Surface smoothness processor for silicon carbide product

Abstract

The utility model relates to the field of polishing devices, in particular to a surface smoothness processor for silicon carbide products, which is characterized in that a mounting seat driven by a power mechanism to move transversely is arranged on a mounting frame, a liftable polishing mechanism is arranged below the mounting seat, and the polishing mechanism is driven by the transverse movement of the mounting seat to be close to the inner wall or the outer wall of an annular silicon carbide sealing element; the top of the supporting table is provided with a rotating disc which is driven by a power device and rotates around the axis of the rotating disc. The rotating disc is provided with four supporting columns evenly distributed around the axis of the rotating disc at intervals. The polishing wheel is driven to be close to the inner wall or the outer wall of the annular silicon carbide sealing element through transverse movement of the mounting base, the polishing wheel is driven to rotate through the polishing motor to polish the silicon carbide sealing element, and in the polishing process, the polishing wheel is driven to move up and down through stretching of the air cylinder so as to change the polishing part. And the turntable drives the silicon carbide sealing element to rotate to expand the polishing range, so that the inner wall or the outer wall of the silicon carbide sealing element can be conveniently polished according to requirements.

Description

Technical Field

[0001] This utility model relates to the field of polishing equipment, specifically to a surface finishing machine for silicon carbide products. Background Technology

[0002] Silicon carbide, also known as silicon carbide stone, is produced by smelting raw materials such as quartz sand, petroleum coke (or coal coke), and sawdust (salt needs to be added when producing green silicon carbide) at high temperatures in an electric resistance furnace. Silicon carbide has stable chemical properties, high thermal conductivity, low coefficient of thermal expansion, and good wear resistance, therefore it is widely used in various fields.

[0003] Silicon carbide seals are components used to prevent fluid or solid particles from leaking between adjacent mating surfaces and to prevent external impurities (such as dust and moisture) from entering the interior of machinery and equipment. To improve the flatness of silicon carbide seals, polishing is required. In the prior art, utility model patent application number CN201921818113.7 discloses a high-strength silicon carbide seal surface polishing machine. The upper part of the support platform is equipped with a support frame and two sets of upright plates. An electric push rod is installed on the side of the upright plate, and a pressure block is installed at the output end of the electric push rod. A motor is installed on the side of the support frame via a motor mount. A drive shaft is installed at the output end of the motor via a coupling. A first threaded rod is symmetrically installed on the outer side of the drive shaft. A sleeve is threadedly connected to the outer side of the first threaded rod, and a second threaded rod is threadedly connected to the inner side of the sleeve. A connecting block is installed at the end of the second threaded rod, and a polishing abrasive block is installed on the side of the connecting block.

[0004] When using the above-mentioned polishing machine, the annular silicon carbide seal to be polished is placed on the outside of the polishing abrasive block. The electric push rod drives the pressure block to press on the outside of the annular silicon carbide seal, thereby fixing the annular silicon carbide seal. Then, the motor drives the polishing abrasive block to rotate, thereby polishing annular silicon carbide seals with different inner diameters.

[0005] However, the above polishing method can only polish the inner wall of the annular silicon carbide seal, and cannot polish the outer wall of the annular silicon carbide seal, which cannot meet different processing requirements and needs to be improved. Utility Model Content

[0006] The purpose of this invention is to provide a vacuum drying oven for purifying silicon carbide blanks, which can polish the inner and outer walls of annular silicon carbide seals to solve the defects mentioned in the background art.

[0007] To achieve the above objectives, the present invention provides the following technical solutions:

[0008] A surface finishing machine for silicon carbide products includes a support platform. A mounting frame is fixedly mounted on the top of the support platform. A mounting seat, driven by a power mechanism, moves laterally on the mounting frame. A height-adjustable grinding mechanism is located below the mounting seat. The lateral movement of the mounting seat causes the grinding mechanism to approach the inner or outer wall of an annular silicon carbide seal. A turntable, driven by a power device and rotating around its own axis, is located on the top of the support platform. The axis of the turntable extends vertically. Four support columns, evenly spaced around the axis, extend vertically on the turntable. An adjustment mechanism on the turntable is used to move the support columns radially. The four support columns move radially inward along the turntable to clamp the outer wall of the silicon carbide seal, or move radially outward along the turntable to press against the inner wall of the silicon carbide seal. The support columns have stepped surfaces for supporting the bottom of the silicon carbide seal.

[0009] As a further improvement, the top of the turntable is provided with two parallel slide rails, which are symmetrically arranged along one diameter of the turntable. The two slide rails are driven by a bidirectional screw to move closer or further apart from each other. Two opposing sliders are slidably installed inside the slide rails, and a support column is fixedly installed on the top of each slider. A lifting plate is also provided above the turntable, which has multiple vertically penetrating slots. The length direction of the slots extends radially along the turntable, and each slot corresponds to a support column. The multiple slots are evenly spaced around the axis of the turntable, and the lower end of each support column is movably installed in the corresponding slot.

[0010] As a further improvement, the lifting plate is driven by a power unit and slidably mounted vertically on the turntable.

[0011] As a further improvement, slides are fixedly installed on the bottom of the lifting plates on both sides of the width of the strip hole. The slides extend along the length of the strip hole, and a baffle for sealing the strip hole is installed between the two slides. The baffle is provided with a positioning hole, and the lower end of the corresponding support column is sleeved in the positioning hole.

[0012] As a further improvement, a rubber sleeve is fitted on the outer side of the upper end of the support column.

[0013] Compared with the prior art, the beneficial effects of the present invention are:

[0014] 1. The lateral movement of the mounting base drives the polishing wheel to approach the inner or outer wall of the annular silicon carbide seal. The polishing motor drives the polishing wheel to rotate and polish the silicon carbide seal. During the polishing process, the extension and retraction of the cylinder drives the polishing wheel to move up and down to change the polishing position. The turntable drives the silicon carbide seal to rotate and expand the polishing range, so as to facilitate the polishing of the inner or outer wall of the silicon carbide seal according to the requirements.

[0015] 2. When the inner wall of the silicon carbide seal needs to be polished, the four support columns clamp the outer wall of the silicon carbide seal, or when the outer wall of the silicon carbide seal needs to be polished, the four support columns press against the inner wall of the silicon carbide seal, thereby avoiding interference between the support columns and the polishing wheel.

[0016] 3. After the thin column at the upper end of the support column has finished clamping and fixing the silicon carbide seal, the electric push rod retracts to drive the lifting plate to descend, and the bottom of the silicon carbide seal is suspended in the air. This avoids the polishing wheel from colliding with the lifting plate when it moves up and down, and increases the range of downward movement of the polishing wheel. The polishing wheel can then perform more comprehensive polishing on the inner or outer wall of the silicon carbide seal.

[0017] 4. When the support column moves radially along the turntable, it drives the baffle to move synchronously. The baffle blocks the bottom of the strip hole, thereby preventing the waste generated by grinding from falling down into the slide rail or guide rail through the strip hole. Attached Figure Description

[0018] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0019] Figure 1 This is a structural schematic diagram of an embodiment of the present utility model;

[0020] Figure 2 This is a schematic diagram of the support platform according to an embodiment of the present utility model;

[0021] Figure 3 This is a schematic diagram of the turntable structure according to an embodiment of the utility model;

[0022] Figure 4 This is a three-dimensional schematic diagram of the turntable implemented in this utility model;

[0023] Figure 5 This is an exploded view of the turntable according to the present invention;

[0024] Figure 6This is a schematic diagram of the structure of the bottom of the lifting plate according to the present invention;

[0025] Figure 7 This is a schematic diagram of the support column implemented in this utility model.

[0026] In the diagram: 1-Support platform; 2-Mounting bracket; 3-Mounting seat; 4-Slide rod; 5-Screw rod; 6-Drive motor; 7-Cylinder; 8-Grinding motor; 9-Polishing wheel; 10-Silicon carbide seal; 11-Turntable; 12-Support column; 13-Thin column; 14-Coarse column; 15-Step surface; 16-Slide rail; 17-Double-actuated screw; 18-Guide rail; 19-Slide seat; 20-Nut; 21-Slider; 22-Lifting plate; 23-Strip hole; 24-Guide rod; 25-Sleeve; 26-Electric push rod; 27-Slide track; 28-Baffle; 29-Positioning hole; 30-Rubber sleeve; 31-Rotary motor; 32-Support seat. Detailed Implementation

[0027] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0028] like Figures 1 to 7 As shown, the silicon carbide product surface finishing machine includes a support platform 1. A mounting frame 2 is fixedly mounted on the top of the support platform 1. The mounting frame 2 has two vertical arms arranged opposite each other. The lower ends of the vertical arms are fixedly mounted to the support platform 1 by bolts, and a crossbeam is fixedly mounted between the upper ends of the two vertical arms by bolts. A mounting seat 3, driven by a power mechanism, is mounted on the mounting frame 2 and moves laterally. A laterally extending slide rod 4 is fixedly mounted between the two vertical arms of the mounting frame 2 by bolts. The mounting seat 3 is slidably mounted on the slide rod 4. A laterally extending lead screw 5 is also provided between the two vertical arms of the mounting frame 2. The left end of the lead screw 5 is rotatably connected to the left vertical arm via a bearing, and the right end is connected to the rotating shaft of a drive motor 6 via a coupling. The drive motor 6 is bolted to the right vertical arm, and the mounting seat 3 is threadedly connected to the lead screw 5. The drive motor 6 drives the lead screw 5 to rotate, which in turn drives the mounting seat 3 to move left and right along the slide rod 4.

[0029] The mounting base 3 is equipped with a height-adjustable grinding mechanism. Specifically, the bottom of the mounting base 3 is bolted with a cylinder 7 whose piston rod extends downward. The lower end of the piston rod of the cylinder 7 is bolted with a grinding motor 8 whose rotating shaft extends downward. A polishing wheel 9 is fixedly mounted on the rotating shaft of the grinding motor 8.

[0030] In practical use, the polishing wheel 9 is first moved to the inner or outer wall of the annular silicon carbide seal 10 by the lateral movement of the mounting base 3. The polishing wheel 9 is rotated by the grinding motor 8 to polish the silicon carbide seal 10. During the polishing process, the polishing wheel 9 is moved up and down by the extension and retraction of the cylinder 7 to change the polishing position.

[0031] The top of the support platform 1 is equipped with a turntable 11 driven by a power device and rotating around its own axis. The axis of the turntable 11 extends vertically. A rotary motor 31 is installed inside the support platform 1, and the rotation axis of the rotary motor 31 extends upward to the top of the support platform 1. The turntable 11 is coaxially fixed to the rotation axis of the rotary motor 31 by bolts. When polishing the silicon carbide seal 10, the silicon carbide seal 10 is placed above the turntable 11 and clamped and fixed. During the polishing process of the polishing wheel 9 polishing the silicon carbide seal 10, the turntable 11 drives the silicon carbide seal 10 to rotate, thereby expanding the polishing range of the silicon carbide seal 10.

[0032] like Figure 3 and Figure 4 As shown, the turntable 11 is provided with four support columns 12 evenly spaced around its axis. The support columns 12 extend vertically. The turntable 11 is provided with an adjustment mechanism for driving the support columns 12 to move radially along the turntable 11. The four support columns 12 move radially inward along the turntable 11 to clamp the outer wall of the silicon carbide seal 10, or the four support columns 12 move radially outward along the turntable 11 to press against the inner wall of the silicon carbide seal 10.

[0033] In practical use, when it is necessary to polish the inner wall of the silicon carbide seal 10, the silicon carbide seal 10 is placed inside the four support columns 12. The adjustment mechanism drives the four support columns 12 to move radially inward along the turntable 11 to clamp the outer wall of the silicon carbide seal 10, thereby achieving clamping and fixing of the silicon carbide seal 10. The clamping of the outer wall of the silicon carbide seal 10 by the four support columns 12 can avoid interference between the support columns 12 and the polishing wheel 9 when polishing the inner wall of the silicon carbide seal 10.

[0034] When the outer wall of the silicon carbide seal 10 needs to be polished, the silicon carbide seal 10 is placed outside the four support columns 12. The adjustment mechanism drives the four support columns 12 to move outward along the radial direction of the turntable 11 and press against the inner wall of the silicon carbide seal 10 to achieve clamping and fixing of the silicon carbide seal 10. The four support columns 12 pressing against the inner wall of the silicon carbide seal 10 can avoid interference between the support columns 12 and the polishing wheel 9 when polishing the outer wall of the silicon carbide seal 10.

[0035] The support column 12 has a thin column 13 with a smaller diameter at the upper end and a thick column 14 with a larger diameter at the lower end. The thin column 13 is used to clamp and fix the inner or outer wall of the silicon carbide seal 10. The upper end of the thick column 14 is provided with a stepped surface 15. When clamping and fixing the silicon carbide seal 10, the bottom of the silicon carbide seal 10 is supported by the stepped surface 15, thereby preventing the silicon carbide seal 10 from moving downward.

[0036] like Figure 5 As shown, the top of the turntable 11 is provided with two parallel slide rails 16, which are symmetrically arranged along one diameter of the turntable 11. The two slide rails 16 are driven by a bidirectional screw 17 to move closer or further apart. The top of the turntable 11 is fixed with two parallel guide rails 18, which are symmetrically arranged along one diameter of the turntable 11 and perpendicular to the slide rails 16. The bottom of the slide rails 16 is fixed with a matching slide block 19, which provides guidance for the movement of the slide rails 16. The top of the turntable 11 is also fixed with two opposing support seats 32, which are fixed with bolts. The two ends of the bidirectional screw 17 are rotatably mounted on the two support seats 32 through bearings. The bidirectional screw 17 is parallel to the guide rails 18, and the outer side of the bidirectional screw 17 is symmetrically provided with two external threads with opposite directions of rotation. The bottom of the two slide rails 16 is fixed with nuts 20, which are screwed onto the external threads of the bidirectional screw 17 with opposite directions of rotation. Rotating the bidirectional screw 17 in a specific direction causes the two slide rails 16 to move closer to each other along the guide rail 18, or rotating the bidirectional screw 17 in the opposite direction causes the two slide rails 16 to move further apart along the guide rail 18.

[0037] Two opposing sliders 21 are slidably mounted inside the slide rail 16. A support column 12 is fixedly mounted on the top of each slider 21, and the thick column 14 at the lower end of the support column 12 is welded or embedded in the slider 21. A lifting plate 22 is also provided above the turntable 11. The lifting plate 22 is circular and coaxial with the turntable 11. The lifting plate 22 has multiple vertically penetrating slots 23. The length direction of the slots 23 extends radially along the turntable 11. The slots 23 correspond one-to-one with the support columns 12. The multiple slots 23 are evenly spaced around the axis of the turntable 11. The lower end of the support column 12 is movably installed in the corresponding slot 23.

[0038] Specifically, when the two slide rails 16 approach each other along the guide rail 18, they drive the four support columns 12 to move inward along the strip hole 23, and the diameter of the circle formed by the four support columns 12 becomes smaller, thereby clamping the outer wall of the silicon carbide seal 10 through the four support columns 12; when the two slide rails 16 move away from each other along the guide rail 18, they drive the four support columns 12 to move outward along the strip hole 23, and the diameter of the circle formed by the four support columns 12 becomes larger, thereby pressing the inner wall of the silicon carbide seal 10 through the four support columns 12.

[0039] The lifting plate 22 is driven by a power unit and is vertically slidably mounted on the turntable 11. A vertically extending guide rod 24 is welded to the bottom of the lifting plate 22, and a vertically extending sleeve 25 is welded to the top of the turntable 11. The guide rod 24 is vertically slidably mounted inside the sleeve 25 to provide guidance for the lifting plate 22. The power unit is specifically an electric push rod 26 that is bolted to the top of the turntable 11. The telescopic rod of the electric push rod 26 extends downward and passes through the turntable 11 and is fixedly connected to the turntable 11 or the support base 32 by bolts. In practical use, before clamping the silicon carbide seal 10, the electric push rod 26 extends to raise the lifting plate 22, keeping the top of the lifting plate 22 flush with the stepped surface 15 on the support column 12. This allows the lifting plate 22 to support the silicon carbide seal 10, and the thin column 13 at the upper end of the support column 12 to clamp and fix the silicon carbide seal 10. After the thin column 13 at the upper end of the support column 12 has finished clamping and fixing the silicon carbide seal 10, as... Figure 3 As shown, the electric push rod 26 retracts to drive the lifting plate 22 to descend, and the bottom of the silicon carbide seal 10 is suspended, thereby avoiding the polishing wheel 9 from colliding with the lifting plate 22 when it moves up and down. This increases the range in which the polishing wheel 9 can move downward, and allows for more comprehensive polishing of the inner or outer wall of the silicon carbide seal 10 by the polishing wheel 9.

[0040] like Figure 6 As shown, slide rails 27 are welded to the bottom of the lifting plates 22 on both sides of the width of the slot 23. The slide rails 27 extend along the length of the slot 23. A baffle 28 for sealing the slot 23 is installed between the two slide rails 27. The baffle 28 is provided with a positioning hole 29, and the thick column 14 at the lower end of the corresponding support column 12 is fitted into the positioning hole 29. When the support column 12 moves radially along the turntable 11, it drives the baffle 28 to move synchronously, and the bottom of the slot 23 is sealed by the baffle 28, thereby preventing the waste generated by grinding from falling down into the slide rail 16 or guide rail 18 through the slot 23.

[0041] like Figure 7 As shown, in order to prevent the support column 12 from damaging the silicon carbide seal 10 and to increase the friction between the support column 12 and the silicon carbide seal 10, a rubber sleeve 30 is provided on the outer side of the thin column 13 at the upper end of the support column 12.

[0042] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely preferred examples and are not intended to limit the utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model. The scope of protection of this utility model is defined by the appended claims and their equivalents.

Claims

1. A surface finishing machine for silicon carbide products, characterized in that: The device includes a support platform, on the top of which is a mounting frame. The mounting frame has a mounting seat that moves laterally, driven by a power mechanism. Below the mounting seat is a height-adjustable grinding mechanism. The lateral movement of the mounting seat causes the grinding mechanism to approach the inner or outer wall of the annular silicon carbide seal. The top of the support platform has a turntable driven by a power device and rotating around its own axis. The axis of the turntable extends vertically. Four support columns are evenly spaced around the turntable's axis. The support columns extend vertically. The turntable has an adjustment mechanism for moving the support columns radially. The four support columns move radially inward along the turntable to clamp the outer wall of the silicon carbide seal, or move radially outward along the turntable to press against the inner wall of the silicon carbide seal. The support columns have stepped surfaces for supporting the bottom of the silicon carbide seal.

2. The silicon carbide product surface finishing machine as described in claim 1, characterized in that: The top of the turntable is provided with two parallel slide rails, which are symmetrically arranged along one diameter of the turntable. The two slide rails are driven by a bidirectional screw to move closer or further apart from each other. Two opposing sliders are slidably installed inside the slide rails, and a support column is fixedly installed on the top of each slider. A lifting plate is also provided above the turntable. The lifting plate has multiple vertically penetrating strip holes, the length of which extends radially along the turntable. Each strip hole corresponds to a support column, and the multiple strip holes are evenly spaced around the axis of the turntable. The lower end of each support column is movably installed in the corresponding strip hole.

3. The silicon carbide product surface finishing machine as described in claim 2, characterized in that: The lifting plate is driven by a power unit and is vertically slidably mounted on the turntable.

4. The silicon carbide product surface finishing machine as described in claim 2, characterized in that: Slides are fixedly installed on the bottom of the lifting plates on both sides of the width of the strip hole. The slides extend along the length of the strip hole. A baffle for sealing the strip hole is installed between the two slides. The baffle is provided with a positioning hole, and the lower end of the corresponding support column is sleeved in the positioning hole.

5. The silicon carbide product surface finishing machine as described in claim 1, characterized in that: A rubber sleeve is fitted on the outer side of the upper end of the support column.

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