Photoresist stripping device for micro-nano processing

Abstract

The utility model discloses a photoresist stripping device for micro-nano processing, which belongs to the technical field of photoresist stripping devices and comprises a shell, a plurality of fixing boxes are mounted in the shell, a high-pressure cavity and a low-pressure cavity are arranged in the shell and are separated by the fixing boxes, and the high-pressure cavity is communicated with the low-pressure cavity. A pump body is installed on the outer surface of the shell, and the input end of the pump body is connected with the low-pressure cavity. According to the photoresist stripping device for micro-nano processing disclosed by the utility model, the fixed box, the flow guide mechanism and other parts are arranged, and the pump body injects a chemical solution in the low-pressure cavity into the high-pressure cavity, so that the height of the chemical solution in the high-pressure cavity exceeds the upper end of the flow guide mechanism, and meanwhile, the height of the chemical solution in the low-pressure cavity is reduced; and the chemical solution in the high-pressure cavity flows to the circuit board along the flow guide mechanism under the action of gravity, so that the circuit board is washed, and the stripping effect is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of photoresist stripping device, especially micro nanometer processing's photoresist stripping device. BACKGROUND

[0002] Photoresist, also known as photoresist, is a kind of photosensitive material playing a vital role in the field of semiconductor manufacturing and microelectronics, in the production process of integrated circuit, photoresist is used as mask material, helps to form micro circuit pattern, realizes the manufacture of circuit and device, after exposure and development step, the uncured photoresist needs to be removed, which needs to strip photoresist, so as to subsequent etching or deposition step.

[0003] The existing photoresist stripping mode is generally divided into wet stripping and dry stripping mode, wherein dry stripping is to use active species in plasma to oxidize and decompose photoresist, so as to realize removal, this method is generally carried out in vacuum environment, can provide higher stripping efficiency and better substrate protection, but the cost is higher, wet stripping is to use chemical solution to dissolve photoresist, generally, the circuit board is soaked in the solution containing specific chemical components, the chemical components can react with photoresist, so as to realize stripping, but in the wet stripping process, the chemical solution is static, there is no flow between the chemical solution and the circuit board, so as to cause low stripping efficiency, in order to solve the technical problem, the utility model provides a kind of micro nanometer processing's photoresist stripping device. UTILITY MODEL CONTENT

[0004] The main purpose of the utility model is to provide a kind of micro nanometer processing's photoresist stripping device, can effectively solve the problems mentioned in the background art.

[0005] To achieve the above purpose, the technical scheme adopted by the utility model is as follows:

[0006] A kind of micro nanometer processing's photoresist stripping device, including shell, the inside of the shell is installed with multiple fixed boxes, high pressure cavity and low pressure cavity are arranged in the inside of the shell, the high pressure cavity and low pressure cavity are separated by multiple fixed boxes, the outer surface of the shell is installed with pump body, the input end of the pump body is connected with low pressure cavity, the output end of the pump body is connected with high pressure cavity, the inner wall of the fixed box is slidably connected with sliding block, the side of the fixed box is provided with flow guide mechanism, the lower part of the flow guide mechanism is provided with box body, the outer surface of the box body is fixedly connected with the fixed box, the lower of the sliding block is provided with adjusting mechanism.

[0007] Preferably, the lower surface of the shell is installed with support frame, the upper surface of the shell is detachably connected with two mounting plates.

[0008] Preferably, the upper surface of the fixed box is slidably connected with a sliding plate, and the outer surface of the sliding plate is slidably connected with the mounting plate.

[0009] Preferably, the flow guide mechanism comprises a flow guide pipe, the outer surface of the flow guide pipe is fixedly connected with the fixed box, the upper end of the flow guide pipe is provided with a liquid inlet plate, and one side of the liquid inlet plate is provided with a grille.

[0010] Preferably, the lower end of the flow guide pipe is provided with a liquid outlet plate, the liquid outlet plate is located in the interior of the box body, and the lower surface of the liquid outlet plate is provided with a plurality of splash-proof strips.

[0011] Preferably, the adjusting mechanism comprises a threaded rod, the outer surface of the threaded rod is threadedly connected with the shell, and the upper end of the threaded rod is rotatably connected with the sliding block.

[0012] Preferably, the inner wall of the fixed box is fixedly provided with a sealing block, and the sealing block is slidably connected with the upper end of the threaded rod.

[0013] Compared with the prior art, the micro-nano processing photoresist stripping device has the following beneficial effects:

[0014] In the utility model, through setting up fixed box and flow guide mechanism and other components, the pump body injects the chemical solution in the low pressure cavity into the inside of the high pressure cavity, makes the chemical solution height in the high pressure cavity overtop the upper end of the flow guide mechanism, simultaneously makes the chemical solution height in the low pressure cavity reduce, and the chemical solution in the high pressure cavity flows to the circuit board along the flow guide mechanism under the action of gravity, thereby the circuit board is washed, thereby the stripping effect is increased.

[0015] In the utility model, through setting up flow guide mechanism and other components, when using, the chemical solution flows to the circuit board from the inside of the high pressure cavity through the flow guide mechanism, the solid substance in the chemical solution can be intercepted through the grille, prevents its from entering the flow guide pipe, thereby avoids the blockage, when the chemical solution moves to the lower part of the flow guide pipe, is blocked by the splash-proof strip, so as to slow down the speed of the chemical solution falling, reduces the kinetic energy of the chemical solution, thereby slows down the flow speed of the chemical solution, to avoid that the impact force caused by the chemical solution speed being too fast to the circuit board is larger, leads to the sensitive position on the circuit board being damaged. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 It is the whole structure schematic view of the micro-nano processing photoresist stripping device of the utility model;

[0017] Figure 2 It is the sectional view of the shell in the micro-nano processing photoresist stripping device of the utility model;

[0018] Figure 3 It is the sectional view of the fixed box in the micro-nano processing photoresist stripping device of the utility model;

[0019] Figure 4 It is the sectional view of sliding block in the photoresist stripping device for micro-nano processing of the utility model.

[0020] Figure 5 It is the three-dimensional structure schematic diagram of flow guide mechanism in the photoresist stripping device for micro-nano processing of the utility model.

[0021] In the figure: 1, shell; 2, fixed box; 3, high-pressure cavity; 4, low-pressure cavity; 5, pump body; 6, sliding block; 7, flow guide mechanism; 701, flow guide pipe; 702, liquid inlet plate; 703, grid; 704, liquid outlet plate; 705, splash-proof strip; 8, box body; 9, adjusting mechanism; 901, threaded rod; 902, sealing block; 10, support frame; 11, mounting plate; 12, sliding plate. DETAILED DESCRIPTION

[0022] In order to make the technical means, creation features, purposes and effects realized by the utility model easy to understand, the utility model is further described below in combination with specific implementation manners.

[0023] As Figures 1-5 shown, a photoresist stripping device for micro-nano processing includes a shell 1, multiple fixed boxes 2 are installed inside the shell 1, a high-pressure cavity 3 and a low-pressure cavity 4 are arranged inside the shell 1, the high-pressure cavity 3 and the low-pressure cavity 4 are separated by the multiple fixed boxes 2, a support frame 10 is installed on the lower surface of the shell 1, two mounting plates 11 are detachably connected to the upper surface of the shell 1, the number of the support frame 10 is two, the number of the mounting plate 11 is two, and the mounting plates 11 are arranged above the high-pressure cavity 3 and the low-pressure cavity 4 to seal the high-pressure cavity 3 and the low-pressure cavity 4, the mounting plate 11 is fixed to the shell 1 by bolts, and the mounting plate 11 can be detached when needed to leak the inside of the shell 1, a sliding plate 12 is slidably connected to the upper surface of the fixed box 2, the outer surface of the sliding plate 12 is slidably connected to the mounting plate 11, and the sliding plate 12 is used to seal the upper end of the multiple fixed boxes 2, and the sliding plate 12 can be slid down to leak the fixed box 2 at any time when in use.

[0024] The outer surface of the shell 1 is provided with a pump body 5, the input end of the pump body 5 is connected with the low-pressure cavity 4, the output end of the pump body 5 is connected with the high-pressure cavity 3, the inner wall of the fixed box 2 is slidably connected with a sliding block 6, one side of the fixed box 2 is provided with a flow guide mechanism 7, the lower part of the flow guide mechanism 7 is provided with a box body 8, the outer surface of the box body 8 is fixedly connected with the fixed box 2, the flow guide mechanism 7 comprises a flow guide pipe 701, the outer surface of the flow guide pipe 701 is fixedly connected with the fixed box 2, the upper end of the flow guide pipe 701 is provided with a liquid inlet plate 702, one side of the liquid inlet plate 702 is provided with a grille 703, in use, the grille 703 can intercept solid substances in the chemical solution to prevent them from entering the flow guide pipe 701, thereby avoiding blockage, the lower part of the flow guide pipe 701 is provided with a liquid outlet plate 704, the liquid outlet plate 704 is located in the inside of the box body 8, the lower surface of the liquid outlet plate 704 is provided with a plurality of splash-proof strips 705, when the chemical solution moves to the lower part of the flow guide pipe 701, it is blocked by the splash-proof strips 705 to slow down the falling speed of the chemical solution, reduce the kinetic energy of the chemical solution, thereby slowing down the flow speed of the chemical solution.

[0025] The lower part of the sliding block 6 is provided with an adjusting mechanism 9, the adjusting mechanism 9 comprises a threaded rod 901, the outer surface of the threaded rod 901 is threadedly connected with the shell 1, the upper end of the threaded rod 901 is rotatably connected with the sliding block 6, by rotating the threaded rod 901, the threaded rod 901 can be moved upward to drive the sliding block 6 to move upward, the inner wall of the fixed box 2 is fixedly provided with a sealing block 902, the sealing block 902 is slidably connected with the upper end of the threaded rod 901, the upper half of the threaded rod 901 is not provided with threads, the position where the threaded rod 901 contacts with the sealing block 902 is sealed to make the threaded rod 901 have good sealing effect when moving upward or downward.

[0026] The pump body 5 can pump the chemical solution in the low-pressure cavity 4 into the high-pressure cavity 3, the chemical solution in the high-pressure cavity 3 can enter the upper part of the sliding block 6 through the flow guide mechanism 7, the upper part of the sliding block 6 is provided with a recess for placing a circuit board, and has a certain inclination, so that the chemical solution on the circuit board can flow to the outside of the fixed box 2 under the action of gravity, and then enter the inside of the low-pressure cavity 4, thereby realizing the circulating flow of the chemical solution.

[0027] The bottom of the support frame 10 is lower than the bottom of the adjusting mechanism 9 to support the whole.

[0028] It should be noted that, in actual use, the sliding plate 12 is slid out, thereby opening the upper part of the plurality of fixed boxes 2, an appropriate amount of chemical solution is first poured into the fixed boxes 2, and then enters the inside of the low-pressure cavity 4 through the opening on one side of the fixed box 2, so that the height of the chemical solution exceeds the upper part of the sliding block 6, the threaded rod 901 is screwed, the threaded rod 901 moves upward, thereby driving the sliding block 6 to slide out of the fixed box 2, when the upper part of the sliding block 6 slides to the upper part of the fixed box 2, the circuit board to be processed is clamped to the upper part of the sliding block 6, and the sliding block 6 is reset, thereby driving the circuit board to be immersed in the chemical solution, after the circuit board is soaked for a period of time, the pump body 5 is started, the pump body 5 injects the chemical solution in the low-pressure cavity 4 into the inside of the high-pressure cavity 3, so that the height of the chemical solution in the high-pressure cavity 3 exceeds the upper end of the flow guide pipe 701, and the height of the chemical solution in the low-pressure cavity 4 is lowered, the chemical solution in the high-pressure cavity 3 flows onto the circuit board along the flow guide mechanism 7 under the action of gravity, thereby washing the circuit board, by adjusting the height of the sliding block 6, the sliding block 6 can cover or open the box body 8, so as to selectively wash, thereby increasing the stripping effect.

[0029] The pump body 5 in the application is a common electrical device in the prior art, and the model or internal structure thereof will not be described in detail, and it can also be replaced by other power sources.

[0030] The basic principles and main features of the present application and the advantages of the present application are shown and described above. It should be understood by those skilled in the art that the present application is not limited by the above embodiments, and the above embodiments and descriptions in the specification are only to illustrate the principles of the present application, and various changes and improvements can be made to the present application without departing from the spirit and scope of the present application, and these changes and improvements all fall within the scope of the present application. The scope of protection of the present application is defined by the appended claims and their equivalents.

Claims

1. A device for stripping microlithographically processed photoresist, comprising a housing (1), characterized in that: The inside of the shell (1) is provided with a plurality of fixed boxes (2), the inside of the shell (1) is provided with a high pressure cavity (3) and a low pressure cavity (4), the high pressure cavity (3) and the low pressure cavity (4) are separated by a plurality of fixed boxes (2), the outer surface of the shell (1) is provided with a pump body (5), the input end of the pump body (5) is connected with the low pressure cavity (4), the output end of the pump body (5) is connected with the high pressure cavity (3), the inner wall of the fixed box (2) is slidably connected with a sliding block (6), one side of the fixed box (2) is provided with a flow guide mechanism (7), the lower part of the flow guide mechanism (7) is provided with a box body (8), the outer surface of the box body (8) is fixedly connected with the fixed box (2), the lower part of the sliding block (6) is provided with an adjusting mechanism (9).

2. The micro-nano fabricated photoresist lift-off device of claim 1, wherein: The lower surface of the shell (1) is provided with a support frame (10), and the upper surface of the shell (1) is detachably connected with two mounting plates (11).

3. The micro-nano fabricated photoresist lift-off device of claim 2, wherein: The upper surface of the fixed box (2) is slidably connected with a sliding plate (12), and the outer surface of the sliding plate (12) is slidably connected with the mounting plate (11).

4. The micro-nano processed photoresist lift-off device of claim 3, wherein: The flow guide mechanism (7) comprises a flow guide pipe (701), the outer surface of the flow guide pipe (701) is fixedly connected with the fixed box (2), the upper end of the flow guide pipe (701) is provided with a liquid inlet plate (702), one side of the liquid inlet plate (702) is provided with a grille (703).

5. The micro-nano fabricated photoresist lift-off device of claim 4, wherein: The lower part of the flow guide pipe (701) is provided with a liquid outlet plate (704), the liquid outlet plate (704) is located in the inside of the box body (8), and the lower surface of the liquid outlet plate (704) is provided with a plurality of splash-proof strips (705).

6. The micro-nano processed photoresist lift-off device of claim 5, wherein: The adjusting mechanism (9) comprises a threaded rod (901), the outer surface of the threaded rod (901) is threadedly connected with the shell (1), and the upper end of the threaded rod (901) is rotatably connected with the sliding block (6).

7. The micro-nano fabricated photoresist lift-off device of claim 6, wherein: The inner wall of the fixed box (2) is fixedly provided with a sealing block (902), and the sealing block (902) is slidably connected with the upper end of the threaded rod (901).

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