rear vacuum chamber 130 is opened, and the workpiece in the magnetron sputtering coating chamber 120 enters the rear vacuum chamber 130 driven by the drive roller 180. This vacuum lock door 150 is closed. Then, the air release valve of the rear vacuum chamber 130 is opened to allow air to enter the rear vacuum chamber 130. When the atmospheric pressure inside the rear vacuum chamber 130 is equal to the outside atmospheric pressure, the workpiece in the rear vacuum chamber 130 is taken out to the film unloading table 140 driven by the drive roller 180. At this time, the device has completed one working cycle, and the above working process is repeated as a standard to carry out the next working cycle. This device adopts a three-chamber structure, with low economic cost. Vacuum pump units 160 are provided in the front vacuum chamber 110 and the rear vacuum chamber 130; multiple molecular pumps 170 are provided in the magnetron sputtering coating chamber, with small vacuum degree fluctuations, stable coating, high target material utilization rate, and high production efficiency.
[0033] Specifically, as Figure 2As shown, the vacuum pump unit 160 is arranged on one side of the front vacuum chamber 110 and the rear vacuum chamber 130. Such an arrangement of the vacuum pump unit 160 is conducive to installation and saves installation space. In addition, the number of vacuum pump units 160 in the front vacuum chamber 110 is three. Installing three vacuum pump units 160 can ensure that the front vacuum chamber 110 quickly reaches the working pressure and improves work efficiency. Similarly, the number of vacuum pump units 160 in the rear vacuum chamber 130 is three. Installing three vacuum pump units 160 can ensure that the rear vacuum chamber 130 quickly reaches the working pressure and improves work efficiency.
[0034] It should be noted that, as Figure 3 shown, the molecular pumps 170 are arranged on both sides of the magnetron sputtering coating chamber 120. Such an arrangement of the molecular pumps 170 is conducive to the uniform pressurization of the magnetron sputtering coating chamber 120 and ensures the stable air pressure in the magnetron sputtering coating chamber 120. Moreover, three molecular pumps 170 are respectively arranged on both sides of the magnetron sputtering coating chamber 120. Such an arrangement of the molecular pumps 170 is conducive to the magnetron sputtering coating chamber 120 quickly reaching a high vacuum pressure and improving work efficiency.
[0035] It can be understood that the drive roller 180 is driven by a drive motor (the drive motor is not shown in the figure). The drive motor drives the drive roller 180 to rotate, thereby driving the workpiece to move forward.
[0036] It is worth mentioning that the materials of the front vacuum chamber 110, the magnetron sputtering coating chamber 120, and the rear vacuum chamber 130 are carbon steel or stainless steel. Using carbon steel or stainless steel is easy to process and at the same time ensures a certain strength for the front vacuum chamber 110, the magnetron sputtering coating chamber 120, and the rear vacuum chamber 130.
[0037] In the description of this specification, the description with reference to terms such as "one embodiment, some embodiments, illustrative embodiments, examples, specific examples, or some examples" means that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.
[0038] The above has described the embodiments of the present invention in detail with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments, and various changes can be made without departing from the spirit of the present invention within the scope of knowledge possessed by those of ordinary skill in the art.
Claims
1. A three-chamber horizontal magnetron sputtering coater, characterized in that, It includes a wafer loading table (100), a front vacuum chamber (110), a magnetron sputtering coating chamber (120), a rear vacuum chamber (130), and a wafer unloading table (140) connected in sequence, as well as vacuum lock doors (150) provided between them. The wafer loading table (100), the front vacuum chamber (110), the magnetron sputtering coating chamber (120), the rear vacuum chamber (130), and the wafer unloading table (140) are all provided with drive rollers (180) for driving the workpiece forward. The front vacuum chamber (110) and the rear vacuum chamber (130) are both connected to a plurality of vacuum pump units (160). The magnetron sputtering coating chamber (120) is connected to a plurality of molecular pumps (170). A rotating cylindrical target is further provided in the magnetron sputtering coating chamber (120). The front vacuum chamber (110), the magnetron sputtering coating chamber (120), and the rear vacuum chamber (130) are provided with air release valves.
2. The three-chamber horizontal magnetron sputtering coater according to claim 1, characterized in that, The vacuum pump units (160) are arranged on one side of the front vacuum chamber (110) and the rear vacuum chamber (130).
3. The three-chamber horizontal magnetron sputtering coater according to claim 2, wherein, The number of the vacuum pump units (160) in the front vacuum chamber (110) is three.
4. The three-chamber horizontal magnetron sputtering coater according to claim 2, wherein, The number of the vacuum pump units (160) in the rear vacuum chamber (130) is three.
5. The horizontal magnetron sputtering coater with three chambers according to claim 1, characterized in that, The molecular pumps (170) are arranged on both sides of the magnetron sputtering coating chamber (120).
6. The three-chamber horizontal magnetron sputtering coater according to claim 5, wherein, Three molecular pumps (170) are respectively provided on both sides of the magnetron sputtering coating chamber (120).
7. The three-chamber horizontal magnetron sputtering coater according to claim 1, wherein, The drive rollers (180) are driven by drive motors.
8. A three-chamber horizontal magnetron sputtering coater according to claim 1, wherein, The materials of the front vacuum chamber (110), the magnetron sputtering coating chamber (120), and the rear vacuum chamber (130) are carbon steel or stainless steel.