Glass processing equipment

By laying buffers on the glass processing platform and utilizing movable devices and a flipping mechanism, the problem of low yield of finished glass caused by friction between glass and processing equipment was solved, achieving efficient glass processing and protection.

CN223904241UActive Publication Date: 2026-02-13SICHUAN XUHONG OPTOELECTRONICS TECH +1
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Patent Information

Application Number
CN202520181817.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-02-05
Publication Date
2026-02-13
Estimated Expiration
2035-02-05

AI Technical Summary

Technical Problem

Friction between the glass and the processing equipment during processing leads to a low yield of finished glass.

Method used

A buffer with a lower hardness than the glass is laid on the processing platform to reduce friction. The glass and the buffer are moved between the platforms using a movable device, and the glass is processed in combination with a flipping mechanism and an adsorption channel.

Benefits of technology

It effectively reduces friction and scratches between the glass and the processing platform, improves the yield of finished glass, and protects the glass from damage during the transfer process through the buffer.

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Abstract

The utility model provides glass processing equipment which comprises a supporting device, a processing device and a movable device, the supporting device is provided with a first supporting platform and a second supporting platform, the first supporting platform is provided with a first supporting space used for supporting an object with first hardness, and the second supporting platform is provided with a second supporting space used for supporting an object with second hardness. The second hardness is greater than the first hardness; the machining device is provided with a machining platform, the machining platform is provided with a machining space, and the thickness of the machining space is larger than the sum of the thicknesses of the first supporting space and the second supporting space. The movable device comprises a moving mechanism which can move between any two of the first supporting platform, the second supporting platform and the machining platform and can take the supported object of any platform or release the supported object to any platform. The first-hardness object (such as a buffering piece) forms buffering between the second-hardness object (such as glass) and the machining platform, and the friction phenomenon between the glass and the machining platform can be avoided.
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Description

TECHNICAL FIELD

[0001] The present disclosure relates to the technical field of glass production, and particularly relates to a glass processing equipment. BACKGROUND

[0002] After the semi-finished glass is processed through pattern processing, hole processing, cutting, grinding and other processing procedures, the semi-finished glass can form a finished glass.

[0003] In the related art, scratches are prone to occur between the glass and the processing platform of the processing equipment due to friction, thereby resulting in a low yield of the finished glass. CONTENT OF THE UTILITY MODEL

[0004] The present disclosure provides a glass processing equipment, and one of the technical problems to be solved is to avoid friction between the glass and the processing equipment, thereby improving the yield of the finished glass.

[0005] To solve the above technical problem, the present disclosure provides a glass processing equipment, which can include a supporting device, a processing device and a moving device, the supporting device has a first supporting platform and a second supporting platform, the first supporting platform has a first supporting space for supporting a first hardness object, the second supporting platform has a second supporting space for supporting a second hardness object, the second hardness is greater than the first hardness; the processing device has a processing platform, the processing platform has a processing space, the thickness of the processing space is greater than the sum of the thicknesses of the first supporting space and the second supporting space; the moving device includes a moving mechanism, the moving mechanism can move between any two of the first supporting platform, the second supporting platform and the processing platform, and can take or release the supported object of any platform.

[0006] In some embodiments, the space above the upper surface of the processing platform is the processing space, the processing space includes a first thickness space and a second thickness space, the first thickness space and the second thickness space are arranged in layers, and the first thickness space is located below the second thickness space, the first thickness space is used for supporting the first hardness object, and the second thickness space is used for supporting the second hardness object; the moving device further includes a turnover mechanism, the turnover mechanism is arranged adjacent to the processing platform, and the turnover mechanism is used for turning over the supported object of the second thickness space.

[0007] In some embodiments, the thickness of the first thickness space is less than the thickness of the second thickness space.

[0008] In some embodiments, the processing mechanism of the processing device processes the object of the second thickness space.

[0009] In some embodiments, the processing mechanism of the processing device synchronously processes the objects of the second thickness space and the first thickness space.

[0010] In some embodiments, the processing device is further provided with at least one adsorption channel, one end of the adsorption channel is opened and corresponds to the upper surface of the processing platform.

[0011] In some embodiments, the plurality of adsorption channels are evenly distributed in the plurality of openings of the upper surface of the processing platform.

[0012] In some embodiments, the processing device further comprises a limiting part arranged on the upper surface of the processing platform and corresponding to two adjacent boundaries of the processing space, and the thickness of the limiting part is greater than the thickness of the processing space.

[0013] In some embodiments, the hardness of the upper surface of the processing platform meets the consistency condition with the first hardness.

[0014] In some embodiments, the first support platform, the second support platform and the processing platform are in the same horizontal plane.

[0015] Through the above technical solution, the glass processing equipment provided by the present disclosure can reduce the friction scratches caused by the direct contact between the glass and the processing platform by laying one or more layers of buffer members with smaller hardness than the glass on the processing platform before placing the glass to be processed on the processing platform, thereby avoiding the problem of low yield of finished glass caused by friction between the glass and the processing platform.

[0016] The above description is only a summary of the technical solutions of the present disclosure, in order to more clearly understand the technical means of the present disclosure, and the contents of the description can be implemented, the following will be described in detail with the preferred embodiments of the present disclosure and the accompanying drawings. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the present disclosure or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description, obviously, the drawings in the following description are only some embodiments of the present disclosure, and those skilled in the art can obtain other drawings according to these drawings without creating any creative labor.

[0018] Figure 1 Partial structure schematic diagram of the glass processing equipment (with first hardness object and second hardness object) provided by the present disclosure;

[0019] Figure 2 Structure schematic diagram of the glass processing equipment provided by the present disclosure Figure 1 ;

[0020] Figure 3 Structure schematic diagram of the glass processing equipment provided by the present disclosure Figure 2 .

[0021] Explanation of reference signs:

[0022] 1, support device; 11, first support platform; 111, first support space; 12, second support platform; 121, second support space; 2, processing device; 21, processing platform; 211, processing space; 2111, first thickness space; 2112, second thickness space; 22, suction channel; 221, opening; 3, moving device; 31, overturning mechanism; 311, connecting arm; 312, rotating shaft; 313, overturning part; 4, first hardness object; 5, second hardness object. DETAILED DESCRIPTION

[0023] The embodiments of the present disclosure will be described in further detail below with reference to the drawings and examples. The following detailed description and drawings are provided to illustrate the principles of the present disclosure by way of example only, and should not be used to limit the scope of the present disclosure, which can be realized in many different forms, not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

[0024] The present disclosure provides these embodiments in order to make the present disclosure thorough and complete, and to fully convey the scope of the present disclosure to those skilled in the art. It should be noted that: unless otherwise specified, the relative arrangement of components and steps, the composition of materials, numerical expressions and values set forth in these embodiments should be interpreted as merely exemplary, and not as a limitation.

[0025] It should be noted that, in the description of the present disclosure, unless otherwise specified, the meaning of "a plurality of" is greater than or equal to two; the orientation or positional relationship indicated by the terms "upper", "lower", "left", "right", "inner", "outer" and the like is only for the purpose of facilitating the description of the present disclosure and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation to the present disclosure. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0026] In addition, "first", "second", and similar words used in the present disclosure do not indicate any order, number, or importance, but are only used to distinguish different parts. "Vertical" is not strictly vertical, but within the allowable range of error. "Parallel" is not strictly parallel, but within the allowable range of error. "Include" or "contain" and similar words mean that the elements before the word cover the elements listed after the word, and do not exclude the possibility of also covering other elements.

[0027] It should be noted that in the description of the present disclosure, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood in a broad sense, for example, can be fixedly connected, can be detachably connected, or integrally connected, can be directly connected, or indirectly connected through an intermediate medium. For those skilled in the art, the specific meanings of the above terms in the present disclosure can be understood according to specific circumstances. When it is described that a specific device is located between a first device and a second device, there can be or can not be an intermediate device between the specific device and the first device or the second device.

[0028] All the terms used in the present disclosure have the same meanings as understood by those skilled in the art to which the present disclosure belongs, unless otherwise specifically defined. It should also be understood that the terms defined in general dictionaries should be interpreted to have meanings consistent with their meanings in the context of the relevant art, and should not be interpreted in an idealized or excessively formalized sense, unless otherwise defined explicitly herein.

[0029] The techniques, methods, and devices known to those skilled in the relevant art can not be discussed in detail, but in appropriate cases, the techniques, methods, and devices should be considered as part of the specification.

[0030] The semi-finished glass can form a finished glass after processing procedures such as pattern processing, hole processing, cutting, and polishing.

[0031] In the related art, scratches can occur between the glass and the processing platform of the processing equipment due to friction, thereby resulting in a low yield of the finished glass.

[0032] In view of this, the present disclosure provides a glass processing equipment, which can reduce the friction scratches caused by the direct contact between the glass and the processing platform by laying one or more layers of buffer members with smaller hardness than the glass on the processing platform before placing the glass to be processed on the processing platform, thereby avoiding the problem of low yield of the finished glass caused by friction between the glass and the processing platform. In addition, after the glass on the buffer member is processed, the glass and the buffer member can be removed together. Thus, after multiple glass processing is completed, multiple glasses are stacked together, and there is a buffer member between the two adjacent glasses above and below, so as to reduce the operation time and operation procedure of setting the buffer member between the two adjacent glasses above and below again.

[0033] The present disclosure provides a glass processing equipment, which is described with reference to Figures 1 to 3As shown, it can include: a support device 1, a processing device 2 and a moving device 3, the support device 1 has a first support platform 11 and a second support platform 12, the first support platform 11 has a first support space 111 for supporting a first hardness object 4, the second support platform 12 has a second support space 121 for supporting a second hardness object 5, the second hardness is greater than the first hardness; the processing device 2 has a processing platform 21, the processing platform 21 has a processing space 211, the thickness of the processing space 211 is greater than the sum of the thicknesses of the first support space 111 and the second support space 121; the moving device 3 includes: a moving mechanism (not shown in the figure), which can move between any two of the first support platform 11, the second support platform 12 and the processing platform 21, and can take or release the supported objects of any platform.

[0034] The support device 1 is used at least for supporting the first hardness object 4 and the second hardness object 5; the first support platform 11 can have a first support surface extending in a first horizontal plane, and the space above the first support surface is the first support space 111 to support the first hardness object 4, and the first support space 111 can be multiple and stacked in sequence from the first support surface upwards, and one first support space 111 can support one first hardness object 4; the second support platform 12 can have a second support surface extending in a second horizontal plane, and the space above the second support surface is the second support space 121 to support the second hardness object 5, and the second support space 121 can be multiple and stacked in sequence from the second support surface upwards, and one first support space 111 can support one second hardness object 5. The hardness of the first hardness object 4 is less than the hardness of the second hardness object 5, for example: the first hardness object 4 is a cushioning paper, a cushioning sponge, a cushioning non-woven fabric, etc., and the second hardness object 5 is a glass to be processed, a wood board to be processed, etc., and hereinafter, the first hardness object 4 is taken as paper and the second hardness object 5 is taken as glass to be processed.

[0035] The processing device 2 includes a processing platform 21, which can have a processing plane extending in a third plane, and the space above the processing plane can form a processing space 211, which can place the cushioning paper and the glass to be processed. The thickness of the processing space 211 is greater than the sum of the thicknesses of the first support space 111 and the second support space 121, so as to support the placement of the cushioning paper and the glass to be processed at the same time. The processing of the glass by the processing device 2 can be to process a through hole, or to process a concave-convex pattern on one side surface of the glass, or other processing effects.

[0036] The moving mechanism can take the object on any one of the first supporting platform 11, the second supporting platform 12 and the processing platform 21, and can release the object on any one of the first supporting platform 11, the second supporting platform 12 and the processing platform 21.

[0037] In an example, referring to Figures 1 to 3 As shown in the figure, the glass processing equipment can include a supporting device 1, a processing device 2 and a moving device 3. The supporting device 1 has a first supporting platform 11 and a second supporting platform 12. The first supporting platform 11 has a first supporting space 111 for supporting a first hardness object 4, and the first hardness object 4 is a buffering paper. The second supporting platform 12 has a second supporting space 121 for supporting a second hardness object 5, and the second hardness object 5 is a glass to be processed. The hardness of the glass is greater than the hardness of the buffering paper. The processing device 2 has a processing platform 21, and the processing platform 21 has a processing space 211. The thickness of the processing space 211 is greater than the sum of the thicknesses of the first supporting space 111 and the second supporting space 121, so as to support the buffering paper and the glass to be processed at the same time. The moving device 3 includes a moving mechanism. The moving mechanism can move between any two of the first supporting platform 11, the second supporting platform 12 and the processing platform 21, and can take the supported object on any one of the first supporting platform 11, the second supporting platform 12 and the processing platform 21 or release the supported object to any one of the first supporting platform 11, the second supporting platform 12 and the processing platform 21. An operation method of the glass processing equipment is as follows.

[0038] S101: The moving mechanism moves the buffering paper in the first supporting space 111 to the processing platform 21.

[0039] S102: The moving mechanism moves the glass to be processed in the second supporting space 121 to the buffering paper on the processing platform 21.

[0040] S103: The processing mechanism of the processing device 2 processes the glass to be processed on the processing platform 21.

[0041] S104: The moving mechanism moves the processed glass and the buffering paper together to a transfer platform, so as to pack the processed glass and the buffering paper together.

[0042] In the embodiment, the glass processing device can include a supporting device 1, a processing device 2 and a moving device 3. The supporting device 1 can support the buffer and the glass to be processed. The moving device 3 can move the buffer and the glass to be processed on the supporting device 1 to the processing platform 21 of the processing device 2 in sequence. Then, the processing device 2 can process the glass at least. During the processing, the buffer can avoid the friction between the glass and the processing platform 21, thereby improving the processing yield of the glass. In addition, the glass processed and the buffer between the processing platform 21 and the glass can be moved to other platforms as a whole to continuously protect the glass by the buffer.

[0043] In some embodiments, referring to Figures 1 to 3 As shown, the space above the upper surface of the processing platform 21 is a processing space 211. The processing space 211 includes a first thickness space 2111 and a second thickness space 2112. The first thickness space 2111 and the second thickness space 2112 are arranged in a stack, and the first thickness space 2111 is located below the second thickness space 2112. The first thickness space 2111 is used to support the first hardness object 4, and the second thickness space 2112 is used to support the second hardness object 5. The moving device 3 further includes a turnover mechanism 31. The turnover mechanism 31 is arranged adjacent to the processing platform 21, and is used to turn over the supported object in the second thickness space 2112.

[0044] In this way, the processing platform 21 can support the buffer paper and the glass to be processed in sequence. After the first surface of the glass to be processed away from the paper is processed, the turnover mechanism 31 can be used to turn over the glass to be processed to continue processing the second surface of the glass to be processed away from the first surface, so as to realize the purpose of processing the two opposite surfaces of the glass in sequence.

[0045] The turnover mechanism 31 can include a mechanical hand. The mechanical hand can hold the glass on the processing platform 21, first lift it, then turn it over and lower it to release it on the processing platform 21. The structure of the mechanical hand is mature in manufacturing process. It can not only be mass-produced, but also be stable during turnover, so as to reduce the probability of glass breakage caused by falling glass during turnover. Alternatively, referring to Figure 2 and Figure 3As shown, the overturning mechanism 31 can include a connecting arm 311, a rotating shaft 312 and an overturning part 313. The connecting arm 311 can be lifted and lowered. The rotating shaft 312 is rotationally connected to the connecting arm 311 and connected to the overturning part 313. In the overturning operation, the connecting arm 311 is lowered, the overturning part 313 is attached to and adsorbed on the glass on the processing platform 21, the connecting arm 311 is raised, the overturning part 313 overturns the glass in the process of rotating the rotating shaft 312 relative to the connecting arm 311, the connecting arm 311 is lowered, and the overturning part 313 releases the glass. Of course, the overturning mechanism 31 can be other settings, which are not limited here.

[0046] In some embodiments, the first thickness space 2111 has a smaller thickness than the second thickness space 2112. That is, the first hardness object 4 has a smaller thickness than the second hardness object 5. In this way, the use of the buffer can be reduced while supporting the protection of the glass processing process, thereby reducing costs and reducing the occupation of the space by the buffer.

[0047] For example, after the glass is processed, the processed glass and the buffer between the glass and the processing platform 21 are transferred to other platforms together. The thickness of the buffer is small, so as to reduce the occupation of the space in the thickness dimension of the other platform.

[0048] In some embodiments, the processing mechanism of the processing device 2 processes the object in the second thickness space 2112. In other words, the processing device 2 processes the glass on the processing platform 21 to complete the processing of the glass to be processed into finished glass. The processing can be processing the first surface of the glass away from the processing platform 21, processing the side surface of the glass, or processing the second surface of the glass after overturning the glass.

[0049] In some embodiments, the processing mechanism of the processing device 2 synchronously processes the objects in the second thickness space 2112 and the first thickness space 2111. In other words, the processing device 2 synchronously processes the glass and the buffer on the processing platform 21. For example, a plurality of through holes are synchronously processed in the glass and the buffer. The glass with the through hole can allow a screw to pass through the through hole to be screwed on a wall surface or the like. For another example, the peripheral surface of the glass and the buffer is synchronously cut.

[0050] In some embodiments, referring to Figure 2 and Figure 3 As shown, the processing device 2 is further provided with at least one adsorption channel 22. One end opening 221 of the adsorption channel 22 corresponds to the upper surface of the processing platform 21.

[0051] Alternatively, when the first hardness object 4 is placed on the processing platform 21, a vacuum can be drawn through the adsorption channel 22 to more firmly adsorb the first hardness object 4 onto the processing platform 21. After processing the second hardness object 5 on the first hardness object 4, gas can be released through the adsorption channel 22 so that the first hardness object 4 can be removed directly after the second hardness object 5 is removed, or the second hardness object 5 and the first hardness object 4 can be removed simultaneously. The adsorption channel 22 not only enables the adsorption of buffer components during glass processing, but also provides a convenient and quick vacuuming method.

[0052] In some embodiments, see Figure 2 and Figure 3 As shown, multiple adsorption channels 22 are evenly distributed on the upper surface of the processing platform 21 with multiple openings 221. The evenly distributed openings 221 can simultaneously draw vacuum to different positions of the first hardness object 4 and simultaneously release the first hardness object 4, so that the first hardness object 4 can be placed more stably on the processing platform 21.

[0053] In some embodiments, the processing apparatus 2 further includes a limiting portion (not shown in the figure), disposed on the upper surface of the processing platform 21 and corresponding to two adjacent boundaries of the processing space 211, wherein the thickness of the limiting portion is greater than the thickness of the processing space 211. Thus, during the process of placing the first hardness object 4 and the second hardness object 5 on the processing platform 21, the two adjacent sides of the first hardness object 4 and the two adjacent sides of the second hardness object 5 can abut against the limiting portion, thereby limiting the position of the first hardness object 4 and the second hardness object 5 on the processing platform 21, thereby improving processing efficiency.

[0054] In one example, the limiting part has a first limiting surface and a second limiting surface that are perpendicular to each other. During the stacking of a rectangular first hardness object 4 and a rectangular second hardness object 5 on the processing platform 21, two adjacent sides of the first hardness object 4 can abut against the first and second limiting surfaces, and then two adjacent sides of the second hardness object 5 can abut against the first and second limiting surfaces, thereby processing the second hardness object 5. Due to the limiting effect of the first and second limiting surfaces, the first hardness object 4 and the second hardness object 5 can be quickly positioned on the processing platform 21, and the probability of the first hardness object 4 shifting is reduced when the adsorption channel 22 is under vacuum.

[0055] In some embodiments, the hardness of the upper surface of the processing platform 21 meets the condition of consistency with the first hardness. Alternatively, the hardness of the upper surface of the processing platform 21 tends to be consistent with the hardness of the object 4 with the first hardness. This consistency can include: complete consistency, or incomplete consistency but with a very small difference, so as to reduce the probability of friction between the processing platform 21 and the object 4 with the first hardness causing scratches. The material of the upper surface of the processing platform 21 may be the same as or different from the material of the object 4 with the first hardness.

[0056] In some embodiments, see Figure 2 and Figure 3 As shown, the first support platform 11, the second support platform 12, and the processing platform 21 are on the same horizontal plane. In this way, the first hardness object 4 can be moved from the first support platform 11 to the processing platform 21, and the second hardness object 5 can be moved from the second support platform 12 to the processing platform 21 by the moving mechanism. The transfer process can be realized without a lifting process, which can shorten the time required for movement and simplify the moving device 3.

[0057] The embodiments of this disclosure have now been described in detail. To avoid obscuring the concept of this disclosure, some details known in the art have not been described. Those skilled in the art can fully understand how to implement the technical solutions disclosed herein based on the above description.

[0058] While specific embodiments of this disclosure have been described in detail by way of examples, those skilled in the art should understand that the examples are for illustrative purposes only and not intended to limit the scope of this disclosure. Those skilled in the art should understand that modifications can be made to the above embodiments or equivalent substitutions can be made to some technical features without departing from the scope and spirit of this disclosure. In particular, as long as there is no structural conflict, the technical features mentioned in the various embodiments can be combined in any manner.

Claims

1. A glass processing apparatus characterized by, The device comprises: a supporting device (1) having a first supporting platform (11) and a second supporting platform (12), the first supporting platform (11) having a first supporting space (111) for supporting a first hardness object (4), the second supporting platform (12) having a second supporting space (121) for supporting a second hardness object (5), the second hardness being greater than the first hardness; a processing device (2) having a processing platform (21) with a processing space (211), the thickness of the processing space (211) being greater than the sum of the thicknesses of the first supporting space (111) and the second supporting space (121); a moving device (3) comprising a moving mechanism capable of moving between any two of the first supporting platform (11), the second supporting platform (12) and the processing platform (21), and capable of picking up or releasing the supported objects on any platform.

2. The glass processing device according to claim 1, wherein the space above the upper surface of the processing platform (21) is the processing space (211), the processing space (211) comprising a first thickness space (2111) and a second thickness space (2112), the first thickness space (2111) and the second thickness space (2112) being arranged in layers, and the first thickness space (2111) being below the second thickness space (2112), the first thickness space (2111) being used for supporting the first hardness object (4), and the second thickness space (2112) being used for supporting the second hardness object (5); the moving device (3) further comprises a turnover mechanism (31) arranged adjacent to the processing platform (21), and the turnover mechanism (31) is used for turning over the supported object in the second thickness space (2112).

3. The glass processing device according to claim 2, wherein the thickness of the first thickness space (2111) is less than the thickness of the second thickness space (2112).

4. The glass processing device according to claim 2, wherein the processing mechanism of the processing device (2) processes the object in the second thickness space (2112).

5. The glass processing device according to claim 2, wherein the processing mechanism of the processing device (2) synchronously processes the objects in the second thickness space (2112) and the first thickness space (2111).

6. The glass processing device according to any one of claims 2 to 5, wherein the processing device (2) is further provided with at least one suction channel (22), one end of the suction channel (22) having an opening (221) corresponding to the upper surface of the processing platform (21).

7. The glass processing device according to claim 6, wherein a plurality of the suction channels (22) are uniformly distributed at a plurality of openings (221) on the upper surface of the processing platform (21).

8. The glass processing apparatus according to claim 6, wherein the processing device (2) further comprises a limiting portion disposed on the upper surface of the processing platform (21) and corresponding to two adjacent boundaries of the processing space (211), and the thickness of the limiting portion is greater than the thickness of the processing space (211).

9. The glass processing apparatus according to any one of claims 2 to 5, wherein the upper surface of the processing platform (21) has a hardness that meets a consistency condition with the first hardness.

10. The glass processing apparatus according to claim 1, wherein the first support platform (11), the second support platform (12), and the processing platform (21) are on the same horizontal plane. ​ ​ ​