Radio frequency identification (RFID)-based read-write device of photoetching mask traceability system
By using an RFID-based photomask traceability system, combined with barcodes and physical condition monitoring, the problems of data loss and label damage in photomask management have been solved, realizing digital traceability and multi-specification management throughout the entire lifecycle.
Patent Information
- Application Number
- CN202520269540.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-19
- Publication Date
- 2026-02-06
- Estimated Expiration
- 2035-02-19
AI Technical Summary
Current photomask management mainly relies on manual recording or barcodes, which is prone to data omissions or label damage, making accurate traceability impossible.
An RFID-based photolithography mask traceability system is adopted, which combines barcode reading and physical status monitoring, and integrates reading and writing devices, including functions such as mask placement, barcode reading, RFID reading and writing, position detection and quality monitoring.
It enables digital traceability of the entire lifecycle of photomasks, improving the reliability and accuracy of management, reducing human error, and supporting the use of photomasks of various specifications.
Smart Images
Figure CN223884015U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to semiconductor manufacturing technology especially relates to read-write device of photolithography mask plate tracing system based on RFID. BACKGROUND
[0002] Photolithography mask plate is the pattern master used by the photolithography process of micro-nano processing technology, and the mask pattern structure is formed on the transparent substrate by the opaque light shielding film, and then the pattern information is transferred to the product substrate through the exposure process, which is an indispensable step in integrated circuit production. For an IC chip, it needs seven or eight photolithography mask plates, and for a wafer foundry FAB factory, the wafer of the IC chip to be processed is large, so there are tens of thousands of mask plates in the FAB, and the use and management of the photolithography mask plate are obviously very important. At present, the photolithography mask plate is mainly managed by manual record process sheet or bar code, and the bar code is easy to blur, which leads to the problem of being unable to read out. SUMMARY
[0003] The utility model discloses to the problem of manual record process sheet management or bar code management in prior art, bar code is easy to blur, leads to the problem of being unable to read out, and read-write device of photolithography mask plate tracing system based on RFID is provided.
[0004] In order to solve the above technical problem, the utility model discloses the following technical scheme to solve:
[0005] The read-write device of the photolithography mask plate tracing system based on RFID includes a photolithography mask plate read-write device body. The photolithography mask plate read-write device body includes a photolithography mask plate read-write device box and a photolithography mask plate read-write device upper cover. The photolithography mask plate read-write device box and the photolithography mask plate read-write device upper cover form a closed photolithography mask plate read-write device cavity. The photolithography mask plate read-write device upper cover is connected with a mask plate unit for placing a mask plate, a bar code reading unit for reading the bar code of the mask plate and an antenna rod for receiving an RFID signal.
[0006] As a preferred, the photolithography mask plate read-write device upper cover is provided with a clamping groove unit, and the clamping groove unit includes oppositely arranged clamping groove baffles. A clamping groove is formed between the clamping groove baffles, and the photolithography mask plate read-write device box passes through the clamping groove.
[0007] As a preferred, the photolithography mask plate read-write device upper cover is further connected with a support unit.
[0008] As preferred, the photolithography mask reading and writing device cavity is provided with an RFID reading and writing unit, an infrared sensing unit and a quality acquisition unit, the quality acquisition unit is used for acquiring the quality of the photolithography mask reading and writing device box body, the infrared sensing unit is used for acquiring the position information of the photolithography mask reading and writing device box body, and the RFID reading and writing unit is used for reading and writing the RFID tag of the mask of the photolithography mask reading and writing device box body.
[0009] As preferred, the infrared sensing unit is provided with two infrared sensing units, which are located below the oppositely arranged clamping groove baffles.
[0010] As preferred, the antenna rod is a high frequency or ultra-high frequency RFID antenna.
[0011] As preferred, the photolithography mask reading and writing device box body is further provided with a display unit for displaying the reading and writing state; the display unit is an LED display screen, which is used for displaying the photolithography mask reading and writing state information.
[0012] As preferred, the mask unit supports various specifications of photolithography masks, including but not limited to 6-inch and 8-inch masks.
[0013] The utility model discloses a photolithography mask reading and writing device, which has the following technical effects:
[0014] The utility model discloses a photolithography mask reading and writing device, which has the following technical effects:
[0015] The utility model discloses a photolithography mask reading and writing device, which has the following technical effects:
[0016] The utility model discloses a photolithography mask reading and writing device, which has the following technical effects:
[0017] The utility model discloses a photolithography mask reading and writing device, which has the following technical effects:
[0018] The utility model discloses a photolithography mask reading and writing device, which has the following technical effects:
[0019] The utility model discloses a photolithography mask reading and writing device, which has the following technical effects: BRIEF DESCRIPTION OF DRAWINGS
[0020] Figure 1 is the device structure diagram of the utility model.
[0021] Figure 2 is the utility model device's explosion map.
[0022] Figure 3 is the utility model's explosion map.
[0023] Figure 4 is the light etching mask plate reading and writing device box body structure diagram of the utility model.
[0024] 1 is the light etching mask plate reading and writing device body, 11 is the light etching mask plate reading and writing device box body, 12 is the light etching mask plate reading and writing device upper cover, 13 is the mask plate unit, 14 is the bar code reading unit, 15 is the antenna rod, 16 is the support unit, 18 is the infrared induction unit, 17 is the quality acquisition unit, 121 is the card slot unit, 122 is the card slot baffle. DETAILED DESCRIPTION
[0025] The utility model will be described in further detail below in combination with the drawings and examples.
[0026] Example 1
[0027] The reading and writing device of the light etching mask plate tracing system based on RFID includes the light etching mask plate reading and writing device body 1;The light etching mask plate reading and writing device body 1 includes the light etching mask plate reading and writing device box body 11 and the light etching mask plate reading and writing device upper cover 12;The light etching mask plate reading and writing device box body 11 and the light etching mask plate reading and writing device upper cover 12 form a closed light etching mask plate reading and writing device cavity;The light etching mask plate reading and writing device upper cover 12 is connected with the mask plate unit 13 for placing the mask plate, the bar code reading unit 14 for reading the bar code of the mask plate and the antenna rod 15 for receiving RFID signal.
[0028] The light etching mask plate reading and writing device box body 11 and the light etching mask plate reading and writing device upper cover 12 jointly form a closed light etching mask plate reading and writing device cavity for protecting the internal mask plate and related elements from the influence of external environment.The light etching mask plate reading and writing device box body 11 and the light etching mask plate reading and writing device upper cover 12 can be connected through a hinge to realize the opening and closing of the upper cover, facilitating the operation personnel to operate the internal mask plate.
[0029] The bar code reading unit 14 can quickly and accurately read the bar code or two-dimensional code information on the mask plate by adopting a two-dimensional code scanner, realizing the identity recognition and tracing of the mask plate.
[0030] 2. The upper cover 12 of the photomask read-write device is provided with a clamping groove unit 121, which includes oppositely arranged clamping groove baffles, namely a first clamping groove baffle 122 and a second clamping groove baffle 123. A clamping groove is formed between the first clamping groove baffle 122 and the second clamping groove baffle 123, and the photomask read-write device box body 11 passes through the clamping groove.
[0031] The mask unit 13 supports photomasks of various specifications, including but not limited to 6-inch and 8-inch photomasks. The antenna rod 15 is a high-frequency or ultra-high-frequency RFID antenna.
[0032] Embodiment 2
[0033] Based on the embodiment 1, the upper cover 12 of the photomask read-write device in this embodiment is also connected with a support unit 16. The support unit 16 is used to support the entire device and keep it stable. The support unit can be designed to be adjustable in height to adapt to different working environments and operation requirements.
[0034] The cavity of the photomask read-write device is provided with an RFID read-write unit, an infrared sensing unit 18, and a quality acquisition unit 17. The quality acquisition unit 17 is used to acquire the quality of the photomask read-write device box body 11. The infrared sensing unit 18 is used to acquire the position information of the photomask read-write device box body 11. The RFID read-write unit is used to read and write the RFID tags of the mask of the photomask read-write device box body 11. The RFID read-write unit cooperates with the antenna rod to realize efficient reading and writing of the RFID tags and ensure the accuracy and integrity of the data.
[0035] The quality acquisition unit 17 is used to acquire the quality of the photomask read-write device box body. The quality acquisition unit 17 uses a high-precision weighing sensor to monitor the quality change of the box body in real time, providing data support for subsequent quality control and management.
[0036] The infrared sensing unit 18 is provided with two units, which are located below the oppositely arranged clamping groove baffles 122.
[0037] Embodiment 3
[0038] Based on the above embodiments, the photomask read-write device box body 11 is also provided with a display unit for displaying the read-write state. The display unit is an LED display screen, which is used to display the read-write state information of the photomask. The photomask read-write device box body is also provided with a display unit for displaying the read-write state. The display unit is an LED display screen, which can clearly display the read-write state information of the photomask, such as read-write success, read-write failure, etc. The operator can observe the information on the display screen to timely understand the operation results and ensure the accuracy and reliability of the operation.
Claims
1. A read-write device of an RFID-based photomask tracing system, comprising a photomask read-write device body (1); characterized in that, The photolithography mask read-write device body (1) comprises a photolithography mask read-write device box (11) and a photolithography mask read-write device upper cover (12); the photolithography mask read-write device box (11) and the photolithography mask read-write device upper cover (12) form a closed photolithography mask read-write device cavity; the photolithography mask read-write device upper cover (12) is connected with a mask unit (13) for placing a mask, a barcode reading unit (14) for reading the barcode of the mask and an antenna rod (15) for receiving an RFID signal.
2. The RFID-based photolithography mask retromark system read-write device according to claim 1, wherein, The photolithography mask read-write device upper cover (12) is provided with a clamping groove unit (121), and the clamping groove unit (121) comprises oppositely arranged clamping groove baffles (122); a clamping groove is formed in the middle of the oppositely arranged clamping groove baffles (122), and the photolithography mask read-write device box (11) passes through the clamping groove.
3. The RFID-based photolithography mask retromark system read-write device of claim 1, wherein, The photolithography mask read-write device upper cover (12) is further connected with a support unit (16).
4. The RFID-based photolithography mask retromark system read-write device of claim 1, wherein, An RFID read-write unit, an infrared induction unit (18) and a quality acquisition unit (17) are arranged in the photolithography mask read-write device cavity, the quality acquisition unit (17) is used for acquiring the quality of the photolithography mask read-write device box (11); the infrared induction unit (18) is used for acquiring the position information of the photolithography mask read-write device box (11); and the RFID read-write unit is used for reading and writing the RFID tag of the mask of the photolithography mask read-write device box (11).
5. The RFID-based photolithography mask retromark system read / write device of claim 1, wherein, The infrared induction unit (18) is provided with two infrared induction units, which are located below the oppositely arranged clamping groove baffles (122).
6. The RFID-based photolithography mask retromark system read / write device of claim 1, wherein, The antenna rod (15) is a high-frequency or ultrahigh-frequency RFID antenna.
7. The RFID-based photolithography mask retromark system read / write device of claim 1, wherein, The photolithography mask read-write device box (11) is further provided with a display unit for displaying the read-write state; the display unit is an LED display screen, which is used for displaying the photolithography mask read-write state information.
8. The RFID-based photolithography mask retromark system read / write device of claim 1, wherein, The mask unit (13) supports a plurality of specifications of photolithography masks, including but not limited to 6-inch and 8-inch masks.