A preparation device of corrosion-resistant photoresist stripping solution for silicon-based panel

Abstract

The utility model discloses a preparation device for corrosion -resistant type photoresist stripping liquid of silicon base panel, including reation kettle, the upper portion fixed of reation kettle has premixing bucket, the bottom of premixing bucket is established export, and premixing bucket is set up the plug, the plug can be separated export makes the material in premixing bucket flow to reation kettle. The utility model discloses directly setting up a premixing bucket in the inside of reation kettle, and the premixing step is integrated in the inside of reation kettle, and does not need to additionally add the extra pipeline line etc., and convenient to use.

Description

Technical Field

[0001] This utility model relates to an apparatus for preparing an anti-corrosion photoresist stripping solution, specifically an apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels. Background Technology

[0002] The photoresist stripping solution for silicon-based panels is made of a mixture of various raw materials. Some of these raw materials can be mixed first and then mixed with the main raw materials to form the photoresist stripping solution. Currently, an additional mixing tank is used to mix the various raw materials first, and then pour them into the main reactor to mix with the main raw materials again. This requires transporting the premixed liquid from the mixing tank to the main reactor, which requires the use of pumps and pipelines. This requires additional steps such as piping, wiring, and control, which increases costs. Utility Model Content

[0003] To address the shortcomings of the prior art, this invention provides a preparation apparatus for an anti-corrosion photoresist stripping solution for silicon-based panels. This invention directly integrates a premixing tank inside the reactor, eliminating the need for additional piping and wiring, making it convenient to use.

[0004] An apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels includes a reactor, a premixing tank fixed to the upper part of the reactor, an outlet at the bottom of the premixing tank, and a blockage block provided at the outlet, the blockage block being able to detach from the outlet to allow the material in the premixing tank to flow into the reactor.

[0005] The outlet has a structure that is narrow at the top and wide at the bottom, and the block is also narrow at the top and wide at the bottom.

[0006] It also includes a drive cylinder, which is located at the top of the reactor. The drive cylinder is connected to a transmission rod, which is connected to at least two connecting rods. The premixing tank has a through hole, and the connecting rod passes through the through hole and is fixedly connected to the block.

[0007] The outer periphery of the premixing tank is fixed to the inner wall of the reactor, and the bottom surface of the premixing tank is not lower than the middle height of the reactor.

[0008] The inner bottom surface of the premixing tank is a sloping surface that is high around the edges and low in the middle.

[0009] It also includes a stirring shaft, which passes through the center of the premixing tank and the block and is installed at the bottom of the reactor.

[0010] The stirring shaft is equipped with a pre-stirring frame and a main stirring frame. The pre-stirring frame is located inside the pre-mixing tank, and the main stirring frame is located at the bottom of the reactor.

[0011] To achieve the above technical objectives, the present invention adopts the following technical solution:

[0012] In summary, this utility model achieves the following technical effects:

[0013] This invention features a premixing tank inside the reactor. Multiple raw materials can be injected into the premixing tank and stirred first. Then, the plug is opened to allow the mixed liquid to be injected into the reactor below, where it is mixed again with the raw materials in the reactor. This allows premixing to be achieved in one reactor, improving mixing efficiency. It also eliminates the need for other reactors and additional pipelines, saving the steps of premixing, transportation, and injection. Attached Figure Description

[0014] Figure 1 It is a device for preparing an anti-corrosion photoresist stripping solution for silicon-based panels;

[0015] Figure 2 This is a schematic diagram of the liquid discharge state from the premixing tank. Detailed Implementation

[0016] The present invention will be further described in detail below with reference to the accompanying drawings.

[0017] This specific embodiment is merely an explanation of the present utility model and is not intended to limit the present utility model. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but as long as they are within the scope of the claims of the present utility model, they are protected by patent law.

[0018] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0019] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0020] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0021] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0022] Example:

[0023] Figure 1 This is a preparation apparatus for an anti-corrosion photoresist stripping solution for silicon-based panels. The apparatus includes a reaction vessel 1, a premixing tank 2 fixed to the upper part of the reaction vessel 1, an outlet 23 opened at the bottom of the premixing tank 2, and a block 5 provided at the outlet 23. The block 5 can detach from the outlet 23 to allow the material in the premixing tank 2 to flow into the reaction vessel 1.

[0024] This invention features a premixing tank inside the reactor. Multiple raw materials can be injected into the premixing tank and stirred first. Then, the plug is opened to allow the mixed liquid to be injected into the reactor below, where it is mixed again with the raw materials in the reactor. This allows premixing to be achieved in one reactor, improving mixing efficiency. It also eliminates the need for other reactors and additional pipelines, saving the steps of premixing, transportation, and injection.

[0025] Figure 2 This is a schematic diagram of the liquid discharge state of the premixing tank. The outlet 23 has a structure that is narrow at the top and wide at the bottom, and the block 5 is matched with a structure that is narrow at the top and wide at the bottom.

[0026] The top-narrow, bottom-wide structure allows the plug to seal the outlet more tightly when it moves upwards, eliminating the need for additional sealing rings. Even minor leaks won't have a significant impact, as the liquid ultimately flows to the lower area to mix and generate the corrosion-inhibiting photoresist stripping fluid. The sloping surface created by the narrow top and wide bottom further facilitates the downward flow of the liquid.

[0027] It also includes a drive cylinder 6, which is located at the top of the reactor 1. The drive cylinder 6 is connected to a transmission rod 61, and the transmission rod 61 is connected to at least two connecting rods 62. The premixing tank 2 has a through hole 21, and the connecting rod 62 passes through the through hole 21 and is fixedly connected to the block 5.

[0028] This invention places the blockage drive outside the reactor, which does not occupy internal space and is easy to control.

[0029] The outer periphery of the premixing tank 2 is fixed to the inner wall of the reactor 1, and the bottom surface of the premixing tank 2 is not lower than the middle height of the reactor 1.

[0030] The inner bottom surface 22 of the premixing tank 2 is a sloping surface that is high around the edges and low in the middle, which facilitates the complete outflow of the mixed liquid.

[0031] It also includes a stirring shaft 3, which is equipped with a stirring motor. The stirring shaft 3 passes through the center of the premixing tank 2 and the block 5 and is installed at the bottom of the reactor 1. The stirring shaft 3 is provided with a pre-stirring frame 4 and a main stirring frame 7. The pre-stirring frame 4 is located inside the premixing tank 2, and the main stirring frame 7 is located at the bottom of the reactor 1. One stirring shaft is configured with two stirring frames to achieve stirring in two areas, resulting in fewer parts.

[0032] It is also equipped with multiple first feed pipes 10 and multiple second feed pipes 11. The first feed pipes 10 can inject raw materials into the premixing tank, and the second feed pipes 11 can inject raw materials into the reactor after passing through the premixing tank.

[0033] The bottom of the reactor is still the discharge pipe 8, which facilitates the discharge of the corrosion-inhibiting photoresist stripping liquid.

[0034] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any way. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present utility model shall fall within the scope of the technical solution of the present utility model.

Claims

1. An apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels, characterized in that: The reactor includes a reaction vessel (1), and a premixing tank (2) is fixed on the upper part of the reaction vessel (1). The premixing tank (2) has an outlet (23) at the bottom, and the outlet (23) is provided with a block (5). The block (5) can be disengaged from the outlet (23) so that the material in the premixing tank (2) flows into the reaction vessel (1).

2. The apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels according to claim 1, characterized in that: The outlet (23) has a structure that is narrow at the top and wide at the bottom, and the block (5) is matched with a structure that is narrow at the top and wide at the bottom.

3. The apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels according to claim 1, characterized in that: It also includes a drive cylinder (6), which is located at the top of the reactor (1). The drive cylinder (6) is connected to a transmission rod (61), which is connected to at least two connecting rods (62). The premixing tank (2) has a through hole (21), and the connecting rod (62) passes through the through hole (21) and is then fixedly connected to the block (5).

4. The apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels according to claim 1, characterized in that: The outer periphery of the premixing tank (2) is fixed to the inner wall of the reactor (1), and the bottom surface of the premixing tank (2) is not lower than the middle height of the reactor (1).

5. The apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels according to claim 1, characterized in that: The inner bottom surface (22) of the premixing tank (2) is a sloping surface that is high around the edges and low in the middle.

6. The apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels according to claim 1, characterized in that: It also includes a stirring shaft (3), which passes through the center of the premixing tank (2) and the block (5) and is installed at the bottom of the reactor (1).

7. The apparatus for preparing an anti-corrosion photoresist stripping solution for silicon-based panels according to claim 6, characterized in that: The stirring shaft (3) is provided with a pre-stirring frame (4) and a main stirring frame (7). The pre-stirring frame (4) is located inside the premixing tank (2), and the main stirring frame (7) is located at the bottom of the reactor (1).

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