Automatic mixing equipment for semiconductor silicon epitaxial wafer TCS centralized liquid supply system

Abstract

The utility model discloses automatic mixing equipment for a semiconductor silicon epitaxial wafer (TCS) concentrated liquid supply system, which comprises a rack and a stirring barrel body, the stirring barrel body is arranged in the rack, three groups of rollers are movably arranged at the bottom end of the stirring barrel body at equal intervals, a support frame is arranged outside the rack, and the support frame is connected with the stirring barrel body. U-shaped frames are symmetrically arranged outside the stirring barrel body, a holder plate is arranged outside the supporting frame, and four sets of storage barrels are arranged outside the holder plate at equal intervals. According to the utility model, not only can the automatic mixing equipment conveniently rotate to quantitatively add different liquids, the various liquids can be conveniently and sufficiently stirred, and the stirring barrel can be conveniently and randomly moved and conveyed, but also the convenience of the automatic mixing equipment for rotatably adding the liquids is improved, and the convenience of the stirring barrel for moving and conveying is improved.

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