A cleaning device for germanium wafer processing

By designing a cleaning device for germanium wafer processing, and employing a combination of nozzle spraying and ultrasonic cleaning, the problem of traditional cleaning processes being unable to remove tiny particles and chemical residues was solved, achieving thorough cleaning of the germanium wafer surface and improving the performance of solar cells.

CN224294070UActive Publication Date: 2026-05-29NICHE OPTOELECTRONICS TECH (JIUJIANG) CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
NICHE OPTOELECTRONICS TECH (JIUJIANG) CO LTD
Filing Date
2025-05-14
Publication Date
2026-05-29

AI Technical Summary

Technical Problem

Traditional cleaning processes are ineffective at removing tiny particles and chemical residues from germanium wafers, leading to white fog or clump defects on the surface, which affects the reliability and lifespan of solar cells.

Method used

A cleaning device for germanium sheet processing was designed. It uses a nozzle to spray cleaning fluid followed by ultrasonic cleaning. The nozzle and ultrasonic transmitter are used to thoroughly clean the germanium sheet. After the nozzle sprays the cleaning fluid, the germanium sheet is immersed in the cleaning fluid for further cleaning.

Benefits of technology

It effectively removes tiny particles and chemical residues from germanium wafers, improves the cleaning effect of germanium wafers, prevents the generation of surface defects, and enhances the performance of solar cells.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to germanium wafer processing field especially uses a kind of cleaning device for germanium wafer processing.The utility model provides such a kind of cleaning device for germanium wafer processing: including base, cleaning bucket, flush shell, box door, observation glass, electric push rod and connecting rod etc.;Base is fixedly installed with cleaning bucket, flush shell is fixedly connected with cleaning bucket upper end, box door is symmetrically set up in flush shell front side, flush shell left and right sides are all set up a certain number of observation glass, electric push rod is rotatably installed in flush shell inner top, electric push rod lower end is fixedly connected with connecting rod.The utility model is sprayed on germanium wafer by the spray head on flush pipe and is washed initially, then germanium wafer is soaked in cleaning fluid, and using ultrasonic wave is more completely washed to germanium wafer, reaches the effect of effectively removing small particle and chemical residue adsorbed on germanium wafer.
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Description

Technical Field

[0001] This utility model relates to the field of germanium sheet processing, and in particular to a cleaning device for germanium sheet processing. Background Technology

[0002] Germanium wafers are semiconductor wafers made of germanium single crystal material. They have high electron mobility and hole mobility and are key materials in aerospace, infrared optics and solar cells. Especially when used as a substrate in space solar cells, their high temperature resistance, radiation resistance and high photoelectric conversion efficiency significantly improve the performance of the cells.

[0003] Germanium wafers are susceptible to contaminants such as particles, metal impurities, and oxide layers during processing. Traditional cleaning processes, such as strong acid corrosion or alternating hot and cold rinsing, can easily lead to surface passivation, thickening of the oxide layer, or spot residue. They are difficult to effectively remove adsorbed microparticles and chemical residues, resulting in white fog or clump defects on the wafer surface, which in turn affects the reliability and lifespan of solar cells.

[0004] Therefore, it is necessary to design a cleaning device for germanium sheet processing. Utility Model Content

[0005] In order to overcome the shortcomings of traditional cleaning processes that are difficult to effectively remove adsorbed microparticles and chemical residues, resulting in white fog or clump defects on the wafer surface, the technical problem is to provide a cleaning device for germanium wafer processing.

[0006] The technical solution of this utility model is: a cleaning device for germanium sheet processing, comprising a base, a cleaning tank, a rinsing shell, a door, an observation glass, an electric push rod, a connecting rod, a support frame, a placement frame, an inlet pipe, a rinsing pipe, a nozzle, an ultrasonic transmitter, and an outlet pipe. The cleaning tank is fixedly installed on the base, and the rinsing shell is fixedly connected to the upper end of the cleaning tank. The rinsing shell has symmetrically arranged doors on the front side. A certain number of observation glasses are arranged on both the left and right sides of the rinsing shell. An electric push rod is rotatably installed at the top inside the rinsing shell. A connecting rod is fixedly connected to the lower end of the telescopic rod of the electric push rod. A support frame is fixedly connected to the lower end of the connecting rod. A certain number of placement frames are slidably and evenly arranged on the support frame. An inlet pipe is fixedly inserted through the upper rear side of the rinsing shell. A certain number of rinsing pipes are evenly arranged on the inner periphery of the rinsing shell. The inlet pipe and the rinsing pipe are interconnected. A certain number of nozzles are evenly distributed on the rinsing pipe. An ultrasonic transmitter is fixedly installed on both the left and right sides inside the cleaning tank. An outlet pipe is fixedly inserted through the bottom right side inside the cleaning tank.

[0007] Furthermore, it also includes wedge blocks and springs. A certain number of notches are opened in the middle of the front side of the support frame, and wedge blocks are slidably installed in each notch. Springs are fixed between the wedge blocks and the support frame.

[0008] Furthermore, it also includes a motor, with the motor fixedly installed in the middle of the base, and the motor output shaft rotating through the cleaning bucket.

[0009] Furthermore, the placement frame has a certain number of notches to facilitate the flow of cleaning fluid.

[0010] Furthermore, the tips of the nozzles all face the direction of the placement frame.

[0011] Furthermore, the bottom of the support frame has a notch corresponding to the motor output shaft, and the notch at the bottom of the support frame and the motor output shaft are in the same vertical direction.

[0012] The beneficial effects are: This utility model uses a nozzle on the rinsing pipe to spray cleaning fluid onto the germanium sheet for initial cleaning, and then soaks the germanium sheet in the cleaning fluid and uses ultrasound to clean the germanium sheet more thoroughly, achieving the effect of effectively removing tiny particles and chemical residues adsorbed on the germanium sheet. Attached Figure Description

[0013] Figure 1 This is a three-dimensional structural diagram of the present invention.

[0014] Figure 2 This is a three-dimensional structural diagram of the ultrasonic transmitter, liquid outlet pipe, and motor of this utility model.

[0015] Figure 3 This is a three-dimensional structural diagram of the connecting rod, support frame, and placement frame of this utility model.

[0016] Figure 4 This is a three-dimensional structural diagram of the electric push rod, connection, and support frame of this utility model.

[0017] Figure 5 This is a three-dimensional structural diagram of the wedge block and spring of this utility model.

[0018] Figure 6 This is a schematic diagram of the planar structure of the liquid inlet pipe and the flushing pipe of this utility model.

[0019] In the attached diagram, the following are the reference numerals: 1_base, 2_cleaning bucket, 3_rinsing shell, 4_box door, 5_observation glass, 6_electric push rod, 7_connecting rod, 8_support frame, 81_wedge block, 82_spring, 9_placement frame, 10_inlet pipe, 11_rinsing pipe, 12_nozzle, 13_ultrasonic transmitter, 14_outlet pipe, 15_motor. Detailed Implementation

[0020] Example: A cleaning apparatus for germanium wafer processing, such as... Figures 1-6As shown, the device includes a base 1, a cleaning tank 2, a rinsing shell 3, a door 4, an observation glass 5, an electric push rod 6, a connecting rod 7, a support frame 8, a placement frame 9, an inlet pipe 10, a rinsing pipe 11, a nozzle 12, an ultrasonic transmitter 13, and an outlet pipe 14. The cleaning tank 2 is fixedly mounted on the base 1. The rinsing shell 3 is fixedly connected to the upper end of the cleaning tank 2. The rinsing shell 3 has symmetrically arranged doors 4 on its front side. Three observation glasses 5 are provided on both the left and right sides of the rinsing shell 3. An electric push rod 6 is rotatably mounted on the top of the rinsing shell 3. A connecting rod 7 is fixedly connected to the lower end of the telescopic rod of the electric push rod 6. The connecting rod 7... A support frame 8 is fixedly connected to the end, and three placement frames 9 are slidably and evenly arranged on the support frame 8. An inlet pipe 10 is fixedly inserted through the upper rear side of the rinsing shell 3. Three rinsing pipes 11 are evenly arranged on the inner periphery of the rinsing shell 3. The inlet pipe 10 and the rinsing pipes 11 are interconnected. A certain number of nozzles 12 are evenly distributed on the rinsing pipes 11. Ultrasonic transmitters 13 are fixedly installed on both the left and right sides inside the cleaning tank 2. An outlet pipe 14 is fixedly inserted through the bottom right side inside the cleaning tank 2. A certain number of notches are opened on the placement frames 9 to facilitate the flow of cleaning liquid. The ends of the nozzles 12 all face the direction of the placement frames 9.

[0021] like Figure 3 and Figure 5 As shown, it also includes a wedge block 81 and a spring 82. A certain number of notches are provided in the middle of the front side of the support frame 8. The wedge block 81 is slidably provided in each notch. The spring 82 is fixedly connected between the wedge block 81 and the support frame 8.

[0022] like Figure 2 As shown, it also includes a motor 15. The motor 15 is fixedly installed in the middle of the base 1. The output shaft of the motor 15 is rotatably inserted into the cleaning bucket 2. The bottom of the support frame 8 has a notch corresponding to the output shaft of the motor 15. The notch at the bottom of the support frame 8 and the output shaft of the motor 15 are in the same vertical direction.

[0023] This device is used when cleaning germanium sheets. First, the germanium sheets are placed on the placement frame 9. Then, the door 4 is opened, and the placement frame 9 is slidably placed on the support frame 8. When the placement frame 9 enters the support frame 8, the wedge block 81 on the front side of the support frame 8 is pressed down, and the spring 82 is squeezed. When the placement frame 9 is fully inside the support frame 8, the wedge block 81 is reset under the action of the spring 82, which limits the placement frame 9. After the placement frame 9 is placed on the support frame 8, the door 4 is closed, and the cleaning solution is injected into the rinsing pipe 11 through the liquid inlet pipe 10. At the same time, a certain amount of cleaning solution is injected into the cleaning tank 2. Then, the nozzle 12 on the rinsing pipe 11 is opened to spray the cleaning solution onto the germanium sheets for cleaning. The cleaning solution sprayed from the nozzle 12 eventually flows into the cleaning tank 2 through the notch on the placement frame 9. When the nozzle 12 performs the initial cleaning of the rinsing pipe 11, the operator can observe the cleaning solution through the two sides of the rinsing shell 3. Observe the cleaning process inside the glass 5. When the cleaning reaches a certain level, turn off the nozzle 12 and start the electric push rod 6. The electric push rod 6 drives the support frame 8 to move downward through the connecting rod 7. When the support frame 8 moves to the bottom of the cleaning tank 2, the notch at the bottom of the support frame 8 connects with the output shaft of the motor 15. At this time, turn off the electric push rod 6. The placement frame 9 and the germanium sheet are completely submerged in the cleaning solution in the cleaning tank 2. Then, start the motor 15 and the ultrasonic transmitter 13. The ultrasonic transmitter 13 emits ultrasonic waves to clean the germanium sheet in the cleaning solution. At the same time, the output shaft of the motor 15 drives the support frame 8 and the electric push rod 6 to rotate, making the germanium sheet cleaner more thorough. After the germanium sheet is cleaned, turn off the motor 15 and the ultrasonic transmitter 13, start the electric push rod 6 to reset the support frame 8, and discharge the waste liquid in the cleaning tank 2 through the liquid outlet pipe 14. Then, open the box door 4, press down the wedge block 81, and take out the placement frame 9.

Claims

1. A cleaning apparatus for processing germanium sheets, characterized in that, The device includes a base (1), a cleaning tank (2), a rinsing shell (3), a door (4), an observation glass (5), an electric push rod (6), a connecting rod (7), a support frame (8), a placement frame (9), an inlet pipe (10), a rinsing pipe (11), a nozzle (12), an ultrasonic transmitter (13), and an outlet pipe (14). The cleaning tank (2) is fixedly installed on the base (1). The rinsing shell (3) is fixedly connected to the upper end of the cleaning tank (2). The rinsing shell (3) has symmetrical doors (4) on the front side. A certain number of observation glasses (5) are opened on both the left and right sides of the rinsing shell (3). An electric push rod (6) is rotatably installed on the top of the rinsing shell (3). The lower end of the electric push rod (6) is fixedly connected to a connecting rod (7), and the lower end of the connecting rod (7) is fixedly connected to a support frame (8). A certain number of placement frames (9) are slidably and evenly arranged on the support frame (8). An inlet pipe (10) is fixedly inserted through the upper rear side of the flushing shell (3). A certain number of flushing pipes (11) are evenly arranged on the inner periphery of the flushing shell (3). The inlet pipe (10) and the flushing pipe (11) are interconnected. A certain number of nozzles (12) are evenly distributed on the flushing pipe (11). An ultrasonic transmitter (13) is fixedly installed on both the left and right sides inside the cleaning tank (2). An outlet pipe (14) is fixedly inserted through the bottom right side inside the cleaning tank (2).

2. The cleaning apparatus for germanium sheet processing as described in claim 1, characterized in that, It also includes a wedge block (81) and a spring (82). A certain number of notches are provided in the middle of the front side of the support frame (8). The wedge block (81) is slidably provided in each notch. The spring (82) is fixed between the wedge block (81) and the support frame (8).

3. The cleaning apparatus for germanium sheet processing as described in claim 2, characterized in that, It also includes a motor (15), which is fixedly installed in the middle of the base (1), and the output shaft of the motor (15) is rotatably inserted into the cleaning bucket (2).

4. The cleaning apparatus for germanium sheet processing as described in claim 3, characterized in that, A certain number of notches are provided on the placement frame (9).

5. The cleaning apparatus for germanium sheet processing as described in claim 4, characterized in that, The ends of the nozzles (12) all face the direction of the placement frame (9).

6. The cleaning apparatus for germanium wafer processing as described in claim 5, characterized in that, The bottom of the support frame (8) has a notch corresponding to the output shaft of the motor (15), and the notch at the bottom of the support frame (8) and the output shaft of the motor (15) are in the same vertical direction.