Water tank of quartz wafer cleaning machine

Abstract

The utility model discloses a water tank of a quartz wafer cleaning machine, and relates to the technical field of quartz wafer cleaning, a reciprocating vibration mechanism comprises a U-shaped connecting plate fixedly connected to the output end of a hydraulic lifting column, and the inner wall of the U-shaped connecting plate is slidably connected with four sliding rods; a connecting block is fixedly connected between the opposite sides of the two sliding rods on the left side and the two sliding rods on the right side, a driving hole is formed in the inner wall of the connecting block, a machine fixing plate is fixedly connected to the bottom of the U-shaped connecting plate, a first motor is fixedly connected to the inner wall of the machine fixing plate, and an extrusion wheel is fixedly connected to the output end of the first motor; by arranging the reciprocating vibration mechanism, the quartz wafer can be driven to continuously vibrate left and right in the cleaning liquid, the wafer is continuously washed in the cleaning liquid, the clear liquid better permeates the wafer, dirt is more easily stripped from the surface of the wafer and enters the cleaning liquid, and therefore the cleaning effect is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to quartz wafer cleaning technical field, concretely is a quartz wafer cleaning machine water tank. BACKGROUND

[0002] With the rapid development of national economy, quartz wafer is widely used in electronic component technical field, quartz wafer is polluted on the surface in the production and processing process, therefore needs to carry out cleaning treatment to quartz wafer surface. But, in traditional quartz wafer cleaning machine, quartz wafer under the static state is difficult to be fully washed surface, leading to uneven cleaning effect, and cleaning fluid is difficult to fully penetrate quartz wafer, and the wafer cylinder storage rack in the prior art cannot effectively adjust the size of the storage rack opening when in use, leading to the wafer cylinder of different sizes cannot be clamped. UTILITY MODEL CONTENTS

[0003] The utility model discloses a quartz wafer cleaning machine water tank, solve the technical problem mentioned in the above background art.

[0004] The purpose of the utility model can be realized by the following technical scheme:

[0005] A quartz wafer cleaning machine water tank, including the groove body and L type fixed plate being set on the top of the machine table, the bottom of L type fixed plate is fixedly connected with hydraulic lift column, the output end of hydraulic lift column is provided with reciprocating vibration mechanism.

[0006] The reciprocating vibration mechanism includes the U-shaped connecting plate fixedly connected at the output end of the hydraulic lift column, four slide rods are slidably connected to the inner wall of the U-shaped connecting plate, a connecting block is fixedly connected between the opposite sides of the left two slide rods and the right two slide rods, a drive hole is formed in the inner wall of the connecting block, a fixed machine plate is fixedly connected to the bottom of the U-shaped connecting plate, a first motor is fixedly connected to the inner wall of the fixed machine plate, and a squeezing wheel is fixedly connected to the output end of the first motor.

[0007] As a further scheme of the utility model: the bottom of the machine table is fixedly connected with a supporting rod, and the bottom of the connecting block is provided with a ring-shaped clamping mechanism.

[0008] As a further scheme of the utility model: the ring-shaped clamping mechanism includes four connecting rods, a second motor and three connecting shafts fixedly connected to the bottom of the connecting block, an annular groove is fixedly connected between the bottoms of the four connecting rods, a gear ring is rotatably connected to the inner wall of the annular groove, four racks are slidably connected to the inner wall of the annular groove, a clamping head is fixedly connected to each of the four racks, a first gear is fixedly connected to the surface of the output shaft of the second motor, and a second gear is rotatably connected to the surface of each of the three connecting shafts.

[0009] As a further scheme of the utility model: four support rods are arranged at the bottom edge of the machine table in a rectangular array, and the bottom of each of the four support rods is fixedly connected with a base.

[0010] As a further scheme of the utility model: the extrusion wheel and the driving hole are matched, and each of the four slide rods is matched with the connecting block.

[0011] As a further scheme of the utility model: the first gear and the second gear are of the same size, the first gear and the three second gears are engaged with the gear ring, and the first gear and the three second gears are engaged with the adjacent racks.

[0012] Advantages

[0013] The utility model provides a quartz wafer cleaning machine water tank, and has the following advantages compared with the prior art

[0014] Advantages

[0015] (1), the application can drive the quartz wafer to continuously vibrate left and right in the cleaning liquid by setting the reciprocating vibration mechanism, so that the wafer is continuously scoured in the cleaning liquid, the cleaning liquid also better penetrates the wafer, so that dirt is more easily stripped from the wafer surface and enters the cleaning liquid, thereby improving the cleaning effect.

[0016] (2), the application can adaptively adjust the clamping range according to the actual size of the quartz wafer by setting the annular clamping mechanism, so that different sizes of quartz wafers are adapted, the clamping is stable, and the wafer is prevented from shaking or falling off during the cleaning process. DETAILED DESCRIPTION

[0017] Figure 1 It is the main view of the utility model;

[0018] Figure 2 It is the perspective view of the local structure of the utility model;

[0019] Figure 3 It is the perspective view of the reciprocating vibration mechanism of the utility model;

[0020] Figure 4 It is the exploded view of the reciprocating vibration mechanism of the utility model;

[0021] Figure 5 It is the perspective view of the annular clamping mechanism of the utility model;

[0022] Figure 6 It is the local structure exploded view of the annular clamping mechanism of the utility model.

[0023] As shown in the figure: 1, machine table; 2, groove; 3, L-shaped fixed plate; 4, hydraulic lifting column; 5, reciprocating vibration mechanism; 51, U-shaped connecting plate; 52, slide rod; 53, connecting block; 54, drive hole; 55, fixed machine plate; 56, first motor; 57, extrusion wheel; 6, support rod; 7, ring clamping mechanism; 71, connecting rod; 72, second motor; 73, connecting shaft; 74, ring groove; 75, gear ring; 76, rack; 77, clamping head; 78, first gear; 79, second gear; 8, base. DETAILED DESCRIPTION

[0024] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.

[0025] Please refer to Figures 1-6 As shown in the figure, the utility model is a kind of quartz wafer cleaning machine water tank, including the groove 2 and L-shaped fixed plate 3 being arranged on the top of machine table 1, the bottom of L-shaped fixed plate 3 is fixedly connected with hydraulic lifting column 4, the output end of hydraulic lifting column 4 is provided with reciprocating vibration mechanism 5;Reciprocating vibration mechanism 5 includes the U-shaped connecting plate 51 being fixedly connected at the output end of hydraulic lifting column 4, the inner wall of U-shaped connecting plate 51 is slidably connected with four slide rods 52, the opposite side between left two slide rods 52 and right two slide rods 52 is fixedly connected with connecting block 53, drive hole 54 is formed in the inner wall of connecting block 53, the bottom of U-shaped connecting plate 51 is fixedly connected with fixed machine plate 55, the inner wall of fixed machine plate 55 is fixedly connected with first motor 56, first motor 56 is electrically connected with external power supply, and is controlled by external program. The output end of first motor 56 is fixedly connected with extrusion wheel 57, by setting reciprocating vibration mechanism 5, quartz wafer can be driven to continuously vibrate left and right in cleaning liquid, so that the wafer is continuously washed in cleaning liquid, and the cleaning liquid also penetrates the wafer better, so that dirt is more easily stripped from the wafer surface and enters the cleaning liquid, thereby improving the cleaning effect.

[0026] The bottom of machine table 1 is fixedly connected with support rod 6, the bottom of connecting block 53 is provided with ring clamping mechanism 7, by setting ring clamping mechanism 7, it can be adapted to adjust the clamping range according to the actual size of quartz wafer, adapt to quartz wafer of different sizes, ensure clamping stable, prevent wafer from shaking or falling off in the cleaning process.

[0027] The annular clamping mechanism 7 comprises four connecting rods 71 fixedly connected at the bottom of the connecting block 53, a second motor 72 and three connecting shafts 73. The second motor 72 is electrically connected with an external power supply and is controlled by an external program. The second motor 72 is a direct current motor, and the rotating speed can be controlled by changing the input voltage. When the input voltage is reduced, the rotating speed of the motor will be reduced accordingly. The slow rotating speed can prevent the quartz wafer from being damaged by the excessive clamping force caused by the too fast movement speed during clamping. The bottom of the four connecting rods 71 is fixedly connected with an annular groove 74. The inner wall of the annular groove 74 is rotatably connected with a gear ring 75. The inner wall of the annular groove 74 is slidably connected with four racks 76. The four racks 76 are fixedly connected with clamping heads 77. The clamping heads are made of elastic rubber material, which can provide a certain buffering effect during clamping, reduce the direct impact of the clamping force on the quartz wafer, and prevent damage. The surface of the output shaft of the second motor 72 is fixedly connected with a first gear 78. The surface of the three connecting shafts 73 is rotatably connected with a second gear 79.

[0028] The support rods 6 are provided in four and are distributed in a rectangular array at the bottom edge of the machine table 1. The bottom of the four support rods 6 is fixedly connected with a base 8. The design of the plurality of support rods 6 ensures the stability of the equipment.

[0029] The extrusion wheel 57 is matched with the driving hole 54, and the four slide rods 52 are matched with the connecting block 53. The extrusion wheel 57 is eccentrically designed, and the working effect is similar to that of an eccentric wheel. The extrusion wheel 57 can extrude the connecting block 53 while continuously rotating and reciprocally changing its position.

[0030] The first gear 78 and the second gear 79 are of the same size. The first gear 78 and the three second gears 79 are engaged with the gear ring 75. The first gear 78 and the three second gears 79 are engaged with the adjacent racks 76. The first gear 78 and the second gear 79 are stainless steel gears. The stainless steel gears have high strength and excellent corrosion resistance, and can maintain good performance in underwater environments. Stainless steel gears are widely used in various underwater equipment and machinery, especially in situations that require high load bearing and corrosive media.

[0031] Meanwhile, the contents not described in detail in the specification all belong to the existing technology known to those skilled in the art.

[0032] The utility model discloses a work principle: first, quartz wafer is placed in the position of four clamping head 77 middle, then start second motor 72, let it drive the rotation of first gear 78 on the output shaft, and first gear 78 rotates the rotation of gear 75 in the inner wall of annular groove 74, and gear 75 is driven to rotate by first gear 78, and also drive the three second gears 79 originally static, let three second gears 79 rotate on the surface of three connecting shafts 73, first gear 78 and three second gears 79 rotate the adjacent rack 76 of each other, let four rack 76 slowly slide to the inside, to make four clamping head 77 to the surrounding of quartz wafer clamping, start hydraulic lifting column 4 again, let it drive the downward movement of all structures of output end, make the quartz wafer in the clamping enter the cleaning fluid, finally start first motor 56, let it drive the rotation of extruding wheel 57 of output end, and extruding wheel 57 rotates in the driving hole 54 on the connecting block 53, and since it is eccentric design, will rotate in the driving hole 54 and back and forth extrude connecting block 53, let connecting block 53 reciprocate in the inner wall of U type connecting plate 51 through four slide bars 52 on both sides, so that the quartz wafer clamped in the cleaning fluid reciprocates and cleans.

[0033] It is to be understood that the terminology used herein such as first and second, and the like, is merely intended to differentiate one entity or action from another without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the use of the term "including", "containing", "comprising", or other variants thereof, is intended to cover the non-exclusive inclusion such that a process, method, article, or apparatus that comprises a list of elements is not necessarily limited to those elements but can include other elements not expressly listed or inherent to such process, method, article, or apparatus.

[0034] Although embodiments of the present application have been shown and described, it is to be understood that various modifications, substitutions, replacements and changes can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A quartz wafer cleaning machine water tank, comprising a tank body (2) and an L-shaped fixing plate (3) arranged on the top of a machine table (1), characterized in that: The bottom of the L-shaped fixed plate (3) is fixedly connected with a hydraulic lifting column (4), and the output end of the hydraulic lifting column (4) is provided with a reciprocating vibration mechanism (5); The reciprocating vibration mechanism (5) comprises a U-shaped connecting plate (51) fixedly connected to the output end of the hydraulic lifting column (4), four slide rods (52) slidably connected to the inner wall of the U-shaped connecting plate (51), a connecting block (53) fixedly connected between the opposite sides of the left two slide rods (52) and the right two slide rods (52), a driving hole (54) formed in the inner wall of the connecting block (53), a fixed mechanism plate (55) fixedly connected to the bottom of the U-shaped connecting plate (51), a first motor (56) fixedly connected to the inner wall of the fixed mechanism plate (55), and an extrusion wheel (57) fixedly connected to the output end of the first motor (56).

2. The water tank of the quartz wafer cleaning machine according to claim 1, wherein: The bottom of the machine table (1) is fixedly connected with a support rod (6), and the bottom of the connecting block (53) is provided with an annular clamping mechanism (7).

3. A water tank for a quartz wafer cleaning machine according to claim 2, wherein: The annular clamping mechanism (7) comprises four connecting rods (71), a second motor (72) and three connecting shafts (73) fixedly connected to the bottom of the connecting block (53), an annular groove (74) fixedly connected between the bottoms of the four connecting rods (71), a gear ring (75) rotatably connected to the inner wall of the annular groove (74), four racks (76) slidably connected to the inner wall of the annular groove (74), a clamping head (77) fixedly connected to each of the four racks (76), a first gear (78) fixedly connected to the surface of the output shaft of the second motor (72), and a second gear (79) rotatably connected to the surface of each of the three connecting shafts (73).

4. The water tank of the quartz wafer cleaning machine according to claim 2, wherein: The support rod (6) is provided with four support rods (6) arranged in a rectangular array at the bottom edge of the machine table (1), and the bottom of each of the four support rods (6) is fixedly connected with a base (8).

5. The water tank of the quartz wafer cleaning machine according to claim 1, wherein: The extrusion wheel (57) and the driving hole (54) are matched with each other, and the four slide rods (52) are matched with the connecting block (53).

6. The water tank of the quartz wafer cleaning machine according to claim 3, wherein: The first gear (78) and the second gear (79) are the same size, the first gear (78) and the three second gears (79) are engaged with the gear ring (75), and the first gear (78) and the three second gears (79) are engaged with the adjacent racks (76).

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