Backlight wafer inspection workbench

Abstract

The utility model relates to the technical field of wafer inspection, in particular to a backlight wafer inspection workbench, which comprises a workbench, a light source plate, shading foam and a fixing mechanism, the fixing mechanism comprises two positioning plates, a driving piece, a worm, a worm gear, a transmission piece, two moving frames and two abutting assemblies, the light source plate is matched with the shading foam to detect a wafer, and the fixing mechanism is fixed on the workbench. When a wafer is detected, a first driving piece is started, the first driving piece works to drive a worm to rotate, the worm drives a worm gear to rotate, the worm gear drives a transmission piece to rotate, the transmission piece drives two moving frames to get close to each other until the two moving frames make contact with a positioning plate, and two abutting assemblies work to longitudinally abut against shading foam on a light source plate; and at the moment, the shading foam can be limited to prevent the shading foam from displacement due to the influence of external force, so that the problem that the wafer is damaged due to the fact that the shading foam is possibly influenced by the external force to push the wafer to move out of the table top range in the wafer detection process is solved.

Description

TECHNICAL FIELD

[0001] The utility model relates to wafer inspection technical field especially relates to back light source wafer inspection work table. BACKGROUND

[0002] Wafer refers to the silicon wafer used for making silicon semiconductor integrated circuit, is called wafer because its shape is circular, can be processed into various circuit element structures on the silicon wafer, and becomes IC product with specific electrical function, and the raw material of wafer is silicon, and the surface of the crust has inexhaustible silicon dioxide, wherein the inspection platform is often used in the process of making and producing wafer to facilitate observation of the shape of wafer, inspection of wafer appearance (including pattern, appearance, etc.), defects (including foreign matter, loss, scratch, etc.) and measurement data (including CD key size, Overlay overlay size, line size, etc.).

[0003] When the wafer is detected, the light shielding foam is placed on the wafer on the back light source plate for inspection, and the light shielding foam may be pushed out of the desktop range by external force during the detection process, thereby causing damage to the wafer. UTILITY MODEL CONTENT

[0004] The utility model discloses a back light source wafer inspection work table, which aims to solve the problem of wafer damage caused by the light shielding foam being pushed out of the desktop range by external force during wafer detection.

[0005] To achieve the above-mentioned purpose, the utility model provides a back light source wafer inspection work table, which comprises a workbench, a light source plate, light shielding foam and a fixing mechanism, the fixing mechanism comprises two positioning plates, a driving part one, a worm, a worm wheel, a transmission part, two movable frames and two resisting components;

[0006] The light source plate is installed on the workbench, the light shielding foam is placed on the light source plate, the two positioning plates are fixedly connected with the workbench and located on the workbench, the driving part one is installed in the workbench, the worm is fixedly connected with the output end of the driving part one and rotationally connected with the workbench and located between the driving part one and the workbench, the worm wheel is engaged with the worm and rotationally connected with the workbench, the transmission part is installed on the worm wheel, the two movable frames are installed on the transmission part, and the two resisting components are installed on the two movable frames.

[0007] Among them, the transmission part includes a turntable, a transmission rod and two inclined rods, the turntable is fixedly connected with the worm wheel and located on the worm wheel, the transmission rod is fixedly connected with the turntable and located on the turntable, and the two inclined rods are rotationally connected with the transmission rod and rotationally connected with the two movable frames respectively.

[0008] Two sliding rails are fixedly connected with the workbench and located in the workbench, and two sliding blocks are slidably connected with the two sliding rails and fixedly connected with two moving frames and located between the sliding rails and the moving frames.

[0009] The resisting assembly comprises a second driving member, a resisting plate and two guide rods, the second driving member is fixedly connected with the moving frame and located on the moving frame, the resisting plate is fixedly connected with an output end of the second driving member, and the two guide rods are fixedly connected with the resisting plate and slidably connected with the moving frame and penetrate through the moving frame.

[0010] The fixing mechanism further comprises a plurality of clamping plates, and the plurality of clamping plates are fixedly connected with the two moving frames and located on the two moving frames.

[0011] The backlight wafer inspection worktable of the utility model, the workbench provides installation condition for the light source plate and the fixing mechanism, can detect wafer through the light source plate cooperation light shielding bubble cotton, when detecting wafer, start the first driving member, the first driving member work drive the worm rotation, the worm drives the worm wheel rotation, the worm wheel drives the transmission part rotation, the transmission part drives two moving frames to approach each other, until two moving frames contact with the positioning plate, two resisting assemblies work on the light source plate on the light shielding bubble cotton longitudinal resistance, at this moment can limit the light shielding bubble cotton, prevent its displacement under external force, thereby solve the problem that wafer detection process light shielding bubble cotton may be affected by external force and push wafer to move out of the desktop range and cause wafer damage. BRIEF DESCRIPTION OF DRAWINGS

[0012] In order to more clearly illustrate the technical scheme in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or prior art description will be briefly introduced.

[0013] Fig. 1 It is the structure schematic diagram of the utility model backlight wafer inspection worktable.

[0014] Fig. 2 It is the sectional view of the utility model backlight wafer inspection worktable.

[0015] Fig. 3 It is the top view of the utility model backlight wafer inspection worktable.

[0016] In the figure: 1-workbench, 2-light source plate, 3-shading bubble cotton, 4-positioning plate, 5-driving part one, 6-worm, 7-worm wheel, 8-moving frame, 9-rotating disc, 10-transmission rod, 11-inclined rod, 12-sliding rail, 13-sliding block, 14-driving part two, 15-pressing plate, 16-guide rod, 17-clamping plate. DETAILED DESCRIPTION

[0017] The embodiments of the present application are described in detail below, examples of which are shown in the drawings, wherein the same or similar notations represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by reference to the drawings are exemplary and are intended to explain the present application, and cannot be understood as a limitation of the present application.

[0018] Please refer to Figs. 1-3 The present application provides a backlight wafer inspection workbench, comprising a workbench 1, a light source plate 2, shading bubble cotton 3 and a fixing mechanism, the fixing mechanism comprises two positioning plates 4, a driving part one 5, a worm 6, a worm wheel 7, a transmission member, two moving frames 8 and two pressing assemblies;

[0019] The light source plate 2 is installed on the workbench 1, the shading bubble cotton 3 is placed on the light source plate 2, the two positioning plates 4 are fixedly connected with the workbench 1 respectively and are located on the workbench 1, the driving part one 5 is installed in the workbench 1, the worm 6 is fixedly connected with the output end of the driving part one 5 and is rotatably connected with the workbench 1 and is located between the driving part one 5 and the workbench 1, the worm wheel 7 is engaged with the worm 6 and is rotatably connected with the workbench 1, the transmission member is installed on the worm wheel 7, the two moving frames 8 are installed on the transmission member respectively, and the two pressing assemblies are installed on the two moving frames 8 respectively.

[0020] In the present embodiment, the workbench 1 provides installation conditions for the light source plate 2 and the fixing mechanism, and the wafer can be detected by the light source plate 2 cooperating with the shading bubble cotton 3. When the wafer is detected, the driving part one 5 is started, the driving part one 5 drives the worm 6 to rotate, the worm 6 drives the worm wheel 7 to rotate, the worm wheel 7 drives the transmission member to rotate, the transmission member drives the two moving frames 8 to approach each other, until the two moving frames 8 contact with the positioning plates 4, and the two pressing assemblies work to longitudinally press the shading bubble cotton 3 on the light source plate 2. At this time, the shading bubble cotton 3 can be limited, preventing it from being displaced by external force, thereby solving the problem that the wafer may be damaged due to the shading bubble cotton 3 being pushed out of the desktop range by external force during wafer detection.

[0021] Further, the transmission member comprises a rotating disc 9, a transmission rod 10 and two inclined rods 11, the rotating disc 9 is fixedly connected with the worm gear 7 and located on the worm gear 7, the transmission rod 10 is fixedly connected with the rotating disc 9 and located on the rotating disc 9, the two inclined rods 11 are rotationally connected with the transmission rod 10 respectively and rotationally connected with the two moving frames 8 respectively.

[0022] In the embodiment, the rotating of the rotating disc 9 can drive the transmission rod 10 to rotate forward or reverse, the rotating of the transmission rod 10 can drive the two inclined rods 11 to rotate, when the included angle between the two inclined rods 11 and the transmission rod 10 becomes smaller, the two inclined rods 11 drive the two moving frames 8 to approach each other, when the included angle between the two inclined rods 11 and the transmission rod 10 becomes larger, the two inclined rods 11 drive the two moving frames 8 to move away from each other.

[0023] Further, the fixing mechanism further comprises two sliding rails 12 and two sliding blocks 13, the two sliding rails 12 are fixedly connected with the workbench 1 respectively and located in the workbench 1, the two sliding blocks 13 are slidingly connected with the two sliding rails 12 respectively and fixedly connected with the two moving frames 8 respectively and located between the sliding rails 12 and the moving frames 8.

[0024] In the embodiment, the two sliding rails 12 provide mounting conditions for the two sliding blocks 13, the two moving frames 8 can be guided and limited by the two sliding blocks 13, so that the stability of the two moving frames 8 during movement is improved.

[0025] Further, the resisting assembly comprises a driving member two 14, a resisting plate 15 and two guide rods 16, the driving member two 14 is fixedly connected with the moving frame 8 and located on the moving frame 8, the resisting plate 15 is fixedly connected with the output end of the driving member two 14, the two guide rods 16 are fixedly connected with the resisting plate 15 respectively and slidingly connected with the moving frame 8 respectively and penetrate through the moving frame 8.

[0026] In the embodiment, the driving member two 14 is an electric push rod, the driving member two 14 can drive the resisting plate 15 to move, the resisting plate 15 can resist the light shielding bubble cotton 3 on the light source plate 2 longitudinally, the resisting plate 15 can be guided by the guide rods 16, so that the stability of the resisting plate 15 during movement is improved.

[0027] Further, the fixing mechanism further comprises a plurality of clamping plates 17, the plurality of clamping plates 17 are fixedly connected with the two moving frames 8 respectively and located on the two moving frames 8 respectively.

[0028] In the embodiment, the two positioning plates 4 are provided with clamping holes, and the plurality of clamping plates 17 are matched with the corresponding clamping holes to limit the movement of the moving frame 8.

[0029] When the driving member one 5 is started, the driving member one 5 drives the worm 6 to rotate, the worm 6 drives the worm gear 7 to rotate, the worm gear 7 drives the rotating disc 9 to rotate, the rotating disc 9 drives the transmission rod 10 to rotate, the transmission rod 10 drives the two inclined rods 11 to rotate, the two inclined rods 11 drive the two moving frames 8 to move close to each other, until the two moving frames 8 contact with the positioning plate 4, the two driving member twos 14 drive the two abutting plates 15 to move close to the light-shielding bubble cotton 3, until the abutting plate 15 contacts with the light-shielding bubble cotton 3, and longitudinally abuts the light-shielding bubble cotton 3 on the light source plate 2, at this time, the light-shielding bubble cotton 3 can be limited, and the light-shielding bubble cotton 3 is prevented from being displaced by external force, thereby solving the problem that the wafer is damaged due to the wafer being pushed out of the desktop range by the light-shielding bubble cotton 3 affected by external force in the wafer detection process.

[0030] The above only discloses one or more preferred embodiments of the present application, and cannot limit the scope of the rights of the present application. Those skilled in the art can understand that all or part of the above-mentioned embodiments can be implemented, and equivalent changes made according to the claims of the present application still belong to the scope covered by the present application.

Claims

1. A backlight wafer inspection workbench, comprising a worktable, a light source board, and light-shielding foam, wherein the light source board is mounted on the worktable, and the light-shielding foam is placed on the light source board, characterized in that, It also includes a fixing mechanism, which includes two positioning plates, a driving component, a worm gear, a worm wheel, a transmission component, two moving frames, and two abutment components; The two positioning plates are fixedly connected to the worktable and are both located on the worktable. The first driving component is installed inside the worktable. The worm gear is fixedly connected to the output end of the first driving component and rotatably connected to the worktable, and is located between the first driving component and the worktable. The worm wheel meshes with the worm gear and is rotatably connected to the worktable. The transmission component is installed on the worm wheel. The two moving frames are respectively installed on the transmission component. The two abutting components are respectively installed on the two moving frames.

2. The backlight wafer inspection workbench as described in claim 1, characterized in that, The transmission component includes a turntable, a transmission rod, and two inclined rods. The turntable is fixedly connected to the worm gear and is located on the worm gear. The transmission rod is fixedly connected to the turntable and is located on the turntable. The two inclined rods are rotatably connected to the transmission rod and rotatably connected to the two movable frames, respectively.

3. The backlight wafer inspection workbench as described in claim 2, characterized in that, The fixing mechanism also includes two slide rails and two sliders. The two slide rails are fixedly connected to the worktable and are located inside the worktable. The two sliders are slidably connected to the two slide rails and fixedly connected to the two movable frames, and are located between the slide rails and the movable frames.

4. The backlight wafer inspection workbench as described in claim 3, characterized in that, The abutment assembly includes a second driving component, an abutment plate, and two guide rods. The second driving component is fixedly connected to the movable frame and is located on the movable frame. The abutment plate is fixedly connected to the output end of the second driving component. The two guide rods are respectively fixedly connected to the abutment plate and are slidably connected to the movable frame, both penetrating the movable frame.

5. The backlight wafer inspection workbench as described in claim 4, characterized in that, The fixing mechanism also includes multiple snap-fit ​​plates, which are fixedly connected to the two movable frames respectively and are located on the two movable frames respectively.

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