Conductive ceramic low-temperature-speed sintering furnace based on infrared radiation

Abstract

The utility model discloses a conductive ceramic low-temperature fast sintering furnace based on infrared radiation, which relates to the technical field of low-temperature sintering furnaces and comprises a furnace body and a furnace door, the furnace door is laterally and rotatably connected to the side wall of the furnace body, a base is arranged in the furnace body, a bearing piece is placed at the upper end of the base and comprises a bearing plate, and the bearing plate is arranged on the furnace body. A fixing frame is fixed to the upper end of the bearing plate. The utility model discloses a conductive ceramic low-temperature-speed sintering furnace based on infrared radiation. By forming the through holes in the frame and arranging the aluminum foil reflecting film on the side face of the fixing frame, the penetration and reflection effects of infrared radiation are enhanced, heat loss is reduced, and the sintering efficiency is improved; the distance between a clamping plate and a supporting rod of the adjusting assembly can be flexibly adjusted, small-size ceramics can be supported, large-size ceramics can be stably supported, and the applicability is improved; and the porous aluminum plate is adopted as the bearing plate, so that the heat gradient is reduced, and the cracking risk caused by uneven thermal stress of the ceramic is reduced.

Description

Technical Field

[0001] This utility model relates to the field of low-temperature sintering furnace technology, specifically to a low-temperature rapid sintering furnace for conductive ceramics based on infrared radiation. Background Technology

[0002] Conductive ceramics are widely used in electronic devices, energy storage and other fields due to their excellent electrical and mechanical properties. Conductive ceramics are processed by low-temperature infrared radiation in a sintering furnace, which forms stable electrical and mechanical properties.

[0003] Traditional sintering furnaces typically employ low-temperature infrared radiation processing. Infrared radiation causes rapid temperature rise, which can lead to uneven internal stress, abnormal grain growth, and even cracking in ceramics, affecting product performance. Furthermore, the fixed support structure of traditional sintering furnaces makes it difficult to adapt to the processing requirements of ceramics of different sizes, and the low utilization rate of infrared radiation results in high energy consumption and low efficiency. Utility Model Content

[0004] To address the shortcomings of existing technologies, this invention provides a low-temperature rapid sintering furnace for conductive ceramics based on infrared radiation, which solves the problems of cracking during the sintering of conductive ceramics and insufficient utilization of infrared radiation.

[0005] To achieve the above objectives, this utility model is implemented through the following technical solution: a low-temperature rapid sintering furnace for conductive ceramics based on infrared radiation, comprising a furnace body and a furnace door, wherein the furnace door is laterally rotatably connected to the side wall of the furnace body, a base is provided inside the furnace body, a support member is placed on the upper end of the base, the support member includes a support plate, a fixing frame is fixed to the upper end of the support plate, and side frames are fixed to the two sides of the fixing frame, the support plate is a porous aluminum plate, used to reduce the thermal stress of the conductive ceramics, a fixing bracket is provided at the upper end of the support plate, and an adjustable spacing adjustment component is provided on the fixing bracket, used to support the conductive ceramics to detach from the support plate, and the support member can be stacked vertically.

[0006] Furthermore: the upper end of the fixing frame is provided with a groove, the adjusting component includes a locking plate, the locking plate is slidably engaged in the groove at the upper end of the fixing frame, the lower end of the locking plate extends to the upper surface of the support plate and is fixed with multiple support rods, the support rods are used to support conductive ceramics of different sizes.

[0007] Furthermore: a groove is provided at the upper end of the frame, and slide bars are fixed on both sides of the lower end of the support plate. The slide bars slide in match with the groove to realize the stacking of the support components.

[0008] Furthermore: the fixing frame is cross-shaped, and a fixing groove is provided on the side of the fixing frame. An aluminum foil reflective film is attached to the fixing groove to enhance the infrared radiation efficiency.

[0009] Furthermore, the side of the frame is provided with perforations.

[0010] Furthermore, the lower end of the base is symmetrically provided with slots to facilitate loading and unloading of materials.

[0011] This invention provides a low-temperature rapid sintering furnace for conductive ceramics based on infrared radiation. Compared with the prior art, it has the following advantages:

[0012] This infrared radiation-based low-temperature rapid sintering furnace for conductive ceramics features enhanced infrared radiation penetration and reflection through perforations in the frame and the installation of aluminum foil reflective films on the sides of the mounting brackets, reducing heat loss and improving sintering efficiency. The adjustable components, including the clamping plates and support rods, allow for flexible spacing adjustments, supporting both small and large ceramics, thus improving versatility. The use of perforated aluminum plates as support plates reduces the heat gradient, minimizing the risk of cracking due to uneven thermal stress. The support components are stacked via grooves and slide bars, and the base's slot design facilitates forklift handling, improving production efficiency. The side-rotating furnace door saves space, and the sliding clamping mechanism of the adjustable components ensures stable operation. The overall structure is simple, reliable, and easy to maintain. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0014] Figure 2 This is a schematic diagram of the structure of the furnace body and base of this utility model;

[0015] Figure 3 This is a schematic diagram of the structure of the fixing frame and fixing groove of this utility model;

[0016] Figure 4 This is a schematic diagram of the unfolded structure of the adjustment component and the support plate of this utility model;

[0017] Figure 5 for Figure 4 Enlarged structural diagram at point A;

[0018] Figure 6 for Figure 4 Enlarged structural diagram at point B.

[0019] In the diagram: 1. Furnace body; 2. Furnace door; 3. Base; 4. Slot; 5. Fixing frame; 6. Support plate; 7. Frame; 8. Slide groove; 9. Slide bar; 10. Perforation; 11. Fixing bracket; 12. Fixing groove; 13. Groove; 14. Card plate; 15. Support rod. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0021] Please see Figure 1-6 This utility model provides a technical solution: a low-temperature rapid sintering furnace for conductive ceramics based on infrared radiation; specifically, it consists of a furnace body 1 and a furnace door 2. The sintering furnace uses infrared radiation heating, and the heating system mainly includes infrared radiation heating elements, such as infrared heating tubes and infrared heating plates. These elements can emit infrared rays of specific wavelengths, which are absorbed by the conductive ceramic material and converted into heat energy, thereby achieving the heating and sintering of the conductive ceramic. This is existing known technology and will not be detailed here. The furnace door 2 rotates laterally on the side wall of the furnace body 1. A base 3 is provided inside the furnace body 1, and a support is placed on the upper end of the base 3. The support specifically includes a support plate 6, with a fixing frame 5 fixed to the upper end of the support plate 6. Frames 7 are fixed to the upper two edges of the fixing frame 5, and perforations 10 are provided on the sides of the frame 7. The perforations 10 can effectively improve the heating performance. The high infrared radiation penetration effect is achieved by a fixed frame 11 located at the upper end of the support plate 6. An adjustment component is installed on the fixed frame 11, which can support the conductive ceramic body to detach from the support plate 6, thereby increasing the contact area between the conductive ceramic and the infrared radiation. The adjustment component can adjust the spacing according to the size of the conductive ceramic. At the same time, the support components can be stacked, which facilitates the placement of more conductive ceramics inside the furnace body 1 for processing. In addition, a reflective film is installed on the side of the fixed frame 11, which can improve the working efficiency of infrared radiation.

[0022] A groove 13 is provided at the upper end of the fixing frame 11. The adjustment component specifically includes a locking plate 14. The locking plate 14 is locked in the groove 13 and slides against the upper end of the fixing frame 11. The lower end of the locking plate 14 extends to the upper surface of the support plate 6. A support rod 15 is fixed at the lower end of the locking plate 14. There are multiple support rods 15. Smaller conductive ceramics can be placed directly on multiple support rods 15, while larger conductive ceramics can be placed between two sets of support rods 15, thereby effectively supporting the conductive ceramics to detach from the support plate 6. The locking plate 14 can be placed in two sets in the groove 13 at the same time, and can be stably locked when sliding.

[0023] A groove 8 is provided at the upper end of the frame 7, and slide bars 9 are fixed on both sides of the lower end of the support plate 6. The slide bars 9 are matched with the groove 8 and slide to facilitate the overall stacking of the support components.

[0024] The fixing frame 11 is arranged in a cross shape, which divides the overall space of the support plate 6 into four spaces. A fixing groove 12 is provided on the side of the fixing frame 11, and aluminum foil is attached in the fixing groove 12. The aluminum foil can effectively reflect infrared radiation, and the reflection of the aluminum foil can reduce the infrared radiation path, thereby effectively improving the working efficiency of infrared radiation.

[0025] The support plate 6 is a porous aluminum plate. The porous aluminum plate can effectively reduce the thermal stress on the surface of the conductive ceramic. As a result, the processing of the conductive ceramic in the support plate 6 can effectively reduce the rate of increase of the heat gradient, thereby reducing the probability of cracking of the conductive ceramic.

[0026] A slot 4 is provided at the lower end of the base 3. The slots 4 are symmetrically arranged. When unloading materials, a forklift can directly insert into the slot 4, which is convenient for unloading.

Claims

1. A low-temperature rapid sintering furnace for conductive ceramics based on infrared radiation, comprising a furnace body (1) and a furnace door (2), wherein the furnace door (2) is laterally rotatably connected to the side wall of the furnace body (1), characterized in that: The furnace body (1) is provided with a base (3) inside. A support component is placed on the upper end of the base (3). The support component includes a support plate (6). A fixing frame (5) is fixed on the upper end of the support plate (6). A frame (7) is fixed on both sides of the fixing frame (5). The support plate (6) is a perforated aluminum plate to reduce the thermal stress of the conductive ceramic. A fixing bracket (11) is provided on the upper end of the support plate (6). An adjustable spacing adjustment component is provided on the fixing bracket (11) to support the conductive ceramic to detach from the support plate (6). The support component can be stacked up and down.

2. The infrared radiation-based low-temperature rapid sintering furnace for conductive ceramics according to claim 1, characterized in that: The upper end of the fixing frame (11) is provided with a groove (13). The adjustment component includes a clamping plate (14). The clamping plate (14) is slidably engaged in the groove (13) at the upper end of the fixing frame (11). The lower end of the clamping plate (14) extends to the upper surface of the support plate (6) and is fixed with multiple support rods (15). The support rods (15) are used to support conductive ceramics of different sizes.

3. The infrared radiation-based low-temperature rapid sintering furnace for conductive ceramics according to claim 2, characterized in that: The upper end of the frame (7) is provided with a sliding groove (8), and the lower ends of the support plate (6) are fixed with sliding strips (9). The sliding strips (9) and the sliding groove (8) slide together to realize the stacking of the support components.

4. The infrared radiation-based low-temperature rapid sintering furnace for conductive ceramics according to claim 2, characterized in that: The fixing frame (11) is cross-shaped, and a fixing groove (12) is provided on the side of the fixing frame (11). An aluminum foil reflective film is attached to the fixing groove (12) to enhance the infrared radiation efficiency.

5. The infrared radiation-based low-temperature rapid sintering furnace for conductive ceramics according to claim 2, characterized in that: The side of the frame (7) is provided with a perforation (10).

6. The infrared radiation-based low-temperature rapid sintering furnace for conductive ceramics according to claim 2, characterized in that: The base (3) has symmetrical slots (4) at its lower end, which facilitates loading and unloading of materials.

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