Magnetron sputtering cathode system and coating equipment

Abstract

The utility model relates to the technical field of magnetron sputtering coating, and discloses a magnetron sputtering cathode system and coating equipment, a first end of a magnet push rod is connected with a magnet, and at least part of the magnet push rod penetrates through a magnet fixing rod to keep the angle of the magnet relatively static; the push rod guide rail is used for contacting with the second end of the magnet push rod, the rotating module drives the push rod guide rail to rotate by a preset angle, and the magnet push rod contacts with and moves relative to the magnet fixing rod along with the contour shape of the push rod guide rail to change the distance between the magnet and the target. Under the conditions that the vacuum state is not broken and the target material is not removed, the distance between the magnet and the target material is adjusted, so that the radial magnetic field intensity distribution of the target material is adjusted; the surface magnetic field intensity change caused by the reduction of the thickness of the target material is eliminated, so that the influence on the sputtering rate and the coating quality is eliminated.

Description

Technical Field

[0001] This utility model relates to the field of magnetron sputtering coating technology, and in particular to a magnetron sputtering cathode system and coating equipment. Background Technology

[0002] Sputtering deposition typically refers to a coating technique in which high-energy particles, accelerated by an electric field, bombard the surface of a target material, ejecting target atoms or molecules, which are then deposited onto a substrate to form a thin film. In magnetron sputtering, the introduction of a magnetic field causes electrons to move along helical orbits under the influence of both electric and magnetic fields, increasing the electron and plasma density near the target surface and thus improving sputtering efficiency. Compared to traditional evaporation deposition processes, magnetron sputtering deposition offers advantages such as denser film layers, lower substrate temperature rise, and higher and more stable deposition rates.

[0003] In magnetron sputtering coating, the magnetic field strength distribution on the target surface affects coating uniformity, target utilization, and coating rate. Therefore, a magnetic field adjustment mechanism is needed to regulate the magnetic field strength distribution. Based on the target shape, magnetron sputtering cathodes are typically classified into planar cathodes and rotating cathodes. Planar cathodes have a relatively simple structure, making it easier to design a magnet adjustment mechanism. Rotating cathodes, however, are constrained by their motion, space limitations, and complex cooling and sealing structures, resulting in more complex magnetic field adjustment mechanisms. For example, in a conventional rotating cathode system, the target is mounted on a rotating magnetic rod, which remains stationary. The magnetic rod generates a stable magnetic field around the target to constrain electron trajectories and improve ionization. During coating, as the target is consumed, its thickness gradually decreases, leading to changes in the magnetic field strength on the target surface. This can cause variations in the sputtering rate and coating quality, making it difficult to guarantee the stability of the sputtering coating effect. To ensure the stability of sputtering coating effects, the impact of target thickness variations on the coating effect can be reduced by adjusting the distance between the magnetic rod and the target. In existing technologies, the position adjustment of the magnetic rod in a rotating cathode system is sometimes achieved by breaking the vacuum and adjusting it in an atmospheric environment. This method is not only time-consuming and difficult to assemble, but also has a limited adjustable range. Existing technologies sometimes use adjustment components, including gears, to achieve magnetic rod position adjustment without breaking the vacuum. However, these adjustment components are often complex in structure, occupy a large amount of space, and are not conducive to improving the overall performance of the cathode system.

[0004] Therefore, there is an urgent need for a magnetron sputtering cathode system that allows for convenient adjustment of the magnetic field strength in the design of a rotating cathode. Utility Model Content

[0005] The utility model discloses a magnetron sputtering cathode system and coating equipment, under the condition of not breaking the vacuum state, realize the adjustment of target material surface magnetic field intensity distribution, eliminate the influence of target material thickness reduction to sputtering rate and coating quality.

[0006] In order to achieve this purpose, the utility model adopts the following technical scheme:

[0007] Magnetron sputtering cathode system, including:

[0008] Target material module, the target material module includes target material;

[0009] Magnet module, the magnet module includes magnet fixed link, magnet and adjustment assembly, the adjustment assembly includes magnet push rod and push rod guide rail, the first end of magnet push rod is connected with the magnet, and the push rod guide rail is used for contacting the second end of magnet push rod, and at least part of magnet push rod passes through magnet fixed link;

[0010] Rotary module, the rotary module can drive push rod guide rail rotates the preset angle, to make magnet push rod moves relative to magnet fixed link, be used for changing the interval of magnet and target material.

[0011] As optional technical scheme of magnetron sputtering cathode system, the adjustment assembly still includes adjustment pipe, and the adjustment pipe is fixedly connected with push rod guide rail, and the adjustment pipe is provided with a pair of through holes, and the magnet push rod passes through the pair of through holes.

[0012] As optional technical scheme of magnetron sputtering cathode system, the first end of magnet push rod is provided with screw thread, and the magnet push rod is screw connected with the magnet.

[0013] As optional technical scheme of magnetron sputtering cathode system, the second end of magnet push rod is provided with ball head or roller, and the ball head or roller is used to form the abutment of relative sliding or rolling with push rod guide rail.

[0014] As optional technical scheme of magnetron sputtering cathode system, the adjustment assembly still includes auxiliary part, and the auxiliary part can make the second end of magnet push rod always keep abutment with push rod guide rail, so that magnet push rod can reciprocatingly move relative to magnet fixed link.

[0015] As optional technical scheme of magnetron sputtering cathode system, the auxiliary part is elastic part, the elastic part is sleeved on magnet push rod, and the first end of elastic part abuts on magnet fixed link.

[0016] As an optional technical scheme of the magnetron sputtering cathode system, the second end of the magnet push rod is provided with a protruding part, the protruding part is protruded along the radial direction of the magnet push rod, the elastic member is sleeved on the middle section of the magnet push rod, and the second end of the elastic member abuts against the protruding part.

[0017] As an optional technical scheme of the magnetron sputtering cathode system, the second end of the magnet push rod is provided with a clamping part, the auxiliary member is a clamping member, the clamping member is fixedly arranged on the push rod guide rail, and the clamping member and the clamping part are movably connected to prevent the magnet push rod from being disconnected from the push rod guide rail.

[0018] As an optional technical scheme of the magnetron sputtering cathode system, the push rod guide rail is provided with a sliding groove, and the magnet push rod is slidably arranged in the sliding groove.

[0019] As an optional technical scheme of the magnetron sputtering cathode system, the magnet module comprises a plurality of the adjusting assemblies, and the adjusting assemblies are distributed along the length direction of the magnet fixing rod.

[0020] As an optional technical scheme of the magnetron sputtering cathode system, the target material is provided in a cylindrical shape, and the magnet module is arranged in the inner cavity of the target material; the target material module further comprises an upper end cover and a lower end cover, the upper end cover is sealingly arranged at the upper end of the target material, and the lower end cover is sealingly arranged at the lower end of the target material; the rotating module can drive the target material to rotate.

[0021] The coating equipment comprises the magnetron sputtering cathode system.

[0022] The utility model discloses the beneficial effect:

[0023] The magnetron sputtering cathode system provided by the utility model comprises a target material module, a magnet module and a rotating module, the target material module comprises a target material, the magnet module comprises a magnet fixing rod, a magnet and an adjusting assembly, the adjusting assembly further comprises a magnet push rod and a push rod guide rail, the first end of the magnet push rod is connected with the magnet, and at least part of the magnet push rod passes through the magnet fixing rod, the magnet push rod and the magnet can be constrained from rotating in the horizontal direction, and the angle of the magnet can be kept relatively static during work; the second end of the magnet push rod is contacted by the push rod guide rail, the rotating module can drive the push rod guide rail to rotate by a preset angle, meanwhile, the magnet push rod is contacted and moves along the contour shape of the push rod guide rail relative to the magnet fixing rod, so as to change the distance between the magnet and the target material. In the case that the vacuum state is not broken and the target material is not removed, the distance between the magnet and the target material can be adjusted, so that the radial magnetic field intensity distribution of the target material can be adjusted, the purpose of enhancing or reducing the surface magnetic field intensity of the target material is achieved; the surface magnetic field intensity change caused by the thickness change of the target material can be eliminated, the influence of the thickness change of the target material on the sputtering rate and the film coating quality is eliminated, the surface magnetic field intensity distribution characteristics of the target material are improved, the film coating stability is improved, and the film coating process can be adjusted according to actual needs.

[0024] The film coating equipment provided by the utility model can reduce assembly difficulty, has simple structure and occupies small space by adopting the magnetron sputtering cathode system; the adjusting difficulty of the magnet is reduced, and the adjustable range is improved; the efficiency of film coating is improved, and the film coating effect is improved. BRIEF DESCRIPTION OF DRAWINGS

[0025] Figure 1 is a structural schematic view of the magnetron sputtering cathode system provided by the utility model embodiment;

[0026] Figure 2 is an enlarged view of part A in the utility model Figure 1 ;

[0027] Figure 3 is a sectional view of the utility model Figure 2 at B-B.

[0028] In the drawings:

[0029] 1, target material; 2, magnet fixing rod; 3, vacuum chamber door plate; 4, upper end cover; 5, magnet; 6, lower end cover; 7, rotating module; 8, target material driving belt; 9, adjusting driving belt; 10, target material driving pulley; 11, adjusting driving pulley; 12, elastic member; 13, magnet push rod; 14, push rod guide rail; 15, adjusting pipe; 16, fixing screw; 17, through hole. DETAILED DESCRIPTION

[0030] The utility model will be further explained in detail below in combination with the drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the utility model, and not to limit the utility model. In addition, it should be noted that, in order to facilitate the description, only the part related to the utility model is shown in the drawings, not all structures.

[0031] In the description of the utility model, unless otherwise explicitly specified and limited, the terms "connected", "connected", "fixed" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated, it can be mechanically connected, or it can be electrically connected, it can be directly connected, or it can be indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction relationship of two elements. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.

[0032] In the utility model, unless otherwise explicitly specified and limited, the first feature is "on" or "below" the second feature, which can include direct contact between the first and second features, or indirect contact between the first and second features through another feature between them. Moreover, the first feature "on", "above" and "above" the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0033] In the description of the embodiment, the terms "up", "down", "right", "left" and other orientation or position relationship are based on the orientation or position relationship shown in the drawings, only for the convenience of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore, it cannot be understood as a limitation of the utility model. In addition, the terms "first", "second" are only used to distinguish in the description, and have no special meaning.

[0034] As Figures 1 to 3As shown, this utility model discloses a magnetron sputtering cathode system, including a target module, a magnet module, and a rotation module 7. The target module includes a target 1, and the magnet module includes a magnet fixing rod 2, a magnet 5, and an adjustment assembly. The adjustment assembly includes a magnet push rod 13 and a push rod guide rail 14. The first end of the magnet push rod 13 is connected to the magnet 5. The magnet fixing rod 2 is provided with a guide hole, and at least part of the magnet push rod 13 passes through the guide hole on the magnet fixing rod 2, so as to constrain the assembly composed of the magnet push rod 13 and the magnet 5 to move synchronously in a specific direction without relative rotation with the magnet fixing rod 2, and to keep the magnet 5 stationary relative to the magnet push rod 13. Specifically, the guide hole on the magnet fixing rod 2 can extend in a certain direction, thereby limiting the movement of the magnet push rod 13 to only in that direction and preventing relative rotation with the magnet fixing rod 2; the guide hole on the magnet fixing rod 2 can be located inside the main body of the magnet fixing rod 2, or it can be a guide hole on the side extension fixedly connected to the main body of the magnet fixing rod 2; the guide hole on the magnet fixing rod 2 can be a closed hole or a non-closed hole; in short, the guide hole on the magnet fixing rod 2 only needs to play the role of limiting the movement direction of the magnet push rod 13, so its position and shape can be flexibly determined according to actual needs.

[0035] Meanwhile, the push rod guide rail 14 is used to contact the second end of the magnet push rod 13. The rotation module 7 can drive the push rod guide rail 14 to rotate by a preset angle so that the magnet push rod 13 moves relative to the magnet fixing rod 2 from the initial position. Due to the limiting effect of the guide hole on the magnet fixing rod 2, the magnet push rod 13 and the magnet 5 can only move in a specific direction to change the distance between the magnet 5 and the target material 1. Specifically, under the driving action of the rotation module 7, the push rod guide rail 14 can rotate by a preset angle. Since the push rod guide rail 14 has a pre-designed contour track, during the rotation of the push rod guide rail 14, the second end of the magnet push rod 13 moves relative to the push rod guide rail 14 at the contact point; at the same time, the second end of the magnet push rod 13 moves along the pre-designed contour track on the push rod guide rail 14 to push the magnet push rod 13 to slide linearly relative to the magnet fixing rod 2, thereby changing the distance between the magnet 5 and the target material 1.

[0036] Without breaking the vacuum or removing the target 1, the distance between the magnet 5 and the target 1 can be adjusted, thereby adjusting the radial magnetic field intensity distribution of the target 1. This achieves the purpose of enhancing or reducing the surface magnetic field intensity of the target 1. It can eliminate the surface magnetic field intensity variation caused by changes in the thickness of the target 1, thus eliminating the impact on the sputtering rate and coating quality, improving the stability of the surface magnetic field intensity distribution of the target 1, thereby improving the coating stability, and facilitating the adjustment of the coating process according to actual needs. For example, the magnet 5 can be a permanent magnet or an electromagnet.

[0037] Furthermore, the adjustment assembly also includes an auxiliary component that ensures the second end of the magnet push rod 13 remains in contact with the push rod guide rail 14, allowing the magnet push rod 13 to reciprocate relative to the magnet fixing rod 2. By maintaining the relative interaction between the magnet push rod 13 and the push rod guide rail 14 through the auxiliary component, the structure of the adjustment assembly is stabilized, and the distance between the magnet 5 and the target material 1 can be repeatedly adjusted, improving the applicability of the magnetron sputtering cathode system.

[0038] Specifically, the auxiliary component functions to give the second end of the magnet push rod 13 a tendency to move away from or towards the magnet fixing rod 2. Figures 1 to 3 The illustrated embodiment is an example, such as setting... Figure 3 The position of the magnet push rod 13 shown is its initial position. The rotating module 7 can drive the push rod guide rail 14 to rotate clockwise or counterclockwise by a preset angle, so that the magnet push rod 13 moves relative to the magnet fixing rod 2 from its initial position and reaches the target position. At this time, the auxiliary component is used to prevent the position change of the magnet push rod 13 caused by the rotation module 7 while the rotation module 7 is driving, and to make the second end of the magnet push rod 13 tend to move away from the magnet fixing rod 2 after the rotation module 7 stops driving, so that the magnet push rod 13 tends to return to its initial position. In some other embodiments, although the auxiliary component cannot prevent the position change of the magnet push rod 13 caused by the rotation module 7 while the rotation module 7 is driving, it can make the second end of the magnet push rod 13 move away from the magnet fixing rod 2 and toward the initial position after the rotation module 7 stops driving, so that the magnet push rod 13 tends to return to its initial position. Understandably, the tendency of the magnetic push rod 13 to return to its initial position will result in actual movement of the magnetic push rod 13 after the rotating module 7 stops driving. Understandably, the auxiliary component helps the adjusting assembly return to a specific state without external force, increasing the controllability and repeatability of the adjusting assembly. The auxiliary component does not necessarily need to always resist the movement of the magnetic push rod 13 caused by the rotating module 7. In some other embodiments, to maintain the service life of the adjusting assembly and the rotating module 7 and further reduce the stress interference caused by the interaction of the components, the auxiliary component is determined to only help maintain stable contact between the second end of the magnetic push rod 13 and the push rod guide rail 14, so that the magnetic push rod 13 can move stably relative to the magnetic fixing rod 2. In some embodiments, the push rod guide rail 14 and the auxiliary component can also be adapted so that when or after the rotating module 7 is driving, the auxiliary component can cause the second end of the magnetic push rod 13 to have a tendency to move closer to the magnetic fixing rod 2.

[0039] Specifically, the shape of the track on the push rod guide rail 14 for sliding relative to the magnet push rod 13 can be a non-closed arc, polygon, straight line, etc., as long as it can achieve the purpose of moving the magnet push rod 13 relative to the magnet fixing rod 2. In this embodiment, the push rod guide rail 14 is approximately semi-circular, and as shown in the figure... Figure 3 As can be seen in the cross-section shown, the semi-annular push rod guide rail 14 does not completely coincide with the arc centered on the magnet fixing rod 2. This arrangement further ensures that there is relative sliding between the magnet push rod 13 and the magnet fixing rod 2 during the rotation of the push rod guide rail 14. For example, with Figure 3 Taking the track shape of the push rod guide rail 14 as an example, in the initial stage of use of the target material 1, the target material 1 is relatively thick, and the second end of the magnet push rod 13 is located in the lower half of the push rod guide rail 14. As the target material 1 is consumed, the target material 1 becomes thinner. In some coating applications, it is necessary to increase the distance between the magnet 5 and the target material 1 to ensure the stability of the coating quality. Therefore, the push rod guide rail 14 can be driven to rotate counterclockwise by a certain angle using the rotating module 7 so that the magnet push rod 13 moves to the left relative to the magnet fixing rod 2, thereby increasing the distance between the magnet 5 and the target material 1.

[0040] Furthermore, the push rod guide rail 14 is provided with a groove to constrain the movement of the magnet push rod 13. The magnet push rod 13 slides within the groove, effectively preventing it from jumping and ensuring its stability in the horizontal plane. Specifically, the auxiliary component can be a snap-fit ​​component, fixedly installed on the push rod guide rail 14 as a limiting structure. A snap-fit ​​portion is provided at the second end of the magnet push rod 13. Through the combined action of the snap-fit ​​component and the push rod guide rail 14, the magnet push rod 13 is kept within the groove by the snap-fit ​​portion, preventing it from disengaging from the guide rail 14 during movement. Further defining the structural features of the auxiliary component ensures stable contact between the second end of the magnet push rod 13 and the push rod guide rail 14, allowing the magnet push rod 13 to move stably relative to the magnet fixing rod 2 during the operation of the magnetron sputtering cathode system, preventing mid-range failure in the control and maintenance of the magnet 5.

[0041] For example, the first end of the magnet push rod 13 is provided with a thread, and the magnet push rod 13 is threadedly connected to the magnet 5, which can facilitate the replacement and adaptation of different magnets 5, and expand the applicability of the magnetron sputtering cathode system. It is understood that the second end of the magnet push rod 13 is provided with a kinematic pair structure with a high degree of freedom, such as a ball head or a roller. The ball head or roller can be used to form a relative sliding or rolling contact with the push rod guide rail 14, further assisting the magnet push rod 13 and the push rod guide rail 14 to form a smoother relative interaction structure, preventing relative sliding resistance between the magnet push rod 13 and the push rod guide rail 14, and improving the sliding performance between the two.

[0042] Specifically, the adjusting assembly further comprises an adjusting tube 15 provided with a pair of through holes 17, the adjusting tube 15 is sleeved on the outside of the magnet fixing rod 2, and the magnet push rod 13 passes through the through holes 17 at both ends while passing through the guide hole; the adjusting tube 15 is fixedly arranged with the push rod guide rail 14 through the fixing screw 16, the push rod guide rail 14 connected to the adjusting tube 15 through the fixing screw 16 can rotate together with the adjusting tube 15, so the adjusting tube 15 is arranged as an intermediate connecting piece for driving the push rod guide rail 14 to rotate. Understandably, the size of the through holes 17 should meet the requirement that the magnet push rod 13 can move within a predetermined range; the through holes 17 can be closed holes or non-closed holes.

[0043] Further, the rotating module 7 can drive the adjusting tube 15 to rotate by a preset angle until the magnet push rod 13 abuts against both sides of the pair of through holes 17, and the rotation of the adjusting tube 15 around the axis of the magnet fixing rod 2 is limited by the contact with the magnet push rod 13. In the case that the outer profiles of the adjusting tube 15 and the magnet fixing rod 2 are both substantially cylindrical and coaxially arranged, the inner diameter of the adjusting tube 15 needs to be greater than the outer diameter of the magnet fixing rod 2, so that a gap can be kept between the adjusting tube 15 and the magnet fixing rod 2 or a bearing can be arranged therebetween, to ensure and assist the relative rotation of the two. In other embodiments, the positions and shapes of the adjusting tube 15 and the magnet fixing rod 2 can be flexibly arranged according to actual conditions, as long as the basic functions of transmission and limiting of the adjusting tube 15 and the magnet fixing rod 2 can be realized under the spirit and principles of the present application.

[0044] In the present embodiment, the auxiliary member can be specifically provided as an elastic member 12. The elastic member 12 is sleeved on the magnet push rod 13, and the first end of the elastic member 12 abuts against the magnet fixing rod 2. A protruding portion is arranged at the second end of the magnet push rod 13, the protruding portion protrudes from the magnet push rod 13 along the radial direction of the magnet push rod 13, at this time the elastic member 12 is sleeved on the middle segment of the magnet push rod 13, and the second end of the elastic member 12 can abut against the protruding portion. The rotation of the push rod guide rail 14 changes the relative distance between the push rod guide rail 14 and the magnet fixing rod 2, i.e. changes the length of the part of the magnet push rod 13 between the two, and the length of the elastic member 12 changes with the distance between the protruding portion and the magnet fixing rod 2. The push rod guide rail 14 can release the magnet push rod under the action of the elastic member 12, and reset the magnet push rod 13 while keeping contact with the push rod guide rail 14. Specifically, the elastic member 12 can be a spring. For example, the spring is arranged on the magnet push rod 13, and the first end of the spring abuts against the magnet fixing rod 2, and the second end of the spring abuts against the protruding portion. Figure 3The position of the magnet push rod 13 shown in the figure is the initial position of the magnet push rod 13, at which the spring can be in a free state or a compressed deformed state, at which, as the rotating module 7 drives the push rod guide rail 14 to rotate clockwise by a preset angle, the magnet push rod 13 will move from the initial position relative to the magnet fixed rod 2 and reach a target position. The spring is used to hinder the change of the position of the magnet push rod 13 caused by the driving of the rotating module 7 while the rotating module 7 is exerting driving effect, and to make the second end of the magnet push rod 13 have a movement trend of moving away from the magnet fixed rod 2 after the rotating module 7 stops exerting driving effect, i.e., to make the magnet push rod 13 have a movement trend of returning to the initial position. It can be understood that the elastic member 12 has a state recovery effect in addition to the above-mentioned effect, and can also ensure that the push rod guide rail 14 and the magnet push rod 13 are always in close contact, so that the magnet push rod 13 can move stably relative to the magnet fixed rod 2. Figure 3 Taking the cross-sectional structure of the adjusting assembly shown in the figure as an example, during the movement of the magnet push rod 13 to the right relative to the magnet fixed rod 2, the elastic member 12 appropriately provides a certain resistance to avoid the overrunning of the magnet push rod 13 when the push rod guide rail 14 rotates too fast. However, the selection of the auxiliary member is not limited to having a potential energy effect similar to that of the elastic member, and the most fundamental reason for adding the auxiliary member is to help the second end of the magnet push rod 13 always maintain stable contact with the push rod guide rail 14, so as to achieve the purpose of stable movement of the magnet push rod 13 relative to the magnet fixed rod 2.

[0045] As shown in the figure, Figure 3As shown in the figure, the push rod guide rail 14 is concave arc-shaped relative to one side of the protruding part. When the ball head is in contact with the middle position of the push rod guide rail 14, the length of the magnet push rod 13 between the push rod guide rail 14 and the magnet fixing rod 2 is the longest, at this time, the elastic member 12 is in the original length, the magnet push rod 13 is in the initial position, and the relative distance between the magnet 5 and the target material 1 is the largest. When the first control motor drives the adjusting drive belt 9 to drive the adjusting drive pulley 11 to rotate the adjusting pipe 15, the push rod guide rail 14 also rotates, the relative distance between the push rod guide rail 14 and the magnet fixing rod 2 gradually shortens, the elastic member 12 is also in the compressed state, the relative distance between the magnet 5 and the target material 1 gradually becomes smaller, at this time, the elastic member 12 has the elastic potential energy to restore the magnet push rod 13 to the initial position. The two ends of the elastic member 12 are in contact with the protruding part and the magnet fixing rod 2 respectively, the elastic member 12 is clamped between the magnet push rod 13 and the magnet fixing rod 2, and can assist the magnet push rod 13 to reset to the initial position. Whether the elastic member 12 can reset or buffer the magnet push rod 13 is to meet or replace the core function of the auxiliary member, that is, to ensure that the second end of the magnet push rod 13 always maintains stable contact with the push rod guide rail 14, which helps the magnet push rod 13 to move stably relative to the magnet fixing rod 2. Understandably, when the second end of the magnet push rod 13 is provided with a ball head or other high-degree-of-freedom kinematic pair structure and protrudes along the radial direction of the magnet push rod 13, part of the kinematic pair structure can also be used as the protruding part.

[0046] Further, the magnet module includes a plurality of adjusting assemblies, the plurality of adjusting assemblies are distributed along the length direction of the magnet fixing rod 2, and the shapes of the push rod guide rails 14 of the plurality of adjusting assemblies can be different. In cooperation with the plurality of magnets 5 or a single magnet capable of changing shape, the distance between the magnet 5 at the position and the target material 1 along the axial direction of the magnet fixing rod 2 can be adjusted individually, the magnetic field strength at both ends of the target material 1 is improved, the film thickness in the axial direction is adjusted, the film quality at the top and the bottom is improved, and the utilization rate of the target material 1 is improved, which can better solve the problem of uneven distribution of the magnetic field strength.

[0047] Specifically, the target material 1 is provided in a cylindrical shape, and the target material module further includes an upper end cover 4 and a lower end cover 6. The upper end cover 4 is sealingly arranged at the upper end of the target material 1, and the lower end cover 6 is sealingly arranged at the lower end of the target material 1. The inner cavity of the target material 1 is filled with flowing cooling water, thereby maintaining the sealing state of the target material module and avoiding leakage. The magnetron sputtering cathode system further includes a vacuum chamber door plate 3. The target material module is arranged in the inner cavity of the target material 1, and the target material module, the magnet module, and the rotating module 7 are all fixed on the vacuum chamber door plate 3. Specifically, the magnet fixing rod 2 is coaxially arranged with the target material 1. At this time, the rotating module 7 can drive the target material 1 to rotate around the magnet fixing rod 2 as the axis.

[0048] It can be understood that the target material module further comprises a bearing and a dynamic seal, the outer ring of the bearing is embedded in the upper end cover 4, the magnet fixing rod 2 is fixed with the inner ring of the bearing, the inner ring and the outer ring of the bearing rotate relative to each other, so that the relative rotation between the target material 1 and the magnet 5 can be realized under the conditions that the target material 1 is fixedly connected with the upper end cover 4 and the magnet 5 is fixedly connected with the magnet fixing rod 2; the top of the magnet fixing rod 2 is provided with a fixing position, and a fastener is arranged at the fixing position, so that the magnet fixing rod 2 can pass through the upper end cover 4 and be fixed to the vacuum chamber door plate 3, so as to ensure the stability of the movement of the magnet push rod 13; and under the support of the dynamic seal, the target material 1 and the magnet 5 can rotate relative to each other while keeping the inside of the target material 1 sealed, so as to realize the function of continuous sputtering and improve the stability and flexibility of the magnetron sputtering cathode system structure.

[0049] As preferred, the rotation axis of the target material 1 and the rotation axis of the push rod guide rail 14 are collinear, so that the rotation axis of the target material 1 and the rotation axis of the push rod guide rail 14 can be sleeved, and then the cooling water and sealing system can be arranged, avoiding complex sealing and waterproof design, avoiding the problem that the rotating module 7 is placed in the cylindrical target material 1 and contacts with water, and the structure is simple to install and stable in performance.

[0050] In the embodiment, the rotating module 7 comprises a first control motor, an adjusting driving belt 9 and an adjusting driving pulley 11, the lower end of the adjusting pipe 15 is connected with the adjusting driving pulley 11, the first control motor drives the adjusting driving belt 9 to drive the adjusting driving pulley 11 to rotate the adjusting pipe 15. When it is needed to adjust the surface magnetic field intensity of the target material 1, the first control motor drives the adjusting pipe 15 to drive the belt transmission to the adjusting driving pulley 11 to realize the rotating movement of the adjusting pipe 15.

[0051] Similarly, the rotating module 7 comprises a second control motor, a target material driving belt 8 and a target material driving pulley 10, the lower end of the target material 1 is connected with the target material driving pulley 10, the second control motor drives the target material driving belt 8 to drive the target material driving pulley 10 to rotate the target material 1. When the magnetron sputtering cathode system works, the magnet 5 is fixed through the magnet push rod 13 and keeps relative static with the magnet fixing rod 2, the second control motor drives the target material driving belt 8 to drive the target material driving pulley 10 to realize the periodic rotation of the target material 1 around the magnet fixing rod 2.

[0052] The utility model discloses still disclose a kind of coating equipment, including above-mentioned magnetron sputtering cathode system, using this magnetron sputtering cathode system can reduce assembly difficulty, simple structure, smaller space occupation;Reduce the adjustment difficulty of magnet, and improve adjustable range;Improve the efficiency of coating, and improve coating effect.

[0053] Obviously, the above embodiments of the present application are merely examples for clearly illustrating the present application, and are not intended to limit the implementation modes of the present application. For those skilled in the art, various obvious changes, re-adjustments and replacements can be made without departing from the protection scope of the present application. Here, it is not necessary and also impossible to enumerate all the implementation modes. Any modification, equivalent replacement and improvement made within the spirit and principle of the present application shall be included in the protection scope of the present application claim.

Claims

1. A magnetron sputter cathode system, characterized in that The application relates to a magnet module for a magnetron sputtering system. The magnet module comprises a target module, a magnet module, a rotating module and a magnet module. The magnet module comprises a magnet fixing rod (2), a magnet (5) and an adjusting assembly. The adjusting assembly comprises a magnet push rod (13) and a push rod guide rail (14).

2. The magnetron sputter cathode system of claim 1, characterized in that The first end of the magnet push rod (13) is connected with the magnet (5).

3. The magnetron sputter cathode system of claim 1, wherein The second end of the magnet push rod (13) is provided with a ball head or a roller.

4. The magnetron sputter cathode system of claim 1, wherein The adjusting assembly further comprises an auxiliary part.

5. The magnetron sputter cathode system of claim 1, wherein The auxiliary part is an elastic part (12).

6. The magnetron sputter cathode system of claim 5, characterized in that The second end of the magnet push rod (13) is provided with a protruding part.

7. The magnetron sputter cathode system of claim 6, characterized in that The second end of the magnet push rod (13) is provided with a clamping part.

8. The magnetron sputter cathode system of claim 5, wherein The push rod guide rail (14) is provided with a sliding groove.

9. The magnetron sputter cathode system of claim 1, wherein The magnet module comprises a plurality of adjusting assemblies.

10. The magnetron sputter cathode system of claim 1, wherein, The plurality of adjusting assemblies are distributed along the length direction of the magnet fixing rod (2).

11. The magnetron sputter cathode system of any of claims 1 to 10, characterized in that The target (1) is arranged in a cylindrical shape, and the magnet module is arranged in the inner cavity of the target (1); the target module further comprises an upper end cover (4) and a lower end cover (6), the upper end cover (4) is sealingly arranged at the upper end of the target (1), and the lower end cover (6) is sealingly arranged at the lower end of the target (1); the rotating module (7) can drive the target (1) to rotate.

12. A coating apparatus characterized by, A magnetron sputter cathode system comprising a magnetron sputter cathode according to any one of claims 1 to 11.

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