Photoresist production and recovery structure

Abstract

The utility model discloses a photoresist production and recovery structure. The photoresist production and recovery structure comprises a box body, a feeding pipe is mounted at the top of the box body, and a filtering mechanism is mounted in the box body; the filtering mechanism comprises a supporting plate with a hole in the middle, a first frustum-shaped filtering piece and a second frustum-shaped filtering piece are symmetrically installed on the supporting plate, and a baffle is installed on the supporting plate; the first filtering piece comprises a conical outer filtering cover and a conical inner filtering cover, and the inner filtering cover is located below the feeding pipe. According to the photoresist production and recovery structure provided by the utility model, the filtering mechanism comprising the supporting plate, the frustum-shaped first filtering piece and the frustum-shaped second filtering piece is arranged in the box body, so that the filtering area of the filtering mechanism is larger, and the photoresist filtering efficiency of the filtering mechanism can be improved; by arranging the first filtering piece comprising the outer filtering cover and the inner filtering cover, most sundries can be automatically accumulated at the designated position, and then follow-up cleaning is facilitated.

Description

Technical Field

[0001] The utility model relates to the technical field of photoresist production, in particular to a photoresist production and recycling structure. Background Art

[0002] Photoresist is a photoresist that is generally processed by irradiation or radiation of ultraviolet light, electron beam, etc. In the process of photolithography, photoresist is a corrosion-resistant coating material. When processing the surface of semiconductor materials, the appropriate photoresist is selected to obtain the desired image on the surface.

[0003] The existing document with publication number CN219209131U discloses a photoresist production and recovery structure, comprising a main body, a recovery mechanism, and a cleaning mechanism. The recovery mechanism is located inside the main body, and the cleaning mechanism is located above the recovery mechanism. The main body comprises a housing, a support column, a sealing cover, a handle, and a control panel. The support column is fixedly mounted on the upper end of the housing, the sealing cover is movably mounted on the rear end of the upper end of the housing, the handle is fixedly mounted on the front end of the upper end of the sealing cover, and the control panel is fixedly mounted in the middle of the front end of the housing. The recovery mechanism comprises a filter chamber, a liquid storage chamber, a liquid inlet, a filter plate, a circular fixed block, a sink, a long filter barrel, a concave fixed block, a filter screen, a liquid outlet, and a regulating valve. This photoresist production and recovery structure facilitates the removal of contaminants attached to the filter plate, solves the problem of contaminants clogging the filter plate, and reduces the frequency of filter plate replacement.

[0004] The device uses a functional plane filter plate and filter mesh to filter impurities in the photoresist. However, the plane filter structure has a limited filtering area and is not efficient enough.

[0005] Therefore, it is necessary to provide a photoresist production and recycling structure to solve the above technical problems. Utility Model Content

[0006] In view of the above situation, in order to overcome the defects of the prior art, the utility model provides a photoresist production and recovery structure capable of improving filtration efficiency.

[0007] In order to achieve the above purpose, the technical solution adopted by the present utility model is as follows:

[0008] A photoresist production and recycling structure includes: a box body, a feed pipe is installed in the middle of the top of the box body, and the recovered photoresist enters the box body from the feed pipe, a filtering mechanism is installed in the box body, after the photoresist enters the box body, it is filtered by the filtering mechanism, and then collected at the bottom of the box body, a discharge pipe is installed at the bottom of the box body, and a valve is installed on the discharge pipe, through which the filtered photoresist can be taken out, and after subsequent processing, it can be reused, the filtering mechanism includes a support plate with a hole in the middle, a first frustum-shaped filter element and a second filter element are symmetrically installed on the support plate, a baffle is installed on the support plate, the first filter element includes a conical outer filter cover and an inner filter cover connected together, and the inner filter cover is located below the feed pipe.

[0009] Preferably, a motor is installed at the bottom of the second filter element, and the outer shell of the motor is fixedly connected to the inner wall of the box through a plurality of support rods.

[0010] Preferably, a scraper is installed in the box body, and the scraper is arranged in contact with the outer filter cover.

[0011] Preferably, an electric push rod is installed between the scraper and the box.

[0012] Preferably, a cone head is installed in the second filter element.

[0013] Compared with the prior art, the present invention has the following beneficial effects:

[0014] (1) The utility model installs a filter mechanism including a support plate, a first filter element in a frustum shape, and a second filter element in a housing, thereby increasing the filter area of ​​the filter mechanism and improving the filter efficiency of the filter mechanism for photoresist. By providing the first filter element including an outer filter cover and an inner filter cover, most debris can be automatically accumulated in a designated location, thereby facilitating subsequent cleaning.

[0015] (2) The utility model can drive the first filter element to rotate by installing a motor at the bottom of the second filter element, and use centrifugal force to throw debris outward, thereby facilitating the cleaning of the outer filter cover;

[0016] (3) The utility model installs a scraper in the box body, and uses the scraper in conjunction with the rotating first filter element to conveniently scrape off some debris on the outer filter cover, making it easier to clean and use the outer filter cover;

[0017] (4) The utility model can conveniently adjust the distance between the outer filter cover and the scraper by installing an electric push rod between the scraper and the box body;

[0018] (5) The utility model can prevent splashing by installing a cone head on the top of the second filter element, which makes it easier for debris to accumulate at the bottom of the second filter element. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 A schematic cross-sectional view of a photoresist production and recycling structure provided by the present invention;

[0020] Figure 2 for Figure 1 The schematic diagram of the structure of the filtering mechanism in the photoresist production and recycling structure shown;

[0021] Figure 3 for Figure 1 The schematic structural diagram of the first filter element in the photoresist production and recycling structure shown;

[0022] Figure 4 for Figure 1 The schematic diagram of the structure of the second filter element in the photoresist production and recycling structure is shown.

[0023] Among them, the names corresponding to the figure marks are: 1-box, 2-feed pipe, 3-discharge pipe, 4-filter mechanism, 5-support plate, 6-first filter element, 7-second filter element, 8-baffle, 9-outer filter cover, 10-inner filter cover, 11-motor, 12-scraper, 13-electric push rod, 14-cone head. DETAILED DESCRIPTION

[0024] The present invention will be further described below with reference to the accompanying drawings and embodiments. The present invention includes but is not limited to the following embodiments.

[0025] Example 1:

[0026] like Figure 1-4As shown, the photoresist production and recycling structure provided by the present invention includes: a box body 1, a feed pipe 2 is installed in the middle of the top of the box body 1, and the recovered photoresist enters the box body 1 from the feed pipe 2. A filtering mechanism 4 is installed in the box body 1. After the photoresist enters the box body 1, it is filtered by the filtering mechanism 4 and then collected at the bottom of the box body 1. A discharge pipe 3 is installed at the bottom of the box body 1, and a valve is installed on the discharge pipe 3. The filtered photoresist can be taken out through the valve 3 and can be reused after subsequent processing. The filtering mechanism 4 includes a support plate 5 with a hole in the middle, and a first frustum-shaped filter element 6 and a second filter element 7 are symmetrically installed on the support plate 5. , a baffle 8 is installed on the support plate 5, and the first filter element 6 includes a conical outer filter cover 9 and an inner filter cover 10 connected together. The inner filter cover 10 is located below the feed pipe 2. When in use, the recovered photoresist is put into the inner filter cover 10 in the box body 1 from the feed pipe 2, and the first layer of filtration is performed by the inner filter cover 10. The filtered impurities remain in the inner filter cover 10. When the inner filter cover 10 is filled with impurities, the photoresist will flow along the surface of the outer filter cover 9 to the range surrounded by the baffle 8 on the top of the support plate 3, and the photoresist will be filtered by the outer filter cover 9 until the impurities accumulate too much on the inner side of the baffle 8. The photoresist filtered through the above steps enters the second filter element 7, and the second filter element 7 filters out finer impurities. The filtered photoresist passes through the second filter element 7 and falls to the bottom of the box body 1 and accumulates. The conical shape of the first filter element 6 and the second filter element 7 increases the filtration area, thereby improving filtration efficiency. Furthermore, the filtered debris, driven by the photoresist, is automatically concentrated. In particular, during the first layer of filtration, the photoresist accumulates relatively concentratedly within the inner filter housing 10. Once the inner filter housing 10 is full, the debris accumulates relatively concentratedly on the top of the support plate 3. This eliminates the need to clean debris from the filter mechanism 4 for an extended period of time, significantly reducing the frequency of cleaning the filter mechanism 4.

[0027] By installing a filter mechanism 4 including a support plate 5, a first frustum-shaped filter element 6 and a second filter element 7 in the box body 1, the filtering area of ​​the filter mechanism 4 is made larger, which can improve the filtering efficiency of the filter mechanism 4 on the photoresist. By setting the first filter element 6 including an outer filter cover 9 and an inner filter cover 10, most of the debris can be automatically accumulated in the designated position, thereby facilitating subsequent cleaning.

[0028] Example 2:

[0029] like Figure 1-2As shown, a motor 11 is installed at the bottom of the second filter element 7, and the outer shell of the motor 11 is fixedly connected to the inner wall of the box body 1 through a number of support rods. The output shaft of the motor 11 is fixedly connected to the second filter element 7. During use, when there are too many debris attached to the outer filter cover 9 and the holes are blocked, the motor 11 can be started to rotate the second filter element 7, so that the first filter element 6 rotates, and the debris attached to the outer filter cover 9 is thrown out to prevent it from continuing to block the outer filter cover 9, thereby facilitating the cleaning of the outer filter cover 9. It is worth noting that this measure is only effective for a part of the debris that blocks the holes.

[0030] By installing a motor 11 at the bottom of the second filter element 7, the first filter element 6 can be driven to rotate, and the centrifugal force is used to throw the debris outward, thereby facilitating the cleaning of the outer filter cover 9.

[0031] Example 3:

[0032] like Figure 1 As shown, a scraper 12 is installed in the box body 1, and the scraper 12 is set in contact with the outer filter cover 9. When in use, the motor 11 drives the first filter element 6 to rotate at a low speed, and the scraper 12 scrapes off most of the debris attached to the outer filter cover 9, thereby reducing the debris on the outer filter cover 9 and facilitating the cleaning and use of the outer filter cover 9.

[0033] By installing a scraper 12 in the box body 1 and using the scraper 12 in conjunction with the rotating first filter element 6, some debris on the outer filter cover 9 can be conveniently scraped off, making it easier to clean and use the outer filter cover 9.

[0034] Example 4:

[0035] like Figure 1 As shown, an electric push rod 13 is installed between the scraper 12 and the box body 1. When in use, the electric push rod 13 is started to extend and retract, thereby conveniently adjusting the distance between the scraper 12 and the first filter element 6 (outer filter cover 9). After the scraper 12 is worn, it can be moved toward the outer filter cover 9 so that it can always maintain a certain distance from the outer filter cover 9.

[0036] By installing an electric push rod 13 between the scraper 12 and the box body 1, the distance between the outer filter cover 9 and the scraper 12 can be easily adjusted.

[0037] Example 5:

[0038] like Figure 4As shown, a cone head 14 is installed in the second filter element 7. When in use, the photoresist after the first layer of filtration drips onto the cone head 14 and slides along the cone head 14 to the bottom of the second filter element 7. The photoresist randomly passes through the second filter element 7 for the second layer of filtration, and the filtered debris remains in the space between the cone head 14 and the second filter element 7, thereby preventing the photoresist above from dripping directly onto the debris already deposited at the bottom of the second filter element 7, causing the debris to splash, which is not conducive to the accumulation of debris.

[0039] By installing the cone head 14 on the top of the second filter element 7 , it can prevent splashing and facilitate the accumulation of debris at the bottom of the second filter element 7 .

[0040] Working Principle: During use, recovered photoresist is fed from feed pipe 2 into inner filter housing 10 within housing 1, where it undergoes a first-level filtration. Filtered impurities remain within inner filter housing 10. When the inner filter housing 10 is filled with impurities, the photoresist flows along the surface of outer filter housing 9 to the area enclosed by baffle 8 at the top of support plate 3. This filter then undergoes a first-level filtration until impurities accumulate excessively on the inside of baffle 8. Compared to filter plates with flat designs, this design offers a larger filtration area and higher efficiency.

[0041] The photoresist filtered through the above steps enters the second filter element 7, and the second filter element 7 filters out finer impurities. The filtered photoresist passes through the second filter element 7 and falls to the bottom of the box 1 and accumulates.

[0042] Due to the overall conical design of the first filter element 6 and the second filter element 7, the filtration area is increased, thereby improving the filtration efficiency. The filtered debris is driven by the photoresist, and most of the debris can be automatically concentrated. In particular, when the photoresist is filtered in the first layer, it can be relatively concentrated and accumulated in the inner filter cover 10. After the inner filter cover 10 is full, most of the debris slides along the surface of the outer filter cover 9 and accumulates on the top of the support plate 3. It is no longer necessary to clean the debris on the filter mechanism 4 for a long time, thereby reducing the frequency of cleaning the filter mechanism 4.

Claims

1. A photoresist production and recycling structure, characterized in that: include: A box body (1), a feed pipe (2) is installed on the top of the box body (1), and a filtering mechanism (4) is installed inside the box body (1); The filtering mechanism (4) comprises a support plate (5) with a central opening, a first filter element (6) and a second filter element (7) in the shape of a cone are symmetrically mounted on the support plate (5), and a baffle (8) is mounted on the support plate (5); The first filter element (6) comprises a conical outer filter cover (9) and an inner filter cover (10), wherein the inner filter cover (10) is located below the feed pipe (2).

2. A photoresist production and recycling structure according to claim 1, characterized in that: A motor (11) is installed at the bottom of the second filter element (7).

3. A photoresist production and recycling structure according to claim 2, characterized in that: The motor (11) is fixedly connected to the inner wall of the box (1).

4. A photoresist production and recycling structure according to claim 1, characterized in that: A scraper (12) is installed in the box (1).

5. A photoresist production and recycling structure according to claim 4, characterized in that: An electric push rod (13) is installed between the scraper (12) and the box body (1).

6. A photoresist production and recycling structure according to claim 1, characterized in that: A cone head (14) is installed in the second filter element (7).

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