Process gas introduction device

Abstract

The utility model relates to the technical field of vacuum coating equipment, and discloses a process gas introducing device which is used for introducing process gas into a vacuum cavity and comprises a gas distributor, a gas inlet pipe and a diaphragm valve, a plurality of gas channels are formed in the gas distributor, a plurality of gas inlets communicated with the gas channels are formed in the side wall of the gas distributor in the circumferential direction, a plurality of gas outlets communicated with the gas channels are formed in one end of the gas distributor, and the gas inlets are connected with the diaphragm valves; one end of the air inlet pipe communicates with the multiple air outlets, and the other end of the air inlet pipe extends into the vacuum cavity. The gas supply device has the beneficial effects that the conveying pipelines of various process gases are integrated, the pipeline structure is simplified, the arrangement and the installation are convenient, the production cost is reduced, residual gases in the pipelines of the gas supply device cannot enter the vacuum cavity when gas supply is cut off, the proportion of the process gases in the vacuum cavity is prevented from changing, and the production efficiency is improved. The reaction efficiency of each technical process is ensured.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum coating equipment, in particular to a process gas introducing device. Background Art

[0002] The sputtering method in vacuum coating technology is based on the principle of introducing a process gas (usually Ar, N2, O2, etc.) into a vacuum chamber, with the substrate as the anode and the target as the cathode. Under the action of a high-voltage electric field, the working gas will be dissociated into ions and electrons, forming plasma. The positive ions in the plasma will accelerate in the high-voltage electric field and bombard the surface of the target material, causing the target atoms or clusters to be splashed and deposited on the surface of the target substrate to form a thin film.

[0003] The process gas introduction device of existing vacuum coating equipment is generally connected to the gas supply device. To facilitate the separate delivery of process gases (such as Ar, N2, O2, etc.) into the vacuum chamber, the existing process gas introduction device has a separate set of pipelines for each process gas. The introduction pipelines for multiple process gases are arranged in an interlaced manner, which is complex and difficult to install. In addition, when the process gas in the vacuum chamber meets the reaction requirements, the gas supply device stops supplying gas, and a large amount of supply gas remains in the gas supply device pipeline and is still connected to the gas introduction device. The residual process gas enters the vacuum chamber through the gas introduction device, causing the process gas ratio in the vacuum chamber to change, affecting the reaction efficiency of each process. Utility Model Content

[0004] The purpose of the utility model is to provide a process gas introduction device, which integrates the delivery pipelines of multiple process gases, simplifies the pipeline structure, facilitates layout and installation, and reduces production costs. At the same time, when the gas supply is cut off, the residual gas in the gas supply equipment pipeline cannot enter the vacuum chamber, avoiding changes in the process gas ratio in the vacuum chamber and ensuring the reaction efficiency of each process.

[0005] In order to achieve the above-mentioned object, the utility model provides a process gas introduction device for introducing process gas into a vacuum chamber, comprising a gas distributor, an air inlet pipe, and a diaphragm valve;

[0006] The gas distributor is fixed to the vacuum chamber, and a plurality of gas channels are provided in the gas distributor. A plurality of gas inlets communicating with the gas channels are circumferentially provided on the sidewall of the gas distributor. A plurality of gas outlets communicating with the gas channels are provided at one end of the gas distributor. The number of the gas inlets corresponds to the number of the gas outlets and the diaphragm valves, and the gas inlets are connected to the diaphragm valves.

[0007] One end of the air inlet pipe is connected to the plurality of air outlets, and the other end of the air inlet pipe extends into the vacuum chamber;

[0008] The process gas is collected from the gas channel through the gas inlet and the gas outlet to the gas inlet pipe, and is introduced into the vacuum chamber.

[0009] Furthermore, a connecting flange is fixedly provided at one end of the gas distributor facing the gas outlet, the connecting flange is fixedly connected to the outer wall of the vacuum chamber, and the air inlet pipe passes through the connecting flange and extends into the vacuum chamber.

[0010] Furthermore, the outer wall of the gas distributor and the outer wall of the connecting flange are both covered with heating jackets.

[0011] Furthermore, a second sealing groove is formed at one end of the connecting flange facing the vacuum chamber, and a sealing ring is provided in the second sealing groove.

[0012] Furthermore, the gas distributor is provided with a flange corresponding to the connecting flange at one end facing the gas outlet, and a first sealing groove is formed at one end of the connecting flange facing the flange, wherein a first sealing ring is provided in the first sealing groove.

[0013] Furthermore, two opposite side walls of the first sealing groove are arranged close to each other and inclined.

[0014] Furthermore, the shape of the gas channel is L-shaped or T-shaped.

[0015] Furthermore, the gas distributor is provided with a limiting groove at one end facing the gas outlet, and the end of the gas inlet pipe is provided with a limiting step corresponding to the limiting groove.

[0016] Compared with the prior art, the process gas introduction device of the present invention has the following advantages: a gas distributor is provided with multiple gas channels, a side wall of the gas distributor is axially provided with multiple air inlets, one end of the gas distributor is provided with multiple air outlets corresponding to the number of air inlets, one end of the air inlet pipe is connected to the multiple air outlets, and the other end of the air inlet pipe extends into the vacuum chamber. The gas distributor integrates the delivery pipelines of multiple process gases, and after the process gases are gathered, they are delivered to the vacuum chamber through the air inlet pipe, which simplifies the delivery pipelines of the process gases, facilitates layout and installation, and reduces production costs. In addition, a diaphragm valve is provided at each air inlet. When the gas supply needs to be cut off, the diaphragm valve is closed, and the air inlet of the gas distributor is isolated from the pipeline of the gas supply equipment. Residual gas in the pipeline of the gas supply equipment cannot enter the vacuum chamber, thereby preventing changes in the ratio of process gases in the vacuum chamber and ensuring the reaction efficiency of each process. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a schematic diagram of the installation of the process gas introduction device according to an embodiment of the present utility model;

[0018] Figure 2 This is a schematic structural diagram of a process gas introduction device according to an embodiment of the present utility model;

[0019] Figure 3 This is a cross-sectional view of a gas distributor of a process gas introduction device according to an embodiment of the present invention;

[0020] Figure 4 This is a structural diagram of a gas distributor of a process gas introduction device according to an embodiment of the present utility model;

[0021] Figure 5 This is a cross-sectional view of a process gas introduction device according to an embodiment of the present invention;

[0022] Figure 6 It is a structural schematic diagram of the connecting flange of the process gas introduction device according to an embodiment of the present utility model.

[0023] In the figure, 1. gas distributor; 11. gas channel; 12. air inlet; 13. air outlet; 14. limiting groove; 15. flange; 2. air inlet pipe; 21. limiting step; 3. diaphragm valve; 4. connecting flange; 41. first sealing groove; 42. first sealing ring; 43. second sealing groove; 44. second sealing ring; a. vacuum chamber. DETAILED DESCRIPTION

[0024] The following embodiments are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0025] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "inside", "outside", etc. used in the present invention to indicate the orientation or position relationship are based on the position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the devices and elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0026] In the description of this utility model, it should be understood that the terms "first," "second," etc. are used to describe various types of information, but such information should not be limited to these terms. These terms are merely used to distinguish information of the same type from one another. For example, "first" information may also be referred to as "second" information, and similarly, "second" information may also be referred to as "first" information without departing from the scope of this utility model.

[0027] like Figures 1 to 6 As shown, a process gas introduction device of a preferred embodiment of the present invention is connected to a gas supply device and is used to introduce process gas (such as Ar, N2, O2, etc.) into a vacuum chamber a, comprising a gas distributor 1, an air inlet pipe 2, and a diaphragm valve 3. The gas distributor 1 is fixed to the vacuum chamber. To facilitate the introduction of a variety of process gases, a plurality of gas channels 11 are provided in the gas distributor 1. A plurality of gas inlets 12 connected to the gas channels 11 are circumferentially provided on the side wall of the gas distributor 1. A plurality of gas outlets 13 connected to the gas channels 11 are provided at one end of the gas distributor 1. The number of gas inlets 12 corresponds to the number of gas outlets 13. That is, one gas inlet 12 corresponds to one gas outlet 13, and is connected to one gas channel 11 for introducing a process gas. The number of gas channels 11, gas inlets 12, and gas outlets 13 can be adjusted according to actual reaction requirements. When the gas supply needs to be cut off, in order to prevent the residual gas in the pipeline of the gas supply equipment from entering the vacuum chamber, a diaphragm valve 3 is connected to each gas inlet 12. The number of gas inlets 12 is the same as the number of diaphragm valves 3. When the gas supply equipment stops supplying gas, the diaphragm valve 3 is closed, and the gas inlet 12 is isolated from the pipeline of the gas supply equipment. The residual gas in the pipeline of the gas supply equipment cannot enter the vacuum chamber through the gas inlet 12, thereby avoiding changes in the proportion of process gases in the vacuum chamber and ensuring the reaction efficiency of each process.

[0028] To facilitate the unified delivery of multiple process gases from gas distributor 1 to vacuum chamber a, one end of an inlet pipe 2 is connected to multiple outlets 13, and the other end of the inlet pipe 2 extends into the vacuum chamber. Process gases flow through inlet 12 from gas channel 11 and converge at outlet 13 into inlet pipe 2, where they are introduced into vacuum chamber a.

[0029] In some embodiments, in order to facilitate the fixing of the gas distributor 1 to the vacuum chamber, refer to Figure 1 、 Figure 5 、 Figure 6The gas distributor 1 is fixed with a connecting flange 4 at one end facing the gas outlet 13. The connecting flange 4 is fixedly connected to the outer wall of the vacuum chamber by screws, and the air inlet pipe 2 passes through the connecting flange 4 and extends into the vacuum chamber. In order to facilitate the installation of the gas distributor 1 and the connecting flange 4 and ensure the sealing effect of the gas distributor 1 and the connecting flange 4, the gas distributor 1 is provided with a flange 15 corresponding to the connecting flange 4 at one end facing the gas outlet 13. The flange 15 and the connecting flange 4 are fixedly connected by screws. A first sealing groove 41 is provided at one end of the connecting flange 4 facing the flange 15, and a first sealing ring 42 is provided in the first sealing groove 41. In order to prevent the first sealing ring 42 from falling out of the first sealing groove 41 and to improve the sealing effect, the two opposite side walls of the first sealing groove 41 are arranged close to each other and tilted, that is, the cross-section of the first sealing groove 41 is similar to an inverted V shape with an open upper end. Similarly, in order to ensure the sealing effect between the connecting flange 4 and the vacuum chamber, a second sealing groove 43 is opened at one end of the connecting flange 4 facing the vacuum chamber, and a second sealing ring 44 is provided in the second sealing groove 43. The structure of the second sealing groove 43 is the same as that of the first sealing groove 41.

[0030] In some embodiments, in order to prevent condensed water from forming in the gas channel 11 when the gas distributor 1 transports the process gas, thereby affecting the delivery of the process gas, a heating coat (not shown in the figure) is provided on the outer wall of the gas distributor 1 and the outer wall of the connecting flange 4. The structure of the heating coat is similar to an electric blanket, which can heat the outer walls of the gas distributor 1 and the connecting flange 4 to evaporate the condensed water.

[0031] In some embodiments, in order to facilitate the processing of the gas channel 11 inside the gas distributor 1, refer to Figure 3 The shape of the gas channel 11 is L-shaped or T-shaped, which can be directly processed by a drilling machine. Figure 4 、 Figure 5 In order to facilitate the positioning of the gas distributor 1 when connected to the intake pipe 2, a limiting groove 14 is provided at one end of the gas distributor 1 facing the gas outlet 13, and a limiting step 21 corresponding to the limiting groove 14 is provided at the end of the intake pipe 2. The gas distributor 1 and the intake pipe 2 are fixedly connected by screws.

[0032] In summary, the embodiment of the present invention provides a process gas introduction device, wherein a plurality of gas channels 11 are provided in a gas distributor 1, a plurality of air inlets 12 are axially provided on the side wall of the gas distributor 1, a plurality of air outlets 13 corresponding to the number of the air inlets 12 are provided at one end of the gas distributor 1, one end of the air inlet pipe 2 is connected to the plurality of air outlets 13, and the other end of the air inlet pipe 2 extends into the vacuum chamber, and the gas distributor 1 integrates the delivery pipelines of multiple process gases, and after the process gases are gathered, they are delivered to the vacuum chamber through the air inlet pipe 2, thereby simplifying the delivery pipelines of the process gases, facilitating arrangement and installation, and reducing production costs. In addition, a diaphragm valve 3 is provided at each air inlet 12. When the gas supply needs to be cut off, the diaphragm valve 3 is closed, and the air inlet 12 of the gas distributor 1 is in a cut-off state from the pipeline of the gas supply equipment. The residual gas in the pipeline of the gas supply equipment cannot enter the vacuum chamber, thereby preventing the proportion of the process gases in the vacuum chamber from changing and ensuring the reaction efficiency of each process.

[0033] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and replacements can be made without departing from the technical principles of the present invention. These improvements and replacements should also be regarded as the scope of protection of the present invention.

Claims

1. A process gas introduction device for introducing process gas into a vacuum chamber, characterized in that: Including gas distributor, air inlet pipe, diaphragm valve; The gas distributor is fixed to the vacuum chamber, and a plurality of gas channels are provided in the gas distributor. A plurality of gas inlets communicating with the gas channels are circumferentially provided on the sidewall of the gas distributor. A plurality of gas outlets communicating with the gas channels are provided at one end of the gas distributor. The number of the gas inlets corresponds to the number of the gas outlets and the diaphragm valves, and the gas inlets are connected to the diaphragm valves. One end of the air inlet pipe is connected to the plurality of air outlets, and the other end of the air inlet pipe extends into the vacuum chamber; The process gas is collected from the gas channel through the gas inlet and the gas outlet to the gas inlet pipe, and is introduced into the vacuum chamber.

2. The gas introduction device according to claim 1, characterized in that: A connecting flange is fixedly provided at one end of the gas distributor facing the gas outlet, the connecting flange is fixedly connected to the outer wall of the vacuum chamber, and the air inlet pipe passes through the connecting flange and extends into the vacuum chamber.

3. The gas introduction device according to claim 2, characterized in that: The outer wall of the gas distributor and the outer wall of the connecting flange are both covered with heating jackets.

4. The gas introduction device according to claim 2, characterized in that: A second sealing groove is formed on one end of the connecting flange facing the vacuum chamber, and a sealing ring is provided in the second sealing groove.

5. The gas introduction device according to claim 2, wherein: The gas distributor has an end facing the gas outlet with a flange corresponding to the connecting flange, and the connecting flange has an end facing the flange with a first sealing groove, in which a first sealing ring is provided.

6. The gas introduction device according to claim 5, characterized in that: The two opposite side walls of the first sealing groove are arranged close to each other and inclined.

7. The gas introduction device according to claim 1, wherein: The gas channel is in an L-shape or a T-shape.

8. The gas introduction device according to claim 1, wherein: The gas distributor is provided with a limiting groove at one end facing the gas outlet, and the end of the gas inlet pipe is provided with a limiting step corresponding to the limiting groove.

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