Furnace tube gas flow rate control device for solar silicon oxide processing

Abstract

The utility model discloses a furnace tube gas flow rate control device for solar silicon oxide processing, which comprises a furnace tube body and a delivery pipe, one side of the furnace tube body is fixedly communicated with an oxygen supply pipe, and one side of the furnace tube body is fixedly communicated with a reaction gas supply pipe above the oxygen supply pipe. And the opposite sides of the reaction gas supply pipe and the conveying pipe control the gas flow rate through a flow rate adjusting mechanism. The oxygen supply pipe can provide enough oxygen for the furnace tube body to carry out silicon oxide reaction, the reaction gas supply pipe can convey reaction gas into the furnace tube body, and the flow speed can be adjusted through the flow speed adjusting mechanism when the reaction gas is conveyed. In the adjusting process, the power mechanism is arranged to enable the adjusting mechanism to rotate along one side of the gas supply mechanism, and then the gas conveying area of the gas supply mechanism can be quickly adjusted by utilizing the adjusting mechanism, so that the flow speed of the reaction gas can be quickly adjusted.

Description

Technical Field

[0001] The utility model relates to the technical field of solar silicon oxide processing, in particular to a furnace tube gas flow rate control device for solar silicon oxide processing. Background Art

[0002] The production of solar-grade polysilicon or monocrystalline silicon requires the use of various types of furnaces and equipment. In this process, "furnace tubes" refer to special pipes or containers used in high-temperature processing steps. They are usually made of high-temperature resistant materials such as quartz, ceramic, or other materials that can withstand extremely high temperatures.

[0003] During the processing of silicon oxide, sufficient oxygen and corresponding amounts of other reaction gases need to be added into it. According to the different reactions in the silicon oxide processing process, the flow rate of the added reaction gas needs to be controlled. However, the existing equipment has a slow flow rate change control speed during the flow rate control process, which may make the silicon oxide reaction process inconvenient to control. For this reason, we propose a furnace tube gas flow rate control device for solar silicon oxide processing. Utility Model Content

[0004] The purpose of the utility model is to provide a furnace tube gas flow rate control device for solar silicon oxide processing to solve the problems raised in the background technology.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a furnace tube gas flow rate control device for solar silicon oxide processing, comprising a furnace tube body and a delivery tube, wherein one side of the furnace tube body is fixedly connected to an oxygen supply tube, and one side of the furnace tube body, located above the oxygen supply tube, is fixedly connected to a reaction gas supply tube, wherein the gas flow rate is controlled by a flow rate regulating mechanism on opposite sides of the reaction gas supply tube and the delivery tube;

[0006] The flow rate regulating mechanism includes a regulating tube, an air supply mechanism, a power mechanism and a regulating mechanism. The air supply mechanism is fixedly installed inside the regulating tube. One side of the air supply mechanism is rotatably connected to a regulating mechanism for adjusting the flow rate of gas delivered by the air supply mechanism. The regulating tube is provided with a power mechanism for driving the regulating mechanism to rotate and adjust.

[0007] Furthermore, the air supply mechanism includes an air plate, a first air hole and a fixed sleeve. The air plate is fixedly installed inside the regulating tube. Multiple groups of first air holes are opened on the air plate. A side tube fixed sleeve of the air plate is rotatably connected to the regulating mechanism.

[0008] Furthermore, the adjustment mechanism includes a fixed shaft, a sealing plate, a second air hole and a driven gear ring. The fixed sleeve is rotatably connected to the inside thereof. One end of the fixed shaft is fixedly connected to a sealing plate that is in contact with the air plate. Multiple groups of second air holes are provided on the sealing plate at positions corresponding to the first air holes. A driven gear ring is fixedly mounted on the outer surface of the sealing plate.

[0009] Furthermore, the power mechanism includes a limiting sleeve, a rotating rod, a driving gear and a mounting seat. The limiting sleeve is fixedly installed on the top of the inner wall of the adjusting tube. The internal rotation of the limiting sleeve is connected to the rotating rod. The bottom of the rotating rod is fixedly connected to the driving gear engaged with the driven gear ring. The top of the adjusting tube is fixedly installed with a mounting seat. The driving motor is fixedly installed on the mounting seat. The output end of the driving motor is fixedly connected to the rotating rod.

[0010] Furthermore, a plurality of support frames are fixedly mounted on one side of the sealing plate, and the support frames are rotatably connected to limit rollers that contact the inner wall of the regulating tube.

[0011] Furthermore, both sides of the inner wall of the regulating tube are provided with internal threads, and both sides of the regulating tube are threadedly connected to the reaction gas supply pipe and the delivery pipe through the internal threads.

[0012] Compared with the prior art, the present invention has the following beneficial effects: the oxygen supply pipe provided in the present invention can provide the furnace tube body with sufficient oxygen for the silicon oxide reaction, and the reaction gas supply pipe provided can transport the reaction gas to the interior of the furnace tube body. When the reaction gas is transported, the flow rate can be adjusted by the flow rate regulating mechanism. During the adjustment process, the setting of the power mechanism can make the regulating mechanism rotate along one side of the air supply mechanism, and then the regulating mechanism can be used to quickly adjust the gas delivery area of ​​the air supply mechanism, so that the reaction gas flow rate can be quickly adjusted. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 This is a schematic diagram of the three-dimensional structure of the utility model;

[0014] Figure 2 This is a schematic diagram of the three-dimensional structure of the flow rate regulating mechanism of the utility model;

[0015] Figure 3 This is a schematic diagram of the connection structure of the first stereoscopic diagram of the adjustment mechanism and the air supply mechanism of the utility model;

[0016] Figure 4 This is a schematic diagram of the connection structure of the second stereoscopic view of the adjustment mechanism and the air supply mechanism of the utility model.

[0017] In the figure: 1 furnace tube body, 2 oxygen supply pipe, 3 reaction gas supply pipe, 4 flow rate regulating mechanism, 5 delivery pipe, 6 regulating pipe, 7 internal thread, 8 air supply mechanism, 9 power mechanism, 10 regulating mechanism, 11 first air hole, 12 fixed sleeve, 13 fixed shaft, 14 sealing plate, 15 second air hole, 16 driven gear ring, 17 limiting sleeve, 18 rotating rod, 19 driving gear, 20 mounting seat, 21 driving motor, 22 support frame, 23 limiting roller, 24 air plate. DETAILED DESCRIPTION

[0018] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0019] See also Figures 1-4 The utility model provides a technical solution: a furnace tube gas flow rate control device for solar silicon oxide processing, comprising a furnace tube body 1 and a delivery tube 5, one side of the furnace tube body 1 is fixedly connected to an oxygen supply tube 2, one side of the furnace tube body 1 and above the oxygen supply tube 2 is fixedly connected to a reaction gas supply tube 3, the gas flow rate is controlled by a flow rate regulating mechanism 4 on the opposite sides of the reaction gas supply tube 3 and the delivery tube 5; the flow rate regulating mechanism 4 comprises a regulating tube 6, an air supply mechanism 8, a power mechanism 9 and a regulating mechanism 10, the air supply mechanism 8 is fixedly installed inside the regulating tube 6, one side of the air supply mechanism 8 is rotatably connected to an regulating mechanism 10 for adjusting the flow rate of gas delivered by the air supply mechanism 8, and the regulating tube 6 is provided with a power mechanism 9 for driving the regulating mechanism 10 to rotate and adjust.

[0020] Among them, the oxygen supply pipe 2 is provided to provide the furnace tube body 1 with sufficient oxygen for the silicon oxide reaction, and the reaction gas supply pipe 3 is provided to transport the reaction gas to the interior of the furnace tube body 1. When the reaction gas is transported, the flow rate can be adjusted by the flow rate regulating mechanism 4. During the adjustment process, the power mechanism 9 is set to make the regulating mechanism 10 rotate along one side of the gas supply mechanism 8, and then the regulating mechanism 10 can be used to quickly adjust the gas delivery area of ​​the gas supply mechanism 8, so that the reaction gas flow rate can be quickly adjusted.

[0021] See also Figure 1 、 Figure 2 and Figure 3The air supply mechanism 8 includes an air plate 24, a first air hole 11 and a fixed sleeve 12. The air plate 24 is fixedly installed inside the regulating tube 6. Multiple groups of first air holes 11 are opened on the air plate 24. A side tube fixed sleeve 12 of the air plate 24 is rotatably connected to the regulating mechanism 10.

[0022] The external reaction gas is transported to the inside of the regulating tube 6 through the transport pipe 5 , and then the gas is transported through the first gas holes 11 provided on the gas plate 24 , thereby achieving normal transport of the reaction gas.

[0023] See also Figure 1 、 Figure 2 、 Figure 3 and Figure 4 The adjusting mechanism 10 includes a fixed shaft 13, a sealing plate 14, a second air hole 15 and a driven gear ring 16. The fixed sleeve 12 is rotatably connected to the fixed shaft 13, and one end of the fixed shaft 13 is fixedly connected to the sealing plate 14 in contact with the air plate 24. A plurality of groups of second air holes 15 are formed on the sealing plate 14 at positions corresponding to the first air holes 11. The outer surface of the sealing plate 14 is fixedly mounted with a driven gear ring 16. The power mechanism 9 includes a limiting sleeve 17, a rotating rod 18, a driving gear 19 and a mounting seat 20. The top of the inner wall of the adjusting tube 6 is fixedly mounted with a limiting sleeve 17, the internal rotation of the limiting sleeve 17 is connected to the rotating rod 18, and the bottom of the rotating rod 18 is fixedly connected to the driving gear 19 meshing with the driven gear ring 16. The top of the adjusting tube 6 is fixedly mounted with a mounting seat 20, and a driving motor 21 is fixedly mounted on the mounting seat 20. The output end of the driving motor 21 is fixedly connected to the rotating rod 18.

[0024] Among them, when it is necessary to adjust the gas flow rate through the first air hole 11, the drive motor 21 is started to operate, and the drive motor 21 drives the rotating rod 18 and the driving gear 19 to rotate along the limiting sleeve 17. Then, the rotating driving gear 19 can push the sealing plate 14 and the fixed shaft 13 to rotate along the fixed sleeve 12. Then, the originally overlapping first air hole 11 and the second air hole 15 can be misaligned, so that the outlet area of ​​the first air hole 11 for exhaust can be adjusted, so that the reaction gas flow rate can be quickly controlled and adjusted.

[0025] See also Figure 4 A plurality of support frames 22 are fixedly mounted on one side of the sealing plate 14 , and a limiting roller 23 in contact with the inner wall of the regulating tube 6 is rotatably connected to the support frame 22 .

[0026] The sealing plate 14 can be supported by the support frame 22 and the limiting roller 23 when the rotation adjustment is performed, so that the sealing plate 14 can be prevented from being offset when the rotation flow rate is adjusted.

[0027] See also Figure 1 and Figure 2 Internal threads 7 are provided on both sides of the inner wall of the regulating tube 6, and both sides of the regulating tube 6 are threadedly connected to the reaction gas supply tube 3 and the delivery tube 5 through the internal threads 7. The regulating tube 6, the reaction gas supply tube 3 and the delivery tube 5 connected by the internal threads 7 are convenient for disassembly of the regulating tube 6, thereby facilitating the inspection and maintenance of the regulating tube 6.

[0028] When in use, first, the oxygen supply pipe 2 provided can provide the furnace tube body 1 with sufficient oxygen for silicon oxide reaction, and the reaction gas supply pipe 3 provided can deliver the reaction gas to the interior of the furnace tube body 1. When the reaction gas is delivered, the flow rate can be adjusted by the flow rate regulating mechanism 4. During the adjustment process, the power mechanism 9 is provided to make the regulating mechanism 10 rotate along one side of the air supply mechanism 8. Then, the regulating mechanism 10 can be used to quickly adjust the gas delivery area of ​​the air supply mechanism 8, so that the reaction gas flow rate can be quickly adjusted. The external reaction gas is delivered to the interior of the regulating tube 6 through the delivery pipe 5, and then the gas passes through the air plate 24. The first air hole 11 opened on the upper surface is used for transportation, so that the normal transportation of the reaction gas can be achieved. When the gas flow rate through the first air hole 11 needs to be adjusted, the drive motor 21 is started to operate, and the drive motor 21 drives the rotating rod 18 and the driving gear 19 to rotate along the limiting sleeve 17. Then the rotating driving gear 19 can push the sealing plate 14 and the fixed shaft 13 to rotate along the fixed sleeve 12, and then the originally overlapping first air hole 11 and the second air hole 15 can be misaligned, so that the outlet area of ​​the first air hole 11 for exhaust can be adjusted, so that the reaction gas flow rate can be quickly controlled and adjusted.

[0029] Although the embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations may be made to these embodiments without departing from the principles and spirit of the present invention, and the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A furnace tube gas flow rate control device for solar silicon oxide processing, comprising a furnace tube body (1) and a delivery pipe (5), wherein one side of the furnace tube body (1) is fixedly connected to an oxygen supply pipe (2), and one side of the furnace tube body (1) and located above the oxygen supply pipe (2) is fixedly connected to a reaction gas supply pipe (3), characterized in that: The gas flow rate is controlled by a flow rate regulating mechanism (4) on opposite sides of the reaction gas supply pipe (3) and the delivery pipe (5); The flow rate regulating mechanism (4) comprises a regulating tube (6), an air supply mechanism (8), a power mechanism (9) and a regulating mechanism (10); the air supply mechanism (8) is fixedly installed inside the regulating tube (6); one side of the air supply mechanism (8) is rotatably connected to the regulating mechanism (10) for adjusting the flow rate of gas delivered by the air supply mechanism (8); and the regulating tube (6) is provided with a power mechanism (9) for driving the regulating mechanism (10) to rotate and adjust.

2. The gas flow rate control device for a furnace tube for processing solar silicon oxide according to claim 1, characterized in that: The air supply mechanism (8) comprises an air passage plate (24), a first air passage hole (11) and a fixed sleeve (12); the air passage plate (24) is fixedly installed inside the regulating tube (6); a plurality of groups of first air passage holes (11) are provided through the air passage plate (24); and a fixed sleeve (12) on one side of the air passage plate (24) is rotatably connected to the regulating mechanism (10).

3. The gas flow rate control device for a furnace tube for processing solar silicon oxide according to claim 2, characterized in that: The regulating mechanism (10) comprises a fixed shaft (13), a sealing plate (14), a second air hole (15) and a driven gear ring (16); the fixed shaft (13) is rotatably connected to the interior of the fixed sleeve (12); one end of the fixed shaft (13) is fixedly connected to a sealing plate (14) that is in contact with the air plate (24); a plurality of groups of second air holes (15) are provided on the sealing plate (14) at positions corresponding to the first air holes (11); and a driven gear ring (16) is fixedly mounted on the outer surface of the sealing plate (14).

4. The gas flow rate control device for a furnace tube for processing solar silicon oxide according to claim 3, characterized in that: The power mechanism (9) comprises a limiting sleeve (17), a rotating rod (18), a driving gear (19) and a mounting seat (20); the limiting sleeve (17) is fixedly mounted on the top of the inner wall of the regulating tube (6); the rotating rod (18) is rotatably connected inside the limiting sleeve (17); the bottom of the rotating rod (18) is fixedly connected to the driving gear (19) meshing with the driven gear ring (16); the mounting seat (20) is fixedly mounted on the top of the regulating tube (6); a driving motor (21) is fixedly mounted on the mounting seat (20); and the output end of the driving motor (21) is fixedly connected to the rotating rod (18).

5. The gas flow rate control device for a furnace tube for solar silicon oxide processing according to claim 4, characterized in that: A plurality of support frames (22) are fixedly mounted on one side of the sealing plate (14), and a limiting roller (23) in contact with the inner wall of the regulating tube (6) is rotatably connected to the support frame (22).

6. The gas flow rate control device for a furnace tube for processing solar silicon oxide according to claim 5, characterized in that: Internal threads (7) are provided on both sides of the inner wall of the regulating tube (6), and the two sides of the regulating tube (6) are threadedly connected to the reaction gas supply tube (3) and the delivery tube (5) through the internal threads (7).

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