Reliable magnetron sputtering coating device

By introducing an adjustment device and a motor drive system into the magnetron sputtering coating apparatus, precise control of the target and substrate positions is achieved, solving the problem of difficulty in adjustment in existing devices, improving the stability and uniformity of the coating, and making it suitable for substrates with complex shapes.

CN223951156UActive Publication Date: 2026-02-27SHENZHEN CHANGSHENGYUAN TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202520370288.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-03-05
Publication Date
2026-02-27
Estimated Expiration
2035-03-05

AI Technical Summary

Technical Problem

Existing magnetron sputtering coating equipment has difficulty in making precise position adjustments according to the actual shape and size of the substrate, which affects the uniformity and efficiency of the coating process. In particular, for substrates with complex shapes and sizes, the coating quality is unstable.

Method used

A reliable magnetron sputtering coating apparatus was designed, comprising an adjustment device, a motor-driven rotating rod, and a slider system, allowing for flexible adjustment of the target and substrate. Combined with an electric telescopic rod and a rotating rod, precise control of the target and substrate positions is achieved. Furthermore, vacuum and current devices are provided to ensure the stability and uniformity of the coating process.

Benefits of technology

It improves the flexibility and precision of the coating process, ensures the coating quality of substrates with different shapes and sizes, avoids shaking and displacement, improves the stability and uniformity of the coating, and meets the coating requirements of substrates with complex shapes.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of magnetron coating, in particular to a reliable magnetron sputtering coating device which comprises a base, a control console and a coating box, a cavity without an upper side wall is arranged in the coating box, a protective cover matched with the upper side wall of the coating box is arranged on the upper side wall of the coating box, adjusting devices are arranged in the protective cover and the cavity, and the adjusting devices are arranged on the base. The adjusting device comprises a rotating rod, sliding blocks and a sliding plate, an electric telescopic rod is arranged on the bottom wall of the sliding block at the upper end, a target material is arranged on the bottom wall of the electric telescopic rod, a connecting box is arranged on the upper side wall of the sliding block at the lower end, a rotating rod is arranged at the upper end of the connecting box, and a placing plate is arranged at the upper end of the rotating rod; fixing plates are arranged at the four corners of the upper side wall of the placing plate, springs are arranged at one ends of the fixing plates, and limiting plates are arranged at one ends of the springs, so that the film coating requirements of base materials with different shapes and sizes are met, and the flexibility and precision of the film coating process are improved.
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Description

TECHNICAL FIELD

[0001] The utility model relates to magnetron coating technology field, concretely is a reliable magnetron sputtering coating device. BACKGROUND

[0002] It is known that, in the field of material science and industrial manufacturing, surface treatment technology occupies a pivotal position, among them, magnetron sputtering coating technology is favored because of its unique advantages, and this technology makes the atoms or molecules on the surface of target material sputter out through high-energy particle bombardment and deposits on the surface of the substrate to be coated, thereby forming a uniform, dense and strong adhesion thin film, this technology not only can significantly improve the wear resistance, corrosion resistance, optical performance of the substrate, but also can give the substrate specific functional properties according to the demand, such as conductivity, magnetism, optical reflection or absorption, etc.

[0003] However, the existing magnetron sputtering coating device often adopts fixed target material and substrate position design when in use, which makes it difficult to accurately adjust the position according to the actual shape and size of the substrate during the coating process, not only affects the uniformity and efficiency of the coating process, but also may lead to unstable coating quality, especially for the substrate with complex shape and size, it is difficult to guarantee the consistency and integrity of the coating. UTILITY MODEL CONTENT

[0004] (I) technical problem solved

[0005] In view of the deficiency of prior art, the utility model provides a reliable magnetron sputtering coating device.

[0006] (II) technical scheme

[0007] In order to achieve the above object, the utility model provides the following technical scheme: a reliable magnetron sputtering coating device, including base, control platform and coating box, the control platform is in the base upper side wall one end, the coating box is in the base upper side wall other end, the control platform with the coating box signal connection, the coating box is provided with the cavity without upper side wall, the coating box upper side wall is provided with the protection cover which adapts to it, the protection cover with the cavity all is provided with adjusting device, the adjusting device includes rotating lever, sliding block and sliding plate, the rotating lever passes through the protection cover upper side with the coating box bottom wall, the sliding block is on the rotating lever and is connected with its screw thread, the sliding plate is symmetrically arranged in the rotating lever both sides and is pasted with the sliding block side wall, the protection cover with the coating box side wall all is provided with first motor, the rotating lever passes through the protection cover with the coating box and is connected with corresponding the first motor output end, the sliding block bottom wall of upper end is provided with electric telescopic rod, the electric telescopic rod bottom wall is provided with target material, the sliding block upper side wall of lower end is provided with connecting box, the connecting box upper end is provided with rotary rod, the rotary rod upper end is provided with placing plate, the placing plate upper side wall four corners are provided with fixed plate, one end of the fixed plate is provided with spring, one end of the spring is provided with limit stop, the coating box side wall is provided with current device and vacuum device.

[0008] In order to enhance the controllability of coating process, the utility model improves that: the control platform upper side wall is provided with universal shaft, the universal shaft upper end is provided with operation screen, the operation screen is connected with the control platform signal.

[0009] In order to enhance the stability and carrying capacity of spring, the utility model improves that: the spring is provided with telescopic column, the telescopic column passes through the spring, one end of the telescopic column is connected with the limit stop, and the other end is connected with the fixed plate.

[0010] In order to effectively protect the substrate from scratching or damage, the utility model improves that: the limit stop inner side wall is provided with silica gel pad.

[0011] In order to increase the friction between the device and the ground, the utility model improves that: the base bottom wall four corners are all provided with placing pad, and the placing pad is made of silica gel material.

[0012] In order to realize the automatic rotation of the rotary rod, the utility model improves that: the connecting box is provided with second motor, and the rotary rod passes through the connecting box and is connected with the second motor output end.

[0013] In order to prevent the penetration of gas or impurities in the coating process, the utility model improves that: a sealing washer is arranged between the protection cover and the coating box.

[0014] In order to monitor and adjust the coating process in real time away from the coating site, the utility model improves: the control cabinet is internally provided with a remote control device.

[0015] (Three) beneficial effects

[0016] Compared with the prior art, the utility model provides a reliable magnetron sputtering coating device, has the following beneficial effects:

[0017] The reliable magnetron sputtering coating device is provided with an adjusting device, a first motor output drives a rotating rod to rotate, under the control of a sliding plate, a sliding block moves along with the rotation of the rotating rod, drives target material or base material to move, so that the relative position between the target material and the base material can be flexibly adjusted, not only satisfies the coating demand of different shapes and sizes of base material, but also improves the flexibility and precision of the coating process, the electric telescopic rod can accurately control the distance between the target material and the base material, thereby ensuring the stability and uniformity of the coating process, the spring and the limiting plate are arranged, different base materials are conveniently clamped, the stability of base material fixation is enhanced, the shaking and displacement in the coating process are avoided, the coating quality is improved, the introduction of the current device and the vacuum device provides necessary sputtering conditions and vacuum environment for the coating process. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is the first view angle schematic diagram of the utility model structure;

[0019] Figure 2 It is the second view angle schematic diagram of the utility model structure;

[0020] Figure 3 It is the internal element exploded view 1 of the coating box of the utility model structure;

[0021] Figure 4 It is the internal element exploded view 2 of the coating box of the utility model structure.

[0022] In the drawing: 1, coating box;2, base;3, first motor;4, protective cover;5, second motor;6, operation screen;7, control cabinet;8, universal shaft;9, placing pad;10, rotating rod;11, sliding plate;12, placing plate;13, electric telescopic rod;14, target material;15, sliding block;16, fixed plate;17, spring;18, limiting plate;19, telescopic column;20, rotating rod;21, connecting box. DETAILED DESCRIPTION

[0023] Clearly, the described embodiments are merely a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0024] Please refer to Figures 1-4 A reliable magnetron sputtering coating device, including base 2, console 7 and coating box 1, the console 7 on the base 2 side wall one end, the coating box 1 on the base 2 side wall the other end, the console 7 with the coating box 1 signal connection, the coating box 1 in the setting has no upper cavity, the coating box 1 upper wall is provided with the protection cover 4 that fits with it, the protection cover 4 with the cavity in all be provided with adjusting device, the adjusting device includes rotating rod 10, sliding block 15 and sliding plate 11, the rotating rod 10 passes through the protection cover 4 upper wall with the coating box 1 bottom wall, the sliding block 15 on the rotating rod 10 and with its threaded connection, the sliding plate 11 is symmetrically arranged on the rotating rod 10 both sides and with the sliding block 15 side wall fit, the protection cover 4 with the coating box 1 side wall all be provided with first motor 3, the rotating rod 10 passes through the protection cover 4 with the coating box 1 and with corresponding the first motor 3 output end connection, the sliding block 15 bottom wall of upper end is provided with electric telescopic rod 13, the electric telescopic rod 13 bottom wall is provided with target material 14, the sliding block 15 upper wall of lower end is provided with connecting box 21, the connecting box 21 upper end is provided with rotary rod 20, the rotary rod 20 upper end is provided with placing plate 12, the placing plate 12 upper wall four corners are provided with fixed plate 16, the fixed plate 16 one end is provided with spring 17, the spring 17 one end is provided with limit plate 18, the coating box 1 side wall is provided with current device and vacuum device, the console 7 upper wall is provided with universal shaft 8, the universal shaft 8 upper end is provided with operating screen 6, the operating screen 6 with the console 7 signal connection, the spring 17 is provided with telescopic column 19 in, the telescopic column 19 passes through the spring 17, the telescopic column 19 one end is connected with the limit plate 18, the other end is connected with the fixed plate 16, the connecting box 21 is provided with second motor 5 in, the rotary rod 20 passes through the connecting box 21 and with the second motor 5 output end connection.

[0025] In use, first, the substrate to be plated is placed on the upper side wall of the placement plate 12, ensuring that the substrate is stable and centered, at which time the spring 17 is retracted to drive the limiting plate 18 to move, and the telescopic column 19 is shortened, so that the substrate can be clamped and stably fixed on the placement plate 12. Then the protective cover 4 is covered, and the first motor 3 on the side wall of the plating box 1 is started through the operation screen 6 on the control console 7. The first motor 3 output drives the rotating rod 10 to rotate, and under the limiting of the sliding plate 11, the sliding block 15 moves with the rotation of the rotating rod 10, which can drive the target material 14 or the substrate to move in different directions. The upper sliding block 15 drives the target material 14 to move forward and backward, and the lower sliding block 15 drives the substrate to move horizontally. The telescopic extension of the electric telescopic rod 13 can fine-tune the vertical distance between the target material 14 and the substrate to meet the requirements of different plating thickness, position and uniformity. At the same time, the second motor 5 is started, and the second motor 5 output drives the rotating rod 20 to rotate, which can drive the placement plate 12 and the substrate thereon to rotate, so as to realize uniform plating. Then the vacuum device on the side wall of the plating box 1 is used to extract the air in the plating box 1 to achieve the required vacuum degree, so as to ensure the purity and quality of the plating process. The current device is started to provide the necessary electric field for the sputtering process. When the vacuum degree and electric field conditions are met, the plating program is started by operating the control console 7. The target material 14 is accelerated under the action of the electric field, and the atoms on its surface are sputtered to form a sputtering particle flow. The sputtering particle flow is uniformly deposited on the surface of the rotating substrate under the guidance of the electric field and vacuum environment to form the required plating layer. When the plating reaches the predetermined thickness or time, the plating program is stopped by operating the control console 7 using the operation screen 6, and the current device and vacuum device are turned off. After the plating box 1 restores to normal pressure, the protective cover 4 is opened, and the completed substrate is taken out.

[0026] In actual use, it is necessary to improve the stability of the substrate fixation and the plating effect. In order to meet the above requirements, in this embodiment, the inner side wall of the limiting plate 18 is provided with a silica gel pad.

[0027] In actual use, it is necessary to increase the friction between the device and the ground to prevent the device from sliding or shifting during work. In order to meet the above requirements, in this embodiment, the bottom wall of the base 2 is provided with a placement pad 9 at each corner, and the placement pad 9 is made of silica gel.

[0028] In actual use, it is necessary to prevent the infiltration of gas or impurities during plating to ensure the purity of the plating environment and the quality of the plating. In order to meet the above requirements, in this embodiment, a sealing washer is arranged between the protective cover 4 and the plating box 1.

[0029] In actual use, it is necessary to be able to remotely monitor and adjust the plating process. In order to meet the above requirements, in this embodiment, a remote control device is arranged in the control console 7.

[0030] In order to explain the possible application scenarios, technical principles, specific schemes that can be implemented, purposes and effects that can be achieved of the present application in detail, the specific embodiments listed below are combined with the drawings to be described in detail. The embodiments recorded in this paper are only used to more clearly illustrate the technical solutions of the present application, and therefore only serve as examples, but cannot limit the protection scope of the present application.

[0031] Although the embodiments of the present application have been shown and described, it can be understood by those of ordinary skill in the art that various changes, modifications, replacements and variations can be made to these embodiments without departing from the principles and spirits of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A reliable magnetron sputtering coating device comprising a base (2), a control console (7) and a coating chamber (1), characterized in that: The control console (7) is arranged at one end of the upper side wall of the base (2), and the coating box (1) is arranged at the other end of the upper side wall of the base (2); the control console (7) is in signal connection with the coating box (1); the coating box (1) is internally provided with a cavity without an upper side wall; the coating box (1) is provided with a protective cover (4) matched therewith on the upper side wall; the protective cover (4) and the cavity are both provided with adjusting devices; the adjusting devices comprise a rotating rod (10), a sliding block (15) and a sliding plate (11); the rotating rod (10) penetrates through the upper side of the protective cover (4) and the bottom wall of the coating box (1); the sliding block (15) is arranged on the rotating rod (10) and is in threaded connection with the rotating rod (10); the sliding plate (11) is symmetrically arranged on both sides of the rotating rod (10) and is in abutment with the side walls of the sliding block (15); the protective cover (4) and the coating box (1) are both provided with first motors (3) on the side walls; the rotating rod (10) penetrates through the protective cover (4) and the coating box (1) and is connected with the output ends of the corresponding first motors (3); the bottom wall of the upper sliding block (15) is provided with an electric telescopic rod (13); the bottom wall of the electric telescopic rod (13) is provided with a target material (14); the upper side wall of the lower sliding block (15) is provided with a connecting box (21); the upper end of the connecting box (21) is provided with a rotating rod (20); the upper end of the rotating rod (20) is provided with a placing plate (12); the upper side walls of the four corners of the placing plate (12) are provided with fixed plates (16); one end of each fixed plate (16) is provided with a spring (17); one end of the spring (17) is provided with a limiting plate (18); the coating box (1) is provided with current devices and vacuum devices.

2. A reliable magnetron sputter coater as claimed in claim 1, wherein: The upper side wall of the control console (7) is provided with a universal shaft (8); the upper end of the universal shaft (8) is provided with an operation screen (6); the operation screen (6) is in signal connection with the control console (7).

3. A reliable magnetron sputter coater as claimed in claim 2, wherein: The spring (17) is internally provided with a telescopic column (19); the telescopic column (19) penetrates through the spring (17); one end of the telescopic column (19) is connected with the limiting plate (18), and the other end of the telescopic column (19) is connected with the fixed plate (16).

4. A reliable magnetron sputter coater as claimed in claim 3, wherein: The inner side wall of the limiting plate (18) is provided with a silica gel pad.

5. A reliable magnetron sputter coater as claimed in claim 4, wherein: The bottom wall of the base (2) is provided with placing pads (9) at the four corners; the placing pads (9) are made of silica gel.

6. A reliable magnetron sputter coater as claimed in claim 5, wherein: The connecting box (21) is internally provided with a second motor (5); the rotating rod (20) penetrates through the connecting box (21) and is connected with the output end of the second motor (5).

7. A reliable magnetron sputter coater as claimed in claim 6, wherein: Sealing washers are arranged between the protective cover (4) and the coating box (1).

8. A reliable magnetron sputter coater as claimed in claim 7, wherein: The control console (7) is internally provided with a remote control device.