Production device of semiconductor stripping liquid

Abstract

The utility model discloses a production device of semiconductor stripping liquid, which comprises a reaction kettle, the left upper part of the reaction kettle is communicated with a feed port, and the left lower part of the reaction kettle is communicated with a discharge pipe; a motor is mounted above the reaction kettle, the output end of the motor is connected with a driving rotating shaft, a reciprocating screw rod is mounted at the lower end of the driving rotating shaft, the lower end of the reciprocating screw rod is rotationally connected with a driven rotating shaft, and a vortex spring is connected between the end part of the driven rotating shaft and the reciprocating screw rod. According to the production device of the semiconductor stripping liquid, the rotating rod is controlled to rotate through rotation of the reciprocating lead screw, so that the stirring rod is controlled to rotate in the horizontal direction, and the rotating rod drives the stirring rod to rotate in the vertical direction in cooperation with intermittent pushing of the protruding block on the protruding rod and the elastic force effect of the vortex spring; and the stirring rod rotates in the vertical direction while horizontally rotating, so that raw materials are stirred in multiple channels, and the mixing efficiency and the mixing effect are improved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor stripping fluid production technology, specifically to a semiconductor stripping fluid production apparatus. Background Technology

[0002] Semiconductor stripping fluid, also known as photoresist stripping fluid, is a material used in semiconductor manufacturing processes to effectively remove photoresist. It not only removes photoresist efficiently but also ensures chemical inertness to the substrate, avoiding corrosion and damage. It is suitable for all stages of the semiconductor manufacturing industry. Semiconductor stripping fluid is composed of multiple components, which are mixed together to form the stripping fluid.

[0003] However, when mixing liquid raw materials, directly using a fixed rate and a fixed mixing method results in poor mixing efficiency and effect. It is not conducive to the rapid penetration and mixing of various raw materials from different channels, and the uniformity of mixing is low, which is not conducive to improving the mixing effect. Therefore, we propose a semiconductor stripping liquid production device to solve the above-mentioned problems. Utility Model Content

[0004] The purpose of this invention is to provide a semiconductor stripping fluid production apparatus to solve the problems mentioned in the background art, where the current market uses a fixed speed and a fixed stirring method to mix liquid raw materials, resulting in poor mixing efficiency and effect, hindering the rapid penetration and mixing of various components from different channels, and causing low uniformity of mixing, which is not conducive to improving the mixing effect.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a semiconductor stripping fluid production apparatus, comprising a reaction vessel, wherein a feed inlet is connected to the upper left side of the reaction vessel and a discharge pipe is connected to the lower left side of the reaction vessel;

[0006] A motor is installed above the reactor. The output end of the motor is connected to a drive shaft. A reciprocating screw is installed at the lower end of the drive shaft. A driven shaft is rotatably connected to the lower end of the reciprocating screw. A scroll spring is connected between the end of the driven shaft and the reciprocating screw.

[0007] A rotating rod is installed on the outer side of the driven rotating shaft, a stirring rod is connected to the outer side of the rotating rod, and a protruding rod is installed at the lower end of the rotating rod;

[0008] The bottom of the inner side of the reactor is equipped with a protrusion;

[0009] The outer side of the reciprocating wire rod is connected with a moving frame, the lower section of the moving frame is provided with a mounting ring, the mounting ring is provided with a gas cylinder, the inside of the gas cylinder is slidably connected with a piston, the upper end of the piston is connected with a moving rod, the upper end of the moving rod is connected with a mounting plate, the side surface of the mounting plate is connected with the inner wall of the reaction kettle, and the lower end of the gas cylinder is communicated with a spray head.

[0010] Preferably, the rotating rod is connected with the reciprocating wire rod through a driven rotating shaft to form a rotating structure, and the lower end of the reciprocating wire rod is in an "n" shape.

[0011] Preferably, the contact positions of the convex rods and the convex blocks are in smooth arc shapes, and the convex rods are in side "L" shapes.

[0012] Preferably, the upper side of the mounting plate is in an inclined shape, the mounting plate is symmetrically provided with two groups about the longitudinal center line of the reaction kettle, and there is a gap between the end portions of the two groups of mounting plates.

[0013] Preferably, the moving rod slidably penetrates the upper wall of the gas cylinder, and the moving rod is connected between the piston and the mounting plate.

[0014] Preferably, the mounting rings are connected through the moving frame, there is a gap between the mounting rings and the inner wall of the reaction kettle, and the moving frame is in an inverted "U" shape.

[0015] Compared with the prior art, the semiconductor stripping liquid production device has the following beneficial effects:

[0016] (1) The semiconductor stripping liquid production device utilizes the rotation of the reciprocating wire rod to control the rotation of the rotating rod, thereby controlling the horizontal orientation rotation of the stirring rod, and in combination with the intermittent pushing of the convex blocks on the convex rods and the elastic force of the vortex spring, the rotating rod drives the stirring rod to rotate in the vertical orientation, so that the stirring rod rotates in the vertical orientation while rotating horizontally, the raw materials are subjected to multi-channel stirring, and the mixing efficiency and mixing effect are improved.

[0017] (2) The semiconductor stripping liquid production device utilizes the rotation of the reciprocating wire rod to control the up-down reciprocating movement of the moving frame, thereby controlling the movement of the mounting ring and the gas cylinder, adjusting the relative position between the piston and the gas cylinder, and thereby utilizing the spray head to continuously suck and spray the liquid raw materials, and utilizing the spraying force to rapidly penetrate and mix the raw materials, thereby improving the mixing uniformity. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is a whole structure schematic view of the utility model;

[0019] Figure 2 It is a sectional structure schematic view of the utility model;

[0020] Figure 3The utility model discloses a mounting plate structure schematic diagram.

[0021] Figure 4 The utility model discloses a pneumatic cylinder cross section structure schematic diagram.

[0022] Figure 5 The utility model discloses a reciprocating screw rod side view structure schematic diagram.

[0023] Figure 6 The utility model discloses a protruding block structure schematic diagram.

[0024] In the drawing: 1, reaction kettle; 2, feed inlet; 3, discharge pipe; 4, motor; 5, driving shaft; 6, reciprocating screw rod; 7, driven shaft; 8, vortex spring; 9, rotating rod; 10, stirring rod; 11, piston; 12, protruding rod; 13, protruding block; 14, mounting plate; 15, moving rod; 16, moving frame; 17, mounting ring; 18, pneumatic cylinder; 19, spray head. DETAILED DESCRIPTION

[0025] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of the utility model.

[0026] Please refer to Figures 1-6 The utility model provides the following technical scheme: a semiconductor stripping liquid's production device, including reaction kettle 1, the upper left of reaction kettle 1 is connected with feed inlet 2, and the lower left of reaction kettle 1 is connected with discharge pipe 3;The upper of reaction kettle 1 is installed with motor 4, and the output of motor 4 is connected with driving shaft 5, and the lower end of driving shaft 5 is installed with reciprocating screw rod 6, and the lower end of reciprocating screw rod 6 is rotatably connected with driven shaft 7, and vortex spring 8 is connected between the end of driven shaft 7 and reciprocating screw rod 6;Driven shaft 7's outside is installed with rotating rod 9, and the outside of rotating rod 9 is connected with stirring rod 10;

[0027] Further, rotating rod 9 forms a rotating structure with driven shaft 7 and reciprocating screw rod 6, the lower end of reciprocating screw rod 6 is "n" structure, can realize the smooth rotation of rotating rod 9, can carry out vertical orientation rotation while the horizontal orientation rotation of stirring rod 10, carries out the multi-channel stirring of liquid raw materials;

[0028] The lower end of rotating rod 9 is installed with protruding rod 12, and the bottom of the inner side of reaction kettle 1 is installed with protruding block 13;

[0029] Further, the contact between the convex rod 12 and the convex block 13 is smooth and arc-shaped, the convex rod 12 is "L"-shaped, and the convex block 13 can push the convex rod 12 to control the rotation of the rotating rod 9;

[0030] The outer side of the reciprocating screw rod 6 is connected with a moving frame 16, the lower section of the moving frame 16 is provided with a mounting ring 17, the mounting ring 17 is provided with an air cylinder 18, the inside of the air cylinder 18 is slidably connected with a piston 11, the upper end of the piston 11 is connected with a moving rod 15, the upper end of the moving rod 15 is connected with a mounting plate 14, the side surface of the mounting plate 14 is connected with the inner wall of the reaction kettle 1, and the lower end of the air cylinder 18 is communicated with a spray head 19;

[0031] Further, the upper side surface of the mounting plate 14 is inclined, the mounting plate 14 is symmetrically provided with two groups about the longitudinal center line of the reaction kettle 1, and there is a gap between the end portions of the two groups of mounting plates 14, so that the raw materials can be prevented from being accumulated on the upper end surface of the mounting plate 14, and the mounting plate 14 is used for mounting and fixing the moving rod 15;

[0032] Further, the moving rod 15 slidably penetrates the upper wall of the air cylinder 18, the moving rod 15 is connected between the piston 11 and the mounting plate 14, so that the relative position between the piston 11 and the air cylinder 18 can be changed to suck and spray the liquid raw materials;

[0033] Further, the mounting rings 17 are connected through the moving frame 16, and there is a gap between the mounting ring 17 and the inner wall of the reaction kettle 1, the moving frame 16 is "U"-shaped, and the moving frame 16 is used for controlling the synchronous movement of the mounting ring 17;

[0034] Specifically, when the production device of the semiconductor stripping liquid is used, the sealing cover threadedly connected with the feeding port 2 is removed, the raw materials can be put into the reaction kettle 1 from the feeding port 2, the total capacity of the raw materials entering the reaction kettle 1 is less than that of the reciprocating screw rod 6, then the power supply of the motor 4 is turned on, the motor 4 controls the rotation of the driving shaft 5 connected with the output end, the driving shaft 5 drives the reciprocating screw rod 6 connected with the lower end to rotate, the reciprocating screw rod 6 controls the rotating rod 9 provided at the lower end to rotate, the rotating rod 9 drives the stirring rod 10 mounted on the outer side to rotate, the stirring rod 10 stirs and mixes the raw material components, and when the rotating rod 9 rotates, the convex rod 12 intermittently contacts with the convex block 13, the convex block 13 pushes the convex rod 12 when the convex rod 12 contacts with the convex block 13, so that the rotating rod 9 rotates on the reciprocating screw rod 6 through the driven shaft 7, the driven shaft 7 drives the vortex spring 8 connected with the end portion to rotate and store force, and when the position of the convex rod 12 is not contacted with the convex block 13, the vortex spring 8 controls the driven shaft 7 to reset and rotate, so that the rotating rod 9 resets and rotates, so that the stirring rod 10 also rotates in the vertical direction while rotating horizontally, and the raw materials are stirred in multiple channels;

[0035] When the reciprocating screw rod 6 rotates, the outer connecting moving frame 16 reciprocates up and down, the moving frame 16 drives the installation ring 17 to move down, the installation ring 17 controls the air cylinder 18 to move down, at this time the piston 11 slides in the air cylinder 18, and the liquid raw material is sucked into the air cylinder 18 along the nozzle 19, when the moving frame 16 moves up, the installation ring 17 is controlled to move up, thereby controlling the air cylinder 18 to move up, at this time the piston 11 reversely slides in the air cylinder 18, and the liquid raw material is sprayed out along the nozzle 19, the raw materials are rapidly and mutually infiltrated by using the spraying force, the mixing uniformity is improved, the semiconductor stripping liquid is prepared, the valve on the discharge pipe 3 is opened, and the semiconductor stripping liquid is discharged.

[0036] Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions recorded in the foregoing embodiments or make equivalent replacement to part of the technical features, and any modification, equivalent replacement, improvement, etc. within the spirit and principle of the utility model should be included in the protection scope of the utility model.

Claims

1. A production apparatus of a semiconductor stripping solution comprising a reaction vessel (1), characterized by: The upper left side of the reation kettle (1) is connected with the feeding port (2), and the lower left side of the reation kettle (1) is connected with the discharging pipe (3). The upper side of the reation kettle (1) is installed with the motor (4), and the output end of the motor (4) is connected with the driving shaft (5), and the lower end of the driving shaft (5) is installed with the reciprocating screw rod (6), and the lower end of the reciprocating screw rod (6) is rotatably connected with the driven shaft (7), and the end of the driven shaft (7) is connected with the vortex spring (8) between the reciprocating screw rod (6). The outer side of the driven shaft (7) is installed with the rotating rod (9), the outer side of the rotating rod (9) is connected with the stirring rod (10), and the lower end of the rotating rod (9) is installed with the convex rod (12). The bottom of the inner side of the reation kettle (1) is installed with the convex block (13). The outer side of the reciprocating screw rod (6) is connected with the moving frame (16), the lower section of the moving frame (16) is installed with the mounting ring (17), the mounting ring (17) is installed with the air cylinder (18), the inside of the air cylinder (18) is slidably connected with the piston (11), the upper end of the piston (11) is connected with the moving rod (15), the upper end of the moving rod (15) is connected with the mounting plate (14), the side of the mounting plate (14) is connected with the inner wall of the reation kettle (1), and the lower end of the air cylinder (18) is connected with the nozzle (19).

2. The apparatus according to claim 1, wherein: The rotating rod (9) is rotatably connected with the reciprocating screw rod (6) through the driven shaft (7), and the lower end of the reciprocating screw rod (6) is in "n" shape structure.

3. The apparatus according to claim 1, wherein: The contact part of the convex rod (12) and the convex block (13) is in smooth arc shape distribution, and the convex rod (12) is in "L" shape structure.

4. The apparatus according to claim 1, wherein: The upper side of the mounting plate (14) is in inclined shape distribution, and the mounting plate (14) is symmetrically provided with two groups about the longitudinal center line of the reation kettle (1), and there is a gap between the ends of the two groups of mounting plates (14).

5. The apparatus according to claim 1, wherein: The moving rod (15) slidably penetrates the upper wall of the air cylinder (18), and the moving rod (15) is connected between the piston (11) and the mounting plate (14).

6. The apparatus according to claim 1, wherein: The mounting rings (17) are connected through the moving frame (16), and there is a gap between the mounting rings (17) and the inner wall of the reation kettle (1), and the moving frame (16) is in inverted "U" shape structure.

Images