Gas dispersion device for PECVD (plasma enhanced chemical vapor deposition) reaction cavity
By designing a rotatable gas dispersion device, the problem of uneven diffusion of nano vapor in the PECVD reaction chamber was solved, achieving uniform gas distribution and uniform deposition of nano waterproof membrane within the reaction chamber.
Patent Information
- Application Number
- CN202520357571.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-03
- Publication Date
- 2026-02-17
- Estimated Expiration
- 2035-03-03
AI Technical Summary
The uneven diffusion of nanovapor in the PECVD reaction chamber leads to uneven nanovapor deposition.
A gas dispersion device is designed, including a shell and a dispersion seat. The shell is rotatably mounted on the dispersion seat. When the gas is ejected from the outlet end through the guide channel, it pushes the shell to rotate, realizing the rapid diffusion of the gas flow in the circumferential space. The gas is rotated in the circumferential space through the outlet end of the guide channel, thereby improving the diffusion speed and uniformity of the gas.
This achieves uniform gas distribution within the PECVD reaction chamber, reduces the problem of uneven gas deposition, and ensures uniform distribution of the nano-waterproof membrane on the workpiece surface.
Smart Images
Figure CN223921551U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of gas dispersion devices, in particular to a gas dispersion device for a PECVD reaction chamber. BACKGROUND
[0002] PECVD (Plasma Enhanced Chemical Vapor Deposition) is a method for preparing semiconductor thin film materials and other material films by using glow discharge to ionize in a deposition chamber and then depositing on a substrate by chemical reaction.
[0003] In response to the demand and development of electronic products, the requirements for nanometer waterproof treatment of electronic products are becoming higher and higher, and PECVD vacuum coating nanometer waterproof treatment has become a hot spot. Nanometer waterproof treatment is required on the surface of many electronic products. During the nanometer waterproof treatment process, appropriate reaction gases are selected according to the composition and performance of the required thin film. These gases usually include silicon sources (such as silane), nitrogen sources (such as ammonia), oxygen sources (such as oxygen), etc. After the gas enters the reaction chamber from the gas inlet, it diffuses throughout the reaction chamber. The position of the gas inlet is fixed, and it is easy to cause uneven deposition of nanometer vapor. CONTENT OF THE INVENTION
[0004] The main purpose of the present application is to provide a gas dispersion device for a PECVD reaction chamber, which aims to solve the technical problem that in the prior art, after the nanometer vapor enters the reaction chamber from the gas inlet, the nanometer vapor takes a relatively long time to diffuse to the space far from the gas inlet compared to the time required for the gas to diffuse to the space close to the gas inlet, which easily causes uneven deposition of nanometer vapor.
[0005] To achieve the above-mentioned purpose, the present application provides a gas dispersion device for a PECVD reaction chamber, comprising:
[0006] A housing comprising a fixed base and at least one support body, the fixed base having a receiving cavity, and the support body having a flow guide channel in communication with the receiving cavity;
[0007] A dispersion seat having a through hole, the gas inlet end of the through hole being used for communication with a gas inlet device, the gas outlet end of the through hole being rotatably connected with the fixed base, and the gas outlet end of the through hole being in communication with the receiving cavity;
[0008] The support body extends away from the fixed base, the outlet end of the flow guide channel penetrates the outer wall of the support body, and the opening direction of the outlet end of the flow guide channel is arranged counterclockwise or clockwise around the axis of the through hole, so that the shell can be driven to rotate around the generatrix when the airflow is sprayed out of the outlet end of the flow guide channel.
[0009] Optionally, the shell comprises a top cover and a bottom plate, the top cover has a first accommodating groove and a first flow guide groove in communication, and the bottom plate has a second accommodating groove and a second flow guide groove in communication, the top cover and the bottom plate are buckled to form a sealed structure, and the first accommodating groove and the second accommodating groove are matched to form the accommodating cavity, and the first flow guide groove and the second flow guide groove are matched to form the flow guide channel.
[0010] Optionally, the bottom plate has a mounting hole for matching with the dispersing seat, and the top cover has a plurality of first dispersing holes penetrating therethrough and in communication with the accommodating cavity.
[0011] Optionally, a transmission bearing is arranged between the outer wall of the dispersing seat and the inner wall of the mounting hole.
[0012] Optionally, the bottom plate has an annular flange arranged at the periphery of the mounting hole, and a gap is formed between the upper end face of the annular flange and the top cover.
[0013] Optionally, the top cover and / or the bottom plate are provided with a plurality of second dispersing holes penetrating therethrough, the second dispersing holes are in communication with the flow guide channel, and all the second dispersing holes are arranged and distributed away from the fixed base.
[0014] Optionally, the periphery of the fixed base is provided with four support bodies, the spacing between adjacent support bodies is equal, the opening direction of the outlet end of the flow guide channel of each support body is arranged in the same direction, and the distance between the end of each support body away from the fixed base and the fixed base is equal.
[0015] Optionally, the flow guide channel comprises a first flow guide section and a second flow guide section in communication with each other, the first flow guide section is in communication with the accommodating cavity, the second flow guide section penetrates the outer wall of the support body, an included angle is formed between the first flow guide section and the second flow guide section, and the outer side inner wall at the included angle is rounded.
[0016] Optionally, the cross-sectional area of the first flow guide section gradually decreases away from the fixed base.
[0017] Optionally, the maximum width of the flow guide channel is greater than the inner diameter of the through hole.
[0018] The beneficial effects that can be achieved by the present application are as follows:
[0019] This application proposes a gas dispersion device for a PECVD reaction chamber. The device rotatably mounts a housing on a dispersion seat, which has a through-hole with an inlet and an outlet. The inlet connects to an inlet device, allowing nano-vapor to enter the through-hole and then into the accommodating cavity. The nano-vapor is then discharged to the support body via a flow channel. When gas is ejected from the outlet of the flow channel, it exerts a reaction force on the support body, pushing it to move in the opposite direction to the outlet of the flow channel. This causes the housing to rotate around the dispersion seat, enabling the outlet of the flow channel to rotate within the circumferential space. This allows the airflow to quickly reach any position in the circumferential space. The airflow ejected from the outlet of the flow channel also acts as a turbulence, further increasing the gas dispersion velocity. Attached Figure Description
[0020] Figure 1 This is a three-dimensional structural diagram of the gas dispersion device according to an embodiment of this application;
[0021] Figure 2 This is a schematic diagram of the structure of the base plate in an embodiment of this application;
[0022] Figure 3 This is a schematic diagram of the exploded structure of the gas dispersion device according to an embodiment of this application;
[0023] Figure 4 This is a cross-sectional structural schematic diagram of the gas dispersion device according to an embodiment of this application;
[0024] Figure 5 This is a top view of the base plate according to an embodiment of this application.
[0025] The numbers on the map are:
[0026] 10-Housing shell, 11-Fixed base, 111-First dispersion hole, 12-Support body, 121-Second dispersion hole, 13-Base plate, 14-Top cover, 20-Annular flange, 30-Dispersion seat, 31-Through hole, 40-Accommodation cavity, 41-First accommodation groove, 42-Second accommodation groove, 50-Guiding channel, 51-First guiding groove, 52-Second guiding groove, 60-Transmission bearing.
[0027] The realization of the purpose, functional features and advantages of this application will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation
[0028] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.
[0029] It should be noted that all directional indicators (such as up, down, left, right, front, back, etc.) in this utility model embodiment are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indicator will also change accordingly.
[0030] In this utility model, unless otherwise explicitly specified and limited, the terms "connection," "fixing," etc., should be interpreted broadly. For example, "fixing" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection or an electrical connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.
[0031] Furthermore, if the embodiments of this utility model involve descriptions such as "first" or "second," these descriptions are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the meaning of "and / or" throughout the text includes three parallel solutions; for example, "A and / or B" includes solution A, solution B, or a solution where both A and B are satisfied simultaneously. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of those skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed by this utility model.
[0032] Example 1
[0033] Reference Figures 1-5The first embodiment of this application provides a gas dispersion device for a PECVD reaction chamber, comprising: a housing 10, which includes a fixed base 11 and at least one support body 12, the fixed base 11 having a receiving cavity 40, and the support body 12 having a flow channel 50 communicating with the receiving cavity 40; a dispersion seat 30, which has a through hole 31, the air inlet end of the through hole 31 being used to communicate with an air inlet device, the air outlet end of the through hole 31 being rotatably connected to the fixed base 11, and the air outlet end of the through hole 31 communicating with the receiving cavity 40; wherein, the support body 12 extends in a direction away from the fixed base 11, the outlet end of the flow channel 50 penetrates the outer wall of the support body 12, and the opening direction of the outlet end of the flow channel 50 is set counterclockwise or clockwise with the axis of the through hole 31 as the generatrix, so that when the airflow is ejected from the outlet end of the flow channel 50, it can drive the housing 10 to rotate around the generatrix.
[0034] In this embodiment, the gas dispersion device is used in the reaction chamber of PECVD. The lower end of the dispersion seat 30 is connected to an air inlet device, which can be a nano-vapor generator, etc., to guide the gas into the receiving chamber 40 through the dispersion seat 30. The housing 10 is rotatably mounted on the dispersion seat 30, and the dispersion seat 30 provides support to the housing 10. Figure 1 From above, there is no clear dividing line between the fixed seat and the support body 12. For ease of structural description, the shell 10 is divided into the fixed seat and the support body 12. The fixed seat and the support body 12 can be integrally formed. The fixed seat is disc-shaped, and the support body 12 is square-shaped. Gas enters the through hole 31 of the dispersion seat 30 through the inlet end and then enters the accommodating cavity 40 through the outlet end of the through hole 31. The lower end of the through hole 31 is the inlet end, and the upper end is the outlet end. The airflow entering the accommodating cavity 40 moves through the guide channel 50 and finally exits the shell 10 through the outlet end of the guide channel 50, entering the reaction chamber of PECVD. The outlet end of the guide channel 50 is located on the side wall of the support body 12. When multiple supports 12 are provided, all supports 12 are arranged in a ring, and the outlet ends of the guide channels 50 of all supports 12 are located on the clockwise or counterclockwise side, such as... Figure 1As shown, the outlet of the flow channel 50 is set clockwise. When gas is ejected from the outlet of the flow channel 50, it pushes the housing 10 to rotate counterclockwise. During the rotation of the housing 10, the housing 10 rotates around the axis of the through hole 31. The automatic rotation of the housing 10 can be achieved by airflow, without the need for an additional drive source to control the rotation of the housing 10. When the air intake stops, the housing 10 loses the reaction force of the gas and gradually stops rotating. During the rotation of the housing 10, the coverage area of the outlet of the flow channel 50 is increased, the diffusion efficiency of the gas after it is discharged from the outlet of the flow channel 50 is improved, and the gas discharged from the outlet of the flow channel 50 can also play a turbulence role, further improving the diffusion efficiency of the gas, so that the gas can move more evenly to the surface of the workpiece, ensuring that the nano-waterproof membrane on the surface of the workpiece is evenly distributed. Compared with the prior art where the gas outlet position is fixed, the time required for the gas to reach a place farther from the outlet position is longer than the time required to reach a place closer to the outlet position. The technical solution of this embodiment enables the gas to be more evenly distributed in the reaction chamber, reducing the problem of uneven gas deposition. The components of the dispersion device, such as the shell 10 and the dispersion seat 30, are all made of thermally conductive materials with excellent thermal conductivity.
[0035] Example 2
[0036] As an optional implementation, this embodiment provides a specific structure of the housing 10, including: the housing 10 includes a top cover 14 and a bottom plate 13, the top cover 14 has a first receiving groove 41 and a first flow guide groove 51 communicating with each other, the bottom plate 13 has a second receiving groove 42 and a second flow guide groove 52 communicating with each other, the top cover 14 and the bottom plate 13 are fastened together to form a sealing structure, the first receiving groove 41 and the second receiving groove 42 cooperate to form a receiving cavity 40, and the first flow guide groove 51 and the second flow guide groove 52 cooperate to form a flow guide channel 50.
[0037] Specifically, the housing 10 includes a detachable top cover 14 and a bottom plate 13, which are connected by adhesive or bolt assemblies. After the top cover 14 and bottom plate 13 are connected, a sealing strip can also be provided between them to improve the sealing performance of the connection. This facilitates repair or replacement of the top cover 14 or bottom plate 13 if one of the components fails.
[0038] Optionally, the base plate 13 has mounting holes for engaging with the dispersion seat 30, and the top cover 14 has a plurality of through first dispersion holes 111, which are connected to the receiving cavity 40.
[0039] Specifically, by providing mounting holes, it is easy to install the housing 10 and the dispersion seat 30. By providing the first dispersion hole 111, it is easy for the gas in the accommodating cavity 40 to enter the reaction chamber of PECVD through the first dispersion hole 111. The first dispersion hole 111 can also play a turbulence role for the gas in the reaction chamber.
[0040] Optionally, a transmission bearing 60 is provided between the outer wall of the distribution seat 30 and the inner wall of the mounting hole.
[0041] Specifically, by setting the transmission bearing 60, the stability of the housing 10 during the rotation of the dispersion seat 30 is ensured.
[0042] Optionally, the base has an annular flange 20 disposed around the mounting hole, and there is a gap between the upper end face of the annular flange 20 and the top cover 14.
[0043] Specifically, by providing an annular flange 20 on the base plate 13, a gap is formed between the upper end of the annular flange 20 and the top cover 14. The annular flange 20 can guide the gas entering the accommodating cavity 40, so that the gas entering the accommodating cavity 40 can get closer to the first dispersion hole 111 and can be discharged from the accommodating cavity 40 through the first dispersion hole 111.
[0044] Optionally, the top cover 14 and / or the bottom plate 13 are provided with a plurality of second dispersion holes 121, which are connected to the flow channel 50, and all the second dispersion holes 121 are arranged in a direction away from the fixed base 11.
[0045] Specifically, by providing a second dispersion hole 121 on the top cover 14 and / or the bottom plate 13, and by providing multiple second dispersion holes 121, the efficiency of gas being discharged from the shell 10 can be further increased, and the number of gas outlets discharged from the shell 10 can also be increased. During the rotation of the shell 10, the coverage area of the second dispersion hole 121 can be expanded. During the rotation of the shell 10, the gas discharged from the second dispersion hole 121 can also play a turbulent role in the gas in the reaction chamber, so that the gas can be more evenly distributed in the reaction chamber.
[0046] Example 3
[0047] As an optional implementation, this embodiment provides a specific structure of the support body 12, including: four support bodies 12 are arranged around the fixed base 11, the spacing between adjacent support bodies 12 is equal, the opening direction of the outlet end of the flow channel 50 of each support body 12 is arranged in the same direction, and the distance between the end of each support body 12 away from the fixed base 11 and the fixed base 11 is equal.
[0048] Specifically, by setting four support bodies 12 around the fixed base 11, with equal spacing between adjacent support bodies 12 and identical structures for the four support bodies 12, the thrust of the gas on the four support bodies 12 is equal when the gas is discharged through the outlet end of the guide channel 50 on the four support bodies 12, thereby improving the stability of the shell 10 during rotation.
[0049] Optionally, the flow channel 50 includes a first flow section and a second flow section that are interconnected. The first flow section is connected to the accommodating cavity 40, and the second flow section penetrates the outer wall of the support body 12. An angle is formed between the first flow section and the second flow section, and the inner wall on the outer side of the angle is rounded.
[0050] Specifically, such as Figure 5 M represents the first guide section, and N represents the second guide section. The second guide section is used to change the direction of gas movement from the first guide section, so that the direction of gas exiting from the outlet end of the guide channel 50 of the support 12 is clockwise or counterclockwise, ensuring that the shell 10 can rotate in the opposite direction under the push of the gas.
[0051] Optionally, the cross-sectional area of the first guide section gradually decreases in the direction away from the fixed base 11.
[0052] Optionally, the maximum width of the flow channel 50 is greater than the inner diameter of the through hole 31.
[0053] Specifically, to ensure that the gas enters the receiving tank from the dispersion seat 30, the first guide section can provide a certain degree of propulsion for the gas, increasing its movement speed. This also increases the speed at which the gas exits from the outlet of the guide channel 50, enhancing the gas turbulence effect.
[0054] The above are merely preferred embodiments of this application and do not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.
Claims
1. A gas dispersion device for a PECVD reaction chamber, comprising: The application relates to a shell, which comprises a fixed base with a containing cavity and at least one setting support with a flow guide channel communicating with the containing cavity. The setting support extends away from the fixed base, the outlet end of the flow guide channel penetrates the outer wall of the setting support, and the opening direction of the outlet end of the flow guide channel is arranged counterclockwise or clockwise around the axis of the through hole, so that the shell can be driven to rotate around the axis when air flow is sprayed from the outlet end of the flow guide channel. The shell comprises a top cover with a communicating first containing groove and a first flow guide groove and a bottom plate with a communicating second containing groove and a second flow guide groove, the top cover and the bottom plate are buckled to form a sealed structure, the first containing groove and the second containing groove are matched to form the containing cavity, and the first flow guide groove and the second flow guide groove are matched to form the flow guide channel. The bottom plate is provided with a mounting hole for matching the setting seat, and the top cover is provided with a plurality of penetrating first dispersing holes which communicate with the containing cavity.
2. The gas dispersion apparatus for a PECVD reaction chamber of claim 1, wherein, A transmission bearing is arranged between the outer wall of the setting seat and the inner wall of the mounting hole.
3. The gas dispersion apparatus for a PECVD reaction chamber of claim 2, wherein, The bottom plate is provided with an annular flange arranged at the periphery of the mounting hole, and a gap is formed between the upper end face of the annular flange and the top cover.
4. The gas dispersion apparatus for a PECVD reaction chamber of claim 3, wherein, The top cover and / or the bottom plate are provided with a plurality of second dispersing holes which communicate with the flow guide channel, and all the second dispersing holes are arranged and distributed away from the fixed base.
5. The gas dispersion apparatus for a PECVD reaction chamber of claim 3, wherein, The periphery of the fixed base is provided with four setting supports, the spacing between adjacent setting supports is equal, the opening direction of the outlet end of the flow guide channel of each setting support is arranged in the same direction, and the distance between the end of each setting support away from the fixed base and the fixed base is equal.
6. The gas dispersion apparatus for a PECVD reaction chamber of claim 2, wherein, The flow guide channel comprises a first flow guide section and a second flow guide section which communicate with each other, the first flow guide section communicates with the containing cavity, the second flow guide section penetrates the outer wall of the setting support, an included angle is formed between the first flow guide section and the second flow guide section, and the outer side inner wall at the included angle is chamfered.
7. The gas dispersion apparatus for a PECVD reaction chamber of claim 1, wherein, The cross-sectional area of the first flow guide section gradually decreases away from the fixed base.
8. The gas dispersion apparatus for a PECVD reaction chamber of claim 1, wherein, The maximum width of the flow guide channel is greater than the inner diameter of the through hole.
9. The gas dispersion apparatus for a PECVD reaction chamber of claim 8, wherein, 10. The gas dispersion apparatus for a PECVD reaction chamber of claim 1, wherein,