Vacuum protection device for wafer detection

Abstract

The utility model relates to a wafer detection vacuum protection device, which comprises a detection machine table, a main pipeline, a pressure detector, a branch pipe, a vacuum pump start-stop controller, a vacuum pump, a vacuum tank and a main pipeline, the microscope vacuum tube is connected with the main pipeline through the main pipeline, the pressure detector is connected to the main pipeline, and the main pipeline is provided with a first one-way valve. The vacuum pump start-stop controller is electrically connected with the pressure detector and the vacuum pump respectively; the vacuum tank is connected with a vacuum pump. The utility model has the advantages that the two one-way valves control the flow direction of gas, thereby preventing the gas tightness problem from the detection machine to the main pipeline and the vacuum tank, and preventing the absolute value of negative pressure in the pipeline from becoming small; the pressure detector monitors a negative pressure value in the main pipeline in real time, and the vacuum pump is started and stopped according to a detection value, so that the main pipeline is assisted to supply pressure to the detection machine table, the negative pressure in the microscope vacuum tube is always kept in a stable range, and a wafer is prevented from falling off and being broken due to unstable negative pressure when the wafer is in a suspended inspection state.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor testing technology, and in particular to a wafer inspection vacuum protection device. Background Technology

[0002] In the field of wafer testing, the back side and edges of wafers need to be inspected. The wafers are suspended on the microscope testing machine, typically requiring a vacuum line to maintain this suspended state under negative pressure. However, minor sealing issues in the vacuum line are difficult to detect, and when a vacuum anomaly occurs, the pressure inside the line approaches the critical vacuum point, requiring manual intervention on the production line. Delayed intervention can easily lead to wafer detachment and breakage. Furthermore, insufficient negative vacuum pressure prevents the machine from automatically returning the wafer, and manual removal further increases the risk of damage.

[0003] Therefore, it is necessary to further improve the structure of the negative pressure pipeline device of the existing wafer testing equipment to solve the problem of unstable negative pressure in the vacuum pipeline. Utility Model Content

[0004] The purpose of this invention is to provide a wafer inspection vacuum protection device that can effectively prevent wafer detachment caused by insufficient negative pressure in the negative pressure pipeline.

[0005] To achieve the above-mentioned utility model objectives, this utility model provides a wafer inspection vacuum protection device, including an inspection machine, a main pipeline, a pressure detector, a branch pipeline, a vacuum pump start / stop controller, a vacuum pump, a vacuum tank, and a main pipeline;

[0006] The testing machine is connected to a microscope vacuum tube, which is connected to the main pipeline via the main pipeline. The pressure detector is connected to the main pipeline, and the main pipeline is equipped with a first one-way valve.

[0007] The vacuum pump start / stop controller is electrically connected to the pressure detector and the vacuum pump respectively; the vacuum tank is connected to the vacuum pump, and the vacuum tank is connected to the microscope vacuum tube through the branch pipe, which is equipped with a second one-way valve.

[0008] Preferably, the number of pressure detectors is three.

[0009] As a further improvement to the utility model, it also includes several hand valves, the microscope vacuum tube is connected to the main pipeline and the branch pipeline respectively through the hand valves, the pressure detector is connected to the main pipeline through the hand valves, and the vacuum tank is connected to the vacuum pump through the hand valves.

[0010] This invention relates to a wafer inspection vacuum protection device, which is applied to a wafer inspection machine. The microscope vacuum tube of the inspection machine is connected to a main pipeline and a branch pipeline. The main pipeline is connected to the main pipeline, and the airflow in the main pipeline flows to the main pipeline. A pressure detector monitors the air pressure value of the main pipeline in real time and transmits the detection data to the terminal. When the negative pressure value in the main pipeline does not reach the preset negative pressure value, the terminal sends a command to the vacuum pump start / stop controller based on the data to start the vacuum pump, which flows the gas in the microscope vacuum tube to the vacuum tank, thus assisting the main pipeline and keeping the negative pressure value generated by the microscope on the wafer stable during wafer inspection.

[0011] The advantages of this novel wafer inspection vacuum protection device compared to existing technologies are as follows:

[0012] (1) Two check valves control the gas flow direction to prevent airtightness problems in the main pipeline and vacuum tank from the testing machine, and to avoid the absolute value of negative pressure in the pipeline becoming smaller.

[0013] (2) The pressure detector monitors the negative pressure value in the main pipeline in real time. The vacuum pump starts and stops according to the detection value, thereby assisting the main pipeline to supply pressure to the testing machine, ensuring that the negative pressure in the microscope vacuum tube always remains within a stable range, and preventing the wafer from falling and breaking due to unstable negative pressure when it is suspended for inspection. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the wafer inspection vacuum protection device of this utility model. Detailed Implementation

[0015] The specific embodiments of this utility model will be further described in detail below with reference to the accompanying drawings.

[0016] like Figure 1 As shown, the wafer inspection vacuum protection device of this utility model includes an inspection machine 1, a main pipeline 2, a pressure detector 3, a branch pipe 4, a vacuum pump start / stop controller 5, a vacuum pump 6, a vacuum tank 7, and a main pipeline 8.

[0017] The testing machine 1 is connected to a microscope vacuum tube 11, which is connected to the main pipeline 8 via the main pipeline 2. The pressure detector 3 is connected to the main pipeline 2, which is equipped with a first check valve 21.

[0018] The vacuum pump start / stop controller 5 is electrically connected to the pressure detector 3 and the vacuum pump 6 respectively; the vacuum tank 7 is connected to the vacuum pump 6, and the vacuum tank 7 is connected to the microscope vacuum tube 11 through the branch pipe 4. The branch pipe 4 is equipped with a second one-way valve 41.

[0019] The wafer inspection vacuum protection device of this invention is applied to a wafer inspection machine 1. The microscope vacuum tube 11 of the inspection machine 1 is connected to the main pipeline 2 and the branch pipeline 4. The main pipeline 2 is connected to the main pipeline 8. The airflow in the main pipeline 2 flows to the main pipeline 8. The pressure detector 3 monitors the air pressure value of the main pipeline 2 in real time and transmits the detection data to the terminal. When the negative pressure value in the main pipeline 2 does not reach the preset negative pressure value, the terminal sends a command to the vacuum pump start / stop controller 5 based on the data to start the vacuum pump 6, which flows the gas in the microscope vacuum tube 11 to the vacuum tank 7, thus assisting the main pipeline 2 and keeping the negative pressure value generated by the microscope on the wafer stable during wafer inspection.

[0020] Three pressure detectors 3 are set to improve the accuracy of real-time monitoring of the air pressure value of the main pipeline 2. The input negative pressure of the vacuum tube 11 of the conventional wafer inspection microscope needs to be controlled within the range of <-80 kPa. When the detection value of any two or three pressure detectors 3 is >-85 kPa, it indicates that the negative pressure of the main pipeline 2 is insufficient. The vacuum pump start / stop controller 5 receives the signal and executes the start command, and the vacuum pump 6 runs. When the detection value of any two or three pressure detectors 3 is <-90 kPa, it indicates that the negative pressure of the main pipeline 2 is stable. The vacuum pump start / stop controller 5 receives the signal and executes the stop command, and the vacuum pump 6 goes into standby mode.

[0021] The wafer inspection vacuum protection device of this utility model also includes several hand valves 9. The microscope vacuum tube 11 is connected to the main pipeline 2 and the branch pipeline 4 through the hand valves 9 respectively. The pressure detector 3 is connected to the main pipeline 8 through the hand valves 9. The vacuum tank 7 is connected to the vacuum pump 6 through the hand valves 9. When checking the airtightness of the pipeline, the hand valves 9 facilitate the inspection of the main pipeline 2 or the microscope vacuum tube 11, and also facilitate the replacement of the vacuum tank 7.

[0022] The preferred embodiments of this utility model have been described in detail above, but this utility model is not limited to the embodiments described. Those skilled in the art can make various equivalent modifications or substitutions without departing from the spirit of this utility model, and these equivalent modifications or substitutions are all included within the scope defined by the claims of this application.

Claims

1. A wafer inspection vacuum protection device, characterized in that, Includes testing equipment, main pipeline, pressure detector, branch pipeline, vacuum pump start / stop controller, vacuum pump, vacuum tank, and main pipeline; The testing machine is connected to a microscope vacuum tube, which is connected to the main pipeline via the main pipeline. The pressure detector is connected to the main pipeline, and the main pipeline is equipped with a first one-way valve. The vacuum pump start / stop controller is electrically connected to the pressure detector and the vacuum pump respectively; the vacuum tank is connected to the vacuum pump, and the vacuum tank is connected to the microscope vacuum tube through the branch pipe, which is equipped with a second one-way valve.

2. The wafer inspection vacuum protection device as described in claim 1, characterized in that, The number of pressure detectors is three.

3. The wafer inspection vacuum protection device as described in claim 1, characterized in that, It also includes several hand valves, through which the microscope vacuum tube is connected to the main pipeline and the branch pipeline respectively, the pressure detector is connected to the main pipeline through the hand valve, and the vacuum tank is connected to the vacuum pump through the hand valve.

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