Laser etching mechanism
Through the design of the laser etching mechanism, the problem of poor etching effect of existing equipment is solved by using high-speed galvanometers and dust removal components, and efficient and stable pole etching and dust removal are achieved to meet the needs of different pole widths.
Patent Information
- Application Number
- CN202422377337.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-27
- Publication Date
- 2025-08-22
- Estimated Expiration
- 2034-09-27
AI Technical Summary
The existing pole etching equipment has poor etching effect, inconcentrated dust collection, and prone to deviation in the pole etching position, resulting in unsatisfactory etching effect, especially in lithium-ion power batteries that affect the wetting and distribution of the electrolyte.
The laser etching mechanism is adopted, including a laser assembly, an etching bracket, an etching support roller structure and a dust removal assembly. The high-speed galvanometer and a width and focal length adjustment structure are used to improve the etching efficiency, and the dust removal assembly is combined with the dust removal assembly to absorb dust to ensure etching accuracy and stability.
It has achieved high-efficiency etching efficiency ≥25m/min, high production efficiency, good stability, strong dust removal ability, adapt to the etching requirements of different pole widths, and significant dust adsorption effect.
Smart Images
Figure CN223250786U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of lithium battery production, in particular to a laser etching mechanism. Background Art
[0002] Lithium-ion batteries have garnered widespread attention due to their high energy density, long lifespan, lightweight, and environmentally friendly advantages. They are widely used in a variety of products, including mobile phones, laptops, digital cameras, electric vehicles, power tools, and new energy vehicles. The initial injection process for lithium-ion batteries involved manual injection in a glove box or dry box, resulting in extremely slow injection and absorption rates. With technological advancements, vacuum injection machines and vacuum and positive pressure cycle injection machines for lithium-ion batteries have emerged. These methods can significantly improve the injection efficiency and production capacity of small-capacity batteries, such as mobile phone and laptop batteries.
[0003] However, with the development of modern society and the energy crisis and environmental protection issues facing humanity, people have begun to apply lithium-ion batteries to the automotive industry, using lithium-ion power batteries to provide driving force for automobiles, achieving zero emissions and zero pollution. The application of lithium-ion power batteries in the automotive industry has led to higher requirements for battery capacity and capacity consistency. Therefore, the low injection efficiency and absorption rate have once again become a major production bottleneck in the lithium-ion power battery manufacturing industry, especially for lithium-ion power batteries with nano-lithium iron phosphate as the positive electrode system. Due to the dense and smooth surface of the positive electrode sheet, the infiltration and absorption of the electrolyte are very slow, which greatly affects the production efficiency and the distribution of the electrolyte within the battery. The uneven distribution of the electrolyte within the battery electrode has a significant impact on the battery capacity and its capacity consistency.
[0004] In order to solve the above technical problems, etching can be performed on the positive electrode sheet to form etching grooves on both end surfaces of the sheet, thereby improving the wettability of the positive electrode sheet surface to the electrolyte and improving the electrolyte penetration efficiency of the lithium battery. However, the existing sheet etching equipment has poor etching effect, unconcentrated dust collection, and the sheet position is prone to deviation during etching, resulting in unsatisfactory etching effect. Utility Model Content
[0005] The main purpose of the utility model is to provide a laser etching mechanism to solve the above technical problems, with high etching efficiency, a high-speed galvanometer, an etching efficiency ≥ 25m / min, high production efficiency and good stability.
[0006] In order to achieve the above purpose, the present invention adopts the following technical solutions:
[0007] A laser etching mechanism includes a laser assembly, an etching bracket, an etching support roller structure and a dust removal assembly. The etching support roller structure is installed on the etching bracket. The laser assembly and the dust removal assembly are respectively aligned with the etching support roller structure. The laser assembly etches the electrode located on the etching support roller structure, and the dust removal assembly absorbs dust generated by etching.
[0008] As a preferred technical solution, the etching support roller structure includes a large roller, which is rotatably installed on the etching bracket. The rotation of the large roller drives the pole piece, and the laser assembly etches the pole piece located on the large roller.
[0009] As a preferred technical solution, the etching support roller structure includes two small rollers, which are rotatably installed on the etching bracket. The rotation of the two small rollers drives the pole piece to transmit, and the laser assembly etches the pole piece located in the gap between the two small rollers.
[0010] As a preferred technical solution, the laser assembly includes a laser, a galvanometer structure and a field lens. The field lens is fixed on the galvanometer structure. The laser emits a light beam to the galvanometer structure. The galvanometer structure is periodically offset to form an offset light beam. The offset light beam etches the surface of the pole piece after passing through the field lens.
[0011] As a preferred technical solution, the galvanometer structure includes a galvanometer, a focal length adjustment structure and a width adjustment structure. The field mirror is fixed on the galvanometer. The width adjustment structure drives the focal length adjustment structure to move, and the focal length adjustment structure drives the galvanometer to move.
[0012] As a preferred technical solution, the dust removal assembly includes a dust removal bracket, a dust removal drive cylinder, a dust removal guide rail and a dust collector. The dust removal drive cylinder and the dust removal guide rail are installed on the dust removal bracket. The dust removal drive cylinder drives the dust collector to move along the dust removal guide rail. The dust collector generates negative pressure to adsorb impurities generated by etching.
[0013] The beneficial effects of the present invention are: the above-mentioned laser etching mechanism, the galvanometer adopts a high-speed galvanometer, the etching efficiency is high, the etching efficiency is ≥25m / min, the production efficiency is high, the stability is good, and the width adjustment structure adjusts the etching width of the laser, and the focal length adjustment structure adjusts the focal length of the laser etching to meet the etching requirements of different pole piece widths, and the dust removal component absorbs the dust generated by etching. BRIEF DESCRIPTION OF THE DRAWINGS
[0014] Figure 1 This is a schematic structural diagram of a laser etching machine according to Example 1 of the present invention;
[0015] Figure 2 This is a schematic diagram of a pole piece etched using an edge blanking process according to Example 1 of the present invention;
[0016] Figure 3 This is a schematic structural diagram of the laser etching mechanism according to Example 1 of the present invention;
[0017] Figure 4 This is a working schematic diagram of the laser etching mechanism according to Example 1 of the present invention;
[0018] Figure 5 A side view of a first ultrasonic dust removal mechanism according to Example 1 of the present invention;
[0019] Figure 6 This is a schematic structural diagram of a first ultrasonic dust removal mechanism according to Example 1 of the present invention;
[0020] Figure 7 A side view of the 3D detection mechanism according to Example 1 of the present invention;
[0021] Figure 8 This is a structural diagram of a 3D detection mechanism according to Example 1 of the present invention;
[0022] Figure 9 A schematic diagram of a pole piece etched using a through-etching process according to Example 2 of the present invention;
[0023] Figure 10 A side view of the laser etching mechanism according to Example 2 of the present invention;
[0024] Figure 11 This is a schematic diagram of the operation of the laser etching mechanism according to Example 2 of the present invention. DETAILED DESCRIPTION
[0025] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.
[0026] [Example 1]
[0027] like Figure 1 and Figure 2As shown, a laser etching machine includes an unwinding device 1, an etching device 2, a dust removal device 3, a 3D detection device 4, a CCD detection device 5, a bad labeling device 6 and a winding device 7. In this embodiment, the etching device 2 adopts an edge blanking process, the unwinding device 1 unwinds the electrode and removes dust and impurities from the surface of the electrode, the etching device 2 etches the surface of the electrode to form etching grooves on both end faces of the electrode, and the etching grooves do not extend to the edge of the electrode, that is, the edge of the electrode is left blank, the dust removal device 3 removes residues on the electrode, the 3D detection device 4 detects the depth and width of the etching grooves, the CCD detection device 5 detects the appearance of the electrode and etching pinholes, the bad labeling device 6 labels the bad electrode detected by the 3D detection device and the CCD detection device, and the winding device 7 removes dust and impurities from the surface of the electrode and then rewinds it.
[0028] The unwinding device 1 includes a pole piece unwinding mechanism 11, a first splicing platform mechanism 12, a first brush dust removal mechanism 13, a first iron removal mechanism 14 and a first tension mechanism 15. The pole piece unwinding mechanism 11 corrects the pole piece after unwinding, the first splicing platform mechanism 12 splices the pole piece after the reel is changed, the first brush dust removal mechanism 13 removes dust from the two end surfaces of the pole piece, two first iron removal mechanisms 14 are provided, and the two first iron removal mechanisms 14 remove iron impurities from the two end surfaces of the pole piece respectively. The first tension mechanism 15 performs tension detection and tension control. The first tension mechanism 15 includes a first tension detector 151 and a first tension regulator 152. The first tension detector 151 detects the tension of the pole piece, and the first tension regulator 152 adjusts the tension of the pole piece.
[0029] Please combine Figure 3 and Figure 4 As shown, the etching device 2 includes a correction mechanism 21, two laser etching mechanisms 22 and a second splicing platform mechanism 23. The correction mechanism 21 corrects the pole piece, and the two laser etching mechanisms 22 etches the two end faces of the pole piece respectively to form etched line grooves in an orderly manner on the two end faces of the pole piece. The second splicing platform mechanism 23 splices the pole piece if it is broken.
[0030] The laser etching mechanism 22 includes a laser assembly 221, an etching bracket 224, an etching support roller structure 222 and a dust removal assembly 223. The etching support roller structure 222 is installed on the etching bracket 224. The laser assembly 221 and the dust removal assembly 223 are respectively aligned with the etching support roller structure 222. The laser assembly 221 etches the electrode located on the etching support roller structure 222. The dust removal assembly 223 absorbs the dust generated by etching. In this embodiment, the etching support roller structure 222 is a large roller, which is rotatably installed on the etching bracket 224. The rotation of the large roller drives the electrode to transmit, and the laser assembly 221 etches the electrode located on the large roller.
[0031] The laser assembly 221 includes a laser 2211, a galvanometer structure 2212 and a field lens 2213. The laser 2211 emits a light beam to the galvanometer structure 2212. The galvanometer structure 2212 is periodically offset to form an offset light beam. The offset light beam etches the surface of the pole piece after passing through the field lens 2213. The galvanometer structure 2212 includes a galvanometer 2214, a focal length adjustment structure 2215 and a width adjustment structure 2216. The width adjustment structure 2216 drives the focal length adjustment structure 2215 to move, thereby adjusting the etching width of the laser 2211. The focal length adjustment structure 2215 drives the galvanometer 2214 to move, thereby adjusting the focal length of the laser etching. In this embodiment, the focal length adjustment structure 2215 and the width adjustment structure 2216 are motor-driven screw movable modules. The galvanometer 2214 adopts a high-speed galvanometer with an etching efficiency of ≥25m / min, high production efficiency and good stability.
[0032] The dust removal assembly 223 includes a dust removal bracket 2234, a dust removal drive cylinder 2231, a dust removal guide rail 2233 and a dust collector 2232. The dust removal drive cylinder 2231 and the dust removal guide rail 2233 are installed on the dust removal bracket 2234. The dust removal drive cylinder 2231 drives the dust collector 2232 to move along the dust removal guide rail 2233. The dust collector 2232 generates negative pressure to adsorb impurities generated by etching.
[0033] The dust removal device 3 includes a first ultrasonic dust removal mechanism 31, a second ultrasonic dust removal mechanism 32, a first traction mechanism 33 and a third ultrasonic dust removal mechanism 34. There are two of the first ultrasonic dust removal mechanism 31, the second ultrasonic dust removal mechanism 32 and the third ultrasonic dust removal mechanism 34 respectively. The first ultrasonic dust removal mechanism 31 and the second ultrasonic dust removal mechanism 32 perform ultrasonic dust removal on the two end surfaces of the pole piece respectively, the first traction mechanism 33 pulls the pole piece to move and rolls the pole piece, and the third ultrasonic dust removal mechanism 34 performs ultrasonic dust removal on the pole piece again. A total of eight ultrasonic dust removal mechanisms are used for dust removal, and the foreign matter removal ability is strong. The dust removal ability for foreign matter with a particle size of 3μm-5μm and above is greater than 99.5%, and the dust removal ability for foreign matter with a particle size of 0.5μm-3μm is greater than 98%.
[0034] Please combine Figure 5 and Figure 6As shown, the structures of the first ultrasonic dust removal mechanism 31, the second ultrasonic dust removal mechanism 32 and the third ultrasonic dust removal mechanism 34 are the same. In this embodiment, in order to avoid redundancy, the first ultrasonic dust removal mechanism 31 is taken as an example for explanation. The first ultrasonic dust removal mechanism 31 includes a dust removal bracket 311, a dust removal driving cylinder 312, a dust removal mounting seat 313, a dust removal guide rail 314, a dust removal slider 315 and a dust collector 316. The dust collector 316 is fixed on one end surface of the dust removal mounting seat 313, and the dust removal guide rail 314 is fixed on the other end surface of the dust removal mounting seat 313. The dust removal slider 315 and the dust removal driving cylinder 312 are fixed on the dust removal bracket 311. The dust removal slider 315 moves along the dust removal guide rail 314, and the dust removal driving cylinder 312 drives the dust removal mounting seat 313 to move relative to the dust removal slider 315 to drive the dust collector 316 to approach the electrode, thereby performing ultrasonic dust removal on the electrode.
[0035] The 3D detection device 4 includes a first cache mechanism 41, a 3D detection mechanism 42, a second traction mechanism 43 and a second cache mechanism 44. The first cache mechanism 41 caches the electrode before detection, the 3D detection mechanism 42 performs random inspections on the depth and width of the etched groove, the second traction mechanism 43 pulls the electrode to move, and the second cache mechanism 44 caches the electrode after detection.
[0036] Please combine Figure 7 and Figure 8 As shown, the 3D detection mechanism 42 includes a detection drive structure 421, a line spectrum 3D sensor 422 and a fine-tuning structure 423. The fine-tuning structure 423 is installed on one side of the detection drive structure 421. The detection drive structure 421 drives the line spectrum 3D sensor 422 to move back and forth, and the line spectrum 3D sensor 422 detects the electrode. In this embodiment, the detection drive structure 421 is a motor-driven screw movable module. The fine-tuning structure 423 can adjust the line spectrum 3D sensor 422 to detect its actual position. During detection, the electrode stops at the detection position, and the detection drive structure 421 drives the line spectrum 3D sensor 422 to move back and forth along the width direction. The line spectrum 3D sensor 422 detects the electrode to detect the depth and width of the etched groove, and feeds back defective products to the defective labeling device 6.
[0037] The CCD detection device 5 includes a second brush dust removal mechanism 51, a third traction mechanism 52 and a CCD detection mechanism 53. The second brush dust removal mechanism 51 removes dust from the two end surfaces of the electrode, the third traction mechanism 52 pulls the electrode to move, and the CCD detection mechanism 53 detects the appearance and etching pinholes of the electrode, and feeds back defective products to the defective labeling device 6.
[0038] The defective labeling device 6 includes a third cache mechanism 61, a defective labeling mechanism 62 and a fourth traction mechanism 63. The third cache mechanism 61 caches the electrode before labeling. The defective labeling mechanism 62 statically labels the electrode that is detected as defective by the 3D detection device 4 and the CCD detection device 5. The fourth traction mechanism 63 pulls the electrode to move.
[0039] The winding device 7 includes a second tension mechanism 71, a second iron removal mechanism 72, a fourth ultrasonic mechanism 73 and a pole piece winding mechanism 74. The second tension mechanism 71 performs tension detection and tension control. There are two second iron removal mechanisms 72 and two fourth ultrasonic mechanisms 73 respectively. The two second iron removal mechanisms 72 remove iron impurities from the two end surfaces of the pole piece. The two fourth ultrasonic mechanisms 73 perform ultrasonic dust removal on the two end surfaces of the pole piece before winding. The pole piece winding mechanism 74 winds up the pole piece after dust removal.
[0040] [Example 2]
[0041] like Figure 1 and Figure 9 As shown, a laser etching machine includes an unwinding device 1, an etching device 2, a dust removal device 3, a 3D detection device 4, a CCD detection device 5, a bad labeling device 6 and a winding device 7. In this embodiment, the etching device 2 adopts a through etching process, the unwinding device 1 unwinds the electrode and removes dust and impurities from the surface of the electrode, the etching device 2 etches the surface of the electrode to form etching grooves on both end faces of the electrode, and the etching grooves cross the width of the electrode, that is, there is no white space at the edge of the electrode, the dust removal device 3 removes residues on the electrode, the 3D detection device 4 detects the depth and width of the etching grooves, the CCD detection device 5 detects the appearance of the electrode and etching pinholes, the bad labeling device 6 labels the bad electrode detected by the 3D detection device and the CCD detection device, and the winding device 7 removes dust and impurities from the surface of the electrode and then rewinds it.
[0042] The unwinding device 1 includes a pole piece unwinding mechanism 11, a first splicing platform mechanism 12, a first brush dust removal mechanism 13, a first iron removal mechanism 14 and a first tension mechanism 15. The pole piece unwinding mechanism 11 corrects the pole piece after unwinding, the first splicing platform mechanism 12 splices the pole piece after the reel is changed, the first brush dust removal mechanism 13 removes dust from the two end surfaces of the pole piece, two first iron removal mechanisms 14 are provided, and the two first iron removal mechanisms 14 remove iron impurities from the two end surfaces of the pole piece respectively. The first tension mechanism 15 performs tension detection and tension control. The first tension mechanism 15 includes a first tension detector 151 and a first tension regulator 152. The first tension detector 151 detects the tension of the pole piece, and the first tension regulator 152 adjusts the tension of the pole piece.
[0043] Please combine Figure 10and Figure 11 As shown, the etching device 2 includes a correction mechanism 21, two laser etching mechanisms 22 and a second splicing platform mechanism 23. The correction mechanism 21 corrects the pole piece, and the two laser etching mechanisms 22 etches the two end faces of the pole piece respectively to form etched line grooves in an orderly manner on the two end faces of the pole piece. The second splicing platform mechanism 23 splices the pole piece if it is broken.
[0044] The laser etching mechanism 22 includes a laser assembly 221, an etching bracket 224, an etching support roller structure 222 and a dust removal assembly 223. The etching support roller structure 222 is installed on the etching bracket 224, and the pole piece is transmitted between the two etching support roller structures 222. The laser assembly 221 and the dust removal assembly 223 are aligned with the etching support roller structure 222 respectively. The laser assembly 221 etches the pole piece located on the etching support roller structure 222, and the dust removal assembly 223 absorbs the dust generated by etching. In this embodiment, the etching support roller structure 222 includes two small rollers, which are rotatably installed on the etching bracket 224. The rotation of the two small rollers drives the pole piece to transmit. The laser assembly 221 etches the pole piece located in the gap between the two small rollers, and the etching point position is suspended to prevent the laser assembly 221 from damaging the etching support roller structure 222.
[0045] The laser assembly 221 includes a laser 2211, a galvanometer structure 2212 and a field lens 2213. The laser 2211 emits a light beam to the galvanometer structure 2212. The galvanometer structure 2212 is periodically offset to form an offset light beam. The offset light beam etches the surface of the pole piece after passing through the field lens 2213. The galvanometer structure 2212 includes a galvanometer 2214, a focal length adjustment structure 2215 and a width adjustment structure 2216. The width adjustment structure 2216 drives the focal length adjustment structure 2215 to move, thereby adjusting the etching width of the laser 2211. The focal length adjustment structure 2215 drives the galvanometer 2214 to move, thereby adjusting the focal length of the laser etching. In this embodiment, the focal length adjustment structure 2215 and the width adjustment structure 2216 are motor-driven screw movable modules.
[0046] The dust removal assembly 223 includes a dust removal bracket 2234, a dust removal drive cylinder 2231, a dust removal guide rail 2233 and a dust collector 2232. The dust removal drive cylinder 2231 and the dust removal guide rail 2233 are installed on the dust removal bracket 2234. The dust removal drive cylinder 2231 drives the dust collector 2232 to move along the dust removal guide rail 2233. The dust collector 2232 generates negative pressure to adsorb impurities generated by etching.
[0047] The dust removal device 3 includes a first ultrasonic dust removal mechanism 31, a second ultrasonic dust removal mechanism 32, a first traction mechanism 33 and a third ultrasonic dust removal mechanism 34. There are two of the first ultrasonic dust removal mechanism 31, the second ultrasonic dust removal mechanism 32 and the third ultrasonic dust removal mechanism 34 respectively. The first ultrasonic dust removal mechanism 31 and the second ultrasonic dust removal mechanism 32 perform ultrasonic dust removal on the two end surfaces of the electrode respectively, the first traction mechanism 33 pulls the electrode to move and rolls the electrode, and the third ultrasonic dust removal mechanism 34 performs ultrasonic dust removal on the electrode again.
[0048] Please combine Figure 5 and Figure 6 As shown, the structures of the first ultrasonic dust removal mechanism 31, the second ultrasonic dust removal mechanism 32 and the third ultrasonic dust removal mechanism 34 are the same. In this embodiment, in order to avoid redundancy, the first ultrasonic dust removal mechanism 31 is taken as an example for explanation. The first ultrasonic dust removal mechanism 31 includes a dust removal bracket 311, a dust removal driving cylinder 312, a dust removal mounting seat 313, a dust removal guide rail 314, a dust removal slider 315 and a dust collector 316. The dust collector 316 is fixed on one end surface of the dust removal mounting seat 313, and the dust removal guide rail 314 is fixed on the other end surface of the dust removal mounting seat 313. The dust removal slider 315 and the dust removal driving cylinder 312 are fixed on the dust removal bracket 311. The dust removal slider 315 moves along the dust removal guide rail 314, and the dust removal driving cylinder 312 drives the dust removal mounting seat 313 to move relative to the dust removal slider 315 to drive the dust collector 316 to approach the electrode, thereby performing ultrasonic dust removal on the electrode.
[0049] The 3D detection device 4 includes a first cache mechanism 41, a 3D detection mechanism 42, a second traction mechanism 43 and a second cache mechanism 44. The first cache mechanism 41 caches the electrode before detection, the 3D detection mechanism 42 performs random inspections on the depth and width of the etched groove, the second traction mechanism 43 pulls the electrode to move, and the second cache mechanism 44 caches the electrode after detection.
[0050] Please combine Figure 7 and Figure 8As shown, the 3D detection mechanism 42 includes a detection drive structure 421, a line spectrum 3D sensor 422 and a fine-tuning structure 423. The fine-tuning structure 423 is installed on one side of the detection drive structure 421. The detection drive structure 421 drives the line spectrum 3D sensor 422 to move back and forth, and the line spectrum 3D sensor 422 detects the electrode. In this embodiment, the detection drive structure 421 is a motor-driven screw movable module. The fine-tuning structure 423 can adjust the line spectrum 3D sensor 422 to detect its actual position. During detection, the electrode stops at the detection position, and the detection drive structure 421 drives the line spectrum 3D sensor 422 to move back and forth along the width direction. The line spectrum 3D sensor 422 detects the electrode to detect the depth and width of the etched groove, and feeds back defective products to the defective labeling device 6.
[0051] The CCD detection device 5 includes a second brush dust removal mechanism 51, a third traction mechanism 52 and a CCD detection mechanism 53. The second brush dust removal mechanism 51 removes dust from the two end surfaces of the electrode, the third traction mechanism 52 pulls the electrode to move, and the CCD detection mechanism 53 detects the appearance and etching pinholes of the electrode, and feeds back defective products to the defective labeling device 6.
[0052] The defective labeling device 6 includes a third cache mechanism 61, a defective labeling mechanism 62 and a fourth traction mechanism 63. The third cache mechanism 61 caches the electrode before labeling. The defective labeling mechanism 62 statically labels the electrode that is detected as defective by the 3D detection device 4 and the CCD detection device 5. The fourth traction mechanism 63 pulls the electrode to move.
[0053] The winding device 7 includes a second tension mechanism 71, a second iron removal mechanism 72, a fourth ultrasonic mechanism 73 and a pole piece winding mechanism 74. The second tension mechanism 71 performs tension detection and tension control. There are two second iron removal mechanisms 72 and two fourth ultrasonic mechanisms 73 respectively. The two second iron removal mechanisms 72 remove iron impurities from the two end surfaces of the pole piece. The two fourth ultrasonic mechanisms 73 perform ultrasonic dust removal on the two end surfaces of the pole piece before winding. The pole piece winding mechanism 74 winds up the pole piece after dust removal.
[0054] The embodiments described above are only preferred examples of the present invention and are not intended to limit the scope of implementation of the present invention. Therefore, any equivalent changes or modifications made according to the structures, features and principles described in the scope of the patent application of the present invention should be included in the scope of the patent application of the present invention.
Claims
1. A laser etching mechanism, characterized in that: It includes a laser assembly, an etching bracket, an etching support roller structure and a dust removal assembly. The etching support roller structure is installed on the etching bracket. The laser assembly and the dust removal assembly are respectively aligned with the etching support roller structure. The laser assembly etches the pole piece located on the etching support roller structure, and the dust removal assembly absorbs the dust generated by etching.
2. The laser etching mechanism according to claim 1, characterized in that: The etching support roller structure includes a large roller, which is rotatably mounted on the etching bracket. The rotation of the large roller drives the pole piece to be transmitted, and the laser assembly etches the pole piece located on the large roller.
3. The laser etching mechanism according to claim 1, characterized in that: The etching support roller structure includes two small rollers, which are rotatably mounted on the etching bracket. The rotation of the two small rollers drives the pole piece to transmit, and the laser assembly etches the pole piece located in the gap between the two small rollers.
4. The laser etching mechanism according to claim 2 or 3, characterized in that: The laser assembly includes a laser, a galvanometer structure and a field mirror. The field mirror is fixed on the galvanometer structure. The laser emits a light beam to the galvanometer structure. The galvanometer structure is periodically offset to form an offset light beam. The offset light beam etches the surface of the pole piece after passing through the field mirror.
5. The laser etching mechanism according to claim 4, characterized in that: The galvanometer structure includes a galvanometer, a focus adjustment structure and a width adjustment structure. The field mirror is fixed on the galvanometer. The width adjustment structure drives the focus adjustment structure to move, and the focus adjustment structure drives the galvanometer to move.
6. The laser etching mechanism according to claim 5, characterized in that: The dust removal assembly includes a dust removal bracket, a dust removal drive cylinder, a dust removal guide rail and a dust collector. The dust removal drive cylinder and the dust removal guide rail are installed on the dust removal bracket. The dust removal drive cylinder drives the dust collector to move along the dust removal guide rail. The dust collector generates negative pressure to adsorb impurities generated by etching.