Physical vapor deposition machine

Abstract

The utility model provides a physical vapor deposition machine table, which comprises a shell provided with an opening; the top cover covers the opening and is used for sealing the shell; and the at least one lifting mechanism is arranged on the side, close to the shell, of the top cover and used for driving the top cover to move in the direction close to or away from the shell in the first direction. The lifting mechanism is arranged at the bottom of the top cover, when the top cover is disassembled, the lifting mechanism is started to move to jack up the top cover, and then the top cover is separated from the shell, so that the difficulty in disassembling the top cover is reduced, the efficiency of disassembling the top cover is improved, the maintenance downtime of the deposition machine is shortened, and the yield of the deposition machine is improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor equipment technology, specifically to a physical vapor deposition machine. Background Technology

[0002] Physical vapor deposition (PVD) refers to a technique that uses physical methods under vacuum conditions to vaporize the surface of a material source into gaseous atoms or molecules, or partially ionize them into ions, and then deposits a thin film with a specific function on the substrate surface through a low-pressure gas (or plasma) process.

[0003] Figure 1 A schematic diagram of a physical vapor deposition (PVD) stage is shown. (For example...) Figure 1 As shown, the reaction chamber of a physical vapor deposition (PVD) system includes a base 10 for placing the wafer, a top cover 20, and a baffle 30 located between the base 10 and the top cover 20. In PVD, a pre-cleaning process is typically performed before the actual deposition to remove oxides from the wafer surface. This pre-cleaning process involves introducing argon gas into the chamber, which is then ionized. The ionized argon ions, under a negative bias, reach the wafer surface and bombard the oxides. The top cover 20 and the baffle 30 are used to block the incoming oxides. However, as the deposition system accumulates long operating times, the blocking ability of the top cover 20 and the baffle 30 weakens, necessitating replacement to maintain this ability. Therefore, these components require regular replacement and maintenance. Maintaining the top cover 20 requires disassembling it and replacing it with a new, maintained one. However, the current top cover 20 is heavy and difficult to disassemble, resulting in excessive downtime for maintenance and impacting the deposition system's throughput. Utility Model Content

[0004] To address the problems in the existing technology, the purpose of this utility model is to provide a physical vapor deposition machine with an internal disassembly mechanism to assist in disassembling the top cover, thereby reducing the difficulty of disassembling the top cover.

[0005] This utility model embodiment provides a physical vapor deposition (PVD) machine, comprising:

[0006] The casing has an opening;

[0007] A top cover is provided over the opening to seal the housing;

[0008] At least one lifting mechanism is provided on the side of the top cover near the housing, for driving the top cover to move in a first direction toward or away from the housing.

[0009] In some embodiments, the lowering mechanism includes a rotating shaft, a first gear, a rack, and a guide rail. The first gear is rotatably mounted on a first end of the rotating shaft. The rack is slidably connected to the guide rail along a first direction, and the first gear is meshed with the rack. When the rotating shaft rotates around a second direction, it drives the first gear to rotate, and the first gear drives the rack to move along the first direction. When the rack moves to a first position, the rack is connected to the top cover.

[0010] In some embodiments, the lifting mechanism further includes a second gear rotatably fitted onto the second end of the rotating shaft.

[0011] In some embodiments, the lifting mechanism further includes a motor for driving the rotating shaft to rotate around the second direction.

[0012] In some embodiments, the lifting mechanism includes a cylinder, the cylinder including a cylinder barrel, a piston and a piston rod, the piston being configured to drive the piston rod to move along the first direction toward or away from the cylinder barrel; when the piston rod moves to the first position, the piston rod is connected to the top cover.

[0013] In some embodiments, a physical vapor deposition machine has a plurality of lifting mechanisms evenly arranged along the circumference of the top cover.

[0014] In some embodiments, the top cover includes a cover body and a contact portion. The cover body protrudes outward in a direction away from the housing, and the contact portion is located on the side of the cover body near the housing and extends outward in an axial direction away from the cover body. When the moving end of the lifting mechanism is in the first position, it is connected to the contact portion.

[0015] In some embodiments, the contact portion is an annular or arc-shaped structure.

[0016] In some embodiments, a fastener is also included for securing the top cover to the housing.

[0017] In some embodiments, the housing has a through hole on the side near the top cover, and the moving end of the lifting mechanism extends into the through hole and connects to the top cover.

[0018] The physical vapor deposition equipment provided by this invention has the following advantages:

[0019] By using a lifting mechanism to move the top cover away from the housing, the top cover can be disassembled, reducing the difficulty of disassembling the top cover, improving the efficiency of disassembly, reducing downtime during sedimentation machine maintenance, and increasing the output of the sedimentation machine. Attached Figure Description

[0020] Other features, objects, and advantages of this invention will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings.

[0021] Figure 1 This is a schematic diagram of a physical vapor deposition (PVD) machine.

[0022] Figure 2 This is a schematic diagram of the connection between the top cover and the shell in the prior art;

[0023] Figure 3 This is a schematic diagram of the connection between the top cover and the housing of a physical vapor deposition machine provided in an embodiment of the present invention;

[0024] Figure 4 This is a schematic diagram showing the separation of the top cover and the shell of a physical vapor deposition machine provided in an embodiment of the present invention;

[0025] Figure 5 This is a schematic diagram of a lifting mechanism provided in an embodiment of the present invention.

[0026] Figure label:

[0027] 10. Base; 20. Top cover; 21. Cover body; 22. Contact part; 30. Baffle; 40. Fixing component; 50. Housing; 51. Through hole; 60. Lifting mechanism; 61. Rotating shaft; 62. First gear; 63. Rack; 64. Guide rail; 65. Second gear. Detailed Implementation

[0028] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this application will be thorough and complete, and will fully convey the concept of the exemplary embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and therefore repeated descriptions of them will be omitted.

[0029] In this application, the terms "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics represented in connection with that embodiment or example, which are included in at least one embodiment or example of this application. Furthermore, the specific features, structures, materials, or characteristics represented may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate different embodiments or examples represented in this application, as well as features of different embodiments or examples.

[0030] Furthermore, the terms "first" and "second" are used for illustrative purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the representation of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0031] Figure 2 This is a schematic diagram of the connection between the top cover and the shell in the prior art. For example... Figure 2 As shown, the top cover 20' is fixed above the housing 50' by the fixing device 40'. Therefore, when replacing the top cover 20', the fixing device 40' and the top cover 20' must first be removed from the top of the housing 50'. However, the top cover 20' is quite heavy, making it difficult to disassemble manually. Furthermore, because the inner wall of the top cover 20' is constantly placed in a high-vacuum chamber, the top cover 20' and the fixing device adhere to the housing 50', and even if the high-vacuum chamber is filled with gas to reach atmospheric conditions, it is not easy to separate the top cover 20' and the fixing device 40' from the housing 50' in a timely manner. Therefore, in the prior art, disassembling the top cover 20' is difficult and inefficient, resulting in long downtime for deposition equipment maintenance and affecting the production output of the deposition equipment.

[0032] To address the problems in the prior art, this utility model provides a physical vapor deposition (PVD) machine, comprising: a housing with an opening; a top cover covering the opening to seal the housing; and at least one lifting mechanism located on the side of the top cover near the housing, for moving the top cover along a first direction toward or away from the housing. In this application, by providing a lifting mechanism below the top cover, the lifting mechanism can move the top cover away from or away from the housing along the first direction. When disassembling the top cover, only the lifting mechanism needs to be operated to separate the top cover from the housing, reducing the difficulty of disassembling the top cover, improving the efficiency of disassembly, reducing downtime of the deposition machine, and increasing the output of the deposition machine.

[0033] The structure of the physical vapor deposition (PVD) rig in a specific embodiment is described below with reference to the accompanying drawings. It is understood that the drawings and the following description are merely illustrative and not intended to limit the scope of protection of this application.

[0034] like Figure 3 and Figure 4As shown, one embodiment of this utility model provides a physical vapor deposition (PVD) machine, including a top cover 20, a housing 50, and at least one lifting mechanism 60. In this embodiment, two lifting mechanisms 60 are provided, symmetrically arranged along the central axis of the top cover 20. Specifically, the housing 50 has an opening, and the top cover 20 covers the opening to close the housing 50. The lifting mechanism 60 is located on the side of the top cover 20 near the housing 50, and is used to move the top cover 20 in a first direction toward or away from the housing 20. Here, the first direction is the up-down direction as seen on paper. When the lifting mechanism 60 moves the top cover 20 away from the housing 50, the top cover 20 is removed from above the housing 50.

[0035] The lifting mechanism 60 is used to move the top cover 20 away from the housing 50, thereby disassembling the top cover 20. This reduces the difficulty of disassembling the top cover 20, improves the efficiency of disassembling the top cover 20, reduces downtime during sedimentation machine maintenance, and increases the output of the sedimentation machine.

[0036] Specifically, such as Figure 5 As shown, in one embodiment, the lifting mechanism 60 includes a rotating shaft 61, a first gear 62, a rack 63, and a guide rail 64. The first gear 62 is rotatably mounted on the first end of the rotating shaft 61. The rack 63 is slidably connected to the guide rail 64 along a first direction, and the first gear 62 is meshed with the rack 63. When the rotating shaft 61 rotates around a second direction, it drives the first gear 62 to rotate, and the first gear 62 drives the rack 63 to move along the first direction. When the rack 63 moves to the first position, the rack 63 connects with the top cover 20, and then the rack 63 drives the top cover 20 to move along the first direction, separating the top cover 20 from the housing 50, thus achieving the disassembly of the top cover 20. It should be noted that the second direction is the left-right direction as seen on paper, and the second direction is perpendicular to the first direction. It should also be noted that the rack 63 can contact the top cover 20 before moving, at which point the first position is zero; or, the rack 63 can move to a certain position before contacting the top cover 20, at which point the first position is a distance greater than zero. The specific first position can be set according to actual needs; no specific restrictions are imposed here.

[0037] Furthermore, such as Figure 5 As shown, the lifting mechanism 60 also includes a second gear 65, which is rotatably sleeved on the second end of the rotating shaft 61. By setting the second gear 65, the second gear 65 can be manually rotated, thereby driving the rotating shaft 61 to rotate in the second direction, so as to realize the manual removal of the top cover 20. The manual removal of the top cover 20 using the lifting mechanism 60 is less difficult and more efficient than removing the top cover 20 from the top.

[0038] Furthermore, in some embodiments, the lifting mechanism 60 also includes a motor (not shown) for driving the rotating shaft 61 to rotate around the second direction. By using a motor to rotate the rotating shaft 61, the lifting mechanism 60 can achieve automated operation, thereby enabling automated disassembly of the top cover 20 and improving the efficiency of disassembling the top cover 20.

[0039] Furthermore, in some embodiments, the lifting mechanism 60 includes a cylinder (not shown in the figure), which includes a cylinder barrel, a piston, and a piston rod. The piston is configured to drive the piston rod to move along a first direction toward or away from the cylinder barrel. When the piston rod moves to the first position, the piston rod connects with the top cover 20, and then the piston rod drives the top cover 20 to move along the first direction, separating the top cover 20 from the housing 50, thereby disassembling the top cover 20. It should be noted that the piston rod may contact the top cover 20 before moving, in which case the first position is zero; or, the piston rod may move a certain position before contacting the top cover 20, in which case the first position is a distance greater than zero. The specific first position can be set according to actual needs, and no specific limitation is made here.

[0040] Furthermore, in some other embodiments, a plurality of lifting mechanisms 60 are evenly arranged along the circumference of the top cover 20. By evenly arranging the lifting mechanisms 60 along the circumference of the top cover 20, the force on each part is evenly distributed when the top cover 20 is disassembled, preventing the top cover 20 from deforming during disassembly; by increasing the number of lifting mechanisms 60, the efficiency of disassembling the top cover 20 can be further improved.

[0041] Furthermore, such as Figure 3 and Figure 4 As shown, in this embodiment, the top cover 20 includes a cover body 21 and a contact portion 22. The cover body 21 protrudes outward in a direction away from the housing 50, and the contact portion 22 is located on the side of the cover body 21 near the housing 50 and extends outward in an axial direction away from the cover body 21. The contact portion 22 is fixedly connected to the housing 50 by a fastener 40. When the moving end of the lifting mechanism 60 is in the first position, it connects with the contact portion 22. By providing the contact portion 22, it is convenient to fix the top cover 20 to the housing 50, and to facilitate the connection between the moving end of the lifting mechanism 60 and the top cover 20.

[0042] Furthermore, the contact portion 22 can be a ring-shaped or arc-shaped structure, which can be set according to actual needs, and no specific restrictions are made here.

[0043] Furthermore, such as Figure 3 and Figure 4 As shown, the deposition equipment also includes a fixing member 40 for securing the top cover 40 to the housing 50. The fixing member 40 securely fixes the top cover 40, preventing risks such as falling or shifting.

[0044] Furthermore, such as Figure 3 and Figure 4 As shown in the figure, in this embodiment, the housing 50 has a through hole 51 on the side near the top cover 20, and the moving end of the lifting mechanism 60 extends into the through hole 51 and connects with the top cover 20. The specific connection method between the top covers 20 and the top cover 20 is not limited to that shown in the figure, and can be set according to actual needs.

[0045] In summary, the physical vapor deposition equipment provided by this utility model has the following advantages:

[0046] By using a lifting mechanism to move the top cover away from the housing, the top cover can be disassembled, reducing the difficulty of disassembling the top cover, improving the efficiency of disassembly, reducing downtime during sedimentation machine maintenance, and increasing the output of the sedimentation machine.

[0047] The above description, in conjunction with preferred embodiments, provides a further detailed explanation of the present invention and should not be construed as limiting the specific implementation of the present invention to these descriptions. For those skilled in the art, various simple deductions or substitutions can be made without departing from the concept of the present invention, and all such modifications or substitutions should be considered within the protection scope of the present invention.

Claims

1. A physical vapor deposition machine, characterized by, The utility model relates to a kind of shell, including: Shell, is equipped with an opening; Top cover, cover is equipped in the opening, to close the shell; At least one lifting mechanism, is equipped in the top cover close to the side of the shell, to drive the top cover along the first direction to the direction close to or away from the shell moves.

2. The physical vapor deposition machine according to claim 1, wherein The lifting mechanism includes rotating shaft, first gear, rack and guide rail, the first gear is rotatably sleeved on the first end of the rotating shaft; The rack and the guide rail are slidably connected along the first direction, and the first gear is engagedly connected with the rack;When the rotating shaft rotates around the second direction, the first gear is driven to rotate, and the first gear drives the rack to move along the first direction, and the rack is connected with the top cover when the rack moves to the first position.

3. The physical vapor deposition machine according to claim 2, wherein, The lifting mechanism further includes second gear, which is rotatably sleeved on the second end of the rotating shaft.

4. The physical vapor deposition machine of claim 2, wherein, The lifting mechanism further includes motor for driving the rotating shaft to rotate around the second direction.

5. The physical vapor deposition machine according to claim 1, wherein, The lifting mechanism includes a cylinder, the cylinder includes a cylinder barrel, a piston and a piston rod, the piston is configured to drive the piston rod to move along the first direction towards or away from the cylinder barrel;When piston rod moves to the first position, the piston rod is connected with the top cover.

6. The physical vapor deposition machine according to any one of claims 2 to 5, wherein, A plurality of lifting mechanisms are uniformly arranged along the circumference of the top cover.

7. The physical vapor deposition machine according to any one of claims 2 to 5, wherein, The top cover includes a cover body and a contact portion, the cover body protrudes outward away from the shell, the contact portion is arranged on the side of the cover body close to the shell and extends outward away from the axial direction of the cover body;When the moving end of the lifting mechanism reaches the first position, it is connected with the contact portion.

8. The physical vapor deposition machine according to claim 7, wherein, The contact portion is annular or arc-shaped structure.

9. The physical vapor deposition machine of claim 7, wherein, It further includes a fixing member for fixing the top cover to the shell.

10. The physical vapor deposition machine of claim 7, wherein, The side of the shell close to the top cover is provided with a through hole, and the moving end of the lifting mechanism extends into the through hole and is connected with the top cover.

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