A four-beam laser interferometry micro / nano fabrication device

Abstract

This utility model discloses a four-beam laser interference micro / nano fabrication device, relating to the field of laser interference micro / nano fabrication devices. The device includes a processing apparatus comprising a circular mounting base, an adjustment mechanism, and a linear slide rail. The adjustment mechanism, via an electric slide block and the linear slide rail, enables precise adjustment and positioning of a first Q-switching module, a waveplate, a pulsed xenon lamp unit, a Dammann transmission grating cavity mirror, and an angle-adjusting mirror. Furthermore, the linear slide rail is engraved with a scale, making the adjustment process more intuitive and accurate. Operators can directly read the adjustment position and angle, ensuring precise alignment of the interference beam and high-quality formation of the interference pattern. This automated adjustment significantly shortens adjustment time, improves processing efficiency, and reduces errors that may be introduced during manual adjustment. Additionally, the adjustment mechanism lowers the skill requirements for operators.

Description

Technical Field

[0001] This utility model relates to the field of laser interference micro-nano processing devices, specifically a four-beam laser interference micro-nano processing device. Background Technology

[0002] The four-beam laser interference micro / nano fabrication device generates four coherent laser beams that intersect and interfere in space, forming an interference pattern with a periodic intensity distribution. When this interference pattern is projected onto the surface of the material to be processed, a periodic micro / nano array structure can be generated on the material surface through exposure, direct writing, or other methods.

[0003] Traditional four-beam laser interferometry micro / nanofabrication devices require manual adjustment of the components on the laser interferometry micro / nanofabrication sheet. This adjustment method is too cumbersome and requires repeated calibration. At this time, the operator needs to rely on experience and intuition to fine-tune the position and angle of each component. This makes the adjustment process both time-consuming and labor-intensive. Moreover, the operator usually needs to adjust multiple components one by one in a specific order and step, such as Q-switching modules, waveplates, pulsed xenon lamp units, Dammann transmission grating cavity mirrors, and angle-adjusting mirrors. The interaction between these components is complex, and a small change in any component may affect the performance of the entire interferometric system. Utility Model Content

[0004] Based on this, the purpose of this utility model is to provide a four-beam laser interference micro-nano processing device to solve the technical problems of the traditional device, which is cumbersome, time-consuming and labor-intensive, requires repeated calibration, and has complex interactions between components, making adjustment difficult and affecting the performance and processing accuracy of the interference system.

[0005] To achieve the above objectives, the present invention provides the following technical solution: a four-beam laser interference micro / nano processing device, comprising a processing device, wherein the processing device includes a mounting base arranged in a circular structure, and the bottom of the mounting base is provided with a first arc-shaped track, a second arc-shaped track, a third arc-shaped track and a fourth arc-shaped track in sequence along the circumferential direction, and each arc-shaped track is provided with an electric slide, and an adjustment mechanism is installed on the electric slide;

[0006] The adjustment mechanism includes a linear slide rail, the bottom of which has a slide rail groove. Multiple sliders are engaged and slide inside the slide rail groove. A fixing bolt is screwed to one side of the bottom of each slider, and a mounting head is provided on the other side of the top of the slider via a mounting rod.

[0007] By adopting the above technical solution, the laser interferometer unit can be flexibly installed and positioned in the circumferential direction, improving the flexibility and adjustability of the device. Simultaneously, the design of the linear guide rail and slider allows for precise adjustment of each component of the laser interferometer unit in the linear direction, further improving processing accuracy and stability.

[0008] Furthermore, from left to right, the mounting heads are provided with a first Q-switching module, a waveplate, a pulsed xenon lamp unit, a Damman transmission grating cavity mirror, and an angle-adjusting reflector. The pulsed xenon lamp unit is composed of a laser crystal Ce-Nd:YAG and a pulsed xenon lamp, and is used to emit a laser beam.

[0009] By adopting the above technical solution, the precise configuration and sequential arrangement of these components ensure the smooth execution of the laser beam emission, adjustment, and interference processes, thereby improving the quality and efficiency of the processing.

[0010] Furthermore, a semi-reflective lens is provided at the bottom axis of the mounting base via a fixed seat.

[0011] By employing the above technical solution, the semi-reflective mirror partially reflects and partially transmits the beams from different laser interference units, enabling the four beams to interfere at the intersection of the semi-reflective mirror. This design is key to realizing four-beam laser interference micro / nano fabrication, improving the accuracy and effectiveness of the fabrication process.

[0012] Furthermore, the first Q-switching module, waveplate, pulsed xenon lamp unit, Dammann transmission grating cavity mirror, and angle-adjusting reflector constitute a laser interference unit, and four sets of laser interference units are provided.

[0013] By adopting the above technical solution and designing multiple sets of laser interference units, the device can simultaneously process multiple processing points or perform more complex interference pattern processing, thereby improving the processing capability and flexibility of the device.

[0014] Furthermore, the four sets of laser interference units are divided into two teams, and each team of laser interference units is divided into two groups, with the included angle between the laser interference units in each team being thirty degrees.

[0015] By adopting the above technical solution, this specific angle setting allows the four beams to form a stable interference pattern at the intersection of the semi-reflective mirror, further improving the processing accuracy and stability. At the same time, this configuration also increases the flexibility and adjustability of the device, enabling it to adapt to different processing requirements.

[0016] Furthermore, the angle-adjusting mirrors of the four sets of laser interference units are used to focus the four beams into a single point for processing the workpiece.

[0017] By adopting the above technical solution, laser energy can be concentrated on the processing point, improving processing efficiency and precision. Simultaneously, by adjusting the angle and position of the angle-adjusting reflector, precise control of the processing point can be achieved, further enhancing the processing capability and flexibility of the device.

[0018] In summary, the present invention has the following main advantages:

[0019] 1. This utility model incorporates an adjustment mechanism, a linear slide rail, a slide rail groove, a slider, fixing bolts, a mounting rod, and a mounting head. The adjustment mechanism, via an electric slide block and the linear slide rail, enables precise adjustment and positioning of the first Q-switching module, waveplate, pulsed xenon lamp unit, Dammann transmission grating cavity mirror, and angle-adjusting reflector. Furthermore, the linear slide rail is engraved with a scale, making the adjustment process more intuitive and accurate. Operators can directly read the adjustment position and angle, ensuring precise alignment of the interference beam and high-quality formation of the interference pattern. The driving mechanism of the electric slide block and the linear slide rail allows for rapid response to control signals, achieving automated adjustment, significantly shortening adjustment time, improving processing efficiency, and reducing errors that may be introduced during manual adjustment. Additionally, the adjustment mechanism lowers the skill requirements for operators, allowing even non-professionals to easily operate the device. More importantly, its precise adjustment capability and rapid response characteristics ensure the stability and consistency of the interference beam, thereby improving processing accuracy and stability, resulting in more reliable and repeatable processing results. Attached Figure Description

[0020] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0021] Figure 2 This is a bottom-view three-dimensional structural diagram of the present invention;

[0022] Figure 3 For the present utility model Figure 1 Enlarged structural diagram at point A in the middle;

[0023] Figure 4 For the present utility model Figure 2 Enlarged structural diagram at point B.

[0024] In the diagram: 1. Processing device; 101. Mounting base; 102. First arc-shaped track; 103. Second arc-shaped track; 104. Third arc-shaped track; 105. Fourth arc-shaped track; 106. Electric slide block; 107. Semi-reflective lens; 2. Adjustment mechanism; 201. Linear slide rail; 202. Slide rail groove; 203. Slider; 204. Fixing bolt; 205. Mounting rod; 206. Mounting head; 207. First Q-switching module; 208. Wave plate; 209. Pulsed xenon lamp unit; 210. Damman transmission grating cavity mirror; 211. Angle-adjusting mirror; 212. Beam; 3. Workpiece; 4. Laser interference unit. Detailed Implementation

[0025] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0026] A four-beam laser interferometry micro / nano fabrication device, such as Figure 1-4 As shown, the device includes a processing device 1, which includes a mounting base 101 with a circular structure. The bottom of the mounting base 101 is provided with a first arc-shaped track 102, a second arc-shaped track 103, a third arc-shaped track 104 and a fourth arc-shaped track 105 in sequence along the circumferential direction. Each arc-shaped track is provided with an electric slide 106 inside, and an adjustment mechanism 2 is installed on the electric slide 106.

[0027] The adjustment mechanism 2 includes a linear slide rail 201. A slide rail groove 202 is provided at the bottom of the linear slide rail 201. Multiple sliders 203 are engaged and slidable inside the slide rail groove 202. A fixing bolt 204 is screwed to one side of the bottom of the multiple sliders 203. An installation head 206 is provided on the other side of the top of the sliders 203 through an installation rod 205.

[0028] See Figure 1 , Figure 4 Multiple mounting heads 206 are arranged from left to right as follows: a first Q-switching module 207, a waveplate 208, a pulsed xenon lamp unit 209, a Damman transmission grating cavity mirror 210, and an angle-adjusting mirror 211. The pulsed xenon lamp unit 209 is composed of a laser crystal Ce-Nd:YAG and a pulsed xenon lamp, and is used to emit a beam 212.

[0029] See Figure 3 , Figure 4 A semi-reflective lens 107 is mounted on the bottom axis of the mounting base 101 via a fixed base.

[0030] See Figure 1 , Figure 4The first Q-switching module 207, waveplate 208, pulsed xenon lamp unit 209, Damman transmission grating cavity mirror 210 and angle-adjusting mirror 211 constitute the laser interference unit 4, and the laser interference unit 4 is provided with four sets.

[0031] See Figure 1 The four sets of laser interference units are divided into two teams, and each team of laser interference units is divided into two groups. The included angle between each team of laser interference units is 30 degrees.

[0032] See Figure 3 , Figure 4 The angle-adjusting mirrors of the four sets of laser interference units 4 are used to focus the four beams 212 into a single point for processing the workpiece 3.

[0033] The implementation principle of this embodiment is as follows: The first arc-shaped track 102, the second arc-shaped track 103, the third arc-shaped track 104, and the fourth arc-shaped track 105 sequentially opened along the circumferential direction at the bottom of the mounting base 101, along with the electric slide block 106 inside each arc-shaped track, enable flexible installation and positioning of the adjustment mechanism 2 in the circumferential direction. The linear slide rail 201 in the adjustment mechanism 2 and the slide rail groove 202 opened at its bottom, in conjunction with multiple sliders 203 that slide within the slide rail groove 202, and the fixing bolts 204 screwed to one side of the bottom of the sliders 203 and the mounting head 206 provided on the other side of the top via the mounting rod 205, constitute a precise adjustment and fixing mechanism for the four components of the laser interference unit, including the first Q-switching module 207, the waveplate 208, the pulsed xenon lamp unit 209, the Damman transmission grating cavity mirror 210, and the angle-adjusting reflector 211.

[0034] The pulsed xenon lamp unit 209 consists of a Ce-Nd:YAG laser crystal and a pulsed xenon lamp, used to emit beams 212. After being adjusted by components such as the first Q-switching module 207, waveplate 208, and Damman transmission grating cavity mirror 210, the four beams 212 are finally focused into a single point by the angle-adjusting reflector 211. This point is the processing point, used for micro- and nano-fabrication of the workpiece 3.

[0035] The semi-reflective lens 107, mounted on the bottom axis of the mounting base 101 via a fixed base, is used to partially reflect and partially transmit the beams from different laser interference units, so that the four beams can interfere at the intersection of the semi-reflective lens, thereby achieving precise micro-nano processing of the workpiece 3.

[0036] The four sets of laser interference units 4 are divided into two teams, with the included angle between each team of laser interference units 4 being thirty degrees. This configuration ensures that the four beams can form a stable interference pattern at the intersection of the semi-reflective mirror, improving the processing accuracy and stability. Through the coordinated action of the electric slide 106 and the adjustment mechanism 2, the position and angle of the laser interference units 4 can be precisely adjusted to adapt to different processing requirements.

[0037] Although embodiments of the present invention have been shown and described, these specific embodiments are merely explanations of the present invention and are not intended to limit the invention. The specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. After reading this specification, those skilled in the art may make modifications, substitutions, and variations to the embodiments as needed without departing from the principles and spirit of the present invention, provided that such modifications, substitutions, and variations are within the scope of the claims of the present invention and are protected by patent law.

Claims

1. A four-beam laser interference micro-nano processing device, characterized in that: The device includes a processing apparatus (1), which includes a mounting base (101) arranged in a circular structure. The bottom of the mounting base (101) is provided with a first arc-shaped track (102), a second arc-shaped track (103), a third arc-shaped track (104) and a fourth arc-shaped track (105) in sequence along the circumferential direction. Each arc-shaped track is provided with an electric slide (106) inside, and an adjustment mechanism (2) is installed on the electric slide (106). The adjustment mechanism (2) includes a linear slide rail (201), the bottom of which is provided with a slide rail groove (202), and multiple sliders (203) are engaged and slidable inside the slide rail groove (202). A fixing bolt (204) is screwed to one side of the bottom of the multiple sliders (203), and an installation head (206) is provided on the other side of the top of the sliders (203) through an installation rod (205). 2.The four-beam laser interference micro-nano processing device according to claim 1, characterized in that: The mounting heads (206) are arranged from left to right as follows: a first Q-switching module (207), a waveplate (208), a pulsed xenon lamp unit (209), a Damman transmission grating cavity mirror (210), and an angle-adjusting mirror (211). The pulsed xenon lamp unit (209) is composed of a laser crystal Ce-Nd:YAG and a pulsed xenon lamp and is used to emit a beam (212).

3. The four-beam laser interference micro / nano fabrication device according to claim 1, characterized in that: A semi-reflective lens (107) is provided at the bottom axis of the mounting base (101) via a fixed seat.

4. The four-beam laser interference micro / nano fabrication device according to claim 2, characterized in that: The first Q-switching module (207), waveplate (208), pulsed xenon lamp unit (209), Damman transmission grating cavity mirror (210) and angle-adjusting mirror (211) constitute a laser interference unit (4), and the laser interference unit (4) is provided with four sets.

5. The four-beam laser interference micro / nano fabrication device according to claim 4, characterized in that: The four groups of laser interference units (4) are divided into two teams, and the laser interference units (4) in each team are divided into two groups. The included angle between the laser interference units (4) in each team is thirty degrees.

6. The four-beam laser interference micro / nano fabrication apparatus according to claim 4, characterized in that: The angle-adjusting mirrors of the four sets of laser interference units (4) are used to focus the four beams (212) into a single point for processing the workpiece (3).

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