Gas holder capable of preventing gas from being mixed in advance

Abstract

The utility model discloses a gas holder capable of preventing gas from being mixed in advance. The gas holder comprises a plurality of gas control modules, wherein each gas control module comprises a first gas conveying unit and a second gas conveying unit; each of the first gas conveying unit and the second gas conveying unit comprises a purging pipeline and a plurality of process gas conveying pipelines, and one end of the purging pipeline of the first gas conveying unit is connected with one end of each process gas conveying pipeline in parallel and then is divided into a first branch and a third branch which are provided with switch valves; one end of the purging pipeline of the second gas conveying unit is connected with one end of the process gas conveying pipeline in parallel and then is divided into a second branch and a fourth branch which are provided with switch valves; the first gas conveying unit is provided with a process gas conveying pipeline for conveying oxidizing gas, the second gas conveying unit is provided with a process gas conveying pipeline for conveying reducing gas, the first branch and the second branch are connected in parallel and then connected with the reaction chamber, and the third branch and the fourth branch are connected in parallel and then connected with the vacuum pumping system. And on the premise of ensuring the process stability, the problem caused by advanced mixing of process gas in the gas holder is solved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a gas cabinet capable of preventing gases from mixing in advance. Background Art

[0002] In the precision field of semiconductor manufacturing, wafers, as indispensable substrates, play a crucial role in the production of chips, integrated circuits, and electronic devices. In chemical vapor deposition (CVD) equipment, the gas box is a key component responsible for transporting multiple reactive process gases into the reaction chamber for chemical reactions to occur, generating solid products and gaseous byproducts. The solid products are then deposited on the wafer surface to form a solid film.

[0003] Chemical vapor deposition equipment switches to different processes by changing the process gases introduced into the reaction chamber via a gas cabinet to accommodate diverse production needs. However, during process switching, residual gases from the previous process can affect the subsequent process, potentially altering the final process results. Therefore, to ensure process stability, effective measures must be taken to remove residual gases from the previous process.

[0004] Furthermore, when existing gas cabinets transport multiple process gases, the reactive reducing and oxidizing gases mix thoroughly within the pipelines before reaching the reaction chamber. This premature mixing not only leads to the premature formation of solid products and gaseous byproducts, disrupting the normal reaction flow within the reaction chamber and adversely affecting process performance, but also results in unnecessary consumption and waste of process gases, increasing production costs. Summary of the Invention

[0005] The utility model provides a gas cabinet which prevents premature mixing of gases, so as to overcome the problem caused by premature mixing of process gases in the gas cabinet while ensuring process stability.

[0006] In order to achieve the above purpose, the technical solution of the utility model is:

[0007] A gas cabinet for preventing premature mixing of gases includes a plurality of gas control modules, wherein the gas control modules include a first gas delivery unit and a second gas delivery unit;

[0008] The first gas delivery unit includes a purge pipeline and a plurality of process gas delivery pipelines. An end of the purge pipeline of the first gas delivery unit away from the purge gas source is connected to an end of the process gas delivery pipeline away from the process gas source, and then branched into a first branch and a third branch provided with an on-off valve.

[0009] The second gas delivery unit includes a purge pipeline and a plurality of process gas delivery pipelines. An end of the purge pipeline of the second gas delivery unit away from the purge gas source is connected to an end of the process gas delivery pipeline away from the process gas source, and then a second branch and a fourth branch are branched with switch valves.

[0010] The first gas delivery unit is provided with at least one process gas delivery pipeline capable of delivering oxidizing gas, the second gas delivery unit is provided with at least one process gas delivery pipeline capable of delivering reducing gas, the first branch and the second branch are connected in parallel to connect to the reaction chamber, and the third branch and the fourth branch are connected in parallel to connect to the vacuum pumping system.

[0011] Furthermore, when the first gas delivery unit includes a plurality of process gas delivery pipelines, the plurality of process gas delivery pipelines of the first gas delivery unit can deliver a plurality of mutually non-reactive process gases;

[0012] When the second gas delivery unit includes a plurality of process gas delivery pipelines, the plurality of process gas delivery pipelines of the second gas delivery unit can deliver a plurality of process gases that do not react with each other.

[0013] Furthermore, it also includes a gas cabinet body, the gas control module is arranged in the gas cabinet body, the gas cabinet body includes a cabinet body and a cabinet door, the cabinet body and the cabinet door can form an airtight space, and an exhaust pipe is provided on the top of the cabinet body, and the exhaust pipe is connected to the exhaust system.

[0014] Furthermore, the process gas delivery pipelines of the first gas delivery unit and the second gas delivery unit are both provided with a gas mass flow controller and a pneumatic valve.

[0015] Furthermore, filters are provided on one end of the process gas delivery pipelines of the first gas delivery unit and the second gas delivery unit, which is close to the process gas source.

[0016] Furthermore, manual valves are provided on the process gas delivery pipelines of the first gas delivery unit and the second gas delivery unit.

[0017] Furthermore, the purge pipelines of the first gas delivery unit and the second gas delivery unit are both provided with a gas mass flow controller and a pneumatic valve.

[0018] Furthermore, filters are provided on one end of the purge pipelines of the first gas delivery unit and the second gas delivery unit, which is close to the purge gas source.

[0019] Furthermore, manual valves are provided on the purge pipelines of the first gas delivery unit and the second gas delivery unit.

[0020] Beneficial effects:

[0021] The utility model provides a gas cabinet for preventing premature gas mixing. By providing a first gas delivery unit for delivering oxidizing gas and a second gas delivery unit for delivering reducing gas, the reducing gas and the oxidizing gas that can react with each other are effectively isolated. Before the first branch and the second branch merge, the reducing gas and the oxidizing gas do not come into contact with each other, greatly reducing the premature generation of solid products and gaseous by-products that may be caused by premature gas mixing, thereby ensuring the stability of the reaction in the reaction chamber and reducing unnecessary consumption and waste of process gas.

[0022] The purge pipeline of the first gas delivery unit is connected to the reaction chamber and the vacuum pumping system through the first branch and the third branch respectively, and the purge pipeline of the second gas delivery unit is connected to the reaction chamber and the vacuum pumping system through the second branch and the fourth branch respectively, so that residual gas and other impurities in the pipeline and the reaction chamber can be effectively removed to ensure the stability of the process. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following is a brief introduction to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0024] Figure 1 This is a schematic diagram of a pipeline of a gas cabinet for preventing premature mixing of gases disclosed in the utility model;

[0025] Figure 2 This is a schematic diagram of the structure of a gas cabinet that prevents premature mixing of gases disclosed in the utility model. Figure 1 ;

[0026] Figure 3 This is a schematic diagram of the structure of a gas cabinet that prevents premature mixing of gases disclosed in the utility model. Figure 2 ;

[0027] Figure 4 This is a schematic structural diagram of a gas cabinet for preventing premature gas mixing disclosed in the present utility model with the cabinet door removed;

[0028] Figure 5 This is a front view of a gas cabinet for preventing premature gas mixing disclosed in the utility model with the cabinet door removed;

[0029] Figure 6 for Figure 5 Enlarged view of point C;

[0030] Figure 7This is a rear view of a gas cabinet for preventing premature gas mixing disclosed in the utility model;

[0031] Figure 8 for Figure 7 Enlarged view of point D;

[0032] Figure 9 This is a schematic diagram of a gas control module of an existing gas cabinet.

[0033] In the picture:

[0034] 1. The first gas delivery unit;

[0035] 2. Second gas delivery unit;

[0036] 3A, first filter; 3B, second filter; 3C, third filter; 3D, fourth filter; 3E, fifth filter; 3F, sixth filter;

[0037] 4A, first manual valve; 4B, second manual valve; 4C, third manual valve; 4D, fourth manual valve; 4E, fifth manual valve; 4F, sixth manual valve;

[0038] 5A, first gas mass flow controller; 5B, second gas mass flow controller; 5C, third gas mass flow controller; 5D, fourth gas mass flow controller; 5E, fifth gas mass flow controller; 5F, sixth gas mass flow controller;

[0039] 6A, first pneumatic valve; 6B, second pneumatic valve; 6C, third pneumatic valve; 6D, fourth pneumatic valve; 6E, fifth pneumatic valve; 6F, sixth pneumatic valve;

[0040] 7A, first switch valve; 7B, second switch valve; 7C, third switch valve; 7D, fourth switch valve;

[0041] 8. Exhaust pipe; 9. Cabinet door; 10. Cabinet body;

[0042] 11. First branch road; 12. Second branch road; 13. Third branch road; 14. Fourth branch road;

[0043] A. Reaction chamber; B. Vacuum pumping system;

[0044] E, interface; F1, air supply interface; F2, air extraction interface;

[0045] G1, first process gas source; G2, second process gas source; G3, third process gas source; G4, first purge gas source; G5, second purge gas source; G6, fourth process gas source. DETAILED DESCRIPTION

[0046] To make the purpose, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts shall fall within the scope of protection of the present invention.

[0047] This embodiment provides a gas cabinet that prevents premature mixing of gases, such as Figure 5 As shown, it includes several gas control modules, and the number of gas control modules corresponds to the number of reaction chambers A in the CVD equipment. Figure 5 The part selected by the box C is a gas control module. The structure of the gas control module is as follows: Figure 6 As shown, Figure 5 The gas cabinet has four gas control modules, corresponding to the CVD equipment with four reaction chambers A, such as Figure 1 As shown, the gas control module includes a first gas delivery unit 1 and a second gas delivery unit 2;

[0048] The first gas delivery unit 1 includes a purge pipeline and several process gas delivery pipelines, such as Figure 1 As shown, one end of the purge pipeline of the first gas delivery unit 1 away from the purge gas source is connected to the other end of the process gas delivery pipeline away from the process gas source, and then a first branch 11 and a third branch 13 with a switch valve are separated;

[0049] The second gas delivery unit 2 includes a purge pipeline and several process gas delivery pipelines, such as Figure 1 As shown, one end of the purge pipeline of the second gas delivery unit 2 away from the purge gas source is connected to the other end of the process gas delivery pipeline away from the process gas source, and then a second branch 12 and a fourth branch 14 with a switch valve are separated;

[0050] The first gas delivery unit 1 is provided with at least one process gas delivery pipeline capable of delivering oxidizing gas, and the second gas delivery unit 2 is provided with at least one process gas delivery pipeline capable of delivering reducing gas. The first branch 11 and the second branch 12 are connected in parallel to the reaction chamber A, and the third branch 13 and the fourth branch 14 are connected in parallel to the vacuum pumping system B.

[0051] To better illustrate the beneficial effect of the gas cabinet provided by this embodiment for preventing premature gas mixing, the gas control module of the existing gas cabinet is introduced below. Figure 9The gas control module of the conventional gas cabinet shown is equipped with six process gas delivery pipelines. After the six process gas delivery pipelines are connected in parallel, they are connected to the reaction chamber through the interface E. The reacting reducing gas and oxidizing gas will prematurely mix in the pipelines, resulting in the premature formation of solid products and gaseous by-products.

[0052] The present embodiment provides a gas cabinet that prevents premature gas mixing. By providing a first gas delivery unit 1 for delivering oxidizing gas and a second gas delivery unit 2 for delivering reducing gas, the reducing gas and the oxidizing gas, which are capable of reacting with each other, are effectively isolated. Before the first branch 11 and the second branch 12 merge, the reducing gas and the oxidizing gas do not come into contact with each other, greatly reducing the premature generation of solid products and gaseous by-products that may be caused by premature gas mixing, thereby ensuring the stability of the reaction in the reaction chamber A and reducing unnecessary consumption and waste of process gases.

[0053] The purge pipeline of the first gas delivery unit 1 is connected to the reaction chamber A and the vacuum pumping system B through the first branch 11 and the third branch 13, respectively. The purge pipeline of the second gas delivery unit 2 is connected to the reaction chamber A and the vacuum pumping system B through the second branch 12 and the fourth branch 14, respectively, so that residual gas and other impurities in the pipeline and the reaction chamber can be effectively removed to ensure the stability of the process.

[0054] In a specific embodiment, when the first gas delivery unit 1 includes multiple process gas delivery pipelines, the multiple process gas delivery pipelines of the first gas delivery unit 1 can deliver multiple process gases that do not react with each other, thereby preventing multiple process gases from mixing and reacting in the pipelines, causing premature generation of solid products and gaseous by-products, and affecting the normal reaction in the reaction chamber A;

[0055] When the second gas delivery unit 2 includes multiple process gas delivery pipelines, the multiple process gas delivery pipelines of the second gas delivery unit 2 can deliver multiple process gases that do not react with each other, thereby avoiding the reaction of multiple process gases in the pipeline after mixing, causing the premature generation of solid products and gaseous by-products, and affecting the normal reaction in the reaction chamber A.

[0056] In a specific embodiment, a gas cabinet body is further included, and the gas control module is arranged in the gas cabinet body, such as Figures 2 to 5 as well as Figure 7 As shown, the gas cabinet body includes a cabinet body 10 and a cabinet door 9 hinged on the cabinet body 10. The cabinet body 10 and the cabinet door 9 can form an airtight space. An exhaust pipe 8 is provided on the top of the cabinet body 10, and the exhaust pipe 8 is connected to the exhaust system.

[0057] When the gas control module is under maintenance, the cabinet door 9 needs to be opened, and the outside air will enter the gas cabinet body. As the pipeline is disassembled, the residual gas and impurities in the pipeline will overflow into the gas cabinet body, causing the gas cabinet body to be contaminated, seriously affecting the cleanliness of the working environment of the gas control module. Therefore, after the maintenance is completed, the exhaust pipe 8 connected to the exhaust system is used to suck out the residual gas and impurities in the gas cabinet body to eliminate the pollution in the airtight space and ensure the cleanliness of the gas cabinet body.

[0058] In a specific embodiment, a gas mass flow controller and a pneumatic valve are provided on the process gas delivery pipelines of the first gas delivery unit 1 and the second gas delivery unit 2, a filter is provided on one end of the process gas delivery pipelines of the first gas delivery unit 1 and the second gas delivery unit 2 close to the process gas source, and a manual valve is provided on the process gas delivery pipelines of the first gas delivery unit 1 and the second gas delivery unit 2;

[0059] A gas mass flow controller and a pneumatic valve are provided on the purge pipelines of the first gas delivery unit 1 and the second gas delivery unit 2. A filter is provided on one end of the purge pipelines of the first gas delivery unit 1 and the second gas delivery unit 2 close to the purge gas source. A manual valve is provided on the purge pipelines of the first gas delivery unit 1 and the second gas delivery unit 2.

[0060] The filter is used to ensure the purity of the transported gas, the gas mass flow controller is used to accurately control the flow of the transported gas, the pneumatic valve is used to control the on-off of the pipeline, and the manual valve is normally open. The manual valve only needs to be closed when the gas cabinet is repaired or there is a gas leak in the pipeline;

[0061] In this embodiment, the switch valve and the pneumatic valve are both pneumatic diaphragm valves, and the manual valves are both manual diaphragm valves. Each process gas delivery pipeline is independently provided with a manual diaphragm valve and a pneumatic diaphragm valve. The valves of the corresponding pipelines can be opened and closed individually according to different process requirements to meet different process requirements.

[0062] In this embodiment, if Figure 1 As shown, the first gas delivery unit 1 includes three process gas delivery pipelines and one purge pipeline. The three process gas delivery pipelines are respectively connected to the first process gas source G1, the second process gas source G2 and the third process gas source G3, and the purge pipeline is connected to the first purge gas source G4;

[0063] The second gas delivery unit 2 includes a process gas delivery pipeline and a purge pipeline, the process gas delivery pipeline is connected to the fourth process gas source G6, and the purge pipeline is connected to the second purge gas source G5;

[0064] In this embodiment, the gas corresponding to the first process gas source G1 is N2O (oxidizing gas), the gas corresponding to the second process gas source G2 is CF4, the gas corresponding to the third process gas source G3 is NH3, the gas corresponding to the fourth process gas source G6 is SiH4 (reducing gas), and the gases corresponding to the first purge gas source G4 and the second purge gas source G5 are both N2;

[0065] The process gas delivery pipelines and purge pipelines of the first gas delivery unit 1 and the second gas delivery unit 2 are both provided with filters (corresponding to Figure 1 The first filter 3A to the sixth filter 3F), manual valve (corresponding to Figure 1 The first manual valve 4A to the sixth manual valve 4F), gas mass flow controller (corresponding to Figure 1 The first gas mass flow controller 5A to the sixth gas mass flow controller 5F) and the pneumatic valve (corresponding to Figure 1 The first pneumatic valve 6A to the sixth pneumatic valve 6F), the first branch 11 to the fourth branch 14 are respectively provided with a switch valve (corresponding to Figure 1 In the embodiment, the first switch valve 7A to the fourth switch valve 7D are Figure 8 As shown, the first branch 11 and the second branch 12 are connected in parallel and connected to the reaction chamber A through the gas supply interface F1, and the third branch 13 and the fourth branch 14 are connected in parallel and connected to the vacuum pumping system B through the gas pumping interface F2;

[0066] When the gas cabinet is operating normally, the manual valve is normally open, and the fourth pneumatic valve 6D, the fifth pneumatic valve 6E, the third on-off valve 7C, and the fourth on-off valve 7D are closed. Based on different process requirements, different process gases are selected, and one or more of the first pneumatic valve 6A, the second pneumatic valve 6B, the third pneumatic valve 6C, and the sixth pneumatic valve 6F corresponding to the different process gases are opened. The first on-off valve 7A and the second on-off valve 7B are also opened to supply the process gases to the reaction chamber A.

[0067] When the cavity of reaction chamber A needs to be opened, the flammable, explosive, toxic and harmful process gases remaining in reaction chamber A need to be discharged. The third on-off valve 7C and the fourth on-off valve 7D are closed, and the first pneumatic valve 6A, the second pneumatic valve 6B, the third pneumatic valve 6C and the sixth pneumatic valve 6F are closed. The fourth pneumatic valve 6D, the fifth pneumatic valve 6E, the first on-off valve 7A and the second on-off valve 7B are opened, and N2 is introduced into reaction chamber A for cleaning (in actual application, reaction chamber A is also connected to the vacuum exhaust system B. While N2 is introduced, gas can be extracted through the vacuum exhaust system B to clean the interior of reaction chamber A).

[0068] Since the process gas contains toxic, harmful, flammable and explosive gases, when the accessories of the gas cabinet (such as valves, pipelines, gas mass flow controllers and other accessories of the gas control module) need to be replaced or repaired, the residual process gas in the pipeline needs to be emptied, the first switch valve 7A and the second switch valve 7B are closed, the first pneumatic valve 6A, the second pneumatic valve 6B, the third pneumatic valve 6C and the sixth pneumatic valve 6F are closed, the third switch valve 7C and the fourth switch valve 7D are opened to vacuum the pipeline, the fourth pneumatic valve 6D and the fifth pneumatic valve 6E are opened to introduce N2 into the pipeline to evacuate the residual process gas in the pipeline, and then the third switch valve 7C and the fourth switch valve 7D are closed. After all manual valves are closed, the gas cabinet can be inspected and repaired.

[0069] When it is necessary to switch the process, the first pneumatic valve 6A, the second pneumatic valve 6B, the third pneumatic valve 6C and the sixth pneumatic valve 6F are closed, the first on-off valve 7A and the second on-off valve 7B are closed, the third on-off valve 7C and the fourth on-off valve 7D are opened to evacuate the pipeline, the fourth pneumatic valve 6D and the fifth pneumatic valve 6E are opened to introduce N2 into the pipeline to exhaust the residual process gas in the pipeline, ensuring that the newly introduced process gas after the process is switched will not be contaminated by the residual gas in the pipeline; after the residual process gas is exhausted, the fourth pneumatic valve 6D, the fifth pneumatic valve 6E, the third on-off valve 7C and the fourth on-off valve 7D are closed, and different process gases are selected according to different process requirements, and one or more of the first pneumatic valve 6A, the second pneumatic valve 6B, the third pneumatic valve 6C and the sixth pneumatic valve 6F corresponding to different process gases are opened, and the first on-off valve 7A and the second on-off valve 7B are opened to provide gas to the reaction chamber A.

[0070] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A gas cabinet for preventing premature mixing of gases, characterized in that: It comprises a plurality of gas control modules, wherein the gas control modules include a first gas delivery unit (1) and a second gas delivery unit (2); The first gas delivery unit (1) comprises a purge pipeline and a plurality of process gas delivery pipelines, wherein an end of the purge pipeline of the first gas delivery unit (1) away from the purge gas source is connected to an end of the process gas delivery pipeline away from the process gas source, and then a first branch (11) and a third branch (13) provided with an on-off valve are formed; The second gas delivery unit (2) comprises a purge pipeline and a plurality of process gas delivery pipelines, wherein an end of the purge pipeline of the second gas delivery unit (2) away from the purge gas source is connected to an end of the process gas delivery pipeline away from the process gas source, and then a second branch (12) and a fourth branch (14) provided with a switch valve are formed; The first gas delivery unit (1) is provided with at least one process gas delivery pipeline capable of delivering oxidizing gas, the second gas delivery unit (2) is provided with at least one process gas delivery pipeline capable of delivering reducing gas, the first branch (11) and the second branch (12) are connected in parallel to be connected to a reaction chamber (A), and the third branch (13) and the fourth branch (14) are connected in parallel to be connected to a vacuum pumping system (B).

2. A gas cabinet for preventing premature gas mixing according to claim 1, characterized in that: When the first gas delivery unit (1) comprises a plurality of process gas delivery pipelines, the plurality of process gas delivery pipelines of the first gas delivery unit (1) are capable of delivering a plurality of mutually non-reactive process gases; When the second gas delivery unit (2) comprises a plurality of process gas delivery pipelines, the plurality of process gas delivery pipelines of the second gas delivery unit (2) are capable of delivering a plurality of mutually non-reactive process gases.

3. A gas cabinet for preventing premature gas mixing according to claim 1, characterized in that: The invention also includes a gas cabinet body, wherein the gas control module is arranged in the gas cabinet body, and the gas cabinet body includes a cabinet body (10) and a cabinet door (9), wherein the cabinet body (10) and the cabinet door (9) can form an airtight space, and an exhaust pipe (8) is provided on the top of the cabinet body (10), and the exhaust pipe (8) is connected to an exhaust system.

4. A gas cabinet for preventing premature gas mixing according to claim 1, characterized in that: The process gas delivery pipelines of the first gas delivery unit (1) and the second gas delivery unit (2) are both provided with a gas mass flow controller and a pneumatic valve.

5. A gas cabinet for preventing premature gas mixing according to claim 4, characterized in that: The process gas delivery pipelines of the first gas delivery unit (1) and the second gas delivery unit (2) are both provided with filters at one end close to the process gas source.

6. A gas cabinet for preventing premature gas mixing according to claim 4, characterized in that: Manual valves are provided on the process gas delivery pipelines of the first gas delivery unit (1) and the second gas delivery unit (2).

7. A gas cabinet for preventing premature gas mixing according to claim 1, characterized in that: The purge pipelines of the first gas delivery unit (1) and the second gas delivery unit (2) are both provided with a gas mass flow controller and a pneumatic valve.

8. A gas cabinet for preventing premature gas mixing according to claim 7, characterized in that: The purge pipelines of the first gas delivery unit (1) and the second gas delivery unit (2) are both provided with filters at one end close to the purge gas source.

9. A gas cabinet for preventing premature gas mixing according to claim 7, characterized in that: Manual valves are provided on the purge pipelines of the first gas delivery unit (1) and the second gas delivery unit (2).

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