Photoresist volatilization rate measuring device
By designing an automated photoresist evaporation rate measurement device, which uses a motor-driven sprocket and chain system to automatically move silicon wafers, the problem of photoresist spillage and silicon wafer drop caused by worker fatigue is solved, thus improving measurement efficiency and accuracy.
Patent Information
- Application Number
- CN202423052307.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-11
- Publication Date
- 2025-11-18
- Estimated Expiration
- 2034-12-11
AI Technical Summary
During the photoresist evaporation rate measurement process, worker fatigue caused the silicon wafer to become unstable, resulting in photoresist spillage or the silicon wafer falling off, which reduced work efficiency.
A photoresist evaporation rate measuring device was designed. It uses a motor-driven sprocket and chain system to automatically move silicon wafers. Combined with a high-precision weighing scale and a temperature-controlled electric heating element, it realizes automated heating and weighing of silicon wafers, avoiding manual operation.
This technology automates the handling of silicon wafers, preventing photoresist spillage and wafer drop, and improving measurement efficiency and accuracy.
Smart Images
Figure CN223565500U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the photoresist field, concretely, relate to a photoresist volatile rate measuring device. BACKGROUND
[0002] Photoresist, alias photoresist, is the etching film material of the solubility change of the irradiation or radiation of ultraviolet light, electron beam, ion beam, X-ray etc. It is the mixed liquid of photosensitive resin, sensitizer and solvent. In the photoetching process, it is used as the anticorrosive coating material. When the semiconductor material is on the surface processing, if the appropriate selective photoresist is used, the required image can be obtained on the surface.
[0003] Photoresist needs to measure its volatile rate frequently, usually photoresist is daubed on the surface of silicon wafer, then its weight is weighed, then the heating equipment is used to heat the silicon wafer for a certain time, finally its weight is weighed again, then comparison calculation is carried out, and the volatile rate is obtained. In the process, when the staff moves the silicon wafer, it is possible that the staff is tired excessively, and the hand is unstable, thereby causing the photoresist on the silicon wafer to be scattered or the silicon wafer to be dropped, so that the volatile rate needs to be measured again, and the working efficiency is reduced.
[0004] Therefore, we improve it, and propose a photoresist volatile rate measuring device. UTILITY MODEL CONTENT
[0005] The utility model aims at: in view of the existing measurement volatile rate process, when the staff moves the silicon wafer, it is possible that the staff is tired excessively, and the hand is unstable, thereby causing the photoresist on the silicon wafer to be scattered or the silicon wafer to be dropped, so that the volatile rate needs to be measured again, and the working efficiency is reduced.
[0006] In order to realize the above-mentioned utility model purpose, the utility model provides the following technical scheme:
[0007] Photoresist volatile rate measuring device is to improve the above-mentioned problem.
[0008] The application is as follows:
[0009] Including the workstation, high-precision weighing scale body is fixedly installed on the workstation, temperature control electric heating sheet body is also arranged on the workstation, vertical rod is fixedly installed on the workstation, U-shaped rod is fixedly installed on the back of the vertical rod, first sprocket is rotatably connected to the front of the U-shaped rod, motor is fixedly installed on the back of the U-shaped rod, second sprocket is fixedly installed on the output end of the motor, chain is meshingly connected on the first sprocket and the second sprocket, rotating shaft is fixedly installed on the chain, connecting plate is rotatably connected to the rotating shaft, taking rod is fixedly installed on the front of the connecting plate, slide rod is fixedly installed on the inner side wall of the vertical rod, limiting rod is slidably connected on the slide rod, the connecting plate is slidably connected with the limiting rod.
[0010] As a preferred technical scheme of the application, the high-precision weighing scale body comprises a weighing body, a control panel, a display screen and a weighing disc, the control panel and the display screen are arranged on the weighing body, the display screen is located above the control panel, and the weighing disc is arranged on the top of the weighing body.
[0011] As a preferred technical scheme of the application, the temperature control electric heating sheet body comprises a temperature controller, a power line and a silica gel heating sheet, and the temperature controller, the power line and the silica gel heating sheet are electrically connected.
[0012] As a preferred technical scheme of the application, the workstation is fixedly provided with a supporting rod, and a heat conduction rod is fixedly installed on the supporting rod, the silica gel heating sheet is wrapped on the outer wall of the heat conduction rod, and a silicon sheet is placed on the heat conduction rod.
[0013] As a preferred technical scheme of the application, the weighing disc is provided with a placing rack.
[0014] As a preferred technical scheme of the application, a sliding groove is formed in the inner side wall of the limiting rod, sliding blocks are fixedly installed on the two side walls of the connecting plate, and the sliding blocks are matched with the sliding groove.
[0015] As a preferred technical scheme of the application, the workstation is provided with a switch group, and the switch group is electrically connected with the motor.
[0016] Compared with the prior art, the application has the following beneficial effects:
[0017] In the scheme of the application:
[0018] 1. The output end of the motor drives the second sprocket to rotate, the second sprocket drives the chain, the chain drives the shaft, the shaft drives the connecting plate, (the connecting plate moves and drives the limiting rod to move, the limiting rod slides along the sliding rod, when the connecting plate moves to the bend at both ends of the chain, the connecting plate drives the sliding block to slide along the sliding groove on the limiting rod, at this time the connecting plate rotates on the shaft, so that the silicon wafer on the taking rod is stable), the connecting plate drives the taking rod, the taking rod passes through the gap on the shelf, and the silicon wafer on the shelf is taken away, when the shaft on the chain rotates to the other end, the silicon wafer on the taking rod is placed on the heat conduction rod, the taking rod passes through the gap between the heat conduction rods, then the temperature is set by the temperature controller, the silicon heating sheet is heated to heat the heat conduction rod, the heat conduction rod is heated to heat the silicon wafer, after a certain time of heating, the motor is started again (reversing), the taking rod takes the silicon wafer on the heat conduction rod and places it on the shelf, realizing automatic movement of the photoresist on the silicon wafer to the weighing scale and heating equipment, solving the problem that in the prior art, when the worker moves the silicon wafer, it is likely that due to excessive fatigue of the worker, the hand is unstable, resulting in scattering of the photoresist on the silicon wafer, or the silicon wafer is dropped, so that the volatile rate needs to be measured again, reducing the work efficiency. BRIEF DESCRIPTION OF DRAWINGS
[0019] Figure 1 The structure schematic diagram of the photoresist volatile rate measuring device provided by the application is provided.
[0020] Figure 2 The structure schematic diagram of the photoresist volatile rate measuring device provided by the application is provided.
[0021] Figure 3 The structure schematic diagram of the photoresist volatile rate measuring device provided by the application is provided.
[0022] Figure 4 The structure schematic diagram of the photoresist volatile rate measuring device provided by the application is provided.
[0023] Figure 5 The structure schematic diagram of the photoresist volatile rate measuring device provided by the application is provided.
[0024] Figure 6 The structure schematic diagram of the photoresist volatile rate measuring device provided by the application is provided.
[0025] Figure 7 The structure schematic diagram of the photoresist volatile rate measuring device provided by the application is provided.
[0026] Figure 8The back structure of the photoresist volatilization rate measuring device provided in the application is shown in the figure.
[0027] The figure shows:
[0028] 1, workbench; 2, high-precision weighing scale body; 201, weighing body; 202, control panel; 203, display screen; 204, weighing disc; 3, temperature control electric heating sheet body; 301, temperature controller; 302, power cord; 303, silica gel heating sheet; 4, vertical rod; 5, U-shaped rod; 6, first chain wheel; 7, motor; 8, second chain wheel; 9, chain; 10, rotating shaft; 11, connecting plate; 12, taking rod; 13, sliding rod; 14, supporting rod; 15, heat-conducting rod; 16, placing rack; 17, sliding block; 18, sliding groove; 19, silicon wafer; 20, switch group; 21, limiting rod. DETAILED DESCRIPTION
[0029] In order to make the purpose, technical scheme and advantages of the embodiments of the present application clearer, the technical scheme in the embodiments of the present application will be described clearly and completely below with reference to the drawings. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments.
[0030] Therefore, the following detailed description of the embodiments of the present application is not intended to limit the scope of the claimed application, but only represents some embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of the present application.
[0031] It should be noted that the embodiments in the present application and the features and technical solutions in the embodiments can be combined with each other without conflict.
[0032] It should be noted that: similar reference numbers and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.
[0033] In the description of the present application, it should be noted that the terms "upper", "lower", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship commonly used when the product is used, or the orientation or positional relationship commonly understood by those skilled in the art. Such terms are only for the convenience of describing the present application and simplifying the description, and are not intended to indicate or imply that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", etc. are only used for differentiation in description, and cannot be understood as indicating or implying relative importance.
[0034] Embodiment:
[0035] As Figures 1-8 shown, the embodiment proposes a photoresist evaporation rate measuring device, which comprises a workbench 1, a high-precision weighing scale body 2 fixedly installed on the workbench 1 for weighing photoresist; the workbench 1 is also provided with a temperature control electric heating sheet body 3 for heating the photoresist; the workbench 1 is fixedly installed with a vertical rod 4, the back of the vertical rod 4 is fixedly installed with a U-shaped rod 5, the front of the U-shaped rod 5 is rotatably connected with a first chain wheel 6, the back of the U-shaped rod 5 is fixedly installed with a motor 7, the output end of the motor 7 is fixedly installed with a second chain wheel 8, the output end of the motor 7 drives the second chain wheel 8 to rotate, the first chain wheel 6 and the second chain wheel 8 are meshingly connected with a chain 9, the second chain wheel 8 drives the chain 9 to rotate, the chain 9 is fixedly installed with a rotating shaft 10, the chain 9 drives the rotating shaft 10, the rotating shaft 10 is rotatably connected with a connecting plate 11, the rotating shaft 10 drives the connecting plate 11, the front of the connecting plate 11 is fixedly installed with a taking rod 12, the connecting plate 11 drives the taking rod 12, the inner side wall of the vertical rod 4 is fixedly installed with a sliding rod 13, the sliding rod 13 is slidably connected with a limiting rod 21, the connecting plate 11 is slidably connected with the limiting rod 21, the connecting plate 11 moves while driving the limiting rod 21 to move, the limiting rod 21 slides along the sliding rod 13; when the device is used, the photoresist on the silicon wafer 19 can be automatically moved to the weighing scale and the heating equipment, effectively avoiding manual movement of the silicon wafer 19, the staff will be tired due to fatigue, resulting in the phenomenon that the photoresist on the silicon wafer 19 is scattered or the silicon wafer 19 is dropped, so that the device is convenient to use.
[0036] The high-precision weighing scale body 2 comprises a scale body 201, a control panel 202, a display screen 203 and a weighing disc 204, the control panel 202 and the display screen 203 are arranged on the scale body 201, the display screen 203 is located above the control panel 202, and the weighing disc 204 is arranged on the top of the scale body 201; during measurement, the silicon wafer 19 is first placed on the placing rack 16 of the high-precision weighing scale body 2, then the photoresist is evenly applied on the silicon wafer 19, and then the weight is measured and the data is recorded; when the weight is measured, the weight of the placing rack 16 and the silicon wafer 19 should be removed.
[0037] The temperature control electric heating sheet body 3 comprises a temperature controller 301, a power line 302 and a silica gel heating sheet 303, and the temperature controller 301, the power line 302 and the silica gel heating sheet 303 are electrically connected; the temperature is set through the temperature controller 301.
[0038] The workbench 1 is fixedly installed with a supporting rod 14, the supporting rod 14 is fixedly installed with a heat conduction rod 15, the silica gel heating sheet 303 is wrapped outside the heat conduction rod 15, the silica gel heating sheet 303 heats the heat conduction rod 15, and the silicon wafer 19 is placed on the heat conduction rod 15, so that the heat conduction rod 15 heats the silicon wafer 19.
[0039] The placing rack 16 is placed on the weighing pan 204, and the silicon wafer 19 is placed on the placing rack 16 of the high-precision weighing scale body 2.
[0040] The sliding groove 18 is formed in the inner wall of the limiting rod 21, and the sliding blocks 17 are fixedly installed on the two side walls of the connecting plate 11 and are matched with the sliding groove 18, so that when the connecting plate 11 is moved to the bending positions at the two ends of the chain 9, the connecting plate 11 drives the sliding blocks 17 to slide along the sliding groove 18 of the limiting rod 21.
[0041] The switch group 20 is arranged on the workbench 1 and is electrically connected with the motor 7.
[0042] In the embodiment, the high-precision weighing scale body 2 is produced by Qingdao Zhuanyan Measuring Instrument Co., Ltd., and the model number is UW420H; the structural principle and the use method are both prior art, and thus will not be described herein.
[0043] In the embodiment, the temperature-controlling electric heating sheet body 3 is produced by Tianjin Zhoushu Mechatronic Equipment Technology Co., Ltd., and the model number is DRT-G; the structural principle and the use method are both prior art, and thus will not be described herein.
[0044] Specifically, the photoresist volatilization rate measuring device in use: first, place the silicon wafer 19 on the placing rack 16 on the high-precision weighing scale body 2, then evenly apply the photoresist on the silicon wafer 19, then weigh and record the data, and remember to remove the weight of the placing rack 16 and the silicon wafer 19 when weighing; then start the motor 7 (forward rotation), the output end of the motor 7 drives the second sprocket 8 to rotate, the second sprocket 8 drives the chain 9 to rotate, the chain 9 drives the rotating shaft 10, the rotating shaft 10 drives the connecting plate 11, (the connecting plate 11 moves while driving the limiting rod 21 to move, the limiting rod 21 slides along the sliding rod 13, when the connecting plate 11 moves to the bend at both ends of the chain 9, the connecting plate 11 will drive the sliding block 17 to slide along the sliding groove 18 on the limiting rod 21, at this time the connecting plate 11 will rotate on the rotating shaft 10, so that the silicon wafer 19 on the taking rod 12 on the connecting plate 11 is stable and does not move), the connecting plate 11 drives the taking rod 12, the taking rod 12 passes through the gap on the placing rack 16, and the silicon wafer 19 on the placing rack 16 is taken away, when the rotating shaft 10 on the chain 9 rotates to the other end, the silicon wafer 19 on the taking rod 12 is placed on the heat-conducting rod 15, the taking rod 12 passes through the gap between the heat-conducting rods 15, then set the temperature through the temperature controller 301, the silica gel heating sheet 303 heats to heat the heat-conducting rods 15, the heat-conducting rods 15 heat to heat the silicon wafer 19, after heating for a certain time, the motor 7 is started again (reverse rotation), the taking rod 12 takes away the silicon wafer 19 on the heat-conducting rods 15 and places it on the placing rack 16, then weighs again, compares the data before and after heating, and calculates to obtain the volatilization rate of the photoresist on the silicon wafer 19; the device can automatically move the photoresist on the silicon wafer 19 to the weighing scale and the heating equipment, effectively avoiding manual movement of the silicon wafer 19, and the phenomenon that the photoresist on the silicon wafer 19 is scattered or the silicon wafer 19 is dropped due to fatigue of the staff, so that the device is convenient to use.
[0045] All the technical features in the embodiment can be freely combined according to actual needs.
[0046] The above embodiment is a preferred implementation scheme of the present application, and the present application can also be implemented in other ways without departing from the technical concept of the present application, and any obvious replacement within the scope of the present application is within the protection scope of the present application.
Claims
1. A photoresist evaporation rate measuring apparatus comprising a stage (1), characterized in that, The workbench (1) is fixedly installed with a high-precision weighing scale body (2), and is also provided with a temperature control electric heating sheet body (3), and is fixedly installed with a vertical rod (4), and the back of the vertical rod (4) is fixedly installed with a U-shaped rod (5), and the front of the U-shaped rod (5) is rotatably connected with a first chain wheel (6), and the back of the U-shaped rod (5) is fixedly installed with a motor (7), and the output end of the motor (7) is fixedly installed with a second chain wheel (8), and the first chain wheel (6) and the second chain wheel (8) are meshingly connected with a chain (9), and the chain (9) is fixedly installed with a rotating shaft (10), and the rotating shaft (10) is rotatably connected with a connecting plate (11), and the front of the connecting plate (11) is fixedly installed with a taking rod (12), and the inner side wall of the vertical rod (4) is fixedly installed with a sliding rod (13), and the sliding rod (13) is slidably connected with a limiting rod (21), and the connecting plate (11) is slidably connected with the limiting rod (21).
2. The photoresist evaporation rate measuring apparatus according to claim 1, wherein The high-precision weighing scale body (2) comprises a scale body (201), a control panel (202), a display screen (203) and a weighing disc (204), the control panel (202) and the display screen (203) are arranged on the scale body (201), the display screen (203) is located above the control panel (202), and the weighing disc (204) is arranged on the top of the scale body (201).
3. The photoresist evaporation rate measuring apparatus of claim 1, wherein The temperature control electric heating sheet body (3) comprises a temperature controller (301), a power line (302) and a silica gel heating sheet (303), and the temperature controller (301), the power line (302) and the silica gel heating sheet (303) are electrically connected.
4. The photoresist evaporation rate measuring apparatus according to claim 3, wherein The workbench (1) is fixedly installed with a supporting rod (14), and the supporting rod (14) is fixedly installed with a heat conduction rod (15), the silica gel heating sheet (303) is wrapped on the outer wall of the heat conduction rod (15), and the heat conduction rod (15) is placed with a silicon sheet (19).
5. The photoresist evaporation rate measuring apparatus of claim 2, wherein The weighing disc (204) is placed with a placing rack (16).
6. The photoresist evaporation rate measuring apparatus of claim 1, wherein The inner side wall of the limiting rod (21) is provided with a sliding groove (18), and the two side walls of the connecting plate (11) are fixedly installed with sliding blocks (17), and the sliding blocks (17) are matched with the sliding groove (18).
7. The photoresist evaporation rate measuring apparatus of claim 1, wherein The workbench (1) is provided with a switch group (20), and the switch group (20) is electrically connected with the motor (7).