Gas distribution device and deposition equipment

Abstract

The utility model provides a gas distribution device and deposition equipment, comprising: a housing, the interior of which is hollow and is provided with a first channel, an accommodating space and N second channels, the accommodating space is respectively communicated with the first channel and the N second channels, the first channel is used for connecting with a remote plasma source, and the N second channels are used for connecting with a plasma source; the second channel is used for communicating with the spraying plate or communicating with the spraying plate through an air guide pipeline; the rotary valve body is rotatably arranged in the accommodating space, and the rotary valve body comprises an inlet corresponding to the first channel and N outlets communicated with the inlet; the driving part is in driving connection with the rotary valve body and used for driving the rotary valve body to rotate. The rotary valve body can be switched between the opening position and the closing position under the driving of the driving part, so that the on-off control of clean gas of the N second channels can be realized through one rotary valve body, the structure of the whole gas distribution device is simplified, and the manufacturing cost of the device is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to semiconductor equipment technical field especially, relates to a gas distribution device and deposition equipment. BACKGROUND

[0002] In the deposition process, after the deposition process steps such as deposition are carried out in the process chamber, the process chamber needs to be cleaned to remove the process gas residues that may have been formed on the chamber wall. For example, in the existing atomic layer deposition (ALD), chemical vapor deposition (CVD) or plasma enhanced chemical vapor deposition (PECVD) and other thin film deposition processes, due to the diffusion characteristics of the process gas, not only will the thin film be formed on the wafer surface, but also the deposition will be formed on the surface of the shower plate, the sidewall of the reaction chamber, the bottom of the heating disc, the inside of the exhaust system, etc.

[0003] The commonly used method is to use a remote plasma source (RPS) to clean the chamber. The remote plasma source (RPS) excites the cleaning gas by radio frequency or microwave to generate plasma. The free radicals (activated gas molecules) generated after the cleaning gas is excited can play a cleaning role.

[0004] In the deposition equipment, the remote plasma source is usually connected with the pipeline of the process gas, and the pipeline is also connected with the shower plate. The shower plate is arranged at the top of the process chamber. The cleaning gas is introduced into the pipeline by the remote plasma source to realize the cleaning of the pipeline, the shower plate and the process chamber. In the prior art, a valve is usually arranged on each pipeline to individually control the on-off of the cleaning gas of each pipeline, and the structure is complex.

[0005] Therefore, it is necessary to provide a gas distribution device and deposition equipment to solve the above problems. UTILITY MODEL CONTENT

[0006] The utility model aims at providing a gas distribution device and deposition equipment to improve the problem of the existing structure of a valve arranged on each pipeline.

[0007] The utility model provides a gas distribution device, which comprises:

[0008] The shell is hollow inside and has a first channel, a accommodating space and N second channels. The accommodating space is connected to the first channel and the N second channels respectively. The first channel is used to connect to a remote plasma source, and the second channels are used to connect to a spray plate or to the spray plate through a gas guide pipe. N is a positive integer.

[0009] The rotary valve body is rotatably disposed within the accommodating space. The rotary valve body includes an inlet corresponding to the first channel and N outlets communicating with the inlet. The outlets are arranged one-to-one with the second channel.

[0010] A driving component is connected to the rotary valve body and is used to drive the rotary valve body to rotate.

[0011] The beneficial effects of the gas distribution device provided by this utility model are as follows: by driving the rotary valve body to rotate through the driving component, the rotary valve body can be rotated to the open position to introduce clean gas into N second channels, or the rotary valve body can be rotated to the closed position to stop the introduction of clean gas into N second channels. Thus, the on-off control of clean gas into N second channels can be realized through one rotary valve body, which simplifies the structure of the entire gas distribution device, reduces the manufacturing cost of the device, and makes the on-off control of clean gas simpler.

[0012] In one possible embodiment, a gap is formed between the rotary valve body and the housing.

[0013] Its beneficial effects are as follows: Because there is a gap between the rotary valve body and the housing, no mechanical friction occurs between the rotary valve body and the housing during the rotation of the rotary valve body, thus preventing the generation of particles. When the rotary valve body is in the closed position, purging gas is introduced into the gap through the first channel to fill the gap, preventing leakage of process gas introduced into the second channel.

[0014] In one possible embodiment, at least one end of the rotary valve body is provided with a rotating shaft, the rotating shaft being rotatably mounted on the housing, and a cleaning assembly is provided at the rotating shaft for removing contaminants at the rotating shaft.

[0015] Its beneficial effect is that by setting a cleaning component at the rotating shaft, contaminants at the rotating shaft can be removed, preventing contaminants from entering the gap along the rotating shaft and causing pollution problems.

[0016] In one possible embodiment, the rotating shaft extends out of the housing to form a protrusion, and a sealing cover is provided on the outer wall of the housing corresponding to the protrusion, and the cleaning assembly is disposed inside the sealing cover.

[0017] Its beneficial effect is that the sealing cover isolates the shaft from the external environment, preventing pollutants from the external environment from contaminating the shaft.

[0018] In one possible embodiment, the cleaning assembly includes an air inlet disposed on the housing and surrounding the protrusion, and an exhaust outlet disposed on the side of the air inlet away from the housing and surrounding the protrusion. The air inlet has an air inlet chamber surrounding the protrusion, and the exhaust outlet has an exhaust chamber surrounding the protrusion. The air inlet chamber communicates with the gap and the exhaust chamber, respectively.

[0019] In one possible embodiment, the cleaning assembly further includes an air intake pipe disposed on the air intake member and communicating with the air intake chamber, and an exhaust pipe disposed on the exhaust member and communicating with the exhaust chamber. The air intake pipe is connected to the cleaning gas supply assembly, and the exhaust pipe is connected to the air extraction assembly.

[0020] Its beneficial effects are as follows: the cleaning gas supply assembly introduces cleaning gas into the air intake chamber through the air intake pipe to blow away the contaminants on the rotating shaft. At the same time, the air extraction assembly extracts air, so that the contaminants are drawn away along with the cleaning gas through the exhaust chamber and the exhaust pipe, thus preventing contaminants from entering the gap along the rotating shaft and causing pollution problems.

[0021] In one possible embodiment, the side of the exhaust member away from the intake member is sealed to the protrusion by a seal.

[0022] In one possible embodiment, the protrusion is rotatably mounted on the sealing cover via a bearing.

[0023] Its beneficial effects are: the seal acts as a seal between the exhaust component and the protrusion on the side of the exhaust component away from the intake component, and the bearing makes the rotating shaft rotate more smoothly.

[0024] In one possible embodiment, where the rotary valve body has rotating shafts at both ends, one of the rotating shafts is connected to the drive component; or,

[0025] In the case where one end of the rotary valve body is provided with a rotating shaft, the rotating shaft is connected to the driving component.

[0026] Its beneficial effect is that the rotating shaft is connected to the driving component, and the driving component drives the rotating shaft to rotate, thereby driving the rotary valve body to rotate.

[0027] In one possible embodiment, when N=1, the housing includes an inner tube disposed in the second channel. An external air intake channel and an internal air intake channel are respectively provided on the housing near the rotary valve body. The external air intake channel communicates with the outer space located between the housing and the inner tube, and the internal air intake channel communicates with the inner tube.

[0028] Its beneficial effects are as follows: the second channel and the inner tube form a double-layer pipeline structure, through which different process gases are delivered to the outer tube and the inner tube respectively via the outer air inlet channel and the inner air inlet channel, thus meeting different process requirements. When the rotary valve body is in the open position, clean gas can be introduced into the outer space and the inner tube through the outlet of the rotary valve body.

[0029] In one possible embodiment, the housing further includes a first connecting portion fixedly connected between the housing and the inner tube located at the second channel, and a second connecting portion disposed within the inner tube corresponding to the first connecting portion. The second connecting portion partially obstructs the opening of the inner tube, and the inner air intake channel passes through the housing, the first connecting portion, the inner tube, and the second connecting portion located at the second channel.

[0030] Its beneficial effect is that when the process gas enters the inner air intake channel, it will flow along the path of the inner air intake channel, pass through the shell located at the second channel, the first connecting part, the inner tube and the second connecting part, and enter the internal space of the inner tube, so as to realize the gas flow only to the inner tube.

[0031] In one possible embodiment, when N > 1, a third air intake channel is provided on the housing corresponding to each of the second channels, and the third air intake channel is located close to the rotary valve body and communicates with the second channel.

[0032] Its beneficial effect is that air can be supplied to each of the second channels individually through the third air intake channel of each second channel.

[0033] In one possible embodiment, the housing further includes a third connecting portion disposed within the second channel, the third connecting portion partially obscuring the opening of the second channel, and the third air intake channel passing through the housing located at the second channel and the third connecting portion.

[0034] Its beneficial effect is that when the process gas enters the third intake channel, it will flow along the path of the third intake channel, pass through the housing located at the second channel and the third connecting part, and enter the internal space of the second channel.

[0035] This utility model also provides a deposition device, including: a gas separation device as described in any of the above embodiments. Attached Figure Description

[0036] Figure 1 This is a schematic diagram of the gas distribution device of this utility model when there is only one second channel.

[0037] Figure 2 This is a schematic diagram of the rotary valve body, housing, and cleaning components in the gas distribution device of this utility model.

[0038] Figure 3 This is a schematic diagram of a rotary valve body with one outlet in one embodiment of the gas distribution device of this utility model.

[0039] Figure 4 This is a schematic diagram of the rotary valve body with one outlet in another embodiment of the gas distribution device of this utility model.

[0040] Figure 5 This is a partial cross-sectional view of the gas distribution device of this utility model from one perspective.

[0041] Figure 6 This is a partial cross-sectional view of the gas distribution device of this utility model from another perspective.

[0042] Figure 7 This is a schematic diagram of the gas distribution device of this utility model when there are three channels in the second channel.

[0043] Figure 8 This is a schematic diagram of the rotary valve body with three outlets in the gas distribution device of this utility model.

[0044] Figure 9 This is a partial perspective view of one embodiment of the gas distribution device of this utility model.

[0045] Figure 10 This is a cross-sectional view of the second channel in one embodiment of the gas distribution device of this utility model.

[0046] Explanation of reference numerals in the attached drawings: 100, air distribution device; 110, housing; 111, first channel; 112, second channel; 113, accommodating space; 1131, gap; 1141, inner tube; 1142, first connecting part; 1143, second connecting part; 115, external air intake channel; 116, internal air intake channel; 1161, first part; 1162, second part; 117, third air intake channel; 1171, first air passage section; 1172, second air passage section; 118, third connecting part ; 191, Groove; 120, Rotary valve body; 121, Inlet; 122, Outlet; 123, Rotating shaft; 1231, Protrusion; 1232, Rotating end; 1233, Limiting element; 130, Driving element; 140, Cleaning assembly; 141, Air inlet element; 1411, Air inlet chamber; 142, Exhaust element; 1421, Exhaust chamber; 143, Air inlet pipe; 144, Exhaust pipe; 150, Sealing cover; 160, Sealing element; 170, Bearing; 200, Remote plasma source. Detailed Implementation

[0047] To make the objectives, technical solutions, and advantages of the embodiments of this utility model clearer, the technical solutions of the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this utility model, not all embodiments. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of this utility model.

[0048] To address the problems existing in the prior art, embodiments of this utility model provide a gas distribution device, see [link to relevant documentation]. Figure 1 , Figure 4 , Figure 6 , Figure 7 as well as Figure 8The gas distribution device 100 includes a housing 110, a rotary valve body 120, and a drive component 130. The housing 110 is hollow and has a first channel 111, a receiving space 113, and N second channels 112. The receiving space 113 is connected to the first channel 111 and the N second channels 112 respectively. The first channel 111 is used to connect to a remote plasma source 200, and the second channels 112 are used to connect to a spray plate or to a spray plate through a gas guide pipe. N is a positive integer. The rotary valve body 120 is rotatably disposed in the receiving space 113. The rotary valve body 120 includes an inlet 121 corresponding to the first channel 111 and N outlets 122 connected to the inlet 121. The outlets 122 are arranged one-to-one with the second channels 112. The rotary valve body 120 is hollow, and the inlet 121 and outlets 122 are connected to the internal space of the rotary valve body 120. The drive unit 130 is driven to connect with the rotary valve body 120 and is used to drive the rotary valve body 120 to rotate. When the rotary valve body 120 rotates to the open position, the first channel 111 is aligned with and connected to the inlet 121, and the N outlets 122 are respectively aligned with and connected to the corresponding second channels 112 to introduce clean gas into the N second channels 112. When the rotary valve body 120 rotates to the closed position, the first channel 111 is offset from the inlet 121, and the N outlets 122 are respectively offset from the corresponding second channels 112, stopping the introduction of clean gas into the N second channels 112.

[0049] Driven by the drive unit 130, the rotary valve body 120 can switch between an open position and a closed position. When the rotary valve body 120 is in the open position, the first channel 111 is aligned and connected to the inlet 121 of the rotary valve body 120, and the N outlets 122 of the rotary valve body 120 are also aligned and connected to the corresponding second channels 112. The remote plasma source 200 delivers excited cleaning gas to the first channel 111. The cleaning gas enters the rotary valve body 120 from the inlet 121, and then flows into the N second channels 112 from the N outlets 122, and then flows through the spray plate (not shown in the figure) and the process chamber (not shown in the figure). When the rotary valve body 120 is in the closed position, the first channel 111 is offset from the inlet 121, and the N outlets 122 are offset from the corresponding second channels 112, and the supply of cleaning gas to the second channels 112 stops. The on / off control of the clean gas in N second channels 112 can be achieved through a single rotary valve body 120, reducing the number of valves required and simplifying the control of the clean gas in each second channel 112. Furthermore, instead of individually connecting each second channel 112 to the remote plasma source 200, the gas is distributed to the N second channels 112 via a single first channel 111 connected to the remote plasma source 200. This solution significantly simplifies the structure of the entire gas distribution device 100 and reduces manufacturing costs by simplifying the piping and reducing the number of valves.

[0050] In one embodiment, see Figure 1 and Figure 7 A gap 1131 is formed between the rotary valve body 120 and the housing 110. When the rotary valve body 120 is in the closed position, purge gas is introduced into the gap 1131 through the first channel 111. The purge gas is a gas that does not participate in the reaction, such as an inert gas like argon.

[0051] Because there is a gap 1131 between the rotary valve body 120 and the housing 110, the rotary valve body 120 and the housing 110 will not come into contact during the rotation of the rotary valve body 120, thus avoiding mechanical friction. Mechanical friction not only causes wear on the rotary valve body 120 and the housing 110, but may also generate tiny particles. If these particles enter the process gas, they will adversely affect product quality. Therefore, the structural design of the gap 1131 in this solution can effectively ensure product quality. Moreover, when the rotary valve body 120 is in the closed position, purge gas is introduced into the gap 1131 through the first channel 111. The purge gas fills the gap 1131 between the rotary valve body 120 and the housing 110, forming a pressure barrier. That is, by adjusting the pressure above the second channel 112, the leakage of process gas introduced from the second channel 112 from the gap 1131 is effectively blocked, ensuring the airtightness and safety of the device.

[0052] In one embodiment, see Figure 1 and Figure 3 One end of the rotary valve body 120 is provided with a rotating shaft 123, which is rotatably mounted on the housing 110. A cleaning component 140 is provided at the rotating shaft 123 to remove contaminants from the rotating shaft 123. The other end of the rotating shaft 123 is a rotating end 1232, which is rotatably mounted on the inner wall of the housing 110.

[0053] Furthermore, in the case where one end of the rotary valve body 120 is provided with a rotating shaft 123, the rotating shaft 123 is connected to the driving member 130, and the driving member 130 drives the rotating shaft 123 to rotate, thereby driving the rotary valve body 120 to rotate.

[0054] Furthermore, see Figure 3 and Figure 6For the case where the other end of the rotating shaft 123 is a rotating end 1232, the end face of the rotating end 1232 is provided with several concentrically arranged, ring-shaped limiting members 1233. The limiting members 1233 are integrally formed with the rotating end 1232, and the center of the limiting member 1233 is collinear with the center line of the rotating shaft 123. The inner wall of the housing 110 is provided with several grooves 191 that are adapted to the limiting members 1233. The grooves 191 and the limiting members 1233 are arranged one-to-one, and the limiting members 1233 are placed in the corresponding grooves 191. When the driving member 130 drives the rotating shaft 123 to rotate, the limiting members 1233 can rotate within the corresponding grooves 191. The cooperation between the limiting members 1233 and the grooves 191 can prevent the rotary valve body 120 from shaking or shifting during rotation, ensuring that the rotary valve body 120 can rotate more smoothly.

[0055] In another embodiment, see Figure 2 , Figure 4 , Figure 7 as well as Figure 8 The rotary valve body 120 has two rotating shafts 123 at its two ends. The two rotating shafts 123 are rotatably mounted on the housing 110. The two rotating shafts 123 are each provided with a cleaning assembly 140. The cleaning assembly 140 is used to remove contaminants from the rotating shafts 123 to prevent contaminants from entering the gap 1131 along the rotating shafts 123 and causing pollution problems.

[0056] Further, see Figure 7 In the case where the rotary valve body 120 is provided with rotating shafts 123 at both ends, one of the rotating shafts 123 is connected to the driving member 130, and the driving member 130 drives the rotating shaft 123 to rotate, thereby driving the rotary valve body 120 to rotate.

[0057] Specifically, the drive component 130 can be a device such as a motor or rotary cylinder that can drive the rotary valve body 120 to rotate. The specific type of drive component 130 is not limited here and can be flexibly selected according to actual process requirements.

[0058] In one embodiment, see Figure 2 and Figure 7 The rotating shaft 123 extends out of the housing 110 to form a protrusion 1231. A sealing cover 150 is provided on the outer wall of the housing 110 corresponding to the protrusion 1231, and the cleaning assembly 140 is disposed inside the sealing cover 150. The design of the sealing cover 150 can prevent the protrusion 1231 of the rotating shaft 123 from directly contacting the external environment, and prevent pollutants from the external environment from falling on the rotating shaft 123, thereby playing a role in isolating and protecting the protrusion 1231.

[0059] The housing 110 is a vacuum side, and the sealing cover 150 is an atmospheric side. By providing a cleaning component 140 on the protrusion 1231 of the rotating shaft 123 that extends out of the housing 110, the contaminants on the protrusion 1231 can be discharged, preventing contaminants from entering the gap 1131 along the rotating shaft 123 and causing contamination of the vacuum side.

[0060] In one specific embodiment, see Figure 2 and Figure 7 The protrusion 1231 extends out of the sealing cover 150 and is connected to the drive component 130.

[0061] In one embodiment, see Figure 2 and Figure 7 The cleaning assembly 140 includes an air intake 141 disposed on the housing 110 and surrounding the protrusion 1231, and an exhaust 142 disposed on the side of the air intake 141 away from the housing 110 and surrounding the protrusion 1231. An air intake chamber 1411 surrounding the protrusion 1231 is formed in the air intake 141, and an exhaust chamber 1421 surrounding the protrusion 1231 is formed in the exhaust 142. The air intake chamber 1411 communicates with the gap 1131 and the exhaust chamber 1421, respectively.

[0062] In one embodiment, see Figure 2 and Figure 7 The cleaning assembly 140 also includes an intake pipe 143 disposed on the intake component 141 and communicating with the intake chamber 1411, and an exhaust pipe 144 disposed on the exhaust component 142 and communicating with the exhaust chamber 1421. The intake pipe 143 extends out of the sealing cover 150 and is connected to the cleaning gas supply assembly, and the exhaust pipe 144 extends out of the sealing cover 150 and is connected to the air extraction assembly. The cleaning gas supply assembly supplies cleaning gas to the intake chamber 1411, and at the same time, the air extraction assembly extracts air to remove contaminants at the rotating shaft 123.

[0063] The cleaning gas supply assembly introduces high-speed cleaning gas into the intake chamber 1411 through the intake pipe 143. Under the scouring of the high-speed airflow, the contaminants on the rotating shaft 123 can be effectively blown away. At the same time, the exhaust assembly extracts the gas containing contaminants through the exhaust chamber 1421 and the exhaust pipe 144, preventing contaminants from entering the gap 1131 along the rotating shaft 123 and causing pollution problems.

[0064] In one embodiment, see Figure 2 and Figure 7The side of the exhaust component 142 away from the intake component 141 is sealed to the protrusion 1231 by a seal 160. The seal 160 can be a sealing ring or the like, and the number and type of seal 160 are not limited here. As an example, the seal 160 is located on the side of the exhaust component 142 away from the intake component 141 and is fitted onto the protrusion 1231. When the rotating shaft 123 rotates, the rotating shaft 123 can rotate within the seal 160, and under the sealing action of the seal 160, the protrusion 1231 and the seal 160 can be effectively sealed.

[0065] In one specific embodiment, see Figure 2 and Figure 7 Vacuum grease is provided on the seal 160. Since the rotating shaft 123 needs to rotate within the seal 160, the vacuum grease on the seal 160 acts as a lubricant, reducing the friction between the seal 160 and the rotating shaft 123, thus making the rotating shaft 123 rotate more smoothly. The vacuum grease on the protrusion 1231 can be removed by inflating the cleaning gas supply assembly and evacuating the air from the evacuation assembly as described in the aforementioned scheme.

[0066] In one embodiment, see Figure 2 and Figure 7 The protrusion 1231 is rotatably mounted on the sealing cover 150 via bearings 170, the number of which is not limited here. By connecting the protrusion 1231 and the sealing cover 150 via bearings 170, it can be ensured that the shaft 123 can rotate smoothly and stably during rotation without generating excessive frictional resistance or jamming.

[0067] In one specific embodiment, see Figure 2 and Figure 7 The bearing 170 is equipped with vacuum grease. The vacuum grease serves as a lubricant, which can significantly reduce the friction of the bearing 170 during rotation.

[0068] In one embodiment, see Figure 1 , Figure 5 as well as Figure 6 When N=1, that is, there is one second channel 112. The housing 110 includes an inner tube 1141 disposed in the second channel 112. An outer air intake channel 115 and an inner air intake channel 116 are respectively provided on the housing 110 near the rotary valve body 120. The outer air intake channel 115 is connected to the outer space located between the housing 110 and the inner tube 1141, and the inner air intake channel 116 is connected to the inner tube 1141.

[0069] The second channel 112 and the inner tube 1141 form a double-layer pipeline structure, which can meet different process requirements, such as atomic layer deposition (ALD) process, chemical vapor deposition (CVD) process, etc.

[0070] ALD process flow: Taking the second channel connected to the spray plate via a gas guide pipe, with the gas guide pipe having an inner and outer pipe as an example, the rotary valve body 120 is rotated to the closed position, and simultaneously, purge gas is introduced into the gap 1131 through the first channel 111 to achieve gas sealing. Precursor gas is introduced into the inner layer pipe 1141 through the inner air inlet channel 116. The precursor gas passes through the inner pipe of the gas guide pipe and the spray plate into the process chamber. The precursor gas molecules are adsorbed onto the substrate surface. Then, purge gas (e.g., inert gas) is introduced into the outer layer space and the inner layer pipe 1141 through the outer air inlet channel 115 and the inner air inlet channel 116 respectively. The purge gas passes through the inner and outer pipes of the gas guide pipe and the spray plate, and then enters the process chamber. Simultaneously, the exhaust device is turned on to... The remaining gas is discharged. After purging, reactive gas is introduced into the outer space through the external air inlet channel 115. The reactive gas molecules react chemically with the precursor molecules on the substrate surface to form a monolayer atomic film. Then, purging gas is introduced into the outer space and the inner tube 1141 through the external air inlet channel 115 and the inner air inlet channel 116, respectively. The purging gas passes through the inner and outer tubes of the gas guide pipe and the spray plate, and then enters the process chamber. At the same time, the exhaust device is turned on to discharge the remaining gas. The precursor gas and reactive gas are circulated in a cycle according to the above steps until the desired thin film is obtained. After the reaction is completed, the rotary valve body 120 is rotated to the open position. The cleaning gas enters the first channel 111 after being excited by the remote plasma source 200. The cleaning gas enters the outer space and the inner tube 1141 through the rotary valve body 120, and then enters the process chamber through the inner and outer tubes of the gas guide pipe and the spray plate. At the same time, the purging gas is introduced into the outer space and the inner tube 1141 through the outer air inlet channel 115 and the inner air inlet channel 116 respectively. At the same time, the exhaust device is turned on to discharge the gas in the process chamber to clean the process chamber.

[0071] CVD process flow: Taking the second channel connected to the spray plate via a gas guide pipe, with the gas guide pipe having an inner and outer pipe as an example, the rotary valve body 120 is rotated to the closed position, and simultaneously, purge gas is introduced into the gap 1131 through the first channel 111 to achieve gas sealing. Precursor gas is introduced into the inner layer pipe 1141 through the inner air inlet channel 116, and reaction gas is introduced into the outer layer space through the outer air inlet channel 115. The precursor gas enters the spray plate through the inner pipe of the gas guide pipe, and the reaction gas enters the spray plate through the outer pipe of the gas guide pipe. The precursor gas and reaction gas mix at the spray plate and then enter the reaction chamber for reaction and deposition on the substrate. After the reaction is completed, the rotary valve body 120 is rotated to the open position. The cleaning gas enters the first channel 111 after being excited by the remote plasma source 200. The cleaning gas enters the outer space and inner tube 1141 through the rotary valve body 120, and then passes through the inner and outer tubes of the gas guide pipe and the spray plate before entering the process chamber to clean the process chamber.

[0072] In one specific embodiment, see Figure 5 and Figure 6 The housing 110 also includes a first connecting portion 1142 fixedly connected between the housing 110 and the inner tube 1141 located at the second channel 112, and a second connecting portion 1143 corresponding to the first connecting portion 1142 located inside the inner tube 1141. The second connecting portion 1143 partially blocks the opening of the inner tube 1141. The inner air intake channel 116 passes through the housing 110, the first connecting portion 1142, the inner tube 1141, and the second connecting portion 1143 located at the second channel 112. A first port of the inner air intake channel 116 is formed on the outer wall of the housing 110 located at the second channel 112, and a second port of the inner air intake channel 116 is formed on the second connecting portion 1143 to communicate with the inner tube 1141. A first connecting part 1142 is provided between the housing 110 and the inner tube 1141 located at the second channel 112, and a second connecting part 1143 is provided inside the inner tube 1141. The inner air intake channel 116 passes through the housing 110, the first connecting part 1142, the inner tube 1141 and the second connecting part 1143 located at the second channel 112. The path of the inner air intake channel 116 extends from the outer wall of the housing 110 to the inner tube 1141, so that gas can be introduced into the inner tube 1141 independently.

[0073] The second connecting part 1143 partially blocks the opening of the inner tube 1141. This can be understood as the second connecting part 1143 not blocking the flow path within the inner tube 1141, allowing clean gas to flow from the outside of the second connecting part 1143 (i.e., the unblocked portion). Figure 6 As shown, the second connecting part 1143 is located in the radial direction of the inner tube 1141, and the two sides of the second connecting part 1143 are unblocked parts that can allow clean gas to flow through.

[0074] See Figure 5 and Figure 6 The internal air intake channel 116 includes a first part 1161 and a second part 1162 communicating with the first part 1161. The first part 1161 passes through the housing 110, the first connecting part 1142, the inner tube 1141, and the second connecting part 1143 located at the second channel 112. The second part 1162 is oriented in the same direction as the inner tube 1141, meaning that the internal air intake channel 116 bends within the second connecting part 1143 to adjust the airflow path. This allows the process gas to flow more smoothly along the inner tube 1141 after exiting the second part 1162, preventing it from impacting the inner wall of the inner tube 1141 and causing a sudden change in airflow direction, thus avoiding eddies and turbulence. The second part 1162 is located on the axis of the inner tube 1141, ensuring that the gas entering the inner tube 1141 is more evenly distributed throughout the entire inner tube 1141, avoiding eddies and turbulence caused by uneven airflow distribution.

[0075] In another embodiment, when N > 1, the number of second channels 112 is 2, 3, or 4, etc., and can be designed according to actual process requirements. See also Figure 7 and Figure 8 There are three second channels 112, and three outlets 122 corresponding to the rotary valve body 120. A third air intake channel 117 is provided on the housing 110 corresponding to each second channel 112. The third air intake channel 117 is located close to the rotary valve body 120 and is connected to the second channel 112.

[0076] Multiple second channels 112 are respectively set for different areas of the spray plate. For example, when there are 3 second channels 112, the 3 second channels 112 are respectively set for the central area, middle area and edge area of ​​the spray plate to ensure that the process gas can reach the surface of the substrate more evenly.

[0077] Plasma Enhanced Chemical Vapor Deposition (PECVD) process flow: Taking the second channel connected to the spray plate via a gas guide pipe as an example, the rotary valve body 120 is rotated to the closed position, and simultaneously, purge gas is introduced into the gap 1131 through the first channel 111 to achieve gas sealing. Process gas is introduced into the corresponding second channel 112 through each third gas inlet channel 117. The process gas in each second channel 112 reaches different areas of the spray plate and is then sprayed onto different areas of the substrate surface. The substrate undergoes a coating reaction while rotating. After the reaction is completed, the rotary valve body 120 is rotated to the open position. The cleaning gas enters the first channel 111 after being excited by the remote plasma source 200. The cleaning gas enters the rotary valve body 120 from the inlet 121. After being distributed by the rotary valve body 120, it enters the corresponding second channel 112 from each outlet 122 on the rotary valve body 120. Then it reaches different areas of the spray plate through the gas guide pipe and then enters the process chamber to clean the process chamber.

[0078] In one specific embodiment, see Figure 9 and Figure 10 The housing 110 also includes a third connecting portion 118 disposed in the second channel 112. The third connecting portion 118 partially blocks the opening of the second channel 112. The third air intake channel 117 passes through the housing 110 and the third connecting portion 118 located in the second channel 112. A first channel opening of the third air intake channel 117 is formed on the outer wall of the housing 110 located in the second channel 112. A second channel opening of the third air intake channel 117 is formed on the third connecting portion 118 to communicate with the second channel 112.

[0079] The third connecting part 118 partially blocks the opening of the second channel 112. This can be understood as the third connecting part 118 not blocking the flow path within the second channel 112; clean gas can still flow from the outside of the third connecting part 118 (i.e., the unblocked portion). For example... Figure 10 As shown, the third connecting part 118 is located in the radial direction of the second channel 112, and the two sides of the third connecting part 118 are unobstructed parts, allowing clean gas to flow through.

[0080] See Figure 9 and Figure 10 A third connecting part 118 is provided in the second channel 112. The third air inlet channel 117 passes through the housing 110 and the third connecting part 118 located in the second channel 112, so that process gas can be introduced into the second channel 112.

[0081] See Figure 9 and Figure 10The third air intake channel 117 includes a first air duct section 1171 and a second air duct section 1172 that are connected to each other. The first air duct section 1171 passes through the housing 110 and the third connecting part 118 located at the second channel 112. The second air duct section 1172 is oriented in the same direction as the pipeline of the second channel 112. That is, the second air duct section 1172 bends within the third connecting part 118 to adjust the airflow path, so that the process gas can flow more smoothly along the direction of the second channel 112 after flowing out from the second air duct section 1172, without impacting the inner wall of the second channel 112 and causing a sudden change in airflow direction, thus avoiding eddies and turbulence problems. The second air duct section 1172 is located on the axis of the second channel 112, which can ensure that the gas can be more evenly distributed throughout the entire range of the second channel 112 after entering the second channel 112, avoiding eddies and turbulence problems caused by uneven airflow distribution.

[0082] This utility model also provides a deposition device, including: a gas separation device 100 as in any of the above embodiments, wherein the deposition device is an atomic layer deposition device, a chemical vapor deposition device, or a plasma-enhanced chemical vapor deposition device, etc.

[0083] In the description of this utility model, it should be understood that the terms "comprising" and "having" as used herein, and any variations thereof, are intended to cover non-exclusive inclusion, for example, a process, method, system, product, or device that includes a series of steps or units is not necessarily limited to those steps or units that are explicitly listed, but may include other steps or units that are not explicitly listed or that are inherent to such process, method, product, or device.

[0084] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", and "outer" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0085] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.

[0086] While the embodiments of this utility model have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of this utility model as set forth in the claims. Furthermore, the utility model described herein may have other embodiments and can be implemented or realized in various ways. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by one of ordinary skill in the art to which this utility model pertains.

Claims

1. A gas distribution device, characterized in that, include: The shell is hollow inside and has a first channel, a accommodating space and N second channels. The accommodating space is connected to the first channel and the N second channels respectively. The first channel is used to connect to a remote plasma source, and the second channels are used to connect to a spray plate or to the spray plate through a gas guide pipe. N is a positive integer. The rotary valve body is rotatably disposed within the accommodating space. The rotary valve body includes an inlet corresponding to the first channel and N outlets communicating with the inlet. The outlets are arranged one-to-one with the second channel. A driving component is connected to the rotary valve body and is used to drive the rotary valve body to rotate.

2. The gas separator according to claim 1, characterized in that, A gap is formed between the rotary valve body and the housing.

3. The gas separator according to claim 2, characterized in that, At least one end of the rotary valve body is provided with a rotating shaft, which is rotatably mounted on the housing. A cleaning assembly is provided at the rotating shaft for removing contaminants from the rotating shaft.

4. The gas separator according to claim 3, characterized in that, The rotating shaft extends out of the housing to form a protrusion, and a sealing cover is provided on the outer wall of the housing corresponding to the protrusion. The cleaning assembly is located inside the sealing cover.

5. The gas separator according to claim 4, characterized in that, The cleaning assembly includes an air inlet disposed on the housing and surrounding the protrusion, and an exhaust outlet disposed on the side of the air inlet away from the housing and surrounding the protrusion. An air inlet chamber is formed within the air inlet and surrounding the protrusion, and an exhaust outlet chamber is formed within the exhaust outlet and surrounding the protrusion. The air inlet chamber communicates with the gap and the exhaust outlet chamber, respectively.

6. The gas separator according to claim 5, characterized in that, The cleaning assembly further includes an air intake pipe disposed on the air intake component and communicating with the air intake chamber, and an exhaust pipe disposed on the exhaust component and communicating with the exhaust chamber. The air intake pipe is connected to the cleaning gas supply assembly, and the exhaust pipe is connected to the air extraction assembly.

7. The gas separator according to claim 5, characterized in that, The side of the exhaust component away from the intake component is sealed to the protrusion by a seal.

8. The gas separator according to claim 4, characterized in that, The protruding portion is rotatably mounted on the sealing cover via a bearing.

9. The gas separator according to claim 3, characterized in that, In the case where the rotary valve body has rotating shafts at both ends, one of the rotating shafts is connected to the driving component; or, In the case where one end of the rotary valve body is provided with a rotating shaft, the rotating shaft is connected to the driving component.

10. The gas separator according to any one of claims 1-9, characterized in that, When N=1, the housing includes an inner tube disposed in the second channel. An external air intake channel and an internal air intake channel are respectively provided on the housing near the rotary valve body. The external air intake channel is connected to the outer space located between the housing and the inner tube, and the internal air intake channel is connected to the inner tube.

11. The gas separator according to any one of claims 1-9, characterized in that, When N>1, a third air intake channel is provided on the housing corresponding to each of the second channels. The third air intake channel is located close to the rotary valve body and communicates with the second channel.

12. The gas separator according to claim 11, characterized in that, The housing also includes a third connecting portion disposed within the second channel, the third connecting portion partially obscuring the opening of the second channel, and the third air intake channel passing through the housing located at the second channel and the third connecting portion.

13. A deposition apparatus, characterized in that, include: The gas distribution device as described in any one of claims 1-12.

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