Wafer double-sided scrubbing mechanism

Abstract

The utility model belongs to the technical field of wafer production equipment, and particularly relates to a wafer double-sided scrubbing mechanism. The device comprises a rack, and the rack comprises a bottom plate and a protective cover arranged on the bottom plate; the supporting device comprises at least three rotary supporting units, the multiple rotary supporting units are divided into two groups which are oppositely arranged, and the output ends of the rotary supporting units extend into the protective cover and are used for clamping the outer edge of the wafer; the brushing device comprises two groups of brushing heads arranged between the two groups of rotary supporting units and a first driving unit for driving the brushing heads, and the first driving unit is located outside the protective cover and used for driving the brushing heads arranged on the two surfaces of the wafer at intervals to get close to or away from each other. The wafer cleaning device is used for solving the problem of low wafer cleaning efficiency. The edge of the wafer is clamped by the multiple rotary supporting units in the supporting device, the brushing heads are arranged on the upper face and the lower face of the wafer respectively, the two faces of the wafer are cleaned at the same time, efficiency is improved, and double-face brushing is completed at a time.

Description

TECHNICAL FIELD

[0001] The utility model belongs to wafer production equipment technical field, concretely relates to a wafer double -sided brush washing mechanism. BACKGROUND

[0002] In the manufacturing process of wafer, a large number of particles are generated due to cutting and other operations, and these particles remaining on the wafer surface will affect the precision and quality of subsequent processes, for example, in the photoetching process, particles can block photoetching light, resulting in inaccurate pattern transfer and forming defects.

[0003] Therefore, in the production process, the impurities on the wafer surface need to be cleaned, and currently, for the cleaning of the wafer surface, a soft brush is usually used to contact the wafer surface to make the impurity particles fall off from the wafer surface through mechanical friction, which is simple and direct.

[0004] However, this brushing method usually uses an adsorption mechanism to adsorb the bottom surface of the wafer, and then uses a brush to brush the upper surface of the wafer, and then flips and brushes again, which has low cleaning efficiency and low intelligence. TECHNICAL CONTENT

[0005] The technical problem to be solved by the utility model is to overcome the shortcomings of the prior art, and provide a wafer double -sided brush washing mechanism for solving the problem of low wafer cleaning efficiency.

[0006] The technical scheme for solving the above technical problem is as follows: a wafer double -sided brush washing mechanism, comprising:

[0007] A rack comprising a bottom plate and a protective cover arranged on the bottom plate;

[0008] A support device comprising at least three rotating support units, a plurality of rotating support units being divided into two groups arranged oppositely, the output end of the rotating support unit extending into the protective cover for clamping the outer edge of the wafer;

[0009] A brushing device comprising two groups of brushing heads arranged between the two groups of rotating support units, and a first driving unit driving the brushing heads, the first driving unit being located outside the protective cover for driving the brushing heads arranged on the two sides of the wafer to approach or move away from each other.

[0010] Compared with the prior art, the above technical scheme has the following beneficial effects:

[0011] The edge of the wafer is clamped by a plurality of rotating supporting units in the supporting device, and the brush head is arranged on the upper and lower surfaces of the wafer, and the two surfaces of the wafer are cleaned, the rotating supporting unit supports the wafer and drives the wafer to rotate, so that the brush head between the two rotating supporting units can clean the surface of the wafer, the protective cover can prevent liquid from splashing during the brushing process, the whole brushing process is intelligent, the efficiency is improved, and the double-sided brushing is completed at one time.

[0012] Based on the above technical solutions, the embodiments of the present application can also be improved as follows:

[0013] In an embodiment, the brush head comprises:

[0014] The fixed plate is connected to the output end of the first driving unit at one end and extends into the protective cover at the other end;

[0015] The brush roller is rotatably connected to the fixed plate;

[0016] The nozzle is installed on the fixed plate, and the outlet of the nozzle is directed to the contact position of the brush roller and the wafer.

[0017] In an embodiment, the first driving unit comprises:

[0018] The bracket is arranged on the bottom plate outside the protective cover;

[0019] The first double-head driving cylinder is installed on the bracket, and the fixed plates of the two brush heads are fixedly connected to the two sliding tables of the first double-head driving cylinder.

[0020] In an embodiment, a brush washing motor is installed on the fixed plate, and the output end of the brush washing motor is drivingly connected to one end of the brush roller.

[0021] In an embodiment, the protective cover is provided with an avoiding groove between the two groups of rotating supporting units along the moving direction of the first double-head driving cylinder, and two water blocking plates are arranged on the two fixed plates inside the protective cover to block the avoiding groove.

[0022] In an embodiment, the input ends of the two groups of rotating supporting units outside the protective cover are respectively connected to two groups of rotating driving devices, and the rotating driving devices are used to drive the rotating supporting units to rotate.

[0023] In an embodiment, a second driving unit is mounted on the bottom of the base plate, the second driving unit comprising a second double-end driving cylinder mounted on the bottom of the base plate, two slides of the second double-end driving cylinder being connected with sliding plates respectively, and the rotating driving devices being mounted on the sliding plates to drive the two groups of rotating driving devices and the two groups of rotating supporting units to move closer to or farther from each other.

[0024] In an embodiment, a long circular hole is formed at the bottom of the protective cover for the rotating supporting units to pass through, a first waterproof plate being arranged around the upper periphery of the long circular hole, a second waterproof plate being arranged outside the first waterproof plate, and a waterproof sleeve being sleeved on the rotating supporting units outside the second waterproof plate.

[0025] In an embodiment, the protective cover comprises a cover body arranged on the base plate and a cover lid matched and closed on the cover body, an entrance corresponding to the output end of the supporting device being arranged at the joint of the cover lid and the cover body, a door driving cylinder being arranged outside the protective cover, and a door plate for shielding or exposing the entrance being connected to the output end of the door driving cylinder.

[0026] In an embodiment, an exhaust pipe is arranged on the sidewall of the protective cover and communicates with the inside of the protective cover, and a drain pipe is arranged at the bottom of the protective cover and communicates with the inside of the protective cover. BRIEF DESCRIPTION OF DRAWINGS

[0027] In order to more clearly illustrate the specific embodiments of the present application or the technical solutions in the prior art, the drawings needed in the following specific embodiments or prior art description will be briefly introduced. Obviously, the drawings in the following description are some embodiments of the present application, and other drawings can also be obtained by those skilled in the art without creative labor.

[0028] Figure 1 It is a schematic diagram of the overall structure of the present application.

[0029] Figure 2 It is a schematic diagram of the overall structure of the present application. Figure 1 from another perspective.

[0030] Figure 3 It is a schematic diagram of the overall structure of the present application. Figure 1 from another perspective.

[0031] Figure 4 It is a schematic diagram of the overall structure of the present application. Figure 3 from another perspective.

[0032] Figure 5 It is a schematic diagram of the overall structure of the present application. Figure 3 from another perspective.

[0033] Figure 6 Fig. 1 is a structural schematic diagram of a top view perspective of the present application. Figure 3 Fig. 2 is a structural schematic diagram of a sectional view of the present application.

[0034] Figure 7 Fig. 3 is a structural schematic diagram of a sectional view of the present application. Figure 6 Fig. 4 is a structural schematic diagram of a sectional view of the present application.

[0035] Reference signs:

[0036] 1, frame, 2, support device; 3, brushing device; 4, brushing motor; 5, synchronous wheel; 6, avoiding groove; 7, water baffle; 8, long circular hole; 9, first waterproof plate; 10, second waterproof plate; 11, waterproof sleeve; 12, door driving cylinder; 13, door plate; 14, exhaust pipe; 15, drain pipe; 16, wafer; 17, linear track;

[0037] 101, bottom plate; 102, protective cover;

[0038] 1021, cover body; 1022, cover cap; 1023, entrance and exit;

[0039] 201, rotating support unit; 202, rotating driving device; 203, second driving unit;

[0040] 2031, second double-head driving cylinder; 2032, sliding plate;

[0041] 301, brushing head; 302, first driving unit;

[0042] 3011, fixed plate; 3012, brush roller; 3013, nozzle;

[0043] 3021, support; 3022, first double-head driving cylinder; DETAILED DESCRIPTION

[0044] The embodiments of the technical scheme of the present application will be described in detail below with reference to the drawings. The following embodiments are only used to more clearly illustrate the technical scheme of the present application, and therefore only serve as examples, and cannot limit the protection scope of the present application.

[0045] It should be noted that, unless otherwise specified, the technical terms or scientific terms used in the present application should be the usual meanings understood by the technical personnel in the field to which the present application belongs.

[0046] In the description of the present application, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application.

[0047] In addition, the terms "first", "second" and the like are only for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise explicitly specified and limited.

[0048] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connection", "fixing" and the like should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship of two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0049] As shown in Figures 1-7 The wafer 16 double-sided brushing mechanism provided by the present application comprises a rack 1, a supporting device 2 and a brushing device 3.

[0050] As shown in Figure 3 , 6 The rack 1 comprises a bottom plate 101 and a protective cover 102 arranged on the bottom plate 101, and the protective cover 102 can prevent liquid from splashing during brushing. The supporting device 2 comprises at least three rotating supporting units 201, which can clamp and fix one wafer 16. In the present embodiment, four rotating supporting units 201 are adopted, and the four rotating supporting units 201 are divided into two groups arranged oppositely, each group comprising two rotating supporting units 201. The output end of the rotating supporting unit 201 extends into the protective cover 102, that is, the top of the rotating supporting unit 201 extends into the protective cover 102, which is used for clamping the outer edge of the wafer 16. Specifically, the rotating supporting unit 201 comprises a rotating supporting shaft, and the top of the rotating supporting shaft is provided with a friction wheel, and the circumferential surface of the friction wheel is formed with a groove in contact with the outer edge of the wafer 16, which is used for clamping the wafer 16 to rotate.

[0051] The brushing device 3 comprises two sets of brushing heads 301 arranged between the two sets of rotating support units 201, and a first driving unit 302 for driving the brushing heads 301. The two sets of brushing heads 301 are arranged in an up-down manner and located inside the protective cover 102, and are respectively arranged on the upper and lower surfaces of the wafer 16 for synchronous cleaning of the wafer 16. The first driving unit 302 is located outside the protective cover 102 and is used to drive the brushing heads 301 arranged on the upper and lower surfaces of the wafer 16 to move close to or away from each other. During cleaning, the first driving unit 302 drives the two brushing heads 301 to move close to each other and contact the upper and lower surfaces of the wafer 16. After cleaning, the first driving unit 302 drives the two brushing heads 301 to move away from each other to provide space for placing and taking out the wafer 16.

[0052] The wafer 16 is clamped by the multiple rotating support units 201 in the support device 2, and the brushing heads 301 are arranged on the upper and lower surfaces of the wafer 16, respectively. The rotating support units 201 not only support the wafer 16 but also drive the wafer 16 to rotate, so that the brushing heads 301 located between the two sets of rotating support units 201 can brush the surface of the wafer 16 comprehensively. The protective cover 102 can prevent liquid from splashing during brushing. The entire brushing process is highly intelligent and efficient, and the double-sided brushing can be completed at one time.

[0053] Specifically, the brushing head 301 comprises a fixed plate 3011, a brush roller 3012, and a nozzle 3013.

[0054] One end of the fixed plate 3011 is connected to the output end of the first driving unit 302 outside the protective cover 102, and the other end extends into the protective cover 102 and between the two sets of rotating support units 201. The brush roller 3012 is rotatably connected to the fixed plate 3011, and the two ends of the brush roller 3012 are fixed to the fixed plate 3011 by shaft seats. The brush roller 3012 can rotate to clean the surface of the wafer 16. The nozzle 3013 is installed on the fixed plate 3011, and the outlet of the nozzle 3013 faces the contact position between the brush roller 3012 and the wafer 16. When the brush roller 3012 rotates, the nozzle 3013 continuously sprays cleaning liquid to keep the surface of the wafer 16 wet, improve the cleaning effect, and avoid abrasion.

[0055] The brushing head 301 further comprises a brushing motor 4 installed on the fixed plate 3011. The output end of the brushing motor 4 is drivingly connected to one end of the brush roller 3012. The one end of the brush roller 3012 extends out of the protective cover 102 and is provided with a synchronous wheel 5. The output end of the brushing motor 4 drives the synchronous wheel 5 through a transmission belt, and in turn drives the brush roller 3012 to rotate.

[0056] The brush roller 3012 comprises a central roller shaft and a brush wrapped outside the roller shaft, the roller shaft is hollow inside and uniformly provided with a plurality of spray holes on the surface, and a sealing ring is rotatably connected to one end of the roller shaft.

[0057] In the embodiment, the first driving unit 302 comprises a support 3021 and a first double-head driving cylinder 3022.

[0058] The support 3021 is arranged on the bottom plate 101 outside the protective cover 102, and the support 3021 is vertically arranged. The first double-head driving cylinder 3022 is mounted on the support 3021. The fixed plates 3011 of the two brush washing heads 301 are fixedly connected with two sliding tables of the first double-head driving cylinder 3022. The fixed plates 3011 are further connected with linear rails 17 therebetween, which play a guiding role. The first double-head driving cylinder 3022 is used to slide the two fixed plates 3011 in the vertical direction, so as to realize the opening and closing of the two fixed plates 3011, and further drive the two brush washing heads 301 to open and close.

[0059] In the embodiment, as shown in Figure 4 In order to ensure that the first driving unit 302 can smoothly drive the fixed plates 3011 to move up and down, the protective cover 102 is provided with an avoiding groove 6 between the two groups of rotating support units 201 along the moving direction of the first double-head driving cylinder 3022. The fixed plates 3011 extend into the protective cover 102 through the avoiding groove 6. The two fixed plates 3011 inside the protective cover 102 are respectively provided with two water baffle plates 7 for shielding the avoiding groove 6. The two water baffle plates 7 can block the liquid inside the protective cover 102 from being thrown out of the avoiding groove 6. The two water baffle plates 7 are arranged in a staggered manner along the length direction of the fixed plates 3011, so that the two fixed plates 3011 can block the avoiding groove 6 when moving up and down.

[0060] As shown in Figure 5 The input ends of the two groups of rotating support units 201 outside the protective cover 102 are respectively connected with two groups of rotating driving devices 202. The rotating driving devices 202 are used to drive the rotating support units 201 to rotate. The two groups of rotating driving devices 202 are arranged at the bottom of the bottom plate 101. The top output end of the rotating support unit 201 extends into the protective cover 102. The bottom input end of the rotating support unit 201 is located outside the protective cover 102. The input end is provided with a synchronous wheel 5. The bottom of each rotating support unit 201 in each group is provided with a synchronous wheel 5. The synchronous wheel 5 is connected with the output end of the rotating driving device 202 through a transmission belt, so as to drive the two groups of rotating support units 201 to rotate respectively. The rotating driving device 202 can be realized by a servo motor.

[0061] As shown in Figure 5As shown, the bottom of the bottom plate 101 is provided with a second driving unit 203, which comprises a second double-end driving cylinder 2031 mounted on the bottom of the bottom plate 101, and the double-end driving cylinder 2031 is used to drive the opening and closing of the two groups of rotating support units 201, and the two slides of the double-end driving cylinder 2031 are respectively connected with sliding plates 2032; and the sliding plate 2032 is Z-shaped, one end of which is connected with the slide of the double-end driving cylinder 2031, and the other end is slidably connected on the bottom of the bottom plate 101 through a linear track 17, which plays a guiding role through the linear track 17, and the rotating driving device 202 is mounted on the sliding plate 2032 to drive the two groups of rotating driving devices 202 and the two groups of rotating support units 201 to move close to or away from each other, specifically, the bottom end of the rotating support shaft in the rotating support unit 201 penetrates through the sliding plate 2032, and then the rotating driving device 202 drives the rotating support shaft to rotate through the connection of the transmission belt.

[0062] As shown in Figure 6 , 7 To improve the waterproof effect, the bottom of the protective cover 102 is formed with an oblong hole 8 through which the rotating support unit 201 penetrates, and a first waterproof plate 9 is arranged around the upper periphery of the oblong hole 8, and the outer part of the first waterproof plate 9 is covered with a second waterproof plate 10, and the outer part of the second waterproof plate 10 is covered with a waterproof sleeve 11 which is sleeved on the rotating support unit 201, and the waterproof sleeve 11, the second waterproof plate 10 and the first waterproof plate 9 are sequentially sleeved from the outside to the inside to seal the oblong hole 8 through which the rotating support shaft penetrates the bottom of the protective cover 102, so as to prevent water from flowing out of the oblong hole 8, and the oblong hole 8 is arranged along the displacement direction of the rotating support shaft.

[0063] As shown in Figures 1-2 To facilitate the taking or maintenance of the inside of the protective cover 102, the protective cover 102 is provided in a split type, specifically, the protective cover 102 comprises a cover body 1021 arranged on the bottom plate 101 and a cover lid 1022 matched and covered on the cover body 1021, and the cover lid 1022 can be removed to facilitate the operation of the inside by personnel;

[0064] As shown in Figure 2 The cover lid 1022 and the cover body 1021 are combined at the entrance and exit 1023 corresponding to the output end of the top of the supporting device 2, which facilitates the feeding of the wafer 16 into the entrance and exit 1023 under the condition that the cover lid 1022 is covered, and the protective cover 102 is provided with a door driving cylinder 12, and the output end of the door driving cylinder 12 is connected with a door plate 13 for shielding or exposing the entrance and exit 1023, and the door driving cylinder 12 can be realized by a cylinder or a motor, etc., to move the door plate 13 up and down to shield or expose the entrance and exit 1023.

[0065] In the embodiment, the side wall of the protective cover 102 is provided with an exhaust pipe 14 communicating with the inside of the protective cover 102, and the bottom of the protective cover 102 is provided with a drain pipe 15 communicating with the inside of the protective cover 102, so that the liquid accumulated in the protective cover 102 is drained through the drain pipe 15.

[0066] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, but not limited to them; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: it can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement to part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A wafer double-sided brushing mechanism, characterized in that, include: A frame, comprising a base plate and a protective cover disposed on the base plate; A support device includes at least three rotating support units, which are divided into two groups arranged opposite to each other. The output end of each rotating support unit extends into the protective cover to clamp the outer edge of the wafer. The brushing device includes two sets of brush heads disposed between two sets of the rotating support units, and a first drive unit for driving the brush heads. The first drive unit is located outside the protective cover and is used to drive the brush heads, which are spaced apart on both sides of the wafer, to move closer or further apart from each other. The brushing head includes: A fixing plate, one end of which is connected to the output end of the first drive unit, and the other end of which extends into the protective cover; The brush roller is rotatably connected to the fixed plate; A nozzle is mounted on the fixed plate, with the nozzle outlet facing the contact point between the brush roller and the wafer; The first driving unit includes: A bracket is mounted on the base plate outside the protective cover; The first dual-head drive cylinder is mounted on the bracket, and the fixing plates of the two brush heads are fixedly connected to the two slides of the first dual-head drive cylinder.

2. The wafer double-sided brushing mechanism according to claim 1, characterized in that, A brushing motor is mounted on the fixed plate, and the output end of the brushing motor is connected to one end of the brush roller.

3. The wafer double-sided brushing mechanism according to claim 1, characterized in that, The protective cover has a clearance groove located between the two sets of rotating support units along the moving direction of the first dual-head drive cylinder. Two water baffles for blocking the clearance groove are respectively provided on the two fixed plates inside the protective cover.

4. The wafer double-sided brushing mechanism according to claim 1, characterized in that, The input ends of the two sets of rotating support units located outside the protective cover are respectively connected to two sets of rotating drive devices, which are used to drive the rotating support units to rotate.

5. The wafer double-sided brushing mechanism according to claim 4, characterized in that, A second drive unit is installed at the bottom of the base plate. The second drive unit includes a second double-headed drive cylinder installed at the bottom of the base plate. The two slides of the second double-headed drive cylinder are respectively connected to sliding plates. The rotary drive device is installed on the sliding plates to drive the two sets of rotary drive devices and the two sets of rotary support units to move closer or further apart from each other.

6. The wafer double-sided brushing mechanism according to claim 1, characterized in that, The bottom of the protective cover has an elongated hole through which the rotating support unit passes. A first waterproof plate is provided around the upper periphery of the elongated hole. A second waterproof plate is covered on the outside of the first waterproof plate. A waterproof sleeve is fitted onto the rotating support unit on the upper outside of the second waterproof plate.

7. The wafer double-sided brushing mechanism according to claim 1, characterized in that, The protective cover includes a cover body disposed on the base plate and a cover that matches and covers the cover body. An entrance / exit corresponding to the output end of the top of the support device is opened at the junction of the cover and the cover body. A door drive cylinder is disposed outside the protective cover. The output end of the door drive cylinder is connected to a door panel for blocking or exposing the entrance / exit.

8. The wafer double-sided brushing mechanism according to claim 1, characterized in that, The protective cover has an exhaust pipe on its side wall that connects to its interior, and a drain pipe at the bottom of the protective cover that connects to its interior.

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