Wafer soaking and developing device for manufacturing biosensor chip

Abstract

The utility model discloses a wafer soaking and developing device for manufacturing a biosensor chip, which comprises a developing device main body, a control table is fixedly arranged on the front surface of the developing device main body, a wafer soaking structure is fixedly connected to the bottom end of a partition plate, and a wafer fixing structure is arranged in the wafer soaking structure. The top end of the wafer fixing structure is provided with a control structure, the bottom end of the wafer soaking structure is fixedly connected with a solution circulating structure, the wafer soaking and developing device for manufacturing the biosensor chip is relatively simple in structure while the wafer developing quality and uniformity are ensured, the maintenance cost and difficulty are reduced, and the production efficiency is improved. Operators only need to set relevant parameters on the console, the operation is relatively easy, the wafer is developed in the closed soaking tank, the stability of the developing effect is greatly ensured, the adaptability of the device to wafers of different sizes is improved, the application range is expanded, the practicability and cost performance of the device are improved, and the device is more competitive in the market.

Description

Technical Field

[0001] This utility model relates to the field of developing apparatus technology, specifically a wafer immersion developing apparatus for manufacturing biosensor chips. Background Technology

[0002] Pathogen detection in ginger is crucial in agriculture and food safety. Common ginger pathogens include bacteria (such as Ralstonia solanacearum) and fungi (such as Pythium spp.). The presence of these pathogens can lead to a decline in ginger quality and even endanger human health. Traditional detection methods include microbial culture, but the process is relatively cumbersome. Using biosensor technology and wafer imaging devices to detect ginger pathogens is a novel approach. The wafer undergoes special treatment, and its surface is immobilized with biorecognition molecules that can identify ginger pathogens, thus achieving the purpose of detecting ginger pathogens.

[0003] A wafer is a silicon wafer used to manufacture silicon semiconductor integrated circuits. It is called a wafer because of its circular shape. It is the basic material for manufacturing semiconductor chips and plays a key role in the chip manufacturing process. Almost all semiconductor chips are inseparable from wafers. In many fields such as computer chips, memory chips, communication chips, and sensor chips, wafers are the basic material for chip manufacturing. These chips are widely used in almost all electronic devices such as smartphones, computers, automobiles, industrial control, and medical equipment.

[0004] However, in the manufacturing process of biosensor chips, photoresist is coated on the wafer surface. During the photolithography process, some of the photoresist needs to be removed after exposure to expose the underlying wafer material layer. After the photolithography process, the exposed and unexposed parts of the photoresist will have different properties. Development is a key step in the photolithography process of chip manufacturing. Only after effective development and obtaining a photoresist pattern that meets the design requirements can the next step of precise etching be carried out. Therefore, a development device is needed to selectively dissolve the unexposed (for negative photoresist) or exposed (for positive photoresist) parts of the photoresist, ensuring that excess photoresist can be removed from all areas of the wafer surface and that development is carried out under the same conditions.

[0005] A search revealed a Chinese patent document (publication number: CN221507325U) disclosing a biochip developing device. This device includes a housing, a top plate on the top of which is fitted with a working groove. The working groove is a hollow cavity structure containing a tray. A waste liquid outlet is located at the bottom of the working groove. A wafer sample is mounted on the tray, and a developing nozzle assembly is positioned above the wafer sample. The top of the developing nozzle assembly is connected to a connecting rod assembly. The connecting rod assembly passes through a guide groove and engages with a guide block. The guide block slides against a guide rail, and the guide block drives the connecting rod assembly to perform horizontal reciprocating motion along the guide groove. This device can fully cover the sample area during spraying, ensuring uniformity of the developing solution spray and improving the developing effect to some extent. However, it still has several shortcomings:

[0006] Due to its spray developing characteristics, this device has high maintenance costs and difficulty, requiring regular maintenance and upkeep by professional technicians. Failures not only affect the normal operation of the entire device but are also difficult to repair. Its design and manufacturing require high technical expertise and significant investment, resulting in high initial equipment costs, which can be a heavy burden for small businesses or research institutions. It can also lead to resource oversupply for detecting pathogens in ginger. Compared to immersion developing devices, it requires strict control of various parameters; any deviation can affect the developing effect. It also demands highly skilled operators. The developing solution is sprayed onto the wafer surface in droplet form, making it susceptible to environmental factors, potentially leading to evaporation of the developing solution and uneven droplet distribution. For large wafers, more nozzles and more complex spray systems may be needed to ensure comprehensive coverage and uniform developing. Its applicability is limited, and its practicality and cost-effectiveness are relatively low. Utility Model Content

[0007] The purpose of this invention is to provide a wafer immersion developing apparatus for biosensor chip manufacturing, in order to solve the problems of the spray developing apparatus mentioned in the background art, which has high maintenance costs and difficulty, is difficult to repair, is a heavy burden for some small enterprises or research institutions, requires strict control of various parameters, has high requirements for operators, is easily affected by environmental factors, may cause the developer to evaporate, and the droplets to be unevenly distributed. For large-size wafers, more nozzles and more complex spray systems may be required to ensure full coverage and uniform development. It also has a limited scope of application and low practicality and cost-effectiveness.

[0008] To achieve the above objectives, this utility model provides the following technical solution: a wafer immersion and developing apparatus for biosensor chip manufacturing, comprising a developing apparatus body, a control console fixedly mounted on the front of the developing apparatus body, a display screen mounted on the top of the control console, an observation window mounted in the middle of the front of the developing apparatus body, a partition plate fixedly mounted in the middle of the inner cavity of the developing apparatus body, a wafer immersion structure fixedly connected to the bottom of the partition plate, a wafer fixing structure inside the wafer immersion structure, a control structure mounted on the top of the wafer fixing structure, and a solution circulation structure fixedly connected to the bottom of the wafer immersion structure; by fixing the control console on the front of the developing apparatus body, a centralized operating area is provided for the operator. Combined with the display screen on the top of the control console, the operating parameters and status information of the equipment can be displayed intuitively, facilitating real-time monitoring and adjustment of various parameters during the developing process, improving the accuracy and efficiency of operation. The observation window in the middle of the front of the developing apparatus body allows the operator to more intuitively observe the internal condition of the apparatus, helping to detect abnormalities in a timely manner, ensuring the smooth progress of the developing process, and also avoiding contamination from impurities that may be introduced due to frequent opening of the apparatus.

[0009] Preferably, the wafer immersion structure includes an immersion tank, an insulating ring fixedly connected to the inner surface of the immersion tank, a temperature sensor fixedly connected to one side of the inner surface of the insulating ring, and a heating tube fixedly installed at the bottom of the immersion tank. The temperature sensor can sense the temperature of the ginger pathogen sample solution in the immersion tank in real time. Through precise temperature monitoring, operators can determine the optimal development temperature range according to different solution formulations and wafer photoresist types, ensuring the accuracy and stability of the development process. The heating tube at the bottom of the immersion tank, used in conjunction with the temperature sensor, helps maintain the chemical activity of the ginger pathogen sample solution, ensuring uniform development rate and quality of the photoresist, thereby improving the yield of biosensor chip manufacturing. The insulating ring can effectively reduce heat loss and prevent large fluctuations in solution temperature due to heat exchange with the external environment.

[0010] Preferably, the wafer fixing structure includes a top cover, the surface of which is threaded with a plurality of evenly distributed adjustable fixing blocks. The bottom end of the top cover is provided with a placement tray, the bottom surface of which is provided with a plurality of evenly distributed perforated grooves. The plurality of adjustable fixing blocks penetrate the surface of the placement tray and extend to its bottom end. For wafers of different sizes, only the placement tray with perforated grooves of different sizes needs to be replaced, greatly improving the device's compatibility with various wafers. There is no need to replace the entire fixing structure due to wafer size differences. While fixing the wafer, the perforated grooves provide a smooth flow path for the ginger pathogen sample solution. The solution can contact the wafer surface from all directions through the perforated grooves, ensuring that all parts of the wafer react evenly with the solution. Especially during the soaking process, this helps improve the uniformity of development and avoids uneven development caused by localized poor solution flow, thereby improving the overall performance of the biosensor chip.

[0011] Preferably, the control structure includes a center plate and a moving plate. A servo motor is disposed in the center of the surface of the center plate. A control rod is fixedly connected to the bottom end of the servo motor. A rotating disk is fixedly connected to the bottom end of the control rod. A connecting disk is disposed at the bottom end of the rotating disk. A plurality of evenly distributed connecting rods are fixedly connected to the bottom surface of the connecting disk. The bottom surfaces of the plurality of connecting rods are all fixedly connected to the top surface of the top cover. The servo motor on the center plate drives the rotating disk to rotate through the control rod, and then transmits power through the connecting disk and connecting rods, so that the top cover and the wafer fixed thereon rotate. By rotating the wafer, it is possible to... To ensure a more uniform distribution and action of the ginger pathogen sample solution on the wafer surface, and to avoid uneven development caused by excessively long or short local solution residence time, the quality and accuracy of biosensor chip development are improved. The servo motor is controlled by the console, which allows for precise setting of parameters such as wafer rotation speed and angle, ensuring consistency and repeatability of each development process. This is particularly important for the large-scale production of high-quality biosensor chips, effectively improving production efficiency and product quality stability. After soaking, rotation can also remove some of the solution from the wafer.

[0012] Preferably, air pump guide rods are fixedly connected to both sides of the top of the center plate, and a synchronous air pump is fixedly connected to the top of each of the two air pump guide rods. The tops of the two synchronous air pumps are fixedly connected to the bottom of the moving plate. A drive gear is provided on both sides of the moving plate, and a first synchronous motor is provided at the upper end of both sides of the moving plate. A first motor rod is fixedly connected to the bottom of each of the two first synchronous motors. The two first motor rods extend through the moving plate to the surface of the drive gears. A meshing rack is meshed on one side of each of the two drive gears, and a guide rail is fixedly connected to the surface of each of the two meshing racks. One side of each of the two guide rails is fixedly connected to the surface of the inner cavity of the developing device body. Through the operation of the air pumps, the moving plate can be precisely moved in the vertical direction, allowing the wafer to be immersed in ginger pathogen sample solutions at different depths, or in the developing... The device enables rapid and stable liquid loading and unloading before and after development. At the start of development, the wafer can be slowly lowered to the appropriate solution depth to ensure uniform solution coverage. After development, the wafer can be quickly lifted to reduce solution residue time and avoid over-development. The moving plate is equipped with drive gears on both sides, driven by the first synchronous motor, which cooperate with the meshing rack fixed on the guide rail to move the moving plate horizontally. This allows the wafer fixing structure to be moved to the observation window for more intuitive observation. The adjustable fixing block or the placement tray can also be adjusted or replaced through the observation window or the repair window at the rear of the developing unit. The synergistic effect of vertical and horizontal movement greatly enriches the movement modes of the wafer within the developing unit, better meeting the diverse needs of different biosensor chip manufacturing processes for wafer position and movement, and improving the versatility and flexibility of the device.

[0013] Preferably, the solution circulation structure includes a first storage tank and a second storage tank. The bottom of the first storage tank is fixedly connected to one side of the bottom of the developing device body. A replenishment pipe is provided on one side of the first storage tank, and an inlet pipe is fixedly connected to the top of the first storage tank. The top of the inlet pipe is fixedly connected to one side of the bottom of the soaking tank. A water pump is provided on one side of the inlet pipe, and the bottom of the water pump is fixedly connected to the top of the first storage tank. A drain pipe is provided on one side of the second storage tank, and a drain pipe is fixedly connected to the top of the second storage tank. Valves are provided at the upper ends of both the inlet and drain pipes. During continuous production, as the ginger pathogen sample solution is consumed, it can be replenished through the replenishment pipe. Fresh ginger pathogen sample solution is added to the first storage tank to maintain the solution supply and ensure continuous and stable development without frequent shutdowns for replenishment, thus improving production efficiency. The second storage tank is connected to the soaking tank via a drain pipe. After development, the solution in the soaking tank can be drained into the second storage tank through the drain pipe, achieving effective solution recovery and avoiding waste and environmental pollution caused by direct discharge. It also facilitates centralized treatment or recycling of the used solution. The valve structure can flexibly control the inflow and outflow of the solution. Before development begins, the inflow volume can be precisely controlled by the valve to ensure that the solution in the soaking tank reaches the appropriate level. After development, the draining process is controlled by the valve to prevent solution leakage or poor drainage.

[0014] Preferably, the valve structure includes a second synchronous motor, one end of which is fixedly connected to a second motor rod. A valve partition plate is rotatably connected to the surface of the second motor rod. A valve plate is provided in the middle of the valve partition plate, and the middle of the valve plate is fixedly connected to the middle of the second motor rod. By driving the second motor rod to rotate through the second synchronous motor, the position of the valve partition plate and the valve plate can be controlled, thereby achieving precise control of the inlet or outlet flow rate. Different degrees of flow control can be achieved by adjusting the angle of the valve plate, ensuring the stability and accuracy of the supply and discharge of ginger pathogen sample solution.

[0015] Compared with the prior art, the beneficial effects of this utility model are:

[0016] This immersion developing device ensures wafer development quality and uniformity while maintaining a relatively simple structure, making it easier to inspect and repair during routine maintenance. This reduces maintenance costs and difficulties, making it more user-friendly for small businesses or research institutions using it for ginger pathogen detection. Operators only need to set relevant parameters on the control panel, making operation relatively easy and reducing the need for specialized skills. The wafers are developed in a closed immersion tank, where the ginger pathogen sample solution is in a relatively stable environment, greatly ensuring the stability of the development effect. For wafers of different sizes, simply changing the placement tray with different sized slots can accommodate the fixing needs of wafers of different sizes, improving the device's adaptability to different wafer sizes, expanding its application range, and enhancing its practicality and cost-effectiveness, making it more competitive in the market. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the immersion developing apparatus of this utility model;

[0018] Figure 2 This is a perspective view of the immersion developing apparatus of this utility model;

[0019] Figure 3 This is a schematic diagram of the control structure and wafer fixing structure of this utility model;

[0020] Figure 4 This is a schematic diagram of the wafer immersion structure and solution circulation structure of this utility model;

[0021] Figure 5 This is a schematic diagram of the valve structure of this utility model.

[0022] In the diagram: 1. Main body of the developing device; 2. Control console; 3. Display screen; 4. Observation window; 5. Divider plate; 6. Immersion tank; 7. Insulation ring; 8. Temperature sensor; 9. Heating tube; 10. Top cover; 11. Adjustable fixing block; 12. Placement tray; 13. Hollowed-out groove; 14. Center plate; 15. Servo motor; 16. Control lever; 17. Rotating disk; 18. Connecting disk; 19. Connecting rod; 20. Air pump guide rod; 1. Same-frequency air pump; 22. Moving plate; 23. Drive gear; 24. First same-frequency motor; 25. First motor rod; 26. Meshing rack; 27. Guide rail; 28. First liquid storage tank; 29. ​​Liquid replenishment pipe; 30. Liquid inlet pipe; 31. Water pump; 32. Second liquid storage tank; 33. Drain pipe; 34. Drain pipe; 35. Second same-frequency motor; 36. Second motor rod; 37. Valve partition plate; 38. Valve plate. Detailed Implementation

[0023] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention.

[0024] Please see Figure 1-5 This utility model provides a wafer immersion and development apparatus for manufacturing biosensor chips, including a development apparatus body 1, a control console 2 fixedly disposed on the front of the development apparatus body 1, a display screen 3 disposed on the top of the control console 2, an observation window 4 disposed in the middle of the front of the development apparatus body 1, a partition plate 5 fixedly disposed in the middle of the inner cavity of the development apparatus body 1, a wafer immersion structure fixedly connected to the bottom of the partition plate 5, a wafer fixing structure disposed inside the wafer immersion structure, a control structure disposed at the top of the wafer fixing structure, and a solution circulation structure fixedly connected to the bottom of the wafer immersion structure.

[0025] During use, the operator observes the display screen 3 at the top of the control console 2 to confirm the initial status information of each part of the device and ensure that the equipment is operating normally. Through the observation window 4 in the middle of the front of the developing device body 1, the operator checks whether there are any foreign objects remaining inside the device. According to the process requirements for manufacturing biosensor chips, the operator inputs various parameters on the control console 2.

[0026] Furthermore, the wafer immersion structure includes an immersion tank 6, an insulation ring 7 is fixedly connected to the inner surface of the immersion tank 6, a temperature sensor 8 is fixedly connected to one side of the inner surface of the insulation ring 7, and a heating tube 9 is fixedly installed at the bottom of the immersion tank 6.

[0027] During use, the prepared ginger pathogen sample solution is injected into the soaking tank 6 until the appropriate liquid level is reached. The temperature sensor 8 monitors the temperature of the solution in real time and transmits the collected temperature data to the control console 2. When the temperature sensor 8 detects that the solution temperature is lower than the set value, the heating tube 9 is quickly activated to raise the solution temperature back to the appropriate range.

[0028] Furthermore, the wafer fixing structure includes a top cover 10, the surface of which is threaded with a number of evenly distributed adjustable fixing blocks 11, the bottom end of the top cover 10 is provided with a placement tray 12, the bottom surface of the placement tray 12 is provided with a number of evenly distributed hollow grooves 13, and the number of adjustable fixing blocks 11 penetrate the surface of the placement tray 12 and extend to the bottom end of the placement tray 12.

[0029] In use, the wafer to be developed is placed in the hollow groove 13, and then the top cover 10 and the placement plate 12 are fixed together by the adjustable fixing block 11 to fix the wafer.

[0030] Furthermore, the control structure includes a center plate 14 and a moving plate 22. A servo motor 15 is provided in the middle of the surface of the center plate 14. A control rod 16 is fixedly connected to the bottom end of the servo motor 15. A rotating disk 17 is fixedly connected to the bottom end of the control rod 16. A connecting disk 18 is provided at the bottom end of the rotating disk 17. Several evenly distributed connecting rods 19 are fixedly connected to the bottom surface of the connecting disk 18. The bottom surfaces of the several connecting rods 19 are all fixedly connected to the top surface of the top cover 10.

[0031] In use, the servo motor 15 drives the control lever 16 to rotate, and the control lever 16 transmits the rotational motion to the rotating disk 17. The rotating disk 17 rotates accordingly, driving the connecting disk 18 and the connecting rod 19 to rotate synchronously. This causes the top cover 10 to rotate together with the wafer placed on the placement disk 12, ensuring that the wafer rotates in the solution at a suitable speed and angle, so that the solution can act evenly on all parts of the wafer.

[0032] Furthermore, air pump guide rods 20 are fixedly connected to both sides of the top of the center plate 14, and the top of each air pump guide rod 20 is fixedly connected to a synchronous air pump 21. The top of each synchronous air pump 21 is fixedly connected to the bottom of the moving plate 22. Both sides of the moving plate 22 are provided with drive gears 23. The upper ends of both sides of the moving plate 22 are provided with first synchronous motors 24. The bottom ends of each of the two first synchronous motors 24 are fixedly connected to first motor rods 25. Both first motor rods 25 extend through the moving plate 22 to the surface of the drive gears 23. One side of each of the two drive gears 23 is meshed with a meshing rack 26. The surfaces of each of the two meshing racks 26 are fixedly connected with guide rails 27. One side of each of the two guide rails 27 is fixedly connected to the surface of the inner cavity of the developing device body 1.

[0033] When in use, the development process is started. The control console 2 sends a command to the two synchronous air pumps 21, and the two synchronous air pumps 21 start working. Through the air pump guide rod 20, a vertical force is applied to the moving plate 22, which lowers the moving plate 22 and the wafer fixing structure connected to it to a suitable depth in the solution, so that the wafer is fully immersed in the solution and the solution can evenly cover the wafer surface. When it is necessary to observe the wafer development effect at close range or to change the placement tray 12, the control console 2 controls the first synchronous motor 24 to drive the first motor rod 25 to rotate, which in turn drives the drive gear 23 to rotate and mesh with the meshing rack 26, moving the moving plate 22 horizontally along the guide rail 27 to the observation window 4 or the position behind it where work can be carried out.

[0034] Furthermore, the solution circulation structure includes a first storage tank 28 and a second storage tank 32. The bottom end of the first storage tank 28 is fixedly connected to one side of the bottom of the developing device body 1. A replenishment pipe 29 is provided on one side of the first storage tank 28. An inlet pipe 30 is fixedly connected to the top of the first storage tank 28. The top of the inlet pipe 30 is fixedly connected to one side of the bottom of the soaking tank 6. A water pump 31 is provided on one side of the inlet pipe 30. The bottom end of the water pump 31 is fixedly connected to the top of the first storage tank 28. A drain pipe 33 is provided on one side of the second storage tank 32. A drain pipe 34 is fixedly connected to the top of the second storage tank 32. A valve structure is provided at the upper end of both the inlet pipe 30 and the drain pipe 34.

[0035] When in use, open the valve structure at the upper end of the liquid inlet pipe 30 and start the water pump 31 to transport the ginger pathogen sample solution in the first liquid storage tank 28 to the soaking tank 6 through the liquid inlet pipe 30. After development is completed, open the valve structure at the upper end of the liquid outlet pipe 34. Under the action of gravity, the solution in the soaking tank 6 flows into the second liquid storage tank 32 through the liquid outlet pipe 34.

[0036] Furthermore, the valve structure includes a second synchronous motor 35, one end of which is fixedly connected to a second motor rod 36, and a valve partition plate 37 is rotatably connected to the surface of the second motor rod 36. A valve plate 38 is provided in the middle of the valve partition plate 37, and the middle of the valve plate 38 is fixedly connected to the middle of the second motor rod 36.

[0037] In use, the control console 2 sends a command to the second synchronous motor 35, which drives the second motor rod 36 to rotate, thereby driving the valve plate 38 to open and close precisely, controlling the flow rate of liquid inlet or outlet.

[0038] In this embodiment of the application, the control console 2 starts the water pump 31 to transport the ginger pathogen sample solution in the first storage tank 28 to the soaking tank 6 through the liquid inlet pipe 30. According to the data fed back by the temperature sensor 8, the heating tube 9 is precisely controlled to heat the ginger pathogen sample solution to a suitable temperature. The heat preservation ring 7 keeps the temperature of the ginger pathogen sample solution stable. The synchronous frequency air pump 21 is controlled to drive the moving plate 22 to move vertically through the air pump guide rod 20, so that the wafer reaches a suitable depth in the soaking tank 6. The servo motor 15 drives the control rod 16, the rotating disk 17, the connecting disk 18 and the connecting rod 19 to rotate, so that the wafer in the top cover 10, the placement disk 12 and the hollow groove 13 rotates, ensuring that the ginger pathogen sample solution is evenly applied to all parts of the wafer.

[0039] Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A wafer immersion and developing apparatus for manufacturing biosensor chips, comprising a developing apparatus body (1), characterized in that: A control console (2) is fixedly installed on the front of the developing device body (1). A display screen (3) is provided at the top of the control console (2). An observation window (4) is provided in the middle of the front of the developing device body (1). A partition plate (5) is fixedly installed in the middle of the inner cavity of the developing device body (1). A wafer immersion structure is fixedly connected to the bottom of the partition plate (5). A wafer fixing structure is provided inside the wafer immersion structure. A control structure is provided at the top of the wafer fixing structure. A solution circulation structure is fixedly connected to the bottom of the wafer immersion structure.

2. The wafer immersion and development apparatus for manufacturing biosensor chips according to claim 1, characterized in that: The wafer immersion structure includes an immersion tank (6), an insulation ring (7) is fixedly connected to the inner surface of the immersion tank (6), a temperature sensor (8) is fixedly connected to one side of the inner surface of the insulation ring (7), and a heating tube (9) is fixedly provided at the bottom of the immersion tank (6).

3. The wafer immersion and development apparatus for manufacturing biosensor chips according to claim 1, characterized in that: The wafer fixing structure includes a top cover (10), the surface of which is threaded with a number of evenly distributed adjustable fixing blocks (11), the bottom end of which is provided with a placement disk (12), the bottom surface of which is provided with a number of evenly distributed hollow grooves (13), and the number of adjustable fixing blocks (11) penetrates the surface of the placement disk (12) and extends to the bottom end of the placement disk (12).

4. The wafer immersion and development apparatus for manufacturing biosensor chips according to claim 3, characterized in that: The control structure includes a center plate (14) and a moving plate (22). A servo motor (15) is provided in the middle of the surface of the center plate (14). A control rod (16) is fixedly connected to the bottom end of the servo motor (15). A rotating disk (17) is fixedly connected to the bottom end of the control rod (16). A connecting disk (18) is provided at the bottom end of the rotating disk (17). Several evenly distributed connecting rods (19) are fixedly connected to the bottom surface of the connecting disk (18). The bottom surfaces of several connecting rods (19) are all fixedly connected to the top surface of the top cover (10).

5. The wafer immersion and development apparatus for manufacturing biosensor chips according to claim 4, characterized in that: Air pump guide rods (20) are fixedly connected to both sides of the top of the center plate (14). The top of each of the two air pump guide rods (20) is fixedly connected to a synchronous air pump (21). The top of each of the two synchronous air pumps (21) is fixedly connected to the bottom of the moving plate (22). Both sides of the moving plate (22) are provided with drive gears (23). The upper ends of both sides of the moving plate (22) are provided with first synchronous motors (24). The bottom ends of each of the two first synchronous motors (24) are fixedly connected to first motor rods (25). The two first motor rods (25) extend through the moving plate (22) to the surface of the drive gears (23). One side of each of the two drive gears (23) is meshed with a meshing rack (26). The surfaces of each of the two meshing racks (26) are fixedly connected to guide rails (27). One side of each of the two guide rails (27) is fixedly connected to the surface of the inner cavity of the developing device body (1).

6. The wafer immersion and development apparatus for manufacturing biosensor chips according to claim 1, characterized in that: The solution circulation structure includes a first storage tank (28) and a second storage tank (32). The bottom end of the first storage tank (28) is fixedly connected to one side of the bottom of the developing device body (1). A replenishment pipe (29) is provided on one side of the first storage tank (28). An inlet pipe (30) is fixedly connected to the top end of the first storage tank (28). The top end of the inlet pipe (30) is fixedly connected to one side of the bottom end of the soaking tank (6). A water pump (31) is provided on one side of the inlet pipe (30). The bottom end of the water pump (31) is fixedly connected to the top end of the first storage tank (28). A drain pipe (33) is provided on one side of the second storage tank (32). A drain pipe (34) is fixedly connected to the top end of the second storage tank (32). A valve structure is provided at the upper end of the inlet pipe (30) and the upper end of the drain pipe (34).

7. The wafer immersion and development apparatus for manufacturing biosensor chips according to claim 6, characterized in that: The valve structure includes a second synchronous motor (35), one end of which is fixedly connected to a second motor rod (36), and a valve partition plate (37) is rotatably connected to the surface of the second motor rod (36). A valve plate (38) is provided in the middle of the valve partition plate (37), and the middle of the valve plate (38) is fixedly connected to the middle of the second motor rod (36).

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