Wafer loader of horizontal wafer spin dryer

Abstract

The utility model discloses a wafer loader of a horizontal wafer drying machine, which is characterized in that the circle center of an outer turntable is positioned on a rotating axis, an inner turntable rotates on the outer turntable, and the axial lead of the inner turntable coincides with the axial lead of the outer turntable; a plurality of outer fixing rods are installed on the outer rotating disc, a plurality of inner fixing rods are installed on the inner rotating disc, when a wafer is spin-dried, each inner fixing rod and two corresponding outer fixing rods are distributed on the same isosceles triangle, and the inner fixing rods are located at the vertex angles of the isosceles triangle. And the three corresponding sockets on the inner fixing rod and the two outer fixing rods are jointly used for fixing the same wafer. According to the utility model, an existing support mechanism is optimized, the support is mainly composed of the outer fixing rod, the inner fixing rod and the socket matched with the outer fixing rod and the inner fixing rod, the structure is few, a stable triangular mechanism can be formed, a wafer can be stably supported, the part shielding the wafer is few, and therefore when the wafer is cleaned and dried, the wafer is not prone to falling off. And quick spin-drying can be realized.

Description

Technical Field

[0001] This utility model belongs to the field of wafer spin dryer technology, specifically, it relates to a wafer carrier for a horizontal wafer spin dryer. Background Technology

[0002] Wafer spin dryers utilize high-speed rotation to generate powerful centrifugal force. When a wafer containing moisture or other liquids is placed inside the spin dryer and begins to rotate, the centrifugal force causes the liquid to move from the wafer surface towards the edges. Just as a spinning umbrella shakes off raindrops, the liquid on the wafer is flung against the inner wall of the spin dryer by centrifugal force. The inner wall of the spin dryer is typically designed with special structures and channels to collect the flung liquid. This liquid is then drained from the equipment through a drainage system, thus achieving rapid drying of the wafer.

[0003] The main structure of a wafer spin dryer includes:

[0004] Rotation mechanism: This is the core component of the spin dryer, consisting of a motor and a rotating shaft. The motor provides power, driving the rotating shaft to rotate the wafer carrier at high speed. The rotating shaft needs to have high-precision balance and stability to ensure that excessive vibration is not generated during high-speed rotation;

[0005] Wafer carrier: Used to precisely hold and position wafers. It usually has special clamping devices that can firmly hold the wafer, preventing it from slipping during rotation, without damaging the wafer surface;

[0006] Casing and protective devices: The casing serves to protect the internal structure and prevent liquid splashes.

[0007] However, existing horizontal wafer spin dryers have multiple chambers in their wafer carriers. In order to meet the needs of high efficiency and rapid drying, these chambers can hold one or more wafers and rinse and spin dry them at the same time. However, the multiple chambers of the horizontal wafer spin dryer are all composed of a rectangular frame support structure, with the inlet and outlet located at the inner axis of the chamber.

[0008] The support structure consists of solid plates on opposite sides, while the back is an open plate for easy access to liquids and gases. This support structure tends to obstruct a significant portion of the wafer during the cleaning process, resulting in inadequate drying of the obscured areas. Utility Model Content

[0009] In view of the shortcomings of the existing technology, the purpose of this utility model is to provide a wafer carrier for a horizontal wafer spin dryer.

[0010] To achieve the aforementioned objectives, the technical solution adopted by this utility model includes: a wafer carrier for a horizontal wafer spin dryer, comprising:

[0011] The outer turntable has its center located on the axis of rotation, and its bottom is rotated by the rotating mechanism of the wafer spin dryer itself.

[0012] The inner turntable rotates on top of the outer turntable. The center line of the inner turntable coincides with the center line of the outer turntable, and the diameter of the inner turntable is smaller than that of the outer turntable.

[0013] Several external fixing rods are installed on the outer turntable, and the external fixing rods are evenly distributed at equal intervals along the circumference of the outer turntable.

[0014] Several internal fixing rods are installed on the inner turntable, and the internal fixing rods are evenly distributed at equal intervals along the circumference of the inner turntable.

[0015] The number of external fixing rods is twice that of internal fixing rods. Each external fixing rod and each internal fixing rod is equipped with a socket. Each internal fixing rod and two external fixing rods are set as a group.

[0016] When the wafer is spin-drying, each inner fixing rod and the corresponding two outer fixing rods are distributed on the same isosceles triangle, with the inner fixing rod located at the vertex of the isosceles triangle. The three sockets on the inner fixing rod and the two outer fixing rods are used together to fix the same wafer.

[0017] The existing wafer spin dryer's internal wafer support structure reduces the space for liquids or gases to pass through, resulting in more obstruction of the wafer. This obstruction leads to longer drying times for the obstructed areas.

[0018] This utility model optimizes the existing support mechanism. The product mainly consists of an outer fixing rod, an inner fixing rod, and a matching socket. The structure is simple and can form a stable triangular mechanism, which can firmly support the wafer and obstruct the wafer. This allows the wafer to be quickly spun dry during cleaning and drying.

[0019] Furthermore, each inner fixing rod and the two outer fixing rods are provided with an equal number of sockets; for the same group of inner fixing rods and two outer fixing rods, the sockets on the inner fixing rods and the two outer fixing rods correspond one-to-one.

[0020] Furthermore, it also includes a transmission mechanism that drives the inner turntable to drive the transmission. The outer turntable has a receiving space at its center, and the inner turntable is rotatably disposed within the receiving space. The transmission between the outer turntable and the inner turntable is waterproof.

[0021] Furthermore, the transmission mechanism consists of a helical gear drive and a drive motor. In the helical gear drive, one helical gear is fixedly connected to the inner turntable via a connecting shaft, and the other helical gear is mounted on the output shaft of the drive motor. The drive motor is installed within the accommodating space.

[0022] Furthermore, a bearing is provided between the outer and inner turntables.

[0023] Furthermore, the socket includes mounting grooves formed on the opposing surfaces of the outer fixing rod and the inner fixing rod, with the groove openings facing each other and a silicone protective pad provided between the groove surfaces.

[0024] Furthermore, a reinforcing rod is provided between the tops of the two external fixing rods in each group. The reinforcing rod is arc-shaped, and the center of the arc of the reinforcing rod coincides with the center line of the outer turntable.

[0025] Compared with the prior art, the advantages of this utility model include:

[0026] (1) The wafer carrier of the horizontal wafer spin dryer provided by this utility model has a simple structure and is easy to maintain. It consists of only an outer fixing rod and an inner fixing rod and their matching sockets to form a support structure.

[0027] (2) The wafer carrier of the horizontal wafer spin dryer provided by this utility model can stably support and fix the wafer, and the wafer is less obstructed, so that the wafer can be quickly spin-dried during cleaning and drying. Attached Figure Description

[0028] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0029] Figure 1 This is a three-dimensional schematic diagram of a wafer carrier for a horizontal wafer spin dryer according to the present invention.

[0030] Figure 2 This is a schematic diagram from another perspective of the present invention;

[0031] Figure 3 This is a schematic diagram of the transmission mechanism in this utility model.

[0032] Figure 4 This is a schematic diagram of existing technology.

[0033] Figure label:

[0034] 11. Outer turntable; 12. Inner turntable; 13. Outer fixing rod; 131. Reinforcing rod; 14. Inner fixing rod; 15. Socket; 151. Mounting slot; 152. Silicone protective pad; 16. Transmission mechanism; 161. Helical gear transmission; 162. Drive motor; 17. Accommodation space. Detailed Implementation

[0035] In view of the shortcomings of the prior art, the inventors of this case, through long-term research and extensive practice, have proposed the technical solution of this utility model. The technical solution, its implementation process, and principles will be further explained below with reference to the accompanying drawings and specific implementation examples.

[0036] It should be noted that the embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention. The described embodiments are only a part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, the present invention covers any substitutions, modifications, equivalent methods and solutions made within the spirit, principles and scope of the present invention as defined by the claims. All other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0037] In the description of this application, the terms "first," "second," "third," and similar words do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Similarly, the terms "a" or "one," and similar words, do not indicate a quantity limitation, but rather indicate the presence of at least one. The terms "comprising" or "including," and similar words, mean that the elements or objects preceding "comprising" or "including" encompass the elements or objects listed following "comprising" or "including," and their equivalents, but do not exclude other elements or objects. The terms "connected" or "linked," and similar words, are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect.

[0038] In the description of this application, the terms "center," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used solely for the convenience of describing this application and for simplification, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. Furthermore, when using positional terms such as "both sides," "outer side," and "upper and lower," it should be understood that they are used only for ease of understanding and description, taking into account that the structure may be oriented to other positions.

[0039] In the description of this application, unless otherwise expressly specified and limited, the technical or scientific terms used shall have the ordinary meaning understood by a person with ordinary skills in the art to which this application pertains. Terms such as “installation,” “connection,” and “joining” shall be interpreted broadly, for example, as fixed connection, detachable connection, mating connection, or integral connection. For a person skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.

[0040] This utility model embodiment aims to introduce and explain the structural composition of the wafer carrier of a horizontal wafer spin dryer and the cooperation relationship between the various components. Unless otherwise specified, the dimensions, materials and manufacturing processes of the various components in the wafer carrier suitable for the horizontal wafer spin dryer in this utility model embodiment can be selected according to specific circumstances, and no special limitations or explanations are made here.

[0041] Furthermore, to provide the public with a better understanding of this utility model, certain specific details are described in detail in the following description. However, those skilled in the art can fully understand this utility model even without these detailed descriptions.

[0042] Example 1

[0043] Please see Figure 1 , Figure 2 , Figure 3 A wafer carrier for a horizontal wafer spin dryer, comprising:

[0044] The outer turntable 11 has its center located on the rotation axis, and its bottom is rotated by the rotation mechanism of the wafer spin dryer itself.

[0045] The inner turntable 12 rotates on the outer turntable 11. The axis of the inner turntable 12 coincides with the axis of the outer turntable 11. The diameter of the inner turntable 12 is smaller than that of the outer turntable 11. The outer turntable 11 has a space to accommodate the inner turntable 12. A bearing is installed between the outer turntable 11 and the inner turntable 12, and a sealing ring is installed to prevent water from entering and to facilitate the rotation of the inner turntable 12. Preferably, the upper surfaces of the outer turntable 11 and the inner turntable 12 are on the same horizontal plane.

[0046] A number of external fixing rods 13 are installed on the outer turntable 11, and the number of external fixing rods 13 are evenly distributed at equal intervals along the circumference of the outer turntable 11.

[0047] A plurality of internal fixing rods 14 are installed on the inner turntable 12, and the plurality of internal fixing rods 14 are evenly distributed at equal intervals along the circumference of the inner turntable 12.

[0048] The number of external fixing rods 13 is twice that of internal fixing rods 14. Each external fixing rod 13 and each internal fixing rod 14 is equipped with a socket 15. Each internal fixing rod 14 and two external fixing rods 13 are set as a group. Each internal fixing rod 14 and two external fixing rods 13 are provided with an equal number of sockets 15. For the same group of internal fixing rods 14 and two external fixing rods 13, the sockets 15 on the internal fixing rods 14 and the two external fixing rods 13 correspond one-to-one.

[0049] When the wafer is spin-drying, each inner fixing rod 14 and the corresponding two outer fixing rods 13 are distributed on the same isosceles triangle, with the inner fixing rod 14 located at the apex of the isosceles triangle. The three sockets 15 on the inner fixing rod 14 and the two outer fixing rods 13 are used together to fix the same wafer.

[0050] Furthermore, it also includes a transmission mechanism 16, which drives the inner turntable 12 to drive. The outer turntable 11 has a receiving space 17 at its center. The inner turntable 12 is rotatably disposed in the receiving space 17. The transmission between the outer turntable 11 and the inner turntable 12 is waterproof. The transmission mechanism 16 consists of a helical gear transmission 161 and a drive motor 162. One helical gear of the helical gear transmission 161 is fixedly connected to the inner turntable 12 through a connecting shaft, and the other helical gear is mounted on the output shaft of the drive motor 162. The drive motor 162 is mounted in the receiving space 17.

[0051] Furthermore, the socket 15 includes mounting grooves 151 formed on the opposing surfaces of the outer fixing rod 13 and the inner fixing rod 14. The openings of the mounting grooves 151 are arranged opposite each other, and a silicone protective pad 152 is installed between the inner surfaces of the mounting grooves 151. The silicone protective pad 152 is U-shaped, and the wafer is inserted into the center of the U-shape of the silicone protective pad 152.

[0052] Furthermore, a reinforcing rod 131 is installed between the top ends of the two external fixing rods 13 in each group. The reinforcing rod 131 is arc-shaped, and the center of the arc of the reinforcing rod 131 coincides with the axis of the outer turntable 11. The reinforcing rod 131 mainly improves the stability of the structure.

[0053] Working principle: The bottom of the outer turntable is rotated by the rotating mechanism of the wafer spin dryer itself. The inner turntable is mounted on the outer turntable. The inner turntable is driven by a drive motor to change the position of the inner fixing rod. When a wafer needs to be inserted, the drive motor drives the inner fixing rod to move diagonally to the outer fixing rod. At this time, the socket of the outer fixing rod is exposed, the wafer is inserted, and then the drive motor drives the inner turntable to rotate. The inner turntable rotates to the apex of the triangle formed by the inner turntable and the outer fixing rod, thus completing the fixation of the wafer.

[0054] In this way, the structure of this invention is less complex and can form a stable triangular mechanism, which can firmly support the wafer and obstruct the wafer. This allows the wafer to be quickly spun dry during cleaning and drying.

[0055] It should be understood that the above embodiments are only for illustrating the technical concept and features of this utility model, and are intended to enable those skilled in the art to understand the content of this utility model and implement it accordingly. It should not be considered that the specific implementation of this utility model is limited to these descriptions. For those skilled in the art to which this utility model pertains, several simple deductions or substitutions can be made without departing from the concept of this utility model. All equivalent changes or modifications made in accordance with the spirit and essence of this utility model should be covered within the protection scope of this utility model.

Claims

1. A wafer carrier for a horizontal wafer spin dryer, characterized in that: include: An outer turntable, the center of which is located on the axis of rotation; An inner turntable rotates on an outer turntable, and the axis of the inner turntable coincides with the axis of the outer turntable. A plurality of external fixing rods are provided on an outer turntable, and the plurality of external fixing rods are evenly distributed at equal intervals along the circumference of the outer turntable; A plurality of internal fixing rods are arranged on the inner turntable, and the plurality of internal fixing rods are evenly distributed at equal intervals along the circumference of the inner turntable; The number of external fixing rods is twice that of internal fixing rods. Each external fixing rod and each internal fixing rod is provided with a socket. Each internal fixing rod and two external fixing rods are set as a group. When the wafer is spin-drying, each inner fixing rod and the corresponding two outer fixing rods are distributed on the same isosceles triangle, with the inner fixing rod located at the apex of the isosceles triangle. The three sockets on the inner fixing rod and the two outer fixing rods are used to fix the same wafer.

2. The wafer carrier of a horizontal wafer spin dryer according to claim 1, characterized in that: Each inner fixing rod and the two outer fixing rods are provided with an equal number of sockets; for the same group of inner fixing rods and two outer fixing rods, the sockets on the inner fixing rods and the two outer fixing rods correspond one-to-one.

3. The wafer carrier of a horizontal wafer spin dryer according to claim 1, characterized in that: It also includes a transmission mechanism that drives the inner turntable, and the outer turntable has a receiving space at its center. The inner turntable is rotatably disposed within the receiving space, and the transmission between the outer and inner turntables is waterproof.

4. The wafer carrier of a horizontal wafer spin dryer according to claim 3, characterized in that: The transmission mechanism consists of a helical gear drive and a drive motor. One of the helical gears in the helical gear drive is fixedly connected to the inner turntable via a connecting shaft, and the other helical gear is mounted on the output shaft of the drive motor. The drive motor is installed within the accommodating space.

5. The wafer carrier of a horizontal wafer spin dryer according to claim 3, characterized in that: A bearing is provided between the outer turntable and the inner turntable.

6. The wafer carrier of a horizontal wafer spin dryer according to claim 2, characterized in that: The socket includes mounting grooves formed on the opposing surfaces of the outer fixing rod and the inner fixing rod, the groove openings of the mounting grooves being arranged opposite each other, and a silicone protective pad being provided between the groove surfaces of the mounting grooves.

7. The wafer carrier of a horizontal wafer spin dryer according to claim 2, characterized in that: A reinforcing rod is provided between the tops of the two external fixing rods in each group. The reinforcing rod is arc-shaped, and the center of the arc of the reinforcing rod coincides with the center line of the outer turntable axis.

Images