Isolation mechanism for magnetic field sputtering target material

Abstract

The utility model relates to the technical field of film preparation, in particular to an isolation mechanism for a magnetic field sputtering target material, which comprises four mounting seats arranged on magnetic control equipment, the four mounting seats are respectively arranged above and below a cooling main roller in pairs, the two mounting seats close to the same end of the cooling main roller are detachably connected with the same mounting rack, and the same mounting rack is detachably connected with the magnetic control equipment. A plurality of partition plates arranged between the target materials are detachably connected between the two mounting frames on the same side of the magnetic control equipment, the target materials are separated by arranging the partition plates between the target materials, pollution substances are prevented from spreading, therefore, mutual pollution between the target materials is prevented, the film coating quality is guaranteed, and the film coating efficiency is improved. The mounting frame is detachably connected with the mounting seat, and the mounting frame is detachably connected with the isolation plate, so that the mounting frame and the isolation plate can be conveniently disassembled and assembled subsequently, the mounting frame and the isolation plate can be regularly replaced and cleaned, the target material is prevented from being polluted by metal atoms deposited on the isolation plate and the mounting frame, and the subsequent quality is prevented from being influenced.

Description

TECHNICAL FIELD

[0001] The utility model relates to thin film preparation technical field, concretely relates to a kind of isolation mechanism for magnetic field sputtering target material. BACKGROUND

[0002] The conductive film is a kind of high polymer material plated with metal on the surface, which is widely used in lithium ion batteries and mainly used as battery current collector in lithium ion batteries. In the existing magnetron sputtering coating, a plurality of target materials are usually arranged on the outer periphery of the cooling main roller in the circumferential direction to facilitate the uniform sputtering of metal atoms on the target material on the base film to form a metal film. In order to realize the coating of different functional films at the same time, the consumables of each target material need to be different to form different metal layers.

[0003] However, when different consumable target materials are sputtered, there is no isolation between the target materials, which causes cross contamination between the target materials and affects the coating quality. SUMMARY

[0004] The utility model discloses a kind of isolation mechanism for magnetic field sputtering target material, solve the problem that in the existing magnetron sputtering, target material and target material are communicated, different target materials are easy to spread contaminant, cause each target material cross contamination, affect coating quality.

[0005] To solve the above technical problems, the utility model adopts the following technical solutions:

[0006] A kind of isolation mechanism for magnetic field sputtering target material, including four mounting seats set on magnetron equipment, four mounting seats are respectively arranged above and below cooling main roller, two mounting seats close to the same end of cooling main roller can be detachably connected with the same mounting frame, multiple isolation plates are detachably connected between the two mounting frames located on the same side of magnetron equipment, and the isolation plates are arranged between each target material.

[0007] Further technical solutions are that the outer side of the mounting seat is provided with a slot, and the two ends of the mounting frame are provided with a plug-in block matched with the slot; the two ends of the isolation plate are provided with a connecting groove with a T-shaped cross section, and the end of the isolation plate facing the cooling main roller is provided with a sliding inlet connected with the connecting groove; the inner side of the two mounting frames is provided with a connecting block with a T-shaped cross section.

[0008] Still further technical solutions are that the end of the connecting block facing the cooling main roller is connected with two oppositely arranged insertion strips, an active channel is formed between the two insertion strips, the outer side of the end of the two insertion strips away from the connecting block is provided with a protruding block, and recesses are formed in the two side walls of the connecting groove close to the sliding inlet.

[0009] Still further technical solutions are that the protruding block is in the shape of a hemisphere.

[0010] A further technical solution is that the isolation plates are evenly distributed along the circumference of the cooling main roller.

[0011] Compared with the prior art, the beneficial effects of the present invention are: by arranging an isolation plate between each target material, the target materials are separated to prevent the spread of pollutants, thereby preventing mutual contamination between the targets and ensuring the quality of the coating. In addition, the mounting frame and the mounting seat are detachably connected, and the mounting frame and the isolation plate are detachably connected, which facilitates the subsequent disassembly and assembly of the mounting frame and the isolation plate, and enables regular replacement and cleaning of the mounting frame and the isolation plate, preventing metal atoms deposited on the isolation plate and the mounting frame from contaminating the target material and affecting the subsequent quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 The utility model is a schematic structural diagram of an isolation mechanism for magnetic field sputtering target material.

[0013] Figure 2 For this utility model Figure 1 A split and enlarged image in the middle.

[0014] Figure 3 This is a schematic diagram of the utility model's isolation plate, connection block and inserting strip parts.

[0015] Figure 4 This is a partial cross-sectional view of the utility model's isolation plate, connecting block and inserting strip in the disassembled state.

[0016] Icon: 1-magnetic control device, 2-mounting seat, 3-cooling main roller, 4-mounting frame, 5-isolation plate, 6-slot, 7-plug-in block, 8-connection groove, 9-sliding entrance, 10-connection block, 11-insertion strip, 12-bump, 13-groove, 14-roller, 15-unwinding roller, 16-winding roller, 17-target material, 18-film to be plated. DETAILED DESCRIPTION

[0017] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0018] Example 1

[0019] like Figure 1As shown, the prior art coating equipment includes a magnetron device 1, and inside the magnetron device 1, a cooling main roller 3, a passing roller 14, a unwinding roller 15, a winding roller 16 and the cooling main roller 3 are arranged in rotation, and a plurality of target materials 17 are arranged in the circumferential direction outside the cooling main roller 3. The film to be coated 18 moves around the passing rollers 14 and the cooling main roller 3 under the action of the winding roller 16 and the unwinding roller 15. The cooling main roller 3 is provided with two, and the two surfaces of the film to be coated 18 are in contact with the two cooling main rollers 3 respectively, and the film is coated on the surface which is not in contact, so that the two surfaces of the film to be coated 18 are coated. When the coating equipment is working, the film to be coated 18 is wound and installed on the unwinding roller 15, the unwinding roller 15 releases the film to be coated 18, and the film to be coated 18 successively winds around the first group of passing rollers 14 and winds to the corresponding cooling main roller 3. The cooling main roller 3 close to the first group of passing rollers 14 is in contact with the second surface of the film to be coated 18, and the first surface of the film to be coated 18 faces the target material 17. The metal atoms on the target material 17 are uniformly sputtered on the base film to form a metal film, that is, the first surface of the film to be coated 18 is coated at the cooling main roller 3 close to the first group of passing rollers 14. The consumables of each target material 17 are different, so that the same base film forms a multi-layer composite film with different functional metal layers. After the first surface is coated, it is wound around the second group of passing rollers 14 to the corresponding another cooling main roller 3, and the other cooling main roller 3 is in contact with the first surface of the film to be coated 18, and the second surface of the film to be coated 18 faces the target material 17, that is, the second surface of the film to be coated 18 is coated at the other cooling main roller 3. After the second surface is coated, it is wound around the third group of passing rollers 14 to the winding core on the winding roller 16.

[0020] Referring to Figure 1 , Figure 2 As shown, the utility model relates to a kind of isolation mechanisms for magnetic field sputtering target material, including four mounting seats 2 being arranged in magnetron device 1, four mounting seats 2 are respectively two two and set in the upper and lower of cooling main roller 3, two mounting seats 2 close to the same end of cooling main roller 3 can be detachably connected with same mounting rack 4, between the two mounting racks 4 of same side of magnetron device 1, multiple isolation plates 5 being arranged between each target material 17 can be detachably connected.

[0021] In the embodiment, by being provided with isolation plate 5 between each target material 17, each target material 17 is separated, prevents contaminant propagation, to prevent mutual contamination between target material 17, guarantee coating quality, and mounting rack 4 and mounting seat 2 are detachably connected, mounting rack 4 and isolation plate 5 are detachably connected, facilitate subsequent mounting rack 4 and isolation plate 5 to realize dismounting, realize to mounting rack 4 and isolation plate 5 are periodically replaced and cleaned, prevent the metal atoms deposited on isolation plate 5 and mounting rack 4 from causing contamination to target material 17, avoid affecting subsequent quality.

[0022] Embodiment 2

[0023] On the basis of the foregoing embodiment, referring to Figures 1 to 3As shown, in actual use, the side wall of the mounting seat 2 close to one end of the corresponding cooling main roller 3 is the outer side, the side of the mounting frame 4 close to the isolation plate 5 is the inner side, the outer side of the mounting seat 2 is provided with a slot 6, and the two ends of the mounting frame 4 are provided with a plug-in block 7 matched with the slot 6; the two ends of the isolation plate 5 are provided with a T-shaped connecting groove 8, the end of the isolation plate 5 facing the cooling main roller 3 is provided with a sliding inlet 9 communicated with the connecting groove 8, and the inner side of the two mounting frames 4 are provided with a T-shaped connecting block 10; by arranging the T-shaped connecting groove 8 and the T-shaped connecting block 10, when the connecting block 10 is plugged into the connecting groove 8 through the sliding inlet 9, the connecting block 10 will not slide out of the slot of the connecting groove 8, and when the two mounting frames 4 are installed on the mounting seat 2 through the plug-in block 7 matched with the slot 6, the distance between the inner sides of the two mounting frames 4 is equivalent to the length of the isolation plate 5.

[0024] In use, the plug-in block 7 at both ends of the mounting frame 4 is plugged into the corresponding slot 6, the sliding inlet 9 arranged on the isolation plate 5 is aligned with the end of the connecting block 10 on the inner side of the two mounting frames 4, the isolation plate 5 is pushed, the connecting block 10 is plugged into the connecting groove 8 through the sliding inlet 9, and then the isolation plate 5 is installed between the two mounting frames 4, so as to separate each target material 17 and play a role of isolation. Since the distance between the inner sides of the two mounting frames 4 is equivalent to the length of the isolation plate 5, the isolation plate 5 can hold and limit the two mounting frames 4, prevent the plug-in block 7 from sliding in the slot 6, and make the connection between the mounting frame 4 and the mounting seat 2 more firm. By arranging the above structure, the mounting frame 4 and the mounting seat 2 do not need other auxiliary devices for limiting, and the applicability of the device is improved.

[0025] As a preferred embodiment, refer to Figure 3 、 Figure 4As shown, the connecting block 10 is connected to one end of the cooling main roller 3 in two opposite insertion strips 11, the insertion strip 11 has high elasticity, and the two insertion strips 11 form a movable channel, the movable channel is arranged to allow the two insertion strips 11 to approach each other, the side of the insertion strip 11 away from the movable channel is the outer side, the outer side of the end of the two insertion strips 11 away from the connecting block 10 is provided with a protruding block 12, the two groove walls near the sliding entrance 9 of the connecting groove 8 are provided with a groove 13, the groove 13 is matched with the protruding block 12, and the length of the connecting block 10 plus the length of the insertion strip 11 is shorter than the length of the connecting groove 8; in actual use, when the connecting block 10 is completely inserted into the connecting groove 8, the isolation plate 5 is continuously pushed, so that the insertion strip 11 is inserted into the connecting groove 8 through the sliding entrance 9, when the outer side wall of the protruding block 12 contacts the groove wall of the connecting groove 8 through the sliding entrance 9, the outer side of the protruding block 12 is extruded by the groove wall of the connecting groove 8, and the two insertion strips 11 approach each other to make the protruding block 12 slide into the connecting groove 8, when the protruding block 12 is arranged in the connecting groove 8 and aligned with the groove 13, at this time, the two insertion strips 11 restore the distance to make the protruding block 12 arranged in the groove 13, by arranging the protruding block 12, the insertion strip 11 and the groove 13, the connecting block 10 and the connecting groove 8 play a limiting role, preventing the connecting block 10 from sliding in the connecting groove 8, thereby ensuring the stability of the connection between the isolation plate 5 and the mounting frame 4, when disassembling, the isolation plate 5 is pulled, so that the insertion strip 11 is subjected to tension, at this time, the outer side of the protruding block 12 is extruded by the groove wall of the groove 13 to make the two insertion strips 11 approach each other, thereby making the protruding block 12 slide out of the groove 13, and then until the protruding block 12, the insertion strip 11 and the connecting block 10 are completely pulled out of the connecting groove 8, the disassembly is completed; through the above structure, the limiting of the connection between the isolation plate 5 and the mounting frame 4 can be realized, without the aid of other auxiliary devices for limiting, thereby improving the portability of the device.

[0026] As a preferred embodiment, refer to Figure 3 、 Figure 4 As shown, the protruding block 12 is in the shape of a hemisphere, and the hemisphere is arranged to facilitate the extrusion of the protruding block 12 into the connecting groove 8.

[0027] As a preferred embodiment, refer to Figure 1 As shown, the isolation plate 5 is uniformly distributed along the circumferential direction of the cooling main roller 3, by uniformly arranging each isolation plate 5 and arranging the end face in a radial manner along the center of the cooling main roller 3, the distance between adjacent isolation plates 5 is equivalent, the isolation space of each target material 17 is equivalent, the film coating time of each target material 17 is uniform, each coating is uniform, and each target material 17 can be better isolated to reduce cross contamination and ensure film coating quality. In actual application, the distance between each isolation plate 5 can be set according to production needs.

[0028] While the present application has been described with reference to the numerous explanatory embodiments thereof, it is to be understood that various other modifications can be effected within the scope of the application, as described in the claims. More specifically, many variations and modifications will be apparent to those skilled in the art from the description and drawings herein, given the benefit of the description, drawings and claims as a whole. Other uses will be apparent to those skilled in the art.

Claims

1. An isolation mechanism for a magnetic field sputtering target, characterized in that: The invention comprises four mounting seats (2) arranged on a magnetron device (1), wherein the four mounting seats (2) are arranged in pairs above and below a cooling main roller (3), two mounting seats (2) close to the same end of the cooling main roller (3) are detachably connected to the same mounting frame (4), and a plurality of isolation plates (5) respectively arranged between the target materials (17) are detachably connected between the two mounting frames (4) located on the same side of the magnetron device (1).

2. The isolation mechanism for a magnetic field sputtering target according to claim 1, characterized in that: The outer side of the mounting seat (2) is provided with a slot (6), and both ends of the mounting frame (4) are provided with a plug-in block (7) adapted to the slot (6); both ends of the isolation plate (5) are provided with a connecting groove (8) with a T-shaped cross section, and the end of the isolation plate (5) facing the cooling main roller (3) is provided with a sliding entrance (9) connected to the connecting groove (8), and the inner sides of the two mounting frames (4) are provided with a connecting block (10) with a T-shaped cross section.

3. The isolation mechanism for a magnetic field sputtering target according to claim 2, characterized in that: Two oppositely arranged inserts (11) are connected to one end of the connecting block (10) facing the cooling main roller (3), and a movable channel is formed between the two inserts (11). A protrusion (12) is provided on the outer side of one end of the two inserts (11) away from the connecting block (10), and grooves (13) are provided on both side walls of the connecting groove (8) near the sliding entrance (9).

4. The isolation mechanism for a magnetic field sputtering target according to claim 3, characterized in that: The protrusion (12) is in the shape of a hemisphere.

5. The isolation mechanism for a magnetic field sputtering target according to claim 1, characterized in that: The isolation plates (5) are evenly distributed along the circumference of the cooling main roller (3).

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