Wafer spin-drying equipment

Abstract

A wafer spin-drying device comprises an outer sleeve, a rotating assembly and a balancing assembly. The outer sleeve comprises a top opening, a bottom opening and a cavity communicated with the top opening and the bottom opening. The rotating assembly is located in the outer sleeve and comprises a driving element and a rotating platform which is coupled with the driving element and located in the cavity, and the rotating platform is configured to bear at least one wafer box containing a plurality of wafers and is driven by the driving element to rotate relative to a main shaft. The balancing assembly is coupled to the rotating platform and comprises a first balancing weight and a second balancing weight, the first balancing weight and the second balancing weight rotate along with the rotating platform and are symmetrically arranged relative to the vertical direction of the main shaft, the first balancing weight has a first radial distance relative to the main shaft, and the second balancing weight has a second radial distance relative to the main shaft.

Description

Technical Field

[0001] This utility model relates to a semiconductor manufacturing process equipment, and more particularly to a wafer spin dryer. Background Technology

[0002] Centrifugal drying technology is widely used in the field of wafer cleaning to dry wafers. Centrifugal drying is achieved by using external force to make the wafer rotate at high speed. The liquid on the wafer surface leaves the wafer surface due to the centrifugal force generated by the high speed rotation, thus achieving the purpose of drying. Depending on the direction of wafer rotation, centrifugal drying can be divided into vertical drying and horizontal drying, with horizontal drying being the more common wafer drying technology.

[0003] In horizontal spin dryer technology, two sets of wafers are typically placed symmetrically into the dryer to ensure counterweight and balance during operation. However, in actual operation, the number of wafers in the two sets often differs, causing the wafers to be unbalanced in the dryer, directly affecting drying quality (such as breakage rate). A conventional method is to lock a counterweight block onto the rotating disk of the dryer; however, this method is not only inefficient but also prone to inaccurate counterweighting, easily leading to poor drying quality.

[0004] Therefore, how to solve the problem of poor wafer spin drying quality caused by inaccurate weighting is a problem that those skilled in the art urgently need to solve. Utility Model Content

[0005] The main purpose of this invention is to solve the problem of inaccurate counterweight methods in conventional wafer spin dryer equipment.

[0006] A wafer spin dryer includes an outer sleeve, a rotating assembly, and a balancing assembly. The outer sleeve defines a top opening, a bottom opening, and a chamber connecting the top opening and the bottom opening. The rotating assembly is located within the outer sleeve and includes a drive element and a rotating platform coupled to the drive element and located within the chamber. The rotating platform is configured to carry at least one wafer cassette containing a plurality of wafers and is driven by the drive element to rotate relative to a spindle. The balancing assembly is coupled to the rotating platform and includes a first counterweight and a second counterweight symmetrically arranged in a vertical direction relative to the spindle as the rotating platform rotates. The first counterweight has a first radial distance relative to the spindle, and the second counterweight has a second radial distance relative to the spindle.

[0007] In one embodiment, the first counterweight has a fixed value in the first radial distance relative to the spindle, and the second counterweight has an adjustable value in the second radial distance relative to the spindle.

[0008] In one embodiment, a top plate is also included, the top plate including a plate body and a pressure-bearing reaction assembly disposed in an annular receiving portion of the plate body, the annular receiving portion being formed around a hollow portion.

[0009] In one embodiment, the device further includes a discharge assembly disposed on one side of the outer sleeve and communicating with the chamber, the outer sleeve defining a lateral opening communicating with the chamber and the discharge assembly.

[0010] In one embodiment, the rotating assembly further includes a plurality of guide vanes non-centripetally disposed on the rotating platform.

[0011] In one embodiment, the guide vanes are evenly spaced along an edge of an upper surface of the rotating platform.

[0012] In one embodiment, the balancing assembly includes a counterweight placement platform coupled below and spaced apart from the rotating platform, with the first counterweight and the second counterweight disposed on the counterweight placement platform.

[0013] In one embodiment, the balancing assembly includes a counterweight adjustment assembly fixed to the counterweight placement platform and driving the second counterweight block to move radially relative to the main shaft along the counterweight placement platform.

[0014] In one embodiment, the counterweight adjustment assembly includes a base fixed to the counterweight placement platform, a motor component fixed to one side of the base, at least one slide rail disposed on a top surface of the base and extending radially therefrom, and a rod connected to the motor component and disposed parallel to the slide rail.

[0015] In one embodiment, the second counterweight is movably mounted on the rod and the slide rail, and the rod is driven by the motor element to move the second counterweight along the radial direction. Attached Figure Description

[0016] Figure 1 This is an assembly diagram of an embodiment of the present utility model;

[0017] Figure 2 This is an exploded view of an embodiment of the present utility model;

[0018] Figure 3 This is a three-dimensional schematic diagram of the outer sleeve according to an embodiment of the present utility model;

[0019] Figure 4 This is an exploded view of a lifting cover according to an embodiment of the present utility model;

[0020] Figure 5A This is a three-dimensional cross-sectional view of the top plate according to an embodiment of the present utility model;

[0021] Figure 5B ,for Figure 5A A magnified view of a portion of the image;

[0022] Figure 6 This is an exploded view of the rotating component and the balancing component according to an embodiment of the present invention.

[0023] Figure 7 This is a schematic diagram of the assembly of a counterweight adjustment component according to an embodiment of the present utility model;

[0024] Figure 8A This is a three-dimensional schematic diagram of a discharge component according to an embodiment of the present utility model;

[0025] Figure 8B ,for Figure 8A A three-dimensional cross-sectional view;

[0026] Figure 9A This is a cross-sectional schematic diagram of the discharge component according to an embodiment of the present utility model;

[0027] Figure 9B This is a cross-sectional schematic diagram of the discharge component according to an embodiment of the present utility model.

[0028] [Symbol Explanation]

[0029] 10: Frame

[0030] 11: External scaffolding

[0031] 11a: Accommodation space

[0032] 111: Upper Part

[0033] 112: Lower Part

[0034] 12: Inner frame

[0035] 20: Outerwear

[0036] 21: Top Wall

[0037] 22: Circumferential wall

[0038] 221: Top opening

[0039] 222: Bottom opening

[0040] 223: Lateral opening

[0041] 22a: Chamber

[0042] 23: Discharge section

[0043] 30: Lid Opening

[0044] 31: Cover plate

[0045] 311: Lower surface

[0046] 32: Pivot Component

[0047] 321: Pivot

[0048] 322: Actuating element

[0049] 33: Seals

[0050] 34: Ring plate

[0051] 40: Top plate

[0052] 41: Plate body

[0053] 411: Hollow section

[0054] 412: Annular receiving portion

[0055] 42: Pressure-bearing reaction assembly

[0056] 421: Pressure ring

[0057] 421a: Bottom surface

[0058] 421b: Setting Space

[0059] 422: Conductive ring

[0060] 422a: Top surface

[0061] 423: Signal Transmission Unit

[0062] 50: Rotating component

[0063] 51: Driving element

[0064] 52: Transmission components

[0065] 53: Rotation axis

[0066] 54: Rotating Platform

[0067] 541: Upper surface

[0068] 541a: Edge

[0069] 55: Guide vanes

[0070] 60: Balancing component

[0071] 61: Counterweight Placement Platform

[0072] 62: Counterweight Adjustment Component

[0073] 621: Base

[0074] 622: Side Seat

[0075] 623: Electric motor components

[0076] 624: Slide rail

[0077] 625: Rod

[0078] 626: Sensor

[0079] 63: First counterweight

[0080] 64: Second counterweight

[0081] 70: Discharge Component

[0082] 71: Shell

[0083] 711: Part One

[0084] 712: Part Two

[0085] 7121: First Wall

[0086] 7122: Second wall

[0087] 713: Guiding Channel

[0088] 714: Cavity

[0089] 714a: Upper region

[0090] 714b: Lower area

[0091] 7141: First Space

[0092] 7142: The Second Space

[0093] 715: Entrance

[0094] 716: Liquid outlet

[0095] 717: Gas Outlet

[0096] 72: Diversion Structure

[0097] 721: Gradual narrowing

[0098] 722: Reflector

[0099] 7221: Barrier Structure

[0100] 723: Fixed blocking component

[0101] 724: Movable blocking component

[0102] A1: Spindle

[0103] A2: Centripetal axis

[0104] d1: Distance

[0105] d2: Distance

[0106] D1: First radial distance

[0107] D2: Second radial distance

[0108] F: Fluid flow

[0109] A: Airflow

[0110] L: Liquid

[0111] θ: Angle Detailed Implementation

[0112] The terminology used herein is for the purpose of illustrating particular embodiments only and is not intended to limit the invention. Unless the context otherwise indicates, the singular forms “a” and “the” used herein may also include the plural forms.

[0113] The directional terms used herein, such as up, down, left, right, front, back, and their derivatives or synonyms, relate to the orientation of elements in the accompanying drawings and are not intended to limit the present invention, unless the context clearly states otherwise. The detailed description and technical content of the present invention are now explained in conjunction with the accompanying drawings:

[0114] See Figure 1 and Figure 2 This utility model discloses a wafer spin dryer, including a frame 10, an outer sleeve 20, a lifting cover 30, a top plate 40, a rotating component 50, a balancing component 60, and a discharge component 70.

[0115] The frame 10 includes an outer frame 11 and an inner frame 12. The outer frame 11 defines an accommodating space 11a and has an upper portion 111 and a lower portion 112. The inner frame 12 is located within the accommodating space 11a and is fixed to the lower portion 112 of the outer frame 11.

[0116] The outer sleeve 20 is mounted on the outer frame 11 of the frame body 10. The outer sleeve 20 includes a top wall 21, an annular wall 22 and a discharge part 23. The top wall 21 is fixed to the upper part 111 of the outer frame 11. The annular wall 22 is fixed to the inner frame 12 and extends downward from the top wall 21 to define a chamber 22a. The discharge part 23 is disposed on one side of the annular wall 22 and communicates with the chamber 22a.

[0117] See Figure 2 and Figure 3The annular wall 22 includes a top opening 221, a bottom opening 222, and a lateral opening 223. The top opening 221 and the bottom opening 222 are defined as being formed along a main axis A1, and the lateral opening 223 is defined as being formed along a tangent direction of the annular wall 22. The top opening 221 is located above the annular wall 22 and penetrates through it. The bottom opening 222 is located below the annular wall 22 and is located on the opposite side of the top opening 221 in the main axis A1 direction. The lateral opening 223 penetrates through the annular wall 22. The chamber 22a connects the top opening 221, the bottom opening 222, and the lateral opening 223, and the discharge portion 23 connects to the chamber 22a via the lateral opening 223.

[0118] See Figure 2 and Figure 4 The cover 30 is disposed on the outer frame 11 of the frame 10 and located on the upper part 111. The cover 30 includes a cover plate 31, a pivot assembly 32, a seal 33 and a ring plate 34.

[0119] The cover plate 31 is connected to the pivot assembly 32 and coupled to the upper portion 111 of the outer frame 11 via the pivot assembly 32, allowing the cover plate 31 to be operably positioned above the outer sleeve 20 and open / close relative to the top opening 221. The pivot assembly 32 includes a pivot 321 and an actuating element 322, which drives the pivot 321 to rotate the cover plate 31 about the pivot 321, thereby opening or closing relative to the top opening 221. The sealing member 33 is disposed on a lower surface 311 of the cover plate 31, and the annular plate 34 is disposed on an inner side of the sealing member 33 and located below the cover plate 31.

[0120] See Figure 2 , Figure 5A and Figure 5B The top plate 40 is disposed above the frame 10 and between the outer frame 11 and the cover plate 31. The top plate 40 includes a plate body 41 and a pressure-bearing reaction component 42. The plate body 41 is located outside the accommodating space 11a and covers the top wall 21. The plate body 41 includes a hollow portion 411 and an annular accommodating portion 412. The annular accommodating portion 412 is disposed around the hollow portion 411, and the pressure-bearing reaction component 42 is disposed on the annular accommodating portion 412.

[0121] The pressure-bearing reaction assembly 42 includes a pressure-bearing ring 421, a conductive ring 422, and a signal transmitting unit 423. The pressure-bearing ring 421 is disposed above the conductive ring 422, with a bottom surface 421a of the pressure-bearing ring 421 and a top surface 422a of the conductive ring 422 spaced apart by a distance d1. The signal transmitting unit 423 is fixed to a mounting space 421b of the pressure-bearing ring 421. The mounting space 421b is located on opposite sides of the pressure-bearing ring 421 and extends upward from the bottom surface 421a of the pressure-bearing ring 421, while the signal transmitting unit 423 is located between the conductive ring 422 and the pressure-bearing ring 421 and between the top surface 421a of the conductive ring 422 and the top surface 421a of the conductive ring 422. A distance d2 is spaced between 2a and 3a, where d1 is less than d2. When the cover 30 is closed and the cover plate 31 presses the pressure ring 421 down to contact the conductive ring 422 (the distance d1 is pressed down to zero), the signal transmitting unit 423 is activated. The signal transmitting unit 423 transmits a dynamic signal to the rotating component 50. In one example, the rotating component 50 is configured to activate when the pressure exerted on the pressure-bearing reaction component 42 by the cover plate 31 relative to the top plate 40 exceeds a threshold. In this embodiment, there are two signal transmitting units 423, symmetrically arranged on opposite sides (180° apart) of the pressure ring 421 within the setting space 421b.

[0122] See Figure 2 and Figure 6 The rotating assembly 50 includes a drive element 51, a transmission element 52, a rotating shaft 53, a rotating platform 54, and multiple guide vanes 55.

[0123] The drive element 51 is actuated by the actuation signal transmitted by the signal transmitting unit 423. The rotating platform 54 is coupled to the drive element 51. The drive element 51 is disposed on one side of the rotating shaft 53 and drives the rotating shaft 53 to rotate through the transmission element 52. The rotating platform 54 is disposed on the rotating shaft 53 and located in the chamber 22a. The rotating platform 54 carries at least one wafer cassette containing multiple wafers and is driven by the drive element 51 to rotate relative to the main shaft A1. A central axis of the rotating shaft 53 coincides with the main shaft A1. The guide vanes 55 are non-centripetally disposed on the rotating platform 54 and are evenly spaced annularly arranged on an edge 541a of an upper surface 541 of the rotating platform 54. One extension direction of the guide vanes 55 does not pass through the main shaft A1. In one example, the extension direction of the guide vanes 55 is rotated clockwise or counterclockwise by an angle θ relative to a centripetal axis A2, where the angle θ is between 20° and 30°. The guide vanes 55 guide the gas to rotate as the rotating platform 54 rotates.

[0124] In this embodiment, the driving element 51 is a motor, such as a DC motor, and the transmission element 52 is a toothed belt. The driving element 51 and the rotating shaft 53 are driven by gears and the transmission element 52 to drive the rotating platform 54 disposed on the rotating shaft 53 to rotate.

[0125] The balancing component 60 is coupled to the rotating platform 54 of the rotating component 50 and rotates with the rotating platform 54. The balancing component 60 includes a counterweight placement platform 61, a counterweight adjustment component 62, a first counterweight block 63, and a second counterweight block 64. The counterweight placement platform 61 is coupled below the rotating platform 54. The first counterweight block 63, the counterweight adjustment component 62, and the second counterweight block 64 are disposed on the counterweight placement platform 61. In this embodiment, the first counterweight block 63, the counterweight adjustment component 62, and the second counterweight block 64 are located above the counterweight placement platform 61 and between the counterweight placement platform 61 and the rotating platform 54. In other embodiments, the first counterweight block 63, the counterweight adjustment component 62, and the second counterweight block 64 may be disposed below the counterweight placement platform 61 or directly fixed below the rotating platform 54.

[0126] The first counterweight 63 and the second counterweight 64 rotate with the rotating platform 54 and are symmetrically arranged in a vertical direction (axial direction) relative to the main shaft A1. The first counterweight 63 has a first radial distance D1 relative to the main shaft A1, and the second counterweight 64 has a second radial distance D2 relative to the main shaft A1. The first counterweight 63 is directly fixed to the counterweight placement platform 61, so the first radial distance D1 has a fixed value. The counterweight adjustment assembly 62 is fixed to the counterweight placement platform 61, and the second counterweight 64 is disposed on the counterweight adjustment assembly 62 and is driven by the counterweight adjustment assembly 62 to move radially relative to the main shaft A1 (moving away from or closer to the main shaft A1), so the second radial distance D2 has an adjustable value.

[0127] See Figure 6 and Figure 7The counterweight adjustment assembly 62 includes a base 621, a side seat 622, a motor element 623, at least one slide rail 624, a rod 625, and a sensor 626. The base 621 is fixed to the counterweight placement platform 61. The side seat 622 is fixed to the base 621 and located on the side away from the main shaft A1. The motor element 623 is fixed to the side seat 622. The slide rail 624 is disposed on a top surface of the base 621 and extends radially along the counterweight placement platform 61. The rod 625 connects to the motor element 623 and is disposed parallel to the slide rail 624. The second counterweight 64 is movably mounted on the rod 625 and the slide rail 624, and the second counterweight 64 moves radially by rotating the rod 625 driven by the motor element 623. In this embodiment, the rod 625 is a screw, and the second counterweight 64 has a threaded hole relative to the rod 625, so that when the rod 625 rotates, the second counterweight 64 moves along the axial direction of the rod 625 (the radial direction of the counterweight placement platform 61), making the second radial distance D2 variable.

[0128] The sensor 626 is disposed on one side of the base 621 and close to the side seat 622. The sensor 626 is electrically connected to the motor element 623. When the sensor 626 detects that the second counterweight 64 is close to the side seat 622 and the motor element 623, the motor element 623 stops operating.

[0129] See Figure 2 , Figure 8A and Figure 8B The discharge assembly 70 is connected to the discharge section 23 of the outer sleeve 20. The centrifugal force generated by the rotation of the rotating assembly 50 causes a liquid L (such as water or a reaction agent) to be removed from the surface of the wafer. Together with an airflow A (such as nitrogen used in the drying process) in the chamber 22a, a fluid flow F is formed and sequentially guided through the side opening 223 and the discharge section 23 to the discharge assembly 70.

[0130] The discharge assembly 70 includes a housing 71 and a diversion structure 72. The housing 71 is connected to the lateral opening 223 of the outer sleeve 20. The housing 71 includes a first portion 711 and a second portion 712. The first portion 711 communicates with the lateral opening 223 and extends obliquely downward to the second portion 712. The second portion 712 is connected downstream of the first portion 711. The first portion 711 defines a guide channel 713, and the second portion 712 defines a cavity. 714, the guide channel 713 is laterally connected to the cavity 714, the cavity 714 is divided into an upper region 714a and a lower region 714b by the diversion structure 72, the housing 71 also includes an inlet 715, a liquid outlet 716 and a gas outlet 717, the inlet 715 is connected to the guide channel 713, the liquid outlet 716 is connected to the lower region 714b of the cavity 714, and the gas outlet 717 is connected to the upper region 714a of the cavity 714.

[0131] The inlet 715 connects to the outlet 23 to receive the fluid flow F (liquid L and gas flow A) that is removed from the chamber 22a during the swirl drying process. The liquid L and the gas flow A are respectively moved to the liquid outlet 716 and the gas outlet 717 via the diversion structure 72. The diversion structure 72 is located in the cavity 714 and includes a tapered opening 721, a reflector 722, a fixed blocking member 723, and a movable blocking member 724. The tapered opening 721 is connected between the guide channel 713 and the lower region 714b to receive the liquid L. Due to gravity, the liquid L flows along the tapered opening 721 to the cavity 714 of the housing 71 and is discharged from the liquid outlet 716. The reflector 722 is inclinedly disposed in a flow direction defined by the guide channel 713 to receive the fluid flow F. The fluid flow F is blocked by the reflector 722, causing the liquid L to flow toward the converging orifice 721 and guiding the airflow A to the upper region 714a. Furthermore, the reflector 722 has a blocking structure 7221, which is disposed perpendicular to the flow direction on the side of the reflector 722 near the converging orifice 721, and can guide the liquid L to the lower region 714b of the cavity 714.

[0132] The second part 712 of the housing 71 includes a first wall 7121 and a second wall 7122. The first wall 7121 and the second wall 7122 are disposed opposite each other and the second wall 7122 is located on the side close to the first part 711. The fixed blocking member 723 extends from the first wall 7121 into the cavity 714. The movable blocking member 724 extends from the second wall 7122 into the cavity 714 and contacts the fixed blocking member 723. The reflector 722 extends from the second wall 7122 into the cavity 714.

[0133] See Figure 9A and Figure 9B The fixed blocking member 723 and the movable blocking member 724 are disposed in the upper region 714a. The fixed blocking member 723 and the movable blocking member 724 are in contact with each other under normal conditions, thereby separating the upper region 714a into a first space 7141 and a second space 7142 (e.g., Figure 9A As shown), when the fluid flow F separates the liquid L and the airflow A, the liquid L flows to the lower region 714b and is discharged from the liquid outlet 716, while the airflow A flows to the upper region 714a, causing the movable stop 724 to open due to the push of the airflow A, thus connecting the first space 7141 and the second space 7142 to each other (as shown). Figure 9B (as shown), and the airflow A enters the first space 7141 from the second space 7142 and exits from the gas outlet 717.

[0134] In summary, when the wafer cassette (or wafer) placed in the outer sleeve is not in a balanced state, the second counterweight is set on the counterweight adjustment assembly and can move radially relative to the main shaft, thereby adjusting the weight balance of the rotating assembly during rotation.

Claims

1. A wafer spin dryer, characterized in that, include: An outer sleeve defines a top opening, a bottom opening, and a chamber connecting the top opening and the bottom opening; A rotating assembly, located within the outer sleeve, includes a drive element and a rotating platform coupled to the drive element and located within the chamber. The rotating platform is configured to carry at least one wafer cassette containing a plurality of wafers and is driven by the drive element to rotate relative to a spindle. A balancing assembly is coupled to the rotating platform. The balancing assembly includes a first counterweight and a second counterweight that are symmetrically arranged in a vertical direction relative to the main shaft as the rotating platform rotates. The first counterweight has a first radial distance relative to the main shaft, and the second counterweight has a second radial distance relative to the main shaft.

2. The wafer spin dryer according to claim 1, characterized in that, The first counterweight has a fixed value in its first radial distance relative to the main shaft, and the second counterweight has an adjustable value in its second radial distance relative to the main shaft.

3. The wafer spin dryer according to claim 1, characterized in that, It also includes a top plate, which includes a plate body and a pressure-bearing reaction assembly disposed in an annular receiving portion of the plate body, the annular receiving portion being formed around a hollow portion.

4. The wafer spin dryer according to claim 1, characterized in that, It also includes a discharge assembly disposed on one side of the outer sleeve and communicating with the chamber, the outer sleeve defining a lateral opening communicating with the chamber and the discharge assembly.

5. The wafer spin dryer according to claim 1, characterized in that, The rotating assembly also includes multiple guide vanes that are non-centripetally disposed on the rotating platform.

6. The wafer spin dryer according to claim 5, characterized in that, The guide vanes are evenly spaced on one edge of an upper surface of the rotating platform.

7. The wafer spin dryer according to claim 1, characterized in that, The balancing assembly includes a counterweight placement platform coupled below the rotating platform and spaced apart by a distance, with the first counterweight and the second counterweight disposed on the counterweight placement platform.

8. The wafer spin dryer according to claim 7, characterized in that, The balancing assembly includes a counterweight adjustment assembly fixed to the counterweight placement platform and driving the second counterweight block to move radially relative to the main shaft along the counterweight placement platform.

9. The wafer spin dryer according to claim 8, characterized in that, The counterweight adjustment assembly includes a base fixed to the counterweight placement platform, a motor component fixed to one side of the base, at least one slide rail disposed on a top surface of the base and extending radially therein, and a rod connected to the motor component and disposed parallel to the slide rail.

10. The wafer spin dryer according to claim 9, characterized in that, The second counterweight is movably mounted on the rod and the slide rail, and the rod is driven by the motor component to move the second counterweight along the radial direction.

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