Liquid supply system and developing equipment
By designing a liquid supply system with nozzles of different sizes and shapes and temperature control devices, the problem of the single development spraying mechanism in the existing system was solved, and the diversity and uniformity of development were achieved, thus meeting the development requirements of complex integrated circuits.
Patent Information
- Application Number
- CN202520034930.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-07
- Publication Date
- 2025-12-19
- Estimated Expiration
- 2035-01-07
AI Technical Summary
Existing developing spraying mechanisms are limited and cannot meet the developing requirements of complex integrated circuit manufacturing processes.
Design a liquid supply system including a first nozzle and a second nozzle with different sizes and shapes. The nozzles are used alternately by controlling the on-off valve to achieve nozzle diversity. Combined with a temperature control device and a detachable structure, it can meet different development needs.
It improves the diversity and uniformity of development, meeting the development requirements of complex integrated circuit manufacturing processes.
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Figure CN223692644U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the field of semiconductor manufacturing, especially to a liquid supply system and developing equipment. BACKGROUND
[0002] In the integrated circuit manufacturing process, the photoetching process is an important link, which involves coating, exposure and development. After the wafer has been coated and exposed, it will form a precise circuit pattern on the wafer after passing through the developing unit. With the continuous reduction of the line width of the integrated circuit process, the complexity of the line shape is increasing, and the requirements for developing different line layers in the development process are becoming more and more stringent. In the prior art, the developing spray mechanism is single, which cannot meet the needs of complex integrated circuit processes. SUMMARY
[0003] One of the purposes of the utility model is to provide a liquid supply system to solve the technical problem of single developing spray mechanism in the prior art.
[0004] One of the purposes of the utility model is to provide a developing equipment.
[0005] To achieve the above-mentioned one of the purposes of the utility model, one embodiment of the utility model provides a liquid supply system, which comprises a liquid supply pipeline and a nozzle device connected to the liquid supply pipeline. The liquid supply pipeline comprises a first pipeline and a second pipeline connected to the nozzle device. The nozzle device comprises a first nozzle connected to the first pipeline and a second nozzle connected to the second pipeline. The first nozzle has a first opening for spraying liquid, and the second nozzle has a second opening for spraying liquid. The first opening and the second opening have different sizes and / or different shapes.
[0006] As a further improvement of one embodiment of the utility model, the first opening can be circular, and the radius of the first opening ranges from 0.5mm to 5mm.
[0007] As a further improvement of one embodiment of the utility model, the second opening can be a rounded rectangle, and the length of the second opening ranges from 4mm to 10mm, and the width ranges from 0.4mm to 2mm.
[0008] As a further improvement of one embodiment of the utility model, the distance between the first nozzle and the second nozzle is 10mm-30mm.
[0009] As a further improvement of one embodiment of the utility model, the first opening and the second opening have a height difference in the vertical direction.
[0010] As a further improvement of the embodiment of the present application, the nozzle device comprises a first on-off valve connected with the first nozzle and a second on-off valve connected with the second nozzle, and the liquid supply system is configured to control the on-off state of the first on-off valve and the second on-off valve to switch the first nozzle and the second nozzle for alternate use.
[0011] As a further improvement of the embodiment of the present application, the first nozzle and / or the second nozzle comprises a main body connected with the liquid supply pipeline, a detachable part detachably arranged at one end of the main body away from the liquid supply pipeline, and the first opening and / or the second opening is located at the end of the detachable part away from the main body.
[0012] As a further improvement of the embodiment of the present application, the detachable part has an inverted conical cavity connected with the first opening and / or the second opening.
[0013] As a further improvement of the embodiment of the present application, the liquid supply system comprises a temperature control device, the temperature control device comprises a liquid storage cavity connected with the liquid supply pipeline and a heat preservation cavity surrounding the liquid storage cavity, and the liquid storage capacity of the liquid storage cavity is not less than 20L.
[0014] To achieve one of the purposes of the present application, an embodiment of the present application provides a developing device comprising the liquid supply system according to any one of the technical solutions.
[0015] Compared with the prior art, the present application provides a liquid supply system, the first nozzle has a first opening for spraying liquid, the second nozzle has a second opening for spraying liquid, the first opening and the second opening have different sizes and / or different shapes, and the spraying diversity is improved in the spraying process. BRIEF DESCRIPTION OF DRAWINGS
[0016] Figure 1 is a schematic view of the liquid supply system in an embodiment of the present application.
[0017] Figure 2 is Figure 1 is an enlarged view of the structure in the circle.
[0018] Figure 3 is a schematic view of the liquid supply system in another embodiment of the present application.
[0019] Figure 4 is Figure 3 is an enlarged view of the structure in the circle.
[0020] Figure 5 is a sectional view of the liquid supply system in an embodiment of the present application.
[0021] Figure 6 isFigure 5 Enlarged view of the structure in the circle. DETAILED DESCRIPTION
[0022] The utility model will be described in detail below in combination with the specific embodiments shown in the drawings. However, these embodiments do not limit the utility model, and the changes in structure, method or function made by those skilled in the art based on these embodiments are all included in the protection scope of the utility model.
[0023] It should be noted that the term "comprising" or any other variant thereof is intended to cover non-exclusive inclusion, so that the process, method, article or equipment including a series of elements not only includes those elements, but also includes other elements not explicitly listed or inherent to such process, method, article or equipment. In addition, the terms "first", "second", "third", "fourth" and the like are only for descriptive purposes and cannot be understood as indicating or implying relative importance.
[0024] The term "connected", "connected to" or any other variant is intended to cover various relative positions of the connection relationship, so that it includes direct connection or indirect connection. Among them, the direct connection can be formed by the air path pipeline, the indirect connection can be the connection relationship formed by devices such as valves, sensors, etc., can be the connection relationship formed by air path components such as brake control unit, or can be the connection relationship formed by any other medium such as air.
[0025] Please refer to Figure 1 The structural schematic view of a liquid supply system 100 provided by an embodiment of the utility model, the liquid supply system 100 is used in developing equipment and provides liquid for pre-wetting process and developing process.
[0026] In one embodiment, the liquid supply system 100 includes a liquid supply pipeline 10 and a nozzle device 20 connected to the liquid supply pipeline 10. The liquid from the liquid supply pipeline 10 is delivered to the nozzle device 20 and sprayed to a wafer by the nozzle device 20.
[0027] The liquid supply pipeline 10 at least includes a first pipeline 11 and a second pipeline 12 connected to the nozzle device 20, the nozzle device 20 includes a first nozzle 21 connected to the first pipeline 11 and a second nozzle 22 connected to the second pipeline 12, the first nozzle 21 has a first opening 210 for spraying liquid, the second nozzle 22 has a second opening 220 for spraying liquid, and the first opening 210 and the second opening 220 have different sizes and / or different shapes.
[0028] The first opening 210 and the second opening 220 can have the same shape but different sizes, or the same area size but different shapes, or different shapes and different sizes. It can be understood that the patterns of liquid sprayed by the nozzles with different sizes and / or different shapes are also different, so that the wafer can be pre-wetted or developed by switching different nozzles in a single developing process, thereby improving the diversity of development.
[0029] In one embodiment, the first opening 210 and the second opening 220 are combined Figure 2 As shown, the first opening 210 can be selected as a circle, and the radius of the first opening 210 ranges from 0.5mm to 5mm. Specifically, the first opening 210 can be selected as a small circle with a radius ranging from 0.5mm to 1mm, and the liquid sprayed by the small circle is in a mist shape, which is mainly used in the pre-wetting process.
[0030] The first opening 210 can be selected as a large circle with a radius ranging from 2mm to 5mm, and the liquid sprayed by the large circle is in a column shape with large impact force and small development range.
[0031] In one embodiment, the second opening 220 can be selected as a rounded rectangle, and the length of the second opening 220 ranges from 4mm to 10mm, and the width ranges from 0.4mm to 2mm. Specifically, the liquid sprayed by the rounded rectangle is in a fan shape with relatively small impact force and wide development range. The first opening 210 as a large circle and the second opening 220 as a rounded rectangle are suitable for developing different line layers.
[0032] According to the actual application scenario, the above two first openings 210 and second openings 220 can be alternately used, for example, the first opening 210 is a small circle and the second opening 220 is a rounded rectangle, or the first opening 210 is a large circle and the second opening 220 is a rounded rectangle.
[0033] It can be understood that the present case is not limited to the first opening 210 being necessarily a circle and the second opening 220 being necessarily a rounded rectangle. In other embodiments, the first opening 210 and the second opening 220 can be one of a small circle and a large circle, or one of a small rounded rectangle and a large rounded rectangle, respectively.
[0034] In other embodiments, the first opening 210 and the second opening 220 can be set to more different shapes and sizes according to requirements, as long as they can improve the diversity of the nozzles in a single developing process, thereby improving the diversity of development.
[0035] In one embodiment, the distance between the first nozzle 21 and the second nozzle 22 is 10-30 mm. In a single developing process, the first nozzle 21 and the second nozzle 22 need to be switched for use, and the distance between the first nozzle 21 and the second nozzle 22 and the center of the wafer to be processed should be equal to ensure the uniformity of the developed line layer. Therefore, the distance between the first nozzle 21 and the second nozzle 22 cannot be set too far, otherwise one of the two will be eccentric, resulting in uneven development. In addition, in order to prevent interference between the first nozzle 21 and the second nozzle 22 when switching, a distance between the first nozzle 21 and the second nozzle 22 should be maintained.
[0036] The first opening 210 and the second opening 220 have a height difference in the vertical direction. Similarly, in order to prevent the liquid sprayed between the first nozzle 21 and the second nozzle 22 from affecting each other when switching, a height difference should also be maintained in the vertical direction, and in practice, the height difference is in the range of 2-8 mm.
[0037] Specifically, when the first opening 210 is a small circle and the second opening 220 is a large circle, the second opening 220 should be 2-8 mm higher than the first opening 210. Because the farther the first opening 210 sprays downward, the closer it is to the mist, and the farther the large circle sprays, the closer it is to the column, it can be farther from the wafer. And in the switching process, the large circle is farther from the wafer and can fall later, while the mist sprayed by the small circle is close to the wafer and wets the wafer earlier, preventing mutual influence.
[0038] Specifically, when the first opening 210 is a large circle and the second opening 220 is a circular rectangle, the first opening 210 should be 2-8 mm higher than the second opening 220. The reason is the same as above to prevent the liquid sprayed from affecting each other and improve the uniformity of development.
[0039] In one embodiment, the nozzle device 20 includes a first on-off valve connected to the first nozzle 21 and a second on-off valve connected to the second nozzle 22, and the liquid supply system 100 is configured to control the on-off state of the first on-off valve and the second on-off valve to switch the first nozzle 21 and the second nozzle 22 for use. Specifically, the first on-off valve and the second on-off valve can be solenoid valves controlled by the control system.
[0040] The first on-off valve is arranged in the first pipe 11, and the second on-off valve is arranged in the second pipe 12. The first pipe 11 supplies liquid to the first nozzle 21, and the second pipe 12 supplies liquid to the second nozzle 22. In combination Figures 3-4As shown, the first pipe 11 and the second pipe 12 are independent of each other, but the liquid inlet of the first pipe 11 and the liquid inlet of the second pipe 12 are both communicated to the temperature control device 13 of the liquid supply system 100.
[0041] The liquid supply system 100 comprises a liquid supply tank 14, a temperature control device 13 communicated with the liquid supply tank 14, and a first pipe 11 and a second pipe 12 communicated with the temperature control device 13, wherein the liquid supply tank 14 is located upstream of the temperature control device 13, and the first pipe 11 and the second pipe 12 are located downstream of the temperature control device 13, and the liquid in the liquid supply tank 14 flows into the first pipe 11 or the second pipe 12 after passing through the temperature control device 13, and then flows into the first nozzle 21 or the second nozzle 22.
[0042] The liquid supply system 100 comprises a pivot 15 arranged downstream of the temperature control device 13 and upstream of the first pipe 11 and the second pipe 12, wherein the pivot 15 has a vertical rotation axis, and the first pipe 11 and the second pipe 12 rotate around the axis to drive the nozzle device 20 to rotate around the axis, so as to adjust the position of the nozzle device 20.
[0043] The first pipe 11 and the second pipe 12 are of the same structure, and each of the first pipe and the second pipe 12 comprises a horizontal section and a vertical section, wherein the horizontal section is connected to the pivot 15, so as to communicate the temperature control device 13 and the liquid supply tank 14 upstream, and the vertical section is connected to the nozzle device 20.
[0044] The liquid supply system 100 comprises two liquid supply tanks 14, and the two liquid supply tanks 14 are used alternately to realize uninterrupted liquid supply. In actual application, nitrogen needs to be injected into each liquid supply tank 14 to press the liquid out, so that the liquid supply tank 14 is in a state of high gas pressure, and cannot supply liquid while supplementing liquid. It can be seen that if only one liquid supply tank 14 is arranged, there may be a problem that the liquid capacity of the liquid supply tank 14 is not enough during single cleaning. The liquid outlets of the two liquid supply tanks 14 are communicated to the liquid storage cavity 131 of the temperature control device 13 through the same pipe.
[0045] In one embodiment, the temperature control device 13 comprises a liquid storage cavity 131 communicated with the liquid supply pipe 10 and a heat preservation cavity 132 surrounding the liquid storage cavity 131, and the liquid storage capacity of the liquid storage cavity 131 is not less than 20L, so as to meet the demand of large instantaneous liquid consumption in the developing process. The liquid storage capacity of the heat preservation cavity 132 should also be not less than 20L, so as to meet the demand of temperature control for 20L of liquid in the liquid storage cavity 131 within a certain time.
[0046] The temperature control device 13 comprises a first liquid inlet and a first liquid outlet arranged in the liquid storage cavity 131, the first liquid inlet is communicated to an upstream liquid supply pipeline, for example, to the liquid supply barrel 14, and the first liquid outlet is communicated to a downstream liquid supply pipeline, for example, the first pipeline 11 and the second pipeline 12.
[0047] The temperature control device 13 comprises a second liquid inlet and a second liquid outlet arranged in the heat preservation cavity 132, the second liquid inlet and the second liquid outlet are communicated to a circulating temperature control water bath pipeline outside the environment, so as to circulate and input the heat preservation liquid into the heat preservation cavity 132, and the water bath heat preservation effect of the liquid storage cavity 131 is realized.
[0048] The first nozzle 21 and / or the second nozzle 22 comprise a main body part 23 communicated to the liquid supply pipeline 20, a detachable part 24 detachably arranged at one end of the main body part 23 away from the liquid supply pipeline 20, and the first opening 210 and / or the second opening 220 are located at the end of the detachable part 24 away from the main body part 23.
[0049] The detachable part 24 has an inverted conical cavity 241 communicated to the first opening 210, which plays a role of converging and guiding.
[0050] In actual application, the first nozzle 21 and the second nozzle 22 are the same in structure, and the difference is only that the shapes of the first opening 210 and the second opening 220 are different. Hereinafter, only the structure of the first nozzle 21 will be described in detail. Figures 5-6 As shown, one end of the main body part 23 is connected to the end of the first pipeline 11, the other end of the main body part 23 is connected to the detachable part 24, the detachable part 24 and the main body part 23 are connected through threads, and the first opening 210 is arranged at the tip of the detachable part 24 and used for spraying liquid.
[0051] The utility model discloses a kind of developing equipment, including the liquid supply system 100 described in any of the above technical solutions, in wafer manufacturing process, developing equipment is used to realize the developing of wafer surface circuit layer, and forms precise circuit pattern on wafer.
[0052] The utility model has beneficial effect in that: the pattern of liquid sprayed by the first opening 210 and the second opening 220 with different sizes and / or different shapes is not the same, in single developing process, different first nozzle 21 and second nozzle 22 can be switched to pre-wet or develop wafer, and the diversity of developing is improved.
[0053] Any of the technical solutions provided in the foregoing can be formed, which will not be repeated here.
[0054] It should be understood that although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the description of the specification is only for the sake of clarity, and those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that those skilled in the art can understand.
[0055] The above series of detailed descriptions are only specific descriptions of the feasible embodiments of the present application, and are not intended to limit the protection scope of the present application. Any equivalent embodiments or changes made without departing from the spirit of the present application should be included in the protection scope of the present application.
Claims
1. A liquid supply system, characterized in that, The application relates to a liquid supply system comprising: a liquid supply pipeline and a nozzle device connected to the liquid supply pipeline, the liquid supply pipeline comprising a first pipeline and a second pipeline connected to the nozzle device, the nozzle device comprising a first nozzle connected to the first pipeline and a second nozzle connected to the second pipeline, the first nozzle having a first opening for spraying liquid, and the second nozzle having a second opening for spraying liquid, the first opening and the second opening having different sizes and / or different shapes.
2. The liquid supply system according to claim 1, wherein The first opening can be circular, and the radius of the first opening ranges from 0.5 mm to 5 mm.
3. The liquid supply system according to claim 1, wherein The second opening can be a rounded rectangle, and the length of the second opening ranges from 4 mm to 10 mm, and the width ranges from 0.4 mm to 2 mm.
4. The liquid supply system according to claim 1, wherein The distance between the first nozzle and the second nozzle ranges from 10 mm to 30 mm.
5. The liquid supply system according to claim 1, wherein The first opening and the second opening have a height difference in the vertical direction.
6. The liquid supply system according to claim 1, wherein The nozzle device comprises a first on-off valve connected to the first nozzle and a second on-off valve connected to the second nozzle, and the liquid supply system is configured to control the on-off state of the first on-off valve and the second on-off valve to switch the first nozzle and the second nozzle for use alternately.
7. The liquid supply system according to claim 1, wherein The first nozzle and / or the second nozzle comprises a main body connected to the liquid supply pipeline, and a detachable part detachably arranged at one end of the main body away from the liquid supply pipeline, and the first opening and / or the second opening is located at the end of the detachable part away from the main body.
8. The liquid supply system according to claim 7, wherein The detachable part has an inverted conical cavity connected to the first opening and / or the second opening.
9. The liquid supply system according to claim 1, wherein The liquid supply system comprises a temperature control device, and the temperature control device comprises a liquid storage cavity connected to the liquid supply pipeline and a heat preservation cavity surrounding the liquid storage cavity, and the liquid storage capacity of the liquid storage cavity is not less than 20 L.
10. A developing apparatus characterized by comprising: The application further relates to a liquid supply system according to any one of claims 1-9.