Polycrystalline silicon reduction furnace
By setting a shielding part on the inner wall of the lens barrel to block the gap between the flow guide ring and the lens barrel, the problem of lens contamination in polycrystalline silicon reduction furnaces was solved, enabling clear observation and timely production adjustments, thus improving the efficiency and quality of polycrystalline silicon production.
Patent Information
- Application Number
- CN202423134411.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-18
- Publication Date
- 2025-11-25
- Estimated Expiration
- 2034-12-18
AI Technical Summary
The sight glass of the polysilicon reduction furnace is severely contaminated, making it difficult to observe the growth of polysilicon inside the furnace, preventing timely adjustments, and reducing production efficiency and product quality.
A shielding part is provided on the inner wall of the lens barrel to block the gap between the guide ring and the lens barrel, thereby preventing the deposition of amorphous silicon powder, reducing lens contamination, and fixing the guide ring with a connector to improve its stability.
It reduces sight glass contamination, improves the observation clarity of polycrystalline silicon growth, enables timely adjustments to the production process, and enhances production efficiency and product quality.
Smart Images
Figure CN223592410U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to polycrystalline silicon production technical field especially relates to a polycrystalline silicon reduction furnace. BACKGROUND
[0002] Most of the polycrystalline silicon production manufacturers at home use the Siemens improved process, and the main equipment of the process is a reduction furnace. The working principle of the reduction furnace is to react the mixed gas of trichlorosilane and hydrogen gas to generate polycrystalline silicon on the silicon core through a high-temperature silicon core, and the final product is polycrystalline silicon deposited on the silicon core.
[0003] In the related technology, a lens barrel is arranged on the furnace body of the polycrystalline silicon reduction furnace, and a sight glass and a flow guide ring are installed in the lens barrel. The flow guide ring is provided with a flow guide hole, and four bolts are all arranged along the radial direction of the flow guide ring and abut against the inner wall of the lens barrel, and there is a gap between the flow guide ring and the inner wall of the lens barrel. The lens barrel is provided with a hydrogen gas passage, and the hydrogen gas enters the furnace body along the hydrogen gas passage.
[0004] However, the sight glass of the polycrystalline silicon reduction furnace is seriously polluted, which leads to unclear observation of the growth of polycrystalline silicon in the reduction furnace, and the growth of polycrystalline silicon cannot be adjusted in time, resulting in reduction of production efficiency and product quality. UTILITY MODEL CONTENTS
[0005] The utility model discloses a polycrystalline silicon reduction furnace to solve the problem that the sight glass of the polycrystalline silicon reduction furnace is seriously polluted, which leads to unclear observation of the growth of polycrystalline silicon in the reduction furnace, and the growth of polycrystalline silicon cannot be adjusted in time, resulting in reduction of production efficiency and product quality.
[0006] The utility model discloses a polycrystalline silicon reduction furnace, including furnace body, lens barrel, sight glass, flow guide ring and connecting piece;
[0007] The lens barrel is arranged on the side wall of the furnace body, and the sight glass and the flow guide ring are arranged in the lens barrel.
[0008] The inner wall of the lens barrel is provided with a shielding part, the connecting piece connects the flow guide ring and the shielding part, and the shielding part is configured to shield the gap between the flow guide ring and the lens barrel.
[0009] In a possible implementation, the shielding part is arranged on the side of the flow guide ring facing the furnace body.
[0010] The above technical solution has the following advantages or beneficial effects: it can avoid the accumulation of amorphous silicon powder in the gap between the flow guide ring and the lens barrel in the polycrystalline silicon reduction furnace. It is also convenient to install and disassemble the flow guide ring from the side of the lens barrel away from the furnace body.
[0011] In a possible implementation, the shielding part is a closed annular structure.
[0012] The technical scheme has the advantages or beneficial effects that hydrogen gas entering the internal passage can pass through the shielding part, so that the hydrogen gas in the internal passage can enter the furnace body.
[0013] In a possible implementation, the outer diameter of the shielding part is greater than the outer diameter of the flow guide ring, and the inner diameter of the shielding part is less than the outer diameter of the flow guide ring.
[0014] In a possible implementation, the inner diameter of the shielding part is greater than the inner diameter of the flow guide ring.
[0015] The technical scheme has the advantages or beneficial effects that in the axial direction of the lens barrel, the shielding part can avoid shielding the flow guide hole of the flow guide ring.
[0016] In a possible implementation, the shielding part is coaxially arranged with the flow guide ring.
[0017] In a possible implementation, the connecting piece connects the flow guide ring and the shielding part along the axial direction of the flow guide ring.
[0018] In a possible implementation, the connecting piece is threadedly connected with the flow guide ring and the shielding part respectively.
[0019] The technical scheme has the advantages or beneficial effects that the flow guide ring can be fixed on the shielding part, so that the flow guide ring is firmly installed, the flow guide ring is not easy to fall off from the lens barrel, and the stability of the flow guide ring is improved.
[0020] In a possible implementation, the connecting piece is a bolt, and the head of the bolt is located on the side of the flow guide ring away from the shielding part.
[0021] In a possible implementation, the number of the connecting pieces is multiple, and the multiple connecting pieces are arranged at intervals along the circumferential direction of the flow guide ring.
[0022] The utility model discloses a polycrystal silicon reduction furnace, through the inner wall of lens barrel is provided with shielding part, shielding part can shield the gap between flow guide ring and lens barrel, shielding part can block amorphous silicon powder in polycrystal silicon reduction furnace and pass through the gap between flow guide ring and the inner wall of lens barrel, thereby make the amorphous silicon powder deposited on the sight mirror reduce, reduce the sight mirror pollution of polycrystal silicon reduction furnace, and then can clearly observe the polycrystal silicon growth in reduction furnace, can make the adjustment to polycrystal silicon growth in time, improve production efficiency and product quality. BRIEF DESCRIPTION OF DRAWINGS
[0023] In order to make the technical scheme of the embodiments of the present application or the prior art clearer, the accompanying drawings needed in the description of the embodiments or the prior art will be briefly introduced. Obviously, the accompanying drawings in the description below are some embodiments of the present application, and for those skilled in the art, other drawings can be obtained without creative labor on the basis of these drawings.
[0024] Figure 1 A structural schematic diagram of a polycrystalline silicon reduction furnace provided by the present application is shown in the figure.
[0025] Figure 2 A cross-sectional schematic diagram of the A-A position in the figure. Figure 1
[0026] Figure 3 A cross-sectional schematic diagram of the B-B position in the figure. Figure 2
[0027] Figure 4 A cross-sectional schematic diagram of the C-C position in the figure. Figure 2 Explanation of the reference signs:
[0028] 10 - furnace body
[0029] 20 - lens barrel
[0030] 21 - internal passage
[0031] 22 - gas passage
[0032] 30 - shielding part
[0033] 40 - sight glass
[0034] 50 - flow guide ring
[0035] 51 - flow guide hole
[0036] 60 - connecting piece
[0037] DETAILED DESCRIPTION In order to make the technical scheme of the embodiments of the present application or the prior art clearer, the accompanying drawings needed in the description of the embodiments or the prior art will be briefly introduced. Obviously, the accompanying drawings in the description below are some embodiments of the present application, and for those skilled in the art, other drawings can be obtained without creative labor on the basis of these drawings.
[0038]
[0039] It should be noted that the terms "first", "second" are used only for descriptive purpose, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined with "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present application, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise specifically limited.
[0040] In the present application, unless otherwise specifically defined and limited, the terms "mounting", "connecting", "fixing" and the like should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected or in communication with each other; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication or interaction relationship between two elements, unless otherwise specifically limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.
[0041] In the present application, unless otherwise specifically defined and limited, the first feature is "on" or "under" the second feature, which can be direct contact between the first and second features, or indirect contact between the first and second features through an intermediate medium. Moreover, the first feature "above", "above" and "above" the second feature can be directly above or obliquely above the first feature, or only indicate that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature can be directly below or obliquely below the first feature, or only indicate that the horizontal height of the first feature is less than that of the second feature.
[0042] In the above description, the description of the reference terms "one embodiment", "some embodiments", "example", "specific example" or "some examples" means that the specific features, structures, materials or characteristics described in the embodiment or example are included in at least one embodiment or example of the present application. In the present application, the illustrative description of the above terms is not necessarily for the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine different embodiments or examples described in the present application and the features of different embodiments or examples without contradiction.
[0043] As described in the background, the sight glass of the polysilicon reduction furnace is seriously polluted, which results in unclear observation of the growth of polysilicon in the reduction furnace, and the growth of polysilicon cannot be adjusted in time, thereby reducing the production efficiency and product quality. The inventor has found that the reason for the problem is that the amorphous silicon powder in the polysilicon reduction furnace can deposit on the sight glass through the gap between the flow guide ring and the inner wall of the lens barrel, the sight glass is seriously polluted, which results in unclear observation of the growth of polysilicon in the reduction furnace, and the growth of polysilicon cannot be adjusted in time, thereby reducing the production efficiency and product quality.
[0044] The amorphous silicon powder is a non-crystalline silicon material, and the particle size is usually between 1-100 microns, that is, the particle size is usually greater than or equal to 1 micron and less than or equal to 100 microns.
[0045] In order to solve the above problems, the utility model embodiment provides a kind of polysilicon reduction furnace, it is provided with shielding portion on the inner wall of lens barrel, shielding portion can shield the gap between flow guide ring and lens barrel, shielding portion can block amorphous silicon powder in the polysilicon reduction furnace can pass through the gap between flow guide ring and the inner wall of lens barrel, to make the amorphous silicon powder deposited on sight glass reduce, reduce the sight glass pollution of polysilicon reduction furnace, to can be clear to the observation of the growth of polysilicon in the reduction furnace, can be adjusted in time to the growth of polysilicon, improve production efficiency and product quality.
[0046] The polysilicon reduction furnace provided by the utility model embodiment will be described in detail below in combination with specific embodiments.
[0047] Referring to Figure 1 The utility model embodiment provides a kind of polysilicon reduction furnace, including furnace body 10.In some examples, in furnace body 10, trichlorosilane and hydrogen gas mixture gas reaction generates polysilicon and deposits on silicon core.
[0048] Polysilicon reduction furnace includes lens barrel 20.Lens barrel 20 is arranged on the side wall of furnace body 10, and lens barrel 20 is installed on the outside of furnace body 10.In some examples, the shape of lens barrel 20 can be cylindrical.
[0049] Lens barrel 20 has internal passage 21 inside, and internal passage 21 is communicated with the inside of furnace body 10.
[0050] Referring to Figure 2 Gas passage 22 is provided on lens barrel 20.The outside of lens barrel 20 is provided with gas inlet pipe (not shown in the figure).One end of gas passage 22 is communicated with gas inlet pipe, and the other end is communicated with internal passage 21.In some examples, the gas in gas inlet pipe can be hydrogen.Hydrogen enters furnace body 10 through gas passage 22 and internal passage 21.
[0051] The number of gas passages 22 can be one or more.
[0052] The gas passages 22 can be straight passages, annular passages, or a combination of straight passages and annular passages. In some examples, the number of the gas passages 22 is two. Each of the gas passages 22 is a straight passage. Each of the gas passages 22 extends along a radial direction of the lens barrel 20.
[0053] The lens barrel 20 is provided with a shielding portion 30. In some examples, the shielding portion 30 can be a protrusion on the inner wall of the lens barrel 20.
[0054] The polycrystalline silicon reduction furnace includes a sight glass 40. The sight glass 40 is disposed in the lens barrel 20. The sight glass 40 can be a glass structure. In some examples, the sight glass 40 can be a flat quartz glass.
[0055] The polycrystalline silicon reduction furnace includes a flow guide ring 50. The flow guide ring 50 is disposed in the lens barrel 20. The flow guide ring 50 has a flow guide hole 51.
[0056] In some examples, the flow guide ring 50 has a circular shape. An axis of the flow guide ring 50 coincides with an axis of the lens barrel 20. The flow guide hole 51 is a circular hole. The flow guide hole 51 is used to guide the hydrogen gas entering the inner passage 21, which helps to control the flow of the hydrogen gas.
[0057] In an axial direction of the lens barrel 20, the flow guide ring 50 is closer to the furnace body 10 than the sight glass 40. The axial direction of the lens barrel 20 can be the X-axis direction.
[0058] In some examples, the furnace body 10 is located on one side of the sight glass 40 in the -X-axis direction. In the axial direction of the lens barrel 20, the flow guide ring 50 is located between the furnace body 10 and the sight glass 40.
[0059] In some examples, the flow guide ring 50 can have a circular shape. The flow guide hole 51 can have a circular shape.
[0060] The polycrystalline silicon reduction furnace includes a connecting piece 60. The connecting piece 60 is disposed in the lens barrel 20. In some examples, the connecting piece 60 connects the flow guide ring 50 and the shielding portion 30. There is a gap between the flow guide ring 50 and the inner wall of the lens barrel 20. The shielding portion 30 can shield the gap between the flow guide ring 50 and the lens barrel 20. After the hydrogen gas enters the inner passage 21 through the gas passage 22, the hydrogen gas in the inner passage 21 is guided by the flow guide hole 51 of the flow guide ring 50 and then enters the furnace body 10.
[0061] The polycrystalline silicon reduction furnace provided by the embodiment of the utility model, through the inner wall of the lens barrel 20 is provided with the shielding part 30, the shielding part 30 can shield the gap between the flow guiding ring 50 and the lens barrel 20, the shielding part 30 can block the amorphous silicon powder in the polycrystalline silicon reduction furnace from passing through the gap between the flow guiding ring 50 and the inner wall of the lens barrel 20, thereby reducing the amorphous silicon powder deposited on the sight glass 40, reducing the pollution of the sight glass 40 of the polycrystalline silicon reduction furnace, and then the observation of the growth of polycrystalline silicon in the reduction furnace can be clear, the growth of polycrystalline silicon can be adjusted in time, and the production efficiency and product quality are improved.
[0062] In a possible implementation, as shown in Figure 2 The shielding part 30 is arranged on the side of the flow guiding ring 50 facing the furnace body 10, and the flow guiding ring 50 is located on the side of the shielding part 30 away from the furnace body 10. In this way, the amorphous silicon powder in the polycrystalline silicon reduction furnace can be prevented from accumulating in the gap between the flow guiding ring 50 and the lens barrel 20. In addition, the flow guiding ring 50 can be conveniently mounted and dismounted from the side of the lens barrel 20 away from the furnace body 10.
[0063] In some examples, the furnace body 10 is located on the side of the flow guiding ring 50 in the direction of the X-axis. The shielding part 30 is located between the furnace body 10 and the flow guiding ring 50.
[0064] In a possible implementation, the shielding part 30 is a closed annular structure. In this way, the hydrogen gas entering the internal passage 21 can pass through the shielding part 30, so that the hydrogen gas in the internal passage 21 can enter the furnace body 10.
[0065] In some examples, as shown in Figure 2 、 Figure 3 and Figure 4 The shielding part 30 can be a closed circular annular structure. The outer diameter D1 of the shielding part 30 is greater than the outer diameter D2 of the flow guiding ring 50, and the inner diameter D3 of the shielding part 30 is less than the outer diameter D2 of the flow guiding ring 50. In this way, in the axial direction of the lens barrel 20, the shielding part 30 can shield the gap between the flow guiding ring 50 and the lens barrel 20.
[0066] In a possible implementation, as shown in Figure 2 、 Figure 3 and Figure 4 The inner diameter D3 of the shielding part 30 is greater than the inner diameter D4 of the flow guiding ring 50. In this way, in the axial direction of the lens barrel 20, the flow guiding hole 51 of the flow guiding ring 50 can be prevented from being shielded by the shielding part 30.
[0067] In a possible implementation, the shielding part 30 can be a closed circular annular structure. The shielding part 30 and the flow guiding ring 50 are coaxially arranged, that is, the axis of the shielding part 30 coincides with the axis of the flow guiding ring 50.
[0068] It should be noted that the guide ring in the related art is fixed by the friction force between the bolt and the lens barrel. During the operation of the polysilicon reduction furnace, the guide ring is not firmly installed, and the phenomenon of falling of the guide ring is prone to occur.
[0069] In a possible implementation, the connecting piece 60 connects the guide ring 50 and the shielding part 30 along the axial direction of the guide ring 50.
[0070] The connecting piece 60 can be threadedly connected with the guide ring 50 and the shielding part 30, respectively. In this way, the guide ring 50 can be fixed on the shielding part 30, so that the guide ring 50 is firmly installed, and thus the guide ring 50 is not prone to falling from the lens barrel 20, thereby improving the stability of the guide ring 50.
[0071] In some examples, the connecting piece 60 can be a bolt. The shielding part 30 and the guide ring 50 are respectively provided with threaded holes, and the bolt is connected in the threaded holes of the shielding part 30 and the guide ring 50. The head of the bolt is located on the side of the guide ring 50 away from the shielding part 30. In this way, the connecting piece 60 can be conveniently installed and dismounted from the side of the lens barrel 20 away from the furnace body 10.
[0072] In a possible implementation, the number of the connecting pieces 60 is multiple, and the multiple connecting pieces 60 are arranged at intervals along the circumferential direction of the guide ring 50. In this way, the force on the guide ring 50 can be uniform, and the stability of the guide ring 50 can be improved.
[0073] In some examples, the connecting piece 60 is a bolt. The number of the bolts can be four. The four bolts are arranged at equal intervals along the circumferential direction of the guide ring 50.
[0074] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, and not to limit them. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that they can still modify the technical solutions recorded in the foregoing embodiments, or equivalently replace some or all of the technical features. These modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.
Claims
1. A polycrystalline silicon reduction furnace, characterized in that, It includes a furnace body (10), a mirror tube (20), a sight glass (40), a flow guide ring (50), and a connector (60); The mirror tube (20) is disposed on the side wall of the furnace body (10), and the sight glass (40) and the flow guide ring (50) are disposed inside the mirror tube (20); A shielding part (30) is provided on the inner wall of the lens barrel (20). The connector (60) connects the flow guide ring (50) and the shielding part (30). The shielding part (30) is configured to shield the gap between the flow guide ring (50) and the lens barrel (20).
2. The polycrystalline silicon reduction furnace according to claim 1, characterized in that, The shielding part (30) is disposed on the side of the guide ring (50) facing the furnace body (10).
3. The polycrystalline silicon reduction furnace according to claim 1, characterized in that, The shielding part (30) is a closed ring structure.
4. The polycrystalline silicon reduction furnace according to claim 3, characterized in that, The outer diameter of the shielding part (30) is larger than the outer diameter of the guide ring (50), and the inner diameter of the shielding part (30) is smaller than the outer diameter of the guide ring (50).
5. The polycrystalline silicon reduction furnace according to claim 4, characterized in that, The inner diameter of the shielding part (30) is larger than the inner diameter of the guide ring (50).
6. The polycrystalline silicon reduction furnace according to claim 4, characterized in that, The shielding part (30) is coaxially arranged with the flow guide ring (50).
7. The polycrystalline silicon reduction furnace according to any one of claims 1-6, characterized in that, The connector (60) connects the guide ring (50) and the shielding part (30) along the axial direction of the guide ring (50).
8. The polycrystalline silicon reduction furnace according to claim 7, characterized in that, The connector (60) is threadedly connected to the guide ring (50) and the shielding part (30) respectively.
9. The polycrystalline silicon reduction furnace according to claim 8, characterized in that, The connector (60) is a bolt, and the bolt head is located on the side of the guide ring (50) away from the shielding part (30).
10. The polycrystalline silicon reduction furnace according to claim 7, characterized in that, The number of connectors (60) is multiple, and the multiple connectors (60) are spaced apart along the circumferential direction of the guide ring (50).