Cleaning and drying device

Abstract

The utility model provides a cleaning and drying device. The cleaning and drying device comprises a drying cavity; the cleaning tank is located in the drying cavity and used for containing cleaning liquid; the lifting device is located in the drying cavity, the lifting device comprises a support, and the support is connected with a first lifting motor and is configured to move in the direction of entering or being away from the cleaning tank under the driving of the first lifting motor; the first bearing part is connected with the bracket and is used for bearing a part to be cleaned; and the second bearing part and the first bearing part alternately bear the to-be-cleaned part by lifting relative to the first bearing part. The cleaning and drying device provided by the utility model can avoid wafer surface defects caused by incomplete drying of a contact point between the wafer and the lifting device in a wafer drying process.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor manufacturing, in particular to a cleaning and drying device. BACKGROUND

[0002] Wet etching can accurately control the removal amount of thin film and has low loss of raw materials in the process, and is widely used in the field of integrated circuit manufacturing. The slot etching machine is a commonly used etching equipment in the wet etching process.

[0003] After the wafer is etched and immersed cleaned by using the slot etching machine, the wafer needs to be dried. When the wafer is dried, the lifting device lifts the wafer cleaned by deionized water from the immersion tank to the surface of the deionized water, so that the wafer is in the isopropyl alcohol (IPA) steam atmosphere in the process chamber for drying.

[0004] However, the contact point between the wafer and the lifting device cannot be exposed to the isopropyl alcohol atmosphere, so that the deionized water at the contact point cannot be taken away from the surface of the wafer by the isopropyl alcohol atmosphere, affecting the drying effect of the wafer and causing defects on the surface of the wafer.

[0005] Therefore, it is necessary to develop a cleaning and drying device to avoid the incomplete drying of the contact point between the wafer and the lifting device during the drying of the wafer, which causes defects on the surface of the wafer. CONTENT OF THE INVENTION

[0006] The purpose of the present application is to provide a cleaning and drying device to avoid the incomplete drying of the contact point between the wafer and the lifting device during the drying of the wafer, which causes defects on the surface of the wafer.

[0007] The cleaning and drying device provided by the present application comprises a drying chamber, a cleaning tank located in the drying chamber for containing cleaning liquid, and a lifting device located in the drying chamber, wherein the lifting device comprises a support connected with a first lifting motor and configured to move towards or away from the cleaning tank under the driving of the first lifting motor, a first supporting part connected with the support for supporting a to-be-cleaned piece, and a second supporting part for alternatively supporting the to-be-cleaned piece with the first supporting part by lifting relative to the first supporting part.

[0008] In some embodiments, the second supporting part comprises a lifting plate located on the side of the support away from the first supporting part and connected with a second lifting motor and configured to rise or fall under the driving of the second lifting motor, and a plurality of second supporting rods connected with one end of the lifting plate close to the cleaning tank for supporting the to-be-cleaned piece.

[0009] In some embodiments, the first supporting part comprises a plurality of first supporting rods, which are fixedly connected to the support near one end of the cleaning tank, and the first supporting rods are staggered with the second supporting rods. In some embodiments, the number of the first supporting rods is three, the first supporting rods on both sides are flush with each other, and the first supporting rod in the center is lower than the first supporting rods on both sides.

[0010] In some embodiments, the number of the second supporting rods is two, which are respectively located between adjacent first supporting rods, and the two second supporting rods are flush with each other.

[0011] In some embodiments, the support is provided with a groove matched with the second supporting rod near one side of the cleaning tank, so that the second supporting rod slides along the groove.

[0012] In some embodiments, the first supporting rod is provided with a plurality of first toothed parts on the side away from the cleaning tank, which are used for clamping the cleaning object; and / or the second supporting rod is provided with a plurality of second toothed parts on the side away from the cleaning tank, which are used for clamping the cleaning object.

[0013] In some embodiments, the bottom of the drying cavity is provided with a first liquid inlet and a first liquid outlet, which are respectively used for making the cleaning liquid enter or discharge from the drying cavity; the bottom of the cleaning tank is respectively provided with a second liquid inlet and a second liquid outlet, the second liquid inlet is communicated with the first liquid inlet through a liquid inlet pipeline, which is used for making the cleaning liquid enter the cleaning tank, and the second liquid outlet is used for making the cleaning liquid discharge from the cleaning tank.

[0014] In some embodiments, the bottom of the cleaning tank is provided with a supporting bracket, the first end of the supporting bracket is connected to the outer wall of the bottom of the cleaning tank, and the second end of the supporting bracket is connected to the inner wall of the bottom of the drying cavity.

[0015] In some embodiments, the drying cavity is provided with a gas nozzle, which is used for blowing gas to the cleaning object.

[0016] The cleaning and drying device provided by the present application has the following beneficial effects, but is not limited to the following:

[0017] The lifting device of the cleaning and drying device provided by the present application comprises a first supporting part and a second supporting part, which can support the cleaning object, and the first supporting part and the second supporting part can alternately support the cleaning object, which avoids the incomplete drying of the contact part between the cleaning object and the supporting part caused by the single supporting part supporting the cleaning object, and affects the cleaning effect of the cleaning object. BRIEF DESCRIPTION OF DRAWINGS

[0018] The following accompanying drawings describe in detail the exemplary embodiments disclosed in this application. The same reference numerals denote similar structures in several views of the drawings. Those skilled in the art will understand that these embodiments are non-limiting and exemplary, and the drawings are for illustrative purposes only and are not intended to limit the scope of this application. Other embodiments may similarly fulfill the inventive intent of this application. It should be understood that the drawings are not drawn to scale.

[0019] in:

[0020] Figure 1 This is a schematic diagram of the structure of a cleaning and drying apparatus according to some embodiments of this application, in which the first support portion supports the part to be cleaned;

[0021] Figure 2 This is a schematic diagram of the structure of a cleaning and drying apparatus according to some embodiments of this application, in which the part to be cleaned is supported by a second support.

[0022] Figure 3 A schematic diagram of the structure of a lifting device according to some embodiments of this application; and

[0023] Figure 4 for Figure 3 Left view of the lifting device shown. Detailed Implementation

[0024] The following description provides specific application scenarios and requirements for this application, intended to enable those skilled in the art to make and use the content of this application. Various partial modifications to the disclosed embodiments will be apparent to those skilled in the art, and the general principles defined herein can be applied to other embodiments and applications without departing from the spirit and scope of this application. Therefore, this application is not limited to the embodiments shown, but rather to the widest scope consistent with the claims.

[0025] This application provides a cleaning and drying apparatus, comprising: a drying chamber; a cleaning tank located within the drying chamber for holding cleaning liquid; and a lifting device located within the drying chamber, the lifting device comprising: a support connected to a first lifting motor and configured to move in a direction toward entering or away from the cleaning tank under the drive of the first lifting motor; a first support connected to the support for supporting a workpiece to be cleaned; and a second support, the second support alternately supporting the workpiece to be cleaned with the first support by lifting relative to the first support.

[0026] The lifting device of the cleaning and drying apparatus provided in this application includes a first support part and a second support part that can support the parts to be cleaned. The first support part and the second support part can alternately support the parts to be cleaned, which avoids incomplete drying at the contact point between the parts to be cleaned and the support part caused by a single support part supporting the parts, thus affecting the cleaning effect of the parts to be cleaned.

[0027] The cleaning and drying apparatus provided in this application will be described in detail below with reference to specific embodiments and accompanying drawings.

[0028] refer to Figures 1 to 4 This application provides a cleaning and drying device, which includes a drying chamber 100, a cleaning tank 200, and a lifting device 300. The lifting device 300 includes a bracket 301, a first support part 302, and a second support part 400.

[0029] The cleaning tank 200 is located inside the drying chamber 100 and is used to hold cleaning liquid (e.g., deionized water). After the part to be cleaned 11 is cleaned in the cleaning tank 200, it is lifted out of the cleaning tank 200 by the lifting device 300 and dried in the drying chamber 100. During the drying process, the first support part 302 and the second support part 400 alternately support the part to be cleaned 11.

[0030] In some embodiments, the bottom of the drying chamber 100 is provided with a first liquid inlet 101 and a first liquid outlet 102, which are respectively used to allow the cleaning liquid to enter the drying chamber 100 or to discharge from the drying chamber 100.

[0031] In some embodiments, the first liquid inlet 101 is connected to the cleaning tank 200 through the liquid inlet pipe 103. The cleaning liquid enters the drying chamber 100 through the first liquid inlet 101 and is transported to the cleaning tank 200 through the liquid inlet pipe 103. The cleaning liquid discharged from the cleaning tank 200 is discharged from the drying chamber 100 through the first liquid outlet 102.

[0032] In some embodiments, the drying chamber 100 is provided with a gas nozzle 104 for blowing air onto the part 11 to be cleaned.

[0033] In some embodiments, the gas nozzle 104 is connected to a gas source, such as nitrogen (N2) and / or isopropanol (IPA).

[0034] In some embodiments, the drying chamber 100 is further provided with an air outlet 105 for discharging gas from the drying chamber 100. In some embodiments, the air outlet 105 is connected to a negative pressure device, such as a vacuum pump.

[0035] In some embodiments, during the process of cleaning the to-be-cleaned piece 11, the dry cavity 100 is filled with nitrogen gas to avoid impurity gas from polluting the to-be-cleaned piece 11; after the cleaning of the to-be-cleaned piece 11 is completed, isopropyl alcohol is filled into the dry cavity 100, which can accelerate the evaporation rate of deionized water on the surface of the to-be-cleaned piece 11, then the to-be-cleaned piece 11 is lifted from the cleaning tank 200, and nitrogen gas is continuously blown to the surface of the to-be-cleaned piece 11 through the gas nozzle 104, after the drying of the to-be-cleaned piece 11 is completed, the negative pressure device is started, and the nitrogen gas and the isopropyl alcohol are extracted from the dry cavity 100 through the gas outlet 105. In some embodiments, the temperature of the nitrogen gas filled into the dry cavity 100 is higher than room temperature.

[0036] In some embodiments, the top of the dry cavity 100 is provided with a movable cover (not shown in the figure) for the to-be-cleaned piece 11 to enter or leave the dry cavity 100.

[0037] In some embodiments, the bottom of the cleaning tank 200 is respectively provided with a second liquid inlet 201 and a second liquid outlet (not shown in the figure), the second liquid inlet 201 is communicated with the first liquid inlet 101 through the liquid inlet pipeline 103, for the cleaning liquid to enter the cleaning tank 200, and the second liquid outlet is used for the cleaning liquid to be discharged from the cleaning tank 200.

[0038] When the to-be-cleaned piece 11 needs to be cleaned, the cleaning liquid enters the cleaning tank 200 through the second liquid inlet 201, then the to-be-cleaned piece 11 is immersed in the cleaning liquid, after soaking for a period of time, the cleaning of the to-be-cleaned piece 11 is completed, then the to-be-cleaned piece 11 is removed from the cleaning tank 200, and the cleaning liquid is discharged from the second liquid outlet of the cleaning tank 200 to the bottom of the dry cavity 100, and is discharged from the dry cavity 100 through the first liquid outlet 102.

[0039] In some embodiments, the bottom of the cleaning tank 200 is provided with a supporting bracket 500, the first end of the supporting bracket 500 is connected with the outer wall of the bottom of the cleaning tank 200, and the second end of the supporting bracket 500 is connected with the inner wall of the bottom of the dry cavity 100.

[0040] In this embodiment, the lifting device 300 is configured to drive the to-be-cleaned piece 11 to move towards or away from the cleaning tank 200.

[0041] Before the loading of the cleaning object 11, the lifting device 300 is located above the drying cavity 100, and after the loading of the cleaning object 11, the lifting device 300 moves towards the cleaning tank 200, so that the cleaning object 11 is completely immersed in the cleaning liquid in the cleaning tank 200. After the cleaning of the cleaning object 11 is completed, the lifting device 300 moves away from the cleaning tank 200, so that the cleaning object 11 is completely removed from the cleaning liquid.

[0042] In some embodiments, the support 301 is connected with a first lifting motor (not shown in the figure) and is configured to be lifted or lowered under the driving of the first lifting motor.

[0043] In some embodiments, the first supporting part 302 includes a plurality of first supporting rods 302b, which are fixedly connected with one end of the support 301 close to the cleaning tank 200.

[0044] In some embodiments, the number of the first supporting rods 302b is three, the heights of the first supporting rods 302b on both sides are flush, and the height of the first supporting rod 302b in the center is lower than the heights of the first supporting rods 302b on both sides, so as to better match the cleaning object 11, such as a wafer.

[0045] In some embodiments, the first supporting rod 302b is provided with a plurality of first tooth-shaped parts 302a on the side away from the cleaning tank 200, which are used for clamping the cleaning object 11.

[0046] In some embodiments, the support 301 is provided with a groove 303 on the side close to the cleaning tank 200.

[0047] In some embodiments, the second supporting part 400 is configured to be lifted alternately relative to the first supporting part 302 to alternately support the cleaning object 11 with the first supporting part 302.

[0048] In some embodiments, the second supporting part 400 includes a lifting plate 401 and a plurality of second supporting rods 402. The lifting plate 401 is located on the side of the support 301 away from the first supporting part 302, is connected with a second lifting motor (not shown in the figure), and is configured to be lifted or lowered under the driving of the second lifting motor. The second supporting rods 402 are distributed alternately with the first supporting rods 302b and are connected with one end of the lifting plate 401 close to the cleaning tank 200, and are used for supporting the cleaning object.

[0049] In some embodiments, the number of the second supporting rods 402 is two, which are respectively located between adjacent first supporting rods 302b, and the heights of the two supporting rods 402 are flush.

[0050] In some embodiments, the second supporting rod 402 is matched with the groove 303 and can slide along the groove 303.

[0051] In some embodiments, the second supporting rod 402 is provided with a plurality of second teeth 402a on the side away from the cleaning tank 200, which are used to clamp the to-be-cleaned piece 11.

[0052] In some embodiments, the height of the second supporting rod 402 is slightly lower than the height of all the first supporting rods 302b before the lifting device 300 loads the to-be-cleaned piece 11 and during the cleaning of the to-be-cleaned piece 11, so that the to-be-cleaned piece 11 is supported by the first supporting rod 302b, and the lifting of the second supporting part 400 is synchronized with the lifting device 300; after the cleaning of the to-be-cleaned piece 11 is completed, the second supporting part 400 is lifted synchronously with the lifting device 300, and when the to-be-cleaned piece 11 completely leaves the cleaning tank 200, the lifting device 300 stops lifting, the second supporting part 400 continues to rise relative to the first supporting part 302, so that the height of the second supporting rod 402 is at least higher than the height of the first supporting rod 302b located in the middle, so that the to-be-cleaned piece 11 is supported by the second supporting rod 402; after the to-be-cleaned piece 11 is supported by the second supporting rod 402 for a certain period of time, the second supporting part 400 is lowered relative to the first supporting part 302, so that the height of the second supporting rod 402 is lower than the height of the first supporting rod 302b, so that the to-be-cleaned piece 11 is supported by the first supporting rod 302b again; the second supporting part 400 is repeatedly lifted and lowered for multiple times, so that the to-be-cleaned piece is alternately supported by the first supporting part 302 and the second supporting part 400, until the to-be-cleaned piece 11 is completely dried.

[0053] In other embodiments, the to-be-cleaned piece 11 can also be alternately supported between the first supporting part 302 and the second supporting part 400 by alternately lifting or lowering the first supporting part 302 and the second supporting part 400, which is not described here.

[0054] The first supporting part 302 and the second supporting part 400 can alternately support the to-be-cleaned piece 11, which avoids incomplete drying of the contact part between the to-be-cleaned piece and the supporting part caused by single supporting part, and affects the cleaning effect of the to-be-cleaned piece.

[0055] In some embodiments, the to-be-cleaned piece 11 is a wafer, and the cleaning and drying process of the wafer using the cleaning and drying device is as follows:

[0056] The deionized water is sequentially passed through the first liquid inlet 101, the liquid inlet pipeline 103 and the second liquid inlet 201 into the cleaning tank 200 to a set liquid level, the wafer is placed on the first supporting part 302, the lifting device 300 is lowered, the wafer is completely immersed in the deionized water in the cleaning tank 200, and the second supporting part 400 is synchronously lowered during the period; nitrogen is passed into the drying cavity 100 through the gas nozzle 104, the wafer is soaked for a period of time to clean the wafer, isopropanol is passed into the drying cavity 100 through the gas nozzle 104, the lifting device 300 is raised, and the wafer is completely removed from the deionized water; the wafer is alternately supported by the first supporting part 302 and the second supporting part 400 by lifting the second supporting part 400 until the wafer surface is completely dried; the input of the isopropanol is stopped, and the deionized water is discharged from the cleaning tank 200 and the drying cavity 100 through the second liquid outlet and the first liquid outlet 102; the input of the nitrogen is stopped, and the negative pressure device is started to vacuumize the drying cavity 100.

[0057] The cleaning and drying device provided in the application has the following beneficial effects, but is not limited to the following:

[0058] The lifting device of the cleaning and drying device provided in the application comprises a first supporting part and a second supporting part that can support a to-be-cleaned piece, and the first supporting part and the second supporting part can alternately support the to-be-cleaned piece, so that the incomplete drying of the contact part between the to-be-cleaned piece and the supporting part caused by the single supporting part supporting the to-be-cleaned piece is avoided, and the cleaning effect of the to-be-cleaned piece is affected.

[0059] It should be noted that different embodiments can have different beneficial effects, and in different embodiments, the beneficial effects that can be produced can be any one or a combination of several of the above, or any other beneficial effect that can be obtained.

[0060] The above has described the basic concept, and it is obvious that the above detailed disclosure is only used as an example and does not limit the specification. Although it is not explicitly stated here, those skilled in the art can make various modifications, improvements and corrections to the application. Such modifications, improvements and corrections are suggested in the specification, so such modifications, improvements and corrections still belong to the spirit and scope of the exemplary embodiments of the application.

[0061] It should be noted that, in the description of the present application, unless specifically defined and limited otherwise, the terms "mounting", "connected", "connection", "fixed", "linking" should be interpreted broadly, for example, can be fixed connection, can also be detachable connection, or integrated; can be mechanical connection, can also be electrical connection; can be rotary connection, can also be sliding connection; can be direct connection, can also be indirect connection through intermediate medium, can be internal communication of two elements or interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood in combination with specific circumstances.

[0062] In addition, when the terms "first", "second", "third" and the like are used in the description of the present application to describe various features, these terms are used only to distinguish the features, and cannot be understood as indicating or implying the relevance, relative importance between the features, or implicitly indicating the number of the indicated features.

[0063] In addition, the present application describes exemplary embodiments by referring to idealized exemplary cross-sectional and / or plan and / or perspective views. Therefore, differences from the illustrated shapes due to, for example, manufacturing techniques and / or tolerances are foreseeable. Therefore, the exemplary embodiments should not be interpreted as being limited to the shapes of the regions shown here, but should include deviations in the shapes caused by, for example, manufacturing. Therefore, the regions shown in the figures are essentially schematic, and the shapes thereof are not intended to show the actual shape of the regions of the device nor to limit the scope of the exemplary embodiments.

[0064] Meanwhile, the present application uses specific words to describe the embodiments of the present application. As "one embodiment", "an embodiment", and / or "some embodiments" means a certain feature, structure or characteristic related to at least one embodiment of the present application. Therefore, it should be emphasized and noted that the "an embodiment" or "one embodiment" or "one alternative embodiment" mentioned in different places in the present application does not necessarily refer to the same embodiment. In addition, certain features, structures or characteristics in one or more embodiments of the present application can be properly combined.

[0065] Similarly, it should be noted that, in order to simplify the expression of the present application and to help understand one or more embodiments of the present application, in the foregoing description of the embodiments of the present application, various features are sometimes combined into one embodiment, figure or description thereof. However, this method of disclosure does not mean that the features required by the present application are more than the features mentioned in the claims. In fact, the features of the embodiments are less than all the features of the disclosed single embodiment.

[0066] Finally, it should be understood that the embodiments described herein are merely exemplary of the principles of the application. Other embodiments can fall within the scope of the application. Thus, although the application has been described with respect to example embodiments, it will be recognized that the scope of the application encompasses alternatives and modifications thereof. Accordingly, the embodiments of the application are not limited to the examples described above, but rather are limited only by the claims.

Claims

1. A cleaning and drying apparatus, characterized by, include: Drying chamber; A cleaning tank, located inside the drying chamber, is used to hold the cleaning solution; A lifting device, located within the drying chamber, comprises: A support bracket, which is connected to a first lifting motor and is configured to move in or away from the cleaning tank under the drive of the first lifting motor; A first support portion, connected to the bracket, is used to support the item to be cleaned; and The second support portion alternately supports the item to be cleaned by moving up and down relative to the first support portion.

2. The cleaning and drying apparatus of claim 1, wherein The second support portion includes a lifting plate and a plurality of second support rods. The lifting plate is located on the side of the bracket away from the first support portion and is connected to a second lifting motor. It is configured to rise or fall under the drive of the second lifting motor. The second support rods are connected to the end of the lifting plate near the cleaning tank and are used to support the items to be cleaned.

3. The cleaning and drying apparatus of claim 2, wherein The first support portion includes a plurality of first support rods, which are fixedly connected to one end of the bracket near the cleaning tank, and the first support rods and the second support rods are distributed alternately.

4. The cleaning and drying apparatus of claim 3, wherein There are three first support rods. The first support rods on both sides are at the same height, and the first support rod in the center is lower than the first support rods on both sides.

5. The cleaning and drying apparatus of claim 4, wherein There are two second support rods, located between adjacent first support rods, with the two second support rods at the same height.

6. The cleaning and drying apparatus of claim 3, wherein The bracket has a groove on the side near the cleaning tank that matches the second support rod, so that the second support rod can slide along the groove.

7. The cleaning and drying apparatus of claim 3, wherein The first support rod has a plurality of first toothed portions on the side away from the cleaning tank for engaging the part to be cleaned; and / or the second support rod has a plurality of second toothed portions on the side away from the cleaning tank for engaging the part to be cleaned.

8. The cleaning and drying apparatus of claim 1, wherein, The bottom of the drying chamber is provided with a first liquid inlet and a first liquid outlet, which are used to allow the cleaning liquid to enter the drying chamber or to discharge it from the drying chamber, respectively; the bottom of the cleaning tank is provided with a second liquid inlet and a second liquid outlet, the second liquid inlet is connected to the first liquid inlet through a liquid inlet pipe, which is used to allow the cleaning liquid to enter the cleaning tank, and the second liquid outlet is used to allow the cleaning liquid to discharge from the cleaning tank.

9. The cleaning and drying apparatus of claim 8, wherein, The bottom of the cleaning tank is provided with a support bracket, the first end of which is connected to the outer wall of the bottom of the cleaning tank, and the second end of which is connected to the inner wall of the bottom of the drying chamber.

10. The cleaning and drying apparatus of claim 1, wherein, The drying chamber is equipped with a gas nozzle for blowing air onto the part to be cleaned.

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