Main tank circulating system of photovoltaic wet process chain type cleaning equipment

Abstract

The utility model discloses a main tank circulating system of photovoltaic wet process chain type cleaning equipment, which belongs to the technical field of photovoltaic automation, and comprises a tank body, a plurality of groups of supporting pieces are horizontally and vertically arranged in the middle of the inside of the tank body, and a plurality of groups of supporting pieces are arranged in the middle of the inside of the tank body. Water retaining fixing plates are arranged at the two ends of the interior of the tank body, and a plurality of sets of parallel circulating pipes are transversely and obliquely arranged above the supporting piece. According to the technical scheme, the circulating pipe is obliquely arranged, and when the silicon wafer transversely passes through the inside of the silicon wafer tank body, different positions of the silicon wafer can be covered with different liquid medicine openings of the circulating pipe, so that the liquid medicine in contact with the different positions of the silicon wafer is uniform, and the liquid medicine sprayed out of the circulating pipe can fully react with the surface of the silicon wafer; the circulating pipe with the double-layer structure can mix the liquid medicine again in the pipeline on the outer layer, so that the liquid medicine is mixed more sufficiently, the liquid medicine can be stably injected into the tank body, the liquid level is kept stable, and the reaction of the silicon wafer is more sufficient and stable.

Description

Technical Field

[0001] This utility model belongs to the field of photovoltaic automation technology, specifically relating to the main tank circulation system of a photovoltaic wet chain cleaning equipment. Background Technology

[0002] In photovoltaic wet-process chain equipment, before the silicon wafers enter the main acid tank for reaction from the feeding section, a mixture of water and chemical solution from the auxiliary tank needs to be pumped into the main tank's circulation pipeline system in a certain proportion and uniformly through the auxiliary tank's circulation pump, and then enter the main tank. Whether the main tank's circulation pipeline system can stably pump the chemical solution from the auxiliary tank into the main tank and whether it can make uniform contact between the pumped solution and the reaction surface of the silicon wafer are important factors that directly affect the quality of the reaction between the silicon wafer and the chemical solution.

[0003] In recent years, with the continuous development and expansion of the photovoltaic industry, the demand for the production capacity of photovoltaic wet chain cleaning equipment has also increased. The main tank circulation pipeline, as a crucial part of the entire chain cleaning equipment, directly affects the process stability of the equipment. Existing traditional main tank circulation pipelines, such as... Figure 2 As shown, its circulation pipes are laid out horizontally in the horizontal direction. During the process of the silicon wafer passing through the cleaning tank, the corresponding position of the silicon wafer and the circulation pipe remains unchanged. This makes the contact position between the liquid sprayed by the circulation pipe and the silicon wafer fixed, and the contact point between the liquid and the silicon wafer is the same. The reaction at both ends of the silicon wafer is insufficient. At the same time, the existing circulation pipe lacks an exhaust structure. The gas in the pipe cannot be discharged by itself and will be sent out with the liquid. This will cause bubbles to appear in the tank and affect the stability of the liquid surface. Utility Model Content

[0004] The purpose of this invention is to provide a main tank circulation system for a photovoltaic wet chain cleaning equipment to solve the problems of existing circulation pipeline systems mentioned in the background art during use.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a main tank circulation system for a photovoltaic wet chain cleaning equipment, comprising a tank body, wherein multiple sets of support members are arranged horizontally and vertically in the middle of the tank body, and water-blocking fixing plates are provided at both ends of the tank body, and multiple sets of parallel circulation pipes are arranged horizontally and obliquely above the support members, wherein the circulation pipes have a double-layer structure, and both ends of the circulation pipes are connected to flexible hoses that extend into the inner side of the water-blocking fixing plates.

[0006] Preferably, the circulation pipe includes an outer circulation pipe and an inner circulation pipe, both of which have through holes, and both ends of the circulation pipe are connected to a hose through an exhaust port connector.

[0007] Preferably, a small hole is formed on the water retaining fixed plate, and one end of the hose extends into the right side of the water retaining fixed plate through the small hole.

[0008] Preferably, the distance between the two ends of the circulation pipe in the horizontal vertical direction is consistent with the width of the silicon wafer.

[0009] Preferably, the distance between the two ends of the circulation pipe in the horizontal vertical direction is consistent with the width of the silicon wafer.

[0010] Preferably, the midpoint of the circulation pipe is provided with an angle adjusting hinge.

[0011] Compared with the prior art, the utility model has the beneficial effects that:

[0012] The circulation pipe is inclined, and when the silicon wafer passes through the circulation pipe horizontally, different liquid outlets of the circulation pipe can cover different positions of the silicon wafer, so that the liquid contacted by different positions of the silicon wafer is uniform, and the liquid sprayed by the circulation pipe can fully react with the surface of the silicon wafer; the circulation pipe with the double-layer structure can mix the liquid again in the pipeline of the outer layer, so that the liquid is mixed more fully, and the liquid can be smoothly sprayed into the groove, the liquid level is kept stable, the reaction of the silicon wafer is more stable and sufficient, and the quality of the produced silicon wafer is better. BRIEF DESCRIPTION OF DRAWINGS

[0013] Figure 1 It is a structural schematic view of the utility model;

[0014] Figure 2 It is a structural schematic view of the utility model;

[0015] Figure 3 It is a structural schematic view of the utility model.

[0016] In the drawing: 1, groove; 2, water retaining fixed plate; 3, silicon wafer; 4, circulation pipe; 5, angle adjusting hinge; 6, supporting piece; 7, inner circulation pipe; 8, outer circulation pipe; 9, hose; 10, exhaust port connector. DETAILED DESCRIPTION

[0017] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the protection scope of the utility model.

[0018] Reference Figures 1-3The utility model provides a kind of main groove circulating system of photovoltaic wet chain cleaning equipment, including tank body 1, multiple groups of support 6 are arranged in the inside middle horizontal vertical of tank body 1, the inside both ends of tank body 1 are provided with water retaining fixed plate 2, the upper side of support 6 is horizontally and obliquely provided with multiple groups of parallel circulating pipe 4, circulating pipe 4 is double-layer structure, and the both ends of circulating pipe 4 are connected with hose 9 into the inside of water retaining fixed plate 2.

[0019] For the horizontal transverse arrangement of existing circulating pipe 4 road circulating pipe 4, the uneven contact of silicon wafer 3 with liquid medicine and the problem of circulating pipe 4 liquid sending bubble, the circulating pipe 4 of the technical scheme is obliquely arranged, and when the silicon wafer 3 passes through the tank body 1 horizontally, different liquid ports of the circulating pipe 4 can cover different positions of the silicon wafer 3, and different positions of the silicon wafer 3 can be used as the first contact point of the liquid medicine sprayed by the circulating pipe 4, so that the liquid medicine contacted by different positions of the silicon wafer 3 is uniform, and the liquid medicine sprayed by the circulating pipe 4 can fully react with the surface of the silicon wafer 3; simultaneously, the circulating pipe 4 of the present scheme is double-layer structure, and the both ends of the circulating pipe 4 are connected with the hose 9, and the hose 9 is inserted into the inside of the water retaining fixed plate 2, the double-layer structure circulating pipe 4 can mix the liquid medicine again in the outer pipe, so that the liquid medicine is more fully mixed, and the liquid medicine can be smoothly sprayed into the tank body 1, the liquid level is kept stable, the reaction of the silicon wafer 3 is more fully and stably, and the quality of the produced silicon wafer 3 is better.

[0020] Further, the circulating pipe 4 includes an outer circulating pipe 8 and an inner circulating pipe 7, and through holes are formed in the outer circulating pipe 8 and the inner circulating pipe 7, and the both ends of the circulating pipe 4 are connected with the hose 9 through the exhaust port joint 10.

[0021] Through the technical scheme, the circulating pipe 4 is double-layer structure, the liquid medicine can enter the outer circulating pipe 8 through the through holes between the inner circulating pipe 7 and the outer circulating pipe 8, and is fully mixed in the outer circulating pipe 8, and finally is discharged from the through holes of the outer circulating pipe 8, and the exhaust port joint 10 is installed at the both ends of the double-layer circulating pipe 4 to assist in discharging the gas in the liquid medicine.

[0022] Further, a small hole is formed in the water retaining fixed plate 2, and one end of the hose 9 extends into the inside of the water retaining fixed plate 2 through the small hole.

[0023] Through the technical scheme, the air in the circulating pipe 4 is guided to the inside of the water retaining fixed plate 2 through the hose 9, and the liquid level fluctuation generated is blocked by the water retaining fixed plate 2, so as to avoid affecting the stability of the liquid level in the tank body 1.

[0024] Further, the distance between the both ends of the circulating pipe 4 in horizontal vertical direction is consistent with the width of the silicon wafer 3.

[0025] Further, the distance between two adjacent groups of the circulating pipe 4 is greater than or equal to the width of the silicon wafer 3.

[0026] The vertical distance between the two liquid outlet ports of the circulating pipe 4 is set according to the type of the silicon wafer 3, and is kept consistent with the width of the silicon wafer 3, and the inclined arrangement of the circulating pipe 4 can fully cover the silicon wafer 3 compared with the horizontally transverse arrangement of the circulating pipe 4, so that the contact of the silicon wafer 3 with the liquid is more sufficient.

[0027] Further, the midpoint of the circulating pipe 4 is provided with an angle adjusting hinge 5.

[0028] Through the technical scheme, the circulating pipe 4 can adjust the angle through the angle adjusting hinge 5, so as to adapt to silicon wafers 3 of different specifications, and the use effect is better.

[0029] Working principle: the circulating pipe 4 of the technical scheme is arranged in an inclined manner, when the silicon wafer 3 passes through the slot body 1 transversely, different liquid outlets of the circulating pipe 4 can cover different positions of the silicon wafer 3, so that the liquid contacted by different positions of the silicon wafer 3 is uniform, and the liquid sprayed by the circulating pipe 4 can fully react with the surface of the silicon wafer 3; the circulating pipe 4 of the scheme adopts a double-layer structure, and the two ends of the circulating pipe 4 are connected with the hose 9, and the hose 9 is inserted into the inner side of the water blocking fixed plate 2, the double-layer structure of the circulating pipe 4 can mix the liquid again in the outer pipe, so that the liquid is mixed more fully, and the liquid can be smoothly sprayed into the slot body 1, the liquid surface is kept stable, the reaction of the silicon wafer 3 is more sufficient and stable, and the quality of the produced silicon wafer 3 is better.

[0030] In the description of the present application, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first", "second" can be explicitly or implicitly included at least one of the features. In the description of the present application, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0031] In the description of the present application, the description of the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present application, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine different embodiments or examples described in the present application and the features of different embodiments or examples without contradiction.

[0032] Although the embodiments of the present application have been shown and described, it is to be understood that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present application, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A main tank circulation system of a photovoltaic wet chain cleaning apparatus, characterized by: The utility model provides a silicon wafer cleaning device, including the groove body, the inside of groove body is provided with a plurality of sets of support piece in the middle horizontal vertical, both ends of the inside of groove body are provided with the water retaining fixed plate, the top of support piece is provided with a plurality of sets of parallel circulating pipe in the horizontal oblique, circulating pipe is double -deck structure, and both ends of circulating pipe are connected with the hose that goes into to the inboard of water retaining fixed plate.

2. The main tank circulation system of a photovoltaic wet chain cleaning equipment according to claim 1, characterized in that: The circulating pipe includes an outer circulating pipe and an inner circulating pipe, and the outer circulating pipe and the inner circulating pipe are both provided with through holes.

3. The main tank circulation system of a photovoltaic wet chain cleaning equipment according to claim 1, characterized in that: Both ends of the circulating pipe are connected with the hose through the exhaust port joint.

4. The main tank circulation system of a photovoltaic wet chain cleaning equipment according to claim 1, characterized in that: The water retaining fixed plate is provided with a small hole, and one end of the hose extends into the right side of the water retaining fixed plate through the small hole.

5. The main tank circulation system of a photovoltaic wet chain cleaning apparatus according to claim 1, characterized in that: The distance between both ends of the circulating pipe in the horizontal vertical is consistent with the width of the silicon wafer.

6. A main tank circulation system of a photovoltaic wet chain cleaning apparatus according to claim 1, characterized in that: The distance between two adjacent groups of the circulating pipe is greater than or equal to the width of the silicon wafer. The midpoint of the circulating pipe is provided with an angle adjusting hinge.

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