Mask moving platform

Abstract

The utility model provides a mask movement platform. The mask movement platform comprises a bearing frame, a first movement mechanism, a first bottom plate, a second movement mechanism and a second bottom plate which are sequentially arranged from top to bottom. The bearing frame is used for bearing a mask plate, the surface, deviating from the mask plate, of the bearing frame is connected with a first driver of the first movement mechanism, and a first guide rail of the first movement mechanism is arranged on the upper surface of the first bottom plate in the first direction; the lower surface of the first bottom plate is connected with a second driver of the second movement mechanism, a second guide rail of the second movement mechanism is arranged on the upper surface of the second bottom plate in the second direction, and the lower surface of the second bottom plate is connected with the fixed platform. The mask moving platform has enough stroke and can adapt to masks of different sizes, so that the bearing frame for bearing the masks accurately moves in the first direction and the second direction, stability and uniformity are kept in the whole moving process, and high-precision positioning is achieved.

Description

TECHNICAL FIELD

[0001] The utility model relates to mask detection equipment technical field, concretely relates to a mask motion platform. BACKGROUND

[0002] In the field of semiconductor manufacturing, mask is an indispensable key tool in the process of integrated circuit manufacturing. The mask transfers the circuit pattern accurately to the wafer in the process of photoetching through the accurately designed pattern on its surface, thereby realizing the manufacturing of integrated circuit. With the rapid development of semiconductor technology, the complexity and integration of integrated circuit are continuously improved, and the precision and size requirements of mask are also increasingly strict.

[0003] The detection of mask is an important link to ensure its quality and precision. In the detection process, the mask motion platform as the equipment supporting and moving the mask, its performance directly affects the accuracy and reliability of the detection result.

[0004] The design of the existing mask motion platform faces many technical challenges. Among them, the key is that the mask motion platform needs enough stroke to adapt to mask of different sizes, while maintaining stability and uniformity in the entire stroke range.

[0005] Therefore, in order to meet the design requirements of mask motion platform, the application provides a mask motion platform. UTILITY MODEL CONTENT

[0006] In view of the defects and deficiencies of the mask motion platform in the prior art, the application provides a mask motion platform. The mask motion platform is provided with a bearing frame, a first motion mechanism and a second motion mechanism, which can make the bearing frame carrying the mask move accurately along the first direction and the second direction, adapt to mask of different sizes, and ensure stability and uniformity during movement.

[0007] An embodiment of the application provides a mask motion platform, which comprises:

[0008] A bearing frame for carrying a mask;

[0009] A first motion mechanism comprising a first guide rail and a first driver, the first driver being connected with the bearing frame away from the surface of the mask, and the first driver driving the bearing frame to reciprocate along the first guide rail;

[0010] A first bottom plate, the first guide rail being arranged on the surface of the first bottom plate along the first direction;

[0011] a second moving mechanism, the second moving mechanism comprising a second guide rail and a second driver, the second driver being connected to a surface of the first bottom plate facing away from the first guide rail, and the second driver driving the first bottom plate to reciprocate along the second guide rail;

[0012] a second bottom plate, the second guide rail being arranged on a surface of the second bottom plate in a second direction, and a surface of the second bottom plate facing away from the second guide rail being connected to a fixed platform;

[0013] wherein the first direction is perpendicular to the second direction.

[0014] As an implementation form, the first driver is a first linear motor, and the second driver is a second linear motor.

[0015] As an implementation form, the bearing frame is provided with protrusions at four corner positions of a surface of the bearing frame for bearing the mask plate.

[0016] As an implementation form, the bearing frame is provided with recesses at four corner positions of a surface of the bearing frame, and the protrusions are arranged in the recesses.

[0017] As an implementation form, the material of the protrusions is rubber.

[0018] As an implementation form, the protrusions are rubber rings.

[0019] As an implementation form, the distance between a surface of the protrusion facing away from the bearing frame and a surface of the bearing frame is 0.5 mm to 2 mm.

[0020] As an implementation form, the bearing frame comprises a first through hole, the first through hole penetrating the bearing frame from a surface of the bearing frame bearing the mask plate to a surface of the bearing frame facing away from the mask plate in a third direction;

[0021] The third direction is perpendicular to the first direction and the second direction.

[0022] As an implementation form, one side of a surface of the bearing frame is provided with a recess for accommodating a mechanical finger to pick and place the mask plate.

[0023] As an implementation form, the first bottom plate is provided with a second through hole, the second through hole penetrating the first bottom plate from a surface of the first bottom plate close to the first guide rail to a surface of the first bottom plate facing away from the first guide rail in a third direction;

[0024] The second bottom plate is provided with a third through hole penetrating from the surface of the second bottom plate close to the second guide rail to the surface of the second bottom plate away from the second guide rail along the third direction.

[0025] The third direction is perpendicular to the first direction and the second direction.

[0026] As described above, the mask movement platform has the following beneficial effects:

[0027] The mask movement platform is provided with a bearing frame, a first movement mechanism, a first bottom plate, a second movement mechanism and a second bottom plate, so that the bearing frame bearing the mask can move accurately along the first direction and the second direction, and can maintain stability and uniformity during the whole movement process. The mask movement platform has sufficient stroke to adapt to masks of different sizes and can realize high-precision positioning. BRIEF DESCRIPTION OF DRAWINGS

[0028] Figure 1 A structure schematic diagram of a mask detection system in the prior art is shown.

[0029] Figure 2 A structure schematic diagram of a mask movement platform bearing a mask according to an embodiment of the present application is shown.

[0030] Figure 3 A perspective structure schematic diagram of a mask movement platform according to an embodiment of the present application is shown.

[0031] Figure 4 A top view structure schematic diagram of a mask movement platform according to an embodiment of the present application is shown.

[0032] Figure 5 An enlarged view of A part in Figure 4

[0033] ELEMENT NUMBER EXPLANATION

[0034] 1, detector; 2, beam splitter; 3, optical element; 4, light source; 5, sample to be measured; 6, mask movement platform; 10, mask; 20, bearing frame; 21, protrusion; 22, groove; 23, recess; 24, first through hole; 30, first movement mechanism; 31, first guide rail; 32, first driver; 40, first bottom plate; 50, second movement mechanism; 51, second guide rail; 52, second driver; 60, second bottom plate. DETAILED DESCRIPTION

[0035] ​The embodiments of the present application will be described in detail with specific examples. Those skilled in the art can easily understand other advantages and functions of the present application from the content disclosed in the specification. The present application can also be implemented or applied in other different specific embodiments, and various modifications or changes can be made to the details in the specification without departing from the spirit of the present application.

[0036] Please refer to Figures 1 to 5 It should be noted that the diagrams provided in the embodiments only schematically illustrate the basic concept of the present application, and only the components related to the present application are shown in the diagrams, not the number, shape and size of the components in actual implementation. The shape, number and proportion of the components in actual implementation can be changed at will, and the layout of the components can be more complex.

[0037] In the field of semiconductor manufacturing, mask plays a crucial role, which is a key tool for accurately transferring circuit patterns onto wafers. Mask detection is an important link to ensure its quality and accuracy. A mask detection system is used to detect the mask. A mask detection system in the prior art is shown in Figure 1 The light beam after the imaging system is irradiated onto the detector 1, which can be a CCD, CMOS or other type of photosensitive element, for capturing and converting the light signal into an electrical signal. The light source emits light through the beam splitter 2, which can split the light beam into two paths to irradiate onto the sample 5 to be tested. The light beam passing through the beam splitter passes through a series of optical lenses, which are used to focus and shape the light beam to ensure that the light beam is irradiated onto the sample 5 to be tested in the best state. The light source 4 can be ultraviolet light, visible light or infrared light. The choice of light source 4 depends on the material and detection requirements of the sample 5 to be tested. The light emitted by the light source 4 needs to be uniform and stable to ensure the accuracy of the detection. In some cases, the light source 4 can also be replaced by other energy sources, such as X-rays or electron beams, etc. The sample 5 to be tested is the mask. The sample 5 to be tested is placed on the mask movement platform 6, which should be movable so that the light source 4 can irradiate onto each part of the sample 5 to be tested.

[0038] In order to realize the detection of the mask, one of the key links is that the mask movement platform 6 needs to have enough travel to adapt to different sizes of the mask, and at the same time the mask movement platform 6 needs to have good stability and uniformity.

[0039] In view of the above defects, the present application provides a mask movement platform. The embodiments will be described in detail as follows.

[0040] The embodiment provides a mask movement platform, as shown in the figure. Figures 2 to 4 The mask movement platform comprises a bearing frame 20, a first movement mechanism 30, a first bottom plate 40, a second movement mechanism 50 and a second bottom plate 60. The bearing frame 20 is used for bearing a mask 10. The first movement mechanism 30 comprises a first guide rail 31 and a first driver 32. The first driver 32 is connected with a surface (a lower surface of the bearing frame 20) of the bearing frame 20 away from the mask 10, and the first driver 32 drives the bearing frame 20 to reciprocate along the first guide rail 31. The first guide rail 31 is arranged on an upper surface of the first bottom plate 40 in a first direction. The second movement mechanism 50 comprises a second guide rail 51 and a second driver 52. The second driver 52 is connected with a surface (a lower surface of the first bottom plate 40) of the first bottom plate 40 away from the first guide rail 31, and the second driver 52 drives the first bottom plate 40 to reciprocate along the second guide rail 51. The second guide rail 51 is arranged on an upper surface of the second bottom plate 60 in a second direction. A surface (a lower surface of the second bottom plate 60) of the second bottom plate 60 away from the second guide rail 51 is connected with a fixed platform (not shown in the figure) in a mask detection system. The first direction is perpendicular to the second direction. For example, the first direction can be an X-axis direction, and the second direction can be a Y direction. Alternatively, the first direction can be a Y-axis direction, and the second direction can be an X-axis direction.

[0041] The mask movement platform provided by the embodiment can make the bearing frame 20 accurately move in the first direction and the second direction and keep stability and uniformity during the whole movement process, has sufficient stroke to adapt to masks of different sizes, can realize high-precision positioning, has good integrality and can adapt to compact space and complex environment of a semiconductor manufacturing process.

[0042] In an optional embodiment, the first driver 32 is a first linear motor, and the second driver 52 is a second linear motor. The control of the first linear motor and the second linear motor is the core of realizing precise positioning, and the first linear motor and the second linear motor need to have the characteristics of high precision, high stability and fast response. The first linear motor can be connected with the bearing frame 20 through a screw, and the second linear motor can be connected with the first bottom plate 40 through a screw. Since the first linear motor is matched with a first grating ruler, and the second linear motor is matched with a second grating ruler, the first grating ruler and the second grating ruler can feed back the position information of the mask plate in real time, thereby ensuring the precise control of the mask plate movement platform. The movement process of the mask plate 10 on the mask plate movement platform is as follows: the control system plans the movement path and speed of the mask plate 10 in the first direction and the second direction according to the detection program, so as to ensure smooth and accurate movement; during the detection process, if it is necessary to fine-tune the position of the mask plate 10, the control system will adjust the movement parameters of the first linear motor and the second linear motor in real time to adapt to the changes in the detection process; when an abnormality of the first linear motor, the second linear motor and / or the mask plate movement platform is detected, the first linear motor and the second linear motor can immediately stop moving and take corresponding protection measures.

[0043] In an optional embodiment, as shown in Figure 4 and Figure 5 , the four corner positions of the surface (the upper surface of the bearing frame 20) of the bearing frame 20 for carrying the mask plate 10 are provided with protrusions 21, and the protrusions 21 are used for carrying the mask plate 10, reducing the contact area between the upper surface of the bearing frame 20 and the mask plate 10, and preventing the mask plate 10 from being scratched. Optionally, the material of the protrusions 21 is rubber, which can prevent the mask plate 10 from being scratched and can prevent the mask plate 10 from sliding during movement. Optionally, the protrusions 21 are rubber rings. The structure of the rubber ring can further effectively prevent the mask plate 10 from sliding during movement. Optionally, the distance between the surface (the top surface of the protrusion 21) of the protrusion 21 away from the bearing frame 10 and the upper surface of the bearing frame 20 is between 0.5 mm and 2 mm. Specifically, the distance between the surface (the top surface of the protrusion 21) of the protrusion 21 away from the bearing frame 10 and the upper surface of the bearing frame 20 can be, for example, 0.5 mm, 0.7 mm, 1 mm, 1.5 mm, 2 mm, etc. This prevents the mask plate 10 from being scratched while ensuring the compactness of the structure of the mask plate movement platform.

[0044] In an optional embodiment, as shown in Figure 5 , the four corner positions of the surface (the upper surface of the bearing frame 20) of the bearing frame 20 for carrying the mask plate 10 are provided with recesses 22, and the recesses 22 are provided with protrusions 21.

[0045] In an optional embodiment, as shown in Figure 2 and Figure 3As shown, a portion of the support frame 20 on one side of the surface (upper surface of the support frame 20) used to support the mask 10 is recessed in a direction away from the mask 10 (towards the lower surface of the support frame 20) to form a recess 23. The recess 23 is used to accommodate the mechanical finger, which facilitates the mechanical finger to pick up and put down the mask 10.

[0046] In optional embodiments, such as Figures 2 to 4 As shown, the support frame 20 includes a first through-hole 21, which extends from the surface of the support frame 20 carrying the mask plate 10 (the upper surface of the support frame 20) along a third direction to the surface of the support frame 20 opposite to the mask plate 10 (the lower surface of the support frame 20). Grooves 22 are located at the four corners near the first through-hole 21. A second through-hole (not shown in the figure) is provided on the first base plate 40, extending along a third direction from the surface of the first base plate 40 near the first guide rail 31 (the upper surface of the first base plate 40) to the surface of the first base plate 40 opposite to the first guide rail 31 (the lower surface of the first base plate 40). A third through-hole (not shown in the figure) is provided on the second base plate 60, extending along a third direction from the surface of the second base plate 60 near the second guide rail 51 (the upper surface of the second base plate 60) to the surface of the second base plate 60 opposite to the second guide rail 51 (the lower surface of the second base plate 60). The third direction is perpendicular to both the first and second directions; for example, the third direction can be the Z-axis direction. By setting the first through-hole 24, the second through-hole, and the third through-hole, materials can be saved, production costs can be reduced, the weight of the mask motion platform can be reduced, and the movement of the mask 10 can be facilitated. At the same time, in order to reduce errors caused by mechanical deformation or temperature changes, the rigidity and thermal stability of the mechanical structure of the mask motion platform are taken into account.

[0047] This embodiment also provides a method for using a mask plate motion platform, including the following steps:

[0048] S1. Automatic film loading by mechanical finger: The mechanical finger reaches the recess 23 of the carrier frame 20 of the mask movement platform and places the mask 10 on the protrusion 21 of the carrier frame 20.

[0049] S2. Start the detection equipment and the system performs a self-test: The self-test includes confirming whether the status of all components such as the first motion mechanism 30 and the second motion mechanism 50 is normal. The mask motion platform moves the mask 10 to the preset starting position through the control of the first driver 32 and the second driver 52 by the controller. During this process, the system will perform position calibration according to the preset parameters to ensure the alignment accuracy between the mask 10 and the detection equipment.

[0050] S3, the first driver 32 and the second driver 52 detect under the control of the controller according to the predetermined detection coordinates, the first driver 32 and the second driver 52 accurately control the movement of the mask plate 10 in the first direction and the second direction, and ensure that the mask plate 10 reaches the accurate detection position.

[0051] S4, after the mask plate 10 is positioned, the detection equipment (such as an optical microscope, a laser scanner, etc.) is initialized and adjusted to the parameter setting suitable for detecting the mask plate pattern; the detection equipment starts to scan the mask plate 10, and the mask plate movement platform may need to be finely adjusted in the first direction and the second direction according to the requirement of the detection program, so as to ensure the complete detection of the pattern; the detection equipment collects the image data of the mask plate 10 pattern and transmits the data to the data processing system for analysis and evaluation.

[0052] S5, after the detection is completed, the mechanical finger automatically takes the mask plate from the bearing frame 20; once the mask plate pattern detection is completed, the system automatically moves the mask plate 10 back to the initial position or the specified safe position; after the mask plate 10 is unloaded, the system is reset for the detection of the next mask plate 10.

[0053] The above embodiment only illustrates the principle and effect of the present application, and is not used to limit the present application. Any person skilled in the art can modify or change the above embodiment without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought of the present application should be covered by the claims of the present application.

Claims

1. A photomask motion platform, characterized in that, include: The support frame is used to support the photomask; A first motion mechanism, comprising a first guide rail and a first driver, wherein the first driver is connected to the surface of the support frame opposite to the mask, and the first driver drives the support frame to reciprocate along the first guide rail; A first base plate, wherein the first guide rail is disposed on the surface of the first base plate along a first direction; The second motion mechanism includes a second guide rail and a second driver. The second driver is connected to the surface of the first base plate opposite to the first guide rail, and the second driver drives the first base plate to reciprocate along the second guide rail. The second base plate, the second guide rail is disposed on the surface of the second base plate along the second direction, and the surface of the second base plate opposite to the second guide rail is connected to the fixed platform; Wherein, the first direction is perpendicular to the second direction.

2. The photomask motion platform according to claim 1, characterized in that, The first driver is a first linear motor; The second driver is a second linear motor.

3. The photomask motion platform according to claim 1, characterized in that, The support frame has protrusions at the four corners of the surface of the mask, which are used to support the mask.

4. The photomask motion platform according to claim 3, characterized in that, The support frame is provided with grooves at the four corners of the surface of the mask, and the protrusions are provided in the grooves.

5. The photomask motion platform according to claim 4, characterized in that, The protrusion is made of rubber.

6. The photomask motion platform according to claim 5, characterized in that, The protrusion is a rubber ring.

7. The photomask motion platform according to claim 3, characterized in that, The distance between the protrusion and the surface of the support frame is between 0.5 mm and 2 mm.

8. The photomask motion platform according to claim 1, characterized in that, The support frame includes a first through-hole, which extends from the surface of the support frame that carries the photomask in a third direction through the surface of the support frame away from the surface of the photomask; The third direction is perpendicular to both the first direction and the second direction.

9. The photomask motion platform according to claim 1, characterized in that, The support frame has a recessed portion on one side of the surface of the mask, which is used to accommodate mechanical fingers to pick up and place the mask.

10. The photomask motion platform according to claim 1, characterized in that, The first base plate is provided with a second through opening, which extends along a third direction from the surface of the first base plate near the first guide rail to the surface of the first base plate away from the first guide rail. The second base plate is provided with a third through opening, which extends along the third direction from the surface of the second base plate near the second guide rail to the surface of the second base plate away from the second guide rail; The third direction is perpendicular to both the first direction and the second direction.

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