Removing device for photoresist on side wall of mask

Abstract

The utility model provides a device for removing light resistance on the side wall of a mask, which comprises a base arranged in a shell, a UV light source, a control system and a lifting platform deck mechanism used for placing the mask, the lifting platform deck mechanism is arranged on the base and electrically connected with the control system, the UV light source is arranged on the inner wall of the shell, and the control system is electrically connected with the control system. The control system controls the lifting platform deck mechanism to convey the mask from the outside of the shell to the inside of the shell so as to remove residual light resistance on the side wall of the mask. The mask plate is compact in structure, light resistance remaining on the side wall of the mask plate can be thoroughly removed, meanwhile, the complexity of the production process is reduced, the production period is effectively shortened, the productivity can be effectively improved, and the cost can be effectively reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor processing, in particular to a kind of removal device of mask side wall photoresist. BACKGROUND

[0002] Photolithography mask is also called mask, and the mask is made of quartz glass as substrate, with a layer of metal chromium and photosensitive glue on it, becoming a kind of photosensitive material. The designed circuit pattern is exposed on the photosensitive glue (also called photoresist) by electronic laser equipment, and the exposed area will be developed to form a circuit pattern on the metal chromium, becoming a photomask similar to the negative after exposure. Then, it is applied to the projection positioning of integrated circuit, and the projected circuit is etched by integrated circuit photolithography machine. The production and processing procedures are: exposure, development, photosensitive glue removal, and finally applied to photoetching.

[0003] In the manufacturing process of mask, various dirt will be left on the side wall of mask when coating photosensitive glue. These dirt include photoresist left in the substrate production process, residue of mask chromium surface photoresist in the cleaning process, chemicals left in the mask production process, and fingerprints, etc. When wafer foundry uses mask for production, these side wall dirt may cause wafer exposure machine to fail to accurately detect the mask, thereby affecting production quality and efficiency. Therefore, removing the dirt on the side wall of mask is a crucial quality control link in photomask production.

[0004] At present, in the prior art, the main way to remove the dirt on the side wall of mask is cleaning, which mainly includes two methods: immersion cleaning and rotary cleaning. The immersion cleaning has good effect on removing the dirt on the side wall, and can effectively remove various residues on the side wall. However, due to the limitation of design, the coverage range of the nozzle of rotary cleaning is mainly concentrated on the Cr (chromium) surface, and there are certain defects in the cleaning of the side wall, which cannot completely remove the dirt on the side wall. In view of the shortcomings of rotary cleaning in side wall cleaning, additional specific process steps are often required in actual production, and even special hardware film blocks are equipped to specifically deal with the cleaning problem of the side wall. This not only increases the complexity of production process, prolongs the production cycle, but also causes the reduction of production capacity and the increase of cost. In addition, if cleaning machine is not used, manual wiping method is adopted, which will also bring many risks, such as version drop, scratch and chromium surface chemical residue, etc. These may have adverse effects on the quality and performance of mask. UTILITY MODEL CONTENTS

[0005] In view of the above-mentioned shortcomings of the prior art, the technical problem to be solved by the utility model is to provide a removal device of mask side wall photoresist, which can effectively remove the photoresist on the side wall of mask.

[0006] The utility model provides a kind of removal device of mask side wall photoresist, including the pedestal being set in shell, UV light source, control system and be used for placing mask lifting platform mechanism of mask, the lifting platform mechanism is set on the pedestal and is electrically connected with control system, the UV light source is set on the inner wall of the shell;The control system controls the lifting platform mechanism and is transported from shell to shell inside mask, to remove the photoresist remaining on mask side wall.

[0007] Preferably, the lifting platform mechanism includes a driving portion, a first lifting portion, a second lifting portion, and a plurality of limiting portions. The driving portion and the limiting portions are both disposed on the pedestal. The first lifting portion is connected to the driving portion in a vertical direction. The second lifting portion is disposed on the top of the first lifting portion. When the first lifting portion drives the second lifting portion to descend to a predetermined height, the limiting portions push the second lifting portion to completely expose the mask side wall on the second lifting portion.

[0008] Preferably, the first lifting portion includes a first platform and a plurality of first guiding limiting members. The first platform is connected to the driving portion. Each of the first guiding limiting members is fixedly arranged on the bottom of the first platform. The first guiding limiting members abut against the pedestal when the first platform descends to the predetermined height.

[0009] Preferably, a groove or a through hole is formed on the first platform for the limiting portions to pass through.

[0010] Preferably, the second lifting portion includes a second platform for placing the mask and a plurality of second guiding limiting members for preventing the mask from falling. The second guiding limiting members are fixedly arranged on the first platform. The second platform is sleeved on the second guiding limiting members, so that the second platform can move axially up and down along the second guiding limiting members.

[0011] Preferably, a plurality of supporting blocks for placing the mask are fixedly arranged on the second platform. Gaps are formed on the second guiding limiting members to accommodate the four corners of the supporting blocks, so as to prevent the mask from falling.

[0012] Preferably, an opening is formed on the top of the shell for the mask to enter and exit the shell.

[0013] Preferably, a protective door is arranged at the opening.

[0014] Preferably, the protective door is provided with a handle.

[0015] Preferably, a groove is formed on one side of the protective door along the opening direction of the protective door to accommodate the handle.

[0016] The mask side wall photoresist removal device has the following beneficial effects:

[0017] The utility model discloses a control system control the lifting platform mechanism in the shell and convey mask to the inside of shell, under the action of lifting platform, make the four side walls of mask expose completely under the UV light source of shell four inner walls, make photoresist that UV light source irradiate the side wall of mask remain, make photoresist change chemical property, cooperate with the developing solution and remove photoresist. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 The utility model provides a three -dimensional schematic view of mask side wall photoresist removal device of an embodiment.

[0019] Figure 2 The utility model provides a first working condition schematic view of mask side wall photoresist removal device of an embodiment.

[0020] Figure 3 The utility model provides a second working condition schematic view of mask side wall photoresist removal device of an embodiment.

[0021] Figure 4 The utility model provides a three -dimensional schematic view of lifting platform mechanism of an embodiment.

[0022] Figure 5 For Figure 4 Partial enlarged view.

[0023] Figure 6 The utility model provides a first working condition schematic view of lifting platform mechanism of an embodiment.

[0024] Figure 7 The utility model provides a second working condition schematic view of lifting platform mechanism of an embodiment.

[0025] Figure 8 The utility model provides a plan view of lifting platform mechanism of an embodiment.

[0026] BRIEF DESCRIPTION OF DRAWINGS

[0027] 100, base; 200, UV light source; 300, lifting stage mechanism; 310, driving part; 320, first lifting part; 321, first platform; 322, first guide limiting piece; 330, second lifting part; 331, second platform; 332, second guide limiting piece; 333, support block; 334, support platform; 335, guide column; 340, limiting part; 400, mask; 500, shell; 510, opening; 511, groove; 520, protection door; 521, handle. DETAILED DESCRIPTION

[0028] The implementation of the present application will be illustrated by specific embodiments below, and other advantages and effects of the present application can be easily understood by those skilled in the art according to the content disclosed in the present specification.

[0029] It should be understood that the structures, proportions, sizes, etc. shown in the drawings of the present specification are only used to understand and read the content disclosed in the present specification, and are not used to limit the implementation conditions of the present application, and therefore do not have technical substantive significance. Any modification of the structure, change of the proportional relationship, or adjustment of the size, without affecting the effects and purposes that can be achieved by the present application, should still fall within the scope of the technical content disclosed by the present application. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and the like in the present specification are only for the convenience of clear description, and are not used to limit the implementation range of the present application. The change or adjustment of the relative relationship, without substantially changing the technical content, is also considered as the implementation scope of the present application.

[0030] For example, Figure 1 , Figure 2 , Figure 3 and Figure 8As shown in the embodiment of the mask sidewall photoresist removal device, a base 100, a UV light source 200, a control system and a lifting platform mechanism 300 for placing a mask 400 are arranged in a housing 500. An opening 510 for the mask to enter or exit the housing is arranged at the top of the housing 500, and the lifting platform mechanism 300 can enter or exit the opening 510. The lifting platform mechanism 300 is arranged on the base 100 and electrically connected to the control system. Control buttons and start buttons are arranged on the outer sidewall of the housing 500, and the control buttons and the start buttons are connected to the lifting platform mechanism 300 to control the lifting of the mask 400. The UV light source 200 is arranged on the inner wall of the housing 500. The mask 400 is transported from outside the housing to a predetermined position inside the housing by controlling the lifting platform mechanism 300 through the control system, so that the four sidewalls of the mask 400 are completely exposed to the UV light source 200. The sidewalls of the mask are completely exposed to the UV light source 200, and the UV light source 200 irradiates the photoresist remaining on the sidewalls of the mask to change the chemical properties of the photoresist, and the photoresist remaining on the sidewalls of the mask is removed with the developing solution. A time timer is also arranged on the outer sidewall of the housing 500 to facilitate observation of the photoresist removal time, and the control system is preferably a PLC.

[0031] In use, the start button is turned on, and the lifting platform mechanism 300 is controlled to rise to a predetermined position outside the housing 500 through the rising button. Then, the mask 400 to be processed is placed on the lifting platform mechanism 300, and the lifting platform 300 is controlled to lower the processed mask 400 into the housing 500 through the lowering button until the sidewalls around the mask 400 are completely exposed to the UV light source 200. The time of irradiation of the sidewalls of the mask 400 by the UV light source 200 is fed back by the time timer, and when the processing time reaches a predetermined time, the lifting platform mechanism 300 can be lifted to a predetermined position outside the housing with the mask 400 through the rising button.

[0032] In an embodiment, as shown in the embodiment of the mask sidewall photoresist removal device, Figures 1 to 3 A protective door 520 is arranged at the opening 510, and a handle 521 is arranged on the protective door 520 to facilitate opening of the protective door 520. A groove 511 capable of accommodating the handle 521 is arranged on one side of the opening 510 in the opening direction of the protective door 520 to avoid interference between the handle 521 and the protective door 520 and the lifting platform mechanism 300, and to prevent external dust from entering the housing to contaminate the mask.

[0033] In an embodiment, as shown in the embodiment of the mask sidewall photoresist removal device, Figures 4 to 7As shown, the lifting platform mechanism 300 includes a driving part 310, a first lifting part 320, a second lifting part 330 and a plurality of limiting parts 340. The base 100 is fixed in the shell 500 by screw connection. The driving part 310 and the limiting part 340 are fixed or detachably connected to the base 100. The limiting part 340 is distributed circumferentially, which is used to ensure that the second lifting part 330 is balanced. The first lifting part 320 is fixed or detachably connected to the driving part 310 in the vertical direction. The driving part 310 is connected to the control system. The driving part 310 includes a lifting servo motor, and a hydraulic cylinder or a pneumatic cylinder can also be selected. The second lifting part 330 is movably arranged on the top of the first lifting part 320, and is used to place the mask plate 400. Two-stage lifting is realized by the first lifting part 320 and the second lifting part 330, which is used to ensure that the position of the mask plate 400 does not deviate during the descending process, and the four side walls of the mask plate 400 can be completely exposed.

[0034] In use, the driving part 310 is controlled by the control system, and the driving part 310 drives the first lifting part 320 to drive the second lifting part 330 to rise to a predetermined position outside the shell 500. Then, the mask plate 400 is placed on the second lifting part 330, and the driving part 310 drives the first lifting part 320 and the second lifting part 330 to descend to a first predetermined height (i.e., the bottom of the second lifting part 330 abuts against the limiting part 340). As the driving part 310 continues to drive the first lifting part 320 to descend, the limiting part 340 applies a pushing force to the second lifting part 330, until the second lifting part 330 rises to a second predetermined height (i.e., the four side walls of the mask plate 400 are completely exposed to the UV light source). After the photoresist on the side wall of the mask plate 400 is removed, the control system controls the driving part 310 to ascend the first lifting part 320 to a predetermined position outside the shell 500 according to the reverse process of the descending process in the embodiment.

[0035] In an embodiment, as shown in FIG. 1, the mask plate 400 is placed on the second lifting part 330, and the driving part 310 drives the first lifting part 320 and the second lifting part 330 to descend to a first predetermined height (i.e., the bottom of the second lifting part 330 abuts against the limiting part 340). As the driving part 310 continues to drive the first lifting part 320 to descend, the limiting part 340 applies a pushing force to the second lifting part 330, until the second lifting part 330 rises to a second predetermined height (i.e., the four side walls of the mask plate 400 are completely exposed to the UV light source). Figures 4 to 7As shown, the first lifting part 320 includes a first platform 321 and a plurality of first guide limit members 322. The first platform 321 is connected to the driving part 310, so that the driving part 310 drives the first platform 321 to move up and down along the vertical direction. Each first guide limit member 322 is fixed to the bottom of the first platform 321 along the vertical direction, and the free end of the first guide limit member 322 is inserted into the guide hole on the base. The first guide limit member 322 includes but is not limited to a stepped shaft structure. In use, the driving part 310 drives the first guide limit member 322 to descend along the vertical direction. When the first guide limit member 322 abuts against the base 100, i.e., the first platform 321 descends to a first predetermined height, the limiting part 340 just abuts against the second lifting part 330 at this moment. With the continuous descent of the first platform 321 driven by the driving part 310, the limiting part 340 applies a pushing force to the second lifting part 330, until the four side walls of the mask plate 400 are completely exposed, i.e., the second predetermined height is reached. The first platform 321 is provided with a groove or a through hole for the limiting part 340 to pass through. Whether the groove or the through hole is selected can be determined according to the specific working conditions. The first guide limit member 322 limits the descending height of the first platform 321, and also provides a guide function for the descent of the first platform 321.

[0036] In an embodiment, as shown in Figures 4 to 7 The second lifting part 330 includes a second platform 331 for placing the mask plate 400 and a plurality of second guide limit members 332 for preventing the mask plate 400 from falling. The second guide limit members 332 are fixed to the first platform 321. The arrangement of the second guide limit members 332 includes but is not limited to a circumferential arrangement. The second platform 331 is sleeved on the second guide limit members 332. The second guide limit members 332 include two guide columns 335 and a support platform 334. In the initial state (i.e., without the pushing force applied by the limiting part), the second platform 331 abuts against the support platform 334. In use, the driving part 310 drives the first platform 321 to descend to the first predetermined height, so that the limiting part 340 abuts against the second platform 331. With the continuous descent of the first platform 321, the limiting part 340 applies a pushing force to the second platform 331, so that the second platform 331 ascends along the guide columns 335 to the second predetermined height (i.e., the four side walls of the mask plate 400 are completely exposed). In this process, the mask plate 400 can be prevented from deviating.

[0037] In an embodiment, as shown in Figure 5As shown, the second platform 331 is fixed with a plurality of support blocks 333 for placing the mask, and the second guide limiting member 332 is provided with gaps for accommodating the support blocks 333. Specifically, the gaps are formed by two guide columns 335 arranged side by side, and when the four corners of the mask 400 are placed on the support blocks 333, the four corners of the mask 400 are opened and closed in the gaps to prevent the mask 400 from falling.

[0038] The above embodiments only exemplarily illustrate the principles and effects of the present application, and are not used to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought disclosed by the present application should be covered by the claims of the present application.

Claims

1. A device for removing photoresist from the sidewalls of a photomask, characterized in that, The application relates to a mask plate cleaning device, which comprises a base (100), a UV light source (200), a control system and a lifting platform mechanism (300) for placing a mask plate (400) in a shell (500), the lifting platform mechanism (300) is arranged on the base (100) and electrically connected with the control system, the UV light source (200) is arranged on the inner wall of the shell (500), the control system controls the lifting platform mechanism (300) to convey the mask plate (400) from outside the shell into the shell, so that the sidewall of the mask plate is completely exposed to the UV light source (200) to remove the photoresist remaining on the sidewall of the mask plate.

2. The mask sidewall photoresist removal device of claim 1, wherein, The lifting platform mechanism (300) comprises a driving part (310), a first lifting part (320), a second lifting part (330) and a plurality of limiting parts (340), the driving part (310) and the limiting parts (340) are arranged on the base (100), the first lifting part (320) is connected with the driving part (310) in the vertical direction, and the second lifting part (330) is movably arranged on the top of the first lifting part (320); when the driving part (310) drives the first lifting part (320) to drive the second lifting part (330) to descend to a predetermined height, the limiting parts (340) push the second lifting part (330), so that the sidewall of the mask plate on the second lifting part (330) is completely exposed.

3. The mask sidewall photoresist removal device of claim 2, wherein, The first lifting part (320) comprises a first platform (321) and a plurality of first guide limiting members (322), the first platform (321) is connected with the driving part (310), each first guide limiting member (322) is fixedly arranged on the bottom of the first platform (321), the free end of the first guide limiting member (322) is inserted into a guide hole on the base, the first platform (321) descends to a predetermined height, and the first guide limiting member (322) abuts against the base (100).

4. The mask sidewall photoresist removal device of claim 3, wherein, A groove or a through hole is formed in the first platform (321) and used for the limiting parts (340) to pass through.

5. The mask sidewall photoresist removal device of claim 3, wherein, The second lifting part (330) comprises a second platform (331) for placing the mask plate and a plurality of second guide limiting members (332) for preventing the mask plate from falling, the second guide limiting members (332) are fixedly arranged on the first platform (321), and the second platform (331) is sleeved on the second guide limiting members (332), so that the second platform (331) can move up and down along the second guide limiting members (332) in the axial direction.

6. The mask sidewall photoresist removal device of claim 5, wherein, A plurality of supporting blocks (333) for placing the mask plate are fixedly arranged on the second platform (331), and gaps for accommodating the four corners of the supporting blocks are formed in the second guide limiting members (332), so that the mask plate is prevented from falling.

7. The mask sidewall photoresist removing apparatus according to any one of claims 1 to 6, wherein An opening (510) for the mask plate to enter and exit the shell is arranged on the top of the shell (500).

8. The mask sidewall photoresist removal device of claim 7, wherein, A protective door (520) is arranged at the opening (510).

9. The mask sidewall photoresist removing device of claim 8, wherein, The protective door (520) is provided with a handle (521).

10. The mask sidewall photoresist removal device of claim 9, wherein, The opening (510) is provided with a groove (511) capable of accommodating the handle (521) along one side of the opening direction of the protective door (520).

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