Irradiation optical system and exposure apparatus including same
By setting an aperture in the irradiation optical system of the exposure equipment and using a cooling component to compensate for the temperature, the problems of lens misalignment and reduced transmittance caused by temperature changes in the lens section were solved, thus improving the reliability of the equipment.
Patent Information
- Application Number
- CN202520203049.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Priority Date
- 2024-03-19
- Filing Date
- 2025-02-08
- Publication Date
- 2026-03-03
- Estimated Expiration
- 2035-02-08
AI Technical Summary
In existing exposure equipment, temperature changes in the lens section cause lens misalignment and reduced transmittance, affecting the reliability of the equipment.
In the illumination optical system of the exposure equipment, first and second apertures are set to block part of the light, and the temperature of the apertures is compensated by a cooling component to reduce the impact of heat on the support component and prevent lens misalignment and reduced transmittance.
By compensating for the temperature of the aperture, the temperature rise of the support components is reduced, preventing lens misalignment and reduced transmittance, thus improving the reliability of the lens section.
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Figure CN223966812U_ABST
Abstract
Description
Technical Field
[0001] This disclosure generally relates to illumination optical systems and exposure apparatuses including illumination optical systems. More specifically, this disclosure relates to illumination optical systems including temperature-compensated apertures and exposure apparatuses including illumination optical systems. Background Technology
[0002] Exposure equipment can be a device that transfers a pattern formed on a mask to a substrate or plate. Exposure equipment can also be a device that uses an illumination optics system to illuminate a mask and a projection optics system to transfer the pattern from the mask. For example, exposure equipment can be used to manufacture flat panel displays, semiconductor devices, or microelectromechanical systems (“MEMS”).
[0003] The light source for the exposure equipment can be a short-arc discharge lamp. The short-arc discharge lamp can be, for example, an ultra-high pressure mercury lamp. Light emitted from the light source can illuminate the mask through multiple lenses (e.g., condenser lenses, fly-eye lenses, etc.). Utility Model Content
[0004] The embodiment provides an illumination optical system with improved reliability of the lens section.
[0005] An embodiment provides an exposure apparatus including an illumination optical system.
[0006] An illumination optical system according to an embodiment of the present disclosure may include: a mirror portion for converging light; a light source portion disposed at a first focal point of the mirror portion and emitting light; a first aperture portion disposed at a second focal point of the mirror portion different from the first focal point, blocking a portion of the light converged at the plane of the second focal point and transmitting first light; a lens portion spaced apart from the mirror portion, wherein the first aperture portion is inserted between the mirror portion and the lens portion; a second aperture portion disposed between the first aperture portion and the lens portion, blocking a portion of the first light and transmitting second light; and a cooling member for compensating for the temperature of the second aperture portion.
[0007] In one embodiment, the lens portion may include: a first lens for receiving second light; and a support member for supporting the first lens. A second aperture may block a portion of the first light traveling from the second focal point toward the support member.
[0008] In one embodiment, the second light passing through the second aperture may not reach the support member.
[0009] In one embodiment, the light source may include a mercury lamp that emits ultraviolet light. The first diameter of the first aperture and the second diameter of the second aperture can satisfy the following formula:
[0010]
[0011] Wherein, d is the distance between the electrodes of the light source (mm), f1 is the distance between the intersection point of the imaginary line connecting the first focal point and the second focal point and the mirror part at that point and the first focal point, f2 is the distance between the second focal point and the above intersection point, and D1 is the first diameter (mm), D2 is the second diameter (mm), and D3 is the diameter of the first lens (mm).
[0012] In one embodiment, the lens portion may define an opening through which light exits and have a shape that is part of an ellipse, and the first and second apertures may be sequentially arranged along a direction parallel to the optical axis of the lens portion.
[0013] In this embodiment, the cooling component can further compensate for the temperature of the first aperture.
[0014] An exposure apparatus according to embodiments of the present disclosure may include: an illumination optical system for illuminating a mask with light emitted from a light source; and a projection optical system for projecting an image of a pattern of the mask onto a substrate. The illumination optical system may include: a mirror for converging light, defining an opening through which light exits, and having a shape that is partly elliptical; a light source disposed at a first focal point of the mirror and emitting light; a first aperture disposed at a second focal point of the mirror, different from the first focal point, blocking a portion of the light converged at the plane of the second focal point and transmitting the first light; a lens spaced apart from the mirror, wherein the first aperture is inserted between the mirror and the lens; a second aperture disposed between the first aperture and the lens, blocking a portion of the first light and transmitting the second light; and a cooling member thermally connected to the second aperture.
[0015] In one embodiment, the lens portion may include: a first lens for receiving second light; and a support member for supporting the first lens. A second aperture may block a portion of the first light traveling from the second focal point toward the support member.
[0016] In this embodiment, the first aperture and the second aperture can be arranged sequentially along a direction parallel to the optical axis of the lens.
[0017] In this embodiment, a cooling component can compensate for the temperature of the second aperture. The cooling component can be further thermally connected to the first aperture, and can further compensate for the temperature of the first aperture.
[0018] An illumination optical system according to an embodiment of the present disclosure may include: a mirror portion for converging light emitted from a light source portion; a first aperture for blocking a portion of the light converged by the mirror portion and transmitting first light; a second aperture for blocking a portion of the first light and transmitting second light; a lens portion spaced apart from the mirror portion, wherein the first and second apertures are inserted between the mirror portion and the lens portion; and a cooling member for compensating for the temperature of the second aperture. The lens portion may include a first lens and a support member supporting the first lens.
[0019] The second aperture can absorb the light from the first light that is traveling toward the support member. Correspondingly, the second light can be incident on the first lens and can be blocked from reaching the support member. Consequently, the temperature rise of the support member when the second light is incident on it can be reduced.
[0020] The cooling component can suppress the temperature rise of the second aperture. That is, the heat transferred from the light to the second aperture can be transferred to the cooling component. Correspondingly, the temperature of the second aperture can be compensated, and the temperature rise of the support component adjacent to the second aperture can be reduced. By compensating for the temperature rise of the second aperture, misalignment problems of the first lens or reduced transmittance of the first lens can be suppressed. In other words, the reliability of the lens section can be improved. Attached Figure Description
[0021] The illustrative, non-limiting embodiments will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings.
[0022] Figure 1 This is a side view illustrating an exposure apparatus according to an embodiment of the present disclosure.
[0023] Figure 2 It is a diagram. Figure 1 A view of an embodiment of an illumination optical system.
[0024] Figure 3 This is a view illustrating the optical path in an illumination optical system based on a comparative example.
[0025] Figure 4 yes Figure 2 A magnified view of region A.
[0026] Figure 5 It is a diagram. Figure 1 A view of another embodiment of the illumination optical system.
[0027] Figure 6 yes Figure 5 A magnified view of region B. Detailed Implementation
[0028] Embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. The inventive concept can be implemented with various modifications and has various forms. However, it should be understood that the present inventive concept is not intended to be limited to the specific forms disclosed; rather, it is intended to cover all modifications, equivalents, and substitutions falling within the spirit and scope of the present inventive concept. In the drawings, the same reference numerals are used for the same parts, and repeated descriptions of the same parts may be omitted.
[0029] In the accompanying drawings, the thickness, proportions, and dimensions of the components may be enlarged to effectively depict the technical content.
[0030] Figure 1 This is a side view illustrating an exposure apparatus according to an embodiment of the present disclosure.
[0031] refer to Figure 1 An exposure apparatus LTA according to embodiments of the present disclosure may include an illumination optics system 100, a projection optics system 300, and a stage STG. The exposure apparatus LTA may be a photolithography apparatus that uses light encompassing multiple wavelength ranges to illuminate a mask 200 and transfer a pattern of the mask 200 onto a substrate SUB. For example, the exposure apparatus LTA may be used to manufacture flat panel displays, semiconductor devices, or microelectromechanical systems (“MEMS”).
[0032] The illumination optical system 100 may include a light source 120 capable of emitting light (see Figure 2 Light can have multiple wavelength ranges. The illumination optical system 100 can use light to illuminate the mask 200.
[0033] The projection optical system 300 can project light onto a substrate SUB. The projection optical system 300 can also project an image of a pattern formed on a mask 200 onto the substrate SUB. The mask 200 can be disposed on the object plane of the projection optical system 200. The substrate SUB can be disposed on the image plane of the projection optical system 300. For example, the projection optical system 300 may include a plurality of projection mirrors that are reflective of light. The projection mirrors may include a first projection mirror PM1, a second projection mirror PM2, and a third projection mirror PM3. The third projection mirror PM3 may be disposed between the first projection mirror PM1 and the second projection mirror PM2.
[0034] Light passing through mask 200 can be reflected by the projection mirrors. Light from mask 200 can be reflected by the first projection mirror PM1, the second projection mirror PM2, and the third projection mirror PM3. For example, light from mask 200 can be reflected sequentially by the first projection mirror PM1, the second projection mirror PM2, the third projection mirror PM3, the second projection mirror PM2, and the first projection mirror PM1. Accordingly, the projection optical system 300 can form a projected image of mask 200 on the substrate SUB. When the projection optical system 300 is configured as a reflective optical system, the chromatic aberration of the light from the light source section 120 can be relatively small compared to when the projection optical system 300 is configured as a refractive optical system.
[0035] The substrate SUB can be disposed on the stage STG. Specifically, the substrate SUB can be mounted on the stage STG. The pattern of the mask 200 can be transferred to the substrate SUB that can be loaded onto the stage STG. The stage STG may include an upper surface for receiving the substrate SUB. The stage STG may include a flat upper surface. For example, the stage STG may include an electrostatic chuck for statically holding the substrate SUB by electrostatic force.
[0036] Figure 2 It is a diagram. Figure 1 A view of an embodiment of an illumination optical system.
[0037] Reference Figure 2 The illumination optical system 100 according to an embodiment of the present disclosure may include a mirror section 110, a light source section 120, a lens section 130, a first aperture 140, a second aperture 150, and a fly-eye lens section 160. The lens section 130 may include a first lens CDS1, a support member BAR, a second lens CDS2, and a third lens CDS3.
[0038] The light source 120 can emit light. The mirror 110 can focus the light emitted from the light source 120. The mirror 110 can define an opening through which the light emitted from the light source 120 can exit. The mirror 110 can have a focusing shape. In an embodiment, the mirror 110 can have a shape that is part of an ellipse. The light source 120 can be disposed at a first focal point F1. When the light source 120 is disposed at the first focal point F1, the mirror 110 can focus the light emitted from the light source 120 to a second focal point F2.
[0039] The light source 120 can be disposed at the first focal point F1 of the mirror 110. The light source 120 can emit light encompassing multiple wavelength ranges. For example, the light source 120 can emit broadband light. In an embodiment, the light source 120 may include a mercury lamp capable of emitting ultraviolet light. In this case, the light source 120 can emit light with multiple peak wavelengths (e.g., an i-line of approximately 365 nm, an h-line of approximately 405 nm, and a g-line of approximately 436 nm). The peak wavelengths can be visualized as spectral lines.
[0040] The first aperture 140 can be set at the second focal point F2 of the lens 110. The first aperture 140 can adjust the amount of transmitted light. Specifically, the first aperture 140 can block light converging toward the plane of the second focal point F2 (e.g., Figure 4 A portion of the converged light (CLT). In an embodiment, the first aperture 140 may absorb a portion of the converged light. For example, the first aperture 140 may block a portion of the converged light traveling toward the second aperture 150. Furthermore, the first aperture 140 may transmit a first ray of the converged light (e.g., Figure 4The first light (LT1). In this case, the first light can be defined as the light in the converging light that is not absorbed by the first aperture 140.
[0041] The second aperture 150 can be disposed between the first aperture 140 and the lens portion 130. The second aperture 150 can adjust the amount of transmitted light. Specifically, the second aperture 150 can block a portion of the first light passing through the first aperture 140. In an embodiment, the second aperture 150 can absorb a portion of the first light. Furthermore, the second aperture 150 can transmit a second light (e.g., ...) within the first light. Figure 4 The second light (LT2). In this case, the second light can be defined as the light in the first light that is not absorbed by the second aperture 150.
[0042] In some embodiments, the first aperture 140 and the second aperture 150 may be sequentially arranged along a direction parallel to the optical axis of the lens portion 130. In some embodiments, the optical axis of the lens portion 130 may be the same as the optical axis of the illumination optical system 100. In other words, the first aperture 140 and the second aperture 150 may be arranged on the same optical path of light traveling toward the lens portion 130. Light converged by the mirror portion 110 may be incident on the first aperture 140, and the first light passing through the first aperture 140 may be incident on the second aperture 150.
[0043] The illumination optical system 100 according to embodiments of the present disclosure may further include a cooling member 170 to compensate for the temperature of the second aperture 150. Reference herein to... Figure 4 Provide a detailed description.
[0044] In an embodiment, the illumination optical system 100 may include a first aperture 140 and a second aperture 150 disposed between the mirror portion 110 and the lens portion 130. However, the number of apertures included in the illumination optical system 100 is not limited thereto. For example, the illumination optical system 100 may further include a third aperture disposed between the first aperture 140 and the second aperture 150.
[0045] The lens portion 130 may be spaced apart from the mirror portion 110, wherein a first aperture 140 and a second aperture 150 are inserted between the lens portion 130 and the mirror portion 110. The lens portion 130 may include a first lens CDS1 and a support member BAR. The support member BAR may support the first lens CDS1.
[0046] The support member BAR can receive the first lens CDS1. For example, the support member BAR can be a rod-shaped retainer, an annular mounting bracket, a claw-shaped mounting bracket, or a component mounting bracket. The embodiments are not limited to the examples herein, and the support member BAR can be configured differently.
[0047] The first lens CDS1 can receive the second light passing through the second aperture 150. The first lens CDS1 can shape the second light into parallel light. The light shaped into parallel light by the first lens CDS1 can be incident on the fly-eye lens section 160.
[0048] The fly-eye lens section 160 may be spaced apart from the second aperture 150, wherein the first lens CDS1 is inserted between the fly-eye lens section 160 and the second aperture 150. The fly-eye lens section 160 may include a plurality of microlenses. The fly-eye lens section 160 may form a secondary light source from the light incident on the incident surface of the fly-eye lens section 160 at the exit surface of the fly-eye lens section 160.
[0049] Light emitted from the fly-eye lens section 160 can pass through the second lens CDS2 and the third lens CDS3, and can illuminate the mask 200. For example, the fly-eye lens section 160 can be referred to as an optical integrator.
[0050] Figure 3 This is a view illustrating the optical path in an illumination optical system based on a comparative example. Figure 4 yes Figure 2 A magnified view of region A. For example, Figure 4 This is a view illustrating the optical path in an illumination optical system 100 according to an embodiment of the present disclosure.
[0051] Reference Figure 3 According to the comparative example, the illumination optical system 100C may include a mirror section 110, a light source section 120, and a lens section 130. The lens section 130 may include a first lens CDS1 and a support member BAR supporting the first lens CDS1.
[0052] Except that the illumination optical system 100C does not include a first aperture and a second aperture that can be disposed between the mirror portion 110 and the lens portion 130, the illumination optical system 100C according to the comparative example can be compared with the reference. Figure 2 The described illumination optical system 100 is essentially the same.
[0053] A light source 120 disposed at a first focal point F1 of the mirror 110 can emit light. The mirror 110 can converge the light emitted from the light source 120 to a second focal point F2. In an embodiment, the light source 120 may include a mercury lamp that emits ultraviolet light. For example, the distance (or arc length) between the electrodes of the light source 120 may be approximately 10 millimeters, but this disclosure is not limited thereto. In this case, the converged light CLT focused by the mirror 110 may not be focused to a single point. In other words, the converged light CLT may form a converging plane at a certain distance from or near the second focal point F2. The converging plane may extend substantially perpendicular to the optical axis of the illuminating optical system 100C.
[0054] The converging light CLT can pass through the second focal point F2 and propagate towards the lens section 130. In this case, the converging light CLT can reach the first lens CDS1 and the support member BAR. When the converging light CLT is incident on the support member BAR, the temperature of the support member BAR may rise. When the temperature of the support member BAR rises, misalignment of the first lens CDS1 may occur. For example, misalignment of the first lens CDS1 may occur due to the difference in thermal expansion between the support member BAR and the first lens CDS1. Furthermore, when the temperature of the support member BAR rises, more foreign matter may be absorbed into the lens section 130, and the transmittance of the first lens CDS1 may decrease.
[0055] Reference Figure 4 An illumination optical system 100 according to an embodiment of the present disclosure may include a mirror section 110, a light source section 120, a lens section 130, a first aperture 140, a second aperture 150, and a cooling member 170. The lens section 130 may include a first lens CDS1 and a support member BAR supporting the first lens CDS1.
[0056] The light source 120 can be configured to emit light. The light source 120 can be disposed at the first focal point F1 of the mirror 110. The light source 120 disposed at the first focal point F1 of the mirror 110 can emit light. The mirror 110 can converge the light emitted from the light source 120 to a second focal point F2. The distance (or arc length) between the electrodes of the light source 120 can be approximately 10 mm, but this disclosure is not limited thereto. The converged light CLT converged by the mirror 110 may not be converged to a single point. In other words, the converged light CLT can form a converging plane at a certain distance from or near the second focal point F2. The converging plane can extend substantially perpendicular to the optical axis of the illuminating optical system 100.
[0057] A portion of the converging light CLT can be incident from the second focal point F2 onto the first aperture 140. The first aperture 140 can absorb a portion of the converging light CLT. The portion of the converging light CLT absorbed by the first aperture 140 can be excluded from illuminating the mask 200 (see...). Figure 2 The light illuminating the mask 200 is absorbed by the first aperture 140. In other words, the portion of the converging light CLT absorbed by the first aperture 140 may not contribute to the illuminance of the light illuminating the mask 200. Correspondingly, even if a portion of the converging light CLT is absorbed by the first aperture 140, the illuminance of the light illuminating the mask 200 can be substantially guaranteed. For example, the first diameter D1 of the first aperture 140 can be approximately 50 mm to approximately 60 mm. However, the first diameter D1 of the first aperture 140 is not limited to this.
[0058] The first aperture 140 can transmit the first light LT1 portion of the converging light CLT. In this case, the first light LT1 can be defined as the light in the converging light CLT that is not absorbed by the first aperture 140.
[0059] The first light LT1 passing through the first aperture 140 can be incident on the second aperture 150. The second aperture 150 can absorb a portion of the first light LT1. The portion of the first light LT1 absorbed by the second aperture 150 can contribute almost no to the illuminance of the light illuminating the mask 200. Accordingly, even if a portion of the first light LT1 is absorbed by the second aperture 150, the illuminance of the light illuminating the mask 200 can be substantially guaranteed. For example, the second diameter D2 of the second aperture 150 can be approximately 60 mm. However, the second diameter D2 of the second aperture 150 is not limited to this.
[0060] In this embodiment, the second aperture 150 can absorb a portion of the light in the first light LT1 that travels toward the support member BAR. In other words, the second aperture 150 can absorb a first portion of the light in the first light LT1 that would otherwise be incident on the support member BAR if not absorbed. The second aperture 150 can transmit a second portion of the light in the first light LT1 that travels toward the first lens CDS1.
[0061] The second aperture 150 can transmit a portion of the second light LT2 from the first light LT1. In this case, the second light LT2 can be defined as the light in the first light LT1 that is not absorbed by the second aperture 150. Furthermore, the second light LT2 can refer to the light traveling toward the first lens CDS1.
[0062] The second light LT2 passing through the second aperture 150 can travel towards the lens section 130. In this case, the second light LT2 can be incident on the first lens CDS1. That is, the second light LT2 can be blocked and essentially cannot reach the support member BAR. In other words, since the second aperture 150 can absorb the light from the first light LT1 traveling towards the support member BAR, the amount of light incident on the support member BAR can be reduced. For example, less than about 10% of the second light LT2 can be incident on the support member BAR. In another example, less than about 5% of the second light LT2 can be incident on the support member BAR. In yet another example, less than 1% of the second light LT2 can be incident on the support member BAR. Accordingly, the temperature rise of the support member BAR when the second light LT2 is incident on the support member BAR can be reduced. As a result, misalignment problems of the first lens CDS1 or problems of reduced transmittance of the first lens CDS1 can be suppressed or prevented. In other words, the reliability of the lens section 130 can be improved.
[0063] In an embodiment, the first diameter D1 of the first aperture 140 and the second diameter D2 of the second aperture 150 can satisfy the following formula 1.
[0064] [Formula 1]
[0065]
[0066] In Formula 1, d is the distance between the electrodes of the light source section 120, and the unit is millimeters (mm). f1 is the distance between the intersection point IP of the imaginary line connecting the first focal point F1 and the second focal point F2 and the mirror section 110, and the first focal point F1. f2 is the distance between the second focal point F2 and the intersection point IP. D1 is the first diameter D1 of the first aperture 140, and the unit is millimeters (mm). D2 is the second diameter D2 of the second aperture 150, and the unit is millimeters (mm). D3 is the diameter of the first lens CDS1, and the unit is millimeters (mm).
[0067] For example, when d is approximately 10 mm, f1 is approximately 150 mm, and f2 is approximately 900 mm, the first diameter D1 of the first aperture 140 and the second diameter D2 of the second aperture 150 can satisfy the following formula 2.
[0068] [Formula 2]
[0069] 49.8≤D1≤D2≤60
[0070] In this case, the first diameter D1 of the first aperture 140 can be approximately 50 mm, and the second diameter D2 of the second aperture 150 can be approximately 60 mm, but this disclosure is not limited thereto.
[0071] The second aperture 150 can be positioned adjacent to the lens portion 130. For example, the spacing SPD between the second aperture 150 and the support member BAR can be approximately 30 mm. Since the second aperture 150 and the lens portion 130 are adjacent to each other, an increase in the temperature of the second aperture 150 may affect the lens portion 130. Specifically, since the second aperture 150 can absorb light traveling toward the support member BAR from the first light LT1, the temperature of the second aperture 150 may increase, and this increase in temperature may affect the lens portion 130.
[0072] To suppress or prevent temperature rise in the second aperture 150, the illumination optical system 100 according to embodiments of the present disclosure may include a cooling member 170. The cooling member 170 may compensate for the temperature of the second aperture 150. For example, the cooling member 170 may be thermally connected to the second aperture 150 and may transfer heat away from the second aperture 150. Heat transferred by light to the second aperture 150 may be transferred to the cooling member 170, which has a relatively lower temperature than the second aperture 150. Accordingly, the temperature of the second aperture 150 may be compensated, and the temperature rise of the support member BAR adjacent to the second aperture 150 may be further reduced. For example, the cooling member 170 may include a Peltier element. In the case of a Peltier element, the cooling member 170 may be mounted on the second aperture 150. For example, the cooling member 170 may include a cooling water supply pipe through which cooling water flows. The cooling water supply pipe may be disposed on a portion of the second aperture 150 and may provide a thermal connection for transferring heat away from the second aperture 150. However, this disclosure is not limited thereto, and the cooling member 170 may include various cooling means known in the art. In an embodiment, the cooling member 170 may compensate for the temperature of the second aperture 150 and the temperature of the lens portion 130.
[0073] In this embodiment, the cooling member 170 can compensate for the temperature of the first aperture 140 and the second aperture 150. For example, the cooling member 170 can be thermally connected to the first aperture 140 and the second aperture 150, and can transfer heat away from the first aperture 140 and the second aperture 150. Since the first aperture 140 absorbs a portion of the converging CLT, the temperature of the first aperture 140 may rise due to the absorbed portion of the converging CLT. The heat transferred to the first aperture 140 can be transferred to the cooling member 170, which has a relatively lower temperature than the first aperture 140. Accordingly, the temperature of the first aperture 140 can be compensated, and the temperature rise of the second aperture 150 adjacent to the first aperture 140 can be reduced.
[0074] The following text will refer to Table 1. Figure 3 and Figure 4 To describe the example effects of this disclosure.
[0075] A first light quantity, a second light quantity, and a third light quantity are given as measurements of the illumination optical system satisfying Comparative Examples 1, 2, 3, 4, 5, and 6. The first light quantity is defined as the amount of light absorbed by the second aperture 150. The second light quantity is defined as the amount of light incident on the support member BAR. The third light quantity is defined as the amount of light absorbed by the illumination mask (200, see...) Figure 2The amount of light. The distance (or arc length) between the electrodes of the light source section 120 is approximately 10 mm. The distance f1 between the intersection point IP of the imaginary line connecting the first focal point F1 and the second focal point F2 and the mirror section 110 at that point and the first focal point F1 is approximately 150 mm. The distance f2 between the second focal point F2 and the intersection point IP is approximately 900 mm. The diameter D3 of the first lens CDS1 is approximately 80 mm.
[0076] Illumination optical systems that satisfy Examples 1, 2, and 3 (e.g., Figure 4 The illumination optical system 100 includes a first aperture 140 and a second aperture 150 disposed between the mirror portion 110 and the lens portion 130. The first aperture 140 and the second aperture 150 absorb corresponding portions of light. The first aperture 140 has a first diameter D1 of approximately 50 mm. The second aperture 150 has a second diameter D2 of approximately 60 mm. In the illumination optical system satisfying Example 1, the spacing distance SPD between the second aperture 150 and the support member BAR is approximately 30 mm. In the illumination optical system satisfying Example 2, the spacing distance SPD between the second aperture 150 and the support member BAR is approximately 40 mm. In the illumination optical system satisfying Example 3, the spacing distance SPD between the second aperture 150 and the support member BAR is approximately 50 mm.
[0077] Illumination optical systems that satisfy Examples 4, 5, and 6 (e.g., Figure 4 The illumination optical system 100 includes a first aperture 140 and a second aperture 150 disposed between the mirror portion 110 and the lens portion 130. The first aperture 140 and the second aperture 150 absorb corresponding portions of light. The first aperture 140 has a first diameter D1 of approximately 60 mm. The second aperture 150 has a second diameter D2 of approximately 60 mm. In the illumination optical system satisfying Example 4, the spacing distance SPD between the second aperture 150 and the support member BAR is approximately 30 mm. In the illumination optical system satisfying Example 5, the spacing distance SPD between the second aperture 150 and the support member BAR is approximately 40 mm. In the illumination optical system satisfying Example 6, the spacing distance SPD between the second aperture 150 and the support member BAR is approximately 50 mm.
[0078] The illumination optical system that meets the comparison example (e.g., Figure 3 The illumination optical system 100C does not include a first aperture 140 and a second aperture 150 that can be disposed between the mirror part 110 and the lens part 130.
[0079] As a result, referring to Table 1 below, compared with the illumination optical system that satisfies the comparative examples, the amount of light incident on the support member BAR can be relatively reduced in the illumination optical systems that satisfy Examples 1, 2, 3, 4, 5 and 6.
[0080] Furthermore, compared to the illumination optical system that satisfies the comparative examples, the amount of light illuminating the mask 200 can be substantially guaranteed in the illumination optical systems that satisfy Examples 1, 2, 3, 4, 5, and 6.
[0081] [Table 1]
[0082]
[0083] These results show that by absorbing a portion of the light through the first aperture 140 and the second aperture 150 disposed between the mirror portion 110 and the lens portion 130, the illumination optical system 100 can reduce the temperature rise of the support member BAR without significantly reducing the illuminance of the illumination mask 200.
[0084] Figure 5 It is a diagram. Figure 1 A view of another embodiment of the illumination optical system. Figure 6 yes Figure 5 A magnified view of region B. For example, Figure 6 This is a view illustrating the optical path in an illumination optical system 100' according to another embodiment of the present disclosure.
[0085] Reference Figure 5 and Figure 6 According to another embodiment of the present disclosure, the illumination optical system 100' may include a mirror section 110, a light source section 120, a lens section 130, a first aperture 140', a second aperture 150', and a fly-eye lens section 160. The lens section 130 may include a first lens CDS1, a support member BAR, a second lens CDS2, and a third lens CDS3.
[0086] The illumination optical system 100' can be compared with the above reference. Figure 2 and Figure 4 The illumination optical system 100 described is substantially the same. In the illumination optical system 100', the first aperture 140' and the second aperture 150' reflect corresponding portions of the light. In the following text, references may be omitted or summarized. Figure 2 and Figure 4 The description of the illumination optical system 100 is repeated.
[0087] A light source 120, positioned at the first focal point F1 of the mirror 110, can emit light. The mirror 110 can converge the light emitted from the light source 120 to a second focal point F2. The converged light CLT, converged by the mirror 110, may not converge to a single point. In other words, the converged light CLT may form a converging plane at or near the second focal point F2. The converging plane may extend substantially perpendicular to the optical axis of the illuminating optical system 100'.
[0088] The first aperture 140' can be set at the second focal point F2 of the mirror 110. The converging light CLT can enter the first aperture 140' from the second focal point F2. The first aperture 140' can adjust the amount of light transmitted through it. Specifically, the first aperture 140' can block a portion of the light converging at the plane of the second focal point F2. In an embodiment, the first aperture 140' can reflect a portion of the converging light CLT. The portion of the converging light CLT reflected by the first aperture 140' can be light that is not used to illuminate the mask 200. In other words, the portion of the converging light CLT reflected by the first aperture 140' can not contribute to the illuminance of the light illuminating the mask 200. Accordingly, even if a portion of the converging light CLT is reflected by the first aperture 140', the illuminance of the light illuminating the mask 200 can be substantially guaranteed. Figure 6 The first reflected light RLT1 can be defined as the light reflected from the first aperture 140' in the converging light CLT.
[0089] Furthermore, the first aperture 140' can transmit a portion of the first light LT1 of the converging light CLT. In this case, the first light LT1 can be defined as the light in the converging light CLT that is not reflected by the first aperture 140'.
[0090] The first light LT1 passing through the first aperture 140' can be incident on the second aperture 150'. The second aperture 150' can be positioned between the first aperture 140' and the lens portion 130. The second aperture 150' can adjust the amount of transmitted light. Specifically, the second aperture 150' can block a portion of the first light LT1 passing through the first aperture 140'. In an embodiment, the second aperture 150' can reflect a portion of the first light LT1. The portion of the first light LT1 reflected by the second aperture 150' can substantially contribute no to the illuminance of the light illuminating the mask 200. Accordingly, even if a portion of the first light LT1 is reflected by the second aperture 150', the illuminance of the light illuminating the mask 200 can be substantially guaranteed. Figure 6 The second reflected light RLT2 can be defined as the light reflected from the second aperture 150' in the first light LT1.
[0091] In this embodiment, the second aperture 150' can reflect the light in the first light LT1 that travels toward the support member BAR. In other words, the second aperture 150' can reflect the light traveling toward the support member BAR and can transmit the light in the first light LT1 that travels toward the first lens CDS1.
[0092] The second aperture 150' can transmit the second light LT2 within the first light LT1. In this case, the second light LT2 can be defined as the light within the first light LT1 that is not reflected by the second aperture 150'. Furthermore, the second light LT2 can refer to the light traveling toward the first lens CDS1.
[0093] The second light LT2, passing through the second aperture 150', can propagate towards the lens section 130. In this case, the second light LT2 can be incident on the first lens CDS1. That is, a small portion of the second light LT2 may reach the support member BAR. In other words, since the second aperture 150' may reflect the light from the first light LT1 that is traveling towards the support member BAR, the amount of light incident on the support member BAR can be reduced. Accordingly, the temperature rise of the support member BAR when the second light LT2 is incident on the support member BAR can be reduced. As a result, misalignment problems of the first lens CDS1 or problems of reduced transmittance of the first lens CDS1 can be suppressed or prevented. In other words, the reliability of the lens section 130 can be improved.
[0094] The second aperture 150' can be disposed adjacent to the lens portion 130. For example, the distance between the second aperture 150' and the support member BAR can be approximately 30 mm. Since the second aperture 150' and the lens portion 130 are adjacent to each other, an increase in the temperature of the second aperture 150' may affect the lens portion 130.
[0095] In another embodiment of the illumination optical system 100' according to this disclosure, a first aperture 140' and a second aperture 150' can reflect light. When the second aperture 150' reflects light traveling toward the support member BAR, since the second aperture 150' does not absorb light, the temperature rise of the second aperture 150' can be relatively small. Because the temperature rise of the second aperture 150' can be small, the impact on the lens portion 130 adjacent to the second aperture 150' can be small.
[0096] Furthermore, according to another embodiment of the present disclosure, the illumination optical system 100' may include a cooling member 170 for compensating for the temperature of the second aperture 150' and for suppressing temperature rise in the second aperture 150'. Heat transferred to the second aperture 150' can be transferred to the cooling member 170, which has a relatively lower temperature than the second aperture 150'. Accordingly, the temperature of the second aperture 150' can be compensated, and the temperature rise of the support member BAR adjacent to the second aperture 150' can be reduced. In this embodiment, the cooling member 170 can compensate for the temperature of the second aperture 150' and also compensate for the temperature of the lens portion 130.
[0097] In this embodiment, the cooling component 170 can compensate for the temperature of the first aperture 140' and the second aperture 150'.
[0098] Various aspects of this disclosure can be applied to exposure equipment used in the manufacture of display devices or semiconductor devices. For example, this disclosure applies to a variety of display devices, such as display devices for vehicles, ships and aircraft, portable communication devices, display devices for exhibitions or information transmission, or medical display devices.
[0099] The foregoing description is an illustration of embodiments of this disclosure and should not be construed as limiting it. Although embodiments have been described with reference to the accompanying drawings, those skilled in the art will readily understand that many changes and modifications can be made to the embodiments without departing from the spirit and scope of this disclosure as defined in the claims.
Claims
1. An illumination optical system, comprising: The mirror section focuses light. A light source is disposed at the first focal point of the mirror and emits the light. The first aperture is set at a second focal point on the lens, which is different from the first focal point, to block a portion of the light that converges at the plane of the second focal point and to transmit the first light. A lens portion, spaced apart from the mirror portion, wherein the first aperture is inserted between the mirror portion and the lens portion; The second aperture is disposed between the first aperture and the lens portion, blocking a portion of the first light and transmitting the second light; as well as Cooling components compensate for the temperature of the second aperture.
2. The illumination optical system according to claim 1, wherein, The lens portion includes: A first lens receives the second light; and A support member supports the first lens, and The second aperture blocks a portion of the first light that travels from the second focal point toward the support member.
3. The illumination optical system according to claim 2, wherein, The second light passing through the second aperture does not reach the support member.
4. The illumination optical system according to claim 2, in, The light source includes a mercury lamp that emits ultraviolet light, and Wherein, the first diameter of the first aperture and the second diameter of the second aperture satisfy the following formula: Where d is the distance between the electrodes of the light source section. f1 is the distance between the point where the imaginary line connecting the first focal point and the second focal point intersects the mirror portion and the first focal point. f2 is the distance between the second focus and the intersection point, and D1 is the first diameter, D2 is the second diameter, and D3 is the diameter of the first lens.
5. The illumination optical system according to any one of claims 1 to 4, wherein, The mirror portion defines the opening through which the light exits and has a shape that is partly elliptical. The first aperture and the second aperture are arranged sequentially along a direction parallel to the optical axis of the lens portion.
6. The illumination optical system according to any one of claims 1 to 4, wherein, The cooling component further compensates for the temperature of the first aperture.
7. An exposure apparatus, comprising: An irradiation optical system illuminates a mask with light emitted from a light source. as well as A projection optics system projects an image of the mask pattern onto a substrate. The illumination optical system includes: The mirror section converges the light, defines the light through its exit opening, and has a shape that is part of an ellipse; The light source is positioned at the first focal point of the mirror and emits the light. The first aperture is set at a second focal point on the lens, which is different from the first focal point, to block a portion of the light that converges at the plane of the second focal point and to transmit the first light. A lens portion, spaced apart from the mirror portion, wherein the first aperture is inserted between the mirror portion and the lens portion; A second aperture is disposed between the first aperture and the lens portion, blocking a portion of the first light and transmitting second light; and The cooling component is thermally connected to the second aperture.
8. The exposure apparatus according to claim 7, wherein, The lens portion includes: A first lens receives the second light; and A support member supports the first lens, and The second aperture blocks a portion of the first light that travels from the second focal point toward the support member.
9. The exposure apparatus according to claim 7 or 8, wherein, The first aperture and the second aperture are arranged sequentially along a direction parallel to the optical axis of the lens portion.
10. The exposure apparatus according to claim 7 or 8, wherein, The cooling component compensates for the temperature of the second aperture, and The cooling component is further thermally connected to the first aperture, and the cooling component further compensates for the temperature of the first aperture.