Multifunctional plasma processing device

Abstract

The utility model relates to the field of surface treatment, and discloses a multifunctional plasma treatment device. The device comprises a plasma treatment cabin and a strip division cabin which are integrated in a box body. The plasma treatment cabin comprises a vacuum chamber, a first motor and a vacuum pump which are located outside the vacuum chamber, and a plasma generation assembly and a plurality of object supporting pieces which are located in the vacuum chamber, the plurality of object supporting pieces are configured to be used for placing or bearing a plurality of different objects to be subjected to plasma treatment, the plasma generation assembly is used for generating plasmas, and the vacuum pump is used for carrying out plasma treatment on the different objects. And cleaning and / or hydrophilizing treatment is carried out on various different objects through plasmas in the plasma treatment cabin. The strip cutting cabin comprises a sub-packaging cabin, an unwinding disc, a winding disc and a second motor, the strip cutting cabin is configured to make non-standard strips on the unwinding disc sub-packaged into standard strips on the winding disc, and the standard strips are used for being placed on an object supporting piece to be subjected to hydrophilic treatment. According to the invention, plasma cleaning, hydrophilic treatment and strip standardized subpackaging can be carried out on the surfaces of various objects, so that the scientific research efficiency and the accuracy of experimental results are improved.

Description

Technical Field

[0001] This application relates to the field of surface treatment, specifically to a multifunctional plasma treatment device. Background Technology

[0002] ATUM-SEM (Automated Strip-Based Ultrathin Section Continuous Acquisition Scanning Imaging) is widely used in microscopic brain mapping and neural circuit research. This technology constructs a continuous ultrathin section library of neural tissue by collecting continuous ultrathin sections in long sequences onto polyimide film strips (Kapton), thereby achieving three-dimensional reconstruction at the millimeter level. The successful application of ATUM-SEM technology relies on Kapton strips as its core consumable, which carries and provides the function of continuous acquisition and preservation of ultrathin sections.

[0003] However, the supply of Kapton tapes in China faces numerous difficulties. Most Kapton tapes are single-piece films or single-sided adhesive tapes, and only a few suppliers can customize 8mm wide double-sided smooth substrates that meet the requirements. Furthermore, the existing Kapton tape substrates are hydrophobic and have poor cleaning properties, which makes them unable to meet the stringent requirements of electron microscopy experiments, especially the needs of electron microscope sample processing.

[0004] In current technology, hydrophilization treatment typically uses a plasma hydrophilizer, which introduces polar groups onto the material surface to enhance its hydrophilicity. However, most existing plasma hydrophilizers are compact in structure and have limited functionality, usually only able to process small samples such as TEM copper mesh, and cannot meet the cleaning requirements for processing long Kapton strips and other electron microscopy equipment (such as 4-inch silicon wafers, electron microscope sample holders, and diamond slicers). Summary of the Invention

[0005] The purpose of this application is to provide a multifunctional plasma processing device that can clean, hydrophilize, and standardize the packaging of various objects using plasma, thereby improving research efficiency and the accuracy of experimental results.

[0006] This application discloses a multifunctional plasma processing device, including: a plasma processing chamber 2 and a strip segmentation chamber 3 integrated within a housing 1;

[0007] The plasma processing chamber 2 includes a vacuum chamber 21, a first motor 22 and a vacuum pump located outside the vacuum chamber 21, and a plasma generating component 23 and various object supports located inside the vacuum chamber 21. The various object supports are respectively configured to place or support various different objects to be plasma processed. The plasma generating component 23 generates plasma, and the various different objects are cleaned and / or hydrophilized by the plasma in the plasma processing chamber 2.

[0008] The strip splitting compartment 3 includes a dispensing compartment 31, an unwinding reel 32, a rewinding reel 33, and a second motor 34. The strip splitting compartment 3 is configured to split non-standard strips on the unwinding reel 32 into standard strips on the rewinding reel 33. The standard strips are used to be placed on the object support for the hydrophilic treatment.

[0009] In a preferred embodiment, the various object supports respectively include: unwinding reel 24, rewinding reel 25, and sample stage 26;

[0010] The plasma generating component 23 is located directly above the unwinding reel 24 and the rewinding reel 25, which are at the same horizontal level. The axes of the unwinding reel 24 and the rewinding reel 25 are parallel to the ground. The strip performs unwinding and rewinding operations between the unwinding reel 24 and the rewinding reel 25. The connection part of the strip connecting the unwinding reel 24 and the rewinding reel 25 is located on the tangent line of the highest point of the unwinding reel 24 and the rewinding reel 25. The outer side of the strip faces the plasma generating component 23, and the plasma generating component 23 only performs hydrophilic treatment on the outer side of the strip.

[0011] The sample stage 26 is placed at the bottom of the vacuum chamber 21, the sample stage 26 is parallel to the ground, and the sample stage 26 is set at a certain distance from the bottom of the vacuum chamber 21.

[0012] In a preferred embodiment, the plasma generating assembly 23 includes an insulating plate 231 and an electrode plate 232;

[0013] The insulating plate 231 is located on the upper layer of the electrode plate 232. The electrode plate 232 is parallel to the connecting portion of the strip. The electrode plate 232 is configured to ionize the gas in the vacuum chamber 21 to form plasma. The plasma uniformly and vertically impacts the outer side of the connecting portion of the strip. The insulating plate 231 is configured to prevent the electrode plate 232 from directly contacting the vacuum chamber 21.

[0014] In a preferred embodiment, the plasma processing chamber 2 further includes a sample rod cleaning module, which includes: a sample rod flange interface 27, a sealing joint 28, and a transmission electron microscope sample rod 29;

[0015] The sample rod flange interface 27 is connected to the vacuum chamber 21. If the transmission electron microscope sample rod 29 needs to be cleaned, it is inserted into the vacuum chamber 21 through the sample rod flange interface 27 to be exposed to the plasma environment for cleaning. If the transmission electron microscope sample rod 29 does not need to be cleaned, the sealing joint 28 blocks the sample rod flange interface 27 to keep the vacuum chamber 21 in a sealed state.

[0016] In a preferred embodiment, the sample stage 26 includes a platform body, and a limiting groove 261 is provided on the upper surface of the platform body. The limiting groove 261 is used to support the silicon wafer to be decarbonized and to limit its position. The platform body is also provided with a plurality of circular through holes 262 for placing tubular samples.

[0017] The platform body has recesses 263 on both sides, and the experimenter can insert their fingers into the recesses 263 to pick up the sample stage 26.

[0018] In a preferred embodiment, the plasma treatment chamber 2 further includes:

[0019] The hatch 210 is fixed to the outer side wall of the housing 1. The hatch 210 is provided with an observation window 211, which is used to observe the inside of the vacuum chamber 21. When the hatch 210 is closed, the vacuum chamber 21 is in a sealed state.

[0020] The air extraction port 212 is connected to the vacuum pump, and the vacuum pump performs a vacuuming operation on the inside of the vacuum chamber 21 through the air extraction port 212.

[0021] The first motor 22 transmits torque to the shaft of the rewinding reel 25 through the magnetohydrodynamic sealing mechanism 213, and the rotation of the rewinding reel 25 drives the unwinding reel 24 to rotate.

[0022] In a preferred embodiment, the axis of the unwinding reel 32 and / or the take-up reel 33 is provided with an adjustable diameter mechanism, the adjustable diameter mechanism including: a knob head 35, a knob seat 36, and an adjustment base 37;

[0023] The inner ring of the strip surrounds the adjusting base 37. The knob seat 36 is fitted into the adjusting base 37. The knob seat 36 is conical. When the knob head 35 is rotated, the knob seat 36 gradually protrudes from the adjusting base 37 or gradually retracts into the adjusting base 37. The adjusting base 37 contracts or expands along the shape of the knob seat 36 to reduce or increase the axial diameter of the unwinding reel 32 and / or the take-up reel 33.

[0024] In a preferred embodiment, the housing 1 is further provided with a plurality of air inlets, which are connected to one or more air inlets 214 on the plasma processing chamber 2, and the process gas is introduced into the vacuum chamber 21 through the air inlets on the housing 1.

[0025] In a preferred embodiment, at any given time, only one type of object is cleaned or hydrophilized within the vacuum chamber 21.

[0026] In a preferred embodiment, the dispensing compartment 31 is in direct contact with the outside air.

[0027] In this embodiment, by integrating a plasma processing chamber and a strip segmentation chamber, the device can efficiently process long Kapton strips and other electron microscopy materials. Specifically, the plasma processing chamber is equipped with a vacuum chamber, plasma generation components, an unwinding tray, a rewind tray, and a sample stage, enabling the cleaning and hydrophilization of various objects. Simultaneously, the strip segmentation chamber can separate non-standard strips into standard strips on the rewind tray, thereby improving material standardization and operational precision. This application overcomes the limitations of traditional plasma hydrophilization equipment in processing long Kapton strips and complex electron microscopy instruments, significantly improving processing efficiency and the accuracy of experimental results, and has significant application value, especially in the fields of neuroscience and biomedical research.

[0028] Furthermore, the plasma generation component is located directly above the unwinding and rewinding disks, both at the same horizontal level with their axes parallel to the ground. This ensures that the strip can uniformly contact the plasma during unwinding and rewinding operations between the unwinding and rewinding disks, effectively achieving hydrophilic treatment of the strip's outer surface and avoiding unnecessary treatment of other surfaces. This structure improves the uniformity of the treatment and ensures effective hydrophilication of large-area strips.

[0029] Furthermore, the apparatus of this application specifically considers the processing needs of different electron microscope samples and materials. The sample rod cleaning module can easily expose the transmission electron microscope sample rod to the plasma environment, simplifying the cleaning process. The sample stage combines a limiting groove and multiple through holes, allowing samples and silicon wafers of different shapes and sizes to be placed stably, further improving the flexibility and reliability of operation.

[0030] The specification of this application contains numerous technical features distributed across various technical solutions. Listing all possible combinations of these technical features (i.e., technical solutions) would make the specification excessively lengthy. To avoid this problem, the various technical features disclosed in the above-described invention, the various technical features disclosed in the following embodiments and examples, and the various technical features disclosed in the accompanying drawings can be freely combined to form various new technical solutions (all of which are considered to have been described in this specification), unless such a combination of technical features is technically infeasible. For example, one example discloses feature A+B+C, and another example discloses feature A+B+D+E. Features C and D are equivalent technical means that serve the same function, and technically only one needs to be used; they cannot be used simultaneously. Feature E can technically be combined with feature C. Therefore, the solution A+B+C+D should not be considered as described because it is technically infeasible, while the solution A+B+C+E should be considered as described. Attached Figure Description

[0031] Figure 1 This is a schematic diagram of the structure of a multifunctional plasma processing apparatus according to one embodiment of this application.

[0032] Figure 2 This is a schematic diagram of the structure of a plasma processing chamber according to one embodiment of this application.

[0033] Figure 3 This is a schematic diagram of the structure of a plasma processing chamber according to one embodiment of this application.

[0034] Figure 4 This is a schematic diagram of the plasma movement direction according to one embodiment of this application.

[0035] Figure 5 This is a schematic diagram of the structure of a plasma processing chamber according to one embodiment of this application.

[0036] Figure 6 This is a schematic diagram of the sample stage according to one embodiment of this application.

[0037] Figure 7 This is a structural schematic diagram of a strip-segmented compartment according to one embodiment of this application.

[0038] Figure 8 This is a schematic diagram of an adjustable diameter mechanism according to one embodiment of this application.

[0039] Explanation of reference numerals in the attached figures

[0040] 1-Box body; 2-Plasma treatment chamber; 21-Vacuum chamber; 22-First motor; 23-Plasma generation assembly; 231-Insulating plate; 232-Electrode plate; 24-Unwinding reel; 25-Rewinding reel; 26-Sample stage; 261-Limiting groove; 262-Circular through hole; 263-Notch; 27-Sample rod flange interface; 28-Sealing joint; 29-Transmission electron microscope sample rod; 210-Door; 211-Observation window; 212-Escape port; 213-Magnetofluidic sealing mechanism; 214-Air inlet; 3-Strip dividing chamber; 31-Dispensing chamber; 32-Unwinding reel; 33-Rewinding reel; 34-Second motor; 35-Knob head; 36-Knob base; 37-Adjusting base; 4-Power switch; 5-Brake button. Detailed Implementation

[0041] In the following description, many technical details are presented to help the reader better understand this application. However, those skilled in the art will understand that the technical solutions claimed in this application can be implemented even without these technical details and various variations and modifications based on the following embodiments.

[0042] To make the objectives, technical solutions, and advantages of this application clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.

[0043] This application relates to a multifunctional plasma processing device, the structural diagram of which is shown below. Figure 1-8 As shown, it includes: a plasma treatment chamber 2 and a strip segmentation chamber 3 integrated within the housing 1.

[0044] The plasma processing chamber 2 includes a vacuum chamber 21, a first motor 22 and a vacuum pump located outside the vacuum chamber 21, and a plasma generating assembly 23 and various object supports located inside the vacuum chamber 21. The object supports are configured to place or support various different objects to be plasma-treated. The plasma generating assembly 23 generates plasma, and the plasma in the plasma processing chamber 2 is used to clean and / or hydrophilize the various objects. The strip splitting chamber 3 includes a dispensing chamber 31, an unwinding reel 32, a rewinding reel 33, and a second motor 34. The strip splitting chamber 3 is configured to dispense non-standard strips on the unwinding reel 32 into standard strips on the rewinding reel 33. The standard strips are used to be placed on the object supports for hydrophilization treatment.

[0045] In an optional embodiment, various object supports may include, but are not limited to, an unwinding reel 24, a rewinding reel 25, and a sample stage 26. The plasma generating assembly 23 is located directly above the unwinding reel 24 and the rewinding reel 25, which are at the same horizontal level. The axes of the unwinding reel 24 and the rewinding reel 25 are parallel to the ground. The strip unwinds and rewinds between the unwinding reel 24 and the rewinding reel 25, ensuring that the strip remains in a stable horizontal state and avoiding uneven processing due to imbalance. The connection between the strip and the unwinding reel 24 and the rewinding reel 25 is located on the tangent of the highest point of the unwinding reel 24 and the rewinding reel 25, so that the outer side of the strip always faces the plasma generating assembly 23. Since the inner side of the strip may need to be adhesive to adhere to other objects, it does not need to be hydrophilized. With this setting, the plasma generating assembly 23 can hydrophilize only the outer side of the strip without causing unnecessary impact on the inner side of the strip. The sample stage 26 is placed at the bottom of the vacuum chamber 21, parallel to the ground, and is positioned at a certain distance from the bottom of the vacuum chamber 21.

[0046] In an optional embodiment, the plasma generation assembly 23 may include an insulating plate 231 and an electrode plate 232. The insulating plate 231 is located above the electrode plate 232, which is parallel to the connecting portion of the strip. The electrode plate 232 is configured to ionize the gas within the vacuum chamber 21 to form plasma. By applying a high voltage, the electrode plate 232 can accelerate electrons in the gas within the vacuum chamber 21, causing them to collide with gas molecules to form a plasma of charged ions and free electrons. Figure 4 As shown, the plasma uniformly and vertically impacts the outer side of the strip connection portion, and the insulating plate 231 is configured to prevent the electrode plate 232 from directly contacting the vacuum chamber 21. By placing the insulating plate 231 on top of the electrode plate 232, the insulating plate 231 can effectively block the current conduction between the electrode plate 232 and the vacuum chamber 21, thereby avoiding potential short circuits or damage to the electrode plate 232.

[0047] In an optional embodiment, the plasma processing chamber 2 further includes a sample rod cleaning module, which comprises a sample rod flange interface 27, a sealing connector 28, and a transmission electron microscope (TEM) sample rod 29. The sample rod flange interface 27 communicates with the vacuum chamber 21. If the TEM sample rod 29 requires cleaning, it is inserted into the vacuum chamber 21 through the sample rod flange interface 27 to be exposed to the plasma environment for cleaning. Through the action of plasma, contaminants, grease, carbides, etc., on the surface of the sample rod can be efficiently removed, thereby restoring the surface cleanliness of the sample rod and ensuring high quality and accuracy of electron microscopy observation. If the TEM sample rod 29 does not require cleaning, the sealing connector 28 blocks the sample rod flange interface 27 to keep the vacuum chamber 21 sealed. The sealing connector 28 ensures that the vacuum environment of the vacuum chamber 21 is maintained when the sample rod is not being cleaned, avoiding unnecessary gas leakage or environmental pollution. Simultaneously, the sealing connector 28 allows the system to quickly and easily switch between cleaning operations and routine operations, improving the operational flexibility and efficiency of the device.

[0048] In an optional embodiment, the sample stage 26 includes a platform body with a downward-facing limiting groove 261 on its upper surface. The limiting groove 261 is used to support and limit the silicon wafer to be decarbonized. The platform body also has multiple circular through holes 262 for placing tubular samples. Recesses 263 are provided on both sides of the platform body, allowing the experimenter to insert their fingers into the recesses 263 to retrieve the sample stage 26.

[0049] In an optional embodiment, such as Figure 2 and Figure 3 As shown, the plasma processing chamber 2 may further include a door 210 and an extraction port 212. The door 210 is fixed to the outer wall of the housing 1, and an observation window 211 is provided on the door 210 for observing the interior of the vacuum chamber 21. When the door 210 is closed, the vacuum chamber 21 is in a sealed state. The extraction port 212 is connected to a vacuum pump, which performs a vacuuming operation on the interior of the vacuum chamber 21 through the extraction port 212. The first motor 22 transmits torque to the shaft of the rewinding reel 25 through the magnetohydrodynamic sealing mechanism 213. The rotation of the rewinding reel 25 drives the unwinding reel 24 to rotate. The magnetohydrodynamic sealing mechanism 213 provides a contactless torque transmission mechanism, which can effectively reduce the friction and wear generated in traditional mechanical transmission and improve the durability and operational stability of the system. The rewinding reel 25 rotates under the drive of a motor, which in turn drives the unwinding reel 24 to rotate. The coordinated operation between the rewinding reel 25 and the unwinding reel 24 ensures smooth unwinding and rewinding of the strip within the plasma treatment chamber 2. The magnetohydrodynamic sealing mechanism 213 enables the device to maintain low maintenance requirements during long-term, high-efficiency operation, improving the reliability and lifespan of the equipment.

[0050] In an optional embodiment, the unwinding reel 32 and / or the take-up reel 33 are provided with an adjustable diameter mechanism, which includes: a knob head 35, a knob seat 36, and an adjusting base 37. The inner ring of the strip fits around the adjusting base 37, and the knob seat 36 is fitted into the adjusting base 37. The knob seat 36 is conical. When the knob head 35 is rotated, the knob seat 36 gradually protrudes from or retracts into the adjusting base 37. The adjusting base 37 contracts or expands along the shape of the knob seat 36 to reduce or increase the axial diameter of the unwinding reel 32 and / or the take-up reel 33.

[0051] In an optional embodiment, the housing 1 is further provided with multiple air inlets 214, which are connected to one or more air inlets 214 on the plasma processing chamber 2. Process gas is introduced into the vacuum chamber 21 through the air inlets 214 on the housing 1. Different types of process gas can be selected according to different processing requirements, such as oxygen (O2), argon (Ar), nitrogen (N2), hydrogen (H2), or other specific gas mixtures. When gas replacement is required, it can be performed using a vacuum pump. The vacuum pump is connected to the vacuum chamber 21 and can quickly evacuate the original gas in the vacuum chamber 21, ensuring that the gas environment inside the chamber reaches the required low pressure or high vacuum state. During gas replacement, the vacuum pump first expels air and other gases from the vacuum chamber 21 through the evacuation port 212. After the vacuum requirement is met, the process gas is injected into the vacuum chamber 21 through the air inlet 214.

[0052] In an optional embodiment, only one type of object is cleaned or hydrophilized within the vacuum chamber 21 at any given time. This ensures the precision of the process while avoiding potential cross-contamination or uneven treatment between different objects. By focusing each treatment on a single object, the device of this application optimizes each processing step, ensuring a more concentrated and uniform effect of the plasma on the target object. In this embodiment, the object replacement process is typically performed manually or automatically by the operator. When a replacement object is needed, the operator can open the hatch 210, remove the currently processed object, and place the next object to be processed into the vacuum chamber 21. The objects to be processed can be Kapton strips, silicon wafers, transmission electron microscope sample holders 29, tubular samples, etc. These objects are placed on dedicated support structures within the processing chamber, such as the sample stage 26, unwinding tray 24, rewind tray 25, or sample holder flange interface 27, through holes, etc. The replacement process typically includes the following steps: the operator opens the hatch 210 and removes the object. The removed object can be transferred to other processing areas or storage locations as needed. At this point, the vacuum chamber 21 remains sealed to ensure environmental stability. Afterwards, the operator places a new object to be processed into the vacuum chamber 21 as needed, ensuring the object is stably positioned on the correct support structure. Once the object has been replaced, the plasma processing chamber 2 is resealed, and the vacuum chamber 21 is evacuated to a predetermined pressure. At this time, process gas enters the vacuum chamber 21 through the inlet 214, initiating the plasma generation process. The target object is exposed to the plasma environment for cleaning or hydrophilization treatment. Throughout the entire process, the gas environment within the vacuum chamber 21 remains at a predetermined state, ensuring the stability and efficiency of the processing.

[0053] In an optional embodiment, the packing chamber 31 is in direct contact with the outside air. The packing chamber 31 automatically packs non-standard strips into standard strips of predetermined lengths. Specifically, as the strip unwinds from the unwind reel 32 and gradually passes through the take-up reel 33, a motor drives the take-up reel 33 to rotate, and the strip is transported between the two reels. During transport, the motor's speed is adjusted by a control system to ensure the strip length is processed according to a preset standard length. For example, when the motor rotates to a certain preset number of revolutions, the strip length has reached the required standard length (e.g., 30 meters), at which point a cutting mechanism is automatically activated. The packing chamber 31 is equipped with a sharp cutting head located between the unwind reel 32 and the take-up reel 33, precisely aligned with the strip's connection point. Controlled by an electric or pneumatic drive system, the cutting head quickly and accurately cuts the strip connection point between the unwind reel 32 and the take-up reel 33, thereby cutting the non-standard strip to a standardized 30-meter length. The cutting process can also be done manually. When the strip reaches the standard length (e.g., 30 meters), the motor automatically stops rotating and positions the strip at the appropriate cutting point. At this point, the experimenter can cut it manually. Since the strip has already been precisely transferred to the standard length within the packaging chamber 31, the experimenter only needs to use appropriate cutting tools, such as scissors or other knives, to manually cut the strip to the required length.

[0054] In an optional embodiment, the housing 1 may also be equipped with a power switch 4 and a brake button 5. The power switch and brake button can be located anywhere on the housing 1, as long as they are easily accessible to the operator. The power switch is used to start and stop the power supply to the entire device. The operator can use the power switch to start or stop the device, ensuring that the device is completely powered off when not in operation, thereby avoiding unnecessary energy consumption. The power switch is designed with safety in mind, typically featuring an indicator light and clear markings at the switch location, making it easy for the operator to confirm the device's operating status. The brake button is mainly used to stop the device in emergency situations, immediately stopping the motor and other critical components in sudden events. For example, if the device malfunctions or needs to be stopped immediately, the operator can press the brake button to ensure the device stops operating within a short time, preventing further damage to the device or adverse effects on the sample.

[0055] To better understand the technical solution of this application, a specific example is provided below. The details listed in this example are mainly for ease of understanding and are not intended to limit the scope of protection of this application.

[0056] The multifunctional plasma processing device of the present invention includes a plasma processing chamber 2 and a strip segmentation chamber 3 integrated within a housing 1. The plasma processing chamber 2 contains a vacuum chamber 21, a first motor 22, a vacuum pump, a plasma generation component 23, an unwinding disk 24, a rewinding disk 25, and a sample stage 26. The device operates by placing a long Kapton strip between the unwinding disk 24 and the rewinding disk 25, controlling the strip to uniformly pass through the plasma environment generated by the plasma generation component 23 within the vacuum chamber 21, thereby achieving hydrophilic treatment of the outer surface of the strip. The plasma generation component 23 within the processing chamber is located directly above the unwinding disk 24 and the rewinding disk 25, and forms a uniform plasma through the combination of an electrode plate 232 and an insulating plate 231, which uniformly and vertically strikes the outer surface of the strip for hydrophilic treatment.

[0057] The strip splitting chamber 3 is responsible for repackaging non-standard strips into standard strips. The Kapton strips are processed via the unwinding reel 32 and the take-up reel 33. A second motor 34 drives the take-up reel 33 to rotate, thereby adjusting the strip tension and speed. When the strip reaches the predetermined standardized length, the second motor 34 stops rotating, at which point the operator can manually cut it. The repackaging chamber 31 can also be equipped with a sharp cutting head. In automated cutting mode, when the strip reaches the standard length, the cutting head quickly cuts off the connecting part, dividing the strip into the specified lengths to meet experimental requirements.

[0058] In the strip splitting compartment 3, the unwinding reel 32 and the take-up reel 33 have adjustable diameter structures to accommodate strip rolls of different inner diameters. During processing, if it is necessary to fit strip rolls of different inner diameters onto the take-up reel 33 or the unwinding reel 32, the operator simply rotates the knob head 35. The knob head 35 is connected to the knob seat 36, which has a tapered end. When the knob head 35 is rotated, the knob seat 36 gradually protrudes or retracts from the adjusting base 37. The base adopts a hub design; as the knob head 35 rotates, the diameter of the base moves along the end of the knob seat 36, thus expanding or shrinking accordingly. In this way, the operator can adjust the axial diameter of the unwinding reel 32 and the take-up reel 33 to accommodate strip rolls of different sizes.

[0059] In the sample rod cleaning module of the apparatus, the transmission electron microscope sample rod 29 is inserted into the vacuum chamber 21 through a flange interface for cleaning. During the cleaning process, the sample rod is exposed to a plasma environment to remove contaminants and carbon deposits. This module has a sealing joint 28, which prevents gas from entering the vacuum chamber 21 when cleaning is not required, maintaining the chamber's airtightness. The sample stage 26 is designed with multiple circular through holes 262 specifically for fixing tubular samples. Recesses 263 are provided on both sides of the platform for easy sample handling by the experimenter.

[0060] Once the object to be cleaned / hydrophilized is placed, the operator starts the vacuum pump by activating the device, extracting the gas from the vacuum chamber 21 through the evacuation port 212 to achieve the required vacuum level. Simultaneously, process gas enters the vacuum chamber 21 through the inlet 214, providing the necessary gas for subsequent plasma generation. After the cleaning / hydrophilization process is complete, the door 210 of the vacuum chamber 21 can be opened to remove the object, and then the next object to be cleaned / hydrophilized (such as a silicon wafer, a transmission electron microscope sample holder 29, a strip, etc.) can be placed in, and the above operation is repeated.

[0061] Through the above specific embodiments, the multifunctional plasma treatment device of the present invention can efficiently and accurately clean or hydrophilize different objects, thereby improving work efficiency and processing accuracy.

[0062] It should be noted that in this patent application, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one" does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element. In this patent application, if it refers to performing an action according to an element, it means performing the action at least according to that element, including two cases: performing the action only according to that element, and performing the action according to that element and other elements. Expressions such as "multiple," "repeatedly," and "various" include two, two times, two kinds, and more than two, more than two times, and more than two kinds.

[0063] All documents mentioned in this application are considered to be incorporated in their entirety into the disclosure of this application so that they can serve as a basis for modifications if necessary. Furthermore, it should be understood that after reading the foregoing disclosure of this application, those skilled in the art can make various alterations or modifications to this application, and these equivalent forms also fall within the scope of protection claimed in this application.

Claims

1. A multifunctional plasma treatment device, characterized in that, The application relates to a plasma processing device. The plasma processing device comprises a plasma processing cabin (2) and a strip dividing cabin (3) integrated in a box (1). The plasma processing cabin (2) comprises a vacuum chamber (21), a first motor (22) and a vacuum pump located outside the vacuum chamber (21), and a plasma generating assembly (23) and a plurality of object supports located in the vacuum chamber (21), the plurality of object supports are respectively configured to place or support a plurality of different objects to be processed by plasma, the plasma generating assembly (23) generates plasma, and the plurality of different objects in the plasma processing cabin (2) are cleaned and / or hydrophilized by the plasma. The strip dividing cabin (3) comprises a dividing cabin (31), an unwinding disc (32), a winding disc (33) and a second motor (34), the strip dividing cabin (3) is configured to divide a non-standard strip on the unwinding disc (32) into a standard strip on the winding disc (33), and the standard strip is used for placing on the object supports to be hydrophilized.

2. The multi-functional plasma processing apparatus as claimed in claim 1, wherein The plurality of object supports respectively comprise an unwinding disc (24), a winding disc (25) and a sample stage (26). The plasma generating assembly (23) is located directly above the unwinding disc (24) and the winding disc (25), the unwinding disc (24) and the winding disc (25) are located at the same horizontal height, the axes of the unwinding disc (24) and the winding disc (25) are parallel to the ground, the strip is unwound and wound between the unwinding disc (24) and the winding disc (25), the connecting part of the strip connecting the unwinding disc (24) and the winding disc (25) is located on the tangent line of the highest point of the unwinding disc (24) and the winding disc (25), and the outer side of the strip faces the plasma generating assembly (23), and the plasma generating assembly (23) only hydrophilizes the outer side of the strip. The sample stage (26) is placed at the bottom of the vacuum chamber (21), the sample stage (26) is parallel to the ground, and the sample stage (26) is erected at a distance from the bottom of the vacuum chamber (21).

3. The multi-functional plasma processing apparatus as recited in claim 2, wherein The plasma generating assembly (23) comprises an insulating plate (231) and an electrode plate (232). The insulating plate (231) is located on the upper layer of the electrode plate (232), the electrode plate (232) is parallel to the connecting part of the strip, the electrode plate (232) is configured to ionize the gas in the vacuum chamber (21) to form plasma, the plasma uniformly vertically impacts the outer side of the connecting part of the strip, and the insulating plate (231) is configured to prevent the electrode plate (232) from directly contacting the vacuum chamber (21).

4. The multi-functional plasma processing apparatus of claim 1, wherein The plasma processing cabin (2) further comprises a sample rod cleaning module, the sample rod cleaning module comprises a sample rod flange interface (27), a sealing joint (28) and a transmission electron microscope sample rod (29). The sample rod flange interface (27) is in communication with the vacuum chamber (21), if the transmission electron microscope sample rod (29) needs to be cleaned, the sample rod flange interface (27) is inserted into the vacuum chamber (21) exposed to the plasma environment for cleaning, if the transmission electron microscope sample rod (29) does not need to be cleaned, the sealing joint (28) blocks the sample rod flange interface (27) to make the vacuum chamber (21) in a closed state.

5. The multi-functional plasma processing apparatus of claim 2, wherein The sample table (26) comprises a platform body, a limiting groove (261) is arranged on the upper surface of the platform body and faces downward, the limiting groove (261) is used for supporting and limiting the silicon wafer to be eliminated from carbon deposition, and a plurality of circular through holes (262) are further arranged on the platform body, and the plurality of circular through holes (262) are used for placing tubular samples. Recesses (263) are arranged on both sides of the platform body, and the fingers of the experimenter are inserted into the recesses (263) to take the sample table (26).

6. The multi-functional plasma processing apparatus of claim 2, wherein The plasma treatment cabin (2) further comprises: A cabin door (210) is fixed on the outer side wall of the box body (1), an observation window (211) is arranged on the cabin door (210), the observation window (211) is used for observing the inside of the vacuum chamber (21), and the cabin door (210) makes the vacuum chamber (21) in a closed state in a closed state; An air outlet (212) is in communication with the vacuum pump, and the vacuum pump performs vacuumizing operation on the inside of the vacuum chamber (21) through the air outlet (212); The first motor (22) transmits torque to the shaft of the rewinding disc (25) through a magnetic fluid sealing mechanism (213), and the rewinding disc (25) drives the unwinding disc (24) to rotate.

7. The multi-functional plasma processing apparatus as recited in claim 1, wherein The shaft center of the unwinding disc (32) and / or the winding disc (33) is provided with an adjustable diameter mechanism, and the adjustable diameter mechanism comprises a knob head (35), a knob seat (36) and an adjusting base (37). The inner ring of the strip is sleeved on the adjusting base (37), the knob seat (36) is embedded in the adjusting base (37), the knob seat (36) is conical, and when the knob head (35) is rotated, the knob seat (36) gradually protrudes from the adjusting base (37) or gradually retracts into the adjusting base (37). The adjusting base (37) shrinks or expands along the shape of the knob seat (36) to reduce or enlarge the diameter of the shaft center of the unwinding disc (32) and / or the winding disc (33).

8. The multi-functional plasma processing apparatus of claim 1, wherein A plurality of air inlets are further arranged on the box body (1), the air inlets on the box body (1) are in communication with one or more air inlets (214) on the plasma treatment cabin (2), and process gas is introduced into the vacuum chamber (21) through the air inlets on the box body (1).

9. The multi-functional plasma processing apparatus as recited in claim 1, wherein At the same time, only one object is cleaned or hydrophilized in the vacuum chamber (21).

10. The multi-functional plasma processing apparatus of claim 1, wherein, The sub-packaging cabin (31) is directly in contact with the outside air.

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