Spin-drying machine for substrate slice

Abstract

The utility model relates to the technical field of biochip manufacturing equipment, in particular to a spin dryer for a substrate, which comprises a fixedly arranged barrel, a fixedly arranged bottom plate and a rotatable turntable, the lower end of the barrel is hermetically connected with the bottom plate, the turntable is arranged in the barrel and is provided with a driving device, and the driving device is fixedly arranged on the bottom plate; the cylinder or / and the bottom plate and the turntable are respectively provided with a liquid drainage slot mechanism; the turntable comprises a chassis and a baffle plate, the lower side of the chassis is connected with a driving device, the chassis is provided with at least one station for placing a substrate, the baffle plate is arranged on the upper side of the chassis and is used for blocking the substrate, and the substrate is put in or taken out between the chassis and the baffle plate. And the substrate is placed on the turntable and is spin-dried by utilizing a centrifugal principle, so that the substrate cannot be damaged and is convenient to take and place. The spin dryer is compact in structure and convenient to use.

Description

Technical Field

[0001] This utility model relates to the technical field of biochip manufacturing equipment, specifically a spin dryer for substrates. Background Technology

[0002] Biochips utilize the specific interactions between biomolecules, such as the complementary base pairing of nucleic acids (gene chips) and the specific binding of antigens and antibodies (protein chips), to immobilize known biomolecule probes on the surface of a substrate. When these probes hybridize or bind with target molecules in the sample, the reaction signals are collected and analyzed using detection methods such as fluorescence, chemiluminescence, and electrochemistry, thereby enabling qualitative, quantitative, or localized analysis of biomolecules in the sample.

[0003] Taking protein chips as an example, after pretreatment of the substrate, protein molecules are immobilized on the substrate surface using an antibody aspiration process (refer to patent application CN116693661A, "An Antibody Aspiration Device"). Afterward, a blocking process is required to prevent non-specific adsorption (e.g., protein blocking, which uses protein molecules to saturate and cover the active sites on the substrate surface not occupied by the target protein, thereby preventing non-specific proteins in the sample from binding to the substrate surface during detection experiments). The blocking process involves first immersing the substrate in a specific solution, then washing the substrate to remove excess solution residue, and finally spin-drying the substrate. Currently, in the manufacturing process of protein chips, most methods involve manual spin-drying or air-drying, which is time-consuming, labor-intensive, inefficient, and prone to substrate contamination. Summary of the Invention

[0004] To address the aforementioned problems, this invention provides a spin dryer for substrates, which uses centrifugal drying to dry substrates quickly and conveniently. The technical solution adopted by this invention is as follows:

[0005] A spin dryer for substrates includes a fixed cylinder, a fixed base plate, and a rotatable turntable. The lower end of the cylinder is sealed to the base plate. The turntable is disposed inside the cylinder and equipped with a driving mechanism, which is fixedly mounted on the base plate. The cylinder and / or the base plate and the turntable are respectively provided with a drain groove hole mechanism.

[0006] The turntable includes a chassis and a baffle. The chassis is connected to a drive mechanism on its lower side. The chassis has at least one station for placing a substrate. The baffle is installed on the upper side of the chassis to block the substrate. The substrate is placed or removed between the chassis and the baffle.

[0007] The above-mentioned spin dryer for substrates has a cavity and an opening for draining liquid in the center of the upper side of the base plate. The portion of the base plate from the cavity outward has a gradually descending stepped structure and includes a first step, a second step and a third step in sequence. The lower end of the cylinder is sealed at the second step.

[0008] The opening is located inside the cavity, and a mounting plate is fixedly installed inside the cavity. The mounting plate is spaced apart from the cavity in both the horizontal and vertical directions to allow liquid to drain to the opening. The driving device passes through the opening and is fixedly installed on the lower side of the mounting plate.

[0009] The aforementioned spin dryer for substrates includes a draining groove mechanism on the turntable comprising a plurality of draining grooves extending transversely through the base and a plurality of drain holes on the left and right sides of the baffle; the draining groove mechanism on the base plate includes at least one drain hole I on the second step.

[0010] The aforementioned substrate spin dryer has two symmetrically distributed workstations on the chassis for placing substrates, and a channel groove is provided in the middle of the baffle for picking up and putting in the substrates.

[0011] The aforementioned substrate spin dryer has at least one drain hole II and at least one liquid guide groove on the mounting plate. The drain hole II is connected to an opening, and the liquid guide groove is located on the upper surface of the mounting plate and extends to the outer edge of the mounting plate.

[0012] The aforementioned substrate is dried using a spin dryer, and the mounting plate and the cavity of the base plate are connected by several rubber shock absorbers.

[0013] The advantages of this invention are: placing the substrate on a turntable and using centrifugal drying will not damage the substrate and makes it easy to handle. The centrifuge has a compact structure and is easy to use. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the overall shape of an embodiment of the present utility model;

[0015] Figure 2 This is a schematic diagram of the internal structure of an embodiment of the present utility model;

[0016] Figure 3 A bottom view of an embodiment of this utility model;

[0017] Figure 4 This is a schematic diagram showing the fit between the base plate and the mounting plate in an embodiment of this utility model;

[0018] Figure 5 This is a schematic diagram of the base plate structure of an embodiment of the present utility model;

[0019] Figure 6 This is a schematic diagram of the transmission structure according to an embodiment of the present utility model;

[0020] Figure 7 This is a schematic diagram of the turntable structure according to an embodiment of the present utility model.

[0021] In the diagram: 1 is the cylinder, 2 is the base plate, 3 is the turntable, 4 is the mounting plate, 5 is the sealing ring, 6 is the photoelectric sensor, 7 is the sensing plate, 8 is the rubber shock absorber, 9 is the stepper motor, 11 is the base plate I, 12 is the base plate II, 21 is the drain hole I, 22 is the cavity, 23 is the first step, 24 is the second step, 25 is the third step, 26 is the opening, 31 is the chassis, 32 is the baffle, 33 is the drain groove, 34 is the leakage hole, 41 is the drain hole II, and 42 is the liquid guiding groove. Detailed Implementation

[0022] The technical solution of this utility model will be further described below with reference to the accompanying drawings. The following embodiments are illustrative, and unless otherwise specified, all technical terms used have the same meaning as commonly understood by one of ordinary skill in the art to which this application pertains. It should be noted that the terminology used is for describing specific embodiments only and is not intended to limit the scope of this application.

[0023] This embodiment is a spin dryer for substrates, such as... Figure 1 As shown, it includes a fixed cylinder 1, a fixed base plate 2, and a rotatable turntable 3. The lower end of the cylinder 1 is sealed to the base plate 2 to prevent waste liquid leakage. The base plate 2 can be fixedly mounted on a workbench. The turntable 3 is located inside the cylinder 1 and is equipped with a driving mechanism. The driving mechanism is fixedly mounted on the base plate 2. The cylinder 1 and / or the base plate 2, as well as the turntable 3, are respectively provided with a drain groove hole mechanism.

[0024] refer to Figure 2 , Figure 6 and Figure 7 The turntable 3 includes a base 31 and a baffle 32. A driving mechanism is connected to the lower side of the base 31. The base 31 has at least one station for placing a substrate. The baffle 32 is installed on the upper side of the base 31 to block the substrate. The substrate is placed or removed between the base 31 and the baffle 32. Specifically, in this embodiment, the base 31 has two symmetrically distributed stations for placing substrate I 11 and substrate II 12 respectively. The baffle 32 has an I-shaped channel groove for placing and removing the substrate. In other embodiments, the baffle 32 can be designed for easy disassembly to place and remove the substrate, such as magnetically attaching to the base 31. The driving mechanism can be waterproof and dustproof, and the installation between it and the base 31 can also use a conventional sealing structure, which will not be elaborated here.

[0025] refer to Figure 2 , Figure 4 and Figure 5Furthermore, the upper center of the base plate 2 is provided with a cavity 22 and an opening 26 for draining liquid. The portion of the base plate 2 from the cavity 22 outwards has a gradually descending stepped structure and includes a first step 23, a second step 24 and a third step 25 in sequence. A sealing ring 5 is provided at the second step 24 to seal the lower end of the connecting cylinder 1. The third step 25 is mainly used to install and fix the whole machine on the workbench.

[0026] The opening 26 is located inside the cavity 22. A mounting plate 4 is fixedly installed inside the cavity 22. The mounting plate 4 is spaced apart from the cavity 22 in both the horizontal and vertical directions to drain liquid to the opening 26. The driving device passes through the opening 26 and is fixedly installed on the lower side of the mounting plate 4. The mounting plate 4 is connected to the cavity 22 of the base plate 2 by several rubber shock absorbers 8, which can reduce the transmission of vibration during the operation of the driving device and ensure the stability of the whole machine.

[0027] The drain hole mechanism on the turntable 3 includes several drain holes 33 extending horizontally through the base plate 31 and several drain holes 34 on the left and right sides of the baffle 32, so that waste liquid is discharged from the left and right sides of the turntable 3; the drain hole mechanism on the base plate 2 includes at least one drain hole I 21 on the second step 24. The mounting plate 4 is provided with at least one drain hole II 41 and at least one guide groove 42. The drain hole II 41 is connected to the opening 26, and the guide groove 42 is provided on the upper surface of the mounting plate 4 and extends to the outer edge of the mounting plate 4.

[0028] Before spin-drying, the substrate is rinsed with purified water for the final rinse, so the water spun out during spin-drying is also purified water and does not require special waste liquid treatment. The spin dryer is installed on a workbench during use, and a wastewater tank is installed under the workbench surface to receive the waste liquid flowing out from drain hole I21, opening 26, and drain hole II41. The structure and installation of the wastewater tank use conventional technology and are therefore not shown in the accompanying drawings of this embodiment.

[0029] Combination Figure 2 and Figure 4During the spin-drying process, the turntable 3 operates at high speed, and most of the waste liquid is thrown onto the inner wall of the cylinder 1 and then slides onto the second step 24. Furthermore, the size of the turntable 3 is set to be larger than the size of the cavity 22, so after the turntable 3 stops, most of the remaining waste liquid also flows onto the second step 24. Therefore, most of the waste liquid is discharged through the drain hole I 21. The amount of waste liquid remaining on the substrate is also small, and the drainage capacity of the drain hole I 21 during spin-drying is sufficient. Even in extreme special working conditions where drainage through the drain hole I 21 is not timely, causing liquid to accumulate in the second step 24, the accumulated liquid will overflow from the first step 23 and drain through the gap between the groove 22 and the mounting plate 4 to the opening 26. Therefore, under any circumstances, there will not be excessive waste liquid inside the cylinder 1. A small amount of waste liquid will also remain on the first step 23 and the mounting plate 4, which can be discharged through the drain hole II 41 to the opening 26 or flow into the liquid guide trough 42 and then drain through the gap between the groove 22 and the mounting plate 4 to the opening 26.

[0030] To further improve the automation level of the spin dryer, a photoelectric sensing system can be installed. This involves mounting a photoelectric sensor 6 on a mounting plate 4 and an induction plate 7 on the turntable 3. A stepper motor 9 with an encoder is used as the driving device to precisely control the start and stop positions. The photoelectric sensor 6 records the number of rotations of the turntable 3. When the set number of rotations is reached, the encoder receives a signal to stop the stepper motor 9 (the installation and control of the photoelectric sensor 6, encoder, and stepper motor 9 are all conventional techniques). This ensures that the turntable 3 always starts and stops in the same position, allowing the substrate to be picked up and placed manually with tweezers, a suction nozzle, or by a robotic arm. This is particularly suitable for robotic arms equipped with suction nozzles, as the position of the substrate picked up and placed by the robotic arm remains consistent, facilitating automatic control.

[0031] The above are merely preferred embodiments of this application. It should be noted that those skilled in the art can make various changes or improvements without departing from the principles of this application, and these changes or improvements should also be considered within the scope of protection of this application.

Claims

1. A spin dryer for substrate sheets, characterized by: The application relates to a substrate film processing device, which comprises a fixed cylinder (1), a fixed bottom plate (2) and a rotatable rotating disc (3), the lower end of the cylinder (1) is sealingly connected to the bottom plate (2), the rotating disc (3) is arranged in the cylinder (1) and is provided with a driving device, and the driving device is fixed on the bottom plate (2); a liquid discharge groove mechanism is arranged on the cylinder (1) or / and the bottom plate (2) and the rotating disc (3) respectively. The rotating disc (3) comprises a bottom disc (31) and a baffle (32), the lower side of the bottom disc (31) is connected to the driving device, at least one work station for placing a substrate film is arranged on the bottom disc (31), the baffle (32) is installed on the upper side of the bottom disc (31) and is used for blocking the substrate film, and the substrate film is placed into or taken out between the bottom disc (31) and the baffle (32).

2. The base sheet spin-dryer according to claim 1, characterized by: A recess (22) and an opening (26) for discharging liquid are arranged on the central part of the upper side of the bottom plate (2), the part outward of the recess (22) on the bottom plate (2) is in a gradually descending stepped structure and comprises a first step (23), a second step (24) and a third step (25) in sequence, and the lower end of the cylinder (1) is sealingly connected to the second step (24); The opening (26) is located in the recess (22), a mounting plate (4) is fixed in the recess (22), the mounting plate (4) is arranged in the transverse and longitudinal directions and is spaced apart from the recess (22) to discharge liquid to the opening (26), and the driving device is fixed on the lower side of the mounting plate (4) through the opening (26).

3. The base sheet spin-dryer according to claim 1, characterized by: The liquid discharge groove mechanism on the rotating disc (3) comprises a plurality of liquid discharge grooves (33) arranged transversely through the bottom disc (31) and a plurality of leakage holes (34) arranged on the left and right sides of the baffle (32), and the liquid discharge groove mechanism on the bottom plate (2) comprises at least one liquid discharge hole I (21) arranged on the second step (24).

4. The base sheet spin-dryer according to claim 1, characterized by: The bottom disc (31) is provided with two work stations which are symmetrically distributed leftward and rightward and are used for respectively placing substrate films, and a channel groove is arranged in the middle part of the baffle (32) and is used for taking and placing the substrate films.

5. The base sheet spin-dryer according to claim 2, characterized by: At least one liquid discharge hole II (41) and at least one liquid guide groove (42) are arranged on the mounting plate (4), the liquid discharge hole II (41) is communicated with the opening (26), and the liquid guide groove (42) is arranged on the upper surface of the mounting plate (4) and penetrates to the outer edge of the mounting plate (4).

6. The base sheet spin-dryer according to claim 2, characterized by: The mounting plate (4) and the recess (22) of the bottom plate (2) are connected through a plurality of rubber shock absorbers (8).

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