Wafer loader of horizontal wafer spin dryer
By using an outer fixing rod and an inner fixing rod to form a stable triangular mechanism, the problem of uneven drying caused by a large number of obstructed areas in horizontal wafer spin dryers is solved, and rapid spin drying and uniform drying of wafers are achieved.
CN224124562UActive Publication Date: 2026-04-14KUNSHAN XINRUIWEI EXPERIMENTAL EQUIP CO LTD
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Patent Information
- Application Number
- CN202520777973.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-23
- Publication Date
- 2026-04-14
- Estimated Expiration
- 2035-04-23
AI Technical Summary
Technical Problem
Existing horizontal wafer spin dryers have wafer carriers with many obstructed areas, leading to uneven drying.
Method used
A stable triangular mechanism composed of an outer fixing rod and an inner fixing rod is adopted to reduce the obstruction area. The inner turntable is driven to rotate by a helical gear transmission and a drive motor to achieve stable fixation and rapid drying of the wafer.
Benefits of technology
This technology enables rapid wafer drying, reduces the obstructed area, and improves drying efficiency and uniformity.
✦ Generated by Eureka AI based on patent content.
Abstract
The utility model discloses a wafer loader of a horizontal wafer drying machine, which is characterized in that the circle center of an outer turntable is positioned on a rotating axis, an inner turntable rotates on the outer turntable, and the axial lead of the inner turntable coincides with the axial lead of the outer turntable; a plurality of outer fixing rods are installed on the outer rotating disc, a plurality of inner fixing rods are installed on the inner rotating disc, when a wafer is spin-dried, each inner fixing rod and two corresponding outer fixing rods are distributed on the same isosceles triangle, and the inner fixing rods are located at the vertex angles of the isosceles triangle. And the three corresponding sockets on the inner fixing rod and the two outer fixing rods are jointly used for fixing the same wafer. According to the utility model, an existing support mechanism is optimized, the support is mainly composed of the outer fixing rod, the inner fixing rod and the socket matched with the outer fixing rod and the inner fixing rod, the structure is few, a stable triangular mechanism can be formed, a wafer can be stably supported, the part shielding the wafer is few, and therefore when the wafer is cleaned and dried, the wafer is not prone to falling off. And quick spin-drying can be realized.
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