Disc type magnet mechanism of sputter coating machine

Abstract

The utility model provides a disc-type magnet mechanism of a sputter coating machine, which comprises a process coating cavity, a disc-type magnet device is arranged at the top of the process coating cavity, the upper part of the disc-type magnet device is connected with a rotating device, and a target device is arranged at the lower part of the disc-type magnet device and is used for rotating the disc-type magnet device. Through the arrangement of a plurality of first cylindrical magnets of which the south poles face the target material and a plurality of second cylindrical magnets of which the north poles face the target material, and meanwhile, in the sputter coating process, the disc type magnet device rotates, so that the uniformity and the direction consistency of a magnetic field are ensured, and a relatively uniform space magnetic field is formed.

Description

TECHNICAL FIELD

[0001] The utility model relates to sputter coating technology field, more specifically, relate to a disc type magnet mechanism of sputter coating machine. BACKGROUND

[0002] Sputter deposition is a kind of physical vapor deposition (PVD) process, is widely used in thin film preparation. The principle of sputter deposition is through high-energy particle bombardment target material, and the target particles on the target material are hit out, so that the target particles are deposited to form a thin film.

[0003] The uniformity is an important index for the magnetron sputtering vacuum coating machine to deposit thin films, therefore, researching the factors affecting the uniformity of magnetron sputtering can better realize the uniformity of magnetron sputtering coating. Simply speaking, the magnetron sputtering is that in the orthogonal electromagnetic field, the closed magnetic field confines the electron to make spiral motion around the target surface, and in the process of motion, a large number of working gas ions are continuously ionized by the impact of working gas, the working gas ions are accelerated to hit the target under the action of the electric field, and the target atom ions (or molecules) are sputtered to deposit on the substrate to form a thin film. Therefore, to realize uniform coating, the target atom ions (or molecules) need to be uniformly sputtered, which requires that the working gas ions hitting the target are uniformly hit.

[0004] Since the working gas ions are accelerated to hit the target under the action of the electric field, the electric field needs to be uniform. The working gas ions are formed by the continuous impact of the closed magnetic field confined electron in the process of motion, which requires that the magnetic field is uniform and the working gas distribution is uniform. In fact, the uniformity of the magnetic field and the uniformity of the working gas are the most important factors affecting the uniformity of film formation. The position of the magnetic field is thick, and vice versa. The direction of the magnetic field is also an important factor affecting the uniformity.

[0005] Therefore, it is necessary to solve the important problem of forming a relatively uniform space magnetic field by ensuring the uniformity and direction consistency of the magnetic field. SUMMARY

[0006] Therefore, in order to solve the above problems, the utility model provides a disc type magnet mechanism of sputtering coating machine, including process coating cavity 10, the top of process coating cavity 10 is equipped with disc type magnet device 20, the upper portion of disc type magnet device 20 is connected with rotating device 21, and the lower portion is equipped with target material device, which is used for rotating disc type magnet device 20, disc type magnet device 20 includes two groups of magnet assemblies, and is first magnet assembly 30 and second magnet assembly 40 respectively, the south pole of first magnet assembly 30 faces target material device, and the north pole of second magnet faces target material device, first magnet assembly 30 is formed by the interval arrangement of multiple first cylindrical magnets 31 with the south pole facing target material, multiple first cylindrical magnets 31 are arranged to form mosquito-repellent incense shape with the first center as the starting point and curling outward, second magnet assembly 40 is formed by the interval arrangement of multiple second cylindrical magnets 41 with the north pole facing target material, multiple second cylindrical magnets 41 are arranged to form mosquito-repellent incense shape with the second center as the starting point and curling outward along the side of mosquito-repellent incense shape formed by the arrangement of multiple first cylindrical magnets 31, and the first center and the second center are oppositely arranged through the arrangement of multiple first cylindrical magnets 31 with the south pole facing target material and multiple second cylindrical magnets 41 with the north pole facing target material, and disc type magnet device 20 rotates during sputtering coating process, which guarantees the uniformity and direction consistency of magnetic field and forms a relatively uniform space magnetic field.

[0007] A disc type magnet mechanism of sputtering coating machine, including process coating cavity 10, characterized in that: the top of process coating cavity 10 is equipped with disc type magnet device 20, the upper portion of disc type magnet device 20 is connected with rotating device 21, and the lower portion is equipped with target material device, which is used for rotating disc type magnet device 20, disc type magnet device 20 includes two groups of magnet assemblies, and is first magnet assembly 30 and second magnet assembly 40 respectively, the south pole of first magnet assembly 30 faces target material device, and the north pole of second magnet faces target material device, first magnet assembly 30 is formed by the interval arrangement of multiple first cylindrical magnets 31 with the south pole facing target material, multiple first cylindrical magnets 31 are arranged to form mosquito-repellent incense shape with the first center as the starting point and curling outward, second magnet assembly 40 is formed by the interval arrangement of multiple second cylindrical magnets 41 with the north pole facing target material, multiple second cylindrical magnets 41 are arranged to form mosquito-repellent incense shape with the second center as the starting point and curling outward along the side of mosquito-repellent incense shape formed by the arrangement of multiple first cylindrical magnets 31, and the first center and the second center are oppositely arranged.

[0008] Further, the north pole of the first cylindrical magnet 31 and the south pole of the second cylindrical magnet 41 are fixed on the lower part of the mounting fixed disc 50, the south pole of the first cylindrical magnet 31 is fixedly connected with the south pole fixed ring 32, the north pole of the second cylindrical magnet 41 is fixedly connected with the north pole fixed ring 42, the south pole fixed ring 32 and the north pole fixed ring 42 are arranged on the same plane and are spaced apart from the mounting fixed disc 50.

[0009] Further, the shape of the south pole fixed ring 32 matches the mosquito coil shape formed by the arrangement of the plurality of first cylindrical magnets 31, and the shape of the north pole fixed ring 42 matches the mosquito coil shape formed by the arrangement of the plurality of second cylindrical magnets 41.

[0010] Further, the rotating device 21 includes a speed reduction motor 22, an outer wall toothed synchronous wheel 23, and a magnetic fluid 24, the magnetic fluid 24 includes a magnetic fluid body 241 and a magnetic fluid shaft 242 which is sleeved inside, the upper center position of the mounting fixed disc 50 is connected with one end of the magnetic fluid shaft 242 through a flange plate 25, the other end of the magnetic fluid shaft 242 is connected with the outer wall toothed synchronous wheel 23, the magnetic fluid body 241 is connected with the top of the outer shell of the process plating cavity 10, the tooth part of the outer wall toothed synchronous wheel 23 is connected with the gear of the speed reduction motor 22 through a synchronous belt 26, the speed reduction motor 22 rotates to drive the outer wall toothed synchronous wheel 23 to rotate, the rotation of the outer wall toothed synchronous wheel 23 drives the rotation of the magnetic fluid shaft 242 to drive the rotation of the disc-shaped magnet device 20.

[0011] Further, the speed reduction motor 22 is connected with a control panel 27 for controlling the speed of the gear rotation of the speed reduction motor 22.

[0012] Further, the outer wall toothed synchronous wheel 23 and the magnetic fluid 24 are provided with a protective cover 28, the protective cover 28 is locked with a motor base 29, the motor base 29 is locked on the outer shell of the process plating cavity 10, and the motor base 29 is used for mounting the speed reduction motor 22.

[0013] In some embodiments, an intermediate limiting plate 60 is arranged between the south pole fixed ring 32, the north pole fixed ring 42 and the mounting fixed disc 50, the intermediate limiting plate 60 is sleeved with the plurality of first cylindrical magnets 31 and the plurality of second cylindrical magnets 41 respectively, a magnet counterweight 61 is arranged on the upper part of the intermediate limiting plate 60, the magnet counterweight 61 is sleeved with the first cylindrical magnet 31 and the second cylindrical magnet 41 connected thereto respectively, through the magnet counterweight 61, the disc-shaped magnet device 20 always rotates around the magnetic fluid shaft 242 during rotation, which ensures the stability of the rotation center of gravity of the disc-shaped magnet device 20.

[0014] Further, the south pole fixed ring 32, the mounting fixed disc 50, the intermediate limiting plate 60 and / or the magnet counterweight 61 are all penetrated by a plurality of screw rods 70 for locking, and the north pole fixed ring 42, the mounting fixed disc 50, the intermediate limiting plate 60 and / or the magnet counterweight 61 are also all penetrated by a plurality of screw rods 70 for locking.

[0015] Further, a plurality of stud bolts 80 are arranged between the mounting fixed disc 50 and the intermediate limiting plate 60 for locking.

[0016] In some embodiments, the first center is provided with a south pole target device first slot type magnet 91, and the second center is provided with a north pole target device second slot type magnet 92, and the first slot type magnet 91 and the second slot type magnet 92 are symmetrically arranged.

[0017] The utility model discloses a disc type magnet mechanism of sputter coating machine, including process coating cavity 10, the top of process coating cavity 10 is equipped with disc type magnet device 20, the upper portion of disc type magnet device 20 is connected rotating device 21, and the lower part is equipped with target device, is used for rotating disc type magnet device 20, disc type magnet device 20 includes two groups of magnet assemblies, is first magnet assembly 30 and second magnet assembly 40 respectively, the south pole of first magnet assembly 30 is towards target device, and the north pole of second magnet is towards target device, first magnet assembly 30 is formed by interval arrangement of a plurality of south pole first cylinder magnet 31 that is towards target material, a plurality of first cylinder magnet 31 are arranged to form mosquito-repellent incense shape with first center as starting point, and curl around the mosquito-repellent incense shape outward, second magnet assembly 40 is formed by interval arrangement of a plurality of north pole second cylinder magnet 41 that is towards target material, a plurality of second cylinder magnet 41 are arranged to form mosquito-repellent incense shape with second center as starting point, and curl around the mosquito-repellent incense shape outward along the side of a plurality of first cylinder magnet 31 arrangement mosquito-repellent incense shape, first center and second center are oppositely arranged through the arrangement of a plurality of south pole first cylinder magnet 31 that is towards target material and a plurality of north pole second cylinder magnet 41 that is towards target material, and in the sputter coating process, disc type magnet device 20 rotates and moves, guarantees the uniformity and direction consistency of magnetic field, forms a relatively uniform space magnetic field. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is process coating cavity open state structural drawing of the sputter coating machine of the utility model.

[0019] Figure 2 It is the overall structural drawing of disc type magnet mechanism of the sputter coating machine of the utility model.

[0020] Figure 3 It is the connecting structural drawing of rotating device of disc type magnet mechanism of the sputter coating machine of the utility model.

[0021] Figure 4 The connecting structure diagram of the magnetic fluid of the disc type magnet mechanism of the sputtering coating machine.

[0022] Figure 5 The structure diagram of the disc type magnet device of the disc type magnet mechanism of the sputtering coating machine.

[0023] Figure 6 The side structure diagram of the disc type magnet device of the disc type magnet mechanism of the sputtering coating machine.

[0024] Figure 7 The partial structure diagram of the disc type magnet device of the disc type magnet mechanism of the sputtering coating machine.

[0025] Main element symbol explanation

[0026] Process coating cavity 10, disc type magnet device 20, rotating device 21, speed reduction motor 22, outer wall toothed synchronous wheel 23, magnetic fluid 24, magnetic fluid body 241, magnetic fluid shaft 242, flange plate 25, synchronous belt 26, control panel 27, protective cover 28, motor base 29, first magnet assembly 30, first cylindrical magnet 31, south pole fixed ring 32, second magnet assembly 40, second cylindrical magnet 41, north pole fixed ring 42, installation fixed disc 50, intermediate limiting plate 60, magnet counterweight 61, screw rod 70, stud 80, first slot type magnet 91, second slot type magnet 92.

[0027] The following specific embodiments will further illustrate the utility model in combination with the above-mentioned drawings. Specific embodiments Embodiments

[0028] As Figure 1 , Figure 5As shown, a disk magnet mechanism of a sputtering coating machine includes a process coating chamber 10, and a disk magnet device 20 is provided on the top of the process coating chamber 10. The upper part of the disk magnet device 20 is connected to a rotating device 21, and the lower part is provided with a target device for rotating the disk magnet device 20. The disk magnet device 20 includes two groups of magnet assemblies, namely a first magnet assembly 30 and a second magnet assembly 40. The south pole of the first magnet assembly 30 faces the target device, and the north pole of the second magnet faces the target device. The first magnet assembly 30 is formed by a plurality of first cylindrical magnets 31 with south poles facing the target, which are arranged at intervals. The plurality of first cylindrical magnets 31 are arranged to form a mosquito-repellent coil shape with a first center as the starting point and curled outward. The second magnet assembly 40 is formed by a plurality of second cylindrical magnets 41 with north poles facing the target, which are arranged at intervals. The plurality of second cylindrical magnets 41 are arranged to form a mosquito-repellent coil shape with a second center as the starting point and curled outward along one side of the mosquito-repellent coil shape formed by the plurality of first cylindrical magnets 31. The first center and the second center are arranged opposite to each other.

[0029] The shape of the south pole fixing ring 32 matches the mosquito coil shape formed by arranging the plurality of first cylindrical magnets 31 , and the shape of the north pole fixing ring 42 matches the mosquito coil shape formed by arranging the plurality of second cylindrical magnets 41 .

[0030] like Figures 6-7 As shown, the north pole of the first cylindrical magnet 31 and the south pole of the second cylindrical magnet 41 are both fixed to the lower part of the mounting plate 50, the south pole of the first cylindrical magnet 31 is fixedly connected to the south pole fixing ring 32, and the north pole of the second cylindrical magnet 41 is fixedly connected to the north pole fixing ring 42. The south pole fixing ring 32 and the north pole fixing ring 42 are on the same plane and are arranged parallel to the mounting plate 50 and spaced apart.

[0031] The intermediate limiting plate 60 is sleeved with the plurality of first cylindrical magnets 31 and the plurality of second cylindrical magnets 41 respectively, the upper portion of the intermediate limiting plate 60 is provided with a magnet counterweight 61, the magnet counterweight 61 is sleeved with the first cylindrical magnet 31 and the second cylindrical magnet 41 connected thereto respectively, the magnet counterweight 61 makes the disc-shaped magnet device 20 always rotate around the magnetic fluid shaft 242 in the process of rotation, ensures the stability of the rotation gravity center of the disc-shaped magnet device 20, the south pole fixed ring 32, the mounting fixed disc 50, the intermediate limiting plate 60 and / or the magnet counterweight 61 are all penetrated by a plurality of screw rods 70 for locking, the north pole fixed ring 42, the mounting fixed disc 50, the intermediate limiting plate 60 and / or the magnet counterweight 61 are also all penetrated by a plurality of screw rods 70 for locking, a plurality of threaded studs 80 are further arranged between the mounting fixed disc 50 and the intermediate limiting plate 60 for locking, the first center is provided with a south pole facing target material device first slot-shaped magnet 91, the second center is provided with a north pole facing target material device second slot-shaped magnet 92, the first slot-shaped magnet 91 and the second slot-shaped magnet 92 are symmetrically arranged.

[0032] As shown in Figures 2-4 The rotating device 21 includes a speed reducer motor 22, an outer wall toothed synchronous wheel 23 and a magnetic fluid 24, the magnetic fluid 24 includes a magnetic fluid body 241 and a magnetic fluid shaft 242 sleeved inside, the upper center position of the mounting fixed disc 50 is connected with one end of the magnetic fluid shaft 242 through a flange plate 25, the other end of the magnetic fluid shaft 242 is connected with the outer wall toothed synchronous wheel 23, the magnetic fluid body 241 is connected with the top of the outer shell of the process film plating cavity 10, the tooth part of the outer wall toothed synchronous wheel 23 is connected with the gear of the speed reducer motor 22 through a synchronous belt 26, the speed reducer motor 22 rotates to drive the outer wall toothed synchronous wheel 23 to rotate, the rotation of the outer wall toothed synchronous wheel 23 drives the rotation of the magnetic fluid shaft 242 to drive the rotation of the disc-shaped magnet device 20

[0033] As shown in Figure 1 The speed reducer motor 22 is connected with a control panel 27 for controlling the rotation speed of the gear of the speed reducer motor 22, the outer wall toothed synchronous wheel 23 and the magnetic fluid 24 are provided with a protective cover 28, the protective cover 28 is locked with a motor base 29, the motor base 29 is locked on the outer shell of the process film plating cavity 10, and the motor base 29 is used for installing the speed reducer motor 22.

[0034] The utility model discloses a disc type magnet mechanism of sputter coating machine, including process coating cavity 10, process coating cavity 10's top is equipped with disc type magnet device 20, disc type magnet device 20's upper portion connects rotating device 21, and the lower part is equipped with target material device, is used for rotating disc type magnet device 20, disc type magnet device 20 includes two groups of magnet assemblies, is first magnet assembly 30 and second magnet assembly 40 respectively, the south pole of first magnet assembly 30 is towards target material device, and the north pole of second magnet is towards target material device, first magnet assembly 30 is formed by interval setting up with a plurality of first cylindrical magnet 31 of south pole towards target material, and a plurality of first cylindrical magnet 31 are arranged to form mosquito-repellent incense shape with first center as starting point, and the mosquito-repellent incense shape of curling and winding outward, second magnet assembly 40 is formed by interval setting up with a plurality of second cylindrical magnet 41 of north pole towards target material, and a plurality of second cylindrical magnet 41 are arranged to form mosquito-repellent incense shape with second center as starting point, and the mosquito-repellent incense shape of curling and winding outward along the one side of mosquito-repellent incense shape of a plurality of first cylindrical magnet 31 arrangement, first center and second center are oppositely arranged through the arrangement of a plurality of first cylindrical magnet 31 of south pole towards target material and a plurality of second cylindrical magnet 41 of north pole towards target material, and simultaneously in sputter coating process, disc type magnet device 20 rotates and moves, guarantees the uniformity and direction consistency of magnetic field, forms a relatively uniform space magnetic field.

[0035] The above-described embodiments only express several implementation manners of the utility model, and the description is more specific and detailed, but it can not be understood as the limitation of the utility model patent scope. It should be pointed out that for ordinary skilled person in the art, without departing from the utility model concept, can make several deformation and improvement, and these all belong to the protection scope of the utility model. Therefore, the protection scope of the utility model patent should be the appended claims.

Claims

1. A disc magnet mechanism of a sputter coater, comprising a process coating chamber (10), characterized in that: The process plating cavity (10) is provided with a disc-shaped magnet device (20) at the top, the upper part of the disc-shaped magnet device (20) is connected with a rotating device (21), and the lower part is provided with a target material device for rotating the disc-shaped magnet device (20), the disc-shaped magnet device (20) includes two groups of magnet assemblies, which are a first magnet assembly (30) and a second magnet assembly (40), the south pole of the first magnet assembly (30) faces the target material device, the north pole of the second magnet assembly faces the target material device, the first magnet assembly (30) is formed by a plurality of first cylindrical magnets (31) with south poles facing the target material and arranged at intervals, a plurality of first cylindrical magnets (31) are arranged to form a mosquito coil shape with a first center as a starting point and curled outward, the second magnet assembly (40) is formed by a plurality of second cylindrical magnets (41) with north poles facing the target material and arranged at intervals, a plurality of second cylindrical magnets (41) are arranged to form a mosquito coil shape with a second center as a starting point and curled outward along one side of the mosquito coil shape formed by the plurality of first cylindrical magnets (31), and the first center and the second center are oppositely arranged.

2. The disc-type magnet mechanism for sputtering film deposition machine according to claim 1, wherein: The north poles of the first cylindrical magnets (31) and the south poles of the second cylindrical magnets (41) are fixed on the lower part of a mounting fixed disc (50), the south poles of the first cylindrical magnets (31) are fixedly connected with a south pole fixing ring (32), and the north poles of the second cylindrical magnets (41) are fixedly connected with a north pole fixing ring (42), the south pole fixing ring (32) and the north pole fixing ring (42) are arranged on the same plane and are parallel to the mounting fixed disc (50) at intervals.

3. The disc-shaped magnet mechanism of a sputtering film deposition machine according to claim 2, wherein: The shape of the south pole fixing ring (32) matches the mosquito coil shape formed by the plurality of first cylindrical magnets (31), and the shape of the north pole fixing ring (42) matches the mosquito coil shape formed by the plurality of second cylindrical magnets (41).

4. The disc magnet mechanism of a sputtering film deposition machine according to claim 2, wherein: The rotating device (21) includes a speed reduction motor (22), a synchronous wheel (23) with a toothed outer wall and a magnetic fluid (24), the magnetic fluid (24) includes a magnetic fluid body (241) and a magnetic fluid shaft (242) sleeved inside, the upper center position of the mounting fixed disc (50) is connected with one end of the magnetic fluid shaft (242) through a flange (25), the other end of the magnetic fluid shaft (242) is connected with the synchronous wheel (23) with a toothed outer wall, the magnetic fluid body (241) is connected with the top of the outer shell of the process plating cavity (10), the teeth part of the synchronous wheel (23) with a toothed outer wall is connected with the gear of the speed reduction motor (22) through a synchronous belt (26), the speed reduction motor (22) rotates to drive the synchronous wheel (23) with a toothed outer wall to rotate, and the rotation of the synchronous wheel (23) with a toothed outer wall drives the rotation of the magnetic fluid shaft (242) to drive the rotation of the disc-shaped magnet device (20).

5. The disc-shaped magnet mechanism of a sputtering film deposition machine according to claim 4, wherein: The speed reduction motor (22) is connected with a control board (27) for controlling the speed of the gear rotation of the speed reduction motor (22).

6. The disc-shaped magnet mechanism of a sputtering film deposition machine according to claim 4, wherein: The outer wall toothed synchronous wheel (23) and the magnetic fluid (24) outer cover are provided with a protective cover (28), the protective cover (28) is locked with the motor base (29), the motor base (29) is locked on the process film plating cavity (10) external shell, the motor base (29) is used for installing the speed reducer motor (22).

7. The disc-shaped magnet mechanism of a sputtering film deposition machine according to claim 2, wherein: The south pole fixed ring (32), the north pole fixed ring (42) and the installation fixed disc (50) are provided with an intermediate limiting plate (60), the intermediate limiting plate (60) is sleeved with a plurality of first cylindrical magnets (31) and a plurality of second cylindrical magnets (41), respectively, a magnet counterweight (61) is arranged on the upper portion of the intermediate limiting plate (60), the magnet counterweight (61) is sleeved with the first cylindrical magnet (31) and the second cylindrical magnet (41) connected thereto, respectively, the disc type magnet device (20) is always rotated around the magnetic fluid shaft (242) in the rotating process through the magnet counterweight (61), so that the stability of the rotating center of gravity of the disc type magnet device (20) is ensured.

8. The disc-shaped magnet mechanism of a sputtering film deposition machine according to claim 2, wherein: The south pole fixed ring (32), the installation fixed disc (50), the intermediate limiting plate (60) and / or the magnet counterweight (61) are all penetrated by a plurality of screw rods (70) for locking, the north pole fixed ring (42), the installation fixed disc (50), the intermediate limiting plate (60) and / or the magnet counterweight (61) are also all penetrated by a plurality of screw rods (70) for locking.

9. The disc-shaped magnet mechanism of a sputtering film deposition machine according to claim 2, wherein: The installation fixed disc (50) and the intermediate limiting plate (60) are also provided with a plurality of threaded columns (80) for locking.

10. The disc-shaped magnet mechanism of a sputtering film deposition machine according to claim 1, wherein: The first center is provided with a south pole target device first slot type magnet (91), the second center is provided with a north pole target device second slot type magnet (92), the first slot type magnet (91) and the second slot type magnet (92) are symmetrically arranged.

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