Transfer mechanism of photoetching machine

Abstract

The utility model discloses a transfer mechanism of a photoetching machine. The transfer mechanism comprises a slide rail seat, a linear motion assembly and an end effector, a multi-shaft sliding table is slidably installed on the surface of the sliding rail base, a plurality of shaft lugs are fixedly installed on the bottom face of the multi-shaft sliding table, the two ends of the linear motion assembly are movably connected with the surfaces of the end effector and the shaft lugs correspondingly, and the linear motion assembly and the shaft lugs are distributed on the periphery of the end effector in the circumferential direction. The linear motion assembly comprises a driving base, a motor, a lead screw shaft and a linear sliding rod, and linkage rods connected with the ends of the shaft lugs are arranged on the two sides of the driving base. According to the utility model, the multi-degree-of-freedom accurate control of the end effector is realized through the linear motion assembly and the sliding guide structure of the linear motion assembly, and the problem of wafer falling or displacement is effectively avoided in combination with a vacuum adsorption structure. The system monitors displacement and attitude information in real time through a position sensor and an angle sensor, and feeds back data to a control system, so that the accuracy and stability of the transfer action are ensured.

Description

TECHNICAL FIELD

[0001] The utility model relates to a transfer mechanism technical field, concretely is a photoetching machine transfer mechanism. BACKGROUND

[0002] The transfer mechanism of the photoetching machine currently usually adopts linear sliding platform or single multi-axis mechanical arm to carry out wafer transmission and positioning. Linear sliding platform completes linear transmission of wafer through the driving slider of linear motor, and multi-axis mechanical arm utilizes the rotation of multiple joints to realize the handling and alignment of wafer from starting position to target position. Although these traditional technical schemes can complete the wafer transfer task to a certain extent, but there are still deficiencies in complex motion trajectory, multi-degree-of-freedom control and high-precision positioning.

[0003] The traditional linear sliding platform is limited by its single linear motion form, and cannot meet the demand of multi-direction and multi-attitude adjustment of wafer in complex photoetching machine process. Although the multi-axis mechanical arm has certain motion flexibility, its structure is complex, motion control precision is limited, and shaking and instability phenomenon is prone to appear in the motion process. In addition, these schemes often adopt single-point adsorption or low-efficiency vacuum adsorption mode in the adsorption and fixation process of wafer, cannot ensure the stability of wafer in high dynamic transfer, and there is the risk of wafer falling or displacement. Overall, the traditional transfer mechanism is deficient in high degree of freedom, multi-precision and stability, and is difficult to meet the requirements of modern photoetching process on efficient and reliable transfer.

[0004] The utility model aims at the above -mentioned problem, through setting up the linear motion subassembly and the sliding guide design of multiple degrees of freedom, realized the high-precision motion control of end effector, and combined with stable vacuum adsorption structure, can complete the firm adsorption and accurate positioning of wafer in complex motion trajectory, effectively avoid wafer falling or displacement problem, significantly promoted the performance and reliability of photoetching machine transfer mechanism. CONTENT OF UTILITY MODEL

[0005] The utility model aims at solving the technical problems in prior art or related art.

[0006] The utility model discloses a slide rail seat, linear motion subassembly and end effector, the surface of slide rail seat is slidably installed with multiaxis sliding table, the bottom surface fixed mounting of multiaxis sliding table is with several shaft ears, the both ends of linear motion subassembly are connected with the surface of end effector and shaft ear, and linear motion subassembly and shaft ear are circularly distributed on the outer periphery of end effector, linear motion subassembly includes drive seat, motor, screw shaft and linear slide bar, the both sides of drive seat are equipped with the linkage rod connected with the end of shaft ear, the surface of linear slide bar is equipped with the slide bar slidably sleeved in the inside of linkage rod, the inside rotation of drive seat is installed with screw shaft, the surface of motor is fixed in drive seat and is used for driving the rotation of screw shaft, the surface of linear slide bar is screwed on screw shaft, the other end of slide bar is movably connected with the surface of end effector, and end effector includes fixed shaft seat, movable shaft platform and sucking disc, and the inside of fixed shaft seat and movable shaft platform is equipped with rudder respectively for driving movable shaft platform and sucking disc rotation servo.

[0007] By adopting the above technical scheme, the utility model discloses the linear motion subassembly and circular distribution structure of linear motion subassembly, realize the multi-degree-of-freedom motion control of end effector, satisfy the demand of complex motion trajectory and accurate positioning in the process of photolithography machine removal.

[0008] The utility model discloses a further configuration in a preferable example can be further configured as: the surface of shaft ear and fixed shaft seat is equipped with the ball head rod connected with linear motion subassembly, and the end of linkage rod and slide bar is equipped with the ball sleeve head for connecting with ball head rod.

[0009] By adopting the above technical scheme, the utility model discloses the connecting structure of ball head rod and ball sleeve head, realize the free deflection motion of linear motion subassembly, thereby effectively control the position and direction of end effector, improve the motion flexibility and attitude adjustment precision.

[0010] The utility model discloses a further configuration in a preferable example can be further configured as: the screw shaft, slide bar and linkage rod are mutually parallel arrangement, and the outer periphery of slide bar and the inside of linkage rod are slidably connected.

[0011] By adopting the above technical scheme, the utility model discloses the stable linear motion of linear slide bar through the sliding guide of slide bar and the driving effect of screw shaft, improve the stability of overall motion, avoid the risk of falling caused by unstable motion in the process of wafer adsorption.

[0012] The utility model discloses a further configuration in a preferable example can be further configured as: the sucking disc is vacuum sucking disc structure, and the surface of sucking disc is equipped with several adsorption holes and evenly distributes.

[0013] By adopting the above technical scheme, the utility model discloses the firm adsorption of wafer through the vacuum adsorption structure of sucking disc, effectively prevent the falling and displacement of wafer in the process of high -speed removal.

[0014] The utility model discloses in a preferable example can be further configured as: the fixed axle seat and the inside rudder of movable axle platform are servo motor structure, and two rudders are arranged mutually perpendicular direction.

[0015] Through adopting above-mentioned technical scheme, the utility model discloses through the biaxial arrangement design of servo motor drive, realizes the multidirectional accurate adjustment of end effector, further promotes the flexibility and accuracy of shift action.

[0016] The utility model discloses in a preferable example can be further configured as: the bottom surface of multi -shaft sliding table is equipped with the limiting assembly for limiting linear motion subassembly rotation range respectively, the limiting assembly includes the limiting block and limiting sensor fixed in the axle ear both ends.

[0017] Through adopting above-mentioned technical scheme, the utility model discloses through limiting assembly limit the motion range of linear motion subassembly, avoids its occurrence over range motion, improved the security and reliability of shift mechanism operation.

[0018] The utility model discloses in a preferable example can be further configured as: the inside of end effector is equipped with position sensor and angle sensor, is used for detecting the displacement and deflection attitude of end effector and is fed back to control system.

[0019] Through adopting above-mentioned technical scheme, the utility model discloses through sensor real -time monitoring the displacement and angle information of end effector, has provided accurate attitude feedback for system, has guaranteed the accuracy and stability of shift action.

[0020] The utility model discloses the beneficial effect that has obtained is:

[0021] 1. In the utility model, through setting up multi -shaft sliding table and multiple axle ears on slide rail seat, combine linear motion subassembly and the structure of circular distribution of linear motion subassembly, realize the multidimensional motion control of end effector, can satisfy the demand of complex motion trajectory and accurate positioning in the shift process of photolithography machine.

[0022] 2. In the utility model, combine the sliding guide design of slide rod, not only realize the free deflection motion of linear motion subassembly, still improved the positioning accuracy and attitude adjustment stability of end effector in any direction, and combine suction disc structure, realized the firm adsorption of wafer, effectively avoided wafer drop or displacement problem in the shift process. DETAILED DESCRIPTION

[0023] Figure 1 It is the whole structure schematic diagram of an embodiment of the utility model;

[0024] Figure 2This is a schematic diagram of a multi-axis slide structure according to an embodiment of the present invention;

[0025] Figure 3 This is a schematic diagram of the linear motion component and end effector structure according to an embodiment of the present invention;

[0026] Figure 4 This is an exploded structural diagram of a linear motion component according to an embodiment of the present invention;

[0027] Figure 5 This is a schematic diagram of the end effector structure according to one embodiment of the present invention.

[0028] Figure label:

[0029] 100, slide rail base; 110, multi-axis slide table; 111, shaft lug; 200, linear motion assembly; 210, drive base; 220, motor; 230, lead screw shaft; 240, linear slide bar; 211, connecting rod; 241, slide bar; 300, end effector; 310, fixed shaft base; 320, moving shaft table; 330, suction cup. Detailed Implementation

[0030] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to specific embodiments and accompanying drawings. It should be noted that, unless otherwise specified, the embodiments and features of the present utility model can be combined with each other.

[0031] It should be understood that these descriptions are merely exemplary and are not intended to limit the scope of this invention.

[0032] The following is in conjunction with the appendix Figures 1-5 This invention describes a lithography machine transfer mechanism provided by some embodiments of the present invention.

[0033] Example 1

[0034] The utility model discloses a slide rail seat 100, linear motion subassembly 200 and end effector 300. The surface of slide rail seat 100 is slidably installed with multi -shaft sliding table 110, and the bottom of multi -shaft sliding table 110 is fixedly installed with several shaft ears 111, and the both ends of linear motion subassembly 200 are respectively connected with the surface of end effector 300 and shaft ear 111, and linear motion subassembly 200 and shaft ear 111 are distributed in the circumference of end effector 300 in the circumferential direction.

[0035] End effector 300 includes fixed shaft seat 310, movable shaft table 320 and suction cup 330, and the inner side of fixed shaft seat 310 and movable shaft table 320 is respectively provided with a rudder for driving movable shaft table 320 and suction cup 330 to rotate, and the suction cup 330 is a vacuum suction cup structure, and the surface is uniformly distributed with several adsorption holes. The bottom of multi -shaft sliding table 110 is respectively provided with a limiting assembly for limiting the movement range of linear motion subassembly 200, and the limiting assembly includes a limiting block and a limiting sensor fixed to the both ends of shaft ear 111.

[0036] In actual work, the screw shaft 230 of linear motion subassembly 200 is driven to rotate by motor 220, drives linear slide rod 240 to move in screw along the surface of screw shaft 230, so that end effector 300 realizes stable linear motion. At the same time, the sliding sleeve structure of connecting rod 211 and slide rod 241 realizes the guidance constraint of linear motion subassembly 200, prevents the instability phenomenon caused by deflection motion. The rudder of fixed shaft seat 310 and movable shaft table 320 drives the multidirectional motion of end effector 300, detects the displacement and angle information of end effector 300 in real time through the sensor and feeds back to the control system, ensures the accuracy and stability of the moving action.

[0037] Example two

[0038] In this embodiment, the structure of example one is expanded and optimized as follows:

[0039] Multi-angle motion enhancement

[0040] The multi-angle adjustment module is added to the bottom surface of the multi-axis sliding table 110, the module is connected with the adjustable support of the shaft lug 111, linear motion assembly 200 is installed at different angles to adapt to the wafer transfer requirement under special working conditions.

[0041] Vacuum adsorption function optimization

[0042] The vacuum pipe is connected in the suction cup 330, the vacuum pipe is connected with the external vacuum pump, and the vacuum pressure sensor is added in the vacuum pipe, which is used for real-time detection of adsorption pressure, and ensures the stability of adsorption.

[0043] Precise position feedback

[0044] The position sensor is added to the inside of the screw shaft 230, which is used for detecting the displacement of the linear slide rod 240, and the angle sensor on the end effector 300 is combined to realize accurate monitoring of the transfer path.

[0045] Automatic calibration function

[0046] The automatic calibration device is added to the surface of the sliding rail seat 100, the initial position of the multi-axis sliding table 110 and the initial attitude of the end effector 300 are detected, the automatic calibration of the system is realized, and the starting state of each transfer process is ensured.

[0047] Extended description

[0048] In special working conditions, for example, cross-platform transfer operation, the linear motion assembly 200 can be designed as a larger range of telescopic motion form, the effective stroke of the screw shaft 230 and the linear slide rod 240 is lengthened, and the larger span transfer requirement is met.

[0049] For the scene with high cleanliness requirement, the dust cover plate is added to the surface of the end effector 300, the cover plate covers the adsorption hole when not in use, and effectively avoids the influence of external particle pollution on the wafer surface.

[0050] The utility model discloses through the above two embodiments, respectively show the function and extension function of basic structure in different scenes Application, realized multi-degree of freedom, high precision and high stability wafer transfer control.Through the optimization design of end adsorption structure and guide assembly, the stability of the system in high-speed dynamic operation is ensured, and the sensing and calibration module is further improved the transfer precision, meets the rigorous requirement of modern photolithography process to wafer transfer.

[0051] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "a specific embodiment", and the like means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily mean the same embodiment or example. Furthermore, the described specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner.

[0052] Although the embodiments of the present application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present application, and the scope of the present application is defined by the claims and their equivalents.

Claims

1. A lithography machine transfer mechanism, characterized by, Include: Slide rail seat (100), linear motion assembly (200) and end effector (300), the surface of the slide rail seat (100) is slidingly installed with a multi-axis slide (110), the bottom surface of the multi-axis slide (110) is fixedly installed with a plurality of shaft ears (111), the two ends of the linear motion assembly (200) are movably connected with the end effector (300) and the surface of the shaft ear (111), and the linear motion assembly (200) and the shaft ear (111) are distributed in the circumferential direction of the outer periphery of the end effector (300), the linear motion assembly (200) includes a drive seat (210), a motor (220), a screw shaft (230) and a linear slide rod (240), the two sides of the drive seat (210) are provided with a connecting rod (211) connected with the end of the shaft ear (111), the surface of the linear slide rod (240) is provided with a slide rod (241) slidingly sleeved on the inner side of the connecting rod (211), the inner side of the drive seat (210) is rotatably installed with the screw shaft (230), the motor (220) is fixed on the surface of the drive seat (210) for driving the screw shaft (230) to rotate, the linear slide rod (240) is threadedly sleeved on the surface of the screw shaft (230), the other end of the slide rod (241) is movably connected with the surface of the end effector (300), the end effector (300) includes a fixed shaft seat (310), a movable shaft table (320) and a suction cup (330), and the inner sides of the fixed shaft seat (310) and the movable shaft table (320) are respectively provided with a rudder for driving the movable shaft table (320) and the suction cup (330) to rotate.

2. The transfer mechanism of claim 1, wherein The surfaces of the shaft ear (111) and the fixed shaft seat (310) are provided with a ball head rod connected with the linear motion assembly (200), and the ends of the connecting rod (211) and the slide rod (241) are provided with a ball socket head for connecting with the ball head rod.

3. The transfer mechanism of claim 1, wherein The screw shaft (230), the slide rod (241) and the connecting rod (211) are arranged in parallel, and the outer periphery of the slide rod (241) is in sliding abutment with the inner side of the connecting rod (211).

4. The transfer mechanism of claim 1, wherein The suction cup (330) is a vacuum suction cup structure, and the surface of the suction cup (330) is provided with a plurality of adsorption holes and is uniformly distributed.

5. The photolithography transfer mechanism according to claim 1, wherein The rudders in the inner sides of the fixed shaft seat (310) and the movable shaft table (320) are servo motor structures, and the two rudders are arranged in perpendicular directions.

6. The photolithography transfer mechanism according to claim 1, wherein The bottom surface of the multi-axis slide (110) is respectively provided with a limiting component for limiting the rotation range of the linear motion assembly (200), the limiting component includes a limiting block fixed on both ends of the shaft ear (111) and a limiting sensor.

7. The photolithography machine transfer mechanism according to claim 1, wherein, The inner side of the end effector (300) is provided with a position sensor and an angle sensor for detecting the displacement and deflection posture of the end effector (300) and feeding back to the control system.

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