Gas separation and introduction device and ALD (atomic layer deposition) coating equipment

Abstract

The utility model discloses a gas separating and leading-in device and ALD (atomic layer deposition) coating equipment, the gas separating and leading-in device comprises a gas guide disc, a first flow guide channel and a second flow guide channel are arranged on the gas guide disc, and the first flow guide channel is communicated with the second flow guide channel; a first gas uniformizing channel communicated with the first flow guide channel and a second gas uniformizing channel communicated with the second flow guide channel are formed in the bottom of the gas guide disc, and the first gas uniformizing channel and the second gas uniformizing channel are used for introducing different gases; a plurality of first air uniformizing holes are formed in the first air uniformizing channel, and a plurality of second air uniformizing holes are formed in the second air uniformizing channel; the air supply assembly is arranged on one side of the air guide disc and comprises a first air supply pipeline communicated with the first flow guide channel and a second air supply pipeline communicated with the second flow guide channel, and the first air supply pipeline and the second air supply pipeline are communicated with air supply equipment. According to the utility model, two different gases are respectively and uniformly led out, so that the uniformity of gas inlet is ensured.

Description

Technical Field

[0001] This utility model relates to the fields of photovoltaic and semiconductor technology, and in particular to a gas separation and introduction device and an ALD coating equipment. Background Technology

[0002] Atomic Layer Deposition (ALD) is a self-limiting reaction process that allows for the deposition of films with a single-atom thickness. Because ALD precisely deposits one atomic layer per cycle, it enables complete control of the deposition process at the nanoscale, and the operation is simple. Compared to other current deposition methods, it offers advantages such as lower deposition temperature, precise thickness control, strong film adhesion, consistent layer-by-layer thickness, and good compositional uniformity, making it an advanced nanoscale surface treatment technology.

[0003] Alternating current (ALD) coating equipment is an analytical instrument used in the fields of chemistry and materials science. Currently, ALD coating equipment is widely used in the semiconductor integrated circuit industry, providing a broad application platform for semiconductor engineering, microelectromechanical systems (MEMS), and other nanotechnology applications. ALD coating equipment requires air intake above the workpiece tray, and it needs to ensure uniform and stable airflow. However, existing ALD coating equipment's air intake methods struggle to achieve separate intake of different gases when dealing with large coating surfaces, and it is difficult to guarantee the uniformity of air intake across the entire surface. Utility Model Content

[0004] In order to overcome the shortcomings of the prior art, the purpose of this utility model is to provide a gas separation and introduction device and an ALD coating equipment, which can meet the requirements of uniform gas introduction for different gases.

[0005] The objective of this utility model is achieved through the following technical solution:

[0006] According to a first aspect of the present disclosure, a gas separation and introduction device is provided, comprising:

[0007] A gas guide plate is provided with a first guide channel and a second guide channel. The bottom of the gas guide plate is provided with a first gas equalization channel connected to the first guide channel and a second gas equalization channel connected to the second guide channel. The first gas equalization channel and the second gas equalization channel are used to introduce different gases. The first gas equalization channel is provided with a plurality of first gas equalization holes and the second gas equalization channel is provided with a plurality of second gas equalization holes.

[0008] An air supply assembly is disposed on one side of the air guide plate. The air supply assembly includes: a first air supply pipeline connected to the first guide channel and a second air supply pipeline connected to the second guide channel. The first air supply pipeline and the second air supply pipeline are respectively connected to an air supply device.

[0009] To achieve the above technical solution, different types of gases are supplied through the first gas supply pipeline and the second gas supply pipeline respectively. The first type of gas is introduced into the first gas equalization channel through the first guide channel and discharged from the first gas equalization hole. The second type of gas is introduced into the second gas equalization channel through the second guide channel and discharged from the second gas equalization hole, so as to achieve the uniform output of the two different gases and ensure the uniformity of the intake.

[0010] In some exemplary embodiments, the first guide channel includes: a first main air inlet and a plurality of first sub-air guide holes arranged around the first main air inlet, the first main air inlet being connected to the first air supply pipeline, and the first sub-air guide holes being connected to the first uniform air channel.

[0011] In some exemplary embodiments, the second guide channel includes: a second main air inlet and a plurality of second sub-air guide holes arranged around the second main air inlet, the second main air inlet being connected to the second air supply pipeline, and the second sub-air guide holes being connected to the second uniform air channel.

[0012] To achieve the above technical solution, preliminary air equalization can be performed through the first and second air equalization channels, making the airflow distribution more uniform.

[0013] In some exemplary embodiments, both the first guide channel and the second guide channel are provided in two sets, and the first guide channel and the second guide channel are provided at intervals;

[0014] The first uniform air channel includes a first inner ring air channel and a first outer ring air channel that are respectively connected to the two sets of the first guide channels. The first outer ring air channel is located near the middle of the guide plate and the first outer ring air channel is located near the edge of the guide plate.

[0015] The second uniform air channel includes a second inner ring air channel and a second outer ring air channel that are respectively connected to the two sets of second guide channels. The second outer ring air channel is located near the middle of the air guide plate and near the edge of the air guide plate.

[0016] In some exemplary embodiments, the first inner ring airway is located inside the second inner ring airway, and the first outer ring airway is located outside the second outer ring airway.

[0017] To achieve the above technical solution, the reasonable distribution of the first inner ring airway, the first outer ring airway, the second inner ring airway, and the second outer ring airway can make the gas distribution on the air guide plate more uniform.

[0018] In some exemplary embodiments, the air supply assembly further includes: a mounting plate that is sealed and connected to the air guide plate, the mounting plate having a first air supply port corresponding to the first guide channel and a second air supply port corresponding to the second guide channel;

[0019] The first gas supply line is connected to the first gas supply port, and the second gas supply line is connected to the second gas supply port.

[0020] The above technical solution allows for easy connection to the first and second gas supply lines via the installation panel, improving installation convenience.

[0021] In some exemplary embodiments, both the first gas supply line and the second gas supply line are C-shaped, and the first gas supply line and the second gas supply line are arranged in an alternating manner due to their different heights.

[0022] The first gas supply pipeline has a first gas chamber in the middle, and the first gas chamber is connected to a first gas supply connector for connecting to an external gas supply device.

[0023] The second gas supply pipeline has a second gas chamber in the middle, and the second gas chamber is connected to a second gas supply connector for connecting to external gas supply equipment.

[0024] To achieve the above technical solution, the height difference between the first and second gas supply pipelines facilitates pipeline installation and reduces processing difficulty. The first and second gas chambers can be pressurized to maintain a suitable gas pressure when the gas enters the gas guide plate.

[0025] In some exemplary embodiments, a first sealing ring is provided between the first air supply port and the first guide channel, and a second sealing ring is provided between the second air supply port and the second guide channel.

[0026] The above technical solution achieves improved sealing performance through the first and second sealing rings, preventing the two gases from mixing.

[0027] In some exemplary embodiments, the air guide plate is further provided with a mounting cover, which is used to connect to the ALD coating equipment.

[0028] Implementing the above technical solution facilitates the installation of the gas separation and introduction device.

[0029] According to a second aspect of the present disclosure, an ALD coating apparatus is provided, including a gas separation and introduction device as described in the first aspect.

[0030] In summary, compared with the prior art, this utility model has the following beneficial effects:

[0031] This utility model embodiment provides a gas separation and introduction device and an ALD coating equipment. The gas separation and introduction device includes: a gas guide plate, on which a first guide channel and a second guide channel are provided. The bottom of the gas guide plate is provided with a first gas equalization channel connected to the first guide channel and a second gas equalization channel connected to the second guide channel. The first gas equalization channel and the second gas equalization channel are used to introduce different gases. The first gas equalization channel is provided with a plurality of first gas equalization holes and the second gas equalization channel is provided with a plurality of second gas equalization holes. A gas supply assembly is disposed on one side of the gas guide plate. The gas supply assembly includes: a first gas supply pipe connected to the first guide channel and a second gas supply pipe connected to the second guide channel. The first gas supply pipe and the second gas supply pipe are respectively connected to a gas supply device. Different types of gas are supplied through the first gas supply line and the second gas supply line respectively. The first type of gas is introduced into the first gas equalization channel through the first guide channel and discharged from the first gas equalization hole. The second type of gas is introduced into the second gas equalization channel through the second guide channel and discharged from the second gas equalization hole, so as to achieve the uniform discharge of the two different gases and ensure the uniformity of the intake. Attached Figure Description

[0032] Figure 1 This is a schematic diagram of the gas separation and introduction device in an embodiment of the present invention.

[0033] Figure 2 This is a structural schematic diagram of the gas separation and introduction device from another perspective in an embodiment of this utility model.

[0034] Figure 3 This is an exploded view of the air guide plate and air supply component in an embodiment of this utility model.

[0035] Figure 4 This is a schematic diagram of the air guide plate in an embodiment of the present invention.

[0036] Figure 5 This is a schematic diagram of the gas supply component in an embodiment of the present invention.

[0037] Figure 6 This is a top view of the air guide plate in an embodiment of this utility model.

[0038] Figure 7 For along Figure 6 Sectional view along the AA direction.

[0039] Figure 8 For along Figure 6 Sectional view along the BB direction.

[0040] Figure 9 For along Figure 6 A cross-sectional view along the CC direction.

[0041] The numbers and letters in the diagram represent the names of the corresponding components:

[0042] 10. Air guide plate; 11. First air guide channel; 111. First main air inlet; 112. First sub-air guide hole; 12. Second air guide channel; 121. Second main air inlet; 122. Second sub-air guide hole; 13. First air distribution channel; 131. First air distribution hole; 132. First inner ring air channel; 133. First outer ring air channel; 14. Second air distribution channel; 141. Second air distribution hole; 142. Second inner ring air channel; 143. Second outer ring air channel; 20. Air supply assembly; 21. First air supply pipeline; 211. First air chamber; 212. First air supply connector; 22. Second air supply pipeline; 221. Second air chamber; 222. Second air supply connector; 23. Mounting plate; 231. First air supply port; 232. Second air supply port; 24. First sealing ring; 25. Second sealing ring; 30. Mounting cover. Detailed Implementation

[0043] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0044] like Figures 1 to 9 As shown, the first aspect of this utility model provides a gas separation and introduction device, including: a gas guide plate 10, on which a first guide channel 11 and a second guide channel 12 are provided, and at the bottom of the gas guide plate 10 a first gas equalization channel 13 connected to the first guide channel 11 and a second gas equalization channel 14 connected to the second guide channel 12 are provided, the first gas equalization channel 13 and the second gas equalization channel 14 are used to introduce different gases respectively, and the first gas equalization channel 13 is provided with a plurality of first gas equalization holes 131 and the second gas equalization channel 14 is provided with a plurality of second gas equalization holes 141; and a gas supply assembly 20 disposed on one side of the gas guide plate 10, the gas supply assembly 20 including: a first gas supply pipe 21 connected to the first guide channel 11 and a second gas supply pipe 22 connected to the second guide channel 12, the first gas supply pipe 21 and the second gas supply pipe 22 being respectively connected to a gas supply device.

[0045] Specifically, the first guide channel 11 includes a first main air inlet 111 and a plurality of first sub-air guide holes 112 arranged around the first main air inlet 111. The first main air inlet 111 is connected to the first air supply pipeline 21, and the first sub-air guide holes 112 are connected to the first air distribution channel 13. The second guide channel 12 includes a second main air inlet 121 and a plurality of second sub-air guide holes 122 arranged around the second main air inlet 121. The second main air inlet 121 is connected to the second air supply pipeline 22, and the second sub-air guide holes 122 are connected to the second air distribution channel 14. Preliminary air distribution can be achieved through the first air distribution channel 13 and the second air distribution channel 14, resulting in a more uniform airflow distribution.

[0046] The first guide channel 11 includes a first main air inlet 111 and a plurality of first sub-air guide holes 112 arranged around the first main air inlet 111. The first main air inlet 111 is connected to the first air supply pipeline 21, and the first sub-air guide holes 112 are connected to the first air distribution channel 13. The second guide channel 12 includes a second main air inlet 121 and a plurality of second sub-air guide holes 122 arranged around the second main air inlet 121. The second main air inlet 121 is connected to the second air supply pipeline 22, and the second sub-air guide holes 122 are connected to the second air distribution channel 14. Preliminary air distribution can be achieved through the first air distribution channel 13 and the second air distribution channel 14, resulting in a more uniform airflow distribution.

[0047] Two sets of first guide channels 11 and second guide channels 12 are provided, and the first guide channels 11 and second guide channels 12 are arranged alternately; the first uniform air channel 13 includes a first inner ring air channel 132 and a first outer ring air channel 133 respectively connected to the two sets of first guide channels 11. The first outer ring air channel 133 is located near the middle of the air guide plate 10 and near the edge of the air guide plate 10; the second uniform air channel 14 includes a second inner ring air channel 142 and a second outer ring air channel 143 respectively connected to the two sets of second guide channels 12. The second outer ring air channel 143 is located near the middle of the air guide plate 10 and near the edge of the air guide plate 10; and the first inner ring air channel 132 is located inside the second inner ring air channel 142, and the first outer ring air channel 133 is located outside the second outer ring air channel 143. The reasonable distribution of the first inner ring airway 132, the first outer ring airway 133, the second inner ring airway 142, and the second outer ring airway 143 can make the gas more evenly distributed on the air guide plate 10.

[0048] The gas supply assembly 20 also includes: a mounting plate 23 that is sealed and connected to the air guide plate 10. The mounting plate 23 is provided with a first air supply port 231 corresponding to the first flow channel 11 and a second air supply port 232 corresponding to the second flow channel 12; the first air supply pipeline 21 is connected to the first air supply port 231, and the second air supply pipeline 22 is connected to the second air supply port 232; the mounting plate 23 facilitates connection with the first air supply pipeline 21 and the second air supply pipeline 22, thereby improving the ease of installation.

[0049] In this embodiment, both the first gas supply pipe 21 and the second gas supply pipe 22 are C-shaped, and are staggered due to their different heights. The first gas supply pipe 21 has a first air chamber 211 in its middle, which is connected to a first gas supply connector 212 for connection to an external gas supply device. The second gas supply pipe 22 has a second air chamber 221 in its middle, which is connected to a second gas supply connector 222 for connection to an external gas supply device. The height difference between the first and second gas supply pipes 21 and 22 facilitates pipe installation and reduces processing difficulty. The first and second air chambers 211 and 221 can be used to pressurize the gas, ensuring a suitable pressure when the gas enters the air guide plate 10.

[0050] A first sealing ring 24 is provided between the first air supply port 231 and the first guide channel 11, and a second sealing ring 25 is provided between the second air supply port 232 and the second guide channel 12. The first sealing ring 24 and the second sealing ring 25 can improve the sealing performance and prevent the two gases from mixing.

[0051] Furthermore, an installation cover 30 is provided outside the air guide plate 10. The installation cover 30 is used to connect with the ALD coating equipment. The air guide plate 10 is fastened to the installation cover 30 by several screws. The installation cover 30 facilitates the installation of the gas separation and introduction device.

[0052] This invention supplies different types of gases through the first gas supply pipe 21 and the second gas supply pipe 22 respectively. The first type of gas is introduced into the first gas equalization channel 13 through the first guide channel 11 and discharged from the first gas equalization hole 131. The second type of gas is introduced into the second gas equalization channel 14 through the second guide channel 12 and discharged from the second gas equalization hole 141, so as to achieve the uniform output of the two different gases and ensure the uniformity of the air intake.

[0053] A second aspect of this utility model provides an ALD coating apparatus, including a gas separation and introduction device as described in the first aspect, wherein the gas separation and introduction device is assembled with a corresponding mounting structure on the ALD coating apparatus via a mounting cover 30.

[0054] The above embodiments only illustrate several implementation methods of this utility model, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the utility model patent. It should be noted that for those skilled in the art, several modifications and improvements can be made without departing from the concept of this utility model. These are all equivalent modifications and improvements made to the above embodiments based on the essential technology of this utility model, and all of these fall within the protection scope of this utility model.

Claims

1. A gas separation and introduction device, characterized in that, include: A gas guide plate is provided with a first guide channel and a second guide channel. The bottom of the gas guide plate is provided with a first gas equalization channel connected to the first guide channel and a second gas equalization channel connected to the second guide channel. The first gas equalization channel and the second gas equalization channel are used to introduce different gases. The first gas equalization channel is provided with a plurality of first gas equalization holes and the second gas equalization channel is provided with a plurality of second gas equalization holes. An air supply assembly is disposed on one side of the air guide plate. The air supply assembly includes: a first air supply pipeline connected to the first guide channel and a second air supply pipeline connected to the second guide channel. The first air supply pipeline and the second air supply pipeline are respectively connected to an air supply device.

2. The gas separation and introduction device according to claim 1, characterized in that, The first guide channel includes: a first main air inlet and a plurality of first sub-air guide holes arranged around the first main air inlet. The first main air inlet is connected to the first air supply pipeline, and the first sub-air guide holes are connected to the first uniform air channel.

3. The gas separation and introduction device according to claim 2, characterized in that, The second guide channel includes: a second main air inlet and a plurality of second sub-air guide holes arranged around the second main air inlet. The second main air inlet is connected to the second air supply pipeline, and the second sub-air guide holes are connected to the second uniform air channel.

4. The gas separation and introduction device according to claim 1, 2, or 3, characterized in that, Both the first and second guide channels are provided in two sets, and the first and second guide channels are provided at intervals; The first uniform air channel includes a first inner ring air channel and a first outer ring air channel that are respectively connected to the two sets of the first guide channels. The first outer ring air channel is located near the middle of the guide plate and the first outer ring air channel is located near the edge of the guide plate. The second uniform air channel includes a second inner ring air channel and a second outer ring air channel that are respectively connected to the two sets of second guide channels. The second outer ring air channel is located near the middle of the air guide plate and near the edge of the air guide plate.

5. The gas separation and introduction device according to claim 4, characterized in that, The first inner ring airway is located inside the second inner ring airway, and the first outer ring airway is located outside the second outer ring airway.

6. The gas separation and introduction device according to claim 4, characterized in that, The gas supply assembly further includes: a mounting plate that is sealed and connected to the gas guide plate, the mounting plate having a first gas supply port corresponding to the first guide channel and a second gas supply port corresponding to the second guide channel; The first gas supply line is connected to the first gas supply port, and the second gas supply line is connected to the second gas supply port.

7. The gas separation and introduction device according to claim 6, characterized in that, Both the first and second gas supply lines are C-shaped, and the first and second gas supply lines are arranged in an alternating manner due to their different heights. The first gas supply pipeline has a first gas chamber in the middle, and the first gas chamber is connected to a first gas supply connector for connecting to an external gas supply device. The second gas supply pipeline has a second gas chamber in the middle, and the second gas chamber is connected to a second gas supply connector for connecting to external gas supply equipment.

8. The gas separation and introduction device according to claim 7, characterized in that, A first sealing ring is provided between the first air supply port and the first guide channel, and a second sealing ring is provided between the second air supply port and the second guide channel.

9. The gas separation and introduction device according to claim 1, characterized in that, The air guide plate is also provided with a mounting cover, which is used to connect to the ALD coating equipment.

10. An ALD coating equipment, characterized in that, Includes the gas separation and introduction device as described in any one of claims 1-9.

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