Flow guiding device and vapor phase growth equipment

Abstract

The utility model provides a flow guiding device and vapor phase growth equipment. The flow guiding device comprises a flow guiding device body, a lifting driving device and a buffering device. The lifting driving device is connected with the bottom of the flow guiding device body to drive the flow guiding device body to do lifting motion, the buffering device is connected with the top of the flow guiding device body to provide upward acting force for the flow guiding device body, and even if the lifting driving device is started under the abnormal conditions such as step losing and idle sliding, the lifting driving device can not be started. The buffering driving device can provide upward auxiliary acting force for the flow guiding device body as compensation, and therefore the problem that due to abnormal starting of the lifting driving device, lifting of the flow guiding device is stuck is relieved or avoided; the problem that stable operation and safety of the flow guiding device are affected by deformation and even breakage of the supporting object due to the fact that the lifting driving device controls the flow guiding device through the side wall of the flow guiding device can be solved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor equipment, concretely relates to flow guide device and gas phase growth equipment. BACKGROUND

[0002] In the field of gas phase growth equipment, the design of the growth chamber is crucial to ensure the growth quality of semiconductor crystals. The gas phase growth equipment in the prior art includes key components such as a growth chamber, a flow guide device, a gas injection device, a bearing device, and a heating device. Before and after performing the gas phase growth process, the flow guide device shields or exposes the out-of-chamber passage by controlling its lifting motion to avoid the out-of-chamber passage having an adverse effect on the gas flow field and temperature field near the substrate carrier.

[0003] However, the driving device used to drive the lifting motion of the flow guide device in the prior art has some limitations. Commonly used lifting driving devices, such as motors, may have step loss and empty sliding phenomena when starting, causing the flow guide device to jam during lifting, thereby affecting the stable operation and safety of the flow guide device.

[0004] In addition, the flow guide device is arranged in the growth chamber, and the lifting driving device acts on the side wall of the flow guide device to drive the lifting of the flow guide device. Generally, a support, such as a support rod, is arranged on the side wall of the flow guide device, and the driving device controls the lifting of the flow guide device by acting on the support rod. If the weight of the flow guide device is too large, once the support is subjected to stress fatigue, aging, etc., the control of the lifting driving device on the flow guide device through the side wall of the flow guide device is likely to be affected by the deformation or even breakage of the support, thereby affecting the stable operation and safety of the flow guide device. SUMMARY

[0005] In view of the defects and deficiencies of the gas phase growth equipment in the prior art, the present application provides a flow guide device that reduces or avoids the jamming and out-of-sync phenomena caused by the starting problem of the lifting driving device, improves the stability and safety of the motion of the flow guide device, and avoids the problem that the control of the lifting driving device on the flow guide device through the side wall of the flow guide device is likely to be affected by the deformation or even breakage of the support, thereby affecting the stable operation and safety of the flow guide device.

[0006] The flow guide device of the present application is applied to a gas phase growth equipment, which comprises a cylindrical flow guide device body, and further comprises: a lifting driving device connected to the bottom of the flow guide device body to drive the lifting motion of the flow guide device body; and a buffer device connected to the top of the flow guide device body to provide an upward force to the flow guide device body.

[0007] As an embodiment, the buffer device comprises a gas spring.

[0008] As an implementation form, the lifting driving device comprises a lifting cylinder.

[0009] As an implementation form, the number of the lifting driving devices is at least two, each of the lifting driving devices is connected to the bottom of the flow guide device body and is arranged around the circumference of the flow guide device body.

[0010] As an implementation form, each of the lifting driving devices is uniformly arranged around the flow guide device body.

[0011] As an implementation form, the number of the buffer devices is at least two, each of the buffer devices is connected to the top of the flow guide device body and is arranged around the circumference of the flow guide device body.

[0012] As an implementation form, each of the buffer devices is uniformly arranged around the flow guide device body.

[0013] As an implementation form, the lifting driving device and the buffer device are opposite along the axis of the flow guide device body.

[0014] The vapor phase growth equipment provided in the application comprises a growth chamber and the flow guide device, the flow guide device body is arranged in the growth chamber, the lifting driving device is sealingly connected to the bottom of the growth chamber and is connected to the bottom of the flow guide device body, and the buffer device is sealingly connected to the top of the growth chamber and is connected to the top of the flow guide device body.

[0015] As an implementation form, a susceptor is arranged in the growth chamber to support a substrate, and the flow guide device body is arranged around the susceptor.

[0016] As described above, the flow guide device and the vapor phase growth equipment have the following beneficial effects:

[0017] By arranging the lifting driving device and the buffer device on the flow guide device body, the lifting driving device is connected to the bottom of the flow guide device body to drive the flow guide device body to move up and down, the buffer device is connected to the top of the flow guide device body to provide an upward auxiliary force to the flow guide device body, so that even if the lifting driving device has a start abnormality such as step loss or empty sliding when starting, the buffer driving device can provide an upward auxiliary force to the flow guide device body as compensation, thereby reducing or avoiding the problem of flow guide device lifting jam caused by the start abnormality of the lifting driving device, and meanwhile, the problem that the control of the lifting driving device on the flow guide device through the side wall of the flow guide device is easily affected by the deformation or even the fracture of the support, thereby affecting the stable operation and safety of the flow guide device. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1A structure schematic diagram of a vapor phase growth equipment according to an embodiment of the present application is shown.

[0019] Element number explanation

[0020] 10, growth chamber; 20, flow guide device body; 30, gas injection device; 40, susceptor; 50, heating device; 120, lifting driving device; 220, buffer device. DETAILED DESCRIPTION

[0021] The other advantages and effects of the present application can be easily understood by those skilled in the art from the content disclosed in the present specification. The present application can also be implemented or applied by different specific embodiments, and the details in the present specification can be modified or changed based on different viewpoints and applications without departing from the spirit of the present application.

[0022] Please refer to Figure 1 It should be noted that the diagrams provided in the present embodiment only illustrate the basic concept of the present application in a schematic manner, and thus the diagrams only show the components related to the present application rather than being drawn according to the number, shape and size of the components in actual implementation. The shape, number and proportion of the components in actual implementation can be randomly changed, and the layout pattern of the components can be more complex.

[0023] In the field of vapor phase growth equipment, the design of the growth chamber is crucial to ensure the high-quality growth of semiconductor crystals. Currently, as shown in Figure 1 the vapor phase growth equipment generally includes a growth chamber 10, a flow guide device body 20, a gas injection device 30, a bearing device and a heating device 50, and other core components. The flow guide device body 20 shields or exposes the out-of-cavity passage before and after the execution of the vapor phase growth process by precisely controlling its lifting movement, so as to maintain the stability of the gas flow field and temperature field, thereby avoiding adverse effects on crystal growth.

[0024] However, the driving device used to drive the lifting movement of the flow guide device body in the prior art has limitations, mainly including:

[0025] For example, when using a motor as the driving device, due to the mechanical characteristics and control precision limitations of the motor itself, the lifting process may appear to lose steps or slip. These problems will cause the flow guide device body to be inaccurate in position during lifting, causing stuttering, thereby affecting the stable operation and safety of the flow guide device.

[0026] In view of the above defects, the present application provides a flow guide device. The following embodiments will be described in detail.

[0027] The flow guide device comprises a cylindrical flow guide device body 20, a lifting driving device 120 and a buffer device 220. As shown in the figure, the lifting driving device 120 is connected with the bottom of the flow guide device body 20 to drive the flow guide device body 20 to move up and down. The buffer device 220 is connected with the top of the flow guide device body 20 to provide an upward force to the flow guide device body 20. Figure 1

[0028] Specifically, when the lifting driving device 120 drives the flow guide device body 20 to rise or fall, the directions of the forces applied by the lifting driving device 120 and the buffer device 220 to the flow guide device body 20 are both upward, that is, even if the lifting driving device 120 has a start abnormality such as missing steps or empty sliding when starting, the buffer device 220 can provide an upward auxiliary force to the flow guide device body 20 as compensation, thereby reducing or avoiding the problem of flow guide device lifting jam caused by the start abnormality of the lifting driving device 120. Moreover, if the lifting driving device 120 or the buffer device 220 is arranged on the side wall of the flow guide device body 20, a support such as a support rod needs to be additionally arranged to connect the flow guide device body 20, and then the lifting driving device 120 or the buffer device 220 acts on the support rod. Once the self-weight of the flow guide device is too large, the support will be subjected to stress fatigue, aging and other phenomena, and the control of the flow guide device will be affected by the deformation or even the fracture of the support, thereby affecting the stable operation and safety of the flow guide device.

[0029] During the rising of the flow guide device body 20, the resultant force of the lifting driving device 120 and the buffer device 220 is greater than the gravity of the flow guide device body 20, and more preferably, the difference between the resultant force and the gravity of the flow guide device body 20 is a certain value, which is beneficial to control the uniform and stable rising.

[0030] During the falling of the flow guide device body 20, the upward auxiliary force provided by the buffer device 220 is less than the resultant force of the force applied by the lifting driving device 120 to the flow guide device body 20 and the gravity of the flow guide device body 20, and more preferably, the difference between the resultant force and the auxiliary force is a certain value, which is beneficial to control the uniform and stable falling.

[0031] In some embodiments, the buffer device 220 is a gas spring. The gas spring can be selected to achieve the effect on the flow guide device body 20.

[0032] In some embodiments, the buffer device 220 is a gas spring and a control device for controlling the gas spring, and the control device is, for example, a PLC.

[0033] In some embodiments, the lifting driving device 120 is a lifting cylinder.

[0034] ​In some embodiments, the number of the lifting driving devices 120 is at least two, each of which is connected to the bottom of the flow guide device body 20 and arranged around the circumference of the flow guide device body 20. The specific number is flexibly selected according to the self-weight of the flow guide device body 20 and the driving requirement of the flow guide device body 20.

[0035] In some embodiments, each of the lifting driving devices 120 is uniformly arranged around the flow guide device body 20 to further improve the stability of the lifting control of the flow guide device body 20.

[0036] In some embodiments, the number of the buffering devices 220 is at least two, each of which is connected to the top of the flow guide device body 20 and arranged around the circumference of the flow guide device body 20. The specific number is flexibly selected according to the self-weight of the flow guide device body 20 and the driving requirement of the flow guide device body 20.

[0037] In some embodiments, each of the buffering devices 220 is uniformly arranged around the flow guide device body 20 to further improve the stability of the auxiliary action on the flow guide device body 20.

[0038] In some embodiments, the lifting driving device 120 and the buffering device 220 are opposite along the axis of the flow guide device body 20.

[0039] The embodiments of the present application also provide a vapor phase growth device, the flow guide device body is arranged in a growth chamber of the vapor phase growth device, and the flow guide device body is arranged around a substrate support in the growth chamber. Figure 1 The lifting driving device 120 is sealingly connected to the bottom of the growth chamber 10 and connected to the bottom of the flow guide device body 20, and the buffering device 220 is sealingly connected to the top of the growth chamber 10 and connected to the top of the flow guide device body 20.

[0040] The gas injection device 30 injects raw gas for growth reaction into the growth chamber 10.

[0041] In some embodiments, a substrate support 40 is arranged in the growth chamber 10 to support a substrate, and the flow guide device body 20 is arranged around the substrate support 40.

[0042] An opening is arranged on the side wall of the flow guide device body 20 for the substrate supported on the substrate support 40 to pass through. Before the substrate needs to be transferred into or out of the growth chamber 10, the lifting driving device 120 and the buffering device 220 jointly control the flow guide device body 20 to ascend so that the opening is aligned with the radial direction of the substrate support 40 to facilitate the taking and placing of the substrate. After the taking and placing of the substrate are completed, the lifting driving device 120 and the buffering device 220 jointly control the flow guide device body 20 to descend so that the opening is lower than the position of the substrate support 40 to not affect the process gas flow field near and above the substrate support.

[0043] The above embodiments only exemplarily illustrate the principles and effects of the present application, and are not used to limit the present application. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present application. Therefore, all equivalent modifications or changes completed by those skilled in the art without departing from the spirit and technical thought disclosed by the present application should be covered by the claims of the present application.

Claims

1. A flow directing device, characterized in that, The application is applied to a vapor phase growth device, which comprises a cylindrical flow guide body Further comprising; Lifting driving devices are connected to the bottom of the flow guide body to drive the flow guide body to move up and down; Buffering devices are connected to the top of the flow guide body to provide upward force to the flow guide body. The buffering devices comprise gas springs.

2. The flow directing device of claim 1, wherein, The lifting driving devices comprise lifting cylinders.

3. The flow directing device of claim 1, wherein, The number of the lifting driving devices is at least two, each of which is connected to the bottom of the flow guide body and arranged around the circumference of the flow guide body.

4. The flow directing device of claim 1, wherein, Each of the lifting driving devices is uniformly arranged around the flow guide body.

5. The flow directing device of claim 4, wherein, The number of the buffering devices is at least two, each of which is connected to the top of the flow guide body and arranged around the circumference of the flow guide body.

6. The flow directing device of claim 1, wherein, Each of the buffering devices is uniformly arranged around the flow guide body.

7. The flow directing device of claim 6, wherein, The lifting driving devices and the buffering devices are opposite along the axis of the flow guide body.

8. The flow directing device of claim 1, wherein, The application further provides a vapor phase growth device, which comprises a growth chamber and the flow guide device as claimed in any one of claims 1-8, wherein the flow guide body is arranged in the growth chamber, the lifting driving devices are sealingly connected to the bottom of the growth chamber and connected to the bottom of the flow guide body, and the buffering devices are sealingly connected to the top of the growth chamber and connected to the top of the flow guide body.

9. A vapor phase growth apparatus characterized by comprising: A pedestal is arranged in the growth chamber to support a substrate, and the flow guide body is arranged around the pedestal.

10. The vapor phase growth apparatus according to claim 9, wherein ​

Images