Cleaning equipment, base station and cleaning system

Abstract

The utility model provides cleaning equipment, a base station and a cleaning system. The cleaning equipment comprises a cleaning part and a liquid path system, and the cleaning part is used for mopping a to-be-cleaned surface. The liquid path system comprises a clear water box and a target object. The clear water box is provided with an overflow port. Under the condition that liquid is supplied to the clear water box through an external liquid source of the clear water box to exceed the overflow port, the liquid in the clear water box flows to a target object through the overflow port, and the target object comprises the cleaning piece and / or the sewage box.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of cleaning, and more particularly, to a cleaning device, a base station and a cleaning system. BACKGROUND

[0002] The cleaning device usually includes a floor mopping robot, a sweeping and mopping robot, a handheld scrubber, etc. The cleaning device can mop a surface to be cleaned by a mopping member thereof.

[0003] When the cleaning device is in a state of mopping the surface to be cleaned, a liquid system of the cleaning device provides cleaning liquid (usually water) to the cleaning member to wet the cleaning member, and the surface to be cleaned is mopped by the movement of the wet cleaning member. After the cleaning device mops the surface to be cleaned for a period of time, the cleaning device can return to the base station cooperating therewith to clean the cleaning member. In the state of cleaning the cleaning member, the liquid system of the cleaning device needs to provide a large amount of cleaning liquid (usually water) to the cleaning member to clean the cleaning member. Alternatively, in the state of cleaning the sewage box, the liquid system of the cleaning device needs to provide liquid to the sewage box to clean the sewage box.

[0004] At present, the cleaning device provides liquid to the cleaning member and provides liquid to the sewage box, which is a separate execution action and has no association with other execution actions of the cleaning device, such as liquid supplementing operation, resulting in a relatively complicated overall control logic of the cleaning device. UTILITY MODEL CONTENT

[0005] The present disclosure provides a cleaning device, a base station and a cleaning system, at least for solving the problem of a relatively complicated overall control logic of the cleaning device.

[0006] In a first aspect, the present disclosure provides a cleaning device, which includes a cleaning member and a liquid system, and the cleaning member is used for mopping a surface to be cleaned. The liquid system includes a clean water box and a target object. The clean water box is provided with an overflow outlet. When the clean water box is supplied with liquid by an external liquid source of the clean water box to exceed the overflow outlet, the liquid in the clean water box flows to the target object through the overflow outlet, and the target object includes the cleaning member and / or a sewage box.

[0007] In some embodiments, the clean water box is further provided with a liquid outlet, the height of the liquid outlet on the clean water box is lower than the height of the overflow outlet on the clean water box; the liquid path system further comprises a first path, a first power device and a second path. The first path is provided with a first inlet and a first outlet, the first inlet is communicated with the liquid outlet, and the first outlet is used for the liquid in the clean water box to flow out of the first path. The first power device is used to provide driving power for the liquid in the clean water box to flow out of the first path. The second path is provided with a second inlet and a second outlet, the second inlet is communicated with the overflow outlet, and the second outlet is used for the liquid in the clean water box to flow out of the second path. When the cleaning device is in the state of wiping the surface to be cleaned, the liquid in the clean water box is driven by the first power device to flow into the first path from the liquid outlet and flow out of the first outlet to supply the cleaning element; when the cleaning device is in the state of cleaning the cleaning element, the clean water box is supplied with liquid by an external liquid source of the clean water box, and when the liquid level of the clean water box exceeds the overflow outlet, the liquid in the clean water box overflows from the overflow outlet to the second path and flows out of the second outlet to drain the cleaning element to clean the cleaning element.

[0008] In some embodiments, when the cleaning device is in the state of wiping the surface to be cleaned, the liquid level of the clean water box does not exceed the overflow outlet.

[0009] In some embodiments, the first power device is arranged at the first path or the liquid outlet.

[0010] In some embodiments, when the cleaning device is in the state of cleaning the cleaning element, and the liquid level of the clean water box supplied by the external liquid source of the clean water box exceeds the overflow outlet, the first power device drives the liquid in the clean water box to flow into the first path from the liquid outlet and flow out of the first outlet to drain the cleaning element.

[0011] In some embodiments, the second path is a pipe, the liquid overflowing from the overflow outlet flows into the pipe and directly flows out of the pipe to drain the cleaning element to clean the cleaning element.

[0012] In some embodiments, the second passage is provided with a first chamber, a second chamber and a second power device. The first chamber is provided with a liquid inlet and a liquid outlet, the liquid inlet is used for the liquid from an external liquid source of the first chamber to enter the first chamber, and the liquid outlet is used for the liquid in the first chamber to be discharged to the cleaning member. The second chamber is used for containing sewage, and is provided with a communication port, the communication port is used for the sewage on the cleaning member to enter the second chamber, the second chamber is separated from the first chamber and is in fluid communication with the first chamber through a through hole, and the highest allowable liquid level of the second chamber is lower than the position of the through hole. The second power device is connected with the liquid outlet and is used for providing driving power for driving the sewage on the cleaning member to enter the second chamber and for driving the liquid in the clean water box to be discharged from the second passage. When the cleaning device is in a state of washing the cleaning member and the liquid level of the external liquid source of the clean water box supplying the clean water box exceeds the overflow port, the second power device drives the liquid in the clean water box to overflow from the overflow port to the second passage, and then to flow out of the second passage through the liquid inlet, the first chamber, the liquid outlet and the second outlet to discharge the liquid to the cleaning member to wash the cleaning member. When the cleaning device is in a state of cleaning the surface to be cleaned, the second power device is in an activated state to extract air in the first chamber and the second chamber so that the second chamber is in a negative pressure state to drive the sewage on the cleaning member to enter the second chamber.

[0013] In some embodiments, a filter is arranged at the through hole between the first chamber and the second chamber, the first chamber and the second chamber are in fluid communication through the hole of the filter, and the filter is used for blocking at least part of solid waste in the second chamber from entering the first chamber. When the second power device is in a closed state and the liquid level of the external liquid source of the clean water box supplying the clean water box exceeds the overflow port, the liquid in the clean water box overflows from the overflow port to the first chamber and enters the second chamber after passing through the filter.

[0014] In some embodiments, the liquid path system further comprises the sewage box. The sewage box comprises a box body and a cover body, the cover body is arranged on the top wall of the box body, the through hole is arranged on the top wall of the box body, the second chamber is formed in the box body, and the first chamber is located in the space surrounded by the cover body and the box body.

[0015] In some embodiments, a sealing structure is arranged between the cover body and the box body, and the sealing structure is used at least for surrounding the first chamber between the cover body and the box body. The through hole is located in the area surrounded by the sealing structure.

[0016] In some embodiments, the box further comprises a third chamber, which is independent of the second chamber, and the third chamber is in communication with the second power device, and the top wall of the box is provided with a third chamber inlet in communication with the third chamber, and the third chamber inlet is located in the first chamber.

[0017] In some embodiments, when the cleaning device is in the state of cleaning the cleaning member, and the liquid level of the external liquid source of the clean water box supplying the clean water box exceeds the overflow outlet, the second power device drives the liquid in the clean water box to overflow from the overflow outlet to the first chamber, and then to the cleaning member through the third chamber inlet, the third chamber, the liquid outlet and the second power device; the first chamber is divided into a first sub-chamber and a second sub-chamber by the sealing structure, the through hole is located in the first sub-chamber, the third chamber inlet is located in the second sub-chamber, the sealing structure is provided with a fluid outlet in communication with the first sub-chamber, and the sealing structure is provided with a fluid inlet in communication with the second sub-chamber, and the fluid outlet and the fluid inlet are spaced apart and in fluid communication.

[0018] In some embodiments, the cleaning device further comprises a recovery member, which comprises a dirt scraping part and a dirt containing chamber, and the dirt scraping part is used to abut against the cleaning member to scrape dirt on the cleaning member into the dirt containing chamber. The communication port of the second chamber is in communication with the dirt containing chamber, and the communication port is used for the dirty water on the cleaning member to enter the second chamber through the dirt containing chamber, and for the dirty water in the second chamber to enter the dirt containing chamber and be discharged to the outside of the cleaning device. Wherein, the rotation axis of the cleaning member is parallel to the surface to be cleaned.

[0019] In some embodiments, the cleaning member comprises a track-type cleaning member or a roller-type cleaning member.

[0020] In some embodiments, the dirt containing chamber extends along the rotation axis direction of the cleaning member, one end of the length direction of the dirt containing chamber is provided with a first dirty water outlet, and the other end of the length direction of the dirt containing chamber is provided with a second dirty water outlet, the first dirty water outlet is in communication with the communication port of the second chamber, and the cleaning device further comprises a control structure, which is used to communicate the inside of the dirt containing chamber with the outside when the cleaning device is in the state of discharging dirt.

[0021] In some embodiments, the cleaning member comprises a track-type cleaning member or a roller-type cleaning member, and the liquid path system further comprises a water spraying strip, the first outlet of the first path is in communication with the water spraying strip, the second outlet of the second path is in communication with the water spraying strip, and the water spraying strip has a plurality of water spraying outlets, and the plurality of water spraying outlets are arranged at intervals along the rotation axis direction of the cleaning member.

[0022] In some embodiments, the sewage box is provided with a liquid inlet communicating with the overflow outlet, the liquid inlet is arranged at a position higher than the highest allowable liquid level of the sewage box, the sewage box is used to recover the sewage formed by the cleaning member, in the case that the liquid level of the clean water box exceeds the overflow outlet by supplying liquid to the clean water box through an external liquid source, the liquid overflowing from the overflow outlet of the clean water box enters the sewage box through the liquid inlet to flush the sewage box.

[0023] In some embodiments, the cleaning device is used to interface with a base station, the base station is used to maintain the cleaning device, the base station is provided with a liquid supply system, the external liquid source includes the liquid supply system; the sewage box is provided with a communication port, the arrangement height of the liquid inlet is higher than the arrangement height of the communication port; wherein, in the state that the cleaning device is used to wipe the surface to be cleaned, the sewage on the cleaning member enters the sewage box from the communication port; in the case that the cleaning device is in the sewage discharge state, the sewage in the sewage box flows out of the sewage box from the communication port.

[0024] In some embodiments, the sewage box is connected with a second power device, in the case that the cleaning device is used to clean the surface to be cleaned, the second power device is in an open state and draws negative pressure in the sewage box to provide power for sucking the sewage on the cleaning member into the sewage box; in the case that the cleaning device is in the sewage discharge state, the second power device is in a closed state, the sewage box is supplied with positive pressure gas through the base station to provide power for discharging the sewage in the sewage box to the outside of the sewage box, or the second power device is in an open state and supplies positive pressure gas to the sewage box to provide power for discharging the sewage in the sewage box to the outside of the sewage box.

[0025] In some embodiments, the sewage box is provided with a filter, the filter is used to block solid waste in the sewage box from entering the second power device, the liquid overflowing from the overflow outlet of the clean water box can at least flush the filter to clean the filter.

[0026] In some embodiments, the sewage box includes a first chamber and a second chamber, the second chamber is used to contain sewage, the first chamber and the second chamber are separated from each other and are in fluid communication through a through hole, the highest allowable liquid level of the second chamber is lower than the position of the through hole, the filter is arranged at the through hole, the second power device communicates with the first chamber, the liquid inlet is arranged at the first chamber, the communication port is arranged at the second chamber, and the filter is used to block at least part of the solid waste in the second chamber from entering the first chamber.

[0027] In some embodiments, the second power device comprises a water-air dual pump.

[0028] In some embodiments, the base station is further provided with a gas source system, which is configured to output gas and to communicate with the clean water box and / or the dirty water box when the base station is docked with the cleaning device; when the base station is docked with the cleaning device and the second power device is in an off state, the base station provides the dirty water box with a gas-liquid mixture through the gas source system and the liquid supply system to at least flush the filter.

[0029] In some embodiments, the liquid path system further comprises a recovery member, which comprises a dirt scraping portion and a dirt containing cavity, the dirt scraping portion is configured to abut against the cleaning member to scrape dirt on the cleaning member into the dirt containing cavity; the communicating port of the dirty water box communicates with the dirt containing cavity, the communicating port is configured to allow the dirty water on the cleaning member to enter the dirty water box through the dirt containing cavity, and to allow the dirty water in the dirty water box to be discharged to the outside of the cleaning device through the dirt containing cavity.

[0030] In some embodiments, the dirt containing cavity extends along the rotation axis direction of the cleaning member, one end of the length direction of the dirt containing cavity is provided with a first dirty water port, the other end of the length direction of the dirt containing cavity is provided with a second dirty water port, the first dirty water port communicates with the dirty water box, and the second dirty water port is provided with a control structure, which is configured to allow the inside of the dirt containing cavity to communicate with the outside when the cleaning device is in a dirty water discharging state.

[0031] In some embodiments, a dirt detection sensor is arranged on the dirty water recovery path of the cleaning member to the dirty water box, the dirt detection sensor is configured to detect the dirt level of the dirty water on the dirty water recovery path; the cleaning device further comprises a device control board, which is electrically connected with the dirt detection sensor, and when the cleaning device is docked with the base station, the device control board is configured to determine the fluid parameter and supply strategy of the fluid provided to the dirty water box according to the dirt level detected by the dirt detection sensor.

[0032] In some embodiments, the dirty water box is provided with a stirring device, which is configured to stir the dirty water in the dirty water box when the cleaning device is in a dirty water discharging state; the top wall of the dirty water box is provided with a driving device, the stirring device is connected to the driving device, and the rotating shaft of the stirring device extends from the top wall of the dirty water box into the dirty water box.

[0033] In some embodiments, the dirty water box is provided with a water fullness detection device, which is configured to be triggered when the liquid level in the dirty water box reaches a set liquid level.

[0034] In some embodiments, the water fullness detecting device comprises a float, a guide column and a sensing member. The float is arranged in the sewage box, and the float is provided with a detecting member. The guide column is connected to the top wall of the sewage box, the float is sleeved outside the guide column, and the end of the guide column away from the top wall of the sewage box is provided with a limiting part for preventing the float from coming out of the guide column. The sensing member is arranged on the wall surface of the sewage box and is used for sensing the position of the detecting member.

[0035] The present disclosure provides a cleaning device, which comprises a cleaning member for wiping a surface to be cleaned and a liquid path system. The liquid path system comprises a first chamber, a second chamber and a second power device. The first chamber is provided with a liquid inlet and a liquid outlet. The liquid inlet is used for allowing liquid from a liquid source outside the first chamber to enter the first chamber. The liquid outlet is used for allowing liquid in the first chamber to be discharged to the cleaning member. The second chamber is used for containing sewage. The second chamber is provided with a communication port for allowing sewage on the cleaning member to enter the second chamber. The second chamber is separated from the first chamber and is in fluid communication with the first chamber through a through hole. The highest allowable liquid level of the second chamber is lower than the position of the through hole. The second power device is connected to the first chamber and is used for providing driving power for driving sewage on the cleaning member to enter the second chamber and for providing driving power for discharging liquid in the first chamber to the cleaning member. When the cleaning device is in a state of cleaning the surface to be cleaned, the second power device is in an activated state to extract air in the first chamber and the second chamber so that the second chamber is in a negative pressure state, thereby driving sewage on the cleaning member to enter the second chamber. When the cleaning device is in a state of cleaning the cleaning member, the first chamber is connected to the liquid source outside the first chamber to supply liquid to the first chamber through the liquid source outside the first chamber. The second power device is in an activated state to extract liquid in the first chamber to the cleaning member.

[0036] This disclosure provides a cleaning system, including a base station and cleaning equipment. The base station is used for maintaining the cleaning equipment. The cleaning equipment includes a cleaning component and a liquid system. The cleaning component is used to mop the surface to be cleaned. The liquid system includes a first chamber, a second chamber, and a second power unit. The first chamber has an inlet and an outlet. The inlet allows liquid from an external liquid source to enter the first chamber, and the outlet allows liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain wastewater. The second chamber has a connecting port for wastewater from the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but fluidly connected through a through-hole. The maximum permissible liquid level in the second chamber is lower than the location of the through-hole. The second power unit is connected to the first chamber and is used to provide driving power to drive the wastewater from the cleaning component into the second chamber, and to provide driving power to discharge liquid from the first chamber to the cleaning component. When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, drawing air out of the first chamber and the second chamber to create a negative pressure state in the second chamber, thereby driving the wastewater on the cleaning component into the second chamber; when the cleaning equipment is in the state of cleaning the cleaning component, the first chamber is connected to an external liquid source to supply liquid to the first chamber, and the second power unit is in the start state to draw the liquid from the first chamber to the cleaning component.

[0037] This disclosure provides a cleaning system, including: a base station and cleaning equipment, wherein the base station is used for maintaining the cleaning equipment; the cleaning equipment includes a cleaning component and a liquid system, the cleaning component is used for mopping the surface to be cleaned, and the liquid system includes a clean water tank and a target object. The clean water tank is provided with an overflow outlet. When the clean water tank is supplied with liquid from an external liquid source to the clean water tank to a level exceeding the overflow outlet, the liquid in the clean water tank flows through the overflow outlet to the target object, the target object including the cleaning component and / or a wastewater tank.

[0038] In some embodiments, the cleaning device further comprises a clean water tank and a dirty water tank, the clean water tank is provided with a liquid supplementing port and an overflow port, the clean water tank is in communication with the dirty water tank through the overflow port, and the dirty water tank is used to collect the dirty water formed by the cleaning member; the base station is provided with a docking port used to communicate with the liquid supplementing port; wherein, when the docking port communicates with the liquid supplementing port, the cleaning device comprises at least a liquid supplementing state and a dirty water discharging state; when the cleaning device is in the liquid supplementing state, the liquid provided by the base station is injected into the clean water tank through the docking port and the liquid supplementing port; when the cleaning device is in the dirty water discharging state, the liquid provided by the base station is injected into the clean water tank through the docking port and the liquid supplementing port, at least part of the liquid passes through the clean water tank and enters the dirty water tank through the overflow port to provide a positive pressure for the dirty water tank, so that the dirty water in the dirty water tank is discharged to the outside of the dirty water tank.

[0039] In some embodiments, the base station is provided with a liquid supply system used to provide liquid and a gas source system used to provide gas; when the cleaning device is in the liquid supplementing state, the liquid provided by the liquid supply system is injected into the clean water tank through the docking port and the liquid supplementing port; when the cleaning device is in the dirty water discharging state, the liquid and / or the gas provided by the gas source system and / or the liquid supply system is injected into the clean water tank through the docking port and the liquid supplementing port, at least part of the liquid and / or the gas passes through the clean water tank and enters the dirty water tank through the overflow port, so that the dirty water in the dirty water tank is discharged to the outside of the dirty water tank.

[0040] In some embodiments, the docking port is one, and the gas source system and the liquid supply system are both in communication with the same docking port and both communicate with the same liquid supplementing port through the same docking port.

[0041] In some embodiments, the cleaning device is provided with a dirty water discharging channel, the dirty water discharging channel is used to discharge the dirty water in the dirty water tank to the outside of the dirty water tank; the dirty water discharging channel is provided with a control structure used to control the conduction and interruption of the dirty water discharging channel, and the control structure makes the dirty water discharging channel conductive when the cleaning device is in the dirty water discharging state.

[0042] In some embodiments, the sewage box is connected with a second power device and a filter, the second power device is in an open state and provides negative pressure in the sewage box to provide power for sucking the sewage on the cleaning element into the sewage box when the cleaning device is in a state of cleaning a surface to be cleaned, and the filter is used to block solid waste in the sewage box from entering the second power device; when the docking interface is connected to the liquid supplementing port, the cleaning device further comprises a state of flushing the sewage box, and liquid provided by the liquid supply system is injected into the sewage box through the docking interface and the liquid supplementing port, and gas provided by the gas source system is injected into the sewage box through the docking interface and the liquid supplementing port, and the liquid and the gas together form a bubble liquid to flush the filter in the sewage box.

[0043] In some embodiments, the gas source system comprises a gas pumping device and a control device. The gas pumping device is used to provide a gas source. The control device is connected to the gas pumping device through a gas conveying pipe, connected to the docking interface through a fourth pipe assembly, and used to control the on-off between the gas conveying pipe and the fourth pipe assembly. When the cleaning device is in a sewage discharging state, the control device controls the gas conveying pipe and the fourth pipe assembly to be in a conduction state, and the gas pumping device supplies gas to the sewage box through the gas conveying pipe, the control device, the fourth pipe assembly, the docking interface and the liquid supplementing port.

[0044] In some embodiments, the base station further comprises a sewage tank for storing liquid, and a liquid containing area outside the sewage tank is connected through a liquid pumping pipe to pump liquid and / or a liquid discharging pipe outside the base station to discharge liquid, the liquid pumping pipe passes through the control device, and the control device is further used to control the on-off of the liquid pumping pipe, and after the cleaning device returns to the base station, the sewage discharged from the sewage box enters the liquid containing area outside the sewage tank, and the control device is further connected to the sewage tank through a second pipe assembly and used to control the on-off between the gas conveying pipe and the second pipe assembly; when the cleaning device is in a sewage discharging state, the control device controls the base station to be in a sewage pumping state, and when the base station is in the sewage pumping state, the control device controls the liquid pumping pipe to be in a conduction state, and the gas conveying pipe and the second pipe assembly to be in a conduction state, and the liquid pumping pipe, the sewage tank, the second pipe assembly, the control device and the gas pumping device jointly form a liquid pumping path, and the gas pumping device provides negative pressure to the liquid pumping path to make the liquid in the liquid containing area be pumped into the sewage tank through the liquid pumping pipe.

[0045] In some embodiments, the liquid supply system comprises a clean water channel, which is in communication with the docking interface and an internal clean water tank of the base station and / or an external liquid source of the base station, for delivering clean water. The gas supply system comprises an exhaust channel and a multi-way connector. The exhaust channel is in communication with a gas pumping device of the gas supply system, and is used for discharging gas of the gas pumping device to the outside of the base station. The multi-way connector comprises an output interface and at least two input interfaces, the output interface is in communication with the docking interface, and the outlet of the clean water channel and the outlet of the exhaust channel are respectively in communication with different input interfaces.

[0046] In some embodiments, the liquid supply system further comprises a treatment liquid container, a treatment liquid channel, the multi-way connector and an adjusting device. The treatment liquid container is used for storing treatment liquid. The treatment liquid channel is in communication with the treatment liquid container and another input interface of the multi-way connector. The multi-way connector comprises a fluid buffer chamber, and fluids input from different input interfaces of the multi-way connector can be mixed in the fluid buffer chamber and then output through the output interface. The adjusting device is arranged on the clean water channel and / or the treatment liquid channel, and is used for adjusting properties of liquid entering the docking interface, so that the properties of liquid output from the docking interface to the clean water tank are preset properties, wherein the properties of the liquid include at least one of the following: temperature of the liquid, concentration of the liquid, and composition of the liquid.

[0047] In some embodiments, the cleaning device further comprises a recovery member, which comprises a dirt scraping portion and a dirt containing cavity, the dirt scraping portion is used for abutting against the cleaning member to scrape dirt on the cleaning member into the dirt containing cavity; the sewage tank is provided with a liquid inlet and a communication port. The liquid inlet is in communication with the overflow port. The communication port is in communication with the dirt containing cavity, and the setting height of the liquid inlet is higher than that of the communication port. When the cleaning device is in a dirt discharging state, the fluid provided by the base station is injected into the clean water tank through the docking interface and the liquid supplementing port, at least part of the fluid passes through the clean water tank and enters the sewage tank through the overflow port, so that the sewage in the sewage tank flows out from the communication port into the dirt containing cavity.

[0048] In some embodiments, the base station further comprises a base, a sewage tank and a gas supply system. The base is configured to receive sewage discharged from the sewage receiving cavity. The sewage tank is configured to store liquid and is connected to the base via a liquid suction pipe to draw liquid in and / or connected to the outside via a liquid discharge pipe to discharge liquid. The gas supply system comprises a gas supply device and a control device. The gas supply device is configured to provide a gas source. The control device is connected to the gas supply device via a gas supply pipe, connected to the sewage tank via a second pipe assembly, and configured to control the opening and closing of the gas supply pipe and the second pipe assembly. The liquid suction pipe passes through the control device, and the control device is configured to control the opening and closing of the liquid suction pipe. The liquid suction pipe, the sewage tank, the second pipe assembly, the control device and the gas supply device together form a liquid suction path.

[0049] The present disclosure provides a base station comprising a gas supply system, the gas supply system comprising a gas supply device, a sewage tank, a valve assembly and a control device. The gas supply device is configured to provide a gas source. The sewage tank is configured to store liquid and is connected to an external liquid source via a liquid suction pipe to draw liquid in and connected to the outside via a liquid discharge pipe to discharge liquid. The valve assembly is arranged between a flow outlet of the sewage tank and a discharge outlet of the liquid discharge pipe, and is configured to control the opening and closing of the flow outlet and the discharge outlet by opening or closing the valve assembly. The control device is connected to the gas supply device via a gas supply pipe, connected to the valve assembly via a first pipe assembly, and the liquid suction pipe passes through the control device. The control device is configured to control the opening and closing of the liquid suction pipe and the opening and closing of the gas supply pipe and the first pipe assembly. In a pre-liquid suction state of the control device, the control device controls the opening of the gas supply pipe and the first pipe assembly, and the gas supply device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipe assembly, so that the valve assembly is closed to disconnect the flow outlet and the discharge outlet. In a pre-liquid discharge state of the control device, the control device controls the opening of the gas supply pipe and the first pipe assembly, and the gas supply device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipe assembly, so that the valve assembly is opened to connect the flow outlet and the discharge outlet.

[0050] In some embodiments, the control device is further in communication with the sewage tank through a second pipeline assembly and is configured to control the connection or disconnection between the gas delivery pipe and the second pipeline assembly; wherein, when the control device is in the formal liquid pumping state, the control device controls the connection of the liquid pumping pipe and the connection of the gas delivery pipe and the second pipeline assembly, the liquid pumping pipe, the sewage tank, the second pipeline assembly, the control device, the gas delivery pipe and the gas pumping device together form a liquid pumping path, the gas pumping device provides the negative pressure gas to the liquid pumping path to make the sewage tank pump in liquid through the liquid pumping pipe; when the control device is in the formal liquid discharging state, the control device controls the connection of the gas delivery pipe and the second pipeline assembly, the gas pumping device, the gas delivery pipe, the control device, the second pipeline assembly, the sewage tank, the valve assembly and the liquid discharging pipe together form a liquid discharging path, the gas pumping device provides the positive pressure gas to the liquid discharging path to make the sewage tank discharge liquid to the outside through the liquid discharging pipe;

[0051] In some embodiments, the control device is further in communication with the atmosphere through a third pipeline assembly and is configured to control the connection or disconnection between the gas delivery pipe and the third pipeline assembly; wherein, when the control device is in the formal liquid discharging state, the control device controls the connection of the gas delivery pipe and the third pipeline assembly, the third pipeline assembly, the control device, the gas delivery pipe and the gas pumping device together form a balance path, the gas pumping device provides the negative pressure gas to the balance path to suck external gas;

[0052] In some embodiments, the control device is further in communication with the clean water box of the cleaning device through a fourth pipeline assembly and is configured to control the connection or disconnection between the gas delivery pipe and the fourth pipeline assembly; wherein, when the control device is in the formal liquid pumping state, the control device controls the connection of the gas delivery pipe and the fourth pipeline assembly, the gas pumping device, the gas delivery pipe, the control device and the fourth pipeline assembly together form a gas charging path, the gas pumping device provides the positive pressure gas to the gas charging path to deliver to the clean water box.

[0053] In some embodiments, after the control device switches from the pre-pumping state to the formal pumping state or switches from the pre-draining state to the formal draining state, the control device controls the gas delivery pipe to be disconnected from the first pipe assembly; when the control device is in the zero position state, the control device controls the pumping pipe to be turned on and controls the gas delivery pipe, the first pipe assembly, the second pipe assembly, the third pipe assembly and the fourth pipe assembly to be turned on; in response to a pumping instruction, the gas pumping device works, the control device switches from the zero position state to the pre-pumping state and then switches from the pre-pumping state to the formal pumping state; when the liquid level in the sewage tank reaches a preset liquid level, the gas pumping device stops working, and the control device switches from the formal pumping state to the zero position state; or, in response to a draining instruction, the gas pumping device works, the control device switches from the zero position state to the pre-draining state and then switches from the pre-draining state to the formal draining state; after the gas pumping device works for a preset time length, the gas pumping device stops working, and the control device switches from the formal draining state to the zero position state.

[0054] In some embodiments, the control device comprises a body, a gas transmission pipe, a gas path pipe and a control switch assembly. The gas transmission pipe is in communication with the gas pumping device through the gas delivery pipe, the gas path pipe is in communication with the gas delivery pipe through the gas transmission pipe, the gas path pipe comprises a valve closing gas path, a valve opening gas path, a liquid pumping gas path, a liquid discharging gas path, a balance gas path and a gas charging gas path, the valve closing gas path and the valve opening gas path are in communication with the valve assembly through the first pipe assembly, the liquid pumping gas path and the liquid discharging gas path are in communication with the sewage tank through the second pipe assembly, the balance gas path is in communication with the external atmosphere through the third pipe assembly, and the gas charging gas path is in communication with the clean water box of the cleaning equipment through the fourth pipe assembly. The control switch assembly controls the opening or closing of the valve assembly by controlling the opening or closing of the valve closing gas path and the valve opening gas path, controls the pumping or discharging of the liquid by the sewage tank by controlling the opening or closing of the liquid pumping gas path, the liquid discharging gas path, the liquid pumping pipe and the balance gas path, and controls the input or non-input of the positive pressure gas into the clean water box by controlling the opening or closing of the gas charging gas path. When the sewage tank pumps in liquid, the control device is in the formal liquid pumping state, the valve assembly is closed to disconnect the flow outlet and the discharge outlet, the control switch assembly closes the valve closing gas path, the valve opening gas path, the liquid discharging gas path and the balance gas path, and opens the liquid pumping gas path, the gas charging gas path and the liquid pumping pipe, the gas pumping device works, and the gas in the sewage tank is pumped out through the gas delivery pipe, the gas transmission pipe and the liquid pumping gas path, so that the liquid of the external liquid source enters the sewage tank under the action of negative pressure. When the sewage tank discharges liquid, the control device is in the formal liquid discharging state, the valve assembly is opened to connect the flow outlet and the discharge outlet, the control switch assembly closes the liquid pumping gas path, the gas charging gas path and the liquid pumping pipe, and opens the liquid discharging gas path and the balance gas path, the gas pumping device works, and the gas is delivered into the sewage tank through the gas delivery pipe, the gas transmission pipe and the liquid discharging gas path, so that the liquid in the sewage tank is discharged to the outside of the gas source system under the action of positive pressure.

[0055] The present disclosure provides a cleaning system including a cleaning device and a base station, the cleaning device being movable into the base station for maintenance. The base station includes a base station body and a gas supply system disposed on the base station body, the gas supply system including a gas pumping device, a sewage tank, a valve assembly and a control device. The gas pumping device is configured to provide a gas source. The sewage tank is configured to store liquid and to communicate with an external liquid source through a liquid pumping pipe to pump in liquid and to communicate with an external through a liquid discharging pipe to discharge liquid. The valve assembly is disposed between a flow outlet of the sewage tank and a discharge outlet of the liquid discharging pipe, and is configured to be opened or closed to correspondingly control the connection or disconnection between the flow outlet and the discharge outlet. The control device is configured to communicate with the gas pumping device through a gas conveying pipe, to communicate with the valve assembly through a first pipe assembly, and the liquid pumping pipe passes through the control device, and the control device is configured to control the connection or disconnection of the liquid pumping pipe and the connection or disconnection between the gas conveying pipe and the first pipe assembly. When the control device is in a pre-liquid pumping state, the control device controls the connection between the gas conveying pipe and the first pipe assembly, and the gas pumping device provides positive pressure gas to the valve assembly through the gas conveying pipe, the control device and the first pipe assembly, so that the valve assembly is closed to disconnect the flow outlet and the discharge outlet. When the control device is in a pre-liquid discharging state, the control device controls the connection between the gas conveying pipe and the first pipe assembly, and the gas pumping device provides negative pressure gas to the valve assembly through the gas conveying pipe, the control device and the first pipe assembly, so that the valve assembly is opened to connect the flow outlet and the discharge outlet.

[0056] In the cleaning device, the base station and the cleaning system provided by the present disclosure, if the liquid overflowing from the overflow outlet supplies the cleaning element, the cleaning device can be in the operation of cleaning the cleaning element, that is, the liquid supplementing operation can be performed in the operation of cleaning the cleaning element, so that the control logic of the cleaning device is simple. On the other hand, if the liquid overflowing from the overflow outlet supplies the sewage box, the cleaning device can be in the operation of cleaning the sewage box, that is, the liquid supplementing operation can be performed in the operation of cleaning the sewage box, so that the control logic of the cleaning device is also simple.

[0057] Additional aspects and advantages of the present disclosure will be made apparent from the following description, which, taken in conjunction with the accompanying drawings, that will be part hereof. BRIEF DESCRIPTION OF DRAWINGS

[0058] The above and / or additional aspects and advantages of the present disclosure will become apparent and be readily appreciated from the following description, taken in conjunction with the accompanying drawings, in which:

[0059] Figure 1 is a schematic perspective view of a cleaning system according to some embodiments of the present disclosure;

[0060] Figure 2a yes Figure 1 The diagram shows a structural schematic of the cleaning equipment in the cleaning system cleaning the surface to be cleaned.

[0061] Figure 2b yes Figure 1 A schematic diagram of one embodiment of the cleaning system shown;

[0062] Figure 2c yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0063] Figure 2d yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0064] Figure 2e yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0065] Figure 2f yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0066] Figure 3a yes Figure 1 The diagram shows a simplified state of the liquid circuit system of the cleaning equipment in the cleaning system when suctioning dirt from the surface to be cleaned.

[0067] Figure 3b yes Figure 1 The diagram shows a simplified state of the fluid system in the cleaning system when the cleaning equipment is cleaning the cleaning components.

[0068] Figure 3c yes Figure 1 The diagram shows a simplified state of the liquid circuit system of the cleaning equipment in the cleaning system when cleaning the wastewater box.

[0069] Figure 3d yes Figure 1 The diagram shows a simplified state of the liquid circuit system during the cleaning of the filter elements in the cleaning system shown.

[0070] Figure 4a yes Figure 1 A schematic diagram of one embodiment of the cleaning equipment in the cleaning system shown;

[0071] Figure 4b yes Figure 1 A schematic diagram of another embodiment of the cleaning equipment in the cleaning system shown;

[0072] Figure 4c yes Figure 1 A schematic diagram of one embodiment of the cleaning system shown;

[0073] Figure 4d yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0074] Figure 4e yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0075] Figure 5a yes Figure 1 A schematic diagram of one embodiment of the cleaning system shown;

[0076] Figure 5b yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0077] Figure 5c yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0078] Figure 5d yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0079] Figure 6a yes Figure 1 A schematic diagram of one embodiment of the cleaning system shown;

[0080] Figure 6b yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0081] Figure 6c This is a schematic diagram of a base station in a pre-liquid extraction state in a cleaning system according to certain embodiments of this disclosure;

[0082] Figure 6d This is a schematic diagram of a base station in the formal liquid extraction state in a cleaning system according to certain embodiments of this disclosure;

[0083] Figure 6e This is a schematic diagram of a base station in a pre-drainage state in a cleaning system according to certain embodiments of this disclosure;

[0084] Figure 6f This is a schematic diagram of a base station in a formally draining state in a cleaning system according to certain embodiments of this disclosure;

[0085] Figure 7 yes Figure 1 A schematic diagram of the planar structure of the cleaning equipment in the cleaning system shown;

[0086] Figure 8 yes Figure 7Partial exploded view of the cleaning device;

[0087] Figure 9 is Figure 7 Partial assembled view of a part of the structure of the liquid system in the cleaning device from one perspective;

[0088] Figure 10 is Figure 7 Partial assembled view of a part of the structure of the liquid system in the cleaning device from another perspective;

[0089] Figure 11 is Figure 8 Assembled view of the cleaning module in the cleaning device from one perspective;

[0090] Figure 12 is Figure 11 Partial exploded view of the cleaning module;

[0091] Figure 13 is Figure 11 Further partial exploded view of the cleaning module;

[0092] Figure 14 is Figure 11 Assembled view of the cleaning module in the cleaning device in a state of cleaning a surface to be cleaned;

[0093] Figure 15 is Figure 11 Sectional view of the cleaning module in the cleaning device from one perspective, the sectional view showing the water bar flow channel;

[0094] Figure 16 is Figure 15 Enlarged view of the place XVI of the cleaning module;

[0095] Figure 17 is View of the housing of the cleaning module from one perspective;

[0096] Figure 18 Figure 17 is Enlarged view of the place XVIII in the cleaning module;

[0097] Figure 19 Figure 11 is Sectional view of the cleaning module from one perspective;

[0098] Figure 20 Figure 11 is Sectional view of the cleaning module from another perspective;

[0099] Figure 21 Figure 20 is Enlarged view of the place XXI in the cleaning module;

[0100] Figure 22 is a perspective view of the sewage box and the first power device in the cleaning module shown in Figure 12

[0101] Figure 23 is a perspective exploded view of the sewage box and the first power device in the cleaning module shown in Figure 22

[0102] Figure 24 is a perspective view of the sewage box in the cleaning module shown in Figure 22

[0103] Figure 25 is a perspective view of the cover of the sewage box shown in Figure 23

[0104] Figure 26 is a working scene diagram of the cleaning system provided by the embodiments of the present disclosure;

[0105] Figure 27 is a diagram showing the state of the cleaning device communicating with an external liquid source to replenish liquid provided by the embodiments of the present disclosure;

[0106] Figure 28 is a partial perspective view of the cleaning system according to some embodiments of the present disclosure;

[0107] Figure 29 is a perspective view of the base of the base station in the cleaning system shown in Figure 28

[0108] is a perspective view of part of the structure of the base station in the cleaning system from one viewing angle shown in Figure 30 Figure 28 is a perspective view of part of the structure of the base station in the cleaning system from another viewing angle shown in

[0109] Figure 31 Figure 28 is a perspective view of part of the structure of the base station in the cleaning system from still another viewing angle shown in

[0110] Figure 32 is a plan view of part of the structure of the base station in the cleaning system shown in Figure 28

[0111] Figure 33 is a plan view of part of the structure of the base station in the cleaning system shown in Figure 32

[0112] Figure 34 is a perspective view of the control device in the base station shown in Figure 31

[0113] Figure 35 Figure 34 ​​​​​​​​​​Partial perspective view of the control device from one viewing angle;

[0114] Figure 36 is Figure 34 Partial perspective view of the control device from another viewing angle;

[0115] Figure 37 is Figure 31 Plan view of the drain pipe in the base station;

[0116] Figure 38 is Figure 37 Cross-sectional view of the drain pipe.

[0117] Explanation of main component symbols:

[0118] Cleaning system 1000;

[0119] Cleaning device 100; body 10; liquid path system 30; cleaning module 20; housing 21; cleaning element 22; front roller 221; rear roller 222; mop 223; clean water box 23; liquid supplement port 231; liquid outlet port 233; overflow port 235; first passage 31; first inlet port 311; first outlet port 313; first section of pipe 315; second section of pipe 317; first power device 32; second passage 33; second inlet port 331; second outlet port 333; connecting pipe 334; third section of pipe 335; fourth section of pipe 337; dirty water box 24; liquid inlet port 241; liquid outlet port 242; communication port 243; box body 248; cover body 249; sealing structure 2480; first sealing structure 2481; second sealing structure 2483; fluid outlet 2485; fluid inlet 2487; first chamber 244; first sub-chamber 2441; second sub-chamber 2443; second chamber 245; third chamber 246; third chamber inlet port 2461; third chamber outlet port 2463; filter element 247; recovery element 251; dirt scraping portion 2512; dirt containing chamber 25115; first dirty water outlet 25116; second dirty water outlet 25117; control structure 25183; communication pipe 255; water jet 26; outlet end 260; water jet port 261; control valve 27; dirty detection sensor 28; second power device 34; stirring device 35; driving device 36; anti-backflow device 37; water fullness detection device 38; guide column 381; limiting portion 3811; floating element 383; detection element 3831; sensing element 385; width direction of the cleaning device, body width direction, rotation axis direction, length direction of the dirt containing chamber X; advancing direction of the cleaning device Y; forward advancing direction of the cleaning device Y1; body height direction, height direction of the clean water box Z; device control board 50; through hole O; driving wheel 101; universal wheel 102; support wheel 103; injection joint 104; injection inlet port 1041; blind hole 1043; one-way self-locking valve 105;

[0120] Base station 200; water outlet 201: base station body 60; base 61; docking interface 63; top 64; side wall 65; opening 67; cleaning tank 610; liquid containing area 611; liquid supply system 70; clean water channel 71; clean water tank 711; external liquid source 713 of base station; inlet 715 of clean water channel; outlet 717 of clean water channel; multi-way connector 72; input interface 721; output interface 723; fluid buffer cavity 725; treatment liquid container 73; first treatment liquid container 731; second treatment liquid container 733; treatment liquid channel 74; first treatment liquid channel 741; first port 7411; second port 7413; second treatment liquid channel 743; adjusting device 75; first power unit 751; electrolysis module 752; heating module 753; second power unit 754; first one-way valve 755; second one-way valve 756; first conduction detector 757; second conduction detector 758; gas source system 80; sewage tank 81; liquid suction port 811; flow port 813; flow outlet 815; gas suction device 82; first gas source port 821; second gas source port 823; control device 83; body 830; inner cavity 8300; first mounting hole 8301; second mounting hole 8302; third mounting hole 8303; fourth mounting hole 8304; fifth mounting hole 8305; sixth mounting hole 8306; seventh mounting hole 8307; base 8308; upper cover 8309; first side wall 8310; second side wall 8312; third side wall 8314; fourth side wall 8315; air transmission pipe 831; first four-way pipe 8311; second four-way pipe 8313; gas path pipe 833; valve-closing gas path 8331; valve-opening gas path 8332; liquid suction gas path 8333; liquid discharge gas path 8334; balance gas path 8335; gas inflation gas path 8336; control switch assembly 835; pressure applying piece 8351; drive module 8353; drive motor 83531; speed reduction structure 83530; worm 83532; worm wheel 83533; first gear wheel 83534; second gear wheel 83535; third gear wheel 83536; rotating shaft 8355; first side 83551; second side 83553; avoidance space 8350; position detector 8357; air transmission pipe 84; first air transmission pipe 841; second air transmission pipe 843; liquid suction pipe 85; first opening 851; second opening 853; liquid discharge pipe 86; discharge inlet 861; discharge outlet 863; pipe assembly 87; first pipe assembly 871; first pipe 8711; first three-way pipe 8713; first flow-through port 87131; second flow-through port 87133; third flow-through port 87135; second pipe assembly 873; second pipe 8731; second three-way pipe 8733; first communication port 87331; second communication port 87333; third communication port 87335; third pipe assembly 875; third pipe 8751; first two-way pipe 8753; fourth pipe assembly 877; fourth pipe 8771; second two-way pipe 8773; valve assembly 88; support 881;Cavity 8811; vent 8813; regulating chamber 880; valve body 883; inner space 8830; base station control board 90. DETAILED DESCRIPTION

[0121] In order to make the above objectives, features and advantages of the present disclosure more clear and easy to understand, the specific embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present disclosure. However, the present disclosure can be practiced in many different ways from those described herein without departing from the scope of the present disclosure, and skilled in the art can make similar improvements without departing from the scope of the present disclosure, so the present disclosure is not limited to the specific embodiments disclosed below.

[0122] In the description of the present disclosure, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present disclosure.

[0123] In addition, the terms "first", "second", "third" and the like are used only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", "third" can explicitly or implicitly include at least one of the features. In the description of the present disclosure, the meaning of "plurality" is at least two, for example, two, three, etc., unless otherwise explicitly specified and limited.

[0124] In the present disclosure, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connection", "fixing" and the like should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise explicitly limited. For those skilled in the art, the specific meaning of the above terms in the present disclosure can be understood according to the specific circumstances.

[0125] In the present disclosure, unless specifically stated and limited otherwise, a first feature "on" or "under" a second feature can be directly in contact with the second feature, or indirectly in contact with the second feature through an intermediate medium. Moreover, the first feature "over", "above" and "on top of" the second feature can be directly above or diagonally above the second feature, or simply means that the first feature is higher in horizontal level than the second feature. The first feature "under", "below" and "underneath" the second feature can be directly below or diagonally below the second feature, or simply means that the first feature is lower in horizontal level than the second feature.

[0126] It is noted that when an element is referred to as being "on" or "set on" another element, it can be directly on the other element or there can be an intervening element. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or there can be an intervening element. The terms "vertical", "horizontal", "upper", "lower", "left", "right", and similar expressions used herein are used for explanation only and are not intended to be limiting.

[0127] In the first aspect, the current cleaning device, the liquid supply to the cleaning element and the liquid supply to the sewage box are a separate execution action, which is not associated with other execution actions of the cleaning device, such as liquid replenishment operation, resulting in more complicated overall control logic of the cleaning device. In order to solve this problem, please refer to Figure 1 and Figure 2aThe present disclosure provides a cleaning device 100, which comprises a cleaning member 22 and a liquid path system 30. The cleaning member 22 is used to wipe a surface to be cleaned. The liquid path system 30 comprises a clean water tank 23 and a target object. The clean water tank 23 is provided with an overflow outlet 235. When the clean water tank 23 is supplied with liquid from an external liquid source to exceed the overflow outlet 235, the liquid in the clean water tank 23 flows to the target object through the overflow outlet 235. The target object comprises the cleaning member 22 and / or a dirty water tank 24. Thus, when the clean water tank 23 is replenished with liquid, if the clean water tank 23 is supplied with liquid from the external liquid source to exceed the overflow outlet 235, the liquid in the clean water tank 23 supplies the cleaning member 22 and / or the dirty water tank 24 with liquid. On the one hand, if the liquid overflowing from the overflow outlet 235 supplies the cleaning member 22 with liquid, the cleaning device 100 can be in the operation of cleaning the cleaning member 22, that is, the replenishment operation can be performed in combination with the operation of cleaning the cleaning member 22, thereby simplifying the control logic of the cleaning device 100. On the other hand, if the liquid overflowing from the overflow outlet 235 supplies the dirty water tank 24 with liquid, the cleaning device 100 can be in the operation of cleaning the dirty water tank 24, that is, the replenishment operation can be performed in combination with the operation of cleaning the dirty water tank 24, thereby also simplifying the control logic of the cleaning device 100. It should be noted that “exceeding the overflow outlet 235” means that when the liquid level in the clean water tank 23 reaches the lowest position of the overflow outlet 235, and liquid is replenished into the clean water tank 23, it is considered that the liquid exceeds the overflow outlet 235, and at this time, the liquid in the clean water tank 23 can overflow from the overflow outlet 235 to the outside of the clean water tank 23. The liquid level in the clean water tank 23 is higher than the lowest position of the overflow outlet 235, which is also considered to exceed the overflow outlet 235.

[0128] In the second aspect, since the cleaning device needs a small amount of liquid when wiping the surface to be cleaned and needs a large amount of liquid when cleaning the cleaning member, in the related art, a flow-adjustable power device is arranged in the liquid path system 30 to adjust the flow output to the cleaning member to meet the different state requirements of the cleaning member wiping the surface to be cleaned and the cleaning member self-cleaning. However, the flow-adjustable power device has a high cost. In order to solve this problem, the present disclosure provides a liquid path system 30 (as shown in any one of Figure 2a 、 Figure 2b or Figure 2c or Figure 2d or Figure 2e in the present disclosure), a cleaning device 100 (as shown in any one of Figure 7 or Figure 8 in the present disclosure), a base station 200 (as shown in any one of Figure 1 in the present disclosure), and a cleaning system 1000 (as shown in any one of Figure 1 in the present disclosure).

[0129] Please refer to Figure 1 The cleaning system 1000 of the present disclosure comprises the cleaning device 100 of any one of the embodiments and the base station 200 of any one of the embodiments.

[0130] Cleaning device 100 is a device used to clean a surface to be cleaned. For example, cleaning device 100 may include a mopping robot and a sweeping and mopping robot. A mopping robot can be used to wipe and clean the surface to be cleaned, while a sweeping and mopping robot integrates the functions of both types of robots; that is, the sweeping and mopping robot can be used to sweep the surface to be cleaned, and it can also be used to wipe and clean the surface to be cleaned. The cleaning device 100 disclosed herein is described using a sweeping and mopping robot as an example. The surface to be cleaned may be, but is not limited to, a floor, marble surface, carpet, or glass surface. This disclosure uses a floor as an example of a surface to be cleaned.

[0131] Base station 200 is a device used for maintenance and upkeep of cleaning equipment 100. For example, base station 200 can clean cleaning equipment 100 and charge it. Furthermore, base station 200 may also have at least one of the following functions: replenishing water to cleaning equipment 100, draining water, and collecting dust. For example, when the power of cleaning equipment 100 is insufficient, it returns to base station 200 to recharge. When cleaning equipment 100 is fully charged, it can leave base station 200 and continue cleaning the surface to be cleaned. When cleaning equipment 100 needs to drain (dirt), it returns to base station 200 to discharge the wastewater, and then leaves base station 200 to continue cleaning the surface to be cleaned.

[0132] The following will be combined with the appendix Figure 1 , Figure 2a to Figure 2f , Figure 3a , Figure 3b , Figure 7 to Figure 26 The cleaning equipment 100 and the base station 200 in the first aspect of the cleaning system 1000 will be described in detail.

[0133] Please see Figure 2a to Figure 2f , Figure 8 and Figure 11 The cleaning equipment 100 includes a body 10 and cleaning components 22. Figure 11 The liquid circuit system 30 is shown in any of the following embodiments. The cleaning component 22 is provided on the body 10. The liquid circuit system 30 is also provided on the body 10.

[0134] The body 10 is a component on the cleaning equipment 100 used to house other components besides the body 10. Components other than the body 10 in this document include, but are not limited to, the cleaning module 20 and the fluid system 30.

[0135] The cleaning device 100 comprises a cleaning module 20, which is a module on the cleaning device 100 that participates in cleaning the surface to be cleaned by providing mopping force. The cleaning module 20 comprises a housing 21 and a cleaning piece 22. The housing 21 is a component for loading elements (e.g., the cleaning piece 22) in the cleaning module 20 other than the housing 21. The cleaning piece 22 is a component in the cleaning module 20 that specifically provides mopping force to clean the surface to be cleaned. The cleaning piece 22 is arranged on the machine body 10 specifically in that the housing 21 is mounted on the machine body 10 in a detachable or non-detachable manner, and the cleaning piece 22 is mounted on the housing 21 in a detachable or non-detachable manner, so that the cleaning piece 22 is indirectly arranged on the machine body 10. For example, the housing 21 can be connected to the machine body 10 in a movable manner, e.g., the housing 21 can be lifted along the height direction Z relative to the machine body 10, and the housing 21 can be moved along the machine body width direction X relative to the machine body 10, so that the cleaning module 20 can be lifted along the height direction Z relative to the machine body 10 and moved along the machine body width direction X relative to the machine body 10.

[0136] In some embodiments, the cleaning piece 22 is a track-type cleaning piece, and the cleaning device 100 is a track-type cleaning device. In other embodiments, the cleaning piece 22 is a roller-type cleaning piece, and the cleaning device 100 is a roller-type cleaning device. In yet other embodiments, the cleaning piece 22 can be a flat mop-type cleaning piece or a rotating disc-type cleaning piece, and the cleaning device 100 is a flat mop-type cleaning device or a rotating disc-type cleaning device. Regardless of the type of the cleaning piece 22, the cleaning piece 22 is in contact with the surface to be cleaned when the cleaning module 20 cleans the surface to be cleaned. For the rotating disc-type cleaning piece, the track-type cleaning piece, or the roller-type cleaning piece, when it cleans the surface to be cleaned, it rotates relative to the surface to be cleaned. During the rotation of the cleaning piece 22, the cleaning piece 22 can roll or wipe away dirt on the surface to be cleaned, so that the surface to be cleaned remains clean. The dirt can include liquid dirt and solid dirt. The cleaning piece 22 provided by the embodiments of the present disclosure can be any of the above, as long as it can be supplied with liquid by the liquid path system 30 on the cleaning device 100. In addition, the cleaning piece 22 specifically includes but is not limited to a disposable electrostatic mop, a disposable wet mop, or a reusable fabric mop, etc.

[0137] The cleaning member 22 of the cleaning device according to the embodiments of the present disclosure is only partially in contact with the surface to be cleaned at any time when cleaning the surface to be cleaned. In some embodiments, the rotating axis of the cleaning member 22 can be parallel to the surface to be cleaned. For example, the cleaning member 22 in the form of a track or a roller can be rotated to clean the surface to be cleaned. Compared with a cleaning device using a conventional disc or flat mop, the cleaning member of the cleaning device in the form of a disc or flat mop is cleaned by supplying water to the disc or flat mop when the cleaning device returns to the base station 200. However, this design makes the cleaning member of the cleaning device in the form of a disc or flat mop more and more dirty when cleaning the surface to be cleaned, and the cleaning device needs to return to the base station 200 frequently to clean the cleaning member, which affects the cleaning effect and efficiency of the cleaning device 100. However, since the cleaning member in the form of a track or a roller is rolled on the surface to be cleaned, the cleaning device 100 is provided with a dirt scraping part 2512 abutting against the cleaning member in the form of a track or a roller, which can scrape the dirt on the cleaning member in the form of a track or a roller into the cleaning device 100 for collection, and the cleaning member 22 can remain relatively clean. Therefore, the cleaning effect of the cleaning device in the form of a track or a roller on the surface to be cleaned is better. Of course, in some other embodiments, the rotating axis of the cleaning member 22 can be non-parallel to the surface to be cleaned. Figure 13

[0138] The liquid path system 30 is a system on the cleaning device 100 that provides liquid to participate in cleaning the surface to be cleaned. In some embodiments of the present disclosure, the liquid path system 30 can provide liquid to the cleaning member 22 to wet the cleaning member 22 when the cleaning member 22 wipes the surface to be cleaned, so that the cleaning member 22 can maintain good wiping ability. In some other embodiments of the present disclosure, in addition to providing liquid to the cleaning member 22 to clean the surface to be cleaned, the liquid path system 30 can also recover the sewage formed by the cleaning member 22 when wiping the surface to be cleaned, so as to realize the self-cleaning function of the cleaning member 22. In some other embodiments of the present disclosure, in addition to providing liquid to clean the surface to be cleaned and recovering the sewage formed by the cleaning member 22 when wiping the surface to be cleaned to realize the self-cleaning function of the cleaning member 22, the liquid path system 30 can also provide liquid to clean the cleaning member 22 when the cleaning device 100 reaches a preset position, which includes but is not limited to the base station 200 or an area with a drainage system, such as a bathroom. It should be noted that the liquid path system 30 and the cleaning module 20 are both structures on the cleaning device 100 that participate in cleaning the surface to be cleaned, and the elements included in the two structures can be completely overlapped or at least partially overlapped.

[0139] Specifically, please refer to Figure 2a 、 Figure 2b 、 Figure 2c to Figure 2e 、 Figure 8 to Figure 10 ​In some embodiments, the liquid path system 30 comprises a clean water tank 23, a first passage 31, a first power device 32, and a second passage 33.

[0140] The clean water tank 23 is provided with an outlet 233 and an overflow outlet 235. The outlet 233 is disposed at a lower level than the overflow outlet 235 on the clean water tank 23. For example, the outlet 233 can be disposed on a side wall of the clean water tank 23, and the overflow outlet 235 can be disposed on a top wall of the clean water tank 23. Alternatively, both the outlet 233 and the overflow outlet 235 can be disposed on a side wall of the clean water tank 23, but the outlet 233 is disposed at a lower level than the overflow outlet 235. Alternatively, the clean water tank 23 has an irregular shape, and the clean water tank 23 can comprise at least two top walls. The outlet 233 and the overflow outlet 235 can be disposed on different top walls at different levels. In summary, by disposing the outlet 233 at a lower level than the overflow outlet 235 on the clean water tank 23, the liquid in the clean water tank 23 will not flow out of the overflow outlet 235 when the liquid level in the clean water tank 23 does not reach the level of the overflow outlet 235, and the liquid in the clean water tank 23 will flow out of the overflow outlet 235 when the liquid level in the clean water tank 23 exceeds the level of the overflow outlet 235.

[0141] The first passage 31 is provided with a first inlet 311 and a first outlet 313. The first inlet 311 is in communication with the outlet 233, and the first outlet 313 is used for the liquid in the clean water tank 23 to flow out of the first passage 31. The first power device 32 is used to provide driving power for the liquid in the clean water tank 23 to flow out of the first passage 31. For example, the first power device 32 can be disposed at the first passage 31 or the outlet 233. The second passage 33 is provided with a second inlet 331 and a second outlet 333. The second inlet 331 is in communication with the overflow outlet 235, and the second outlet 333 is used for the liquid in the clean water tank 23 to flow out of the second passage 33. When the cleaning device 100 is in a state of wiping the surface to be cleaned, the first power device 32 drives the liquid in the clean water tank 23 to flow into the first passage 31 from the outlet 233, and then to flow out of the first outlet 313 to supply the cleaning member 22 with liquid. When the cleaning device 100 is in a state of cleaning the cleaning member 22, the clean water tank 23 is supplied with liquid from an external liquid source. When the liquid level in the clean water tank 23 exceeds the level of the overflow outlet 235, the liquid in the clean water tank 23 overflows from the overflow outlet 235 to the second passage 33, and then flows out of the second outlet 333 to drain the cleaning member 22 and clean the cleaning member 22.

[0142] It should be noted that the "supplying liquid" in the embodiments of the present disclosure refers to a process of providing the cleaning member 22 with an amount of water required for normal mopping of the surface to be cleaned, and the "discharging liquid" refers to a process of using the liquid discharged from the overflow outlet 235 in the clean water box 23 to clean the cleaning member 22. For example, when the cleaning device 100 is in a state of mopping the surface to be cleaned, the liquid level in the clean water box 23 does not exceed the overflow outlet 235.

[0143] The clean water box 23 is a container for loading and / or storing liquid on the liquid path system 30 and / or the cleaning module 20. It should be noted that the naming of the clean water box 23 does not constitute a limitation on the type of liquid therein, that is, the liquid in the clean water box 23 is not limited to storing only clean water, but can store liquid used for cleaning the cleaning member 22, such as clean water, a mixture of cleaning agent and clean water (hereinafter referred to as cleaning liquid), a mixture of maintenance agent and clean water (hereinafter referred to as maintenance liquid), and the like. Moreover, "clean water" here is only a relative concept, and any water cleaner than the sewage recognized by the user is within the scope of protection. For example, the clean water can be municipal tap water, clean river, lake, sea water, etc. The clean water box 23 can be of any shape, for example, the shape of the cross section (hereinafter, the "cross section" is the plane cut by the plane perpendicular to the height direction Z of the clean water box 23) of the clean water box 23 can be regular or irregular. Here, "regular shape" includes but is not limited to rectangle, circle, ellipse, triangle, regular polygon, etc. The irregular shape is shown in Figure 9 As shown, the design of the irregular cross section can adapt to the structural layout of the cleaning device 100, and facilitate the compact arrangement of other components. In some embodiments, referring to Figure 8 to Figure 10 The clean water box 23 is provided with a liquid supplementing port 231, a liquid discharging port 233, and an overflow outlet 235. The position, height, shape, and size of the liquid supplementing port 231 can be arbitrarily set, and the present disclosure does not make any limitation. The shape and size of the liquid discharging port 233 and the overflow outlet 235 can also be arbitrarily set, and the present disclosure does not make any limitation. However, the setting height of the liquid discharging port 233 on the clean water box 23 is lower than the setting height of the overflow outlet 235 on the clean water box 23. Specifically, the clean water box 23 has a height center line (a line passing through the height center and perpendicular to the height direction Z), the liquid discharging port 233 is located below the height center line, and the overflow outlet 235 is located above the height center line. In one example, the liquid discharging port 233 is close to the bottom of the clean water box 23, and the overflow outlet 235 is close to the top of the clean water box 23.

[0144] Exemplarily, the cleaning device 100 is provided with a driving wheel 101 for driving the cleaning device 100 to move on a surface to be cleaned. With the front-rear direction Y of the movement of the cleaning device 100 as the reference, the cleaning module 20 provided by the embodiments of the present disclosure can be arranged behind the driving wheel 101 of the cleaning device 100, and the fresh water box 23 can be located behind the cleaning module 20. When the cleaning device 100 needs to enter the base station 200, the cleaning device 100 can enter the base station 200 in a backward posture. In order to adapt to the structural layout of the cleaning device 100 of the present disclosure, facilitate the docking of the fresh water box 23 and the base station 200, and realize the water replenishment of the base station 200 to the fresh water box 23, the liquid replenishment port 231 can be arranged on the side of the rear part of the fresh water box 23 facing the cleaning device 100, and the liquid outlet port 233 and the overflow port 235 can be arranged on the side of the front part of the fresh water box 23 facing the cleaning device 100. The liquid replenishment port 231 is an opening for connecting the inside of the fresh water box 23 and the external liquid source of the fresh water box 23, that is, the external liquid source can enter the inside of the fresh water box 23 through the liquid replenishment port 231. The liquid outlet port 233 and the overflow port 235 are openings for connecting the inside of the fresh water box 23 and the external pipeline, that is, the liquid in the fresh water box 23 can flow out to the external pipeline through the liquid outlet port 233 and / or the overflow port 235, and then flow to the target object through the external pipeline. In the present disclosure, the cleaning module 20 and / or the liquid path system 30 further comprise a water spraying strip 26, and the target object can be the water spraying strip 26. The water spraying strip 26 can be arranged on one side of the cleaning module 20. Exemplarily, in the embodiments of the present disclosure, the water spraying strip 26 can be arranged on the front side of the cleaning module 20 and fixed to the front side part of the shell 21 of the cleaning module 20. The water spraying strip 26 has a plurality of water spraying ports 261, and the plurality of water spraying ports 261 are arranged along the rotation axis direction X of the cleaning element 22 and face the cleaning element 22, so that the liquid sprayed from the water spraying strip 26 can flow to the cleaning element 22.

[0145] The first passage 31 is a channel for the liquid to flow, which connects the liquid outlet port 233 and the water spraying strip 26. The first passage 31 can include a first inlet 311 and a first outlet 313 located at opposite ends, respectively. The first inlet 311 is connected with the liquid outlet port 233, and the first outlet 313 is connected with the water spraying strip 26 and is used for the liquid in the first passage 31 to flow out. Specifically, in some embodiments, the first passage 31 can at least include a pipeline. In other embodiments, the first passage 31 can be a channel defined by the wall surface of the component of the cleaning device 100.

[0146] The second passage 33 is a channel for liquid flow between the overflow outlet 235 and the wick 26. The second passage 33 includes a second inlet 331 and a second outlet 333 at opposite ends, respectively. The second inlet 331 is in communication with the overflow outlet 235, and the second outlet 333 is in communication with the wick 26 and is configured to allow liquid to flow out of the second passage 33. Specifically, in some embodiments, the second passage 33 can include at least a pipe. In other embodiments, the second passage 33 can be a channel defined by a wall of the cleaning device 100.

[0147] The first power device 32 is a device configured to provide driving power for the liquid in the clean water box 23 to flow out of the first passage 31. In some embodiments, the first power device 32 includes a peristaltic pump. Generally, a peristaltic pump has a small flow rate and is suitable for occasions where precise control of the flow rate is required. In the embodiments of the present disclosure, the first power device 32 is arranged in the first passage 31 and is configured to drive the liquid in the clean water box 23 to flow out to the cleaning element 22 through the operation of the first power device 32 when the cleaning device 100 is cleaning the surface to be cleaned, so that the cleaning element 22 is wetted to better wipe the surface to be cleaned. Therefore, in this scenario, the flow rate required by the first power device 32 is small, so that the amount of liquid supplied to the cleaning element 22 can be more accurately controlled, and excessive water stains can be avoided on the surface to be cleaned when wiping the surface to be cleaned. Therefore, the peristaltic pump with a small flow rate and precise control of the flow rate is selected as the first power device 32, which can better meet the needs of the cleaning device 100 to wipe the surface to be cleaned. Of course, in other embodiments, the first power device 32 can also be a water pump with a small flow rate, and the present disclosure does not make any particular limitation.

[0148] As shown in FIG. 1, the first power device 32 is arranged in the first passage 31 and is configured to drive the liquid in the clean water box 23 to flow out to the cleaning element 22 through the operation of the first power device 32 when the cleaning device 100 is cleaning the surface to be cleaned, so that the cleaning element 22 is wetted to better wipe the surface to be cleaned. Therefore, in this scenario, the flow rate required by the first power device 32 is small, so that the amount of liquid supplied to the cleaning element 22 can be more accurately controlled, and excessive water stains can be avoided on the surface to be cleaned when wiping the surface to be cleaned. Therefore, the peristaltic pump with a small flow rate and precise control of the flow rate is selected as the first power device 32, which can better meet the needs of the cleaning device 100 to wipe the surface to be cleaned. Of course, in other embodiments, the first power device 32 can also be a water pump with a small flow rate, and the present disclosure does not make any particular limitation. Figure 2a , Figure 2b , Figure 2c to Figure 2e and Figure 8 and Figure 9 As shown in FIG. 1, the first power device 32 is arranged in the first passage 31 and is configured to drive the liquid in the clean water box 23 to flow out to the cleaning element 22 through the operation of the first power device 32 when the cleaning device 100 is cleaning the surface to be cleaned, so that the cleaning element 22 is wetted to better wipe the surface to be cleaned. Therefore, in this scenario, the flow rate required by the first power device 32 is small, so that the amount of liquid supplied to the cleaning element 22 can be more accurately controlled, and excessive water stains can be avoided on the surface to be cleaned when wiping the surface to be cleaned. Therefore, the peristaltic pump with a small flow rate and precise control of the flow rate is selected as the first power device 32, which can better meet the needs of the cleaning device 100 to wipe the surface to be cleaned. Of course, in other embodiments, the first power device 32 can also be a water pump with a small flow rate, and the present disclosure does not make any particular limitation.

[0149] The cleaning device 100 comprises two states, i.e. a state of wiping the surface to be cleaned and a state of cleaning the cleaning element 22. In the state of wiping the surface to be cleaned, the device control panel 50 controls the first power device 32 to be turned on, the first power device 32 drives the liquid in the water box 23 to flow from the liquid outlet 233 into the first channel 31, and then to flow from the first outlet 313 to the water wiping strip 26, and then to be supplied to the cleaning element 22 through the water wiping strip 26. In the state of cleaning the cleaning element 22, the water box 23 is supplied with liquid from the external liquid source of the water box 23, so that the liquid level in the water box 23 exceeds the overflow outlet 235, the liquid in the water box 23 flows from the overflow outlet 235 to the second channel 33, and then flows from the second outlet 333 to the water wiping strip 26, and then is supplied to the cleaning element 22 through the water wiping strip 26 to clean the cleaning element 22. At this time, the device control panel 50 can control the first power device 32 to be turned on or turned off. It should be noted that in the case where the cleaning module 20 does not comprise the water wiping strip 26, in the state of wiping the surface to be cleaned, the liquid flowing from the first outlet 313 of the first channel 31 can be directly supplied to the cleaning element 22, and in the state of cleaning the cleaning element 22, and the water box 23 is supplied with liquid from the external liquid source of the water box 23 to a liquid level exceeding the overflow outlet 235, the liquid flowing from the second outlet 333 of the second channel 33 can also be directly supplied to the cleaning element 22.

[0150] It should be noted that when the cleaning device 100 wipes the surface to be cleaned, the amount of liquid applied to the cleaning element 22 can be small, i.e. the flow rate of the first power device 32 is small as described above. It can be understood that the larger the cross-sectional size of the overflow outlet 235, the greater the flow rate of the liquid overflowing from the water box 23 through the overflow outlet 235, and in order to achieve the purpose of cleaning the cleaning element 22 with a large flow rate of liquid, those skilled in the art can set the cross-sectional size of the overflow outlet 235 according to the needs to achieve the purpose of cleaning the cleaning element 22 with a large flow rate of liquid.

[0151] In addition, please refer to Figure 2a , Figure 2b and Figure 2c to Figure 2eThe cleaning device 100 is used to interface with the base station 200, which is used to maintain the cleaning device 100. The base station 200 is equipped with a liquid supply system 70 for supplying liquid and a connection interface 63 connected to the liquid supply system 70. The external liquid source of the clean water box 23 includes, but is not limited to, the liquid supply system 70 of the base station 200, the water supply system inside the building, and the outdoor water supply system, and may even be another clean water box in the cleaning device 100. When the external liquid source of the clean water box 23 is the liquid supply system 70 of the base station 200, the connection interface 63 is used to interface with the replenishment port 231 (the connection interface 63 can be directly or indirectly connected to the replenishment port 231). When the cleaning device 100 is docked at the base station 200 and the connection interface 63 is connected to the replenishment port 231, the liquid supply system 70 of the base station 200 is used to supply liquid to the clean water box 23 of the cleaning device 100. When the liquid supply system 70 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the liquid in the clean water box 23 overflows and flows to the cleaning component 22 through the second passage 33.

[0152] The liquid circuit system 30, cleaning device 100, and cleaning system 1000 disclosed herein are provided with a first passage 31 and a second passage 33, both connected to the clean water tank 23. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the first power unit 32 drives the liquid in the clean water tank 23 to supply liquid to the cleaning component 22 through the first passage 31, so as to replenish the cleaning component 22 with liquid for mopping the surface to be cleaned, keeping the cleaning component 22 moist when the cleaning device 100 is mopping the surface to be cleaned. When the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid level supplied to the clean water tank 23 by the external liquid source exceeds the overflow port 235. Liquid overflows from the overflow port 235 into the second passage 33, and then drains into the cleaning component 22 through the second passage 33 to clean the cleaning component 22. Since it is only necessary to keep the cleaning component 22 wet when mopping the surface to be cleaned, the flow rate of the first power device 32 can be relatively small. When mopping the surface to be cleaned, the first power device 32 drives the liquid in the clean water box 23 to flow out at a small flow rate. When cleaning the cleaning component 22, the clean water box 23 can overflow water to the cleaning component 22 to meet the need for a large flow rate of liquid supply to the cleaning component 22. Therefore, there is no need to use a power device with adjustable flow rate to adjust the flow rate output to the cleaning component 22, which reduces the cost of the liquid circuit system 30.

[0153] The above embodiments will be described below with reference to some specific application scenarios.

[0154] like Figure 26 As shown, and in combination Figure 2a , Figure 2b or Figure 2c or Figure 2d or Figure 2e, the user starts the sweeping and mopping integrated machine (cleaning device 100) to move on the floor of the living room under the drive of the drive wheel 101. In the moving process, the water tank 23 in the sweeping and mopping integrated machine provides clean water to the track-type cleaning member 22 to wet the track-type cleaning member 22. The track-type cleaning member 22 contacts and rolls on the floor to wipe the dust on the floor clean. With the movement of the sweeping and mopping integrated machine, the track-type cleaning member 22 cleans the floor to a set area, for example, 20 m 2 When the track-type cleaning member 22 cleans the floor to a set area, for example, 20 m

[0155] Alternatively, the sweeping and mopping integrated machine used in the user's home is provided with a dirt detection sensor, which can detect the dirt level on the cleaning element 22 or the dirt level of the water scraped off the cleaning element 22. The user is away from home for a long time, and the living room floor is dusty. The user starts the sweeping and mopping integrated machine (cleaning device 100) to move on the ground under the drive of the drive wheel 101. In the moving process, the water box 23 built-in the sweeping and mopping integrated machine provides clean water to the track-type cleaning element 22 to wet the track-type cleaning element 22. The track-type cleaning element 22 contacts and rolls on the ground, thereby wiping the dust on the ground clean. As the sweeping and mopping integrated machine moves, the dirt sensor in the sweeping and mopping integrated machine detects that the track-type cleaning element 22 is very dirty. If the track-type cleaning element 22 is not deep cleaned at this time, it will affect the subsequent cleaning effect on the ground. At this time, the sweeping and mopping integrated machine can navigate to the positioning point of the base station 200 and rotate to the replenishment port 231 of the water box 23 of the sweeping and mopping integrated machine facing the inlet of the base station 200. The sweeping and mopping integrated machine retreats into the base station 200. In this process, the replenishment port 231 of the water box 23 of the sweeping and mopping integrated machine is connected to the docking port 63 of the base station 200, and the water supply system 70 of the base station 200 is used to replenish water in the water box 23 of the sweeping and mopping integrated machine. In the process of continuously replenishing water in the water box 23 by the base station 200, the water level in the water box 23 continuously rises until the water level rises above the overflow port 235 of the water box 23. A large amount of water overflows from the overflow port 235 of the water box 23 and flows onto the track-type cleaning element 22. In this process, the track-type cleaning element 22 can continuously rotate forward or alternately rotate forward and backward to realize the self-cleaning of the track-type cleaning element 22 with large flow rate, thereby deeply cleaning the dirt attached to the track-type cleaning element 22. After the cleaning of the cleaning element 22 is completed, the sweeping and mopping integrated machine returns to the ground again to clean other areas that have not been cleaned. In this way, the dust area on most of the floor in the living room is wiped clean.

[0156] Please refer to Figure 2c , Figure 2d , Figure 2e and Figure 2f In some embodiments, the cleaning device 100 further comprises a dirt detection sensor 28 electrically connected to the device control panel 50. The present disclosure also provides a control method of the cleaning device 100, which comprises:

[0157] 01: detecting the dirt level of the sewage on the sewage recovery path between the cleaning element 22 and the sewage box 24 (specifically the second chamber 245 in the sewage box 24 in the figure) by the dirt detection sensor 28;

[0158] 03: determining the fluid parameter and supply strategy of the fluid provided to the second chamber 245 according to the dirt level of the sewage.

[0159] Correspondingly, the dirt detection sensor 28 is configured to detect the dirt level of the sewage on the sewage recovery path between the cleaning member 22 and the second chamber 245, and transmit the detection result to the device control panel 50, which is configured to determine the fluid parameter and supply strategy of the fluid provided to the second chamber 245 according to the dirt level of the sewage.

[0160] The dirt detection sensor 28 is a sensor configured to detect the liquid dirt level, including but not limited to: an optical sensor configured to detect the dirt level by measuring the reflection, scattering or absorption of light; or a capacitive sensor configured to detect the dirt level by using the change of capacitance; or an ultrasonic sensor configured to detect the dirt level by emitting ultrasonic waves and measuring the time of reflection, etc.

[0161] When the cleaning device 100 is performing sewage suction, the second power device 34 is turned on and negative pressure is drawn in the second chamber 245, and the sewage collected by the recovery member 251 on the cleaning member 22 enters the second chamber 245 through the first sewage port 25116, the communication pipeline 255 and the communication port 243 for storage. Therefore, the cleaning member 22, the flow path between the cleaning member 22 and the recovery member 251, the sewage storage cavity 25115, the communication pipeline 255 and the second chamber 245 together form a “sewage recovery path”. The dirt detection sensor 28 can be arranged at any position on the sewage recovery path, for example, arranged in the second chamber 245 (as shown), arranged on the communication pipeline 255 (as shown), arranged in the sewage storage cavity 25115 of the recovery member 251, arranged on the cleaning member 22, and arranged on the flow path between the cleaning member 22 and the recovery member 251, which is not limited in the present disclosure. Figure 2d Figure 2e Figure 2f

[0162] The fluid parameter includes the type of the fluid, and the type of the fluid includes at least one of gas, liquid and gas-liquid mixture (gas bubble liquid). When the fluid is liquid, the supply body of the fluid is the base station 200; when the fluid is gas, the supply body of the fluid can be the base station 200 or the second power device 34, which are supplied separately. When the fluid is gas-liquid mixture, the supply body of the fluid can be the base station 200, in which case the gas source system of the base station 200 supplies gas and the liquid supply system 70 of the base station 200 supplies liquid, and the gas and the liquid are mixed to form the gas-liquid mixture, and the mixing process can occur in the base station 200, for example, the mixing occurs before reaching the docking port 63, or the mixing process can occur in the cleaning device 100, for example, the mixing occurs when or before reaching the second chamber 245; when the fluid is gas-liquid mixture, the supply body of the fluid can also be the base station 200 and the second power device 34, in which case the liquid supply system 70 of the base station 200 supplies liquid and the second power device 34 supplies liquid, and the gas and the liquid are mixed to form the gas-liquid mixture, and the mixing process occurs in the cleaning device 100, for example, the mixing occurs when or before reaching the second chamber 245.​​​

[0163] In the embodiments of the present disclosure, the degree of dirtiness of the sewage on the sewage recovery path is first detected by the dirtiness detection sensor 28, and then the type and parameters of the fluid provided to the second chamber 245 are determined based on the degree of dirtiness of the sewage, so that the supply of the fluid in the second chamber 245 can be dynamically adjusted based on the actual cleaning situation, avoiding the extreme situation of supplying too much or too little, and improving the intelligence of the cleaning device 100.

[0164] In some embodiments, 03: determining the fluid parameters and supply strategy of the fluid provided to the second chamber 245 according to the degree of dirtiness of the sewage, comprising:

[0165] 031: In the case that the degree of dirtiness of the sewage is less than or equal to the first preset dirtiness threshold, it is determined to provide the second chamber 245 with a positive pressure gas to perform sewage discharge on the second chamber 245.

[0166] When the detection result shows that the degree of dirtiness of the sewage is less than or equal to the first preset dirtiness threshold, the device control panel 50 determines to provide the second chamber 245 with a positive pressure gas.

[0167] When the cleaning device 100 performs sewage discharge, one embodiment is that the device control panel 50 controls the second power device 34 to be closed, and the base station 200 provides the clean water box 23 with a positive pressure gas through the interface 63 and the liquid supplementing port 231, and the positive pressure gas overflows from the overflow port 235 to the second chamber 245, and the sewage in the second chamber 245 is extruded outward to be discharged through the communication port 243 and the first sewage port 25116 into the sewage containing chamber 25115. Then, the device control panel 50 controls the control structure 25183 to open the second sewage port 25117 to the outside, and the sewage in the sewage containing chamber 25115 is discharged through the second sewage port 25117 to the base station 200, thereby realizing the sewage discharge of the cleaning device 100. Another embodiment is that the device control panel 50 controls the second power device 34 to be opened and the positive pressure gas to be supplied to the second chamber 245, and the positive pressure gas extrudes the sewage in the second chamber 245 outward to be discharged through the communication port 243 and the first sewage port 25116 into the sewage containing chamber 25115. Then, the device control panel 50 controls the control structure 25183 to open the second sewage port 25117 to the outside, and the sewage in the sewage containing chamber 25115 is discharged through the second sewage port 25117 to the base station 200, thereby realizing the sewage discharge of the cleaning device 100.

[0168] The first preset dirtiness threshold is a critical value for describing whether the second chamber 245 needs to be cleaned, and is a known empirical value, which is usually set before leaving the factory or summarized according to historical experience data. When the dirtiness of the sewage is less than or equal to the first preset dirtiness threshold, it indicates that the second chamber 245 is not very dirty, and no accumulation or wall hanging is formed on the inner wall, so that cleaning of the second chamber 245 is not needed, and only the sewage in the second chamber 245 needs to be discharged.

[0169] In some other embodiments, when the fluid is a liquid, the parameters of the fluid further include: the pressure of the liquid, the flow of the liquid, and the supply duration of the liquid, etc.

[0170] 032: When the dirtiness of the sewage is greater than the first preset dirtiness threshold and less than or equal to the second preset dirtiness threshold, it is determined to first provide the second chamber 245 with the gas to perform the sewage discharge on the second chamber 245, and then provide the second chamber 245 with the liquid to perform the flushing on the second chamber 245, and at least one of the pressure of the liquid, the flow of the liquid, and the supply duration of the liquid is determined according to the dirtiness of the sewage.

[0171] When the detection result indicates that the dirtiness of the sewage is greater than the first preset dirtiness threshold and less than or equal to the second preset dirtiness threshold, the equipment control panel 50 determines to first provide the second chamber 245 with the gas to perform the sewage discharge on the second chamber 245, and then provide the second chamber 245 with the liquid, and at least one of the pressure of the liquid, the flow of the liquid, and the supply duration of the liquid is determined according to the dirtiness of the sewage.

[0172] The second preset dirtiness threshold is a critical value for describing whether the dirt in the holes of the filter 247 is accumulated to a degree that needs to be cleaned separately, and the second preset dirtiness threshold is a known empirical value, which is usually set before leaving the factory or summarized according to historical experience data. When the dirtiness of the sewage is greater than the first preset dirtiness threshold and less than or equal to the second preset dirtiness threshold, it indicates that the second chamber 245 is very dirty, and if not cleaned, accumulation or wall hanging will be formed on the inner wall, and the dirt in the holes of the filter 247 is not accumulated to a degree that needs to be cleaned separately because it hinders the fluid from passing through, so that the filter 247 does not need to be cleaned separately, and only the second chamber 245 needs to be cleaned.

[0173] The pressure of the liquid, the flow of the liquid and the supply time of the liquid can be adjusted according to the dirtiness of the sewage. Generally, the dirtier the sewage is, the greater the pressure of the liquid, the greater the flow of the liquid and the longer the supply time of the liquid, so that the cleaning efficiency and the cleaning effect can be improved. When the method in 032 is performed, the pressure of the liquid can be determined only according to the dirtiness of the sewage, while the flow of the liquid and the supply time remain unchanged. The deeper the dirtiness of the sewage (the dirtier the sewage is), the greater the pressure of the liquid. The flow of the liquid can be determined only according to the dirtiness of the sewage, while the pressure of the liquid and the supply time remain unchanged. The deeper the dirtiness of the sewage (the dirtier the sewage is), the greater the flow of the liquid. The supply time of the liquid can be determined according to the dirtiness of the sewage, while the pressure of the liquid and the flow of the liquid remain unchanged. The deeper the dirtiness of the sewage (the dirtier the sewage is), the longer the supply time of the liquid. Of course, the pressure of the liquid and the flow of the liquid can be determined according to the dirtiness of the sewage, while the supply time remains unchanged. The pressure of the liquid and the supply time can be determined according to the dirtiness of the sewage, while the flow remains unchanged. The flow of the liquid and the supply time can be determined according to the dirtiness of the sewage, while the pressure remains unchanged. The pressure of the liquid, the flow of the liquid and the supply time can be determined according to the dirtiness of the sewage.

[0174] In the present embodiment, according to the detection result obtained by the dirt detection sensor 28, it is determined that the dirtiness of the sewage is in a stage requiring flushing of the second chamber 245, and the second chamber 245 is first provided with gas to perform sewage discharge on the second chamber 245, and then the second chamber 245 is provided with liquid to flush the second chamber 245, instead of only discharging sewage, so that the second chamber 245 can be cleaned immediately, and the problem of dirt hanging or accumulating on the second chamber 245 due to long-term non-cleaning of the second chamber 245, resulting in the need for the user to manually disassemble and clean, is avoided. At the same time, during the process of providing the second chamber 245 with liquid to flush the second chamber 245, at least one of the pressure of the liquid, the flow of the liquid and the supply time of the liquid is determined according to the dirtiness of the sewage. Compared with using fixed pressure of the liquid, flow of the liquid and supply time of the liquid to flush the second chamber 245, the flushing of the present embodiment is more in line with actual needs, avoiding the problem of large energy consumption and waste of resources caused by excessively large parameters, and avoiding the problem of incomplete cleaning caused by excessively small parameters. In other words, the parameters of the present embodiment are determined based on the dirtiness of the sewage, which can save energy and resources and ensure cleaning effect.

[0175] In some embodiments, when the fluid is a liquid, the parameters of the fluid further include: pressure of the liquid, flow rate of the liquid, and supply duration of the liquid, etc.; when the fluid is a gas-liquid mixture, the parameters of the fluid further include: pressure of the gas-liquid mixture, flow rate of the gas-liquid mixture, and supply duration of the gas-liquid mixture, ratio of the gas and the liquid, etc.03: determining the fluid parameters and supply strategy of the fluid provided to the second chamber 245 according to the dirtiness of the sewage, including:

[0176] 033: when the dirtiness of the sewage is greater than the second preset dirtiness threshold, determining to provide the gas-liquid mixture to the second chamber 245 first to flush the filter 247, and determining at least one of the pressure of the gas-liquid mixture, the flow rate of the gas-liquid mixture, the supply duration of the gas-liquid mixture, and the ratio of the gas and the liquid according to the dirtiness of the sewage, then providing the gas to the second chamber 245 to perform the sewage discharge of the second chamber 245, and finally providing the liquid to flush the second chamber 245, and determining at least one of the pressure of the liquid, the flow rate of the liquid, and the supply duration of the liquid according to the dirtiness of the sewage.

[0177] When the dirtiness of the sewage is greater than the second preset dirtiness threshold, it indicates that the dirt in the pores of the filter 247 has accumulated to a degree that cannot be cleaned by the fluid, and the second chamber 245 is also very dirty, and has formed accumulation or wall hanging on the inner wall. Therefore, the gas-liquid mixture can be provided to the second chamber 245 first to flush the filter 247, and after the dirt in the pores of the filter 247 is cleaned and the liquid can pass through, the gas is provided to the second chamber 245 to perform the sewage discharge of the second chamber 245, and finally the liquid is provided to flush the second chamber 245.

[0178] In the process of flushing the filter 247 with the gas-liquid mixture, the gas-liquid mixture (bubble liquid) is equivalent to pressurizing the liquid, and compared with flushing the filter 247 with only the liquid, the flushing force of the bubble liquid on the filter 247 is greater, and the flushing efficiency and effect are better. At this time, at least one of the pressure of the gas-liquid mixture, the flow rate of the gas-liquid mixture, the supply duration of the gas-liquid mixture, and the ratio of the gas and the liquid can be determined according to the dirtiness of the sewage. Generally, the dirtier the sewage is, the greater the pressure of the gas-liquid mixture, the greater the flow rate of the gas-liquid mixture, the longer the supply duration of the gas-liquid mixture, and the greater the ratio of the gas and the liquid, so as to improve the cleaning efficiency and effect. As for the adjustment method, please refer to the adjustment method in the method of the previous execution 032, which will not be described in detail here. In addition, the "providing the gas to the second chamber 245 to perform the sewage discharge of the second chamber 245, and finally providing the liquid to flush the second chamber 245" in 033 is explained before, which will not be described here.

[0179] In the present disclosure, according to the detection result detected by the dirt detection sensor 28, it is determined that the dirt degree of the sewage is in a stage requiring the filter element 247 to be flushed first, and the filter element 247 is provided with the bubble liquid to flush the filter element, which can avoid the problem that the second chamber 245 is not cleaned due to the waste of liquid caused by the fact that the liquid cannot pass through the filter element 247 into the second chamber 245 and be discharged from the liquid outlet 242 while the pores of the filter element 247 are blocked by dirt. At the same time, during the process of providing the second chamber 245 with the bubble liquid to flush the filter element 247, at least one of the pressure of the gas-liquid mixture, the flow of the gas-liquid mixture, the supply time length of the gas-liquid mixture, and the ratio of the gas and the liquid is determined according to the dirt degree of the sewage. Compared with the flushing performed by using a fixed parameter value, the flushing of the filter element 247 in the present embodiment is more in line with the actual needs, avoids the problem of large energy consumption and waste of resources caused by excessively large parameters, and also avoids the problem of incomplete cleaning caused by excessively small parameters. In other words, the parameters in the present embodiment are determined based on the dirt degree of the sewage, which can not only save energy and resources, but also ensure the cleaning effect.

[0180] Referring to Figure 2a , Figure 2b or Figure 2c or Figure 2d or Figure 2e In some embodiments, when the cleaning device 100 is in a state of cleaning the cleaning element 22, and the liquid level of the external liquid source of the clean water box 23 supplying the clean water box 23 exceeds the overflow outlet 235, the first power device 32 drives the liquid in the clean water box 23 to flow from the liquid outlet 233 into the first passage 31, and then flow out from the first outlet 313 to supply the cleaning element 22.

[0181] As mentioned above, when the cleaning device 100 is in a state of cleaning the cleaning element 22, and the liquid level of the external liquid source of the clean water box 23 supplying the clean water box 23 exceeds the overflow outlet 235, the device control panel 50 can control the first power device 32 to be turned on. At this time, the cleaning device 100 can not only provide the liquid for cleaning the cleaning element 22 through the liquid overflowed from the clean water box 23 through the second passage 33, but also provide the liquid for cleaning the cleaning element 22 by driving the liquid in the clean water box 23 through the first passage 31 by the first power device 32, so as to further increase the liquid supply amount when the cleaning element 22 is cleaned, and effectively improve the cleaning efficiency and cleaning effect of the cleaning element 22.

[0182] Referring to Figure 2a , Figure 2bIn some embodiments, the second passage 33 is a pipe through which the liquid overflowing from the overflow outlet 235 flows and directly flows out of the pipe to supply the cleaning member 22. That is, the second passage 33 is only composed of a pipe, which is simple in structure and low in cost. For example, one end of the pipe is in communication with the overflow outlet 235, and the other end is in communication with the water outlet 26. The opening of the pipe in communication with the overflow outlet 235 is the second inlet 331, and the opening of the pipe in communication with the water outlet 26 is the second outlet 333. In this embodiment, the cleaning device 100 does not have a self-cleaning function. The so-called "self-cleaning function" means that the cleaning device 100 can clean the dirt attached to the cleaning member 22 during the process of wiping the surface to be cleaned. Specifically, the cleaning member 22 will accumulate dirt during the process of wiping the surface to be cleaned, and the originally clean liquid will become dirty water. The cleaning device 100 without the self-cleaning function of the cleaning member cannot recover the dirty water on the cleaning member 22 during the cleaning process. Only when the cleaning device 100 is located at a predetermined position, such as returning to the base station 200, can the cleaning device 100 provide the cleaning member 22 with clean water from the overflow of the clean water tank 23 through the second passage 33, or further drive the liquid in the clean water tank 23 through the first passage 31 by the first power device 32 to provide the cleaning member 22 with clean water, so as to achieve the purpose of cleaning the cleaning member 22 of the cleaning device 100.

[0183] Please refer to Figure 2c or Figure 2d or Figure 2e In other embodiments, the second passage 33 is provided with a first chamber 244 and a second chamber 245, and a second power device 34. The first chamber 244 is provided with a liquid inlet 241 and a liquid outlet 242. The liquid inlet 241 is used for the liquid from the liquid source outside the first chamber 244 to enter the first chamber 244, and the liquid outlet 242 is used for the liquid entering the first chamber 244 to be discharged to the cleaning member 22. The second chamber 245 is used for containing dirty water, and is provided with a communication port 243. The communication port 243 is used for the dirty water on the cleaning member 22 to enter the second chamber 245. The second chamber 245 is separated from the first chamber 244 and is in fluid communication through a through hole O. The highest allowable liquid level of the second chamber 245 is lower than the position of the through hole O.

[0184] As shown in Figure 2d , the first chamber 244 and the second chamber 245 can be formed in two separate containers respectively, or as shown in Figure 2e , they can also be two separated chambers formed in the same container. The first chamber 244 and the second chamber 245 can be arranged in an up-down direction (as shown in Figure 2d ), or arranged in a horizontal direction (as shown in Figure 2eThe present embodiment is not particularly limited. The second chamber 245 can have a large capacity as a space for storing the sewage, and the first chamber 244 can have a small capacity as a water passing space, or even a pipe, to save the installation space of the cleaning device 100.

[0185] The second power device 34 is connected to the liquid outlet 242 and is used to provide driving power for driving the sewage on the cleaning member 22 into the second chamber 245 and for driving the liquid in the clean water box 23 out of the second passage 33. That is, the second power device 34 is used to collect the sewage generated by the cleaning member 22 cleaning the surface to be cleaned and to provide high flow liquid for cleaning the cleaning member 22.

[0186] For example, the second power device 34 can be a water and air dual-purpose pump. The second power device 34 can be in an activated state in the following two use states:

[0187] As shown in Figure 3a When the cleaning device 100 is in a state of cleaning the surface to be cleaned, the second power device 34 is in an activated state. Since the second power device 34 is connected to the liquid outlet 242, that is, the second power device 34 is in communication with the first chamber 244, and the first chamber 244 and the second chamber 245 are in fluid communication through the through hole O, when the second power device 34 is pumping, the air in the second chamber 245 flows through the first chamber 244 through the through hole O and is discharged from the liquid outlet 242 together with the air in the first chamber 244, thereby achieving the function of the second power device 34 pumping the air in the first chamber 244 and the second chamber 245, so that the second chamber 245 is in a negative pressure state, thereby driving the sewage on the cleaning member 22 into the second chamber 245. In this way, the second power device 34 is used to achieve the function of the cleaning device 100 collecting the sewage generated by the cleaning member 22 cleaning the surface to be cleaned.

[0188] As shown in Figure 3bAs shown, in the case that the cleaning device 100 is in the state of washing the cleaning element 22, and the liquid level of the external liquid source of the clean water box 23 supplying the clean water box 23 exceeds the overflow outlet 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow outlet 235 to the second passage 33, and then flows out from the second passage 33 through the liquid inlet 241, the first chamber 244, the liquid outlet 242, and the second outlet 333 to supply the cleaning element 22. Since the cleaning device 100 is in the state of washing the cleaning element 22, for the first chamber 244, the external liquid (the liquid overflowing from the clean water box 23) of the first chamber 244 enters the first chamber 244 through the liquid inlet 241, and since the second power device 34 is connected to the liquid outlet 242 of the first chamber 244, the second power device 34 preferentially drives the liquid in the first chamber 244 to the cleaning element 22 through the liquid outlet 242, and specifically, to the squeegee 26 beside the cleaning element 22 to supply the cleaning element 22. In this process, since the highest allowable liquid level of the second chamber 245 is lower than the position of the through hole O, the sewage in the second chamber 245 cannot enter the first chamber 244. In addition, in the process of starting the second power device 34, the liquid in the first chamber 244 always flows through the through hole to block the through hole, and also hinders the second power device 34 from driving the liquid in the second chamber 245 to the first chamber 244. Thus, the demand for large-flow liquid supply to the cleaning element 22 in the state of washing the cleaning element 22 of the cleaning device 100 can be met, and the sewage in the second chamber 245 cannot flow back to the cleaning element 22.

[0189] The liquid path system 30 provided in the embodiment is for the cleaning device 100 with the self-cleaning function. In addition to the small-flow liquid supply to the cleaning element 22 through the first power device 32 connected to the clean water box 23 of the cleaning device 100 to realize the normal mopping of the cleaning device 100, a power device is also needed to be arranged on the cleaning device 100 to realize the function of pumping the sewage on the cleaning element 22 to the cleaning device when the cleaning device 100 cleans the surface to be cleaned. The cleaning device 100 of the embodiment of the present disclosure also needs to meet the demand for large-flow washing of the cleaning element 22. Therefore, the second power device 34 is used in the embodiment to realize the two functions of pumping sewage when the cleaning device 100 normally cleans and large-flow liquid supply when the cleaning element 22 is washed, so that another power device can be effectively saved to serve as the power source for large-flow liquid supply to the cleaning element 22 for washing, or a flow-adjustable power device (the flow-adjustable power device is more expensive than the flow-unadjustable power device) does not need to be arranged to meet the switching between the small-flow liquid supply and the large-flow liquid supply to the cleaning element 22, and thus the overall cost of the cleaning device 100 can be effectively reduced.

[0190] More specifically, please refer to Figure 2c , Figure 2e and Figure 20As shown, the exemplary liquid path system 30 includes a sewage box 24, and a first chamber 244 and a second chamber 245 are formed in the sewage box 24. The sewage box 24 is provided with an inlet 241, an outlet 242, and a communication port 243. The inlet 241 is in communication with the second inlet 331, the outlet 242 is in communication with the second outlet 333, and the communication port 243 is used for sewage on the cleaning member 22 to enter the sewage box 24. For the sewage box 24, it is in communication with the clean water box 23 through the inlet 241 and in communication with the second outlet 333 of the second path 33 through the outlet 242, so that the sewage box 24 constitutes a part of the second path 33, and when the liquid level in the clean water box 23 exceeds the overflow port 235, the liquid in the clean water box 23 can overflow to the sewage box 24.

[0191] When the cleaning device 100 is in a state of washing the cleaning member 22, and the liquid level of the external liquid source of the clean water box 23 exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 to the second path 33, and then flow out of the second path 33 through the inlet 241 of the sewage box 24, the chamber of the sewage box 24, the outlet 242, and the second outlet 333 to be discharged to the cleaning member 22. The sewage box 24 is a container on the liquid path system 30 and / or the cleaning module 20 for passing, loading, and / or storing liquid. It should be noted that the naming of the sewage box 24 does not constitute a limitation on the type of liquid therein, i.e., the liquid in the sewage box 24 is not limited to storing only sewage, but can store clean water, sewage, etc. Here, the explanation of "clean water" is the same as before, and "sewage" is a relative concept, which only needs to be dirtier than the clean water recognized by the user (or a mixture of water and dirt). The sewage box 24 can be of any form, for example, the cross-sectional shape of the sewage box 24 can be regular or irregular. In this document, the cross-sectional shape of the sewage box 24 is irregular, and the design of the irregular cross-section can adapt to the structural layout of the cleaning device 100, facilitating the compact arrangement of other components.

[0192] Please refer to Figure 2c , Figure 8 to Figure 10The sewage box 24 is provided with a liquid inlet 241, a liquid outlet 242, and a communication port 243. The shapes and sizes of the liquid inlet 241, the liquid outlet 242, and the communication port 243 can be arbitrarily set, and the present disclosure does not make any limitation. In some embodiments, the setting height of the liquid outlet 242 on the sewage box 24 is higher than the setting height of the communication port 243 on the sewage box 24. Specifically, the sewage box 24 has a height dividing line (explained above), the liquid inlet 241 and the liquid outlet 242 are both located above the height dividing line, and the communication port 243 is located below the height dividing line. In one example, the communication port 243 is close to the bottom of the sewage box 24, and the liquid inlet 241 and the liquid outlet 242 are close to the top of the sewage box 24. In order to adapt to the structural layout of the cleaning device 100 of the present disclosure, the liquid inlet 241 is arranged on the left side of the sewage box 24 in the machine body width direction X, the liquid outlet 242 is arranged on the right side of the sewage box 24 in the machine body width direction X, and the communication port 243 is close to the side of the clean water box 23 facing the rear of the cleaning device 100. Among them, “left side” and “right side” are viewed from the perspective when the cleaning device 100 moves forward, the liquid inlet 241 is an opening for communicating the inside of the sewage box 24 with the outside of the sewage box 24, specifically, it is communicated with the second inlet 331 of the second passage 33, that is, the liquid in the clean water box 23 can enter the second passage 33 through the second inlet 331, and then enter the inside of the sewage box 24 through the liquid inlet 241. The liquid outlet 242 is an opening for communicating the inside of the sewage box 24 with the outside pipeline, that is, the liquid in the sewage box 24 can flow out to the outside pipeline through the liquid outlet 242, and then flow to the target object, the spitting water strip 26. In the present embodiment, the first chamber 244 and the second chamber 245 are both formed in the sewage box 24, so that the structure of the liquid path system 30 can be more compact, the distance of the connecting pipeline between the first chamber 244 and the second chamber 245 can be shorter, effectively saving the machine space, and reducing the pipeline cost. For example, as shown in Figure 20 Fig. 6, along the height direction Z of the sewage box 24, the first chamber 244 can be located above the second chamber 245. Since the volume of the first chamber 244 only needs to meet the flow requirement when the cleaning member 22 is supplied with a large flow of liquid, the volume of the first chamber 244 can be smaller than that of the second chamber 245. Therefore, the relatively narrow space above the second chamber 245 can be used as the first chamber 244. Moreover, the first chamber 244 is located above the second chamber 245, so that the through hole O communicating the two chambers can be arranged at the top of the second chamber 245 corresponding to the lowest part of the first chamber 244, thereby more favorably ensuring that the setting height of the through hole O is not higher than the highest allowable liquid level of the second chamber 245.

[0193] Please refer to Figure 11 to Figure 13In some embodiments, the liquid path system 30 and / or the cleaning module 20 can further include a recovery member 251 for collecting, loading and / or storing the dirty water generated by the cleaning member 22 when cleaning the surface to be cleaned. The communication port 243 is an opening for communicating the inside of the dirty water box 24 (in particular, the second chamber 245) with the recovery member 251, so that the dirty water in the recovery member 251 can enter the dirty water box 24 (in particular, the second chamber 245) through the communication port 243 for storage, and the liquid (which can be clean water or dirty water) in the dirty water box 24 can also enter the recovery member 251 through the communication port 243 and then be discharged from the recovery member 251 to the outside of the cleaning device 100. Specifically, the recovery member 251 can include a scraping portion 2512 for abutting against the cleaning member 22 to scrape the dirt on the cleaning member 22 into a dirt storage cavity 25115. The communication port 243 of the dirty water box 24 is in communication with the dirt storage cavity 25115, and the communication port 243 is used for the dirty water on the cleaning member 22 to enter the dirty water box 24 through the dirt storage cavity 25115, and for the dirty water in the dirty water box 24 to enter the dirt storage cavity 25115 to be discharged to the outside of the cleaning device 100.

[0194] More specifically, in some embodiments, referring to Figure 13The length direction X of the dirt holding cavity 25115 is provided with a first sewage outlet 25116 at one end and a second sewage outlet 25117 at the other end. The first sewage outlet 25116 is in communication with the communication port 243 of the second chamber 245. The cleaning device 100 further comprises a control structure 25183 which can be arranged at any position of the dirt holding cavity 25115, for example, at the first sewage outlet 25116, or at the second sewage outlet 25117, or at any position between the first sewage outlet 25116 and the second sewage outlet 25117 of the dirt holding cavity 25115. In one example, the control structure 25183 can be a valve which is opened to connect the inside of the dirt holding cavity 25115 with the outside, and is closed to cut off the communication between the inside of the dirt holding cavity 25115 and the outside. In another example, the control structure 25183 is a pipe which is deformable or movable so that the opening of the pipe can be directed to a first direction or a second direction, and the opening of the pipe directed to the first direction is higher than the opening of the pipe directed to the second direction. For example, when the opening of the pipe is directed to the first direction, for example, upward, the control structure 25183 is closed, and the sewage in the dirt holding cavity 25115 cannot flow out of the dirt holding cavity 25115; when the opening of the pipe is directed to the second direction, for example, horizontally or lower than horizontally, the control structure 25183 connects the inside of the dirt holding cavity 25115 with the outside, and the sewage can flow out of the dirt holding cavity 25115. The control structure 25183 is used to connect the inside of the dirt holding cavity 25115 with the outside when the cleaning device 100 is in the sewage discharging state. It should be noted that the recycling member 251 and the elements related thereto which are used to recycle the sewage can be omitted in the cleaning device 100 without the self-cleaning function of the cleaning member.

[0195] Please refer to Figure 10 and Figure 11The second power device 34 is a device that provides driving power for discharging the liquid in the clean water box 23 through the second passage 33. In some embodiments, the second power device 34 comprises a water-air dual pump, i.e., the second power device 34 is both a water pump that can be used to pump water or discharge water, and an air pump that can be used to pump negative pressure or positive pressure. In one example, the inlet of the second power device 34 is in communication with the liquid discharge port 242 through a third section of pipe, and the outlet of the second power device 34 is in communication with the water discharge strip 26 through a fourth section of pipe, and the opening of the fourth section of pipe in communication with the water discharge strip 26 is the second outlet 333. At this time, the second passage 33 comprises the pipe between the clean water box 23 and the dirty water box 24, the dirty water box 24, the third section of pipe, the second power device 34, and the fourth section of pipe. When the cleaning device 100 further comprises a device control panel 50, the device control panel 50 is electrically connected to the second power device 34, and is further used to control the opening and closing of the second power device 34. Of course, it can be understood that the above-mentioned "pipe" can also be formed by a channel formed on the shell.

[0196] Please refer to Figure 2b , Figure 2c , Figure 8 to Figure 10In the state that the cleaning device 100 is cleaning the cleaning member 22, and the liquid level of the external liquid source of the clean water box 23 supplying the clean water box 23 exceeds the overflow outlet 235, the device control board 50 controls the second power device 34 to be turned on, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow outlet 235 to the second passage 33, and then flow out from the second passage 33 to the mopping strip 26 through the liquid inlet 241 of the dirty water box 24, the cavity of the dirty water box 24, the liquid outlet 242, and the second outlet 333 of the second passage 33, and then be discharged to the cleaning member 22 through the mopping strip 26. The liquid path system 30 of the present embodiment loads the dirty water formed on the cleaning member 22 by arranging the dirty water box 24, and the cleaning member 22 can realize the self-cleaning function of the cleaning member 22 by mopping the surface to be cleaned and storing the dirty water formed by mopping the surface to be cleaned in the dirty water box 24 through the communication port 243. After the cleaning device 100 reaches the preset position (for example, the base station 200), the dirty water in the dirty water box 24 is discharged to the recovery member 251 through the communication port 243, and finally discharged to the base station 200 for cleaning. In the process of returning to the base station 200 to clean the cleaning member 22, the device control board 50 can control the first power device 32 and the second power device 34 to be turned on, the first power device 32 drives the liquid in the clean water box 23 to enter the first passage 31 from the liquid outlet 233, and then flow out from the first outlet 313 of the first passage 31 to the mopping strip 26, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow outlet 235 to the second passage 33, and then flow out from the second outlet 333 of the second passage 33 to the mopping strip 26, and finally the liquid entering the mopping strip 26 from the two passages is supplied to the cleaning member 22 through the water outlet 261 to clean the cleaning member 22. The addition of the second power device 34 realizes the state of actively supplementing the liquid flowing through the second passage 33 to the cleaning member 22 when cleaning the cleaning member 22, the amount of liquid supplement is greatly increased compared to not arranging the second power device 34, and the cleaning efficiency and cleaning effect of the cleaning member 22 are improved.

[0197] In some embodiments, the flow rate of the second power device 34 is greater than that of the first power device 32. Thus, the liquid supply flow rate of the first passage 31 to the cleaning element 22 is less than that of the second passage 33 to the cleaning element 22. Since the demand of the cleaning element 22 for liquid is small when the cleaning device 100 is in the state of cleaning the surface to be cleaned, the device control panel 50 can only control the first power device 32 to be turned on to supply liquid to the wick 26 only through the first passage 31. While the cleaning device 100 is in the state of washing the cleaning element 22, the demand of the cleaning element 22 for liquid is large, and the device control panel 50 can control the first power device 32 and the second power device 34 to be turned on, at this time, the first passage 31 and the second passage 33 supply liquid to the wick 26, and the flow rate of the second power device 34 is greater than that of the first power device 32. Compared with not setting the second power device 34 (the second passage 33 is only composed of a pipe) or setting a second power device with the same or smaller flow rate than the first power device 32, the total liquid supply amount from the clean water box 23 to the wick 26 is increased more in this embodiment, thereby greatly improving the cleaning efficiency and cleaning effect of the cleaning element 22.

[0198] As mentioned above, the sewage box 24 is a container for passing, loading and / or storing liquid, and the recovery element 251 is used to collect, load and / or store the sewage generated by the cleaning element 22 during the cleaning of the surface to be cleaned. Therefore, the first chamber 244 is arranged above the second chamber 245, and when the second power device 34 is turned on and negative pressure is drawn in the sewage box 24, the sewage in the recovery element 251 will pass through the communication port 243 into the sewage box 24 and be mainly stored in the second chamber 245 below, and no sewage is stored in the first chamber 244.

[0199] In some embodiments, when the second power device 34 is closed, and the liquid in the clean water box 23 overflows from the overflow port 235 to the first chamber 244, at least part of the liquid in the first chamber 244 flows into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245. Based on the above-mentioned embodiments, when the second power device 34 is closed, and the liquid in the clean water box 23 overflows to the first chamber 244, the liquid in the first chamber 244 flows into the second chamber 245 through the through hole O, so that at least part of the second chamber 245 can be washed, the probability of dirt adhering to the sewage containing space is reduced, the subsequent cleaning of the sewage containing space is facilitated, and the user experience is improved. When the cleaning device 100 returns to the preset position, and the liquid level of the external liquid source of the clean water box 23 supplying the clean water box 23 exceeds the overflow port 235, the cleaning device 100 further includes a state of preliminary washing of the sewage box 24 and a state of sewage discharge. When the cleaning device 100 is in the state of washing the cleaning element 22, the device control panel 50 at least controls the second power device 34 to be opened, and the liquid in the clean water box 23 flows to the water strip 26 through the second passage 33 to be discharged to the cleaning element 22, so as to wash the cleaning element 22. At the same time, the device control panel 50 can control the first power device 32 to be closed or opened. When the first power device 32 is opened, the liquid in the clean water box 23 can also flow to the water strip 26 through the first passage 31 to supply the cleaning element 22, so as to wash the cleaning element 22. When the cleaning device 100 is in the state of preliminary washing of the sewage box 24, the device control panel 50 controls the second power device 34 to be closed (the first power device 32 can be closed), the liquid in the clean water box 23 overflows from the overflow port 235 to the first chamber 244, and flows into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245, so as to wash the second chamber 245.

[0200] As mentioned above, the second power device 34 can be a water-air dual-purpose pump. Before performing the preliminary washing of the sewage box 24, the cleaning device 100 usually performs sewage discharge. In some embodiments, the base station 200 can be provided with an air source system. After the cleaning device 100 is docked with the base station 200, the air source system of the base station 200 can ventilate the sewage box 24 of the cleaning device 100 to provide positive pressure. Under the action of the positive pressure, the sewage in the sewage box 24 flows into the recovery element 251 through the communication port 243, and finally is discharged from the recovery element 251 to the base station 200. After the sewage discharge is completed, the cleaning device 100 can perform the preliminary washing of the sewage box 24 as mentioned above. The sewage generated after washing the second chamber 245 flows into the recovery element 251 through the communication port 243, and finally is also discharged from the recovery element 251 to the base station 200.

[0201] In some other embodiments, the second power device 34 can first aerate the sewage box 24 to provide a positive pressure, and the sewage in the sewage box 24 flows into the recovery member 251 through the communication port 243 under the action of the positive pressure, and finally flows out of the cleaning device 100 from the recovery member 251. After the sewage is discharged, the cleaning device 100 performs the preliminary cleaning of the sewage box 24 as described above, and the sewage generated after the cleaning of the second chamber 245 flows into the recovery member 251 through the communication port 243, and finally also flows out of the cleaning device 100 from the recovery member 251 to the base station 200.

[0202] It should be noted that before the cleaning device 100 performs the cleaning operation of the cleaning member 22, since the cleaning system 1000 is not aware of the specific amount of sewage in the sewage box 24 in the cleaning device 100 after the cleaning device 100 returns to the base station 200, the cleaning system 1000 provided by the embodiments of the present disclosure can first perform the sewage discharge operation of the sewage box 24 after the cleaning device 100 returns to the base station 200, so that the initial dirty sewage in the sewage box 24 is emptied, thereby facilitating the subsequent cleaning operation of the cleaning member 22.

[0203] For the above-mentioned embodiment of aerating the sewage box 24 by the second power device 34 to discharge the sewage in the sewage box 24, the base station 200 does not need to be provided with a gas source system to discharge the sewage from the cleaning device 100, so that the design of the base station 200 can be simpler and smaller in size.

[0204] The advantages of the above-mentioned scheme will be further embodied by describing specific application scenarios as follows:

[0205] Please refer to Figure 27 The user's home area is small, the layout space is limited, and no base station 200 is equipped for maintaining the cleaning device 100, and a docking head is reserved in the toilet or bathroom which can be docked with the cleaning device 100. The docking head is communicated with the water faucet of the user's home. When the cleaning device 100 needs to replenish water in the clean water box 23, the cleaning device 100 returns to the predetermined position to make the clean water box 23 docked with the docking head. At this time, the water path connected to the water faucet serves as the external liquid source of the clean water box 23, and the clean water at the water faucet reaches the docking head through the pipeline and flows into the clean water box 23. When the cleaning device 100 detects that the clean water box 23 is about to reach the preset full water position, the cleaning device 100 exits the docking with the docking head, and then the cleaning device 100 can perform the subsequent task of cleaning the to-be-cleaned surface. In the process of cleaning the to-be-cleaned surface, the clean water in the clean water box 23 flows out to the cleaning member 22 through the first passage 31, so that the cleaning member 22 can maintain a wet state to ensure the cleaning effect.

[0206] When the cleaning device 100 has been cleaning the surface to be cleaned for a period of time, the cleaning element 22 can be relatively dirty, and needs to be deep cleaned using a large amount of liquid, the cleaning device 100 can first move to the vicinity of the floor drain, and start the second power device 34 to provide positive pressure to the sewage box 24 to discharge the sewage in the sewage box 24 through the recovery element 251 to the floor drain through the second sewage outlet 25117 of the recovery element 251, and then the cleaning device 100 returns to the docking position, and the clean water box 23 is replenished with water through the faucet, and the water in the clean water box 23 flows out to the cleaning element 22 through the second passage 33, and in this process, the cleaning element 22 rotates to fully self-clean the cleaning element 22. Since most of the sewage in the sewage box 24 has been discharged to the floor drain, the sewage after self-cleaning is not very dirty, so that the slightly cleaner sewage generated by cleaning the cleaning element 22 can flow to the floor drain on the ground.

[0207] Of course, in actual application scenarios, the floor drain and the docking head can be arranged relatively close, so that the operations of discharging the sewage in the sewage box 24 to the floor drain and cleaning the cleaning element 22 can all occur at the same position, thereby improving the maintenance efficiency of the cleaning device 100.

[0208] As can be seen from the above, due to the self-cleaning and self-discharge functions of the cleaning device 100, the design of the base station 200 can be more simplified, and the size can be smaller, and even the base station 200 can not be provided, and only a water source for supplying water to the cleaning device 100 and a floor drain need to be provided in the user's home. Please refer to Figure 9 and Figure 20 Further, in some embodiments, a filter element 247 is arranged at the through hole between the first chamber 244 and the second chamber 245, and the first chamber 244 and the second chamber 245 are in fluid communication through the holes in the filter element 247, and the filter element 247 is used to block at least part of the solid waste in the second chamber 245 from entering the first chamber 244. Wherein, in the case that the second power device 34 is closed, and the liquid level of the clean water box 23 supplied by the external liquid source of the clean water box 23 exceeds the overflow outlet 235, the liquid of the clean water box 23 overflows from the overflow outlet 235 to the first chamber 244, and enters the second chamber 245 after passing through the filter element 247.

[0209] The filter 247 is a component for filtering large-size substances in liquid. In one example, the filter 247 is a filter screen, which is located at the through hole between the first chamber 244 and the second chamber 245 and is provided with a plurality of holes. The size of the holes can be set as required, as long as it allows liquid to pass through but does not allow large-size substances (solid waste) to pass through. As mentioned above, sewage is usually stored in the second chamber 245, and there is no sewage in the first chamber 244, and the first chamber 244 is for clean water in the clean water tank 23 to pass through and flow out of the liquid outlet 242 to the squeegee 26 and finally out of the squeegee 26 to the cleaning member 22 for cleaning the cleaning member 22. Therefore, when the cleaning device 100 is in the state of cleaning the cleaning member 22, the liquid passing through the first chamber 244 needs to be clean water and cannot be mixed with solid waste. Based on this, the filter 247 is arranged between the second chamber 245 and the first chamber 244, which can avoid the clean water flowing into the squeegee 26 from the first chamber 244 being contaminated by the solid waste in the second chamber 245, thereby ensuring the cleaning effect of cleaning the cleaning member 22.

[0210] On the other hand, liquid usually flows from high to low, so when the cleaning device 100 is in the state of cleaning the cleaning member 22, the liquid entering the first chamber 244 from the liquid inlet 241 tends to flow into the second chamber 245, and although the second power device 34 can have a driving force to drive the liquid to flow to the liquid outlet 242, a certain amount of liquid will still enter the second chamber 245, thereby reducing the liquid amount of the liquid flowing to the squeegee 26 through the second passage 33, and reducing the effect of cleaning the cleaning member 22. In the present embodiment, compared with the through hole between the first chamber 244 and the second chamber 245, the filter 247 arranged between the first chamber 244 and the second chamber 245 can make the clean water entering the first chamber 244 from the liquid inlet 241 more difficult to flow into the second chamber 245, but flow horizontally through the first chamber 244 and flow out of the liquid outlet 242 to the squeegee 26, thereby ensuring that the liquid amount of the liquid provided to the cleaning member 22 is larger when cleaning the cleaning member 22, and improving the effect of cleaning the cleaning member 22. When the cleaning device 100 is in the state of preliminary cleaning of the sewage tank 24, the device control panel 50 controls the second power device 34 to be closed, and the liquid level of the liquid source outside the clean water tank 23 to the clean water tank 23 exceeds the overflow outlet 235, and the liquid of the clean water tank 23 overflows from the overflow outlet 235 to the first chamber 244, and then enters the second chamber 245 after passing through the filter 247, so as to clean the filter 247, flush the solid waste adhered to the filter 247 into the second chamber 245, and clean at least part of the second chamber 245. Similarly, the cleaning device 100 usually performs sewage discharge before performing preliminary cleaning of the sewage tank 24. Details are described above.

[0211] In some embodiments, before the cleaning of the cleaning element 22 is performed, a positive pressure sewage tank purging operation can be performed first. Then a preliminary sewage tank cleaning operation is performed: the second power device 34 is controlled to be closed, and the liquid level of the clean water tank 23 supplied by the external liquid source of the clean water tank 23 exceeds the overflow outlet 235, the liquid of the clean water tank 23 is overflowed from the overflow outlet 235 to the first chamber 244, and then enters the second chamber 245 through the filter element 247. In this process, the filter element 247 is cleaned, so that the solid waste attached to the filter element 247 is cleaned, and further avoids that a small amount of waste attached to the filter element 247 is sucked to the second power device 34 under the driving force provided by the second power device 34 when the cleaning of the cleaning element 22 is performed, and the second power device 34 is damaged. Further, when the preliminary sewage tank cleaning is needed, air and water can be injected into the clean water tank 23 at the same time, so that the fluid overflowed from the clean water tank 23 to the sewage tank 24 is a bubble liquid, which is equivalent to pressurizing the water, so as to further improve the impact force of flushing the filter element 247, and further effectively clean the solid dirt on the filter element 247. It is worth noting that the above-mentioned "purging state" and "preliminary sewage tank cleaning" operations can also be performed at the same time, for example, when there is still sewage in the sewage tank 24, air and water can be injected into the clean water tank 23 at the same time, so that the fluid overflowed from the clean water tank 23 to the sewage tank 24 is a bubble liquid, which can effectively improve the cleaning efficiency of the sewage tank 34.

[0212] In another aspect, when the second power device 34 applies negative pressure to the sewage tank 24 to extract the sewage in the recovery element 251, the filter element 247 can also prevent the particulate waste from entering the second power device 34 and affecting the service life of the second power device 34. At the same time, when the cleaning device 100 is turned upside down, the sewage in the second chamber 245 will flow towards the first chamber 244, and the filter element 247 can also prevent the particulate waste from entering the second power device 34 and affecting the service life of the second power device 34.

[0213] Further specifically, please refer to Figure 20 , Figure 22 and Figure 23In some embodiments, the sewage box 24 comprises a box body 248 and a cover body 249, the cover body 249 is arranged on the top wall of the box body 248, a through hole is arranged on the top wall of the box body 248, the second chamber 245 is formed in the box body 248, and the first chamber 244 is located in the space surrounded by the cover body 249 and the box body 248. This is one way of forming the first chamber 244 and the second chamber 245. Of course, the first chamber 244 and the second chamber 245 can also be formed in other ways, for example, the first chamber 244 is located in the cover body 249, the through hole is arranged on the bottom wall of the cover body 249, and the second chamber 245 is located in the space surrounded by the cover body 249 and the box body 248. For another example, the first chamber 244 is located in the cover body 249, the second chamber 245 is located in the box body 248, and the through hole is located at the joint of the cover body 249 and the box body 248.

[0214] Further, please refer to Figure 20 、 Figure 23 and Figure 25 In some embodiments, a sealing structure 2480 is arranged between the cover body 249 and the box body 248, and the sealing structure 2480 is used at least to surround the first chamber 244 between the cover body 249 and the box body 248, and the through hole is located in the area surrounded by the sealing structure 2480.

[0215] The sealing structure 2480 is a structure for preventing liquid from flowing out. In this disclosure, the first chamber 244 is surrounded by the sealing structure 2480, so that the liquid in the first chamber 244 is blocked by the sealing structure 2480 and cannot leak out. The sealing structure 2480 can be a sealing soft rubber or other structures that can play a sealing role. The "sealing structure 2480 is arranged between the cover body 249 and the box body 248" can be that only the cover body 249 is provided with the sealing structure 2480, and when the cover body 249 is combined with the box body 248, the sealing structure 2480 and the top plate of the box body 248 jointly surround the first chamber 244, at this time, the sealing structure 2480 can be a sealing ring or a convex rib; or only the box body 248 is provided with the sealing structure 2480, and when the cover body 249 is combined with the box body 248, the sealing structure 2480 and the top plate of the box body 248 jointly surround the first chamber 244, at this time, the sealing structure 2480 can also be a sealing ring or a convex rib; or the cover body 249 is provided with a first sealing structure 2481 (such as a sealing ring or a convex rib), the box body 248 is provided with a second sealing structure 2483, and the first sealing structure 2481 and the second sealing structure 2483 cooperate to surround the first chamber 244, as disclosed in Figure 25 , Figure 23 and Figure 25As shown, the first sealing structure 2481 can be a protrusion, and the second sealing structure 2483 can be a groove, the protrusion is inserted into the groove, and the protrusion and the groove are bonded by an adhesive. Of course, the first sealing structure 2481 can be a groove, and the second sealing structure 2483 can be a protrusion, the protrusion is inserted into the groove, and the protrusion and the groove are bonded by an adhesive. The through hole is located in the area surrounded by the sealing structure 2480, that is, the through hole is located in the range of the first chamber 244, or the through hole is located in the area surrounded by the protrusion and the groove. Thus, when the sealing structure 2480 is completely sealed around, the liquid in the first chamber 244 only flows downward and does not leak around; when the sealing structure 2480 is only opened at a specific position (such as the fluid inlet 2485 or the fluid outlet 2487 mentioned below), the liquid in the first chamber 244 has a tendency to flow downward and also has a tendency to flow from the fluid inlet 2485 to the fluid outlet 2487, and there is no liquid leakage in the area except the opening.

[0216] Please refer to Figure 19 to Figure 21 In some embodiments, the box 248 is further provided with a third chamber 246, the third chamber 246 is independent of the second chamber 245, and the third chamber 246 is in communication with the second power device 34. The top wall of the box 248 is provided with a third chamber inlet 2461 in communication with the third chamber 246, and the third chamber inlet 2461 is located in the first chamber 244. When the cleaning device 100 is in a state of washing the cleaning element 22, and the liquid level of the external liquid source of the fresh water box 23 supplying the fresh water box 23 exceeds the overflow outlet 235, the second power device 34 drives the liquid in the fresh water box 23 to overflow from the overflow outlet 235 to the first chamber 244, and then flows to the cleaning element 22 through the third chamber inlet 2461, the third chamber 246, the liquid outlet 242, and the second power device.

[0217] Wherein, "the third chamber 246 is independent of the second chamber 245" means that the third chamber 246 and the second chamber 245 are not directly communicated, since the first chamber 244 is communicated with the second chamber 245, the third chamber 246 can be indirectly communicated with the second chamber 245 through the first chamber 244. "The third chamber 246 is in communication with the second power device 34" specifically means that the third chamber outlet 2463 is in communication with the inlet of the second power device 34, thus, the "liquid outlet 242" is the third chamber outlet 2463, at this time, the aforementioned "third section of pipeline" can be omitted. The outlet of the second power device 34 is communicated with the squeegee 26 through a fourth section of pipeline, in the embodiment, the "fourth section of pipeline" is a passage in the sewage box 24, and the outlet thereof is the second outlet 333 communicated with the squeegee 26.

[0218] In the case that the cleaning device 100 is in the state of washing the cleaning piece 22, and the liquid level of the external liquid source of the water box 23 supplying the water box 23 exceeds the overflow outlet 235, the device control panel 50 controls the second power device 34 to open, and the second power device 34 drives the liquid in the water box 23 to overflow from the overflow outlet 235 to the first chamber 244, the liquid in the first chamber 244 enters the third chamber 246 through the third chamber inlet 2461, and then enters the second power device 34 from the third chamber outlet 2463, and then passes through the fourth section of the pipeline and reaches the water jet strip 26 from the second outlet 333, and finally is sprayed from the water outlet 261 of the water jet strip 26 to the cleaning piece 22 to wash the cleaning piece 22.

[0219] Further, please refer to Figure 20 , Figure 21 and Figure 25 , in some embodiments, the first chamber 244 is divided into a first sub-chamber 2441 and a second sub-chamber 2443 by a sealing structure 2480, the through hole O is located in the first sub-chamber 2441, and the third chamber inlet 2461 is located in the second sub-chamber 2443, the sealing structure 2480 is provided with a fluid outlet 2485 in communication with the first sub-chamber 2441, the sealing structure 2480 is provided with a fluid inlet 2487 in communication with the second sub-chamber 2443, and the fluid outlet 2485 and the fluid inlet 2487 are spaced apart and in fluid communication.

[0220] Among them, the cross-sectional outer contour of the sealing structure 2480 includes two closed (head-to-tail) annulars, the first annular corresponds to the first sub-chamber 2441, and the second annular corresponds to the second sub-chamber 2443. The "fluid outlet 2485" here is an opening for the liquid entering the first chamber 244 to flow, and the "fluid inlet 2487" is an opening for the liquid in the first chamber 244 to enter the second sub-chamber 2443. "Fluid communication" means that the liquid between the fluid outlet 2485 and the fluid inlet 2487 can flow between the fluid outlet 2485 and the fluid inlet 2487, usually from the fluid outlet 2485 to the fluid inlet 2487.

[0221] By separating the first chamber 244 into two independent sub-chambers (the first sub-chamber 2441 and the second sub-chamber 2443) by using the sealing structure 2480, and by setting the "fluid inlet 2487" and the "fluid outlet 2485" far apart, the fluid in the two first chambers 244 can only flow in the direction from the "fluid outlet 2485" to the "fluid inlet 2487". When the preliminary cleaning of the sewage box 24 is needed, the second power device 34 is closed. Since the second power device 34 is in communication with the second sub-chamber 2443, when the second power device 34 is closed, the second power device 34 will not generate suction force at the second sub-chamber 2443. The first sub-chamber 2441 and the second sub-chamber 2443 are isolated from each other by most of the sealing structure 2480, and are only in communication through the "fluid inlet 2487" and the "fluid outlet 2485" arranged at intervals, so that the liquid in the first sub-chamber 2441 is not easy to flow to the second sub-chamber 2443, thereby ensuring the amount of liquid flowing to the second chamber 245 when the sewage box 24 is preliminarily cleaned.

[0222] When the second power device 34 is in the activated state, since the first sub-chamber 2441 and the second sub-chamber 2443 are isolated from each other by most of the sealing structure 2480, and are only in communication through the "fluid inlet 2487" and the "fluid outlet 2485" arranged at intervals, the flow channel from the first sub-chamber 2441 to the second sub-chamber 2443 has a small cross-sectional area. For the fluid, the smaller the cross-sectional area of the flow channel, the greater the suction force generated, and it is easier to suck the fluid in the first sub-chamber 2441 to the second sub-chamber 2443. Therefore, when a large flow of liquid is needed to clean the cleaning element 22, the system can quickly respond and provide a large flow of liquid to clean the cleaning element 22 more quickly.

[0223] Please refer to Figure 7 , Figure 11 and Figure 14In some embodiments, the cleaning member 22 is a belt cleaning member, and the water outlet 261 of the water spraying strip 26 of the liquid channel system 30 is located at the front side of the cleaning member 22, and the recovery member 251 of the liquid channel system 30 is located at the rear side of the cleaning member 22 in the running direction Y of the cleaning device 100. It should be noted that the above-mentioned “front side” and “rear side” are relative, and in the embodiments of the present disclosure, the belt cleaning member generally comprises a mounting bracket and a mop 223, the mounting bracket comprises two spaced apart roller bodies, namely a front side roller body 221 and a rear side roller body 222, the two roller bodies are oppositely spaced apart, and the mop 223 is arranged around the outside of the mounting bracket, and the rotation of the two roller bodies can drive the mop 223 to rotate around the rotation axis X. The water outlet 261 of the water spraying strip 26 is located at the front side of the cleaning member 22, which means that the water outlet 261 of the water spraying strip 26 is close to the front side roller body 221 of the cleaning member 22, and the recovery member 251 is located at the rear side of the cleaning member 22, which means that the recovery member 251 is located at the rear side roller body 222 of the cleaning member 22. The clean water at the front side wets the cleaning member 22, and after contacting the dirt on the cleaning member 22, the clean water becomes dirty water and rotates to the rear side with the cleaning member 22, and then the dirty water can be scraped by the recovery member 251 and sucked into the dirty water box 24 by the second power device 34. On the one hand, when the cleaning device 100 is wiping the surface to be cleaned, the liquid on the cleaning member 22 can be kept in a relatively clean state, avoiding the accumulation of dirt that can cause the wiping to be not clean, thereby improving the cleaning effect on the surface to be cleaned. On the other hand, the dirty water formed on the cleaning member 22 can be efficiently recovered to the dirty water box 24 by the recovery member 251, and will not overflow onto the surface to be cleaned.

[0224] In addition, if the water spraying strip 26 is arranged directly above the cleaning member 22 or close to the rear side of the cleaning member 22, the distance between the water outlet 261 and the recovery member 251 is too close, and the clean water sprayed by the water outlet 261 has not been fully wetted on the mop 223, but is scraped by the scraping and dirtying part 2512 and enters the dirty water cavity 25115, resulting in that the mop 223 is not fully wetted, and finally affecting the cleaning effect of the cleaning member 22 on the surface to be cleaned. In the embodiments of the present disclosure, since the water outlet 261 of the water spraying strip 26 is located at the front side of the cleaning member 22, and the recovery member 251 is located at the rear side of the cleaning member 22, the distance between the water outlet 261 and the recovery member 251 is relatively far, and the clean water sprayed by the water outlet 261 needs a relatively long time to rotate to the scraping and dirtying part 2512, and at this time, the clean water has fully wetted the mop 223, thereby ensuring that the cleaning effect of the cleaning member 22 on the surface to be cleaned is better.

[0225] Further, please refer to the description of the above-mentioned figures Figure 15 to Figure 18The water strip 26 is provided with a flow channel having two inlet ends, one of which is communicated with the first outlet 313 for the fluid in the first channel 31 to enter the flow channel, and the other of which is communicated with the second outlet 333 for the fluid in the second channel 33 to enter the flow channel. The flow channel further has a plurality of outlet ends 260 which protrude towards the cleaning member 22 relative to the housing 21 for interference abutment with the cleaning member 22. The water outlet 261 is arranged on the side wall of the outlet end 260. The inlet ends and the outlet ends 260 of the flow channel can be meandering, for example, including a main flow channel and a plurality of branch flow channels, each of which includes at least two branches. As shown in the example of the present disclosure Figure 15 The flow channel of the water strip 26 includes a main flow channel and four branch flow channels, each of which includes two branches flowing to both sides, and the outlet ends 260 are the terminal ends of the fourth branch flow channels.

[0226] The outlet ends 260 protrude towards the cleaning member 22 relative to the housing 21 for interference abutment with the cleaning member 22, compared with the arrangement that the outlet ends 260 are spaced apart from the cleaning member 22, the outlet ends 260, the cleaning member 22 and the inner wall of the housing 21 of the present disclosure are more likely to be filled with liquid, and the liquid stays in the area for a longer time, and the cleaning member 22 can be more fully wetted. In addition, the water outlet 261 is arranged on the side wall of the outlet end 260, so that the direction S of the liquid sprayed from the water outlet 261 forms an angle with the rotation axis X of the cleaning member 22, compared with the arrangement that the water outlet is arranged directly above the cleaning member 22 (the direction of the liquid is perpendicular to the cleaning member 22), the water outlet 261 of the present disclosure has a wider spraying direction and a larger wetting area, thereby improving the wetting efficiency of the cleaning member 22. In addition, when the cleaning member 22 carrying dirt rotates, the movement trend of dust and garbage in the sewage is to move along the circumferential contour of the cleaning member 22. Arranging the water outlet 261 on the side wall of the outlet end 260 can prevent the dust and garbage in the sewage from being thrown to the water outlet 261, so that the water outlet 261 is not easy to be blocked, and the reliability of the whole machine is improved.

[0227] Please refer to Figure 2c to Figure 2e or attached Figure 2f to Figure 3bThe present disclosure also provides another cleaning device 100, which comprises a cleaning member 22 for wiping a surface to be cleaned and a liquid path system 30. The liquid path system 30 comprises a first chamber 244, a second chamber 245 and a second power device 34. The first chamber 244 is provided with a liquid inlet 241 for allowing liquid from an external liquid source to enter the first chamber 244 and a liquid outlet 242 for allowing liquid in the first chamber 244 to be discharged to the cleaning member 22. The second chamber 245 is configured to contain sewage, and is provided with a communication port 243 for allowing sewage on the cleaning member 22 to enter the second chamber 245. The second chamber 245 is separated from the first chamber 244 and is in fluid communication with the first chamber 244 through a through hole O. The highest allowable liquid level of the second chamber 245 is lower than the position of the through hole O. The second power device 34 is connected to the first chamber 244 and is configured to provide driving power for driving sewage on the cleaning member 22 to enter the second chamber 245 and to provide driving power for discharging liquid in the first chamber 244 to the cleaning member 22. When the cleaning device 100 is in a state of cleaning the surface to be cleaned, the second power device 34 is in an activated state to extract air in the first chamber 244 and the second chamber 245, so that the second chamber 245 is in a state of negative pressure, thereby driving the sewage on the cleaning member 22 to enter the second chamber 245. When the cleaning device 100 is in a state of cleaning the cleaning member 22, the first chamber 244 is connected to the external liquid source to supply liquid to the first chamber 244, and the second power device 34 is in the activated state to extract liquid in the first chamber 244 to the cleaning member 22.

[0228] The present embodiment is basically the same as the above-mentioned embodiments, except that the liquid path system 30 provided by the present embodiment is not limited to the source of liquid in the first chamber 244 being the water box 23. The liquid path system 30 can be configured such that the first chamber 244 of the cleaning device 100 is directly connected to the base station 200, and the liquid supply system 70 of the base station 200 directly supplies water to the first chamber 244. As long as the liquid source outside the first chamber 244 can supply liquid to the first chamber 244 when the cleaning member 22 needs to be cleaned, the present embodiment can be implemented. The specific implementation and effects of other structures of the present embodiment are the same as those of the above-mentioned embodiments in which the second power device 34 is used to collect sewage generated by the cleaning device 100 when the cleaning member 22 wipes the surface to be cleaned and to supply liquid to the cleaning member 22 at a high flow rate when the cleaning member 22 is cleaned. Therefore, the present embodiment will not be described in detail.

[0229] Similar to the above embodiment, the liquid path system 30 comprises the sewage box 24; the first chamber 244 and the second chamber 245 can be formed on the sewage box 24; in the state that the second power device 34 is closed, and the external liquid source supplies liquid to the first chamber 244, at least part of the liquid in the first chamber 244 is discharged into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245.

[0230] Figure 2f to Figure 3b The other structures and functions in the illustrated embodiment are the same as the above-mentioned embodiment in which the clean water box 23 overflows to the first chamber 244 and / or the second chamber 245, and specific reference can be made to the description of the above-mentioned embodiment, and the present embodiment will not be described again.

[0231] As Figure 7 to Figure 8 illustrated, the present embodiment also provides a cleaning device 100, comprising: a machine body 10, a cleaning member 22, and a liquid path system 30 provided by any of the above-mentioned embodiments, wherein the liquid path system 30 is arranged on the machine body 10.

[0232] Illustratively, the cleaning member 22 is a track-type cleaning member, and in the direction of travel Y of the cleaning device 100, the water outlet 261 of the water discharge strip 26 of the liquid path system 30 is located at the front side of the cleaning member 22, and the recovery member 251 of the liquid path system 30 is located at the rear side of the cleaning member 22.

[0233] It should be noted that the structure and function of the liquid path system 30 in the cleaning device 100 provided by the present embodiment are the same as those of the above-mentioned embodiments, and specific reference can be made to the specific description of the above-mentioned embodiments, and the present embodiment will not be described again.

[0234] As Figure 1 and Figure 2b to Figure 2f illustrated, the present embodiment also provides a base station 200 for maintaining the cleaning device 100 provided by the above-mentioned embodiments. The base station 200 is provided with a liquid supply system 70 for supplying liquid.

[0235] Illustratively, the clean water box 23 is provided with a liquid supplement port 231, and the base station 200 is provided with a docking port 63 in communication with the liquid supply system 70, the docking port 63 is used for docking communication with the liquid supplement port 231, in the state that the cleaning device 100 is parked at the base station 200 and the docking port 63 is docked in communication with the liquid supplement port 231, the liquid supply system 70 of the base station 200 supplies liquid to the clean water box 23 of the cleaning device 100, and in the case that the liquid supply system 30 supplies liquid to the clean water box 23 to a liquid level exceeding the overflow port 235, the liquid in the clean water box 23 overflows to the second passage 33.

[0236] The present embodiment also provides a cleaning system 1000, comprising: a cleaning device 100 provided by the above-mentioned embodiments; and / or a base station 200 provided by any of the above-mentioned embodiments, the base station 200 is used for maintaining the cleaning device 100.

[0237] It should be noted that the structure and function of the liquid path system 30 in the cleaning system 1000 provided by the embodiments of the present disclosure are the same as those of the above-mentioned embodiments, and specific descriptions can be made with reference to the specific descriptions of the above-mentioned embodiments. The present embodiment will not be described again.

[0238] In a third aspect, at present, the liquid path system of the cleaning device usually has a clean water box. When the cleaning device is in the state of wiping the surface to be cleaned, the liquid in the clean water box is used to provide cleaning liquid (usually water) for the cleaning element, and the cleaning element moves to realize wiping the surface to be cleaned with the cleaning liquid. With the execution of the wiping task of the cleaning device, more and more dirty water will accumulate on the cleaning element. In order to avoid the dirty water affecting the cleaning effect in the subsequent wiping task, some cleaning devices add a dirty water box to recycle the dirty water formed by wiping the surface to be cleaned. However, because the recycled dirty water is stored in the dirty water box for a long time, some garbage will adhere to the side wall or corner of the dirty water box or bacteria will breed, and the dirty water box needs to be manually disassembled and cleaned, which is time-consuming and laborious. In order to solve the above-mentioned problems, the present disclosure provides a cleaning device 100 (as shown in Figure 4a and Figure 4b ) and a cleaning system 1000 (as shown in Figure 1 , Figure 4c , Figure 4d and Figure 4e ).

[0239] Please refer to Figure 1 , the cleaning system 1000 provided by the present disclosure includes the cleaning device 100 of any one of the following embodiments and the base station 200 of any one of the following embodiments. Wherein the definition and function explanation of the cleaning device 100 and the base station 200 are the same as the definition and function explanation of the cleaning device 100 and the base station 200 in the first aspect, which will not be described here.

[0240] The cleaning device 100 will be described in detail below in combination with the accompanying Figure 1 , Figure 3a to Figure 3d , Figure 4a to Figure 4e , Figure 7 to Figure 13 , Figure 19 to Figure 21 and Figure 26 . It should be noted that the explanation of each element in the third aspect cleaning system 1000 can be referred to the explanation of each element in the second aspect cleaning system 1000. In the following embodiments, only the differences from the first aspect cleaning system 1000 and the effects of the corresponding embodiments will be further explained and described.

[0241] Please refer to Figure 4a to Figure 4eThe cleaning device 100 of an embodiment of the present disclosure comprises a cleaning member 22 for wiping a surface to be cleaned and a liquid path system 30. The liquid path system 30 of the cleaning device 100 comprises a clean water tank 23 and a dirty water tank 24. The clean water tank 23 is provided with an overflow outlet 235. The dirty water tank 24 is provided with a liquid inlet 241 in communication with the overflow outlet 235, the liquid inlet 241 is arranged at a position higher than the highest allowable liquid level of the dirty water tank 24. The dirty water tank 24 is configured to collect the dirty water generated by the cleaning member 22. In the case that the clean water tank 23 is supplied with liquid from an external liquid source to a liquid level exceeding the overflow outlet 235, the liquid overflowing from the overflow outlet 235 of the clean water tank 23 enters the dirty water tank 24 through the liquid inlet 241 to flush the dirty water tank 24.

[0242] In the present disclosure, the “highest allowable liquid level” of the dirty water tank 24 refers to the full liquid level of the dirty water tank 24 set by the manufacturer, for example, when the amount of dirty water contained in the dirty water tank 24 exceeds the set full liquid level, the user can be prompted that the dirty water tank 24 is full. Alternatively, the highest liquid level that can be contained in the internal space of the dirty water tank 24, for example, the topmost position of the tank body of the dirty water tank 24.

[0243] Please refer to Figure 11 to Figure 13 In some embodiments, the liquid path system 30 and / or the cleaning module 20 can further comprise a recovery member 251, which can comprise a dirty scraping portion 2512 and a dirty storage cavity 25115. The dirty scraping portion 2512 is configured to abut against the cleaning member 22 to scrape the dirt on the cleaning member 22 into the dirty storage cavity 25115. The dirty water in the dirty storage cavity 25115 can enter the dirty water tank 24 through a communication conduit 255 for storage, thereby achieving the self-cleaning function of the cleaning member 22.

[0244] The external liquid source of the clean water tank 23 includes but is not limited to the liquid supply system 70 of the base station 200 Figure 4c 、 Figure 4d and Figure 4e), a water supply system in a house, and an outdoor water supply system, and even another clean water box in the cleaning device 100, etc. The liquid supply system 70 is a system for providing liquid to the cleaning device 100 in the base station 200. The liquid provided by the external liquid source includes but is not limited to clean water and cleaning liquid, which is a mixture of clean water and cleaning agent. When the external liquid source of the clean water box 23 is the liquid supply system 70 of the base station 200, the cleaning device 100 is docked with the base station 200, and in an embodiment, only one docking port 63 can be provided on the base station 200, which can be docked and communicated with one opening (for example, the "liquid supplement port 231" mentioned below) on the clean water box 23 to realize the transmission of various fluids (liquid, gas, and gas-liquid mixture mentioned below) to the clean water box 23 through the same docking port 63 and the same liquid supplement port 231. In another embodiment, at least two docking ports 63 can be provided on the base station 200, which can be docked and communicated with at least two openings on the clean water box 23, respectively, to form multiple transmission paths, each of which can transmit fluids of different properties to the clean water box 23.

[0245] The cleaning device 100 and the cleaning system 1000 of the embodiment can recycle the sewage formed by the cleaning element 22 by providing the sewage box 24, and the cleaning of the sewage box 24 does not need to be manually cleaned by disassembling the sewage box 24, but when the external liquid source supplies liquid to the clean water box 23, the liquid overflowing from the overflow port 235 of the clean water box 23 is used to flush the sewage box 24, realizing automatic flushing of the sewage box 24, which is efficient, convenient, time-saving and labor-saving, and can avoid bacterial growth. Further, during the process of supplementing clean water to the clean water box 23 by the external liquid source (the base station 200 or other water supply system), the process of flushing the sewage box 24 can be continued by prolonging the time of supplementing clean water to the clean water box 23, and the cleaning system 1000 does not need to design two control logics to control the opening and closing of the clean water supplement link and the sewage discharge link, simplifying the software control logic. Moreover, compared with directly supplying liquid to the sewage box 24 to clean it by the external liquid source, the liquid used to flush the sewage box 24 in the disclosure is derived from the liquid overflowing from the overflow port 235 of the clean water box 23, so it is not necessary to provide another interface on the external liquid source (for example, the base station 200) for docking with the sewage box 24, and only one interface for docking with the clean water box 23 needs to be designed, which reduces the number of interfaces for docking the cleaning device 100 with the external liquid source, and improves the docking reliability.

[0246] Please refer to Figure 4a , Figure 4b , Figure 4c , Figure 4d , and Figure 4eIn some embodiments, the sewage box 24 is provided with a liquid inlet 241 and a communication port 243. The liquid inlet 241 is in communication with the overflow port 235. The liquid inlet 241 is arranged at a height higher than that of the communication port 243; wherein, when the cleaning device 100 is in a state of mopping the surface to be cleaned, the sewage on the cleaning member 22 flows into the sewage box 24 from the communication port 243; and when the cleaning device 100 is in a sewage discharge state, the sewage in the sewage box 24 flows out of the sewage box 24 from the communication port 243.

[0247] Please refer to Figure 9 to Figure 13 In some embodiments, the sewage-containing cavity 25115 extends along the rotation axis direction X of the cleaning member 22, one end of the length direction X of the sewage-containing cavity 25115 is provided with a first sewage outlet 25116, the other end of the length direction X of the sewage-containing cavity 25115 is provided with a second sewage outlet 25117, one end of the communication pipeline 255 is in communication with the communication port 243, and the other end is in communication with the first sewage outlet 25116. The second sewage outlet 25117 can be provided with a control structure 25183 for conducting the inside of the sewage-containing cavity 25115 with the outside when the cleaning device 100 is in a sewage discharge state. The cleaning device 100 has at least a state of mopping the surface to be cleaned and a sewage discharge state. The liquid path system 30 and / or the cleaning module 20 further comprises a water supply strip 26 for supplying liquid to the cleaning member 22. When the cleaning device 100 is in a state of mopping the surface to be cleaned, the water supply strip 26 supplies clean water to the cleaning member 22 through the water spraying port 261 to wet the cleaning member 22, and the clean water becomes sewage after contacting the dirt on the cleaning member 22 and is rotated to the recovery member 251, and the dirt on the cleaning member 22 is scraped and recovered by the scraping part 2512 of the recovery member 251. When the sewage box 24 is under negative pressure, the sewage in the recovery member 251 is sequentially sucked into the sewage box 24 through the first sewage outlet 25116, the communication pipeline 255 and the communication port 243. On the one hand, when the cleaning device 100 is mopping the surface to be cleaned, the scraping and recovery of the sewage on the cleaning member 22 by the scraping part 2512 enables the liquid on the cleaning member 22 to remain in a relatively clean state, avoiding the accumulation of dirt resulting in unclean mopping, and improving the cleaning effect on the surface to be cleaned. On the other hand, the sewage formed on the cleaning member 22 can be efficiently recovered to the sewage box 24 by the recovery member 251, and will not overflow onto the surface to be cleaned. When the cleaning device 100 is in a sewage discharge state, a positive pressure gas is supplied to the sewage box 24, the positive pressure gas extrudes the sewage in the sewage box 24 outward to discharge it into the sewage-containing cavity 25115 through the communication port 243, the communication pipeline 255 and the first sewage outlet 25116. Then, the control 25183 conducts the second sewage outlet 25117 with the outside, and the sewage in the sewage-containing cavity 25115 is discharged to the base station 200 through the second sewage outlet 25117, thereby realizing the sewage discharge of the cleaning device 100.

[0248] In some other embodiments, the wastewater box 23 of the cleaning device 100 may have a wastewater outlet (not shown) connected to the base station 200. This outlet can be connected to the base station 200's wastewater tank. After the cleaning device 100 returns to the base station 200, the base station 200 can first extract the wastewater formed in the wastewater box 24 after cleaning the surface to be cleaned into its wastewater tank. Then, the base station 200's liquid supply system 70 supplies liquid to the clean water box 23 of the cleaning device 100. The liquid in the clean water box 23 overflows into the wastewater box 24 to rinse it. Subsequently, the base station 200 extracts the relatively clean wastewater from the wastewater box 24 into its wastewater tank. In other words, this embodiment does not limit the method by which wastewater is discharged from the wastewater box 24 of the cleaning device 100; those skilled in the art can choose the appropriate method as needed.

[0249] Please see Figure 4a , Figure 4b , Figure 4c , Figure 4d , Figure 4e , Figure 9 and Figure 10 In some embodiments, the wastewater box 24 is connected to a second power unit 34. When the cleaning equipment 100 is cleaning the surface to be cleaned, the second power unit 34 is in the open state and draws negative pressure into the wastewater box 24 to provide power to draw wastewater from the cleaning component 22 into the wastewater box 24. When the cleaning equipment 100 is in the sewage discharge state, the second power unit 34 is in the closed state and positive pressure gas is supplied to the wastewater box 24 through the base station 200 to provide power to discharge the wastewater in the wastewater box 24 to the outside of the wastewater box 24. Alternatively, the second power unit 34 is in the open state and positive pressure gas is supplied into the wastewater box 24 to provide power to discharge the wastewater in the wastewater box 24 to the outside of the wastewater box 24.

[0250] Corresponding to the arrangement of the second power unit 34, the sewage box 24 is also provided with a drain port 242. The shape and size of the drain port 242 can be arbitrarily set, and this disclosure does not limit it. The liquid, gas or gas-liquid mixture in the sewage box 24 can flow out to the external pipeline through the drain port 242.

[0251] The second power unit 34 is connected to the drain port 242 and is used to provide driving power to propel the wastewater on the cleaning component 22 into the wastewater box 24. That is, the second power unit 34 functions as an air pump, capable of creating negative pressure inside the wastewater box 24 to draw the wastewater scraped from the cleaning component 22 into the wastewater box 24. Furthermore, the cleaning equipment 100 may also include an equipment control panel 50, please refer to... Figure 3aIn the case that the cleaning device 100 is in the state of cleaning the surface to be cleaned, the device control board 50 controls the second power device 34 to open and draw negative pressure in the sewage box 24, and the sewage scraped on the cleaning element 22 into the recovery element 251 is sequentially drawn into the sewage box 24 through the first sewage port 25116, the communication pipeline 255 and the communication port 243 to realize the sewage suction operation. In the case that the cleaning device 100 is in the sewage discharge state, one embodiment is that the base station 200 further comprises a gas source system 80 (as shown in Figure 4c 、 Figure 4d and Figure 4e ), the device control board 50 controls the second power device 34 to close, the gas source system 80 of the base station 200 supplies the sewage box 24 with positive pressure gas, the positive pressure gas extrudes the sewage in the sewage box 24 outward to make it discharge into the sewage containing cavity 25115 through the communication port 243, the communication pipeline 255 and the first sewage port 25116. Then, the device control board 50 controls the control structure 25183 to open the second sewage port 25117 to the outside, and the sewage in the sewage containing cavity 25115 is discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning device 100. Another embodiment is that the device control board 50 controls the second power device 34 to open, and supplies the sewage box 24 with positive pressure gas, the positive pressure gas extrudes the sewage in the sewage box 24 outward to make it discharge into the sewage containing cavity 25115 through the communication port 243, the communication pipeline 255 and the first sewage port 25116. Then, the device control board 50 controls the control structure 25183 to open the second sewage port 25117 to the outside, and the sewage in the sewage containing cavity 25115 is discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning device 100.

[0252] Please refer to Figure 4e 、 Figure 3a and Figure 3c In some embodiments, the sewage box 24 is provided with a filter element 247, the filter element 247 is used to block the solid garbage in the sewage box 24 from entering the second power device 34, and the liquid overflowing from the overflow port 235 of the clean water box 23 can at least flush the filter element 247 to clean the filter element 247.

[0253] Further, please refer to Figure 4e 、 Figure 3a and Figure 3cIn some embodiments, the sewage box 24 comprises a first chamber 244 and a second chamber 245, the second chamber 245 is configured to contain sewage, the first chamber 244 and the second chamber 245 are separated from each other and are in fluid communication through a through hole O, the highest allowable liquid level of the second chamber 245 is lower than the position of the through hole O, the through hole O is provided with a filter 247, the second power device 34 is in communication with the first chamber 244, the liquid inlet 241 is arranged at the first chamber 244, the communication port 243 is arranged at the second chamber 245, and the filter 247 is configured to block at least part of solid waste in the second chamber 245 from entering the first chamber 244. In one example, in the height direction Z of the sewage box 24, the first chamber 244 is located above the second chamber 245, and the through hole O is located at the top wall of the second chamber 245.

[0254] Referring to Figure 3d When the cleaning device 100 performs the flushing of the sewage box 24, the external liquid source of the base station 200 is the liquid supply system 70 of the base station 200. The base station 200 can also be provided with a gas source system 80. When the base station 200 is docked with the cleaning device 100 and the second power device 34 is in the closed state, the base station 200 provides the gas-liquid mixture to the sewage box 24 through the liquid supply system 70 and the gas source system 80 to at least flush the filter 247. The gas source system 80 is configured to output gas and communicate with the clean water box 23 when the base station 200 is docked with the cleaning device 100. The gas output by the gas source system 80 of the base station 200 can mix with the liquid in the clean water box 23 to form a mixture and flow into the sewage box 24. In other embodiments, the gas source system 80 of the base station 200 can directly communicate with the sewage box 24 when the base station 200 is docked with the cleaning device 100. The gas output by the gas source system 80 of the base station 200 can mix with the liquid entering the sewage box 24 to form a gas-liquid mixture to flush the sewage box 24.

[0255] Specifically, when the liquid supply system 70 of the base station 200 and the gas source system 80 of the base station 200 simultaneously provide liquid and gas to the cleaning device 100, the gas and the liquid mix to form a gas-liquid mixture, which can provide the gas-liquid mixture (bubble liquid) to the sewage box 24. The mixing process of the gas and the liquid to form the gas-liquid mixture occurs at the same position as before. In the process of flushing the filter 247 with the gas-liquid mixture, the gas-liquid mixture (bubble liquid) is equivalent to pressurizing the liquid. Compared with flushing the filter 247 only with the liquid, the flushing force of the bubble liquid on the filter 247 is greater, and the flushing efficiency and effect are better.

[0256] Referring to Figure 4a , Figure 4b , Figure 4c , Figure 4d and Figure 4eFurther, in some embodiments, the cleaning device 100 further comprises a dirtiness detection sensor 28 electrically connected with the device control board 50, the dirtiness detection sensor 28 being configured to detect a dirtiness degree of the sewage on the sewage recovery path. The device control board 50 is electrically connected with the dirtiness detection sensor 28, and in the case that the cleaning device 100 is docked with the base station 200, the device control board 50 is configured to control the fluid parameter and the supply strategy of the fluid provided to the sewage box 24 according to the dirtiness degree detected by the dirtiness detection sensor 28.

[0257] In the embodiments of the present disclosure, the dirtiness degree of the sewage on the sewage recovery path is detected by the dirtiness detection sensor 28 first, and then the type and the supply strategy of the fluid provided to the sewage box 24 are determined based on the dirtiness degree of the sewage, so that the supply of the fluid in the sewage box 24 can be dynamically adjusted based on the actual cleaning situation, avoiding the extreme situation of supplying too much or too little, and improving the intelligence of the cleaning device 100.

[0258] In some embodiments, when the fluid is a liquid, the fluid parameter further comprises the pressure of the liquid, the flow rate of the liquid, and the supply duration of the liquid, etc. Correspondingly, the device control board 50 is configured to determine the fluid parameter and the supply strategy of the fluid provided to the sewage box 24 according to the dirtiness degree detected by the dirtiness detection sensor 28, which can specifically include:

[0259] When the dirtiness degree of the sewage is greater than the first preset dirtiness degree threshold and less than or equal to the second preset dirtiness degree threshold, the device control board 50 determines to first provide the positive pressure gas to the second chamber 245 to perform sewage discharge on the sewage box 24, and then provide the liquid to the sewage box 24 to perform flushing on the sewage box 24, and determine at least one of the pressure of the liquid, the flow rate of the liquid, and the supply duration of the liquid according to the dirtiness degree of the sewage.

[0260] In the present embodiment, according to the detection result detected by the dirt detection sensor 28, when it is determined that the dirt degree of the sewage is in a stage requiring the sewage box 24 to be flushed, the sewage box 24 is first provided with the positive pressure gas to perform the sewage discharge on the sewage box 24, and then the sewage box 24 is provided with the liquid to flush the sewage box 24, instead of only discharging the sewage, so that the sewage box 24 can be cleaned immediately, and the problem of dirt wall-hanging or accumulation due to long-term non-cleaning of the sewage box 24, which requires the user to manually disassemble and clean, is avoided. At the same time, during the process of providing the sewage box 24 with the liquid to flush the sewage box 24, at least one of the pressure of the liquid, the flow rate of the liquid, and the supply time length of the liquid is determined according to the dirt degree of the sewage. Compared with the flushing of the sewage box 24 by using the fixed pressure of the liquid, the fixed flow rate of the liquid, and the fixed supply time length of the liquid, the flushing of the present embodiment is more in line with the actual needs, avoids the problem of large energy consumption and waste of resources caused by excessively large parameters, and also avoids the problem of incomplete cleaning caused by excessively small parameters. In other words, the parameters of the present embodiment are determined based on the dirt degree of the sewage, which can save energy and resources and ensure the cleaning effect.

[0261] In some embodiments, when the fluid is a liquid, the fluid parameters further include the pressure of the liquid, the flow rate of the liquid, and the supply time length of the liquid, etc.; and when the fluid is a gas-liquid mixture, the fluid parameters further include the pressure of the gas-liquid mixture, the flow rate of the gas-liquid mixture, the supply time length of the gas-liquid mixture, the ratio of the gas and the liquid, etc. Correspondingly, the device control board 50 is configured to determine the fluid parameters and the supply strategy of the fluid provided to the sewage box 24 according to the dirt degree detected by the dirt detection sensor 28, and the determination of the fluid parameters and the supply strategy of the fluid provided to the sewage box 24 according to the dirt degree detected by the dirt detection sensor 28 can further include:

[0262] When the dirt degree of the sewage is greater than the second preset dirt degree threshold, the device control board 50 determines to first provide the sewage box 24 with the gas-liquid mixture to flush the filter 247, and to determine at least one of the pressure of the gas-liquid mixture, the flow rate of the gas-liquid mixture, the supply time length of the gas-liquid mixture, and the ratio of the gas and the liquid according to the dirt degree of the sewage, then to provide the sewage box 24 with the positive pressure gas to perform the sewage discharge on the sewage box 24, and finally to provide the liquid to flush the sewage box 24, and to determine at least one of the pressure of the liquid, the flow rate of the liquid, and the supply time length of the liquid according to the dirt degree of the sewage.

[0263] In the embodiment of the present disclosure, according to the detection result detected by the dirt detection sensor 28, it is determined that the dirt degree of the sewage is in a stage requiring the filter element 247 to be flushed first, and then the filter element 247 is provided with the bubble liquid to flush the filter element 247, so that the problem that the sewage box 24 is cleaned with liquid only, and due to the fact that the holes of the filter element 247 are blocked by dirt, the liquid cannot pass through the filter element 247 to enter the sewage box 24 and is wasted from the liquid outlet 242, and the sewage box 24 is not cleaned. At the same time, in the process of providing the sewage box 24 with the bubble liquid to flush the filter element 247, at least one of the pressure of the gas-liquid mixture, the flow of the gas-liquid mixture, the supply time of the gas-liquid mixture, and the ratio of the gas and the liquid is determined according to the dirt degree of the sewage. Compared with using fixed parameter values to perform flushing, the flushing of the filter element 247 in the embodiment is more in line with the actual needs, avoids the problem of large energy consumption and waste of resources caused by too large parameters, and also avoids the problem of incomplete cleaning caused by too small parameters. In other words, the parameters in the embodiment are determined based on the dirt degree of the sewage, which can save energy and resources, and also ensure the cleaning effect.

[0264] Further, please refer to FIG. 2, Figure 19 to Figure 21 In some embodiments, the sewage box 24 is provided with a stirring device 35, and when the cleaning device 100 is in the sewage discharge state, the stirring device 35 stirs the sewage in the sewage box 24. Specifically, the top wall of the sewage box 24 is provided with a driving device 36, the stirring device 35 is connected to the driving device 36, and the rotating shaft of the stirring device 35 extends from the top wall of the sewage box 24 into the sewage box 24. The device control panel 50 is electrically connected with the driving device 36 and is used to control the working of the driving device 36.

[0265] The stirring device 35 is a device that generates stirring force by rotating to stir the sewage in the sewage box 24. Generally, the stirring device 35 includes a rotating shaft and an impeller arranged on the rotating shaft. The driving device 36 is a driving structure for driving the stirring device 35 to rotate, and generally includes a motor and a transmission structure (including but not limited to gears, racks, belts, pulleys, etc.). The transmission structure is in transmission connection with the motor and the rotating shaft, respectively. The motor drives the rotating shaft to rotate through the transmission structure, and the rotating shaft drives the impeller to rotate to stir the sewage in the sewage box 24. Since the sewage box 24 stores sewage, the sewage will deposit a lot of large-particle garbage or hang on the wall. When the cleaning device 100 is in the sewage discharge state (the second power device 34 and / or the gas source system 80 supplies positive pressure gas to the sewage box 24), the stirring device 35 stirs the sewage in the sewage box 24, which can destroy the accumulation state and the hanging state of the large-particle garbage. The large-particle garbage will float and disperse, and the dispersed large-particle garbage is more likely to flow out of the communication port 243, enter the sewage storage cavity 25115 through the first sewage port 25116, and finally be discharged to the outside of the cleaning device 100 through the second sewage port 25117, thereby improving the sewage discharge efficiency and effect.

[0266] In some embodiments, the sewage box 24 is provided with an anti-backflow device 37. In other embodiments, the anti-backflow device 37 is arranged on the connecting pipeline 334 through which the clean water box 23 and the sewage box 24 are communicated. In still other embodiments, the sewage box 24 is provided with the anti-backflow device 37, and the connecting pipeline 334 through which the clean water box 23 and the sewage box 24 are communicated is also provided with the anti-backflow device 37. The anti-backflow device 37 is used to hinder the sewage in the sewage box 24 from entering the clean water box 23 through the liquid inlet 241. For example, the anti-backflow device 37 is a one-way valve.

[0267] Please also refer to FIG. 2, Figure 19 to Figure 21 In some embodiments, the sewage box 24 is provided with a water fullness detection device 38. The water fullness detection device 38 is used to trigger when the liquid level in the sewage box 24 reaches a set liquid level.

[0268] Specifically, the water full detection device 38 comprises a guide column 381, a floating member 383, and a sensing member 385. The floating member 383 is arranged in the sewage box 24, and the floating member 383 is provided with a detection member 3831. The guide column 381 is connected to the top wall of the sewage box 24, the floating member 383 is sleeved outside the guide column 381, and the end of the guide column 381 away from the top wall of the sewage box 24 is provided with a limiting portion 3811 for preventing the floating member 383 from coming out of the guide column 381. The sensing member 385 is arranged on the wall surface of the sewage box 24 and is used for sensing the position of the detection member 3831. When the liquid level in the sewage box 24 reaches a set liquid level, the detection member 3831 will rise to a predetermined height along with the floating member 383, the sensing member 385 can sense that the detection member 3831 has reached the predetermined height, and the water full detection device 38 will be triggered, that is, the water full detection device 38 outputs a water full signal to the equipment controller 50, and the equipment controller 50 can control the cleaning equipment 100 to return to the preset position mentioned above to automatically discharge sewage, or send a prompt signal to remind the user to manually control the discharge of sewage. In this way, the user's cleaning burden can be reduced, because the sewage in the sewage box 24 does not overflow to the to-be-cleaned surface which has not been wiped or has been wiped.

[0269] The above embodiments will be described in combination with some specific application scenarios.

[0270] A user purchases a sweeping and mopping integrated robot (the cleaning equipment 100), and a balcony is planted with many plants, and the ground is often contaminated with some soil. By starting the sweeping and mopping integrated robot to perform a task of sweeping first and mopping later on the balcony, the robot sweeps large pieces of soil into the dust box, and the rear mopping cleaning member 22 wipes the swept ground. Since the swept ground still has some dust and soil, the robot's sewage box 24 collects the generated sewage during the mopping process, and the sewage contains a large amount of soil, so that a large amount of soil is left on the cavity wall of the sewage box 24. Subsequently, the robot returns to the base station 200, the sewage discharge link of the sewage box 24 is opened, the original stored sewage in the sewage box 24 is discharged to the base station 200, the base station 200 supplies water to the water tank 23 of the robot, and the water level in the water tank 23 reaches the preset overflow outlet 235 and then overflows to the sewage box 24 to flush the remaining soil in the sewage box 24. In this way, the water tank 23 has been refilled, and the sewage box 24 has also been cleaned, and the user does not need to manually clean the sewage box 24, which is very time-saving and labor-saving. In addition, the cleaning equipment 100 of the embodiment of the present disclosure can also automatically supply liquid to the cleaning member 22 during the cleaning of the to-be-cleaned surface to keep the cleaning member 22 in a wet state.

[0271] Please refer to Figure 4a to Figure 4e 、 Figure 8 to Figure 10 In some embodiments, the liquid path system 30 further comprises a first passage 31 and a first power device 32.

[0272] In some embodiments, the first power device 32 comprises a peristaltic pump. Generally, the flow rate of a peristaltic pump is small, and is suitable for occasions where precise control of flow rate is required. In the embodiments of the present disclosure, the first power device 32 is arranged in the first passage 31, and is used to drive the liquid in the clean water box 23 to flow out to the cleaning member 22 when the cleaning device 100 is cleaning the surface to be cleaned, so that the cleaning member 22 is wetted to better wipe the surface to be cleaned. Therefore, in this scenario, the flow rate of the first power device 32 required is small, so that the amount of liquid supplied to the cleaning member 22 can be more accurately controlled, and excessive water stains can be avoided on the surface to be cleaned when wiping the surface to be cleaned. Therefore, the peristaltic pump with small flow rate and accurate control of flow rate is selected as the first power device 32, which can better meet the requirements of the cleaning device 100 for wiping the surface to be cleaned. Of course, in other embodiments, the first power device 32 can also be a water pump with small flow rate, and the present disclosure is not particularly limited.

[0273] When the cleaning device 100 is in the state of wiping the surface to be cleaned, the device control board 50 controls the first power device 32 to be turned on, and the first power device 32 drives the liquid in the clean water box 23 to flow from the liquid outlet 233 into the first passage 31, and then to flow out from the first outlet 313 to the water wiping strip 26, and then to be supplied to the cleaning member 22 through the water wiping strip 26.

[0274] The cleaning device 100 of the embodiments of the present disclosure can also be provided with a large flow rate of liquid by an external liquid source (for example, the liquid supply system of the base station 200) to clean the cleaning member 22 with a large flow rate. Please refer to Figure 4b 、 Figure 4d 、 Figure 8 to Figure 10 In some embodiments, the liquid path system 30 further comprises a second passage 33. The dirty water box 24 and the second power device 34 are both arranged on the second passage 33.

[0275] The cleaning device 100 further comprises a state of cleaning the cleaning member 22, such as Figure 3bAs shown, when the cleaning device 100 is in the state of cleaning the cleaning element 22, the liquid in the water tank 23 is supplied by the external liquid source of the water tank 23, so that the liquid level of the water tank 23 exceeds the overflow outlet 235, and the liquid in the water tank 23 overflows from the overflow outlet 235 to the second passage 33, and then flows out from the second outlet 333 to the water strip 26, and then is discharged to the cleaning element 22 through the water strip 26, so as to clean the cleaning element 22. At this time, the device control panel 50 can control the first power device 32 to be opened or closed. It should be noted that, in the case that the cleaning module 20 does not provide the water strip 26: when the cleaning device 100 is in the state of wiping the surface to be cleaned, the liquid flowing out from the first outlet 313 of the first passage 31 can be directly supplied to the cleaning element 22, and when the cleaning device 100 is in the state of cleaning the cleaning element 22, and the external liquid source of the water tank 23 supplies the water tank 23 with liquid to a liquid level exceeding the overflow outlet 235, the liquid flowing out from the second outlet 333 of the second passage 33 can also be directly supplied to the cleaning element 22.

[0276] The liquid path system 30, the cleaning device 100 and the cleaning system 1000 of the present disclosure are provided with the first passage 31 and the second passage 33 which are both in communication with the water tank 23, when the cleaning device 100 is in the state of wiping the surface to be cleaned, the first power device 32 drives the liquid in the water tank 23 to supply the cleaning element 22 with liquid through the first passage 31, so as to supplement the liquid for wiping the surface to be cleaned, and keep the cleaning element 22 in a wet state when the cleaning device 100 is wiping the surface to be cleaned; when the cleaning device 100 is in the state of cleaning the cleaning element 22, and the external liquid source of the water tank 23 supplies the water tank 23 with liquid to a liquid level exceeding the overflow outlet 235, the liquid overflows from the overflow outlet 235 to the second passage 33, and then is supplied to the cleaning element 22 through the second passage 33, so as to clean the cleaning element 22. Since the cleaning element 22 only needs to be kept wet when wiping the surface to be cleaned, the flow rate of the first power device 32 can be small, and when cleaning the cleaning element 22, the water tank 23 can overflow to supply the cleaning element 22 with liquid, so as to meet the demand for large flow rate of liquid supplied to the cleaning element 22 when cleaning the cleaning element 22. Therefore, a power device with adjustable flow rate is not needed to adjust the flow rate of the liquid supplied to the cleaning element 22, and the cost of the liquid path system 30 is reduced.

[0277] Further, the second power device 34 can also function as a water pump, at this time, the second power device 34 can be a water and air dual-purpose pump, and is also used to provide driving power for discharging the liquid in the water tank 23 to the second passage 33. That is, the second power device 34 can meet the demand for collecting the sewage generated by the cleaning element 22 when cleaning the surface to be cleaned, and the demand for large flow rate of liquid when cleaning the cleaning element 22.

[0278] Figure 3aAs shown, when the cleaning device 100 is in the state of cleaning the surface to be cleaned, the second power device 34 is in the starting state. Since the second power device 34 is connected with the liquid outlet 242, i.e. the second power device 34 is in communication with the first chamber 244, and the first chamber 244 and the second chamber 245 are in fluid communication through the through hole O, when the second power device 34 is pumping, the air in the second chamber 245 flows through the first chamber 244 through the through hole O, and is discharged from the liquid outlet 242 together with the air in the first chamber 244, so as to realize the function of the second power device 34 pumping the air in the first chamber 244 and the second chamber 245, so as to make the second chamber 245 in the state of negative pressure, thereby driving the sewage on the cleaning element 22 into the second chamber 245. In this way, the second power device 34 realizes the function of the cleaning device 100 collecting the sewage generated by the cleaning element 22 when cleaning the surface to be cleaned.

[0279] As shown, when the cleaning device 100 is in the state of cleaning the surface to be cleaned, the second power device 34 is in the starting state. Since the second power device 34 is connected with the liquid outlet 242, i.e. the second power device 34 is in communication with the first chamber 244, and the first chamber 244 and the second chamber 245 are in fluid communication through the through hole O, when the second power device 34 is pumping, the air in the second chamber 245 flows through the first chamber 244 through the through hole O, and is discharged from the liquid outlet 242 together with the air in the first chamber 244, so as to realize the function of the second power device 34 pumping the air in the first chamber 244 and the second chamber 245, so as to make the second chamber 245 in the state of negative pressure, thereby driving the sewage on the cleaning element 22 into the second chamber 245. In this way, the second power device 34 realizes the function of the cleaning device 100 collecting the sewage generated by the cleaning element 22 when cleaning the surface to be cleaned. Figure 4b Figure 4d As shown, when the cleaning device 100 is in the state of cleaning the surface to be cleaned, the second power device 34 is in the starting state. Since the second power device 34 is connected with the liquid outlet 242, i.e. the second power device 34 is in communication with the first chamber 244, and the first chamber 244 and the second chamber 245 are in fluid communication through the through hole O, when the second power device 34 is pumping, the air in the second chamber 245 flows through the first chamber 244 through the through hole O, and is discharged from the liquid outlet 242 together with the air in the first chamber 244, so as to realize the function of the second power device 34 pumping the air in the first chamber 244 and the second chamber 245, so as to make the second chamber 245 in the state of negative pressure, thereby driving the sewage on the cleaning element 22 into the second chamber 245. In this way, the second power device 34 realizes the function of the cleaning device 100 collecting the sewage generated by the cleaning element 22 when cleaning the surface to be cleaned. Figure 3b

[0280] ​​The liquid path system 30 provided by the embodiment is for the cleaning equipment 100 with the self-cleaning function. In addition to the small-flow liquid supply to the cleaning element 22 for realizing the normal mopping of the cleaning equipment 100 by the first power device 32 connected to the clean water box 23 of the cleaning equipment 100, the cleaning equipment 100 needs to be provided with a power device to realize the function of sucking the sewage on the cleaning element 22 to the cleaning equipment when the cleaning equipment 100 cleans the surface to be cleaned. The cleaning equipment 100 of the embodiment of the present disclosure needs to meet the demand of large-flow cleaning of the cleaning element 22. Therefore, the embodiment takes into account the two functions of sewage suction during the normal cleaning of the cleaning equipment 100 and the large-flow liquid supply during the cleaning of the cleaning element 22 by using the second power device 34, so that the power device for large-flow liquid supply to the cleaning element 22 for cleaning or the power device with adjustable flow (the power device with adjustable flow is more expensive than the power device with non-adjustable flow) for switching between the small-flow liquid supply and the large-flow liquid supply to the cleaning element 22 can be effectively saved, and the overall cost of the cleaning equipment 100 can be effectively reduced.

[0281] Please refer to Figure 4a 、 Figure 4b or Figure 4c or Figure 4d or Figure 4e , in the second aspect, the present disclosure further provides a cleaning system 1000. The cleaning system 1000 comprises a cleaning equipment 100 and a base station 200. The cleaning equipment 100 comprises a cleaning element 22 and a liquid path system 30. The cleaning element 22 is used for wiping the surface to be cleaned. The cleaning equipment 100 is used for docking with the base station 200. The base station 200 is used for maintaining the cleaning equipment 100. The base station 200 is provided with a liquid supply system 70 for liquid supply. The liquid path system 30 of the cleaning equipment 100 comprises a clean water box 23 and a sewage box 24. The clean water box 23 is provided with a liquid supplement port and an overflow port 235. The sewage box 24 is in communication with the overflow port 235. The sewage box 24 is used for recycling the sewage formed by the cleaning element 22. In the case that the base station 200 docks with the cleaning equipment 100 and the liquid supply system 70 supplies liquid to the clean water box 23 to the liquid level exceeding the overflow port 235, the liquid overflowing from the overflow port 235 in the clean water box 23 enters the sewage box 24 to flush the sewage box 24. The base station 200 is further provided with a docking port in communication with the liquid supply system 70. The docking port is used for docking communication with the liquid supplement port. In the state that the cleaning equipment 100 is parked on the base station 200 and the docking port docks with the liquid supplement port, the liquid supply system 70 of the base station 200 supplies liquid to the clean water box 23 of the cleaning equipment 100. In the case that the liquid supply system 70 supplies liquid to the clean water box 23 to the liquid level exceeding the overflow port 235, the liquid in the clean water box 23 overflows to the sewage box 24.

[0282] It should be noted that the structure and function of the liquid circuit system 30 in the cleaning system 1000 provided in this embodiment are the same as those in the above embodiments. For details, please refer to the specific description of the above embodiments. This embodiment will not repeat the description.

[0283] The above embodiments will be described below with reference to some specific application scenarios.

[0284] like Figure 26 As shown, and in combination Figure 4a , Figure 4b or Figure 4c or Figure 4d or Figure 4e The user starts the sweeper and mop combo (cleaning device 100), which moves across the living room floor driven by the drive wheels 101. During this movement, the built-in water tank 23 provides water to the tracked cleaning component 22 to wet it. The tracked cleaning component 22 contacts and rolls against the floor, wiping away dust. Simultaneously, the scraping section 2512 scrapes dirt from the cleaning component 22 into the dirt collection chamber 25115. The second power unit 34 applies negative pressure to the wastewater collection box 24 to pump the wastewater from the dirt collection chamber 25115 into the wastewater collection box 24 for storage. As the sweeper and mop combo moves, the tracked cleaning component 22 cleans the floor to a set area, such as 20 square meters. 2When the sewage in the sewage box 24 reaches the preset level, the sweeper and mop can navigate to the positioning point of the base station 200 and rotate until the replenishment port 231 of the clean water box 23 of the sweeper and mop faces the entrance of the base station 200. The sweeper and mop then retreats into the base station 200. During this process, the replenishment port 231 of the clean water box 23 of the sweeper and mop is connected to the interface 63 of the base station 200. The air source system 80 and / or the second power device 34 of the base station 200 are used to pass positive pressure gas through the sewage box 24 to discharge sewage. After the sewage discharge is completed, the liquid supply system 70 of the base station 200 replenishes water into the clean water box 23 of the sweeper and mop. During the continuous replenishment of water to the clean water box 23 by the base station 200, the second power unit 34 can be shut off first, causing the water level in the clean water box 23 to rise continuously until it exceeds the overflow port 235 of the clean water box 23. A large volume of water overflows from the overflow port 235 and flows into the sewage box 24 to flush the sewage box 24. The flushed liquid is discharged into the floor drain of the base station 200 through the connecting pipe 255 and the recycling component 251. When the dirt detection sensor 28 on the sewage recycling path detects that the dirt level is lower than the first preset dirt level threshold, the second power unit 34 is turned on, allowing the clean water overflowing from the overflow port 235 in the clean water box 23 to flow through the first chamber 244 and the drain port 242 to the second channel 33, and then to the tracked cleaning component 22 through the second channel 33. During this process, the tracked cleaning component 22 can continuously rotate forward or alternate between forward and reverse rotation to achieve high-flow self-cleaning of the tracked cleaning component 22. After the cleaning unit 22 has finished its task, the sweeper and mop can return to the ground to clean other uncleaned areas.

[0285] Fourthly, currently, base stations typically have two interfaces: one interface connects to the clean water tank of the cleaning equipment to replenish the cleaning solution, and the other interface connects to the wastewater tank of the cleaning equipment to discharge wastewater generated during cleaning operations. This dual-interface design undoubtedly increases the difficulty of connection. If the interface connecting to the clean water tank is not properly aligned, it will lead to insufficient replenishment of the cleaning solution or leakage, resulting in waste. If the interface connecting to the wastewater tank is not properly aligned, it will prevent wastewater from being discharged along the intended path or cause wastewater to leak into non-liquid-containing areas of the base station, increasing the need for additional cleaning work. To address this problem, this disclosure provides a cleaning system 1000 (… Figure 1 (As shown). The following will be combined with the appendix. Figure 1 , Figure 5a to Figure 5d , Figure 4a to Figure 4e , Figure 7 to Figure 26 ,and Figure 28 to Figure 31The cleaning device 100 is described in detail. It should be noted that the explanations of the elements in the fourth aspect cleaning system 1000 can refer to the explanations of the elements in the second aspect cleaning system 1000. In the following embodiments, only the differences between the second aspect cleaning system 1000 and the corresponding embodiments are explained.

[0286] Referring to Figure 1 , the cleaning system 1000 of the embodiments of the present disclosure includes the cleaning device 100 and the base station 200. Please refer to Figure 5a and Figure 5b , the cleaning device 100 includes the cleaning element 22 for wiping the surface to be cleaned. The cleaning device 100 further includes the clean water box 23 and the dirty water box 24. The clean water box 23 is provided with a liquid supplement port 231 and an overflow port 235. The clean water box 23 is in communication with the dirty water box 24 through the overflow port 235. The dirty water box 24 is used to collect the dirty water generated by the cleaning element 22. The base station 200 is used to maintain the cleaning device 100. The base station 200 is provided with a docking port 63 for docking with the liquid supplement port 231. When the docking port 63 is in docking communication with the liquid supplement port 231, the cleaning device 100 includes at least a liquid supplement state and a dirty water discharge state. When the cleaning device 100 is in the liquid supplement state, the liquid provided by the base station 200 is injected into the clean water box 23 through the docking port 63 and the liquid supplement port 231. When the cleaning device 100 is in the dirty water discharge state, the liquid provided by the base station 200 is injected into the clean water box 23 through the docking port 63 and the liquid supplement port 231. At least part of the liquid passes through the clean water box 23 and enters the dirty water box 24 through the overflow port 235 to provide a positive pressure to the dirty water box 24, so that the dirty water in the dirty water box 24 is discharged to the outside of the dirty water box 24.

[0287] To realize the docking of the cleaning device 100 and the base station 200, and to supply the clean water box 23 of the cleaning device 100 with liquid through the base station 200, and to clean the dirty water box 24, the following embodiments provide an implementation scheme for realizing the docking communication of the liquid path of the base station 200 and the cleaning device 100 through an interface, which can effectively improve the docking reliability of the cleaning device 100 and the base station 200.

[0288] Specifically, referring to Figure 5a , Figure 5b , Figure 9 and Figure 10 , in some embodiments, the liquid path system 30 includes the clean water box 23 and the dirty water box 24. The clean water box 23 and the dirty water box 24 are in communication. As described above, the explanations of the clean water box 23 and the dirty water box 24 can refer to the explanations of the clean water box 23 and the dirty water box 24 in the first aspect, which will not be repeated here.

[0289] In the embodiment of the present disclosure, the base station 200 is provided with a docking port 63 for docking with the liquid supplement port 231. When the docking port 63 is docked with the liquid supplement port 231, the cleaning device 100 at least includes a liquid supplement state and a sewage discharge state. When the cleaning device 100 is in the liquid supplement state, the liquid provided by the base station 200 is injected into the clean water tank 23 through the docking port 63 and the liquid supplement port 231; when the cleaning device 100 is in the sewage discharge state, the liquid provided by the base station 200 is injected into the clean water tank 23 through the docking port 63 and the liquid supplement port 231, at least part of the liquid passes through the clean water tank 23 and enters the sewage tank 24 through the overflow port 235 to provide a positive pressure to the sewage tank 24, so that the sewage in the sewage tank 24 is discharged to the outside of the sewage tank 24.

[0290] In the present disclosure, "fluid" includes at least one of the following: gas, liquid, and gas-liquid mixture (for example, "bubble liquid" below). The properties of the fluid include at least one of the following: composition of the fluid, temperature of the fluid, and concentration of the fluid. For "liquid", in terms of composition, the "liquid" mentioned herein includes but is not limited to clean water, maintenance liquid formed by mixing clean water and maintenance agent, cleaning liquid formed by mixing clean water and cleaning agent, and the clean water and cleaning liquid can be used as cleaning liquid to clean the surface to be cleaned, the cleaning part 22 or the sewage tank 24, and the maintenance liquid is used for maintenance of the surface to be cleaned. In terms of temperature, "liquid" includes liquid that is not heated and liquid that is heated; in terms of concentration, "liquid" includes maintenance liquid formed by mixing clean water and maintenance agent in a predetermined ratio, and cleaning liquid formed by mixing clean water and cleaning agent in a predetermined ratio. The "gas" in the present disclosure can be air, or can be adjusted in terms of composition, temperature and concentration as the aforementioned "liquid". For "gas-liquid mixture", the "gas-liquid mixture" is a mixture of gas and liquid provided by the base station 200, and the "liquid" and "gas" can be adjusted in terms of the aforementioned properties respectively to form the "gas-liquid mixture" with the final properties. In the present disclosure, when the cleaning device 100 is in the liquid supplement state, the base station 200 provides liquid to the cleaning device 100; and when the cleaning device 100 is in the state of cleaning the sewage tank 24 (including the sewage discharge state and the state of cleaning the sewage tank 24), the base station 200 can provide liquid, gas or gas-liquid mixture to the cleaning device 100. The above will be described in detail below. Figure 5a and Figure 5b The supply behavior of the base station 200 when the cleaning device 100 is in the liquid supplement state and the sewage discharge state will be described in detail.

[0291] In one example, the docking interface 63 of the base station 200 is connected to the liquid supplement port 231, and the cleaning liquid is injected into the clean water box 23 through the docking interface 63 and the liquid supplement port 231. At least part of the cleaning liquid output from the base station 200 is stored in the clean water box 23 to supplement the liquid of the cleaning device 100, and at this time, the cleaning device 100 is in a liquid supplement state. When the liquid level in the clean water box 23 exceeds the overflow port 235, the part of the cleaning liquid exceeding the liquid level of the overflow port 235 enters the sewage box 24 through the overflow port 235, and at this time, the cleaning device 100 is in a sewage discharge state. Therefore, the cleaning device 100 can supplement the liquid first and then discharge the sewage, and the two are performed at different times.

[0292] In another example, the docking interface 63 of the base station 200 is connected to the liquid supplement port 231, and gas is injected into the clean water box 23 through the docking interface 63 and the liquid supplement port 231 first. The gas enters the sewage box 24 through the overflow port 235, and the sewage in the sewage box 24 is extruded outward to be discharged from the sewage box 24, so as to realize the sewage discharge of the cleaning device 100, and at this time, the cleaning device 100 is in a sewage discharge state. Then, the base station 200 injects liquid into the clean water box 23 through the docking interface 63 and the liquid supplement port 231, and the liquid is stored in the clean water box 23 to supplement the liquid of the cleaning device 100, and at this time, the cleaning device 100 is in a liquid supplement state. Therefore, the cleaning device 100 can discharge the sewage first and then supplement the liquid.

[0293] In another example, the docking interface 63 of the base station 200 is connected to the liquid supplement port 231, and gas and liquid are injected into the clean water box 23 through the docking interface 63 and the liquid supplement port 231 at the same time. The gas and the liquid are mixed to form a gas-liquid mixture, part of the gas-liquid mixture is stored in the clean water box 23 to supplement the liquid of the cleaning device 100, and at this time, the cleaning device 100 is in a liquid supplement state. At the same time, part of the gas-liquid mixture enters the sewage box 24 through the overflow port 235, and the sewage in the sewage box 24 is extruded outward to be discharged from the sewage box 24, so as to realize the sewage discharge of the cleaning device 100, and at this time, the cleaning device 100 is also in a sewage discharge state. Therefore, the liquid supplement and the sewage discharge of the cleaning device 100 are performed at the same time.

[0294] In another example, the docking interface 63 of the base station 200 is connected to the liquid supplement port 231, and the gas is injected into the clean water tank 23 through the docking interface 63 and the liquid supplement port 231 first, the gas enters the sewage tank 24 through the overflow port 235, and the sewage in the sewage tank 24 is extruded outward to be discharged, so as to realize the sewage discharge of the cleaning device 100, at this time, the cleaning device 100 is in the sewage discharge state; then, the base station 200 injects the gas and the liquid into the clean water tank 23 through the docking interface 63 and the liquid supplement port 231 at the same time, the gas and the liquid form a gas-liquid mixture after mixing, a part of the gas-liquid mixture is stored in the clean water tank 23 to realize the liquid supplement of the cleaning device 100, and another part of the gas-liquid mixture enters the sewage tank 24 through the overflow port 235, and the sewage in the sewage tank 24 is continuously extruded outward to be discharged from the sewage tank 24, so that the cleaning device 100 realizes the liquid supplement and the sewage discharge at the same time after the sewage discharge.

[0295] In addition, in some embodiments, the docking interface 63 is directly connected to the liquid supplement port 231, and the one-way self-locking valve 105 is arranged at the docking interface 63 or the liquid supplement port 231. In other embodiments, the docking interface 63 is indirectly connected to the liquid supplement port 231 through a pipeline, and the one-way self-locking valve 105 is arranged at the docking interface 63, the liquid supplement port 231 or the pipeline. In the case that the docking interface 63 is connected to or not connected to the liquid supplement port 231, and the one-way self-locking valve 105 is closed, the docking interface 63 and the liquid supplement port 231 are not connected; in the case that the docking interface 63 is connected to the liquid supplement port 231, and the one-way self-locking valve 105 is opened, the docking interface 63 and the liquid supplement port 231 are connected, and the one-way conduction is in the direction from the base station 200 to the cleaning device 100.

[0296] In the cleaning system 1000 of the present disclosure, the base station 200 and the cleaning device 100 are connected only through the docking interface 63 and one liquid supplement port 231, so that the base station 200 can provide at least one of the liquid, the gas or the gas-liquid mixture to the cleaning device 100, so that the cleaning device 100 is in the sewage discharge state and / or the liquid supplement state. Only one docking accuracy needs to be considered between the docking interface 63 and the liquid supplement port 231, which greatly reduces the docking difficulty, has high docking accuracy, avoids waste caused by improper docking, ensures sufficient liquid supplement, and ensures that the sewage can be discharged along the predetermined path without leaking to the non-liquid-containing area of the base station 200, thereby avoiding additional cleaning work.

[0297] Please refer to Figure 8 and Figure 9In the projection in a plane perpendicular to the advancing direction Y1 of the cleaning apparatus 100, the projection of the universal wheel 102 is located below the projection of the clean water box 23. In the projection in a plane perpendicular to the height direction Z of the cleaning apparatus 100, the geometric center of the projection of the universal wheel 102 is located within the projection of the clean water box 23. Due to the heavy weight of the clean water box 23, the design of the positional relationship between the universal wheel 102 and the clean water box 23 is beneficial to support the heavy part of the cleaning apparatus 100, and is more stable when the universal wheel 102 drives the cleaning apparatus 100 to turn, avoiding the liquid in the clean water box 23 from sloshing and spilling out.

[0298] In another embodiment, the machine body 10 of the cleaning apparatus 100 is further provided with a support wheel 103. The support wheel 103 is a wheel on the machine body 10 for supporting weight and keeping stable, and the rotation axis thereof is parallel to the machine body width direction X. The clean water box 23 and the support wheel 103 are both located on the rear side of the cleaning apparatus 100. In the projection in a plane perpendicular to the advancing direction Y1 of the cleaning apparatus 100, the projection of the support wheel 103 is located below the projection of the clean water box 23. In the projection in a plane perpendicular to the height direction Z of the cleaning apparatus 100, the geometric center of the projection of the support wheel 103 is located within the projection of the clean water box 23. Due to the heavy weight of the clean water box 23, the design of the positional relationship between the support wheel 103 and the clean water box 23 is beneficial to support the heavy part of the cleaning apparatus 100, and is more stable when the cleaning apparatus 100 walks, avoiding the liquid in the clean water box 23 from sloshing and spilling out.

[0299] In some embodiments, the rear side wall of the cleaning device 100 is provided with an injection joint 104, which is provided with an injection port 1041 that is in communication with the liquid supplement port 231 of the clean water box 23. The "injection joint 104" here can be the "pipe or adapter" mentioned above for indirect docking connection between the docking port 63 and the liquid supplement port 231. The geometric center of the universal wheel 102 or the support wheel 103 is located on the center line of the width direction X of the cleaning device 100, so that the body 10 can be stably supported and moved. Along the width direction X of the cleaning device 100, the injection port 1041 on the injection joint 104 is located on one side of the universal wheel 102 or the support wheel 103 and is spaced apart from the universal wheel 102 or the support wheel 103. The injection joint 104 is also provided with a blind hole 1043, which is symmetrically arranged with the injection port 1041 on both sides of the universal wheel 102 or the support wheel 103 along the width direction X of the cleaning device 100. The injection port 1041 is used for docking with the docking port 63, so that the docking port 63 is in communication with the liquid supplement port 231 through the injection port 1041. The blind hole 1043 is symmetrically arranged with the injection port 1041 on both sides of the universal wheel 102 or the support wheel 103, so that the appearance of the cleaning device 100 is more beautiful.

[0300] In some embodiments, the base station 200 is provided with a liquid supply system 70 for providing liquid and a gas source system 80 for providing gas. When the cleaning device 100 is in the liquid supplement state, the liquid provided by the liquid supply system 70 is injected into the clean water box 23 through the docking port 63 and the liquid supplement port 231. When the cleaning device 100 is in the sewage discharge state, the liquid and / or gas provided by the liquid supply system 70 and / or the gas source system 80 is injected into the clean water box 23 through the docking port 63 and the liquid supplement port 231. At least part of the liquid and / or gas passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0301] In some embodiments, the sewage box 24 is connected with a second power device 34 and a filter 247. When the cleaning device 100 is in the state of cleaning the surface to be cleaned, the power device 34 is in an open state and creates a negative pressure in the sewage box 24, so as to provide power for sucking the sewage on the cleaning element 22 into the sewage box 24. The filter 247 is used to block solid waste in the sewage box 24 from entering the power device 34. When the docking port 63 is in communication with the liquid supplement port 231, the cleaning device 100 further includes a state of flushing the sewage box 24. When the cleaning device 100 is in the state of flushing the sewage box 24, the liquid provided by the liquid supply system 70 is injected into the clean water box 23 through the docking port 63 and the liquid supplement port 231, and the gas provided by the gas source system 80 is injected into the clean water box 23 through the docking port 63 and the liquid supplement port 231. The liquid and the gas together form a bubble liquid to flush the filter 247 in the sewage box 24.

[0302] The cleaning device 100 is provided with a sewage discharge channel for discharging the sewage in the sewage box 24 out of the sewage box 24. The sewage discharge channel is provided with a control structure 25183 for controlling the conduction and interruption of the sewage discharge channel. When the cleaning device 100 is in the sewage discharge state, the control structure 25183 makes the sewage discharge channel conductive.

[0303] In some embodiments, the cleaning liquid provided by the base station 200 can also be supplied to the clean water box 23 through the interface 63 and the liquid supplementing port 231. By injecting the cleaning liquid into the clean water box 23, the cleaning liquid can overflow from the overflow port 235, and the overflowed cleaning liquid can be discharged to the cleaning element 22 through the sewage box 24 to clean the cleaning element 22. Thus, the cleaning liquid overflowing from the clean water box 23 can also be used to clean the cleaning element 22.

[0304] Please refer to Figure 5a and Figure 5b In some specific embodiments, the liquid path system 30 of the cleaning device 100 further includes a first passage 31, a first power device 32, and a second passage 33. The first passage 31 is provided with a first inlet 311 and a first outlet 313. The first inlet 311 is in communication with the liquid outlet 233 of the clean water box 23, and the first outlet 313 is used for the liquid in the first passage 31 to flow out. The first passage 31 is provided with the first power device 32, which is used to provide driving power for discharging the liquid in the clean water box 23 out of the first passage 31. The second passage 33 is provided with a second inlet 331 and a second outlet 333. The second inlet 331 is in communication with the overflow port 235, and the second outlet 333 is used for the liquid in the second passage 33 to flow out. The second passage 33 is provided with the above-mentioned sewage box 24 and the second power device 34. The sewage box 24 is in communication with the overflow port 235 and the second power device 34. The second power device 34 is also used to provide driving power for discharging the liquid in the clean water box 23 out of the second passage 33.

[0305] Based on the above-mentioned embodiments, the cleaning device 100 of the present disclosure at least includes a state of wiping the surface to be cleaned, a state of cleaning the cleaning element 22, a state of sucking sewage, and a state of flushing the sewage box 24. The following will be described in detail in combination with Figure 5a , Figure 5b , Figure 11 and Figure 13 .

[0306] In the state that the cleaning device 100 is used to mop the surface to be cleaned, the device control board 50 controls the first power device 32 to be turned on, and the first power device 32 drives the liquid or gas-liquid mixture in the clean water box 23 to flow from the liquid outlet 233 to the first passage 31, and then to flow from the first outlet 313 to the mopping strip 26, and then to be discharged to the cleaning element 22 through the mopping strip 26, so that the wet cleaning element 22 can be used to mop the surface to be cleaned. In the state that the cleaning device 100 is used to mop the surface to be cleaned, the cleaning device 100 is also in the state of sucking the dirt. In other words, the cleaning device 100 is used to mop the surface to be cleaned, and meanwhile, the self-cleaning of the cleaning element 22 is performed. Specifically, in the state that the cleaning device 100 is used to mop the surface to be cleaned, the cleaning element 22 is used to mop the surface to be cleaned, and the dirt on the cleaning element 22 is scraped off by the scraping part 2512 and then flows into the dirt storage cavity 25115, the device control board 50 controls the second power device 34 to be turned on, the control structure 25183 to be closed, and the second power device 34 to be used to create a negative pressure in the dirt water box 24, so as to provide the power for sucking the dirt on the cleaning element 22 into the dirt water box 24. The dirt in the dirt storage cavity 25115 is sucked into the dirt water box 24 through the first dirt outlet 25116 and the communication port 243 and is stored in the dirt water box 24.

[0307] In the state that the cleaning device 100 is used to clean the cleaning element 22, and the liquid level in the clean water box 23 exceeds the overflow port 235 due to the external liquid source, the device control board 50 controls the second power device 34 to be turned on, and the second power device 34 drives the liquid or gas-liquid mixture in the clean water box 23 to overflow from the overflow port 235 to the second passage 33, and then to flow from the liquid inlet 241 of the dirt water box 24, the cavity of the dirt water box 24, the liquid outlet 242, and the second outlet 333 to the mopping strip 26 in sequence, and then to be discharged to the cleaning element 22 through the mopping strip 26 to clean the cleaning element 22. At this time, the device control board 50 can control the first power device 32 to be turned on or closed. If the device control board 50 controls the first power device 32 to be closed, only the liquid or gas-liquid mixture in the second passage 33 flows to the mopping strip 26 to clean the cleaning element 22. If the device control board 50 controls the first power device 32 to be turned on, the liquid or gas-liquid mixture in the first passage 31 and the second passage 33 flows to the mopping strip 26, so that the amount of liquid used to clean the cleaning element 22 is increased, and the cleaning efficiency and cleaning effect of the cleaning element 22 can be effectively improved.

[0308] It should be noted that when the cleaning module 20 is not equipped with the spray bar 26: when the cleaning device 100 is in the state of mopping the surface to be cleaned, the liquid or gas-liquid mixture flowing out from the first outlet 313 of the first passage 31 is supplied to the cleaning component 22. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water box 23 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the liquid or gas-liquid mixture flowing out from the second outlet 333 of the second passage 33 can be directly discharged to the cleaning component 22 to clean the cleaning component 22.

[0309] Based on the above-described embodiment with the first passage 31 and the second passage 33, in order to discharge the sewage in the sewage box 24 when the cleaning equipment 100 is in the sewage discharge state, one implementation method is as follows: the equipment control board 50 controls the second power device 34 to shut down, and the base station 200 provides positive pressure fluid (which can be gas, liquid, or a gas-liquid mixture) to the clean water box 23 through the interface 63 and the liquid replenishment port 231. The positive pressure fluid overflows from the overflow port 235 into the sewage box 24, squeezing the sewage in the sewage box 24 outward so that it is discharged into the sludge chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to open to connect the second sewage port 25117 to the outside, and the sewage in the sludge chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. Another implementation is as follows: The equipment control board 50 controls the second power unit 34 to turn on and introduce positive pressure gas into the sewage box 24. The positive pressure gas forces the sewage in the sewage box 24 outward, causing it to be discharged into the sludge chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to open to connect the second sewage port 25117 with the outside. The sewage in the sludge chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. The liquid circuit system 30 also includes a connecting pipe 255 for connecting the connecting port 243 and the first sewage port 25116. For example, when the cleaning equipment 100 is in the non-discharge state, the equipment control board 50 controls the control structure 25183 to close to block the connection between the sewage discharge channel and the outside.

[0310] In some embodiments, a control valve 27 can be provided between the clean water tank 23 and the dirty water tank 24, and the device control board 50 is electrically connected to the control valve 27 and is configured to control the control valve 27 to open or close. The control valve 27 is configured to open to allow the fluid in the clean water tank 23 to enter the dirty water tank 24 when the cleaning device 100 is in the draining state, and is configured to close to prevent the fluid in the clean water tank 23 from entering the dirty water tank 24 when the cleaning device 100 is in the replenishing state. In one example, the control valve 27 can be a one-way valve. It is worth noting that in the present embodiment, since the communication path between the clean water tank 23 and the dirty water tank 24 can be controlled by the control valve 27 to be opened or closed, it is not necessary to strictly limit the installation height of the overflow port 235 to be higher than the installation height of the liquid outlet port 233. In addition, the draining operation of the cleaning device 100 and the cleaning of the cleaning member 22 can be alternately performed. For example, after the cleaning device 100 returns to the base station 200, the cleaning device 100 can first perform the draining operation to drain the dirty water in the dirty water tank 24 to the dirty water tank 81 of the base station 200, or to the drainage system outside the base station 200 through the floor drain. Then, the cleaning device 100 performs the cleaning of the cleaning member 22, i.e., the fluid in the first passage 31 and the second passage 33 flows to the wiper 26 to clean the rotating cleaning member 22. In the state of cleaning the cleaning member 22, and when the cleaning member 22 rotates in the forward direction (the rotation direction is consistent with the normal rotation direction of the cleaning device 100 when it is used to mop the surface to be cleaned), the scraping portion 2512 can scrape the dirty water on the cleaning member 22 into the dirty water collecting cavity 25115 of the recovery member 251, and in this process, the control structure 25183 can be kept in the open state, so that most of the dirty water on the rotating cleaning member 22 can enter the dirty water collecting cavity 25115 and then be directly drained to the base 61 of the base station 200 through the second dirty water outlet 25117, and be collected into the dirty water tank 81 of the base station 200, or be drained to the drainage system outside the base station 200 through the floor drain. In the state of cleaning the cleaning member 22, and when the cleaning member 22 rotates in the reverse direction (the rotation direction is opposite to the normal rotation direction of the cleaning device 100 when it is used to mop the surface to be cleaned), the scraping portion 2512 can scrape the dirty water on the cleaning member 22 to directly fall on the base 61 of the base station 200, and be collected into the dirty water tank 81 of the base station 200, or be drained to the drainage system outside the base station 200 through the floor drain, and in this process, since the dirty water does not need to pass through the dirty water collecting cavity 25115 to be drained into the base station 200, the control structure 25183 can be kept in the open state or the closed state.

[0311] When the base station 200 provides the liquid containing fluid to the clean water box 23 through the interface 63 and the liquid supplementing port 231 in the state of discharging sewage, the positive pressure fluid overflows from the overflow port 235 to the sewage box 24, so as to at least partially clean the sewage box 24. In this process, the control structure 25183 can be in an open state, and the above-mentioned positive pressure fluid extrudes the sewage in the sewage box 24 outward to discharge it. At this time, the cleaning device 100 of the present disclosure recycles the sewage formed by the cleaning element 22 by arranging the sewage box 24, and the cleaning of the sewage box 24 does not need to be manually cleaned by disassembling the sewage box 24, but when the base station 200 is docked with the cleaning device 100 and supplies fluid to the clean water box 23, the fluid overflowing from the overflow port 235 of the clean water box 23 is used to flush the sewage box 24, so as to realize the automatic cleaning of the sewage box 24, which is efficient, convenient, time-saving and labor-saving, and can avoid the breeding of bacteria.

[0312] Since the cleaning device needs a small amount of liquid in the state of wiping the surface to be cleaned, and needs a large amount of liquid in the state of cleaning the cleaning element, in the related art, a flow-adjustable power device is arranged in the liquid path system to adjust the flow output to the cleaning element, so as to meet the different state requirements of the cleaning element wiping the surface to be cleaned and the cleaning element self-cleaning, but the cost of the flow-adjustable power device is high. The liquid path system 30, the cleaning device 100 and the cleaning system 1000 of the present disclosure are provided with the first passage 31 and the second passage 33 which are both in communication with the clean water box 23, the first power device 32 is arranged on the first passage 31, and the second power device 34 is arranged on the second passage 33. In the state of wiping the surface to be cleaned, the first power device 32 drives the liquid in the clean water box 23 to be discharged to the cleaning element 22 through the first passage 31, so as to supplement the liquid for wiping the surface to be cleaned. In the state of cleaning the cleaning element 22, and when the liquid level of the liquid provided by the external liquid source of the clean water box 23 to the clean water box 23 exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water box 23 to be discharged to the cleaning element 22 through the second passage 33, or the second power device 34 drives the liquid in the clean water box 23 to be discharged to the cleaning element 22 through the second passage 33, and at the same time, the first power device 32 also drives the liquid in the clean water box 23 to be discharged to the cleaning element 22 through the first passage 31. Thus, the liquid supply amount of the cleaning device 100 in the state of wiping the surface to be cleaned is small, and the liquid supply amount in the state of cleaning the cleaning element 22 is large, so that the flow-adjustable power device is not needed to adjust the flow output to the cleaning element 22, and the cost of the liquid path system 30 is reduced.

[0313] In some embodiments, before the base station 200 provides liquid to the clean water tank 23 through the liquid supplement port 231 to make the cleaning device 100 in the liquid supplement state, the liquid in the clean water tank 23 can be driven by the first power device 32 to flow out of the clean water tank 23 through the first passage 31. As mentioned above, the "liquid" mentioned herein includes but is not limited to clean water, maintenance liquid and cleaning liquid. The clean water and cleaning liquid can be used as cleaning liquid to clean the surface to be cleaned, the cleaning member 22 or the dirty water tank 24, and the maintenance liquid is used to maintain the surface to be cleaned. Different liquids have different effects on the surface to be cleaned. For example, if the surface to be cleaned is the surface of a wooden floor, the cleaning member 22 spraying clean water (through the spraying member 26) can clean the wooden floor with general dirt, the cleaning member 22 spraying cleaning liquid can clean the oily wooden floor, and the cleaning member 22 spraying maintenance liquid can maintain the cleaned wooden floor. Therefore, different liquids with different properties can be used to perform different tasks. However, all kinds of liquids with different properties share one clean water tank 23. If the liquid in the clean water tank 23 is not drained first, the liquid remaining in the clean water tank 23 after the last task will mix with the liquid supplied by the base station 200. Since the amount of liquid remaining in the clean water tank 23 after the last task cannot be determined, the property of the mixed liquid after the liquid remaining in the clean water tank 23 after the last task mixes with the liquid supplied by the base station 200 cannot be determined, which causes the property (composition, concentration, temperature) of the liquid in the clean water tank 23 in the current task to be inconsistent with the property of the liquid supplied by the base station 200 through the interface 63 and the liquid supplement port 231, or in other words, the property of the mixed liquid cannot be determined, thereby affecting the performance of the task according to the predetermined expectation. For example, if the last task is to mop the surface to be cleaned with clean water, the clean water tank 23 stores clean water in the last task. When the current task is to mop the surface to be cleaned with mixed cleaning liquid, if the clean water in the clean water tank 23 is not drained, the concentration of the input mixed cleaning liquid will be diluted, which cannot achieve the cleaning effect. Therefore, before the base station 200 provides liquid to the clean water tank 23 through the liquid supplement port 231 to make the cleaning device 100 in the liquid supplement state, the first power device 32 drives the liquid in the clean water tank 23 to flow out of the clean water tank 23 through the first passage 31, which can ensure that the property of the liquid stored in the clean water tank 23 in the current task is consistent with the property of the liquid supplied by the base station 200 to the clean water tank 23 through the interface 63 and the liquid supplement port 231, thereby ensuring that each task can be successfully performed. It should be noted that in this embodiment, only the first passage 31 connected to the clean water tank 23 needs to be concerned, and it is not dependent on whether the second passage 33 is connected to the clean water tank 23.

[0314] In some embodiments, please refer to Figure 5c and Figure 5dThe sewage box 24 comprises a first chamber 244 and a second chamber 245, i.e. the first chamber 244 and the second chamber 245 are both formed in the sewage box 24. The first chamber 244, the second chamber 245 and the second power device 34 are arranged on the second passage 33. The first chamber 244 is provided with a liquid inlet 241 and a liquid outlet 242, the liquid inlet 241 is used for allowing liquid from an external liquid source of the first chamber 244 to enter the first chamber 244, and the liquid outlet 242 is used for allowing liquid in the first chamber 244 to be discharged to the cleaning member 22. The second chamber 245 is used for containing sewage, and is provided with a communication port 243, the communication port 243 is used for allowing sewage on the cleaning member 22 to enter the second chamber 245, the second chamber 245 is separated from the first chamber 244, and is in fluid communication with the first chamber 244 through the through hole O, and the highest allowable liquid level of the second chamber 245 is lower than the position of the through hole O. The second chamber 245 serves as a space for storing sewage, and can have a relatively large capacity, while the first chamber 244 can only serve as a water passing space, and can have a relatively small capacity, or even can be a pipe formed to save the installation space of the entire cleaning device 100.

[0315] Please refer to Figure 5c In some embodiments, the first chamber 244 and the second chamber 245 can be arranged in a vertical direction. Specifically, in the height direction Z of the sewage box 24, the first chamber 244 is located above the second chamber 245, and the first chamber 244 and the second chamber 245 are in communication through the through hole O. Please refer to Figure 5d In other embodiments, the first chamber 244 and the second chamber 245 can be arranged side by side. Specifically, in a plane perpendicular to the height direction Z of the sewage box 24, the first chamber 244 is located on one side of the second chamber 245, and the first chamber 244 and the second chamber 245 are in communication through the through hole O.

[0316] In a state that the cleaning device 100 is used for cleaning the cleaning member 22, and the liquid level of the external liquid source (e.g. the base station 200) of the clean water box 23 supplying the clean water box 23 exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 to the second passage 33, and then to flow out of the second passage 33 through the liquid inlet 241, the first chamber 244, the liquid outlet 242 and the second outlet 333 to be discharged to the cleaning member 22; and / or in a state that the second power device 34 is closed, and the liquid level of the external liquid source of the clean water box 23 supplying the clean water box 23 exceeds the overflow port 235, the liquid in the clean water box 23 overflows from the overflow port 235 to the first chamber 244, and then flows into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245.

[0317] The second power device 34 is connected with the liquid outlet 242, and is used to provide driving power for driving the dirty water on the cleaning member 22 to enter the second chamber 245, and driving power for driving the liquid in the clean water box 23 to exit the second passage 33. That is, the second power device 34 is used to collect the dirty water generated by the cleaning member 22 cleaning the surface to be cleaned, and to meet the high flow liquid supply requirement for cleaning the cleaning member 22.

[0318] As mentioned above, the second power device 34 can be a water-air dual-purpose pump. The second power device 34 can be in an activated state in the following two use states:

[0319] Please refer to Figure 5c , Figure 5d and Figure 3a , in the case that the cleaning device 100 is in the state of cleaning the surface to be cleaned, the second power device 34 is in the activated state. Since the second power device 34 is connected with the liquid outlet 242, that is, the second power device 34 is in communication with the first chamber 244, and the first chamber 244 and the second chamber 245 are in fluid communication through the through hole O, therefore, when the second power device 34 is pumping, the air in the second chamber 245 flows through the first chamber 244 through the through hole O, and is discharged from the liquid outlet 242 together with the air in the first chamber 244, thereby realizing the function of the second power device 34 pumping the air in the first chamber 244 and the second chamber 245, so that the second chamber 245 is in a negative pressure state, thereby driving the dirty water generated by the cleaning member 22 and entering the dirt collecting cavity 25115 of the recovery member 251 into the second chamber 245. In this way, the second power device 34 is used to realize the function of the cleaning device 100 collecting the dirty water generated by the cleaning member 22 cleaning the surface to be cleaned.

[0320] Please refer to Figure 5c , Figure 5d and Figure 3bIn the case that the cleaning device 100 is in the state of washing the cleaning element 22, and the liquid level of the external liquid source of the clean water box 23 supplying the clean water box 23 exceeds the overflow outlet 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow outlet 235 to the second passage 33, and then flows out from the second passage 33 through the liquid inlet 241, the first chamber 244, the liquid outlet 242, and the second outlet 333 to be discharged to the cleaning element 22. Since the cleaning device 100 is in the state of washing the cleaning element 22, for the first chamber 244, the external liquid (the liquid overflowing from the clean water box 23) of the first chamber 244 enters the first chamber 244 through the liquid inlet 241, and since the second power device 34 is connected to the liquid outlet 242 of the first chamber 244, the second power device 34 preferentially drives the liquid in the first chamber 244 to the cleaning element 22 through the liquid outlet 242, and specifically, to the squeegee 26 beside the cleaning element 22 to be discharged to the cleaning element 22. In this process, since the highest allowable liquid level of the second chamber 245 is lower than the position of the through hole O, the sewage in the second chamber 245 will not enter the first chamber 244. In addition, in the process of starting the second power device 34, the liquid in the first chamber 244 will always block the through hole O, and will also hinder the second power device 34 from driving the liquid in the second chamber 245 to the first chamber 244, thereby achieving the requirement of large-flow liquid supply of the cleaning device 100 in the state of washing the cleaning element 22, without causing the sewage in the second chamber 245 to flow back to the cleaning element 22.

[0321] The liquid path system 30 provided by the embodiment is for the cleaning device 100 with the self-cleaning function. In addition to the requirement of small-flow liquid supply to the cleaning element 22 for the cleaning device 100 to normally mop the floor through the first power device 32 connected to the clean water box 23 of the cleaning device 100, the cleaning device 100 also needs to be provided with a power device to achieve the function of pumping the sewage on the cleaning element 22 to the cleaning device 100 when the cleaning device 100 cleans the surface to be cleaned. The cleaning device 100 of the embodiment of the present disclosure needs to meet the requirement of large-flow washing of the cleaning element 22. Therefore, the embodiment takes into account the two functions of sewage pumping during normal cleaning of the cleaning device 100 and large-flow liquid supply during washing of the cleaning element 22 by using the second power device 34, thereby effectively saving the need to additionally provide another power device as the power source for large-flow liquid supply to the cleaning element 22 for washing, or the need to provide a flow-adjustable power device (the flow-adjustable power device is more expensive than the flow-unadjustable power device) to meet the switching between small-flow liquid supply and large-flow liquid supply to the cleaning element 22, thereby effectively reducing the overall cost of the cleaning device 100.

[0322] In the embodiment shown in the present disclosure, the first chamber 244 and the second chamber 245 are both formed in the sewage box 24, i.e., the first chamber 244 and the second chamber 245 are two separated chambers formed in the same container (the sewage box 24), so that the structure of the liquid path system 30 can be more compact, and the distance of the connecting pipeline between the first chamber 244 and the second chamber 245 can be shorter, thereby effectively saving the space of the whole machine and reducing the cost of the pipeline. In other embodiments of the present disclosure, the first chamber 244 and the second chamber 245 can be formed in two containers respectively arranged independently, and the through hole O can be connected by a pipeline or directly connected. At this time, the assembly of the two containers can be explained as the "sewage box 24" of the present disclosure.

[0323] Please refer to Figure 5a 、 Figure 5b 、 Figure 19 and Figure 20 In some embodiments, the filter 247 mentioned in the foregoing embodiments can be specifically arranged at the through hole O between the first chamber 244 and the second chamber 245, and the first chamber 244 and the second chamber 245 are in fluid communication through the hole of the filter 247, and the filter 247 is used to block at least part of the solid waste in the second chamber 245 from entering the first chamber 244. Wherein, when the second power device 34 is closed, and the liquid level of the external liquid source (such as the base station 200) of the clean water box 23 supplying the clean water box 23 exceeds the overflow outlet 235, the liquid in the clean water box 23 overflows from the overflow outlet 235 to the first chamber 244, and enters the second chamber 245 after passing through the filter 247.

[0324] As mentioned above, the sewage is usually stored in the second chamber 245, and there is no sewage in the first chamber 244, and the first chamber 244 is used for the relatively clean liquid in the clean water box 23 to pass through and flow out from the liquid outlet 242 to the squeegee 26, and finally be discharged from the squeegee 26 to the cleaning element 22 to clean the cleaning element 22. Therefore, when the cleaning device 100 is in the state of cleaning the cleaning element 22, the liquid passing through the first chamber 244 needs to be relatively clean and cannot be mixed with solid waste. Based on this, the filter 247 is arranged between the second chamber 245 and the first chamber 244, which can avoid the clean liquid flowing into the squeegee 26 through the first chamber 244 from being contaminated by the solid waste in the second chamber 245, thereby ensuring the cleaning effect of cleaning the cleaning element 22.

[0325] In another aspect, when the cleaning apparatus 100 is in a state of cleaning the cleaning member 22, the liquid entering the first chamber 244 from the liquid inlet 241 has a tendency to flow into the second chamber 245, although the second power device 34 is able to have a driving force to drive the liquid to flow to the liquid outlet 242, there is still a certain amount of liquid entering the second chamber 245, thereby reducing the liquid amount of the liquid flowing to the water jet strip 26 through the second passage 33, and reducing the cleaning effect of the cleaning member 22. In the present embodiment, compared with the through hole O between the first chamber 244 and the second chamber 245, the filter 247 is arranged between the first chamber 244 and the second chamber 245, so that the liquid entering the first chamber 244 from the liquid inlet 241 is not easy to flow into the second chamber 245, but flows across the first chamber 244 and flows out from the liquid outlet 242 to the water jet strip 26, so as to ensure that a larger liquid amount of the liquid is provided to the cleaning member 22 when the cleaning member 22 is cleaned, and the cleaning effect of the cleaning member 22 is improved. When the cleaning apparatus 100 is in a state of flushing the sewage box 24, the device control panel 50 controls the second power device 34 to be closed, and the liquid level of the liquid source (for example, the base station 200) outside the clean water box 23 supplying the clean water box 23 exceeds the overflow outlet 235, the liquid of the clean water box 23 overflows from the overflow outlet 235 to the first chamber 244, and then enters the second chamber 245 through the filter 247, so as to clean the filter 247, flush the solid waste adhered to the filter 247 into the second chamber 245, and clean at least part of the second chamber 245. Similarly, the cleaning apparatus 100 usually performs the sewage discharge before performing the flushing of the sewage box 24. Details are described above.

[0326] In another aspect, when the second power device 34 applies negative pressure to the sewage box 24 to extract the sewage in the recovery member 251, the filter 247 can also prevent the solid waste from entering the first chamber 244 from the second chamber 245, and then entering the second power device 34 to affect the service life of the second power device 34. At the same time, when the cleaning apparatus 100 is turned upside down, the sewage in the second chamber 245 flows towards the first chamber 244, and the filter 247 can also prevent the solid waste from entering the second power device 34 to affect the service life of the second power device 34.

[0327] Further, in the case of arranging the filter 247 in the sewage box 24, when the cleaning apparatus 100 is in a state of flushing the sewage box 24, the base station 200 simultaneously injects liquid and gas into the clean water box 23 through the docking port 63 and the liquid supplementing port 231, and the liquid and the gas together form a bubble liquid, which flushes the above-mentioned filter 247.

[0328] As mentioned above, since the filter 247 is a component for blocking at least part of the solid waste in the second chamber 245 from entering the first chamber 244, solid waste is inevitably hung on the filter 247. With time, the solid waste will block the holes on the filter 247. On one hand, the clean liquid passing through the first chamber 244 will contact the solid waste before reaching the water strip 26, resulting in that the liquid for flushing the cleaning member 22 is relatively dirty, and the cleaning effect of the cleaning member 22 is poor. On the other hand, the second power device 34 or the base station 200 cannot provide positive pressure to the sewage box 24, resulting in that the sewage box 24 cannot discharge sewage outward, and the second power device 34 cannot provide negative pressure to the sewage box 24, resulting in that the sewage box 24 cannot suck sewage. In the embodiment, the base station 200 injects liquid and gas into the clean water box 23 at the same time, and the liquid and the gas form a bubble liquid together. The bubble liquid overflows from the overflow port 235 and enters the sewage box 24, which is equivalent to pressurizing the water. Compared with flushing the filter 247 by only liquid, the flushing force of the bubble liquid on the filter 247 is greater, which can avoid the solid waste from blocking the holes on the filter 247, so as to ensure that the liquid for cleaning the cleaning member 22 is relatively clean, and also ensure that the sewage box 24 can discharge and suck sewage smoothly.

[0329] To realize the connection between the cleaning device 100 and the base station 200 through one interface, the base station 200 according to the embodiment of the present disclosure will be described in detail below with reference to the drawings.

[0330] In some embodiments, referring to Figure 5a or Figure 5b , the base station 200 is connected with the cleaning device 100 and is used for maintaining the cleaning device 100. The base station 200 is provided with a liquid supply system 70 for providing liquid and a gas source system 80 for providing gas. The liquid supply system 70 and the gas source system 80 are both in communication with the docking interface 63. In the present disclosure, the docking interface 63 is one, and the liquid supply system 70 and the gas source system 80 are both in communication with the same docking interface 63 and are both connected with the same liquid supplement port 231 on the clean water box 23 through the same docking interface 63. In this way, the base station 200 can provide liquid, gas or a mixture of liquid and gas to the cleaning device 100, so that the cleaning device 100 is in at least one of the following states: discharging sewage, supplementing liquid, cleaning the cleaning member 22 and flushing the sewage box 23. Therefore, only one docking accuracy needs to be considered between the docking interface 63 and the liquid supplement port 231, which greatly reduces the docking difficulty and improves the docking accuracy.

[0331] When the cleaning equipment 100 is in the replenishment state, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231; when the cleaning equipment 100 is in the sewage discharge state, the fluid liquid and / or gas supplied by the liquid supply system 70 and / or the gas source system 80 are injected into the clean water box 23 through the interface 63 and the replenishment port 231, and at least part of the liquid and / or gas passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0332] In some embodiments, when the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. When the cleaning device 100 is in the state of rinsing the wastewater box 24, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. The liquid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to rinse the wastewater box 24. Alternatively, the fluid supplied by the liquid supply system 70 and the gas source system 80 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. The liquid and gas together form a bubble liquid. The bubble liquid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to rinse the wastewater box 24 (especially the filter component 247). Please refer to the above description for details, which will not be repeated here.

[0333] Specifically, please refer to Figure 1 , Figure 5a and Figure 5b The base station 200 also includes a base station body 60 and a multi-channel connector 72, which is disposed on the base station body 60.

[0334] The base station body 60 is a component used to house other components on the base station 200 besides itself. The base station body 60 typically includes a base 61, a top 64, and a side wall 65. The base 61, top 64, and side wall 65 form a semi-enclosed structure, with an opening 67 for the cleaning equipment 100 to enter and exit. The base 61 can be used to receive contaminants from the dirt-containing cavity 25115 of the cleaning equipment 100. Figure 13 The wastewater discharged from the base station 200 (as shown) and the liquid generated by the base station 200 itself are included. Specifically, the base 61 is provided with a liquid-containing area 611, which can be a groove opened on the base 61, for at least containing the wastewater discharged from the cleaning equipment 100, the wastewater flowing in when the base station 200's liquid supply system 70 supplies liquid to the cleaning equipment 100 to clean the cleaning component 22, and the wastewater generated by the liquid supply system 70's self-cleaning.

[0335] The multi-pass connector 72 is also provided on the base station body 60, and can belong to the liquid supply system 70, the gas supply system 80, or be independent of the liquid supply system 70 and the gas supply system 80. Specifically, the multi-pass connector 72 includes at least two input interfaces 721, an output interface 723, and a fluid storage cavity 725. The at least two input interfaces 721 and the output interface 723 are in communication with the fluid storage cavity 725. The at least two input interfaces 721 are also in communication with the liquid channel of the liquid supply system 70 and / or the gas channel of the gas supply system 80, and the output interface 723 is in communication with the docking interface 63. In one example, the liquid supply system 70 and the gas supply system 80 access the fluid storage cavity 725 through different input interfaces 721 of the multi-pass connector 72, and output from the same output interface 723 to communicate with the same docking interface 63. The fluids input from different input interfaces 721 of the multi-pass connector 72 can be mixed in the fluid storage cavity 725 and then output through the output interface 723. The liquid supply system 70 can supply liquid to the docking interface 63 through the multi-pass connector 72, and the gas supply system 80 can also supply gas to the docking interface 63 through the multi-pass connector 72. If the liquid supply system 70 supplies liquid to the docking interface 63 through the multi-pass connector 72 at the same time that the gas supply system 80 supplies gas to the docking interface 63 through the multi-pass connector 72, the gas and liquid will be mixed in the fluid storage cavity 725 of the multi-pass connector 72 to form the aforementioned bubble liquid, which then passes through the docking interface 63 and the liquid supplement port 231 into the clean water box 23 to be used for flushing the sewage box 24, flushing the filter element 247, and / or discharging sewage from the sewage box 24.

[0336] The base station 200 also includes a base station control board 90, which is a device for controlling the operation of various functional modules in the base station 200. The base station control board 90 typically includes a circuit board and a controller or processor provided on the circuit board.

[0337] The liquid supply system 70 of the base station 200 will be described in detail below. Figure 5a and Figure 5b The liquid supply system 70 of the base station 200 will be described in detail below.

[0338] The liquid supply system 70 comprises a clean water channel 71. The clean water channel 71 is connected to the counter interface 63 and a clean water tank 711 inside the base station 200 or a liquid source 713 outside the base station, such as a municipal tap water, etc. The clean water channel 71 is used to transport clean water. The clean water channel 71 comprises an inlet 715 and an outlet 717 at opposite ends. The inlet 715 of the clean water channel 71 is connected to the clean water tank 711 or the liquid source 713 outside the base station. The outlet 717 of the clean water channel 71 is connected to an input interface 721 of the multi-way connector 72, thereby indirectly connected to the counter interface 63 through the multi-way connector 72, so as to provide clean water to the clean water box 23 of the cleaning device 100 by the liquid supply system 70. The clean water tank 711 is explained in the “clean water box 23” mentioned above. In one example, the clean water tank 711 is provided with an inlet and an outlet. The inlet of the clean water tank 711 is connected to the liquid source 713 outside the base station. The outlet of the clean water tank 711 is connected to the inlet 715 of the clean water channel 71. In another example, the clean water tank 711 is provided with an inlet and an outlet. The inlet of the clean water tank 711 is openable and closable for water replenishment. The outlet of the clean water tank 711 is connected to the inlet 715 of the clean water channel 71. At this time, the base station 100 can not be connected to the liquid source 713 outside the base station. The clean water tank 711 has a relatively large capacity and can be regularly replenished by the user. In this way, the base station 100 can be set at any position and is not limited to be close to the liquid source 713 outside the base station. In other embodiments, the number of inlets and outlets of the clean water tank 711 can be set as needed and is not limited to the present embodiment.

[0339] The liquid supply system 70 further comprises a treatment liquid container 73 and a treatment liquid channel 74. The treatment liquid container 73 is used to store treatment liquid. The treatment liquid is a liquid used in the cleaning technical field to have a treatment effect on the surface to be cleaned, including but not limited to cleaning liquid and maintenance liquid. The treatment liquid channel 74 is connected to the treatment liquid container 73 and at least one other input interface 721 (different from the input interface 721 connected to the clean water channel 711) of the multi-way connector 72, thereby indirectly connected to the counter interface 63 through the multi-way connector 72, so as to provide treatment liquid to the clean water box 23 of the cleaning device 100 by the liquid supply system 70. The treatment liquid container 73 is explained in the “clean water box 23” mentioned above. The difference between the treatment liquid container 73 and the “clean water box 23” is that the treatment liquid container 73 needs to be separately provided with a liquid injection port. The liquid injection port is usually closed and only opened for addition when the treatment liquid is used up (mostly manually, but can also be automatic). The treatment liquid container 73 can be provided with an outlet and connected to the treatment liquid channel 74. At this time, the treatment liquid channel 74 is a one-way channel. Alternatively, the treatment liquid container 73 can be provided with two openings. Both openings of the treatment liquid container 73 are connected to the treatment liquid channel 74. At this time, the treatment liquid channel 74 is a circulating channel. Alternatively, after the treatment liquid in the treatment liquid container 73 is used up, the treatment liquid container 73 can be replaced with a new one.

[0340] Specifically, in some embodiments, the treatment liquid passage 74 comprises a first treatment liquid passage 741, and the treatment liquid container 73 comprises a first treatment liquid container 731. The first treatment liquid container 731 is configured to contain a treatment agent for maintaining the ground.

[0341] The first treatment liquid passage 741 comprises a first port 7411 and a second port 7413, which are connected to the input interface 721 of the multi-way connector 72. In one example, the first port 7411 and the second port 7413 are connected to the same input interface 721 of the multi-way connector 72. In another example, the first port 7411 and the second port 7413 are connected to two different input interfaces 721 of the multi-way connector 72, respectively.

[0342] The first treatment liquid container 731 is connected between the first port 7411 and the second port 7413, and the first treatment liquid passage 741 comprises a first use state and a second use state. In the first use state, the treatment agent in the first treatment liquid container 731 flows into the multi-way connector 72 through the first port 7411, so as to be indirectly connected to the docking interface 63 through the multi-way connector 72, to achieve that the liquid supply system 70 provides the treatment liquid to the clean water box 23 of the cleaning device 100. In the second use state, the clean water in the clean water passage 71 sequentially passes through the multi-way connector 72, the first port 7411 and the second port 7413 to clean the first treatment liquid passage 741, and the liquid after cleaning the first treatment liquid passage 741 flows to the multi-way connector 72 through the second port 7413 or is discharged to the liquid containing area 611 of the base 61.

[0343] Since the curing agent has a large viscosity and poor fluidity, if the first treatment liquid channel 741 is left for a period of time, the curing agent will accumulate inside, making it difficult to replenish the cleaning device 100 with the curing liquid subsequently. In the present disclosure, the clean water in t...

Claims

1. A cleaning device, comprising a cleaning component and a fluid system, the cleaning component being used to mop a surface to be cleaned, characterized in that, The fluid circuit system includes: The water tank is equipped with an overflow outlet; and The target object is the clean water container supplied with liquid from an external liquid source to the clean water container until the liquid exceeds the overflow port. The liquid in the clean water container flows to the target object through the overflow port. The target object includes the cleaning component and / or the wastewater container.

2. The cleaning equipment according to claim 1, characterized in that, The water tank is also provided with a liquid outlet, the height of which on the water tank is lower than the height of the overflow outlet on the water tank; the liquid circuit system further includes: a first passage, provided with a first inlet and a first outlet, the first inlet being connected to the liquid outlet, and the first outlet being used for the liquid in the water tank to flow out from the first passage; A first power unit, the first power unit being used to provide driving power for discharging liquid from the water tank into the first passage; and The second passage is provided with a second inlet and a second outlet. The second inlet is connected to the overflow outlet, and the second outlet is used to allow the liquid from the clear water box to flow out from the second passage. When the cleaning device is in the state of mopping the surface to be cleaned, the liquid in the clean water box is driven by the first power device to flow from the liquid outlet into the first passage and out from the first outlet to supply liquid to the cleaning component; When the cleaning equipment is in the state of cleaning the cleaning component, liquid is supplied to the clean water box through an external liquid source so that the liquid level in the clean water box exceeds the overflow port. When this happens, the liquid in the clean water box overflows from the overflow port into the second passage and flows out from the second outlet to drain liquid to the cleaning component and clean it.

3. The cleaning equipment according to claim 2, characterized in that, When the cleaning device is in the state of mopping the surface to be cleaned, the liquid level in the clean water box does not exceed the overflow port.

4. The cleaning equipment according to claim 2, characterized in that, The first power unit is located at the first passage or the liquid outlet; and / or, When the cleaning device is in the state of cleaning the cleaning component, and the liquid level supplied to the water tank by the external liquid source exceeds the overflow port, the first power device drives the liquid in the water tank to flow from the outlet into the first passage and out from the first outlet to drain the liquid to the cleaning component.

5. The cleaning equipment according to any one of claims 2 to 4, characterized in that, The second passage is a pipe through which liquid overflowing from the overflow port flows to the pipe and flows directly out of the pipe to drain liquid to the cleaning component and clean the cleaning component.

6. The cleaning equipment according to claim 2, characterized in that, The second path is equipped with: The first chamber is provided with a liquid inlet and a liquid outlet. The liquid inlet is used to allow liquid from an external liquid source to enter the first chamber, and the liquid outlet is used to allow liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain sewage. The second chamber is provided with a communication port for sewage on the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but is fluidly connected to it through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. The second power unit is connected to the drain port and is used to provide driving power to drive the sewage on the cleaning component into the second chamber, and driving power to discharge the liquid in the clean water box into the second passage. When the cleaning equipment is in the state of cleaning the cleaning component, and the liquid level supplied by the external liquid source to the water tank exceeds the overflow port, the second power device drives the liquid in the water tank to overflow from the overflow port to the second passage, and flows out from the second passage through the inlet, the first chamber, the outlet, and the second outlet in sequence to discharge liquid to the cleaning component and clean the cleaning component; When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, and draws air from the first chamber and the second chamber to make the second chamber negative pressure, thereby driving the sewage on the cleaning component into the second chamber.

7. The cleaning equipment according to claim 6, characterized in that, A filter element is provided at the through hole between the first chamber and the second chamber. The first chamber and the second chamber are in fluid communication through the holes in the filter element. The filter element is used to prevent at least part of the solid waste in the second chamber from entering the first chamber. In the case where the second power device is off and the liquid level supplied by the external liquid source to the water box exceeds the overflow port, the liquid in the water box overflows from the overflow port into the first chamber, passes through the filter element, and enters the second chamber.

8. The cleaning equipment according to claim 6, characterized in that, The liquid circuit system also includes the wastewater box; the wastewater box includes a box body and a cover, the cover is disposed on the top wall of the box body, the through hole is disposed on the top wall of the box body, the second chamber is formed in the box body, and the first chamber is located in the space enclosed by the cover and the box body; A sealing structure is provided between the cover and the box, and the sealing structure is at least used to form the first chamber between the cover and the box, and the through hole is located in the area enclosed by the sealing structure; The box body is also provided with a third chamber, which is independent of the second chamber and is connected to the second power device. The top wall of the box body is provided with a third chamber entrance that is connected to the third chamber, and the third chamber entrance is located inside the first chamber. When the cleaning device is in the state of cleaning the cleaning component, and the liquid level supplied by the external liquid source to the water tank exceeds the overflow port, the second power device drives the liquid in the water tank to overflow from the overflow port into the first chamber, and then flows to the cleaning component through the inlet of the third chamber, the third chamber, the drain port, and the second power device; the first chamber is divided into a first sub-chamber and a second sub-chamber by the sealing structure, the through hole is located in the first sub-chamber, the inlet of the third chamber is located in the second sub-chamber, the sealing structure has a fluid outlet communicating with the first sub-chamber, the sealing structure has a fluid inlet communicating with the second sub-chamber, and the fluid outlet and the fluid inlet are spaced apart and fluidly connected.

9. The cleaning equipment according to claim 6, characterized in that, Also includes: The recycling component includes a scraping part and a dirt-receiving cavity, wherein the scraping part is used to abut against the cleaning component to scrape dirt on the cleaning component into the dirt-receiving cavity; The connecting port of the second chamber is connected to the dirt-containing chamber. The connecting port is used to allow wastewater on the cleaning component to enter the second chamber through the dirt-containing chamber, and to allow wastewater in the second chamber to enter the dirt-containing chamber and be discharged to the outside of the cleaning equipment. Wherein, the rotation axis of the cleaning component is parallel to the surface to be cleaned; and / or, the cleaning component includes a tracked cleaning component or a roller-type cleaning component; The sludge-holding cavity extends along the rotation axis of the cleaning component. One end of the sludge-holding cavity along its length is provided with a first sewage outlet, and the other end of the sludge-holding cavity along its length is provided with a second sewage outlet. The first sewage outlet is connected to the communication port of the second chamber. The cleaning device also includes a control structure, which is used to connect the inside of the sludge-holding cavity with the outside when the cleaning device is in the sewage discharge state.

10. The cleaning equipment according to claim 2, characterized in that, The cleaning component includes a tracked cleaning component or a roller cleaning component, and the hydraulic system further includes: The water spray bar has a first outlet of the first passage connected to the water spray bar, and a second outlet of the second passage connected to the water spray bar. The water spray bar has multiple spray nozzles, which are spaced apart along the rotation axis of the cleaning component.

11. The cleaning equipment according to claim 1, characterized in that, The wastewater box is provided with an inlet that communicates with the overflow port. The inlet is positioned above the maximum allowable liquid level of the wastewater box. The wastewater box is used to recycle the wastewater generated by the cleaning components. When the liquid level of the clean water box exceeds the overflow port due to the external liquid source supplied to the clean water box, the liquid overflowing from the overflow port in the clean water box enters the wastewater box through the inlet to rinse the wastewater box.

12. The cleaning equipment according to claim 11, characterized in that, The cleaning equipment is used to interface with a base station, the base station is used to maintain the cleaning equipment, the base station is equipped with a liquid supply system, and the external liquid source includes the liquid supply system; the wastewater box is equipped with: The connection port is provided, and the height of the liquid inlet is higher than the height of the connection port. When the cleaning device is in the state of wiping the surface to be cleaned, the wastewater on the cleaning component enters the wastewater box through the connection port. When the cleaning device is in the state of discharging wastewater, the wastewater in the wastewater box flows out of the wastewater box through the connection port. The wastewater box is connected to a second power unit. When the cleaning equipment is cleaning the surface to be cleaned, the second power unit is in the open state and draws negative pressure into the wastewater box to provide power to draw the wastewater on the cleaning components into the wastewater box. When the cleaning equipment is in the sewage discharge state, the second power unit is in the closed state and provides positive pressure gas to the wastewater box through the base station to provide power to discharge the wastewater in the wastewater box to the outside of the wastewater box. Alternatively, the second power unit is in the open state and provides positive pressure gas to the wastewater box to provide power to discharge the wastewater in the wastewater box to the outside of the wastewater box.

13. The cleaning equipment according to claim 12, characterized in that, The wastewater box is equipped with a filter element, which is used to prevent solid waste in the wastewater box from entering the second power device. The liquid overflowing from the overflow port of the clean water box can at least rinse the filter element to clean it. The wastewater box includes a first chamber and a second chamber. The second chamber is used to contain wastewater. The first chamber and the second chamber are separated from each other and are fluidly connected through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. The filter element is provided at the through hole. The second power device is connected to the first chamber. The liquid inlet is located in the first chamber, and the connecting port is located in the second chamber. The filter element is used to prevent at least part of the solid waste in the second chamber from entering the first chamber. And / or, the second power unit includes a water-air pump.

14. The cleaning equipment according to claim 13, characterized in that, The base station is also equipped with a gas source system, which is used to output gas and to communicate with the clean water box and / or the wastewater box when the base station is connected to the cleaning equipment. When the base station is connected to the cleaning equipment and the second power device is off, the base station provides a gas-liquid mixture to the wastewater box through the gas source system and the liquid supply system to at least rinse the filter element.

15. The cleaning equipment according to claim 12, characterized in that, The fluid circuit system also includes: The recycling component includes a scraping part and a dirt-receiving cavity, wherein the scraping part is used to abut against the cleaning component to scrape dirt on the cleaning component into the dirt-receiving cavity; The wastewater box has a connecting port that is connected to the sludge-containing cavity. The connecting port is used to allow wastewater on the cleaning component to enter the wastewater box through the sludge-containing cavity, and to allow wastewater in the wastewater box to be discharged out of the cleaning equipment through the sludge-containing cavity. The sludge-holding cavity extends along the rotation axis of the cleaning component. One end of the sludge-holding cavity along its length is provided with a first sewage outlet, and the other end of the sludge-holding cavity along its length is provided with a second sewage outlet. The first sewage outlet is connected to the sewage box, and the second sewage outlet is provided with a control structure. The control structure is used to make the interior of the sludge-holding cavity connected to the exterior when the cleaning equipment is in the sewage discharge state.

16. The cleaning equipment according to claim 15, characterized in that, A dirt detection sensor is provided on the wastewater recycling path from the cleaning component to the wastewater box. The dirt detection sensor is used to detect the degree of dirtiness of the wastewater on the wastewater recycling path. The cleaning equipment also includes an equipment control board, which is electrically connected to the dirt detection sensor. When the cleaning equipment is connected to the base station, the equipment control board is used to determine the fluid parameters and supply strategy of the fluid supplied to the wastewater box based on the degree of dirt detected by the dirt detection sensor.

17. The cleaning equipment according to any one of claims 11 to 16, characterized in that, The wastewater box is equipped with a stirring device. When the cleaning equipment is in the sewage discharge state, the stirring device stirs the wastewater in the wastewater box. The top wall of the wastewater box is equipped with a driving device. The stirring device is connected to the driving device, and the rotating shaft of the stirring device extends from the top wall of the wastewater box toward the inside of the wastewater box. The wastewater tank is equipped with a full water detection device, which is triggered when the liquid level in the wastewater tank reaches a set level. The full water detection device includes: A floating element is disposed inside the wastewater box, and a detection element is provided on the floating element; A guide post is connected to the top wall of the wastewater box. The floating component is sleeved on the outside of the guide post. A limiting part is provided at the end of the guide post away from the top wall of the wastewater box, and the limiting part is used to prevent the floating component from detaching from the guide post; and A sensing element is disposed on the wall of the wastewater box and is used to sense the position of the detection element.

18. A cleaning device, comprising a cleaning component and a fluid system, the cleaning component being used to mop a surface to be cleaned, characterized in that, The fluid circuit system includes: The first chamber is provided with a liquid inlet and a liquid outlet. The liquid inlet is used to allow liquid from an external liquid source to enter the first chamber, and the liquid outlet is used to allow liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain sewage. The second chamber is provided with a communication port for sewage on the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but is fluidly connected to it through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. A second power unit is connected to the first chamber and is used to provide driving power to drive the sewage on the cleaning component into the second chamber, and to provide driving power to discharge the liquid in the first chamber into the cleaning component. When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, drawing air out of the first chamber and the second chamber to create a negative pressure state in the second chamber, thereby driving the wastewater on the cleaning component into the second chamber; when the cleaning equipment is in the state of cleaning the cleaning component, the first chamber is connected to an external liquid source to supply liquid to the first chamber, and the second power unit is in the start state to draw the liquid from the first chamber to the cleaning component.

19. A cleaning system, characterized in that, It includes a base station and cleaning equipment, wherein the base station is used for maintaining the cleaning equipment; The cleaning equipment includes a cleaning component and a liquid system. The cleaning component is used to mop the surface to be cleaned, and the liquid system includes: The first chamber is provided with a liquid inlet and a liquid outlet. The liquid inlet is used to allow liquid from an external liquid source to enter the first chamber, and the liquid outlet is used to allow liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain sewage. The second chamber is provided with a communication port for sewage on the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but is fluidly connected to it through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. A second power unit is connected to the first chamber and is used to provide driving power to drive the sewage on the cleaning component into the second chamber, and to provide driving power to discharge the liquid in the first chamber into the cleaning component. When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, drawing air out of the first chamber and the second chamber to create a negative pressure state in the second chamber, thereby driving the wastewater on the cleaning component into the second chamber; when the cleaning equipment is in the state of cleaning the cleaning component, the first chamber is connected to an external liquid source to supply liquid to the first chamber, and the second power unit is in the start state to draw the liquid from the first chamber to the cleaning component.

20. A cleaning system, characterized in that, include: A base station and cleaning equipment, wherein the base station is used for maintaining the cleaning equipment; The cleaning equipment includes a cleaning component and a liquid system. The cleaning component is used to mop the surface to be cleaned, and the liquid system includes: The water tank is equipped with an overflow outlet. and The target object is the clean water container supplied with liquid from an external liquid source to the clean water container until the liquid exceeds the overflow port. The liquid in the clean water container flows to the target object through the overflow port. The target object includes the cleaning component and / or the wastewater container.

21. The cleaning system according to claim 20, characterized in that, The cleaning equipment further includes a clean water tank and a wastewater tank. The clean water tank has a replenishment port and an overflow port. The clean water tank is connected to the wastewater tank through the overflow port. The wastewater tank is used to recycle the wastewater generated by the cleaning device. The base station is equipped with a docking interface for connecting and communicating with the liquid replenishment port; Wherein, when the interface is connected to the replenishment port, the cleaning equipment includes at least a replenishment state and a discharge state; when the cleaning equipment is in the replenishment state, the liquid provided by the base station is injected into the clean water box through the interface and the replenishment port; when the cleaning equipment is in the discharge state, the fluid provided by the base station is injected into the clean water box through the interface and the replenishment port, and at least a portion of the fluid passes through the clean water box and enters the wastewater box through the overflow port to provide positive pressure to the wastewater box, thereby discharging the wastewater in the wastewater box to the outside of the wastewater box.

22. The cleaning system according to claim 21, characterized in that, The base station is equipped with a liquid supply system for providing liquid and a gas supply system for providing gas; When the cleaning equipment is in the replenishment state, the liquid supplied by the liquid supply system is injected into the clean water box through the docking port and the replenishment port. When the cleaning equipment is in the sewage discharge state, the liquid and / or the gas supplied by the gas source system and / or the liquid supply system are injected into the clean water box through the docking port and the replenishment port. At least a portion of the liquid and / or the gas passes through the clean water box and enters the sewage box through the overflow port, so that the sewage in the sewage box is discharged to the outside of the sewage box.

23. The cleaning system according to claim 22, characterized in that, There is one interface, and both the gas source system and the liquid supply system are connected to the same interface and are connected to the same liquid replenishment port through the same interface. The cleaning equipment is provided with a sewage discharge channel for discharging waste from the sewage box. The sewage discharge channel is provided with a control structure for controlling the opening and closing of the sewage discharge channel. When the cleaning equipment is in the sewage discharge state, the control structure opens the sewage discharge channel.

24. The cleaning system according to claim 22, characterized in that, The wastewater box is connected to a second power unit and a filter element. When the cleaning equipment is cleaning the surface to be cleaned, the second power unit is in the open state and draws negative pressure into the wastewater box to provide the power to draw the wastewater on the cleaning element into the wastewater box. The filter element is used to prevent solid waste in the wastewater box from entering the second power unit. When the interface is connected to the replenishment port, the cleaning equipment also includes a state for rinsing the wastewater box. When the cleaning equipment is in the state of rinsing the wastewater box, the liquid provided by the liquid supply system is injected into the clean water box through the interface and the replenishment port, and the gas provided by the gas source system is injected into the clean water box through the interface and the replenishment port. The liquid and the gas together form a bubble liquid to rinse the filter element in the wastewater box.

25. The cleaning system according to any one of claims 22-24, characterized in that, The gas supply system includes: Gas extraction device, used to provide a gas source; The control device is connected to the gas pumping device via a gas supply pipe and to the docking interface via a fourth pipeline assembly, and is used to control the connection and disconnection between the gas supply pipe and the fourth pipeline assembly. When the cleaning equipment is in the sewage discharge state, the control device controls the air supply pipe and the fourth pipeline assembly to be connected, and the gas extraction device supplies gas to the clean water box through the air supply pipe, the control device, the fourth pipeline assembly, the docking port and the liquid replenishment port.

26. The cleaning system according to claim 25, characterized in that, The base station also includes: A wastewater tank is used to store liquid and is connected to a liquid-containing area outside the wastewater tank via a liquid-drawing pipe to draw in liquid and / or connected to the outside of the base station via a liquid-draining pipe to discharge liquid. The liquid-drawing pipe passes through the control device, which is also used to control the opening and closing of the liquid-drawing pipe. After the cleaning equipment returns to the base station, the wastewater discharged from the wastewater box enters the liquid-containing area outside the wastewater tank. The control device is also connected to the wastewater tank via a second pipeline assembly and is used to control the opening and closing between the gas supply pipe and the second pipeline assembly. When the cleaning equipment is in the sewage discharge state, the control device controls the base station to be in the sewage pumping state. When the base station is in the sewage pumping state, the control device controls the liquid pumping pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The liquid pumping pipe, the sewage tank, the second pipeline assembly, the control device, and the gas pumping device together form a liquid pumping passage. The gas pumping device provides negative pressure to the liquid pumping passage so that the liquid in the liquid-containing area is pumped into the sewage tank through the liquid pumping pipe.

27. The cleaning system according to any one of claims 22 to 24, characterized in that, The liquid supply system includes: A clean water channel connects the interface to the clean water tank inside the base station and / or the liquid source outside the base station, for transporting clean water; The gas supply system includes: An exhaust channel, connected to the gas extraction device of the gas source system, is used to discharge gas from the gas extraction device to the outside of the base station; and A multi-port connector includes an output interface and at least two input interfaces, wherein the output interface is connected to the output interface, and the outlet of the clean water channel and the outlet of the exhaust channel are respectively connected to different input interfaces.

28. The cleaning system according to claim 27, characterized in that, The liquid supply system also includes: Processing fluid container, used to store processing fluid; A processing fluid channel connects the processing fluid container to at least one other input interface of the multi-port connector; The multi-port connector includes a fluid buffer chamber, through which fluids input from different input ports of the multi-port connector can mix and then flow out through the output port; and An adjustment device is disposed on the clean water channel and / or the treatment liquid channel for adjusting the properties of the liquid entering the interface so that the properties of the liquid output from the interface to the clean water box are preset properties, wherein the properties of the liquid include at least one of the following: the temperature of the liquid, the concentration of the liquid, and the composition of the liquid.

29. The cleaning system according to claim 21, characterized in that, The cleaning equipment further includes a recovery component, which comprises a scraping part and a dirt-receiving cavity. The scraping part is used to abut against the cleaning component to scrape dirt from the cleaning component into the dirt-receiving cavity. The wastewater box is provided with: The inlet is connected to the overflow outlet; and A connecting port is connected to the dirt-containing cavity, and the liquid inlet is set at a height higher than the connecting port. When the cleaning equipment is in the sewage discharge state, the fluid provided by the base station is injected into the clean water box through the interface and the replenishment port. At least a portion of the fluid passes through the clean water box and enters the sewage box through the overflow port, so that the sewage in the sewage box flows out from the communication port into the sewage-containing cavity; the base station further includes: A base for receiving wastewater discharged from the sludge chamber; A wastewater tank for storing liquid, connected to the base via a suction pipe for drawing in liquid and / or connected to the outside via a drain pipe for discharging liquid; and Gas source system, the gas source system comprising: Gas extraction device, used to provide a gas source; The control device is connected to the gas extraction device via a gas supply pipe and to the sewage tank via a second pipeline assembly. It is used to control the on / off connection between the gas supply pipe and the second pipeline assembly. The liquid extraction pipe passes through the control device, which also controls the on / off connection of the liquid extraction pipe. The liquid extraction pipe, the sewage tank, the second pipeline assembly, the control device, and the gas extraction device together form a liquid extraction passage.

30. A base station, characterized in that, include: Gas source system, the gas source system comprising: Gas extraction device, used to provide a gas source; A wastewater tank is used to store liquids and is connected to an external liquid source via a pumping pipe to draw in liquids and to the outside via a draining pipe to discharge liquids. A valve assembly is disposed between the outlet of the wastewater tank and the outlet of the drain pipe. Opening or closing the valve assembly controls the connection or disconnection between the outlet and the drain pipe. The control device is connected to the gas pumping device through the gas supply pipe and to the valve assembly through the first pipeline assembly. The liquid extraction pipe passes through the control device. The control device is used to control the opening or closing of the liquid extraction pipe and the opening or closing of the gas supply pipe and the first pipeline assembly. When the control device is in the pre-liquid extraction state, the control device controls the gas supply pipe to be connected to the first pipeline assembly, and the gas extraction device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly closes to disconnect the outlet and the discharge outlet. When the control device is in the pre-drainage state, the control device controls the gas supply pipe to be connected to the first pipeline assembly. The gas pumping device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly opens to connect the outlet and the discharge outlet.

31. The base station according to claim 30, characterized in that, The control device is also connected to the sewage tank via a second pipeline assembly and is used to control the connection or disconnection between the gas supply pipe and the second pipeline assembly; When the control device is in the formal liquid pumping state, the control device controls the liquid pumping pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The liquid pumping pipe, the sewage tank, the second pipeline assembly, the control device, the gas supply pipe and the gas pumping device together form a liquid pumping passage. The gas pumping device provides negative pressure gas to the liquid pumping passage so that the sewage tank can be pumped into the liquid pumping pipe. When the control device is in the formal drainage state, the control device controls the gas supply pipe and the second pipeline assembly to be connected. The gas extraction device, the gas supply pipe, the control device, the second pipeline assembly, the sewage tank, the valve assembly and the drainage pipe together form a drainage passage. The gas extraction device provides positive pressure gas to the drainage passage so that the sewage tank discharges liquid to the outside through the drainage pipe. The control device is also connected to the outside atmosphere through a third pipeline assembly and is used to control the connection or disconnection between the gas pipeline and the third pipeline assembly. When the control device is in the formal drainage state, the control device controls the gas supply pipe and the third pipeline assembly to be connected. The third pipeline assembly, the control device, the gas supply pipe and the gas extraction device together form a balance passage. The gas extraction device provides the negative pressure gas to the balance passage to draw in external gas. The control device is also connected to the clean water box of the cleaning equipment through the fourth pipeline assembly, and is used to control the connection or disconnection between the gas supply pipe and the fourth pipeline assembly; When the control device is in the formal liquid pumping state, the control device controls the gas delivery pipe and the fourth pipeline assembly to be connected. The gas pumping device, the gas delivery pipe, the control device and the fourth pipeline assembly together form an air pumping passage. The gas pumping device provides positive pressure gas to the air pumping passage to deliver it to the clear water box.

32. The base station according to claim 31, characterized in that, After the control device switches from the pre-liquid extraction state to the formal liquid extraction state or from the pre-drainage state to the formal liquid drainage state, the control device controls the gas delivery pipe to disconnect from the first pipeline assembly. When the control device is in the zero position, the control device controls the liquid extraction tube to be connected and controls the gas delivery tube to be connected to the first pipeline assembly, the second pipeline assembly, the third pipeline assembly and the fourth pipeline assembly; In response to a liquid extraction command, the gas extraction device operates, and the control device switches from the zero-position state to the pre-extraction state, and then switches from the pre-extraction state to the formal extraction state; when the liquid level in the wastewater tank reaches a preset level, the gas extraction device stops operating, and the control device switches from the formal extraction state to the zero-position state; or... In response to the drain command, the gas pumping device operates, and the control device switches from the zero position state to the pre-drain state, and then switches from the pre-drain state to the formal drain state; after the gas pumping device has been operating for a preset time, the gas pumping device stops operating, and the control device switches from the formal drain state to the zero position state.

33. The base station according to any one of claims 30-32, characterized in that, The control device includes: a main body, and an air transmission pipe, an air passage pipe, and a control switch assembly disposed on the main body; The gas transmission pipe is connected to the gas delivery pipe and the gas pumping device. The gas path pipe is connected to the gas delivery pipe and the gas transmission pipe. The gas path pipe includes a valve closing gas path, a valve opening gas path, a liquid extraction gas path, a liquid discharge gas path, a balancing gas path, and an air pumping gas path. The valve closing gas path and the valve opening gas path are both connected to the valve assembly through the first pipeline assembly. The liquid extraction gas path and the liquid discharge gas path are both connected to the sewage tank through the second pipeline assembly. The balancing gas path is connected to the outside atmosphere through the third pipeline assembly. The air pumping gas path is connected to the clean water box of the cleaning equipment through the fourth pipeline assembly. The control switch assembly controls the opening or closing of the valve assembly by controlling the opening or closing of the valve-closing air circuit and the valve-opening air circuit; controls the liquid-drawing air circuit, the liquid-draining air circuit, the liquid-drawing pipe, and the balancing air circuit by controlling the opening or closing of the liquid-drawing air circuit, the liquid-draining air circuit, the liquid-drawing pipe, and the balancing air circuit by controlling the opening or closing of the air-pressurizing air circuit to control whether or not the positive pressure gas is input into the clean water box. When liquid is being pumped into the sewage tank, the control device is in the formal pumping state. The valve assembly is closed to disconnect the outlet from the discharge outlet. The control switch assembly closes the valve-closing air path, the valve-opening air path, the liquid discharge air path, and the balancing air path, and opens the liquid pumping air path, the air pumping air path, and the liquid pumping pipe. The gas pumping device operates and extracts the gas from the sewage tank through the gas delivery pipe, the gas transmission pipe, and the liquid pumping air path, so that the liquid from the external liquid source enters the sewage tank through the liquid pumping pipe under negative pressure. When the sewage tank discharges liquid, the control device is in the formal discharge state. The valve assembly opens to connect the outflow outlet and the discharge outlet. The control switch assembly closes the liquid extraction gas path, the air pumping gas path, and the liquid extraction pipe, and opens the liquid discharge gas path and the balancing gas path. The gas pumping device operates and delivers gas to the sewage tank through the gas delivery pipe, the gas transmission pipe, and the liquid discharge gas path, so that the liquid in the sewage tank is discharged to the outside of the gas source system through the liquid discharge pipe under positive pressure.

34. A cleaning system, characterized in that, include: Cleaning equipment; and The cleaning equipment is movable into the base station for maintenance. The base station includes: a base station body; and A gas supply system, wherein the gas supply system is installed on the base station body, and the gas supply system includes: Gas extraction device, used to provide a gas source; A wastewater tank is used to store liquids and is connected to an external liquid source via a pumping pipe to draw in liquids and to the outside via a draining pipe to discharge liquids. A valve assembly is disposed between the outlet of the wastewater tank and the outlet of the drain pipe. Opening or closing the valve assembly controls the connection or disconnection between the outlet and the drain pipe. The control device is connected to the gas pumping device through the gas supply pipe and to the valve assembly through the first pipeline assembly. The liquid extraction pipe passes through the control device. The control device is used to control the opening or closing of the liquid extraction pipe and the opening or closing of the gas supply pipe and the first pipeline assembly. When the control device is in the pre-liquid extraction state, the control device controls the gas supply pipe to be connected to the first pipeline assembly, and the gas extraction device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly closes to disconnect the outlet and the discharge outlet. When the control device is in the pre-drainage state, the control device controls the gas supply pipe to be connected to the first pipeline assembly. The gas pumping device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly opens to connect the outlet and the discharge outlet.

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