Silicon wafer cleaning device

Abstract

A silicon wafer cleaning device comprises a cleaning pool, a plurality of hanging baskets, a first driving mechanism and a second driving mechanism. A second driving mechanism is used for driving a hanging basket to ascend and descend in a second cleaning area, the second driving mechanism comprises a driving motor, an ejector rod and an L-shaped transmission rod, the driving motor is fixedly arranged on a bearing plate, an output shaft of the driving motor is coaxially and fixedly connected with a connecting disc, the connecting disc is connected with an eccentric connecting shaft, and the eccentric connecting shaft is fixedly connected with the ejector rod. One end of the L-shaped transmission rod is rotationally connected with the eccentric connecting shaft, the middle of the L-shaped transmission rod is rotationally connected with the pool wall of the cleaning pool, the other end of the L-shaped transmission rod is rotationally connected with one end of the ejector rod, and the other end of the ejector rod is connected with a bracket used for being connected with a hanging basket. And through work of the second driving mechanism, the silicon wafers can shake to a certain degree in the hanging basket, the dead corners, making contact with the hanging basket, of the silicon wafers can be cleaned through water flow, and the cleaning effect on the silicon wafers is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of silicon wafer cleaning, and particularly to a silicon wafer cleaning device. BACKGROUND

[0002] Silicon wafer cleaning refers to removing contaminants and self-oxidants on the surface of a silicon wafer by physical or chemical methods before oxidation, photolithography, epitaxy, diffusion, and wire evaporation, so as to obtain a silicon wafer surface meeting the cleanliness requirement. Silicon wafer cleaning includes ultrasonic cleaning, plasma cleaning, and other cleaning methods. Ultrasonic cleaning is an effective method commonly used for silicon wafer cleaning. It utilizes high-frequency vibration waves formed by ultrasonic waves in a liquid to effectively remove contaminants on the surface of a silicon wafer through the breaking and impact effect of micro-bubbles in the liquid.

[0003] The existing silicon wafer ultrasonic cleaning machine is generally automated. The silicon wafer is placed in a hanging basket, the hanging basket is sequentially placed in a chemical cleaning tank and a pure water cleaning tank, and the silicon wafer is cleaned by ultrasonic cleaning. However, when the hanging basket is placed in the chemical cleaning tank, the hanging basket is stationary, and only ultrasonic cleaning is used, which cannot clean the dead angle of the silicon wafer in contact with the hanging basket, resulting in incomplete cleaning of the silicon wafer and affecting the subsequent processing quality of the silicon wafer. SUMMARY

[0004] To solve the problem of incomplete cleaning of the silicon wafer in the prior art and affect the subsequent processing quality of the silicon wafer, the utility model provides a silicon wafer cleaning device, which improves the cleaning effect of the silicon wafer.

[0005] The utility model provides a technical scheme for solving the above technical problem: a silicon wafer cleaning device, comprising a cleaning pool, a plurality of hanging baskets, a first driving mechanism, and a second driving mechanism.

[0006] The cleaning pool comprises a plurality of first cleaning zones and a plurality of second cleaning zones.

[0007] The first driving mechanism is used for transferring the hanging basket from the first cleaning zone to the second cleaning zone. The first driving mechanism comprises a lead screw and a sliding block arranged on the lead screw. A cylinder is fixedly connected to the sliding block. A piston rod of the cylinder is fixedly connected to a bearing plate. A plurality of hanging hooks for hanging the hanging basket are rotatably arranged on the bearing plate.

[0008] The second driving mechanism is used for driving the hanging basket to ascend and descend in the second cleaning area, and comprises a driving motor, a top rod and an L-shaped transmission rod.

[0009] As a further optimization of the utility model of a silicon wafer cleaning device: the L-shaped transmission rod and the eccentric connecting shaft are rotatably connected through a first connecting shaft.

[0010] As a further optimization of the utility model of a silicon wafer cleaning device: the L-shaped transmission rod and the top rod are rotatably connected through a second connecting shaft.

[0011] As a further optimization of the utility model of a silicon wafer cleaning device: a vertical guide cylinder is fixedly arranged on the cleaning pool, and the top rod slides through the guide cylinder.

[0012] As a further optimization of the utility model of a silicon wafer cleaning device: the bracket comprises a support rod and a support plate for supporting the hanging basket, the support rod is fixedly connected with the support plate, a guide rod parallel to the top rod is fixedly connected on the support rod, and a plug hole matched with the guide rod is formed in the pool wall of the cleaning pool.

[0013] As a further optimization of the utility model of a silicon wafer cleaning device: a plurality of limiting shafts are arranged on the hanging basket, the support plate comprises two oppositely arranged U-shaped plates, one side of one of the U-shaped plates is fixedly connected with the support rod through an extension rod, and a plurality of accommodating grooves corresponding to the limiting shafts are formed in the bottom of the U-shaped plate.

[0014] As a further optimization of the utility model of a silicon wafer cleaning device: a strip-shaped liquid discharge channel is formed in the support rod.

[0015] As a further optimization of the utility model of a silicon wafer cleaning device: the bearing plate is rotatably connected with the hanging hook through a rotary connecting assembly, the rotary connecting assembly comprises two lining plates parallel to each other and fixedly connected with the bearing plate, a bearing shaft is fixedly connected between the two lining plates, a through hole is formed in the hanging hook, the bearing shaft passes through the through hole, at least one slewing motor is fixedly arranged on the bearing plate, the slewing motor is connected with the hanging hook through a plurality of transmission mechanisms, the slewing motor is drivingly connected with a rotating disc, at least one eccentric mounting shaft is connected with the rotating disc, the transmission mechanism comprises a mounting rod, one end of the mounting rod is rotatably connected with the eccentric mounting shaft, and the other end of the mounting rod is rotatably connected with the hanging hook through a transmission shaft.

[0016] As a further optimization of the utility model kind silicon wafer cleaning device: the bearing plate is provided with strip-shaped passage, the hanging hook can swing in strip-shaped passage.

[0017] As a further optimization of the utility model kind silicon wafer cleaning device: the bearing plate is provided with strip-shaped passage, the hanging hook can swing in strip-shaped passage.

[0018] Compared with the prior art, the utility model has the beneficial effects that:

[0019] 1) the utility model discloses a second drive mechanism is set, and the second drive mechanism is used for driving the lifting basket to lift in the second cleaning area, and the drive motor of starting second drive mechanism works, and the output shaft of drive motor rotates, and the connecting disc rotates along, and the eccentric connecting shaft on the connecting disc rotates along with the connecting disc, and because, the one end of L-shaped transmission rod is rotatably connected with the eccentric connecting shaft, and the middle part of L-shaped transmission rod is rotatably connected with the pool wall of cleaning pool, and the other end of L-shaped transmission rod is rotatably connected with the one end of the top rod, therefore, L-shaped transmission rod will rotate along with the rotation of eccentric connecting shaft and rotate along the middle part of L-shaped transmission rod, and the other end of the top rod rotatably connected with the other end of L-shaped transmission rod is connected with the bracket for connecting the lifting basket, therefore, the top rod will lift the bracket to a certain range, and the reciprocating movement of bracket is realized through the forward and reverse rotation of drive motor, and in the process, the silicon wafer in the lifting basket will shake to a certain degree, and the dead angle of the silicon wafer and the lifting basket can be cleaned by water flow, and the cleaning effect of the silicon wafer is improved.

[0020] 2) the utility model discloses a first drive mechanism is set, and the first drive mechanism is used for shifting the lifting basket from the first cleaning area to the second cleaning area, when needing horizontal direction movement, directly drive the lead screw of first drive mechanism to move the sliding block to the appropriate position, then drive the cylinder, and the piston rod of cylinder extends downward until the hanging hook can hang the lifting basket, and the lifting basket is sent into the first cleaning area or the second cleaning area. ACCURACY OF DRAWINGS

[0021] Figure 1 It is the structural schematic diagram of the utility model;

[0022] Figure 2 It is the first drive mechanism and the schematic diagram of cooperation of lifting basket;

[0023] Figure 3 It is the schematic diagram of cooperation of second drive mechanism and bracket;

[0024] Figure 4 It is the schematic diagram of the bracket and not in the pool wall of cleaning pool;

[0025] Figure 5This is a schematic diagram showing the bracket rising from the wall of the cleaning pool;

[0026] The diagram shows the following markings: 1. Cleaning tank; 101. First cleaning zone; 1011. Limit stop bar; 102. Second cleaning zone; 2. First drive mechanism; 201. Slider; 202. Lead screw; 203. Cylinder; 3. Lifting hook; 301. Hook body; 4. Second drive mechanism; 401. Connecting plate; 402. Eccentric connecting shaft; 403. First connecting shaft; 404. L-shaped transmission rod; 405. Second connecting shaft; 406. Push rod; 407. Guide cylinder; 408. 5. Drive motor, rotary motor, 501. Turntable, 502. Eccentric mounting shaft, 503. Mounting rod, 504. Drive shaft, 6. Bracket, 601. Support plate, 602. Receiving groove, 603. Support rod, 604. Guide rod, 605. Connecting bolt, 606. Drainage channel, 607. Extension rod, 7. Bearing plate, 701. Liner, 702. Fixed shaft, 703. Pad, 8. Hanging basket, 801. Limiting shaft, 802. Through groove, 9. Silicon wafer. Detailed Implementation

[0027] The technical solution of this utility model will be further described in detail below with reference to specific embodiments. Parts not described or disclosed in detail in the following embodiments of this utility model should be understood as prior art known or should be known by those skilled in the art, such as the model, specific structure and working principle of the lead screw 202, how the lead screw 202 and the slider 201 cooperate, the model of the cylinder 203, the model of the drive motor 408, the model of the rotary motor 5, how the silicon wafer 9 is placed in the basket 8, and the cooperation between the lead screw 202, the cylinder 203, the drive motor 408 and the rotary motor 5, etc.

[0028] Example 1

[0029] A silicon wafer cleaning device, such as Figures 1-5 As shown, the system includes a cleaning tank 1, several baskets 8, a first drive mechanism 2, and a second drive mechanism 4. The cleaning tank 1 includes multiple first cleaning zones 101 and multiple second cleaning zones 102. The first cleaning zones 101 contain a chemical solution for cleaning silicon wafers 9. The specific selection of the chemical solution is conventional prior art and will not be described in detail here. The second cleaning zones 102 contain purified water. An ultrasonic generator and multiple ultrasonic transmitters are fixed in the cleaning tank 1. The ultrasonic generator works in conjunction with all the ultrasonic transmitters. The specific coordination method and the installation of the ultrasonic generator and multiple ultrasonic transmitters are conventional prior art and will not be described in detail here. To improve efficiency, multiple first drive mechanisms 2 and second drive mechanisms 4 can also be provided, allowing simultaneous cleaning of silicon wafers 9 in multiple baskets 8.

[0030] The first driving mechanism 2 is used for transferring the hanging basket 8 from the first cleaning area 101 to the second cleaning area 102, and the first driving mechanism 2 comprises a screw rod 202 and a sliding block 201 arranged on the screw rod 202 in a matched mode, the sliding block 201 is fixedly connected with an air cylinder 203, a piston rod of the air cylinder 203 is fixedly connected with a bearing plate 7, and a plurality of hanging hooks 3 for hanging the hanging basket 8 are arranged on the bearing plate 7 in a rotating mode; when horizontal movement is needed, the screw rod 202 is directly driven to move the sliding block 201 to a suitable position, and when vertical movement is needed, the air cylinder 203 is driven, the piston rod of the air cylinder 203 is extended downward until the hanging hooks 3 can hang the hanging basket 8, and the hanging basket 8 is sent into the first cleaning area 101 or the second cleaning area 102.

[0031] The second driving mechanism 4 is used for driving the hanging basket 8 to ascend and descend in the second cleaning area 102, so that the silicon wafer 9 can be better cleaned, and the cleaning efficiency and the cleaning quality of the silicon wafer 9 are improved. The second driving mechanism 4 comprises a driving motor 408, a top rod 406 and an L-shaped transmission rod 404, the driving motor 408 is fixedly arranged on the bearing plate 7, a connecting disc 401 is coaxially fixedly connected with an output shaft of the driving motor 408, and an eccentric connecting shaft 402 is connected with the connecting disc 401. Figure 3 As shown in the figure, the driving motor 408 is started to work, the output shaft of the driving motor 408 rotates in a clockwise direction, the connecting disc 401 rotates in the clockwise direction along with the connecting disc 401, and the eccentric connecting shaft 402 on the connecting disc 401 rotates in the clockwise direction along with the connecting disc 401; since one end of the L-shaped transmission rod 404 is rotationally connected with the eccentric connecting shaft 402, the middle part of the L-shaped transmission rod 404 is rotationally connected with a pool wall of the cleaning pool 1, and the other end of the L-shaped transmission rod 404 is rotationally connected with one end of the top rod 406, therefore, the end of the L-shaped transmission rod 404 connected with the eccentric connecting shaft 402 moves downward, the middle part of the L-shaped transmission rod 404 rotates in a counterclockwise direction, and the end of the L-shaped transmission rod 404 connected with the top rod 406 moves upward, so that the top rod 406 moves upward along with the top rod 406; the other end of the top rod 406 is connected with the bracket 6 used for connecting the hanging basket 8, therefore, the top rod 406 lifts the bracket 6 by a certain range, the bracket 6 moves back and forth through the forward and reverse rotation of the driving motor 408, the silicon wafer 9 in the hanging basket 8 shakes to a certain extent, the dead angle of the silicon wafer 9 in contact with the hanging basket 8 can be cleaned through water flow, and the cleaning effect of the silicon wafer 9 is improved.

[0032] The above is the basic implementation mode of the utility model, and the above can be further improved, optimized and limited, so that the following embodiments are obtained.

[0033] Embodiment 2

[0034] The embodiment is an improved scheme made on the basis of embodiment 1, and the main body structure is the same as that of embodiment 1, and the improvement lies in that, in order to better realize the transmission effect, the L-shaped transmission rod 404 and the eccentric connecting shaft 402 are rotatably connected through the first connecting shaft 403, and the L-shaped transmission rod 404 and the top rod 406 are rotatably connected through the second connecting shaft 405. The driving motor 408 works, so that the first connecting shaft 403 rotatably connected with the eccentric connecting shaft 402 rotates together with the first connecting shaft 403, the L-shaped transmission rod 404 is driven to rotate, and under the action of the L-shaped transmission rod 404, the second connecting shaft 405 moves to a certain extent, and then the top rod 406 lifts the bracket 6 to a certain range.

[0035] Embodiment 3

[0036] The embodiment is an improved scheme made on the basis of embodiment 1, and the main body structure is the same as that of embodiment 1, and the improvement lies in that, in order to ensure that the bracket 6 moves up and down reciprocatingly, a vertical guide cylinder 407 is fixedly arranged on the cleaning pool 1, and the top rod 406 slides through the guide cylinder 407.

[0037] Embodiment 4

[0038] The embodiment is an improved scheme made on the basis of embodiment 1, and the main body structure is the same as that of embodiment 1, and the improvement lies in that, in order to better lift the hanging basket 8, the bracket 6 comprises a supporting rod 603 and a supporting plate 601 for supporting the hanging basket 8, and the supporting rod 603 is fixedly connected with the supporting plate 601. Wherein, the supporting rod 603 of each second cleaning area 102 can be fixedly connected, and the second driving mechanism 4 and the supporting rod 603 are arranged on the front and rear sides of the second cleaning area 102, no matter how many cleaning pools 1 are needed, only two sets of second driving mechanisms 4 can realize the simultaneous up and down movement of the hanging baskets 8 in all second cleaning areas 102, and the driving effect of the two sets of driving mechanisms is more stable. The supporting rod 603 is fixedly connected with a guide rod 604 parallel to the top rod 406, and in order to realize the movement effect of the supporting rod 603, a bushing matched with the guide rod 604 is arranged on the pool wall of the cleaning pool 1. The top rod 406 is fixedly connected with the supporting rod 603, two connecting bolts 605 are screwed on the top rod 406, and after the top rod 406 passes through the supporting rod 603, the two connecting bolts 605 are respectively located on the two sides of the supporting rod 603 to realize the fixation of the top rod 406 and the supporting rod 603.

[0039] Embodiment 5

[0040] The embodiment is an improved scheme based on embodiment 4, and the main structure is the same as that of embodiment 4. The improvement lies in that: in order to ensure that the hanging basket 8 is in better contact with the purified water in the second cleaning area 102, and at the same time does not affect the cooperation between the hanging basket 8 and the support plate 601, a plurality of limiting shafts 801 are arranged on the hanging basket 8. The support plate 601 comprises two oppositely arranged U-shaped plates. One side of the U-shaped plate is fixedly connected with the support rod 603 through the extension rod 607. A plurality of accommodating grooves 602 corresponding to the limiting shafts 801 are formed in the bottom of the U-shaped plate. In order to recycle the purified water splashed when the hanging basket 8 moves up and down into the second cleaning area 102, a strip-shaped liquid discharge channel 606 is formed in the support rod 603. A limiting baffle 1011 is fixedly arranged in the first cleaning area 101. The limiting baffle 1011 can cooperate with the limiting shaft 801 to limit the position of the hanging basket 8 in the first cleaning area 101.

[0041] Embodiment 6

[0042] The embodiment is an improved scheme based on embodiment 1, and the main structure is the same as that of embodiment 1. The improvement lies in that: in order to more efficiently realize the hanging of the hanging hook 3 on the hanging basket 8, the bearing plate 7 is rotatably connected with the hanging hook 3 through a rotary connection assembly. The rotary connection assembly comprises two lining plates 701 which are parallel to each other and fixedly connected with the bearing plate 7. A bearing shaft is fixedly connected between the two lining plates 701. A through hole is formed in the hanging hook 3. The bearing shaft passes through the through hole. At least one rotary motor 5 is fixedly arranged on the bearing plate 7. The rotary motor 5 is connected with the hanging hook 3 through a plurality of transmission mechanisms. The rotary motor 5 is drivenly connected with a rotating disc 501. At least one eccentric mounting shaft 502 is connected with the rotating disc 501. The transmission mechanism comprises a mounting rod 503. One end of the mounting rod 503 is rotatably connected with the eccentric mounting shaft 502. The other end of the mounting rod 503 is rotatably connected with the hanging hook 3 through a transmission shaft 504. When the rotary motor 5 is started, the rotating disc 501 on the rotary motor 5 rotates together. The eccentric mounting shaft 502 on the rotating disc 501 rotates together. The mounting rod 503 rotatably connected with the eccentric mounting shaft 502 will rotate to a certain extent, and then drive the hanging hook 3 to rotate through the transmission shaft 504. When the cylinder 203 sends the hanging hook 3 to the appropriate position, the rotary motor 5 performs the above working process, and the hook body 301 of the hanging hook 3 can enter the through groove 802 formed in the hanging basket 8, so as to lift the hanging basket 8 and move it to other positions. If it is needed to put the hanging basket 8 into the cleaning tank 1, the hook body 301 of the hanging hook 3 can be separated from the through groove 802 by rotating the rotary motor 5 in the opposite direction. In order to better realize the rotation of the hanging hook 3, a strip-shaped channel is formed in the bearing plate 7. The hanging hook 3 can swing in the strip-shaped channel.

[0043] Embodiment 7

[0044] The embodiment is an improved scheme based on the embodiment 1, the main structure is same with the embodiment 1, and the improvement point lies in: in order to better place the rotary motor 5, the spacer plate 703 is arranged between the piston rod and the bearing plate 7, the piston rod is fixedly connected with the spacer plate 703, and the spacer plate 703 is fixedly connected with the bearing plate 7 through a plurality of fixing shafts 702 to form an accommodating space for accommodating the rotary motor 5.

[0045] The above description of disclosed embodiments enables those skilled in the art to make or use the present application. Various modifications to these embodiments will be apparent to those skilled in the art, and the generic principles defined herein can be applied to other embodiments without departing from the spirit or scope of the present application. Thus, the present application is not to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A silicon wafer cleaning apparatus, characterized by: The application relates to a cleaning device, which comprises a cleaning pool (1), a plurality of hanging baskets (8), a first driving mechanism (2) and a second driving mechanism (4). The cleaning pool (1) comprises a plurality of first cleaning zones (101) and a plurality of second cleaning zones (102). The first driving mechanism (2) is used for transferring the hanging baskets (8) from the first cleaning zones (101) to the second cleaning zones (102), and the first driving mechanism (2) comprises a lead screw (202) and a sliding block (201) matched and arranged on the lead screw (202), a cylinder (203) is fixedly connected to the sliding block (201), a bearing plate (7) is fixedly connected to a piston rod of the cylinder (203), and a plurality of hanging hooks (3) for hanging the hanging baskets (8) are rotatably arranged on the bearing plate (7). The second driving mechanism (4) is used for driving the hanging baskets (8) to ascend and descend in the second cleaning zones (102), and the second driving mechanism (4) comprises a driving motor (408), a top rod (406) and an L-shaped transmission rod (404), the driving motor (408) is fixedly arranged on the bearing plate (7), a connecting disc (401) is coaxially fixedly connected to an output shaft of the driving motor (408), an eccentric connecting shaft (402) is connected to the connecting disc (401), one end of the L-shaped transmission rod (404) is rotatably connected to the eccentric connecting shaft (402), a middle part of the L-shaped transmission rod (404) is rotatably connected to a pool wall of the cleaning pool (1), the other end of the L-shaped transmission rod (404) is rotatably connected to one end of the top rod (406), and the other end of the top rod (406) is connected with a bracket (6) used for connecting the hanging baskets (8).

2. The silicon wafer cleaning apparatus of claim 1, wherein: The L-shaped transmission rod (404) and the eccentric connecting shaft (402) are rotatably connected through a first connecting shaft (403).

3. The silicon wafer cleaning apparatus of claim 2, wherein: The L-shaped transmission rod (404) and the top rod (406) are rotatably connected through a second connecting shaft (405).

4. The silicon wafer cleaning apparatus of claim 1, wherein: A vertical guide cylinder (407) is fixedly arranged on the cleaning pool (1), and the top rod (406) slides through the guide cylinder (407).

5. The silicon wafer cleaning apparatus of claim 1, wherein: The bracket (6) comprises a supporting rod (603) and a supporting plate (601) used for supporting the hanging baskets (8), the supporting rod (603) is fixedly connected with the supporting plate (601), a guide rod (604) parallel to the top rod (406) is fixedly connected to the supporting rod (603), and a bushing matched with the guide rod (604) is formed in the pool wall of the cleaning pool (1).

6. The silicon wafer cleaning apparatus of claim 5, wherein: A plurality of limiting shafts (801) are arranged on the hanging baskets (8), the supporting plate (601) comprises two oppositely arranged U-shaped plates, one side of the U-shaped plates is fixedly connected with the supporting rod (603) through an extension rod (607), and a plurality of accommodating grooves (602) corresponding to the limiting shafts (801) are formed in the bottom of the U-shaped plates.

7. The silicon wafer cleaning apparatus of claim 5, wherein: A strip-shaped liquid discharging channel (606) is formed in the supporting rod (603).

8. The silicon wafer cleaning apparatus of claim 1, wherein: The bearing plate (7) is rotatably connected with the hanging hook (3) through a rotating connecting assembly, the rotating connecting assembly comprises two lining plates (701) which are parallel to each other and are fixedly connected with the bearing plate (7), a bearing shaft is fixedly connected between the two lining plates (701), a through hole is formed in the hanging hook (3), the bearing shaft passes through the through hole, at least one rotary motor (5) is fixedly arranged on the bearing plate (7), the rotary motor (5) is correspondingly connected with the hanging hook (3) through a plurality of transmission mechanisms, the rotary motor (5) is drivingly connected with a rotating disc (501), at least one eccentric mounting shaft (502) is connected with the rotating disc (501), the transmission mechanism comprises a mounting rod (503), one end of the mounting rod (503) is rotatably connected with the eccentric mounting shaft (502), the other end of the mounting rod (503) is rotatably connected with the hanging hook (3) through a transmission shaft (504).

9. The silicon wafer cleaning apparatus of claim 8, wherein: A strip-shaped channel is formed in the bearing plate (7), and the hanging hook (3) can swing in the strip-shaped channel.

10. The silicon wafer cleaning apparatus of claim 8, wherein: A backing plate (703) is arranged between the piston rod and the bearing plate (7), the piston rod is fixedly connected with the backing plate (703), and the backing plate (703) is fixedly connected with the bearing plate (7) through a plurality of fixing shafts (702) to form an accommodating space for accommodating the rotary motor (5).

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