Base and vapor deposition equipment
By designing the carrier, connectors, and adapters in the base structure, a quick and easy substrate carrier replacement was achieved, solving the problem of complex disassembly and assembly in existing technologies and improving the efficiency of the machine tool.
Patent Information
- Application Number
- CN202520200049.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-08
- Publication Date
- 2025-12-23
- Estimated Expiration
- 2035-02-08
AI Technical Summary
In the existing technology, when changing substrate carriers of different specifications, it is necessary to replace structures such as magnetorheological fluid and shaft, which leads to complicated disassembly and assembly and affects the efficiency of machine tool use.
Design a base structure including a carrier, connectors and adapters. Through the detachable connection of the adapters and the transfer air passage, quick and easy carrier replacement can be achieved, avoiding the disassembly and assembly of structures such as shafts.
It improved the efficiency of machine utilization, simplified the carrier replacement process, reduced disassembly and assembly time, and improved the ease of operation of the equipment.
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Figure CN223705736U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to semiconductor equipment technical field especially, relates to a base and vapor deposition equipment. BACKGROUND
[0002] Semiconductor equipment, for example, process cavity of vapor deposition equipment is provided with the base that is composed of substrate carrier and shaft body, the recess is arranged on the top surface of substrate carrier to carry wafer, shaft body rotationally connects base, magnetic fluid is arranged in shaft body, rotates through drive shaft body and drives substrate carrier to rotate, and can ensure that process cavity is airtight.
[0003] When needing to use the same type of process condition to deposit semiconductor material layer on different size substrates, in order to improve the utilization rate of process cavity, the same process cavity can be arranged to accommodate different specifications of substrate carrier, when the substrate carrier is replaced, it will involve the disassembly of magnetic fluid, shaft body and other structures having mechanical or electrical relationship with them.
[0004] Especially for the replacement of substrate carrier with different numbers of recesses and self-rotating gas channels, since the prior art is to supply gas to the self-rotating gas channel through the magnetic fluid and the shaft body, the magnetic fluid is usually relatively adapted to the substrate carrier with the self-rotating gas channel, and the replacement of different specifications of substrate carrier will involve the replacement of magnetic fluid.
[0005] Therefore, it is necessary to provide a new base and vapor deposition equipment to solve the above problems existing in the prior art. SUMMARY
[0006] The utility model discloses a base and vapor deposition equipment, can quickly and simply disassemble and assemble when needing to replace the carrier carrying wafer, improve the use efficiency of machine.
[0007] To achieve the above object, the technical scheme of the utility model is as follows:
[0008] A base is used for vapor deposition equipment, and the base comprises:
[0009] A carrier is provided with a plurality of recesses to place substrates, and the carrier is internally provided with a plurality of communication gas channels in communication with each recess to transmit drive gas to each recess;
[0010] A connecting piece is arranged in the middle of the carrier, and each communication gas channel extends into the connecting piece and communicates with the outside through the bottom end face of the connecting piece;
[0011] An adapter has a first end face and a second end face axially opposite to each other, and the adapter is detachably arranged in the connecting piece so that the second end face tightly abuts against the bottom end face of the connecting piece;
[0012] The adapter is provided with a plurality of communication air channels, and the second end surface is provided with a plurality of half-through grooves.
[0013] The openings of the communication air channels at the bottom end surface of the connecting piece are connected to the openings of the communication air channels at the second end surface, or are connected to the openings of the half-through grooves.
[0014] A vapor deposition device comprises a chamber, a docking shaft body and a base;
[0015] The dynamic seal of the docking shaft body is arranged on the bottom wall of the chamber.
[0016] The base is detachably arranged on the docking shaft body.
[0017] A plurality of air supply channels are arranged in the docking shaft body, and a plurality of the air supply channels are connected to the corresponding communication air channels to supply air.
[0018] By adopting the above technical solution, the adapter in the base has a first end surface and a second end surface which are axially opposite to each other. The adapter is detachably arranged on the connecting piece so that the second end surface is tightly attached to the bottom end surface of the connecting piece, which is conducive to quickly and easily disassembling the base and improves the use efficiency of the machine. The adapter is provided with a plurality of communication air channels which are connected to the corresponding communication air channels. The communication air channels penetrate the adapter in the axial direction of the adapter. The second end surface is provided with a plurality of half-through grooves, and at least part of the half-through grooves are connected to the communication air channels. The openings of the communication air channels at the bottom end surface of the connecting piece are connected to the openings of the communication air channels at the second end surface, or are connected to the openings of the half-through grooves. In this way, the same adapter can be adapted to the above-mentioned conditions. During the replacement of the carrier, only the carrier and the adapter are separated for replacement, without disassembling the shaft body installed on the chamber of the device and other structures having mechanical or electrical relationship with the shaft body, which reduces the time consumed for disassembly and further facilitates the quick and easy disassembly of the base and improves the use efficiency of the machine.
[0019] Optionally,
[0020] The carrier further comprises a support;
[0021] The communication air channels comprise base air channels and transmission air channels.
[0022] A plurality of the base air channels are arranged on the support, and each of the base air channels is connected to the corresponding recess.
[0023] The connecting piece is provided with a plurality of transmission air channels, each of which is communicated with a corresponding base air channel, and the transmission air channels extend in the connecting piece and are communicated with the outside through the bottom end surface of the connecting piece.
[0024] Optionally, each of the transfer air channels penetrates the bottom end surface of the corresponding half-through slot to be communicated with the outside.
[0025] Optionally, at least part of the adjacent half-through slots have at least one opening of the transfer air channel.
[0026] Optionally, each of the half-through slots is uniformly distributed, and each of the communication air channels is uniformly distributed around the connecting piece and is communicated with the corresponding half-through slot.
[0027] Optionally, each of the transfer air channels is uniformly distributed, and each of the communication air channels is uniformly distributed around the connecting piece and is communicated with the corresponding transfer air channel.
[0028] Optionally, the adapter is provided with a first positioning notch, the first positioning notch penetrates the second end surface and breaks part of the side wall of the adapter, and the connecting piece is detachably provided with a first positioning piece, and the first positioning piece is detachably clamped in the first positioning notch.
[0029] Optionally, the adapter is provided with a second positioning notch, the second positioning notch penetrates the first end surface and breaks part of the side wall of the adapter, and the adapter is used for positioning the position of the adapter in the vapor deposition equipment.
[0030] Optionally, the base comprises an adapter, the bottom of the adapter is provided with a second positioning notch, and the docking shaft body is detachably provided with a second positioning piece, and the second positioning piece is detachably clamped in the second positioning notch, so that the first end surface of the adapter and the top surface of the docking shaft body are tightly fitted. BRIEF DESCRIPTION OF DRAWINGS
[0031] Figure 1 A schematic view of the positional relationship of a base in a vapor deposition equipment according to an embodiment of the present application;
[0032] Figure 2 A structural schematic view of a base according to an embodiment of the present application;
[0033] Figure 3 A structural schematic view of a carrier according to an embodiment of the present application;
[0034] Figure 4 A structural schematic view of a connecting piece according to an embodiment of the present application; Figure 3 A structural schematic view of the bottom of the connecting piece shown in the figure;
[0035] Figure 5The utility model discloses a kind of position relations of base in gas deposition equipment for the sectional view of the embodiment of the utility model.
[0036] Reference signs:
[0037] 100, carrier; 110, support; 111, recess; 120, connecting piece; 121, first positioning piece; 130, communication air channel; 131, base air channel; 132, transmission air channel; 200, adapter; 210, first end face; 211, second positioning notch; 220, second end face; 221, first positioning notch; 230, transfer air channel; 240, half-through slot; 310, containing side wall; 311, guide surface; 320, containing back wall; 400, cavity; 410, butt joint shaft body; 411, second positioning piece; 412, gas supply air channel. DETAILED DESCRIPTION
[0038] To make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the utility model, not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor belong to the scope of protection of the utility model. Unless otherwise defined, the technical terms or scientific terms used here should be the usual meaning understood by those skilled in the art to which the utility model belongs. The "including" and similar words used in this paper mean that the elements or objects before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.
[0039] The following will be combined with the accompanying drawings Figures 1-5 The specific implementation of the utility model will be further described.
[0040] The embodiments of the utility model provide a kind of base for gas deposition equipment, base includes carrier 100, is equipped with several recesses 111 to place substrate, carrier 100 inside is equipped with with each recess 111 communication several communication air channels 130, to transmission drive gas to corresponding each recess 111;
[0041] The middle part of the carrier 100 is provided with a connecting piece 120, and each communication air channel 130 extends into the connecting piece 120 and communicates with the outside through the bottom end face of the connecting piece 120.
[0042] The base further includes an adapter 200 having a first end face 210 and a second end face 220 axially opposite to each other, and the adapter 200 is detachably arranged in the connecting piece 120 so that the second end face 220 is tightly fitted with the bottom end face of the connecting piece 120 to ensure the air tightness.
[0043] The adapter 200 is provided with a plurality of communication channels 130, each of which is in communication with a corresponding one of the plurality of recesses 111. The adapter 200 is further provided with a plurality of transfer channels 230, each of which is in communication with a corresponding one of the plurality of communication channels 130. The transfer channels 230 extend through the adapter 200 in an axial direction of the adapter 200 and have two ends respectively located at the first end face 210 and the second end face 220. The second end face 220 is provided with a plurality of half-through grooves 240, at least some of which are in communication with the transfer channels 230.
[0044] The openings of the communication channels 130 at the bottom end face of the connecting member 120 are in communication with the openings of the transfer channels 230 at the second end face 220, or are in communication with the openings of the half-through grooves 240.
[0045] In some embodiments, referring to Figure 1 , the carrier 100 is arranged inside a vapor deposition apparatus and is used to carry substrates. The plurality of recesses 111 on the support member 110 are arranged uniformly around the middle portion of the carrier 100, and the substrates are placed in the recesses 111 during the processing of the substrates.
[0046] The carrier 100 includes the support member 110. In some embodiments, the middle portion of the support member 110 is provided with the connecting member 120. In some embodiments, the connecting member 120 is arranged coaxially with the support member 110. In some specific embodiments, the connecting member 120 and the support member 110 are detachably connected, for example, by clamping or bolting. The structure of the connecting member 120 is not limited herein, and it is only necessary that the connecting member 120 can support the support member 110 and ensure the air tightness to prevent gas from leaking from the connection between the connecting member 120 and the support member 110.
[0047] In some embodiments, referring to Figure 1 , Figure 2 and Figure 5 , the adapter 200 is arranged coaxially with the connecting member 120, and the adapter 200 and the connecting member 120 are detachably connected. The first end face 210 of the adapter 200 is detachably fixedly connected with the vapor deposition apparatus. During the replacement of the support member 110, the adapter 200 does not need to be detached because the connecting member 120 and the adapter 200 are detachably connected, and only the connecting member 120 and the adapter 200 need to be separated.
[0048] In some embodiments, referring to Figure 3 and Figure 5 , the communication channel 130 includes a base channel 131 and a transmission channel 132. The support member 110 is provided with a plurality of base channels 131, and each base channel 131 is in communication with a corresponding recess 111.
[0049] The connecting piece 120 is provided with a plurality of transmission air channels 132, each of which is communicated with a corresponding base air channel 131 to form a communication air channel 130, which is communicated with the transfer air channel 230, and extends in the connecting piece 120 and is communicated with the outside through the bottom end surface of the connecting piece 120. The communication mode of the transmission air channel 132 with the base air channel 131 is a prior art, which will not be described here.
[0050] In some embodiments, each transfer air channel 230 corresponds to each base air channel 131, so that the gas can enter the recess 111 through the transfer air channel 230, the transmission air channel 132 and the base air channel 131 in turn. In some specific embodiments, the transfer air channel 230 extends through the adapter 200. In the gas supply process, the gas enters the transfer air channel 230 from the bottom of the adapter 200, and enters the transmission air channel 132 through the top of the adapter 200, and enters the recess 111 through the base air channel 131.
[0051] In some specific embodiments, the transmission air channel 132 extends through the support 110 and the connecting piece 120 in turn. In the gas supply process, the gas enters the transfer air channel 230 through the first end surface 210 of the adapter 200, and enters the recess 111 through the second end surface 220 of the adapter 200. More specifically, each base air channel 131 is communicated with each recess 111, and each transmission air channel 132 extends through the connecting piece 120 and is communicated with each base air channel 131. In the gas supply process, the gas enters the transfer air channel 230 through the first end surface 210 of the adapter 200, enters the transmission air channel 132 through the second end surface 220 of the adapter 200, and enters the base air channel 131 to enter the recess 111.
[0052] In some embodiments, in order to adapt the same adapter 200 to different carriers 100, a plurality of half-through grooves 240 are formed in the second end surface 220. The number of half-through grooves 240 is less than the number of transfer air channels 230, so that at least part of the transfer air channels 230 are communicated with the half-through grooves 240.
[0053] In some embodiments, at least one opening of the transfer air channel 230 is between at least part of the adjacent half-through grooves 240. In this embodiment, eight transfer air channels 230 are selected as an example, and five half-through grooves 240 are selected as an example.
[0054] In some embodiments, each transfer air channel 230 extends through the bottom end surface of the corresponding half-through groove 240 to be communicated with the outside.
[0055] In some embodiments, each half-through groove 240 corresponds to one transfer air channel 230.
[0056] In some embodiments, each half-through groove 240 corresponds to a plurality of transfer air channels 230.
[0057] The cross-sectional area of the half-through groove 240 is greater than the cross-sectional area of the transfer air channel 230, so that the transfer air channel 230 can correspond to the different positions of the communication air channel 130.
[0058] In some embodiments, the half-through grooves 240 are uniformly distributed, and the communication air channels 130 are uniformly distributed around the connecting piece 120, and the opening of the communication air channel 130 on the connecting piece 120 is connected to the corresponding half-through groove 240, facilitating docking. In some embodiments, the transfer air channels 230 are uniformly distributed, and the communication air channels 130 are uniformly distributed around the connecting piece 120, and the opening of the communication air channel 130 on the connecting piece 120 is connected to the corresponding transfer air channel 230, facilitating docking.
[0059] Specifically, referring to Figure 2 and Figure 4 , the half-through groove 240 is recessed on the second end surface 220, and the cross-sectional area of the half-through groove 240 is greater than the cross-sectional area of the corresponding transfer air channel 230.
[0060] In some embodiments, a plurality of half-through grooves 240 are spaced apart on the second end surface 220. Specifically, a plurality of half-through grooves 240 are uniformly distributed on the second end surface 220. When the support 110 containing five transmission air channels 132 is connected to the adapter 200, the transfer air channels 230 connected to the half-through grooves 240 are connected to the corresponding transmission air channels 132 through the half-through grooves 240, and the remaining transfer air channels 230 are blocked by the connecting piece 120; when the support 110 containing eight transmission air channels 132 is connected to the adapter 200, the transfer air channels 230 connected to the half-through grooves 240 are connected to the corresponding transmission air channels 132 through the half-through grooves 240, and the remaining transfer air channels 230 are connected to the remaining transmission air channels 132, so that the same adapter 200 can adapt to supports 110 of different specifications.
[0061] In some embodiments, the cross section of the transfer air channel 230 connected to the half-through groove 240 is elliptical.
[0062] In some embodiments, the cross section of the transfer air channel 230 connected to the half-through groove 240 is polygonal.
[0063] In some embodiments, the area of the half-through groove 240 is greater than the cross-sectional area of the transmission air channel 132, and specifically can adapt to supports 110 containing different numbers of transmission air channels 132.
[0064] The adapter 200 is provided with a first positioning gap 221, the first positioning gap 221 penetrates the second end surface 220 and breaks part of the side wall of the adapter 200, and the connecting piece 120 is detachably provided with a first positioning piece 121, and the first positioning piece 121 is detachably clamped in the first positioning gap 221.
[0065] The adapter 200 is provided with a second positioning notch 211 which penetrates the first end surface 210 and breaks part of the sidewall of the adapter 200 for positioning the adapter 200 in the position of the vapor deposition apparatus.
[0066] In some embodiments, the second end surface 220 is provided with a first positioning notch 221, and the connector 120 is movably provided with a first positioning member 121 which penetrates the connector 120 and extends to the first positioning notch 221 for positioning the adapter 200. In some embodiments, the first positioning member 121 is a bolt.
[0067] In some embodiments, one wall of the first positioning notch 221 penetrates the second end surface 220, and the other wall penetrates the outer wall of the adapter 200. One end of the first positioning member 121 penetrates the connector 120, and when the connector 120 and the adapter 200 are connected, the first positioning member 121 is arranged in the first positioning notch 221 to lock the position of the connector 120 and the adapter 200, so that the transfer gas passage 230 corresponds to and communicates with the transmission gas passage 132.
[0068] The first end surface 210 is provided with a second positioning notch 211 for positioning the adapter 200 in the position of the vapor deposition apparatus.
[0069] The first positioning notch 221 and the second positioning notch 211 both form an accommodation space which includes two accommodation sidewalls 310, one accommodation bottom wall and one accommodation back wall 320.
[0070] In some embodiments, the accommodation space formed by the first positioning notch 221 and the second positioning notch 211 is different in shape.
[0071] In some embodiments, the space formed by the first positioning notch 221 and the second positioning notch 211 is the same in shape and is symmetrically arranged on the adapter 200.
[0072] In this application, the shape of the accommodation space formed by the first positioning notch 221 and the second positioning notch 211 is not limited, and the first positioning notch 221 is mainly used for positioning between the support 110 of the adapter 200, and the second positioning notch 211 is mainly used for positioning between the adapter 200 and the vapor deposition apparatus.
[0073] In this application, the space formed by the first positioning notch 221 and the second positioning notch 211 is the same in shape and is symmetrically arranged on the adapter 200 as an example.
[0074] In some embodiments, the accommodating space comprises two accommodating side walls 310, one accommodating bottom wall and one accommodating back wall 320. The accommodating bottom wall is the side wall away from the second end face 220 or the first end face 210; the accommodating back wall 320 is the side wall close to the axis of the adapter 200, and the accommodating side walls 310 are the remaining two side walls.
[0075] Both of the accommodating side walls 310 are provided with guide surfaces 311, so that the opening of the first positioning gap 221 from the middle of the adapter 200 to the second end face 220 is increased, and the opening of the second positioning gap 211 from the middle of the adapter 200 to the first end face 210 is increased.
[0076] In some embodiments, the accommodating side walls 310 are provided with guide surfaces 311, which are inclinedly arranged, so that the opening of the first positioning gap 221 from the middle of the adapter 200 to the second end face 220 is increased, and the opening of the second positioning gap 211 from the middle of the adapter 200 to the first end face 210 is increased. In the positioning process, the first positioning member 121 first contacts the guide surface 311. If the first positioning member 121 is offset at this time, the first positioning member 121 can be penetrated into the first positioning gap 221 under the action of the guide surface 311, so as to complete the positioning.
[0077] In some embodiments, the accommodating back wall 320 is arranged to be inclined, so that the opening of the first positioning gap 221 from the middle of the adapter 200 to the second end face 220 is increased, and the opening of the second positioning gap 211 from the middle of the adapter 200 to the first end face 210 is increased. The accommodating back wall 320 cooperates with the accommodating side walls 310 to improve the convenience of the positioning and installation process.
[0078] Embodiments of the present application also disclose a vapor deposition device, which comprises a chamber 400, a docking shaft body 410 and a base; the docking shaft body 410 is dynamically sealed to the bottom wall of the chamber 400; the base is detachably arranged on the docking shaft body 410; a plurality of gas supply channels 412 are arranged in the docking shaft body 410 and are communicated with corresponding intermediate gas channels 230 to supply gas.
[0079] In some embodiments, a part of the docking shaft body 410 is arranged outside the chamber 400, and a part of the docking shaft body 410 is arranged inside the chamber 400 and dynamically sealed to the bottom wall of the chamber 400, that is, the docking shaft body 410 can be kept sealed during rotation. During replacement of the support member 110, the docking shaft body 410 does not need to be disassembled, so that the convenience of replacement of the support member 110 is improved.
[0080] In some embodiments, the docking shaft body 410 is coaxially arranged with the adapter 200.
[0081] In some embodiments, the docking shaft body 410 comprises a driving shaft and a sealing sleeve, wherein the sealing sleeve is fixed on the bottom wall of the chamber 400, the driving shaft is arranged in the sealing sleeve and is fixed or rotatable on the bottom wall of the chamber 400, and the driving shaft and the sealing sleeve are sealed to achieve dynamic sealing between the docking shaft body 410 and the bottom wall of the chamber 400.
[0082] In some embodiments, the docking shaft body 410 is a magnetic fluid rotary sealing assembly.
[0083] The base comprises an adapter 200, and the bottom of the adapter 200 is provided with a second positioning gap 211. A second positioning member 411 is detachably arranged on the docking shaft body 410, and the second positioning member 411 is detachably arranged in the second positioning gap 211 to tightly fit the part of the first end surface 210 of the adapter 200 that is in contact with the top surface of the docking shaft body 410.
[0084] In some embodiments, the second positioning member 411 is arranged on the docking shaft body 410 to position the adapter 200 after the adapter 200 is connected to the docking shaft body 410. In some embodiments, the second positioning member 411 is a bolt.
[0085] In some embodiments, the first end surface 210 of the adapter 200 is detachably connected to the docking shaft body 410, such as bolted or clamped.
[0086] In some embodiments, the first end surface 210 of the adapter 200 is fixedly connected to the docking shaft body 410, such as integrally formed.
[0087] In some embodiments, when the adapter 200 is connected to the docking shaft body 410, the second positioning member 411 is arranged in the second positioning gap 211 to position the adapter 200 and the docking shaft body 410, so that the position of the adapter 200 in the chamber 400 is fixed.
[0088] In some embodiments, a plurality of gas supply channels 412 are arranged in the docking shaft body 410, wherein one end of the gas supply channel 412 is in communication with the transfer gas channel 230, and the other end is in communication with an external gas supply device. The gas supply device is used to supply gas, and the gas enters the transfer gas channel 230 through the gas supply channel 412, and then enters the recess 111 through the transmission gas channel 132 and the base gas channel 131 in sequence.
[0089] The implementation principle of the base and the vapor deposition equipment is that the base is detachable relative to the vapor deposition equipment by setting the connecting piece 120 and the adapter piece 200, and during replacement of the base, parts on the vapor deposition equipment do not need to be frequently detached, and only the corresponding support piece 110 and the connecting piece 120 need to be replaced. The half-through groove 240 is further set on the adapter piece 200 to increase the area of the transfer air channel 230, so that the transfer air channel 230 can be connected to the transmission air channels 132 at different positions through the half-through groove 240, thereby meeting the requirement that when the support piece 110 of different specifications (for example, different numbers of recesses 111) is replaced, the shaft body installed on the equipment cavity and other structures having mechanical or electrical relationship with the shaft body do not need to be disassembled, the time consumed for disassembly is reduced, and the base can be quickly and simply disassembled, thereby improving the use efficiency of the machine.
[0090] Although the embodiments of the present application are described in detail above, it is obvious for those skilled in the art that various modifications and changes can be made to the embodiments. However, it should be understood that such modifications and changes are within the scope and spirit of the present application described in the claims. Moreover, the present application described herein can have other embodiments, and can be implemented or realized in various ways.
Claims
1. A susceptor, characterized by, A susceptor for a vapor deposition apparatus, the susceptor comprising: a carrier (100) provided with a plurality of recesses (111) for placing substrates, the carrier (100) internally provided with a plurality of communication channels (130) in communication with the recesses (111) respectively for transmitting a driving gas to the recesses (111) respectively; the carrier (100) is provided with a connecting member (120) in the middle, each of the communication channels (130) extends into the connecting member (120) and penetrates through the bottom end surface of the connecting member (120) to communicate with the outside; an adapter (200) having a first end surface (210) and a second end surface (220) axially opposite to each other, the adapter (200) is detachably arranged in the connecting member (120) so that the second end surface (220) is closely attached to the bottom end surface of the connecting member (120); the adapter (200) is provided with a plurality of transfer channels (230) in communication with the communication channels (130) respectively, each of the transfer channels (230) penetrates through the adapter (200) axially along the adapter (200), and the second end surface (220) is provided with a plurality of half-through grooves (240), at least part of the half-through grooves (240) are in communication with the transfer channels (230) respectively; each of the communication channels is in communication with the opening of the transfer channel (230) on the second end surface (220) or with the opening of the half-through groove (240) axially opposite.
2. The susceptor according to claim 1, wherein: the carrier (100) further comprises a support member (110); the communication channels (130) comprise base channels (131) and transmission channels (132); a plurality of the base channels (131) are arranged on the support member (110), and each of the base channels (131) is in communication with a corresponding recess (111); a plurality of the transmission channels (132) are arranged on the connecting member (120), and each of the transmission channels (132) is in communication with a corresponding base channel (131), and the transmission channel (132) extends in the connecting member (120) and penetrates through the bottom end surface of the connecting member (120) to communicate with the outside.
3. The base of claim 1, wherein each of the transfer channels (230) penetrates through the bottom end surface of the corresponding half-through groove (240) to communicate with the outside.
4. The base of claim 1, wherein At least one opening of the transfer channel (230) is arranged between at least part of the adjacent half-through grooves (240).
5. The base of claim 1, wherein The half-through grooves (240) are uniformly distributed, and each of the communication channels (130) is uniformly distributed around the connecting member (120) and in communication with a corresponding half-through groove (240) axially opposite.
6. The base of claim 1, wherein The transfer channels (230) are uniformly distributed, and each of the communication channels (130) is uniformly distributed around the connecting member (120) and in communication with a corresponding transfer channel (230) axially opposite.
7. The base of claim 2, wherein The adapter (200) is provided with a first positioning gap (221) penetrating the second end surface (220) and breaking part of the side wall of the adapter (200), and the connecting piece (120) is detachably provided with a first positioning piece (121) detachably clamped in the first positioning gap (221).
8. The base of claim 5, wherein, The adapter (200) is provided with a second positioning gap (211) penetrating the first end surface (210) and breaking part of the side wall of the adapter (200) for positioning the adapter (200) in the position of the vapor deposition device.
9. A vapour deposition apparatus, characterised in that, The base comprises a chamber (400), a docking shaft body (410) and the base of any one of claims 1-8. The docking shaft body (410) is dynamically sealed to the bottom wall of the chamber (400); The base is detachably arranged on the docking shaft body (410); The docking shaft body (410) is provided with a plurality of gas supply airways (412) communicating with the corresponding intermediate airways (230) for gas supply.
10. A vapour deposition apparatus as claimed in claim 9, wherein, The base comprises an adapter (200) provided with a second positioning gap (211) at the bottom, and the docking shaft body (410) is detachably provided with a second positioning piece (411) detachably clamped in the second positioning gap (211) to tightly fit the part of the first end surface (210) of the adapter (200) with the top surface of the docking shaft body (410).