Vapor deposition equipment

Abstract

The utility model discloses vapor deposition equipment which comprises a reaction system, a flow control mechanism is arranged on the reaction system, the flow control mechanism comprises a control sleeve, a movable bin, a control block, a through hole, a rotating sleeve, a matching sleeve, a screw rod and a push sleeve, the control sleeve is installed at the inlet end of a counteracting system, a movable groove is formed in the control sleeve, and the through hole is formed in the control sleeve. The control blocks are slidably arranged in the movable bin, the through holes are distributed in the control blocks, the rotating sleeve is rotatably installed at the top end of the control sleeve, the matching sleeve is installed on the inner side of the rotating sleeve, the screw rod is in threaded connection in the matching sleeve, and the push sleeve is installed at the top end of the screw rod, so that stable gas supply is achieved; through precise matching of the rotating sleeve, the matching sleeve and the screw rod, precise lifting control over the push sleeve is achieved, the inclined plane design of the push sleeve is in sliding fit with the control block, so that the control block can stably move in the movable bin, and precise adjustment of the gas flow is achieved through the opening and closing degree of the through hole in the control block.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor manufacturing and new material research and development, more specifically, it relates to a kind of vapor deposition equipment. BACKGROUND

[0002] In the field of semiconductor manufacturing and new material research and development, as a key preparation method, the precise control of process parameters of vapor deposition process directly affects the quality and performance of product, at present, most vapor deposition equipment adopts traditional gas delivery mode, this mode has the problem that gas flow rate is difficult to accurately adjust, in actual production, different deposition materials and process requirements need different gas flow rate, and existing equipment can only provide rough flow adjustment, cannot accurately control according to actual demand, this not only affects the uniformity and density of deposition layer, but also may lead to raw material waste and unstable product quality;

[0003] With the continuous improvement of microelectronic technology and new functional materials on the quality of thin film, the limitations of traditional vapor deposition equipment are increasingly highlighted, in the deposition process of existing equipment, due to lack of accurate air flow regulating device, operator cannot effectively adjust parameters according to special requirements of different process stages, this condition not only reduces production efficiency, but also increases product defect rate and raw material loss, especially for some special materials sensitive to air flow, if gas flow rate cannot be accurately controlled, it is easy to cause uneven deposition, poor crystalline quality and other problems, directly affect the performance index and yield of product. CONTENT OF UTILITY MODEL

[0004] (I) technical problem solved

[0005] In view of the problems in the prior art, the utility model provides a kind of vapor deposition equipment to solve the technical problem that existing equipment can only provide rough flow adjustment, cannot accurately control according to actual demand in the background art, this not only affects the uniformity and density of deposition layer.

[0006] (II) technical scheme

[0007] To achieve the above objectives, this utility model provides the following technical solution: a vapor deposition apparatus, comprising a reaction system, wherein a flow control mechanism is provided on the reaction system, the flow control mechanism comprising a control sleeve, a movable chamber, a control block, a through hole, a rotating sleeve, a mating sleeve, a screw, and a push sleeve, the control sleeve being installed at the inlet of the reaction system, the movable chamber being disposed within the control sleeve, multiple sets of control blocks being provided sliding within the movable chamber, multiple sets of through holes being provided distributed on multiple sets of control blocks, the rotating sleeve being rotatably installed at the top of the control sleeve, the mating sleeve being installed inside the rotating sleeve, the screw being threadedly connected within the mating sleeve, and the push sleeve being installed at the top of the screw, the top of the rotating sleeve being rotatably connected to a connecting pipe, the top of the connecting pipe being connected to a corrugated pipe, the corrugated pipe being connected to an external gas delivery system.

[0008] The present invention is further configured such that a limiting block is installed inside the control sleeve, and multiple sets of the limiting block are provided. Each set of the control block has a limiting groove, and the multiple sets of the control block are slidably connected to the limiting block through the limiting groove. This design achieves precise guidance of the movement trajectory of the control block through the cooperation of the limiting block and the limiting groove, preventing the control block from deviating during movement and ensuring the accuracy of airflow regulation.

[0009] The present invention is further configured such that a tension spring is connected between each of the multiple sets of limiting blocks and the control sleeve. The tension spring provides elastic support to the limiting blocks, enabling the limiting blocks to maintain appropriate pressure when the control blocks move, while ensuring that the control blocks can return to their original positions smoothly.

[0010] The present invention is further configured such that the inner side of each of the multiple sets of control sleeves is provided with an inclined surface that abuts against the push sleeve. The design of the inclined surface enables the push sleeve to convert axial motion into radial force when it moves up and down, thereby achieving precise pushing of the control block and improving the sensitivity of airflow regulation.

[0011] The present invention is further configured such that a sliding groove is provided on the inner side of the control sleeve, and multiple sets of sliding grooves are provided; a slider is provided on the outer side of the push sleeve, and multiple sets of sliders are provided and are slidably connected to multiple sets of sliding grooves respectively. The cooperative design of the sliding groove and the slider ensures the stability of the push sleeve during the movement process, prevents the push sleeve from deflecting, and ensures the accuracy of airflow regulation.

[0012] The present invention is further configured such that a positioning mechanism is provided on the connecting pipe, the positioning mechanism including a positioning block, a positioning groove, a limiting sleeve and a push spring. The positioning block is provided with multiple sets that slide on the rotating sleeve, the positioning groove is provided with multiple sets that are distributed on the outer wall of the connecting pipe, the limiting sleeve slides on the outside of the connecting pipe, and the two ends of the push spring are respectively connected to the limiting sleeve and the connecting pipe. This multi-positioning structure realizes the precise locking of the position of the rotating sleeve, and the setting of the push spring ensures the reliable reset of the positioning mechanism.

[0013] The present invention is further provided that a reset spring is connected between the inner side of the multiple sets of positioning blocks and the outer wall of the rotating sleeve. The reset spring enables the positioning blocks to automatically retract after the limit is released, which facilitates the adjustment of the rotating sleeve and ensures the flexibility of the positioning operation.

[0014] The present invention is further configured such that the outer wall of the connecting pipe is provided with a guide strip, and the guide strip is provided with multiple sets of distance limiting sleeves for sliding connection. The design of the guide strip provides a stable movement trajectory for the limiting sleeves, prevents the limiting sleeves from deviating during sliding, and ensures the reliability of the positioning mechanism.

[0015] (III) Beneficial Effects

[0016] Compared with the prior art, the present invention provides a vapor deposition apparatus with the following advantages:

[0017] 1. The flow control mechanism is connected to the external gas delivery system through a bellows, which realizes a stable gas supply. After the gas enters the control sleeve through the connecting pipe, the precise lifting and lowering control of the push sleeve is realized through the precise cooperation of the rotating sleeve, the mating sleeve and the screw. The inclined surface design of the push sleeve and the sliding cooperation of the control block enable the control block to move smoothly in the movable chamber. The gas flow rate is precisely adjusted by the degree of opening and closing of the through hole on the control block.

[0018] 2. The sliding connection between the limit block and the limit groove ensures the accuracy of the control block's movement trajectory, while the tension spring provides a reliable reset guarantee for the control block. This multi-control mechanism not only solves the problem of rough airflow regulation in traditional equipment, but also achieves precise control of gas flow, greatly improving the accuracy and controllability of the vapor deposition process.

[0019] 3. The positioning mechanism adopts an innovative multi-positioning design. Through the cooperation of the positioning block and the positioning groove, the position of the rotating sleeve is precisely locked, restricting the sleeve from sliding under the guidance of the guide strip. With the elastic action of the push spring, the positioning process is ensured to be smooth and controllable. The reset spring provides a reliable reset function for the positioning block, enabling the positioning block to accurately engage with the positioning groove. This positioning mechanism design not only solves the problem of unstable fixed position in traditional equipment, but also provides a convenient adjustment method. Operators can adjust the position at any time according to actual needs, while ensuring the stability of the adjusted position, which significantly improves the ease of operation and reliability of the equipment. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of a vapor deposition device according to the present invention;

[0021] Figure 2 This is a schematic diagram of the outer structure of the flow control mechanism in this utility model;

[0022] Figure 3 This is a cross-sectional view of the flow control mechanism in this utility model.

[0023] Figure 4 This is a cross-sectional view of the limiting sleeve in this utility model;

[0024] Figure 5 This is a cross-sectional view of the control sleeve in this utility model.

[0025] In the diagram: 1. Reaction system; 2. Control sleeve; 3. Movable chamber; 4. Control block; 5. Through hole; 6. Rotating sleeve; 7. Mating sleeve; 8. Screw; 9. Push sleeve; 10. Connecting pipe; 11. Bellows; 12. Limiting block; 13. Limiting groove; 14. Tension spring; 15. Slide groove; 16. Slider; 17. Positioning block; 18. Positioning groove; 19. Limiting sleeve; 20. Push spring; 21. Return spring; 22. Guide bar. Detailed Implementation

[0026] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0027] It should be noted that, unless otherwise specified, all technical and scientific terms used in this application have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains.

[0028] In this utility model, unless otherwise stated, the orientations used, such as "up" and "down", usually refer to the direction shown in the accompanying drawings, or to the vertical, perpendicular, or gravitational direction; similarly, for ease of understanding and description, "left" and "right" usually refer to the left and right shown in the accompanying drawings; "inner" and "outer" refer to the inner and outer contours of each component itself, but the above directional terms are not used to limit this utility model.

[0029] Please see Figures 1-5 A vapor deposition apparatus includes a reaction system 1. The reaction system 1 is equipped with a flow control mechanism, which includes a control sleeve 2, a movable chamber 3, a control block 4, a through hole 5, a rotating sleeve 6, a mating sleeve 7, a screw 8, and a push sleeve 9. The control sleeve 2 is installed at the inlet of the reaction system. The movable chamber is located inside the control sleeve 2. Multiple sets of control blocks 4 slide within the movable chamber 3. Multiple sets of through holes 5 are distributed on multiple sets of control blocks 4. The rotating sleeve 6 is rotatably installed at the top of the control sleeve 2. The mating sleeve 7 is installed inside the rotating sleeve 6. The screw 8 is threadedly connected to the mating sleeve 7. The push sleeve 9 is installed at the top of the screw 8. A connecting pipe 10 is rotatably connected to the top of the rotating sleeve 6. A corrugated pipe 11 is connected to the top of the connecting pipe 10 and is connected to an external gas delivery system.

[0030] The control sleeve 2 is equipped with a limit block 12. There are multiple sets of limit blocks 12. Each set of control blocks 4 has a limit groove 13. The multiple sets of control blocks 4 are slidably connected to the limit blocks 12 through the limit groove 13. Through the sliding cooperation between the limit blocks 12 and the limit groove 13, the movement of the control blocks 4 is precisely guided. The limit blocks 12 provide a stable guiding effect when the control blocks 4 move, ensuring that the control blocks 4 always stay on the predetermined movement trajectory.

[0031] Multiple sets of limit blocks 12 are connected to the control sleeve 2 by tension springs 14. The tension springs 14 provide continuous elastic support for the limit blocks 12, so that the limit blocks 12 can always maintain appropriate contact pressure with the control block 4. At the same time, they provide a buffer when the control block 4 moves to prevent jamming during the movement.

[0032] Multiple control sleeves 2 have inclined surfaces on their inner sides that abut against the push sleeve 9. The inclined surface design allows the vertical movement of the push sleeve 9 to be converted into the horizontal thrust of the control block 4. When the push sleeve 9 moves up and down, the control block 4 produces a precise radial displacement through the guiding effect of the inclined surface.

[0033] The inner side of the control sleeve 2 is provided with a sliding groove 15, and multiple sets of sliding grooves 15 are provided. The outer side of the push sleeve 9 is provided with a slider 16, and multiple sets of sliders 16 are provided and are slidably connected to multiple sets of sliding grooves 15 respectively. The cooperation design of the sliding grooves 15 and sliders 16 provides a stable motion trajectory for the push sleeve 9, preventing the push sleeve 9 from rotating or deviating during the movement.

[0034] In this embodiment, the external gas delivery system supplies gas to the reaction system 1 through the bellows 11 and the connecting pipe 10. The gas first enters the control sleeve 2. When the airflow needs to be adjusted, the rotating sleeve 6 is rotated, which drives the screw 8 to rotate through the connection with the mating sleeve 7. The rotation of the screw 8 drives the push sleeve 9 to move up and down through the threaded connection. The inclined surface of the push sleeve 9 contacts the control block 4, causing multiple sets of control blocks 4 to slide in the movable chamber 3. The through hole 5 on the control block 4 precisely controls the gas flow rate by the degree of opening and closing. The cooperation of the limiting block 12 and the limiting groove 13 ensures the accuracy of the movement of the control block 4. The controlled gas is deposited through the reaction system 1.

[0035] Please see Figure 4 As one implementation of the positioning mechanism: a positioning mechanism is provided on the connecting pipe 10. The positioning mechanism includes a positioning block 17, a positioning groove 18, a limiting sleeve 19 and a push spring 20. The positioning block 17 is provided with multiple sets that slide on the rotating sleeve 6. The positioning groove 18 is provided with multiple sets that are distributed on the outer wall of the connecting pipe 10. The limiting sleeve 19 slides on the outside of the connecting pipe 10. The two ends of the push spring 20 are respectively connected to the limiting sleeve 19 and the connecting pipe 10.

[0036] Each of the multiple positioning blocks 17 has a return spring 21 connected between its inner side and the outer wall of the rotating sleeve 6. The return spring 21 provides a return force to the positioning block 17, so that the positioning block 17 can automatically retract after leaving the positioning state, which facilitates the rotation adjustment of the rotating sleeve 6.

[0037] The outer wall of the connecting pipe 10 is provided with a guide bar 22. The guide bar 22 is provided with multiple sets of sliding connections to the limiting sleeve 19. The guide bar 22 provides an accurate sliding track for the limiting sleeve 19, ensuring that the limiting sleeve 19 maintains a stable direction of movement during movement and preventing shaking or deviation.

[0038] More specifically, when adjustment is required, the limiting sleeve 19 is pushed to slide along the guide bar 22 and press against the push spring 20. The limiting sleeve 19 releases its contact with the multiple sets of positioning blocks 17. The multiple sets of reset springs 21 push the multiple sets of positioning blocks 17 outward to slide away from the positioning groove 18, releasing the positioning of the rotating sleeve 6. Subsequently, after the adjustment is completed, the pushing of the limiting sleeve 19 is released. The push spring 20 pushes the limiting sleeve 19 to slide along the guide bar 22. The limiting sleeve 19 abuts against the top of the multiple sets of positioning blocks 17 and pushes. The bottom of the multiple sets of positioning blocks 17 is engaged in the positioning groove 18, restricting the rotating sleeve 6 and completing the positioning and fixing.

[0039] In summary, during the use or operation of the overall equipment: the external gas delivery system supplies gas to the reaction system 1 through the bellows 11 and connecting pipe 10. The gas first enters the control sleeve 2. When the airflow needs to be adjusted, the rotating sleeve 6 is rotated, which drives the screw 8 to rotate through the connection with the mating sleeve 7. The rotation of the screw 8 drives the push sleeve 9 to move up and down through the threaded connection. The inclined surface of the push sleeve 9 contacts the control block 4, causing multiple sets of control blocks 4 to slide in the movable chamber 3. The through holes 5 on the control block 4 precisely control the gas flow rate by the degree of opening and closing. The cooperation of the limiting block 12 and the limiting groove 13 ensures the accuracy of the movement of the control block 4. The controlled gas undergoes deposition treatment through the reaction system 1.

[0040] When adjustment is required, push the limiting sleeve 19 to slide along the guide bar 22 and squeeze the push spring 20. The limiting sleeve 19 releases its contact with the multiple sets of positioning blocks 17. The multiple sets of reset springs 21 push the multiple sets of positioning blocks 17 to slide outward and disengage from the positioning groove 18, releasing the positioning of the rotating sleeve 6. Subsequently, after the adjustment is completed, release the push on the limiting sleeve 19. The push spring 20 pushes the limiting sleeve 19 to slide along the guide bar 22. The limiting sleeve 19 abuts against the top of the multiple sets of positioning blocks 17 and pushes it. The bottom of the multiple sets of positioning blocks 17 is engaged in the positioning groove 18, restricting the rotating sleeve 6 and completing the positioning and fixing.

[0041] Of all the solutions mentioned above, those involving the connection between two components can be selected according to the actual situation, such as welding, bolt and nut connection, bolt or screw connection, or other known connection methods, which will not be elaborated here. For all the fixed connections mentioned above, welding is preferred. Although embodiments of this utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this utility model. The scope of this utility model is defined by the appended claims and their equivalents.

Claims

1. A vapour deposition apparatus comprising a reaction system (1), characterised by: The reaction system (1) is provided with a flow control mechanism, the flow control mechanism comprises a control sleeve (2), a movable bin (3), a control block (4), a through hole (5), a rotating sleeve (6), a matching sleeve (7), a screw rod (8) and a push sleeve (9), the control sleeve (2) is installed at the inlet end of the reaction system, the movable bin (3) is arranged in the control sleeve (2), the control block (4) is arranged in the movable bin (3), the through hole (5) is arranged on the control block (4), the rotating sleeve (6) is rotatably installed at the top end of the control sleeve (2), the matching sleeve (7) is installed on the inner side of the rotating sleeve (6), the screw rod (8) is threadedly connected in the matching sleeve (7), the push sleeve (9) is installed at the top end of the screw rod (8), the top end of the rotating sleeve (6) is rotatably connected with a connecting pipe (10), the top end of the connecting pipe (10) is connected with a bellows (11), and the bellows (11) is connected with an external gas conveying system.

2. A vapour deposition apparatus as claimed in claim 1, characterised in that: The control sleeve (2) is provided with a limiting block (12), the limiting block (12) is provided with a plurality of groups, the control block (4) is provided with a plurality of groups, the limiting groove (13) is arranged on the control block (4), and the limiting block (12) is slidably connected with the limiting groove (13).

3. A vapour deposition apparatus as claimed in claim 2, characterised in that the plurality of groups of sources are arranged in a plurality of groups of groups of sources. The limiting block (12) and the control sleeve (2) are connected with a tension spring (14). ​ 4. A vapour deposition apparatus as claimed in claim 3, characterised in that the plurality of groups of The inner side of the control sleeve (2) is provided with a slope and abuts against the push sleeve (9).

5. A vapour deposition apparatus as claimed in claim 4, characterised in that: The inner side of the control sleeve (2) is provided with a plurality of groups of sliding grooves (15), the outer side of the push sleeve (9) is provided with a sliding block (16), and the sliding block (16) is slidably connected with the sliding groove (15).

6. An apparatus as claimed in claim 5, wherein: The connecting pipe (10) is provided with a positioning mechanism, the positioning mechanism comprises a positioning block (17), a positioning groove (18), a limiting sleeve (19) and a push spring (20), the positioning block (17) is provided with a plurality of groups and is slidably arranged on the rotating sleeve (6), the positioning groove (18) is provided with a plurality of groups and is arranged on the outer wall of the connecting pipe (10), the limiting sleeve (19) is slidably arranged on the outer side of the connecting pipe (10), and the push spring (20) is connected with the limiting sleeve (19) and the connecting pipe (10).

7. A vapour deposition apparatus as claimed in claim 6, characterised by: The inner side of the positioning block (17) and the outer wall of the rotating sleeve (6) are connected with a reset spring (21).

8. A vapour deposition apparatus as claimed in claim 7, characterised by: The outer wall of the connecting pipe (10) is provided with a guide strip (22), and the guide strip (22) is provided with a plurality of groups and is slidably connected with the limiting sleeve (19).

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