Quartz boat cleaning device for silicon wafer diffusion

Abstract

The utility model is applicable to the technical field of quartz boat cleaning, and provides a quartz boat cleaning device for silicon wafer diffusion, which comprises a cleaning tank provided with a cleaning area, and a support frame for supporting a quartz boat is arranged in the cleaning area; one end of the cleaning frame is connected with the cleaning tank in a hinged mode, a sliding carrying table is further arranged on the cleaning frame, a spraying head is arranged on the sliding carrying table, and when the cleaning frame deflects to cover the cleaning tank, the spraying head extends into the quartz boat in the cleaning area. According to the utility model, the spraying head is directly inserted into the quartz boat in a deflection manner, so that the spraying water flow can directly act on the clamping groove for supporting the silicon wafer on the quartz boat, and the situation that the spraying effect is poor due to the shielding of the structure of the quartz boat is reduced.

Description

Technical Field

[0001] This utility model belongs to the field of quartz boat cleaning technology, and particularly relates to a quartz boat cleaning device for silicon wafer diffusion. Background Technology

[0002] The silicon wafer diffusion process involves placing a silicon wafer in a high-temperature diffusion furnace, through which gases such as nitrogen, oxygen, and POCl3 are introduced. A chemical reaction occurs at high temperatures, and the diffusion process forms a PN junction on the silicon wafer surface. Specifically, the silicon wafer is first placed on a quartz boat, which is then placed in a high-temperature diffusion furnace (typically a diffusion quartz tube). A gas containing a diffusion source is introduced, and under high-temperature conditions, the diffusion source reacts with the silicon wafer, achieving the diffusion process and forming a PN junction.

[0003] In the silicon wafer diffusion process, the quartz boat that plays a supporting role needs to be cleaned by immersion and spraying with a variety of composite solutions when it is reused to avoid the formation of impurities during the reaction process that would affect the subsequent placement of silicon wafers. However, most of the spraying equipment used in the existing technology cannot extend into the interior of the quartz boat, and the spraying effect is poor due to the shielding effect of the quartz boat itself. Utility Model Content

[0004] This invention provides a quartz boat cleaning device for silicon wafer diffusion, which aims to solve the problem that most current spraying equipment cannot extend into the interior of the quartz boat, and the spraying effect is poor due to the obstruction caused by the structure of the quartz boat itself.

[0005] This invention is implemented as follows: a quartz boat cleaning device for silicon wafer diffusion, comprising:

[0006] A cleaning tank, wherein a cleaning area is provided on the cleaning tank, and a support frame for supporting a quartz boat is provided inside the cleaning area;

[0007] A cleaning rack is provided, one end of which is hinged to a cleaning tank. The cleaning rack is also equipped with a sliding platform, and a spray head is provided on the sliding platform. When the cleaning rack is deflected to cover the cleaning tank, the spray head extends into the interior of the quartz boat in the cleaning area.

[0008] Preferably, the cleaning rack is provided with a first sliding groove, a first through groove and a guide groove, the first through groove being located at the bottom of the first sliding groove and the guide groove being located on the side wall of the first sliding groove;

[0009] The sliding platform includes a support plate, a traction slider, and a guide slider. The support plate slides in a first sliding groove, the guide slider slides in a first through groove, and the traction slider slides in a guide groove.

[0010] Preferably, the guide slider passes through the cleaning frame from the first through groove.

[0011] Preferably, the spray head is located at the end of the guide slider away from the support plate, and the support plate and the guide slider are provided with pipes that communicate with the spray head.

[0012] Preferably, a lead screw is provided in the guide groove, and the traction slider is mounted on the lead screw.

[0013] Preferably, one end of the cleaning rack is provided with a hinge block, the cleaning tank is provided with a rotating groove, and the hinge block is nested on a rotating shaft provided in the rotating groove.

[0014] Preferably, the spray head ring side is provided with an outer protective cover with a frustum-shaped structure.

[0015] Compared with the prior art, the embodiments of this application have the following main advantages:

[0016] 1. The quartz boat cleaning device for silicon wafer diffusion provided by this utility model allows the spray head to be directly inserted into the quartz boat through deflection, which enables the spray head to clean the inside of the quartz boat and allows the spray water flow to directly act on the slots on the quartz boat used to support the silicon wafer, reducing the situation where the spraying effect is poor due to the obstruction of the quartz boat itself.

[0017] 2. The quartz boat cleaning device for silicon wafer diffusion provided by this utility model deflects the cleaning frame away from the top of the cleaning tank, and the top space of the cleaning area is freed up due to the lifting of the cleaning frame, which makes it easier for the quartz boat to be placed on the support frame from the top of the cleaning area, reducing the impact of the spray head setting on the quartz boat placement. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the structure of a quartz boat cleaning device for silicon wafer diffusion provided by this utility model.

[0019] Figure 2 This is a schematic diagram of the cleaning frame and cleaning tank structure of a quartz boat cleaning device for silicon wafer diffusion provided by this utility model.

[0020] Figure 3 This is a schematic diagram of the internal structure of a quartz boat cleaning device for silicon wafer diffusion provided by this utility model.

[0021] Figure 4 This is a schematic diagram of the sliding stage in a quartz boat cleaning device for silicon wafer diffusion provided by this utility model.

[0022] Figure 5 This is a schematic diagram of the cleaning frame structure of a quartz boat cleaning device for silicon wafer diffusion provided by this utility model.

[0023] Explanation of reference numerals in the attached figures:

[0024] 100. Cleaning tank; 110. Cleaning area; 120. Support frame;

[0025] 200. Cleaning rack; 201. First sliding groove; 202. First through groove; 203. Guide groove; 210. Sliding platform; 211. Bearing plate; 212. Traction slider; 213. Guide slider; 220. Spray head; 230. Outer cover; 240. Hinge block; 250. Lead screw;

[0026] 300. Quartz boat. Detailed Implementation

[0027] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs; the terminology used herein in the specification of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application; the terms "comprising" and "having," and any variations thereof, in the specification, claims, and foregoing drawings of this application are intended to cover non-exclusive inclusion. The terms "first," "second," etc., in the specification, claims, or foregoing drawings of this application are used to distinguish different objects, not to describe a particular order.

[0028] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0029] This utility model embodiment provides a quartz boat cleaning device for silicon wafer diffusion, such as... Figures 1-5 As shown, the quartz boat cleaning apparatus for silicon wafer diffusion includes:

[0030] A cleaning tank 100 is provided, and a cleaning area 110 is provided on the cleaning tank 100. The cleaning area 110 is provided with a support frame 120 for supporting the quartz boat 300. Here, the support frame 120 can adopt the structure used in the prior art for supporting the quartz boat 300. The top of the cleaning area 110 is an open structure. The cleaning area 110 is also provided with a cleaning nozzle. An ultrasonic cleaning device can also be used in the cleaning tank 100 as needed, combining ultrasonic washing and spray washing mixed cleaning modes.

[0031] A cleaning rack 200 is provided with a hinge block 240 at one end. A rotating groove is provided on the cleaning tank 100. The hinge block 240 is nested on a rotating shaft provided in the rotating groove. The cleaning rack 200 and the cleaning tank 100 are hingedly connected.

[0032] The cleaning rack 200 is also provided with a sliding platform 210 with a spray head 220. The spray head 220 is provided on the sliding platform 210. When the cleaning rack 200 is deflected and covers the cleaning tank 100, the spray head 220 extends into the interior of the quartz boat 300 in the cleaning area 110. When the cleaning rack 200 is lifted, the cleaning rack 200 will move away from the top of the cleaning tank 100.

[0033] After the cleaning rack 200 is moved away from the top of the cleaning tank 100, the top space of the cleaning area 110 will be freed up due to the lifting of the cleaning rack 200, making it easier for the quartz boat 300 to be placed on the support rack 120 from the top of the cleaning area 110, reducing the impact of the spray head 220 on the placement of the quartz boat 300; in addition, the spray head 220 can be deflected and directly inserted into the interior of the quartz boat 300, allowing the spray head 220 to clean the interior of the quartz boat 300, and allowing the spray water flow to directly act on the slots on the quartz boat 300 used to support the silicon wafers, reducing the poor spraying effect caused by the structure of the quartz boat 300 itself.

[0034] In a preferred embodiment of this invention, the cleaning rack 200 is provided with a first sliding groove 201, a first through groove 202, and a guide groove 203. The first through groove 202 is located at the bottom of the first sliding groove 201. The sliding platform 210 includes a support plate 211, a traction slider 212, and a guide slider 213. The support plate 211 slides in the first sliding groove 201, the guide slider 213 slides in the first through groove 202, and the traction slider 212 slides in the guide groove 203.

[0035] In this embodiment, the first through groove 202 and the first sliding groove 201 form a T-shaped structure. One end of the guide slider 213 passes through the cleaning frame 200 from the first through groove 202, and the other end is connected to the support plate 211 that slides on the first sliding groove 201. The guide groove 203 is provided on the side wall of the first sliding groove 201. A lead screw 250 is provided inside the guide groove 203. The traction slider 212 is provided with a screw hole that matches the lead screw 250. Here, the lead screw 250 is driven to rotate by a driving device provided inside the cleaning frame 200. The rotation of the lead screw drives the traction slider 212 to move back and forth along the guide groove 203, thereby pulling the spray head 220 located on the guide slider 213 to move back and forth, thereby improving the cleaning effect of the spray head 220 on the quartz boat 300.

[0036] The drive device is existing technology, and the traction slider 212 and lead screw 250 adopt the motion principle based on the structure principle of ball screw.

[0037] In a preferred embodiment of this invention, the spray head 220 is disposed at the end of the guide slider 213 away from the support plate 211, and the support plate 211 and the guide slider 213 are provided with pipes communicating with the spray head 220.

[0038] In this embodiment, the end face of the support plate 211 away from the spray head 220 is provided with an interface that communicates with the pipeline. During the cleaning process, the cleaning solution to be used is connected to the interface through the pipeline, and the cleaning solution is delivered to the spray head 220 by an external cleaning solution delivery device to complete the purpose of spray washing.

[0039] The spray head 220 is provided with a frustum-shaped outer cover 230 on its circumferential side. The outer cover 230 reduces the water mist sprayed from the spray head 220 from reaching the end face of the support plate 211 away from the cleaning area 110 from the first through groove 202. In order to reduce the impact of the cleaning liquid on the internal structure of the guide groove 203, the first through groove 202 can be set on the side of the first sliding groove 201 away from the guide groove 203, and the bottom of the first through groove 202 can be designed as a sloping structure so that the cleaning liquid at the bottom of the first through groove 202 can flow back to the cleaning area 110 through the first through groove 202.

[0040] In a further preferred embodiment of the present invention, one end of the cleaning rack 200 is provided with a hinge block 240, the cleaning tank 100 is provided with a rotating groove, and the hinge block 240 is nested on a rotating shaft provided in the rotating groove;

[0041] It should be noted that, for the sake of simplicity, the foregoing embodiments are all described as a series of actions. However, those skilled in the art should understand that the present invention is not limited to the described order of actions, as some steps may be performed in other orders or simultaneously according to the present invention. Furthermore, those skilled in the art should also understand that the embodiments described in the specification are preferred embodiments, and the actions and modules involved are not necessarily essential to the present invention.

[0042] The above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit the scope of protection of this utility model. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on these embodiments, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model. Although this utility model has been described in detail with reference to the above embodiments, those skilled in the art can still combine, add, delete, or otherwise adjust the features of the various embodiments of this utility model according to the circumstances without conflict or creative effort, thereby obtaining different technical solutions that do not fundamentally depart from the concept of this utility model. These technical solutions are also within the scope of protection of this utility model.

Claims

1. A quartz boat cleaning apparatus for silicon wafer diffusion, characterized in that, The utility model relates to a cleaning device for quartz boat, including: A cleaning tank (100) is provided with a cleaning area (110), and a support frame (120) for supporting a quartz boat (300) is arranged in the cleaning area (110); A cleaning frame (200) is hingedly connected to the cleaning tank (100), and a sliding platform (210) is further arranged on the cleaning frame (200), wherein a spray head (220) is arranged on the sliding platform (210), and when the cleaning frame (200) is deflected to cover the cleaning tank (100), the spray head (220) extends into the quartz boat (300) in the cleaning area (110).

2. The cleaning apparatus for a quartz boat for silicon wafer diffusion according to claim 1, wherein The cleaning frame (200) is provided with a first sliding groove (201), a first through groove (202) and a guide groove (203), the first through groove (202) is arranged at the bottom of the first sliding groove (201), and the guide groove (203) is arranged on the side wall of the first sliding groove (201); The sliding platform (210) comprises a bearing plate (211), a traction sliding block (212) and a guide sliding block (213), the bearing plate (211) slides in the first sliding groove (201), the guide sliding block (213) slides in the first through groove (202), and the traction sliding block (212) slides in the guide groove (203).

3. The apparatus for cleaning a quartz boat for silicon wafer diffusion according to claim 2, wherein The guide sliding block (213) penetrates the cleaning frame (200) from the first through groove (202).

4. The apparatus for cleaning a quartz boat for silicon wafer diffusion according to claim 3, wherein The spray head (220) is arranged at one end of the guide sliding block (213) away from the bearing plate (211), and pipelines communicating with the spray head (220) are arranged in the bearing plate (211) and the guide sliding block (213).

5. The apparatus for cleaning a quartz boat for silicon wafer diffusion according to claim 4, wherein A lead screw (250) is arranged in the guide groove (203), and the traction sliding block (212) is assembled on the lead screw (250).

6. The apparatus for cleaning a quartz boat for silicon wafer diffusion according to claim 5, wherein One end of the cleaning frame (200) is provided with a hinge block (240), the cleaning tank (100) is provided with a rotating groove, and the hinge block (240) is nested on a rotating shaft arranged in the rotating groove.

7. The apparatus for cleaning a quartz boat for silicon wafer diffusion according to claim 6, wherein The spray head (220) is provided with a circular table-shaped outer shield (230) on the ring side.

Images