Thermal field component applied to plasma chemical vapor deposition furnace

Abstract

The utility model discloses a thermal field component applied to a plasma chemical vapor deposition furnace, which comprises an outer shell and a heating chamber, the heating chamber is annularly distributed in the outer shell to form a furnace pipe, a constant temperature protective layer is further arranged between the outer shell and the heating chamber, and a heating unit is arranged on the heating chamber and embedded in the heating chamber; the heating device is simple in structure and convenient and fast to use, the heating chamber and the heating unit located in the heating chamber are arranged in the outer shell, so that the heating chamber can generate a high-temperature environment when powered on to complete processing, the constant-temperature protection layer is arranged between the heating chamber and the heating unit, internal high temperature can be effectively prevented from being transmitted out, and the service life of the heating device is prolonged. In addition, the thermocouple fixing seat is provided with the protective cover, so that the workers can be effectively prevented from touching the thermocouple fixing seat by mistake in the using process, and the situation of injury is effectively avoided.

Description

Technical Field

[0001] The utility model relates to the technical field of chemical vapor deposition furnaces, in particular to a thermal field component used in a plasma chemical vapor deposition furnace. Background Art

[0002] Solar energy is a pollution-free, freely available, abundant energy source with unique renewable effects. It is a renewable resource. At present, solar photovoltaic power generation has received attention and is called the most important electricity source technology in the 21st century.

[0003] Among them, in solar photovoltaic power generation, solar panels are a particularly important technology. After the steps of texturing, diffusion, etching, etc., it is also necessary to use the plasma chemical vapor deposition method to prepare a reflective film on its surface to reduce the effect of light reflection, thereby improving the efficiency of solar power generation. Therefore, when preparing solar panels, plasma chemical vapor deposition technology is particularly important and is related to the conversion efficiency of solar panels.

[0004] Existing vapor deposition furnace equipment is large in size, occupies a large area, requires a larger site, and is very cumbersome to operate during installation and use. It is also not convenient for subsequent maintenance, consuming a lot of manpower and time, resulting in increased production and maintenance costs for enterprises.

[0005] Therefore, it is necessary to study a new technical solution to solve the above problems. Utility Model Content

[0006] In view of this, the present invention aims to address the deficiencies in the prior art, and its main purpose is to provide a thermal field component for use in a plasma chemical vapor deposition furnace.

[0007] To achieve the above purpose, the present invention adopts the following technical solutions:

[0008] A thermal field component used in a plasma chemical vapor deposition furnace includes an outer shell and a heating chamber. The heating chamber is annularly distributed in the outer shell to form a furnace core. A constant temperature protection layer is provided between the outer shell and the heating chamber. A heating unit is provided on the heating chamber and embedded in the heating chamber.

[0009] As a preference, a thermocouple fixing seat is provided on the outer shell, and the thermocouple fixing seat is installed and fixed on the outer wall of the outer shell.

[0010] As a preference, the outer shell is further provided with a protective cover, and the protective cover is provided above the thermocouple fixing seat to prevent workers from accidentally touching the thermocouple fixing seat.

[0011] As a preference, the thermocouple fixing seats and the protective covers are provided in a plurality of groups, and the plurality of groups of thermocouple fixing seats and the protective covers are arranged at intervals and distributed on the outer shell.

[0012] As a preference, a temperature display is further provided on the thermocouple fixing seat, and the temperature display is used to display the real-time temperature of the heating chamber in the vapor deposition furnace and facilitate viewing by the user.

[0013] As a preference, the outer shell is provided with a power connection socket, the power connection socket is electrically connected to the heating unit, and one end of the heating unit passes through the outer shell and the heating chamber and is connected to the power connection socket.

[0014] As a preference, the heating chamber is provided with a plurality of installation grooves arranged at intervals, wherein the heating units are embedded and installed in the installation grooves, and the heating units are heating wires.

[0015] As a preferred embodiment, the constant temperature protective layer is integrally formed by using fiber cotton material.

[0016] As a preference, the heating chamber is further provided with a number of mounting pads for installation and fixation, and the several mounting pads are arranged at the inner end of the heating chamber and are fixedly installed in the outer shell by bolts passing through the mounting pads, the heating chamber and the constant temperature protection layer in sequence.

[0017] As a preference, handles are further provided on the outer surface of the outer shell, and the handles are distributed on the left and right sides of the outer shell.

[0018] Compared with the prior art, the present invention has obvious advantages and beneficial effects. Specifically, it can be seen from the above technical solution that:

[0019] The utility model has a simple structure and is quick and easy to use. A heating chamber and a heating unit located in the heating chamber are arranged in the outer shell, so that the heating chamber can generate a high-temperature environment when powered on, thereby completing the processing. A constant temperature protection layer is arranged between the two, which can effectively protect the internal high temperature from being transmitted out, avoiding workers from accidentally touching the outer shell and causing damage. A protective cover is arranged on the thermocouple fixing seat, which can effectively avoid workers from accidentally touching it during use, effectively avoiding injuries. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for use in the embodiments or descriptions of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0021] Figure 1It is a schematic diagram of the overall structure of the utility model.

[0022] Figure 2 It is a structural schematic diagram from another perspective of the present invention.

[0023] Figure 3 It is a side view schematic diagram of the end surface structure of the utility model.

[0024] Among them, the reference numerals in the figures are:

[0025] 10. Outer shell; 20. Heating chamber; 21. Mounting slot; 30. Constant temperature protection layer; 40. Heating unit; 50. Thermocouple fixing seat; 60. Protective cover; 70. Power terminal block; 80. Mounting pad; 90. Handle. DETAILED DESCRIPTION

[0026] In order to make the technical problems, technical solutions and beneficial effects to be solved by this application more clearly understood, this application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain this application and are not intended to limit this application.

[0027] It should be noted that when an element is referred to as being “fixed on” or “disposed on” another element, it may be directly on the other element or indirectly on the other element. When an element is referred to as being “connected to” another element, it may be directly connected to the other element or indirectly connected to the other element.

[0028] It should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0029] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. Throughout the description of this application, "plurality" means two or more, unless otherwise specifically defined.

[0030] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention is further described in detail below with reference to the accompanying drawings and embodiments.

[0031] Reference Attachment Figure 1-3 As shown: A thermal field component used in a plasma chemical vapor deposition furnace includes an outer shell 10 and a heating chamber 20. The heating chamber 20 is distributed in an annular manner in the outer shell 10 to form a furnace core, so as to process the product in all aspects. A constant temperature protection layer 30 is also provided between the outer shell 10 and the heating chamber 20, which can effectively transfer the internal temperature to the outer shell 10 to ensure a constant internal temperature. A heating unit 40 is provided on the heating chamber 20 and embedded in the heating chamber 20.

[0032] In this embodiment, a thermocouple fixing seat 50 is provided on the outer shell 10, and the thermocouple fixing seat 50 is installed and fixed on the outer wall of the outer shell 10. A protective cover 60 is also provided on the outer shell 10, and the protective cover 60 is covered above the thermocouple fixing seat 50 to prevent workers from accidentally touching the thermocouple fixing seat 50.

[0033] In actual use, the thermocouple fixing bases 50 and the protective covers 60 are arranged in several groups, and the groups of thermocouple fixing bases 50 and protective covers 60 are arranged at intervals and distributed on the outer shell 10, so that workers can control the temperature of the heating chamber 20 at different positions.

[0034] In this embodiment, a temperature display is further provided on the thermocouple fixing seat 50 , and the temperature display is used to display the real-time temperature of the heating chamber 20 in the vapor deposition furnace and facilitate viewing by the user.

[0035] In this embodiment, a power supply socket 70 is provided on the outer shell 10 , and the power supply socket 70 is electrically connected to the heating unit 40 . One end of the heating unit 40 passes through the outer shell 10 and the heating chamber 20 and is connected to the power supply socket 70 .

[0036] In this embodiment, a plurality of installation slots 21 spaced apart are provided in the heating chamber 20 , and the heating units 40 are embedded and installed in the installation slots 21 . The heating units 40 are heating wires.

[0037] In this embodiment, the constant temperature protection layer 30 is formed in one piece by using fiber cotton material.

[0038] In this embodiment, the heating chamber 20 is also provided with a number of mounting pads 80 for installation and fixation. The several mounting pads 80 are arranged at the inner end of the heating chamber 20 and are fixedly installed in the outer shell 10 by bolts passing through the mounting pads 80, the heating chamber 20 and the constant temperature protection layer 30 in sequence.

[0039] In this embodiment, a handle 90 is further provided on the outer surface of the outer shell 10 , and the handle 90 is distributed on the left and right sides of the outer shell 10 .

[0040] In this embodiment, annular fixing rings are provided at both ends of the outer shell 100 , and are installed and fixed in the outer shell and located at the side ends of the heating chamber 20 .

[0041] The above is merely a preferred embodiment of the present invention and only specifically describes the technical principles of the present invention. These descriptions are intended only to explain the principles of the present invention and should not be construed in any way as limiting the scope of protection of the present invention. Based on the explanations herein, any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention, as well as other specific implementations of the present invention that can be devised by those skilled in the art without inventive effort, shall be included within the scope of protection of the present invention.

Claims

1. A thermal field component used in a plasma chemical vapor deposition furnace, characterized in that: It includes an outer shell and a heating chamber. The heating chamber is annularly distributed in the outer shell to form a furnace. A constant temperature protection layer is provided between the outer shell and the heating chamber. A heating unit is provided on the heating chamber and embedded in the heating chamber.

2. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 1, characterized in that: A thermocouple fixing seat is provided on the outer shell, and the thermocouple fixing seat is installed and fixed on the outer wall of the outer shell.

3. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 2, characterized in that: The outer shell is further provided with a protective cover, which is arranged above the thermocouple fixing seat to prevent workers from accidentally touching the thermocouple fixing seat.

4. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 3, characterized in that: The thermocouple fixing seats and the protective covers are arranged in a plurality of groups, and the plurality of groups of thermocouple fixing seats and the protective covers are arranged at intervals and distributed on the outer shell.

5. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 4, characterized in that: The thermocouple fixing seat is also provided with a temperature display, which is used to display the real-time temperature of the heating chamber in the vapor deposition furnace and is convenient for users to view.

6. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 1, characterized in that: The outer shell is provided with a power connection seat, which is electrically connected to the heating unit. One end of the heating unit passes through the outer shell and the heating chamber and is connected to the power connection seat.

7. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 1, characterized in that: The heating chamber is provided with a plurality of installation grooves arranged at intervals, and the heating units are embedded and installed in the installation grooves, and the heating units are heating wires.

8. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 1, characterized in that: The constant temperature protection layer is formed by integrally processing fiber cotton material.

9. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 1, characterized in that: The heating chamber is also provided with a plurality of mounting pads for installation and fixation. The plurality of mounting pads are arranged at the inner end of the heating chamber and are fixedly installed in the outer shell by bolts passing through the mounting pads, the heating chamber and the constant temperature protection layer in sequence.

10. The thermal field component used in a plasma chemical vapor deposition furnace according to claim 1, characterized in that: The outer surface of the outer shell is further provided with handles, and the handles are distributed on the left and right sides of the outer shell.

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